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TWM619828U - Atomic layer deposition device for blowing powder - Google Patents

Atomic layer deposition device for blowing powder Download PDF

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Publication number
TWM619828U
TWM619828U TW110204615U TW110204615U TWM619828U TW M619828 U TWM619828 U TW M619828U TW 110204615 U TW110204615 U TW 110204615U TW 110204615 U TW110204615 U TW 110204615U TW M619828 U TWM619828 U TW M619828U
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reaction space
tube body
inner tube
vacuum chamber
space
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TW110204615U
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Chinese (zh)
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林俊成
張容華
古家誠
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天虹科技股份有限公司
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Abstract

本新型提供一種用以吹動粉末的原子層沉積裝置,主要包括一真空腔體、一軸封裝置及一驅動單元,其中驅動單元透過軸封裝置帶動真空腔體轉動。軸封裝置包括一外管體及一內管體,其中內管體由外管體的容置空間延伸至真空腔體的反應空間,並在反應空間內形成一凸出管部。至少一抽氣管線及至少一進氣管線位於內管體內,其中進氣管線穿過凸出管壁的管壁,並由內管體延伸至反應空間。延伸管壁包括複數個出風口朝向反應空間下半部的表面,並用以將一非反應氣體輸送至反應空間,以吹動反應空間內的粉末。 The present model provides an atomic layer deposition device for blowing powder, which mainly includes a vacuum chamber, a shaft sealing device and a driving unit, wherein the driving unit drives the vacuum chamber to rotate through the shaft sealing device. The shaft sealing device includes an outer tube body and an inner tube body, wherein the inner tube body extends from the accommodating space of the outer tube body to the reaction space of the vacuum cavity, and forms a protruding tube part in the reaction space. At least one air extraction line and at least one air intake line are located in the inner tube body, wherein the air intake line passes through the tube wall protruding from the tube wall and extends from the inner tube body to the reaction space. The extension tube wall includes a plurality of air outlets facing the surface of the lower half of the reaction space, and is used for conveying a non-reactive gas to the reaction space to blow the powder in the reaction space.

Description

用以吹動粉末的原子層沉積裝置 Atomic layer deposition device for blowing powder

本新型有關於一種用以吹動粉末的原子層沉積裝置,其中至少一延伸管線由軸封裝置延伸至真空腔體的反應空間內,並透過延伸管線的複數個出風口將一非反應氣體輸送至反應空間,以吹動反應空間內的粉末。 The invention relates to an atomic layer deposition device for blowing powder, in which at least one extension pipeline is extended from a shaft seal device to the reaction space of a vacuum chamber, and a non-reactive gas is transported through a plurality of air outlets of the extension pipeline To the reaction space to blow the powder in the reaction space.

奈米顆粒(nanoparticle)一般被定義為在至少一個維度上小於100奈米的顆粒,奈米顆粒與宏觀物質在物理及化學上的特性截然不同。一般而言,宏觀物質的物理特性與本身的尺寸無關,但奈米顆粒則非如此,奈米顆粒在生物醫學、光學和電子等領域都具有潛在的應用。 Nanoparticles are generally defined as particles smaller than 100 nanometers in at least one dimension. Nanoparticles and macroscopic substances have completely different physical and chemical properties. Generally speaking, the physical properties of macroscopic matter have nothing to do with its size, but nanoparticle is not the case. Nanoparticles have potential applications in the fields of biomedicine, optics, and electronics.

量子點(Quantum Dot)是半導體的奈米顆粒,目前研究的半導體材料為II-VI材料,如ZnS、CdS、CdSe等,其中又以CdSe最受到矚目。量子點的尺寸通常在2至50奈米之間,量子點被紫外線照射後,量子點中的電子會吸收能量,並從價帶躍遷到傳導帶。被激發的電子從傳導帶回到價帶時,會通過發光釋放出能量。 Quantum dots (Quantum Dot) are semiconductor nano-particles. The semiconductor materials currently studied are II-VI materials, such as ZnS, CdS, CdSe, etc., of which CdSe has attracted the most attention. The size of quantum dots is usually between 2 and 50 nanometers. After the quantum dots are irradiated with ultraviolet light, the electrons in the quantum dots absorb energy and transition from the valence band to the conduction band. When the excited electron returns from the conduction band to the valence band, it releases energy through light emission.

