US20090121770A1 - Method for clamping a semiconductor region at or near ground - Google Patents
Method for clamping a semiconductor region at or near ground Download PDFInfo
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- US20090121770A1 US20090121770A1 US12/033,600 US3360008A US2009121770A1 US 20090121770 A1 US20090121770 A1 US 20090121770A1 US 3360008 A US3360008 A US 3360008A US 2009121770 A1 US2009121770 A1 US 2009121770A1
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- 238000000034 method Methods 0.000 title claims description 23
- 239000000758 substrate Substances 0.000 claims description 14
- 238000010586 diagram Methods 0.000 description 9
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- 230000003071 parasitic effect Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000006880 cross-coupling reaction Methods 0.000 description 2
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- 238000007796 conventional method Methods 0.000 description 1
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05F—SYSTEMS FOR REGULATING ELECTRIC OR MAGNETIC VARIABLES
- G05F3/00—Non-retroactive systems for regulating electric variables by using an uncontrolled element, or an uncontrolled combination of elements, such element or such combination having self-regulating properties
- G05F3/02—Regulating voltage or current
- G05F3/08—Regulating voltage or current wherein the variable is dc
- G05F3/10—Regulating voltage or current wherein the variable is dc using uncontrolled devices with non-linear characteristics
- G05F3/16—Regulating voltage or current wherein the variable is dc using uncontrolled devices with non-linear characteristics being semiconductor devices
- G05F3/20—Regulating voltage or current wherein the variable is dc using uncontrolled devices with non-linear characteristics being semiconductor devices using diode- transistor combinations
- G05F3/26—Current mirrors
- G05F3/265—Current mirrors using bipolar transistors only
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
Definitions
- the present invention relates to semiconductor integrated circuits, and more particularly to a circuit for clamping the voltage received by an n-type region formed in a semiconductor substrate.
- One conventional technique for ensuring that the voltage applied to an n-type semiconductor region does not fall significantly below the ground potential is to place a Schottky diode between the n-type region and the ground, and further, to place a current limiting resistor between the n-type region and the node that may pull the n-type region below the ground potential, as shown in FIG. 1 .
- Schottky diode 12 As node 16 is pulled below the ground potential, Schottky diode 12 is forward biased thus maintaining n-type region 10 clamped at a forward Schottky diode voltage below the ground potential.
- n-type region 10 may be clamped at a voltage sufficiently below the ground potential as to cause an associated parasitic lateral NPN transistor to turn on.
- a clamping circuit clamps a voltage received by an n-type semiconductor region without using a Schottky transistor.
- the clamping circuit includes a current mirror as well as first and second bipolar transistors.
- the current mirror receives a first current and supplies a second current in response.
- the first current is received by the first bipolar transistor, and the second current is received by the second bipolar transistor.
- the difference between the base-emitter junction voltages of the first and second bipolar transistors defines the voltage at which the n-type region is clamped.
- current is withdrawn from the base (gate) terminals of the transistors disposed in the current mirror.
- a clamping circuit includes a current mirror, as well as first, second, third and fourth bipolar transistors.
- the third and fourth bipolar transistors form a cross-coupled transistor pair.
- the current mirror receives a first current and supplies a second current in response.
- the first current is received by the first and third bipolar transistors.
- the second current is received by the second and fourth bipolar transistors.
- the emitter-base junction voltages of the first and second bipolar transistors together with the base-emitter junction voltages of the third and fourth transistors define the voltage at which the n-type region is clamped.
- a current source supplying a current to the first bipolar transistor ensures that the clamping circuit starts up properly.
- a clamping circuit includes a current mirror, as well as first, second, third and fourth bipolar transistors.
- the third and fourth bipolar transistors form a cross-coupled transistor pair.
- the current mirror receives a first current and supplies a second current in response.
- the first current is received by the first and third bipolar transistors.
- the second current is received by a fifth transistor coupled to the first and third transistor and adapted to develop a base-emitter voltage substantially similar to the base-emitter voltage of the first and third transistors.
- the emitter-base junction voltages of the first and second bipolar transistors together with the base-emitter junction voltages of the third and fourth transistors define the voltage at which the n-type region is clamped. To start-up the circuit properly, current is withdrawn from the base (gate) terminals of the transistors disposed in the current mirror.
- FIG. 1 is a schematic diagram of a circuit adapted to clamp the voltage applied to an n-type semiconductor region, as known in the prior art.
- FIG. 2 is a schematic diagram of a circuit adapted to clamp the voltage applied to an n-type semiconductor region, in accordance with one exemplary embodiment of the present invention.
- FIG. 3A is a cross-section of a substrate showing a number of different regions associated with the circuit of FIG. 2 , in accordance with one exemplary embodiment of the present invention.
- FIG. 3B is a cross-section of a substrate showing a number of different regions associated with the circuit of FIG. 2 , in accordance with another exemplary embodiment of the present invention.
- FIG. 4 is a schematic diagram of a circuit adapted to clamp the voltage applied to an n-type semiconductor region, in accordance with one exemplary embodiment of the present invention.
- FIG. 5 is a schematic diagram of a circuit adapted to clamp the voltage applied to an n-type semiconductor region, in accordance with one exemplary embodiment of the present invention.
- FIG. 6 is a schematic diagram of a circuit adapted to clamp the voltage applied to an n-type semiconductor region, in accordance with one exemplary embodiment of the present invention.
- an n-type semiconductor region is clamped at or near the ground potential without the use of a Schottky transistor.
- MOS transistors may also be used to clamp an n-type semiconductor region in accordance with the present invention.
- FIG. 2 is a transistor schematic diagram of a clamping circuit 50 adapted to clamp n-type semiconductor region 20 to a known voltage, in accordance with one exemplary embodiment of the present invention.
- Clamping circuit 50 is shown as including bipolar PNP transistors 22 , 24 , as well as bipolar NPN transistors 26 , 28 .
- PNP transistors 22 and 24 have the same base-emitter voltage and form a current mirror. Accordingly, current I 28 supplied by the current mirror is proportional or substantially equal to current I 26 received by the current mirror.
- Current limiting resistor 30 is disposed between the emitter terminal of transistor 26 and node 55 to which voltage V Test is applied.
- transistor 32 begins to draw a relatively small amount of current from the base terminals of transistors 22 and 24 , thereby causing clamping circuit 50 to start up properly. Because transistors 22 and 24 form a current mirror, the ratio of the collector current I 26 of transistor 26 to the collector current I 28 of transistor 28 is determined by the relative base-emitter areas of transistors 22 and 24 .
- the voltage received by n-type region 20 with respect to the ground potential is defined by the difference between the base-emitter regions of transistors 26 and 28 , namely VBE 28 -VBE 26 , where VBE 28 is the voltage across the base-emitter terminals of transistor 28 and VBE 26 is the voltage across the base-emitter terminals of transistor 26 .
- Voltages VBE 26 and VBE 28 are related to currents I 26 and I 28 according to the following:
- VBE 28 (kT/q)*ln( I 28 /I 28 ) (1)
- VBE 26 (kT/q)*ln( I 26 /I 26 ) (2)
- VBE 28 ⁇ VBE 26 (kT/q)*ln( I 28 /I s28 ) ⁇ (kT/q)*ln( I 26 /I s26 ) (3)
- I s26 and I s28 are constant values, respectively defined by the transfer characteristics of transistors 26 and 28 in the forward-active region.
- Equation (3) may be simplified as:
- VBE 28 ⁇ VBE 26 (kT/q)*ln( X *( I s26 /I s28 )) (4)
- I s26 /I s28 is the ratio of the base-emitter areas of transistors 26 and 28 .
- VBE 28 ⁇ VBE 26 (kT/q)*ln( X/Y ) (5)
- the voltage of region 20 may be controlled by selecting the ratio of X and Y. For example, if X and Y are both selected to be equal to 1, the voltage of n-type region 20 with respect to ground may be set to zero. If Y is selected to be twice as large as X, the voltage of n-type region 20 with respect to ground may be set to ( ⁇ 18 mV) at room temperature. It is often desirable to set the clamp point slightly below ground to prevent the circuit from conducting current during a shutdown state.
- Current limiting resistor 30 limits the amount of current I 26 flowing through transistors 26 and 24 , according to the following:
- I 26 ((voltage of clamped region 20) ⁇ V test )/( R 30 )
- R 30 is the resistance of resistor 30 ; this resistance is typically selected to be sufficiently large to keep the currents flowing through transistors 22 , 24 , 26 , and 28 relatively small in order to ensure proper operation.
- PNP transistors 22 and 24 may be either lateral or vertical PNP transistors.
- Transistors 26 , 28 and 32 may be either lateral or vertical NPN transistors.