量子點的能隙與尺寸大小相關,量子點的尺寸越大能隙越小,經照射後會發出波長較長的光,量子點的尺寸越小則能隙越大,經照射後會發出波長較短的光。例如5到6奈米的量子點會發出橘光或紅光,而2到3奈米的量子點則會發出藍光或綠光,當然光色取決於量子點的材料組成。 The energy gap of a quantum dot is related to the size. The larger the size of the quantum dot, the smaller the energy gap, and will emit light with a longer wavelength after irradiation. The smaller the size of the quantum dot, the larger the energy gap, and the wavelength will be emitted after irradiation. Shorter light. For example, quantum dots of 5 to 6 nanometers will emit orange or red light, while quantum dots of 2 to 3 nanometers will emit blue or green light. Of course, the light color depends on the material composition of the quantum dots.

應用量子點的發光二極體(LED)產生的光可接近連續光譜,同時具有高演色性,並有利於提高發光二極體的發光品質。此外亦可透過改變量子點的尺寸調整發射光的波長,使得量子點成為新一代發光裝置及顯示器的發展重點。 Light-emitting diodes (LEDs) using quantum dots produce light that can be close to a continuous spectrum, have high color rendering properties, and help improve the luminous quality of the light-emitting diodes. In addition, the wavelength of the emitted light can be adjusted by changing the size of the quantum dots, making the quantum dots the focus of the development of a new generation of light-emitting devices and displays.

量子點雖然具有上述的優點及特性,但在應用或製造的過程中容易產生團聚現象。此外量子點具有較高的表面活性,並容易與空氣及水氣發生反應,進而縮短量子點的壽命。 Although quantum dots have the above-mentioned advantages and characteristics, they are prone to agglomeration during the application or manufacturing process. In addition, quantum dots have high surface activity and are easy to react with air and water vapor, thereby shortening the lifespan of quantum dots.

具體來說,將量子點製作成為發光二極體的密封膠時,可能會產生團聚效應,而降低了量子點的光學性能。此外,量子點在製作成發光二極體的密封膠後,外界的氧或水氣仍可能會穿過密封膠而接觸量子點的表面,導致量子點氧化,並影響量子點及發光二極體的效能或使用壽命。量子點的表面缺陷及懸空鍵(dangling bonds)亦可能造成非輻射復合(nonradiative recombination),同樣會影響量子點的發光效率。 Specifically, when the quantum dots are made into a sealant for light-emitting diodes, agglomeration effect may occur, which reduces the optical performance of the quantum dots. In addition, after quantum dots are made into the sealant of light-emitting diodes, external oxygen or water vapor may still pass through the sealant and contact the surface of the quantum dots, causing the quantum dots to oxidize and affect the quantum dots and light-emitting diodes. The performance or service life of the product. Surface defects and dangling bonds of quantum dots may also cause nonradiative recombination, which also affects the luminous efficiency of quantum dots.

目前業界主要透過原子層沉積(atomic layer deposition,ALD)在量子點的表面形成一層奈米厚度的薄膜,或者是在量子點的表面形成多層薄膜,以形成量子井結構。 At present, the industry mainly uses atomic layer deposition (ALD) to form a nanometer-thick film on the surface of quantum dots, or form multiple layers of thin films on the surface of quantum dots to form a quantum well structure.

原子層沉積可以在基板上形成厚度均勻的薄膜,並可有效控制薄膜的厚度,理論上亦適用於三維的量子點。量子點靜置在承載盤時,相鄰的量子點之間會存在接觸點,使得原子層沉積的前驅物無法接觸這些接觸點,並導致無法在所有的奈米顆粒的表面皆形成厚度均勻的薄膜。 Atomic layer deposition can form a thin film with uniform thickness on the substrate and can effectively control the thickness of the thin film. In theory, it is also suitable for three-dimensional quantum dots. When the quantum dots are placed on the carrier plate, there will be contact points between adjacent quantum dots, so that the precursors of atomic layer deposition cannot contact these contact points, and it is impossible to form a uniform thickness on the surface of all nano particles. film.