- Transistor 32 may be a parasitic NPN transistor that when selected to be a lateral NPN transistor may be formed by placing n-type region 20 in close proximity of transistors 22 , 24 , or alternatively by placing an n-type moat around n-type region 20 and connecting the moat to the bases of transistors 22 and 24 .
- FIG. 3A is a cross-sectional view of a semiconductor substrate 40 having formed therein a number of different regions associated with clamp circuit 50 of FIG. 2 , in accordance with one exemplary embodiment of the present invention.
- N-type region 20 is assumed to be an epitaxial region that is clamped in accordance with one embodiment of the present invention.
- transistors 22 and 24 see FIG. 2
- N-type region 56 and n+ region 46 is connected to the base terminals of transistors 22 , 24 via a metal layer (not shown) and form the collector region of transistor 32 of FIG. 2 .
- P-type substrate region 40 and n-type region 20 respectively form the base and emitter regions of transistor 32 of FIG. 2 .
- FIG. 3B is a cross-sectional view of a semiconductor substrate 70 having formed therein a number of different regions associated with clamp circuit 50 of FIG. 2 , in accordance with another exemplary embodiment of the present invention.
- n-type region 56 and n+ region 54 together are assumed to form the base region of transistor 24 (or 22 ), as well as the collector terminal of transistor 32 .
- P-type substrate region 40 and n-type region 20 respectively form the base and emitter regions of transistor 32 of FIG. 2 .
- FIG. 4 is a transistor schematic diagram of a clamping circuit 150 adapted to clamp n-type semiconductor region 20 to a known voltage, in accordance with another exemplary embodiment of the present invention.
- Clamping circuit 150 is similar to clamping circuit 50 except that in clamping circuit 150 , transistors 122 and 124 are PMOS transistors.
- the ratio of the channel-width to channel length of transistors 122 , 124 in addition to the ratio of the emitter-base areas of transistors 26 and 28 collectively define the voltage at which n-type region 20 is clamped.
- FIG. 5 is a transistor schematic diagram of a clamping circuit 100 adapted to clamp n-region 40 to a known voltage, in accordance with another exemplary embodiment of the present invention.
- Clamping circuit 100 is shown as including bipolar PNP transistors 142 , 144 , as well as bipolar NPN transistors 146 , 148 , 150 and 152 .
- PNP transistors 142 and 144 have the same base-emitter voltages and form a current mirror, accordingly, current I 1 supplied by this current mirror is proportional or substantially equal to current I 2 received by this current mirror.
- Current I 1 is shown as also flowing through transistors 146 and 148 .
- current I 2 is shown as also flowing through transistors 150 and 152 .
- Current limiting resistor 156 is disposed between the emitter terminal of transistor 150 and node 55 to which voltage V Test is applied.
- transistors 142 and 144 form a current mirror, thus setting the currents that flow through transistors 146 , 148 , on the one hand, and transistors 150 and 152 , on the other, at a predetermined ratio.
- the voltage of the clamped n-type region 40 relative to the ground is defined by the following:
- VBE 150 , VBE 146 , VBE 152 , and VBE 148 represent the base-emitter voltages of transistors 150 , 146 , 152 and 148 respectively.
- N-type region 40 is clamped in accordance with the following expression:
- I s152 , I s148 , I s146 , and I s150 are values respectively defined by the transfer characteristics of transistors 152 , 148 , 146 and 150 in the forward-active region.
- Cross-coupled transistors 148 and 150 reduce the output impedance and improve the power supply rejection ratio.
- PMOS transistors may be used in place of PNP transistors 142 144 .
- the cross-coupled transistors 148 and 150 cancel collector current mismatches between transistors 142 , 152 and 150 disposed in current leg 155 , and transistors 144 , 146 and 148 disposed in current leg 145 .
- FIG. 6 is a transistor schematic diagram of a clamping circuit 200 adapted to clamp n-region 80 to a known voltage, in accordance with another exemplary embodiment of the present invention.
- Clamping circuit 200 is shown as including, in part, bipolar PNP transistors 270 , 272 , as well as bipolar NPN transistors 268 , 266 , 264 , 260 and 262 .
- Transistor 272 also disposed in clamping circuit 200 , may be a parasitic NPN transistor used to start up circuit 200 . The following description is provided with reference to setting the clamp voltage of n-region 80 to nearly 0 volts, i.e., the ground potential.
- clamp voltage of n-region 80 may be selectively set to any other desired value by varying the ratio of the emitter-base areas of the various transistors shown in circuit 200 in a manner generally similar to that described above with respect to FIG. 2 .
- Current limiting resistor 276 is disposed between the emitter terminal of transistor 262 and node 55 to which voltage V Test is applied. As voltage V Test is pulled below the ground potential, transistor 272 is turned on, thereby pulling a relatively small amount of current out from the base terminals of transistors 270 and 274 , in turn, ensuring that circuit 200 starts up properly.
- Transistors 270 and 274 form a current mirror, therefore assuming transistors 270 and 274 have similar base-emitter areas, current I 1 is substantially equal to current I 2 . Therefore, assuming that the base currents are negligible, the collector currents of transistors 266 and 268 are substantially equal. Consequently, the base-emitter voltage of transistor 268 , namely VBE 268 , is substantially equal to the base-emitter voltage of transistor 266 , namely VBE 266 . Since the emitter terminals of both transistors 268 and 266 receive the ground potential, the voltage at node N 1 is substantially equal to the voltage at node N 2 .
- transistors 260 and 264 are substantially the same and the base terminals of these two transistors are coupled to one another, current I 2 flowing through transistor 264 is substantially equal to current I 3 flowing through transistor 260 .
- the base-emitter voltage of transistor 266 i.e., VBE 266 is substantially equal to the base-emitter voltage of transistor 262 , i.e., VBE 262 .
- the base-emitter voltage of transistor 264 i.e., VBE 264 is substantially equal to the base-emitter voltage of transistor 266 . Accordingly:
- the voltage at n-type region 80 is defined by the following expression:
- the voltage at n-type region 80 is nearly equal to zero.
- the voltage at which n-type region 80 is clamped may be selectively set to any other desired value.
- N-type region 80 is clamped in accordance with the following expression:
- I s265 , I s262 , I s266 , and I s260 are values respectively defined by the transfer characteristics of transistors 264 , 262 , 266 and 260 in the forward-active region
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Abstract
Description
- The present application claims benefit under 35 USC 119(e) of U.S. provisional Application No. 60/908,922, filed Mar. 29, 2007, entitled “Method For Clamping A Semiconductor Region At Or Near Ground”, the content of which is incorporated herein by reference in its entirety.
- The present invention relates to semiconductor integrated circuits, and more particularly to a circuit for clamping the voltage received by an n-type region formed in a semiconductor substrate.
- One conventional technique for ensuring that the voltage applied to an n-type semiconductor region does not fall significantly below the ground potential, is to place a Schottky diode between the n-type region and the ground, and further, to place a current limiting resistor between the n-type region and the node that may pull the n-type region below the ground potential, as shown in
FIG. 1 . Asnode 16 is pulled below the ground potential, Schottkydiode 12 is forward biased thus maintaining n-type region 10 clamped at a forward Schottky diode voltage below the ground potential. - One disadvantage of the clamping circuit shown in
FIG. 1 is that Schottkydiode 12, which is a metal-semiconductor junction may not be available for use. Second, if the Schottky diode has a relatively high series resistance and/or a high forward voltage, n-type region 10 may be clamped at a voltage sufficiently below the ground potential as to cause an associated parasitic lateral NPN transistor to turn on. - In accordance with the present invention, a clamping circuit clamps a voltage received by an n-type semiconductor region without using a Schottky transistor. In accordance with one embodiment, the clamping circuit includes a current mirror as well as first and second bipolar transistors. The current mirror receives a first current and supplies a second current in response. The first current is received by the first bipolar transistor, and the second current is received by the second bipolar transistor. The difference between the base-emitter junction voltages of the first and second bipolar transistors defines the voltage at which the n-type region is clamped. To start-up the circuit properly, current is withdrawn from the base (gate) terminals of the transistors disposed in the current mirror.
- In accordance with another embodiment, a clamping circuit includes a current mirror, as well as first, second, third and fourth bipolar transistors. The third and fourth bipolar transistors form a cross-coupled transistor pair. The current mirror receives a first current and supplies a second current in response. The first current is received by the first and third bipolar transistors. The second current is received by the second and fourth bipolar transistors. The emitter-base junction voltages of the first and second bipolar transistors together with the base-emitter junction voltages of the third and fourth transistors define the voltage at which the n-type region is clamped. A current source supplying a current to the first bipolar transistor ensures that the clamping circuit starts up properly.