為了解決上述先前技術面臨的問題,本新型提出一種用以吹動粉末的原子層沉積裝置,主要將至少一進氣管線由軸封裝置延伸至真空腔體的反應空間內,並於反應空間內形成一延伸管線。延伸管線包括複數個朝向反應空間一表面的出風口,並透過延伸管線的複數個出風口輸出非反應氣體吹動反應空間內的粉末,以利於在各個粉末的表面上形成厚度均勻的薄膜。 In order to solve the above-mentioned problems faced by the prior art, the present invention proposes an atomic layer deposition device for blowing powder, which mainly extends at least one gas inlet line from the shaft seal device to the reaction space of the vacuum chamber, and in the reaction space An extension pipeline is formed. The extension pipeline includes a plurality of air outlets facing a surface of the reaction space, and the non-reactive gas is output through the plurality of air outlets of the extension pipeline to blow the powder in the reaction space to facilitate the formation of a uniform thickness film on the surface of each powder.

本新型的一目的,在於提供一種用以吹動粉末的原子層沉積裝置,主要包括一驅動單元、一軸封裝置及一真空腔體,其中驅動單元透過軸封裝置連接並驅動真空腔體轉動。軸封裝置包括一外管體及一內管體,其中內管體設置在外管體的一容置空間內,並將至少一抽氣管線及至少一進氣管線設置在內管體內。抽氣管線用以將真空腔體內的氣體抽出,而進氣管線則用以將一非反應氣體及/或一前驅物氣體輸送至反應空間內。 An object of the present invention is to provide an atomic layer deposition device for blowing powder, which mainly includes a driving unit, a shaft sealing device and a vacuum chamber, wherein the driving unit is connected through the shaft sealing device and drives the vacuum chamber to rotate. The shaft sealing device includes an outer tube body and an inner tube body, wherein the inner tube body is arranged in an accommodating space of the outer tube body, and at least one air suction pipeline and at least one air inlet pipeline are arranged in the inner tube body. The air extraction line is used to extract the gas in the vacuum chamber, and the air intake line is used to transport a non-reactive gas and/or a precursor gas into the reaction space.

過濾單元設置在內管體連接反應空間的一側,而進氣管線穿過過濾單元,並由內管體延伸至反應空間內,以在反應空間內形成一延伸管線。延伸管線靠近反應空間下半部的表面,並包括複數個出風口,其中延伸管線經由複數個出風口將非反應氣體吹向反應空間下半部的表面,以吹動反應空間內的粉末。 The filter unit is arranged on one side of the inner tube body connected to the reaction space, and the air inlet line passes through the filter unit and extends from the inner tube body into the reaction space to form an extended pipeline in the reaction space. The extension pipeline is close to the surface of the lower half of the reaction space and includes a plurality of air outlets, wherein the extension pipeline blows the non-reactive gas to the surface of the lower half of the reaction space through the plurality of air outlets to blow the powder in the reaction space.

本新型的一目的,在於提供一種用以吹動粉末的原子層沉積裝置,主要包括一驅動單元、一軸封裝置及一真空腔體,其中驅動單元透過軸封裝置連接並驅動真空腔體轉動。軸封裝置包括一外管體及一內管體,其中內管體由外管體的一容置空間延伸至真空腔體的一反應空間,並在反應空間內形成一凸出管部。 An object of the present invention is to provide an atomic layer deposition device for blowing powder, which mainly includes a driving unit, a shaft sealing device and a vacuum chamber, wherein the driving unit is connected through the shaft sealing device and drives the vacuum chamber to rotate. The shaft sealing device includes an outer tube body and an inner tube body, wherein the inner tube body extends from an accommodating space of the outer tube body to a reaction space of the vacuum chamber, and a protruding tube portion is formed in the reaction space.

至少一抽氣管線及至少一進氣管線設置在內管體內,其中進氣管線經由凸出管部的一管壁延伸至反應空間內,並在反應空間內形成一延伸管線。延伸管線靠近反應空間下半部的表面,並包括複數個出風口,其中延伸管線經由複數個出風口將非反應氣體吹向反應空間下半部的表面,以吹動反應空間內的粉末。 At least one gas extraction pipeline and at least one gas inlet pipeline are arranged in the inner tube body, wherein the gas inlet pipeline extends into the reaction space through a tube wall of the protruding tube part, and forms an extension pipeline in the reaction space. The extension pipeline is close to the surface of the lower half of the reaction space and includes a plurality of air outlets, wherein the extension pipeline blows the non-reactive gas to the surface of the lower half of the reaction space through the plurality of air outlets to blow the powder in the reaction space.

本新型的一目的,在於提供一種用以吹動粉末的原子層沉積裝置,軸封裝置的內管體由外管體的容置空間延伸至真空腔體的反應空間,並在反應空間內形成一凸出管部。凸出管部的管壁上設置複數個出風口,其中出風口朝向真空腔體下半部的表面。位於內管體內的進氣管線並未延伸至反應空間,而是流體連接內管體管壁上的複數個出風口,並經由複數個出風口將非反應氣體朝反應空間下半部的表面吹送,以利於吹動反應空間內的粉末。 One purpose of the present invention is to provide an atomic layer deposition device for blowing powder. The inner tube of the shaft seal device extends from the accommodating space of the outer tube to the reaction space of the vacuum chamber, and is formed in the reaction space. One protruding tube. A plurality of air outlets are arranged on the pipe wall of the protruding pipe part, and the air outlets face the surface of the lower half of the vacuum cavity. The air inlet pipeline located in the inner tube does not extend to the reaction space, but is fluidly connected to a plurality of air outlets on the wall of the inner tube, and the non-reactive gas is blown toward the surface of the lower half of the reaction space through the plurality of air outlets , In order to facilitate blowing the powder in the reaction space.

為了達到上述的目的,本新型提出一種用以吹動粉末的原子層沉積裝置,包括:一真空腔體,包括一反應空間用以容置複數個粉末;一軸封裝置,包括一外管體及一內管體,其中外管體具有一容置空間,用以容置內管體,其中內管體由外管體的容置空間延伸至真空腔體的反應空間,並在反應空間內形成一凸出管部;一驅動單元,透過軸封裝置的外管體連接真空腔體,並經由外管體帶動真空腔體轉動;至少一抽氣管線,位於內管體內,流體連接真空腔體的反應空間,並用以抽出反應空間內的一氣體;及至少一進氣管線,穿過凸出管部的一管壁,由內管體延伸至反應空間內,並在反應空間內形成一延伸管線,其中延伸管線包括複數個出風口朝向反 應空間的一側面,延伸管線經由複數個出風口朝反應空間的側面的方向吹出一非反應氣體,以吹動反應空間內的粉末。 In order to achieve the above objective, the present invention proposes an atomic layer deposition device for blowing powder, including: a vacuum chamber, including a reaction space for accommodating a plurality of powder; a shaft sealing device, including an outer tube and An inner tube body, wherein the outer tube body has an accommodating space for accommodating the inner tube body, wherein the inner tube body extends from the accommodating space of the outer tube body to the reaction space of the vacuum chamber, and is formed in the reaction space A protruding tube; a driving unit, which is connected to the vacuum chamber through the outer tube body of the shaft seal device, and drives the vacuum chamber to rotate through the outer tube body; at least one suction line is located in the inner tube body and is fluidly connected to the vacuum chamber body The reaction space is used to extract a gas in the reaction space; and at least one gas inlet line passes through a tube wall of the protruding tube portion, extends from the inner tube body to the reaction space, and forms an extension in the reaction space Pipeline, where the extension pipeline includes a plurality of air outlets facing opposite On one side of the reaction space, the extension pipeline blows a non-reactive gas toward the side of the reaction space through a plurality of air outlets to blow the powder in the reaction space.