- In accordance with another embodiment, a clamping circuit includes a current mirror, as well as first, second, third and fourth bipolar transistors. The third and fourth bipolar transistors form a cross-coupled transistor pair. The current mirror receives a first current and supplies a second current in response. The first current is received by the first and third bipolar transistors. The second current is received by a fifth transistor coupled to the first and third transistor and adapted to develop a base-emitter voltage substantially similar to the base-emitter voltage of the first and third transistors. The emitter-base junction voltages of the first and second bipolar transistors together with the base-emitter junction voltages of the third and fourth transistors define the voltage at which the n-type region is clamped. To start-up the circuit properly, current is withdrawn from the base (gate) terminals of the transistors disposed in the current mirror.
-
FIG. 1 is a schematic diagram of a circuit adapted to clamp the voltage applied to an n-type semiconductor region, as known in the prior art. -
FIG. 2 is a schematic diagram of a circuit adapted to clamp the voltage applied to an n-type semiconductor region, in accordance with one exemplary embodiment of the present invention. -
FIG. 3A is a cross-section of a substrate showing a number of different regions associated with the circuit ofFIG. 2 , in accordance with one exemplary embodiment of the present invention. -
FIG. 3B is a cross-section of a substrate showing a number of different regions associated with the circuit ofFIG. 2 , in accordance with another exemplary embodiment of the present invention. -
FIG. 4 is a schematic diagram of a circuit adapted to clamp the voltage applied to an n-type semiconductor region, in accordance with one exemplary embodiment of the present invention. -
FIG. 5 is a schematic diagram of a circuit adapted to clamp the voltage applied to an n-type semiconductor region, in accordance with one exemplary embodiment of the present invention. -
FIG. 6 is a schematic diagram of a circuit adapted to clamp the voltage applied to an n-type semiconductor region, in accordance with one exemplary embodiment of the present invention. - In accordance with the present invention, an n-type semiconductor region is clamped at or near the ground potential without the use of a Schottky transistor. Although the following description is provided with reference to bipolar transistors, it is understood that MOS transistors may also be used to clamp an n-type semiconductor region in accordance with the present invention.
-
FIG. 2 is a transistor schematic diagram of aclamping circuit 50 adapted to clamp n-type semiconductor region 20 to a known voltage, in accordance with one exemplary embodiment of the present invention.Clamping circuit 50 is shown as includingbipolar PNP transistors bipolar NPN transistors PNP transistors resistor 30 is disposed between the emitter terminal oftransistor 26 andnode 55 to which voltage VTest is applied. - As voltage VTest is pulled below the ground potential,
transistor 32 begins to draw a relatively small amount of current from the base terminals oftransistors clamping circuit 50 to start up properly. Becausetransistors transistor 26 to the collector current I28 oftransistor 28 is determined by the relative base-emitter areas oftransistors - Assume that the ratio of the base-emitter area of
transistor 22 totransistor 24 is X. The voltage received by n-type region 20 with respect to the ground potential is defined by the difference between the base-emitter regions oftransistors transistor 28 and VBE26 is the voltage across the base-emitter terminals oftransistor 26. Voltages VBE26 and VBE28 are related to currents I26 and I28 according to the following: -
VBE 28=(kT/q)*ln(I 28 /I 28) (1) -
VBE 26=(kT/q)*ln(I 26 /I 26) (2) -
VBE 28 −VBE 26=(kT/q)*ln(I 28 /I s28)−(kT/q)*ln(I 26 /I s26) (3) - where k is Boltzmann's constant (1.38×10−23), T is the temperature in Kelvin, q is the electron's charge, Is26 and Is28 are constant values, respectively defined by the transfer characteristics of
transistors - Equation (3) may be simplified as:
-
VBE 28 −VBE 26=(kT/q)*ln(X*(I s26 /I s28)) (4) - where Is26/Is28 is the ratio of the base-emitter areas of
transistors - Assume the area of
transistor 28 is Y times the area oftransistor 26. Since I28=X*I26, the voltage of region 20 is defined by the following: -
VBE 28 −VBE 26=(kT/q)*ln(X/Y) (5) - Since (kT/q) is constant for any given temperature, from equation (5) it is seen that the voltage of region 20 may be controlled by selecting the ratio of X and Y. For example, if X and Y are both selected to be equal to 1, the voltage of n-type region 20 with respect to ground may be set to zero. If Y is selected to be twice as large as X, the voltage of n-type region 20 with respect to ground may be set to (−18 mV) at room temperature. It is often desirable to set the clamp point slightly below ground to prevent the circuit from conducting current during a shutdown state.