本新型提出另一種用以吹動粉末的原子層沉積裝置,包括:一真空腔體,包括一反應空間用以容置複數個粉末;一軸封裝置,包括一外管體及一內管體,其中外管體具有一容置空間,用以容置內管體;一過濾單元,位於內管體連接反應空間的一側;一驅動單元,透過軸封裝置的外管體連接真空腔體,並經由外管體帶動真空腔體轉動;至少一抽氣管線,位於內管體內,經由過濾單元流體連接真空腔體的反應空間,並用以抽出反應空間內的一氣體;及至少一進氣管線,位於內管體內,穿過過濾單元由內管體延伸至反應空間內,並在反應空間內形成一延伸管線,其中延伸管線包括複數個出風口朝向反應空間的一側面,延伸管線經由複數個出風口朝反應空間的側面的方向吹送一非反應氣體,以吹動反應空間內的粉末。 The present invention proposes another atomic layer deposition device for blowing powder, including: a vacuum chamber, including a reaction space for accommodating a plurality of powders; a shaft sealing device, including an outer tube body and an inner tube body, The outer tube body has an accommodating space for accommodating the inner tube body; a filter unit located on the side where the inner tube body is connected to the reaction space; a driving unit connected to the vacuum chamber through the outer tube body of the shaft seal device, The vacuum chamber is driven to rotate through the outer tube; at least one air extraction line is located in the inner tube and is fluidly connected to the reaction space of the vacuum chamber through the filter unit, and is used to extract a gas in the reaction space; and at least one air inlet line , Located in the inner tube body, extending through the filter unit from the inner tube body to the reaction space, and forming an extension pipeline in the reaction space, wherein the extension pipeline includes a plurality of air outlets facing one side of the reaction space, and the extension pipeline passes through a plurality of The air outlet blows a non-reactive gas toward the side of the reaction space to blow the powder in the reaction space.

本新型還提出另一種用以吹動粉末的原子層沉積裝置,包括:一真空腔體,包括一反應空間用以容置複數個粉末;一軸封裝置,包括一外管體及一內管體,其中外管體具有一容置空間,用以容置內管體,而內管體由外管體的容置空間延伸至真空腔體的反應空間,並在反應空間內形成一凸出管部,其中凸出管部包括複數個出風口,穿過凸出管部的一管壁,並朝向反應空間的一側面的方向;一驅動單元,透過軸封裝置的外管體連接真空腔體,並經由外管體帶動真空腔體轉動;至少一抽氣管線,位於內管體內,流體連接真空腔體的反應空間,並用以抽出反應空間內的一氣體;及至少一進氣管線,位於內管體及凸出管部內,流體連接複數個出風口, 並經由複數個出風口將一非反應氣體朝反應空間的側面的方向吹送,以吹動反應空間內的粉末。 The present invention also proposes another atomic layer deposition device for blowing powder, including: a vacuum chamber, including a reaction space for accommodating a plurality of powders; a shaft sealing device, including an outer tube body and an inner tube body , Wherein the outer tube body has an accommodating space for accommodating the inner tube body, and the inner tube body extends from the accommodating space of the outer tube body to the reaction space of the vacuum chamber, and a protruding tube is formed in the reaction space Part, wherein the protruding tube part includes a plurality of air outlets, passing through a tube wall of the protruding tube part, and facing the direction of one side of the reaction space; a driving unit connected to the vacuum chamber through the outer tube body of the shaft sealing device , And drive the vacuum chamber to rotate through the outer tube; at least one gas extraction pipeline located in the inner tube, fluidly connected to the reaction space of the vacuum chamber, and used to extract a gas in the reaction space; and at least one gas inlet pipeline located in the In the inner tube body and the protruding tube part, a plurality of air outlets are fluidly connected, A non-reactive gas is blown toward the side of the reaction space through a plurality of air outlets to blow the powder in the reaction space.

所述的用以吹動粉末的原子層沉積裝置,其中延伸管線的複數個出風口朝向反應空間的下半部的側面。 In the atomic layer deposition device for blowing powder, the plurality of air outlets of the extension pipeline face the side surface of the lower half of the reaction space.

所述的用以吹動粉末的原子層沉積裝置,其中反應空間為一柱狀體,包括兩個底面及側面,側面連接兩個底面,而延伸管線朝向反應空間的底面及側面的方向延伸。 In the atomic layer deposition device for blowing powder, the reaction space is a columnar body, including two bottom surfaces and side surfaces, the side surfaces connect the two bottom surfaces, and the extension pipeline extends toward the bottom surface and the side surface of the reaction space.

所述的用以吹動粉末的原子層沉積裝置,其中進氣管線包括至少一非反應氣體輸送管線,非反應氣體輸送管線由內管體延伸至反應空間內並形成延伸管線。 In the atomic layer deposition device for blowing powder, the gas inlet pipeline includes at least one non-reactive gas delivery pipeline, and the non-reactive gas delivery pipeline extends from the inner tube body into the reaction space to form an extension pipeline.

所述的用以吹動粉末的原子層沉積裝置,包括一過濾單元位於內管體連接反應空間的一側。 The atomic layer deposition device for blowing powder includes a filter unit located on the side of the inner tube body connected to the reaction space.

所述的用以吹動粉末的原子層沉積裝置,其中內管體由外管體的容置空間延伸至真空腔體的反應空間,並在反應空間內形成一凸出管部,而過濾單元則位於凸出管部連接反應空間的一側。 In the atomic layer deposition device for blowing powder, the inner tube extends from the accommodating space of the outer tube to the reaction space of the vacuum chamber, and a protruding tube is formed in the reaction space, and the filter unit It is located on the side where the protruding pipe part is connected to the reaction space.

10:用以吹動粉末的原子層沉積裝置 10: Atomic layer deposition device for blowing powder

11:真空腔體 11: Vacuum chamber

111:蓋板 111: cover

1111:內表面 1111: inner surface

113:腔體 113: Cavity

115:監控晶圓 115: monitor wafer

12:反應空間 12: reaction space

121:粉末 121: powder

122:底面 122: Bottom

124:側面 124: Side

13:軸封裝置 13: Shaft seal device

130:凸出管部 130: protruding tube

131:外管體 131: Outer tube body

132:容置空間 132: accommodating space

133:內管體 133: inner tube body

1331:出風口 1331: air outlet

134:連接空間 134: Connecting Space

139:過濾單元 139: filter unit

14:齒輪 14: Gear

15:驅動單元 15: drive unit

16:加熱裝置 16: heating device

171:抽氣管線 171: Extraction line

172:延伸管線 172: Extension pipeline

1721:出風口 1721: air outlet

173:進氣管線 173: intake line

175:非反應氣體輸送管線 175: Non-reactive gas pipeline

177:加熱器 177: heater

179:溫度感測單元 179: temperature sensing unit

191:承載板 191: Carrier Board

193:固定架 193: fixed frame

195:連接軸 195: connecting shaft

[圖1]為本新型用以吹動粉末的原子層沉積裝置一實施例的立體示意圖。 [Figure 1] is a three-dimensional schematic diagram of an embodiment of a new type of atomic layer deposition apparatus for blowing powder.

[圖2]為本新型用以吹動粉末的原子層沉積裝置一實施例的剖面示意圖。 [Figure 2] is a schematic cross-sectional view of an embodiment of a new type of atomic layer deposition apparatus for blowing powder.

[圖3]為本新型用以吹動粉末的原子層沉積裝置的軸封裝置一實施例的剖面示意圖。 [Figure 3] is a schematic cross-sectional view of an embodiment of a shaft sealing device of a novel atomic layer deposition device for blowing powder.

[圖4]為本新型用以吹動粉末的原子層沉積裝置又一實施例的剖面示意圖。 [Figure 4] is a schematic cross-sectional view of another embodiment of the new type of atomic layer deposition apparatus for blowing powder.