- Current limiting
resistor 30 limits the amount of current I26 flowing throughtransistors -
I 26=((voltage of clamped region 20)−V test)/(R 30) - where R30 is the resistance of
resistor 30; this resistance is typically selected to be sufficiently large to keep the currents flowing throughtransistors -
PNP transistors Transistors Transistor 32 may be a parasitic NPN transistor that when selected to be a lateral NPN transistor may be formed by placing n-type region 20 in close proximity oftransistors transistors - Concurrent references are made below to
FIGS. 2 and 3A .FIG. 3A is a cross-sectional view of asemiconductor substrate 40 having formed therein a number of different regions associated withclamp circuit 50 ofFIG. 2 , in accordance with one exemplary embodiment of the present invention. N-type region 20 is assumed to be an epitaxial region that is clamped in accordance with one embodiment of the present invention. In the embodiment shown inFIG. 3A , it is assumed thattransistors 22 and 24 (seeFIG. 2 ) are not in the vicinity of n-type region 20. N-type region 56 andn+ region 46 is connected to the base terminals oftransistors transistor 32 ofFIG. 2 . P-type substrate region 40 and n-type region 20 respectively form the base and emitter regions oftransistor 32 ofFIG. 2 . - Concurrent references are made below to
FIGS. 2 and 3B .FIG. 3B is a cross-sectional view of asemiconductor substrate 70 having formed therein a number of different regions associated withclamp circuit 50 ofFIG. 2 , in accordance with another exemplary embodiment of the present invention. In this embodiment, n-type region 56 andn+ region 54 together are assumed to form the base region of transistor 24 (or 22), as well as the collector terminal oftransistor 32. P-type substrate region 40 and n-type region 20 respectively form the base and emitter regions oftransistor 32 ofFIG. 2 . -
FIG. 4 is a transistor schematic diagram of aclamping circuit 150 adapted to clamp n-type semiconductor region 20 to a known voltage, in accordance with another exemplary embodiment of the present invention. Clampingcircuit 150 is similar to clampingcircuit 50 except that in clampingcircuit 150,transistors transistors transistors -
FIG. 5 is a transistor schematic diagram of aclamping circuit 100 adapted to clamp n-region 40 to a known voltage, in accordance with another exemplary embodiment of the present invention. Clampingcircuit 100 is shown as includingbipolar PNP transistors bipolar NPN transistors PNP transistors transistors transistors resistor 156 is disposed between the emitter terminal oftransistor 150 andnode 55 to which voltage VTest is applied. - Current Itrickle supplied by
current source 54 is used to properly start up clampingcircuit 150. As described above,transistors transistors transistors type region 40 relative to the ground is defined by the following: -
VBE150+VBE146−VBE152−VBE148 (6) - where VBE150, VBE146, VBE152, and VBE148 represent the base-emitter voltages of
transistors - By selecting the ratio of the base-emitter areas of the various transistors shown in
FIG. 5 , the voltage at which n-type region 40 is clamped, is set to a desired value. N-type region 40 is clamped in accordance with the following expression: -
- where Is152, Is148, Is146, and Is150 are values respectively defined by the transfer characteristics of
transistors Cross-coupled transistors PNP transistors 142 144. Thecross-coupled transistors transistors current leg 155, andtransistors current leg 145. If the supply voltage VCC rises, early voltage effects cause a shift in the current ratio oftransistors transistors type region 40 is pulled further below the ground potential, the level of currents flowing through the base terminals oftransistors transistors transistors -
FIG. 6 is a transistor schematic diagram of aclamping circuit 200 adapted to clamp n-region 80 to a known voltage, in accordance with another exemplary embodiment of the present invention. Clampingcircuit 200 is shown as including, in part,bipolar PNP transistors bipolar NPN transistors Transistor 272, also disposed in clampingcircuit 200, may be a parasitic NPN transistor used to start upcircuit 200. The following description is provided with reference to setting the clamp voltage of n-region 80 to nearly 0 volts, i.e., the ground potential. It is understood, however, that the clamp voltage of n-region 80 may be selectively set to any other desired value by varying the ratio of the emitter-base areas of the various transistors shown incircuit 200 in a manner generally similar to that described above with respect toFIG. 2 . - Current limiting
resistor 276 is disposed between the emitter terminal oftransistor 262 andnode 55 to which voltage VTest is applied. As voltage VTest is pulled below the ground potential,transistor 272 is turned on, thereby pulling a relatively small amount of current out from the base terminals oftransistors circuit 200 starts up properly. -
Transistors transistors transistors transistor 268, namely VBE268, is substantially equal to the base-emitter voltage oftransistor 266, namely VBE266. Since the emitter terminals of bothtransistors - Because the emitter voltages of
transistors transistor 264 is substantially equal to current I3 flowing throughtransistor 260. Hence, neglecting base currents, because current I2 is equal to current I3, the base-emitter voltage oftransistor 266, i.e., VBE266 is substantially equal to the base-emitter voltage oftransistor 262, i.e., VBE262. Likewise, the base-emitter voltage oftransistor 264, i.e., VBE264 is substantially equal to the base-emitter voltage oftransistor 266. Accordingly: -
VBE268=VBE266=VBE264=VBE260=VBE262 (8) - As seen from
FIG. 5 , the voltage at n-type region 80 is defined by the following expression: -
VBE266+VBE260−VBE264−VBE262 (9) - Since the base-emitter voltages of
transistors type region 80 is nearly equal to zero. As described above, by varying the ratio of the emitter-base areas of the transistors shown incircuit 100, the voltage at which n-type region 80 is clamped, may be selectively set to any other desired value. N-type region 80 is clamped in accordance with the following expression: -
- where Is265, Is262, Is266, and Is260 are values respectively defined by the transfer characteristics of
transistors - The above embodiments of the present invention are illustrative and not limiting. Various alternatives and equivalents are possible. The invention is not limited by the type of transistors or integrated circuits in which the present invention may be disposed. Nor is the disclosure limited to any specific type of process technology, e.g., CMOS, Bipolar, or BICMOS that may be used to manufacture the present disclosure. Other additions, subtractions or modifications are obvious in view of the present disclosure and are intended to fall within the scope of the appended claims.
Claims (38)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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US12/033,600 US20090121770A1 (en) | 2007-03-29 | 2008-02-19 | Method for clamping a semiconductor region at or near ground |
PCT/US2008/058039 WO2008121597A1 (en) | 2007-03-29 | 2008-03-24 | Method for clamping a semiconductor region at or near ground |
TW097111088A TWI431456B (en) | 2007-03-29 | 2008-03-27 | Clamping circuit and method for controlling a clamp voltage of a semiconductor region in a semiconductor substrate |
US13/178,302 US8159278B2 (en) | 2007-03-29 | 2011-07-07 | Method for clamping a semiconductor region at or near ground |
Applications Claiming Priority (2)
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US90892207P | 2007-03-29 | 2007-03-29 | |
US12/033,600 US20090121770A1 (en) | 2007-03-29 | 2008-02-19 | Method for clamping a semiconductor region at or near ground |
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US13/178,302 Continuation US8159278B2 (en) | 2007-03-29 | 2011-07-07 | Method for clamping a semiconductor region at or near ground |
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US12/033,600 Abandoned US20090121770A1 (en) | 2007-03-29 | 2008-02-19 | Method for clamping a semiconductor region at or near ground |
US13/178,302 Active US8159278B2 (en) | 2007-03-29 | 2011-07-07 | Method for clamping a semiconductor region at or near ground |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/178,302 Active US8159278B2 (en) | 2007-03-29 | 2011-07-07 | Method for clamping a semiconductor region at or near ground |
Country Status (3)
Country | Link |
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US (2) | US20090121770A1 (en) |
TW (1) | TWI431456B (en) |
WO (1) | WO2008121597A1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120043952A1 (en) * | 2010-08-23 | 2012-02-23 | Mitsumi Electric Co., Ltd. | Semiconductor integrated circuit, switching power supply, and control system |
WO2013015829A1 (en) * | 2011-07-28 | 2013-01-31 | Dorfan David Elliot | Precision voltage clamp with very low temperature drift |
CN107203241A (en) * | 2017-05-30 | 2017-09-26 | 长沙方星腾电子科技有限公司 | A kind of bias current generating circuit |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8446203B1 (en) * | 2012-05-29 | 2013-05-21 | Linear Technology Corporation | Current controlled fast low-side clamp |
US9722419B2 (en) * | 2014-12-02 | 2017-08-01 | Nxp Usa, Inc. | Electrostatic discharge protection |
US10177564B2 (en) | 2015-09-25 | 2019-01-08 | Nxp Usa, Inc. | Hot plugging protection |
US10497780B2 (en) * | 2018-04-27 | 2019-12-03 | Semiconductor Components Industries, Llc | Circuit and an electronic device including a transistor and a component and a process of forming the same |
US11307604B2 (en) * | 2020-01-27 | 2022-04-19 | Qualcomm Incorporated | Clamp circuit |
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JPH07147532A (en) * | 1993-11-24 | 1995-06-06 | Fujitsu Ten Ltd | Negative surge clamping circuit |
JP2003198298A (en) * | 2001-12-26 | 2003-07-11 | Mitsumi Electric Co Ltd | Clamp circuit |
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US7760004B2 (en) * | 2008-10-30 | 2010-07-20 | Analog Devices, Inc. | Clamp networks to insure operation of integrated circuit chips |
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2008
- 2008-02-19 US US12/033,600 patent/US20090121770A1/en not_active Abandoned
- 2008-03-24 WO PCT/US2008/058039 patent/WO2008121597A1/en active Application Filing
- 2008-03-27 TW TW097111088A patent/TWI431456B/en active
-
2011
- 2011-07-07 US US13/178,302 patent/US8159278B2/en active Active
Patent Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
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US3704383A (en) * | 1971-12-03 | 1972-11-28 | Bell Telephone Labor Inc | Transistor-transistor logic clipping circuit |
US4027177A (en) * | 1975-03-05 | 1977-05-31 | Motorola, Inc. | Clamping circuit |
US4475077A (en) * | 1981-12-11 | 1984-10-02 | Tokyo Shibaura Denki Kabushiki Kaisha | Current control circuit |
US4704654A (en) * | 1984-02-08 | 1987-11-03 | Robert Bosch Gmbh | Over-voltage protective circuit for semiconductor network |
US4831323A (en) * | 1985-12-19 | 1989-05-16 | Sgs Halbleiter-Bauelemente Gmbh | Voltage limiting circuit |
US4926073A (en) * | 1989-05-01 | 1990-05-15 | Motorola Inc. | Negative voltage clamp |
US5073732A (en) * | 1989-10-27 | 1991-12-17 | U.S. Philips Corporation | Limiter circuit for alternating voltages |
US5121004A (en) * | 1991-08-09 | 1992-06-09 | Delco Electronics Corporation | Input buffer with temperature compensated hysteresis and thresholds, including negative input voltage protection |
US5404096A (en) * | 1993-06-17 | 1995-04-04 | Texas Instruments Incorporated | Switchable, uninterruptible reference generator with low bias current |
US5399914A (en) * | 1993-10-18 | 1995-03-21 | Allegro Microsystems, Inc. | High ratio current source |
US5966006A (en) * | 1996-12-31 | 1999-10-12 | Sgs-Thomson Microelectronic S.A. | Voltage regulator generating a predetermined temperature-stable voltage |
US5910737A (en) * | 1997-06-30 | 1999-06-08 | Delco Electronics Corporation | Input buffer circuit with differential input thresholds operable with high common mode input voltages |
US6137278A (en) * | 1998-05-15 | 2000-10-24 | Siemens Aktiengesellschaft | Clamping circuit |
US6281735B1 (en) * | 1999-09-09 | 2001-08-28 | National Semiconductor Corporation | Voltage clamping circuits for limiting the voltage range of an input signal |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120043952A1 (en) * | 2010-08-23 | 2012-02-23 | Mitsumi Electric Co., Ltd. | Semiconductor integrated circuit, switching power supply, and control system |
US8674677B2 (en) * | 2010-08-23 | 2014-03-18 | Mitsumi Electric Co., Ltd. | Semiconductor integrated circuit, switching power supply, and control system |
WO2013015829A1 (en) * | 2011-07-28 | 2013-01-31 | Dorfan David Elliot | Precision voltage clamp with very low temperature drift |
CN107203241A (en) * | 2017-05-30 | 2017-09-26 | 长沙方星腾电子科技有限公司 | A kind of bias current generating circuit |
Also Published As
Publication number | Publication date |
---|---|
US20120007649A1 (en) | 2012-01-12 |
TW200907630A (en) | 2009-02-16 |
WO2008121597A1 (en) | 2008-10-09 |
US8159278B2 (en) | 2012-04-17 |
TWI431456B (en) | 2014-03-21 |
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