[圖5]為本新型用以吹動粉末的原子層沉積裝置又一實施例的剖面示意圖。 [Figure 5] is a schematic cross-sectional view of another embodiment of the new type of atomic layer deposition apparatus for blowing powder.

[圖6]為本新型用以吹動粉末的原子層沉積裝置又一實施例的剖面示意圖。 [Figure 6] is a schematic cross-sectional view of another embodiment of the new type of atomic layer deposition apparatus for blowing powder.

[圖7]為本新型用以吹動粉末的原子層沉積裝置又一實施例的剖面示意圖。 [Figure 7] is a schematic cross-sectional view of another embodiment of the new type of atomic layer deposition apparatus for blowing powder.

請參閱圖1、圖2及圖3,分別為本新型用以吹動粉末的原子層沉積裝置一實施例的立體示意圖、剖面示意圖及用以吹動粉末的原子層沉積裝置的軸封裝置一實施例的剖面示意圖。如圖所示,用以吹動粉末的原子層沉積裝置10主要包括一真空腔體11、一軸封裝置13及一驅動單元15,其中驅動單元15透過軸封裝置13連接真空腔體11,並帶動真空腔體11轉動。 Please refer to Figure 1, Figure 2 and Figure 3, which are respectively a three-dimensional schematic diagram, a cross-sectional schematic diagram of an embodiment of a novel atomic layer deposition device for blowing powder, and a shaft sealing device of the atomic layer deposition device for blowing powder A schematic cross-sectional view of an embodiment. As shown in the figure, the atomic layer deposition apparatus 10 for blowing powder mainly includes a vacuum chamber 11, a shaft sealing device 13 and a driving unit 15. The driving unit 15 is connected to the vacuum chamber 11 through the shaft sealing device 13, and Drive the vacuum chamber 11 to rotate.

真空腔體11內具有一反應空間12,用以容置複數個粉末121,其中粉末121可以是量子點(Quantum Dot),例如ZnS、CdS、CdSe等II-VI半導體材料,而形成在量子點上的薄膜可以是三氧化二鋁(Al2O3)。真空腔體11可包括一蓋板111及一腔體113,其中蓋板111的一內表面1111用以覆蓋腔體113,並在兩者之間形成反應空間12。 The vacuum cavity 11 has a reaction space 12 for accommodating a plurality of powders 121. The powders 121 can be Quantum Dots, such as II-VI semiconductor materials such as ZnS, CdS, CdSe, etc., and are formed on the quantum dots. The above film can be aluminum oxide (Al2O3). The vacuum chamber 11 may include a cover 111 and a cavity 113, wherein an inner surface 1111 of the cover 111 is used to cover the cavity 113, and a reaction space 12 is formed between the two.

在本新型一實施例中,可於蓋板111的內表面1111設置一監控晶圓115,當蓋板111覆蓋腔體113時,監控晶圓115會位於反應空間12內。在反應空間12內進行原子層沉積時,監控晶圓115的表面會形成薄膜。在實際應用時可進一步量測監控晶圓115表面的薄膜厚度與粉末121表面的薄膜厚度,並計算出兩者之間的關係。而後便可透過量測監控晶圓115表面的薄膜厚度,換算出粉末121表面的薄膜厚度。 In an embodiment of the present invention, a monitoring wafer 115 may be disposed on the inner surface 1111 of the cover 111, and when the cover 111 covers the cavity 113, the monitoring wafer 115 will be located in the reaction space 12. When atomic layer deposition is performed in the reaction space 12, a thin film is formed on the surface of the monitoring wafer 115. In practical applications, the film thickness on the surface of the monitoring wafer 115 and the film thickness on the surface of the powder 121 can be further measured, and the relationship between the two can be calculated. Then, the film thickness on the surface of the monitoring wafer 115 can be measured to calculate the film thickness on the surface of the powder 121.

軸封裝置13包括一外管體131及一內管體133,其中外管體131具有一容置空間132,而內管體133則具有一連接空間134,例如外管體131及內管體133可為空心柱狀體。外管體131的容置空間132用以容置內管體133,其中外管體131及內管體133同軸設置。軸封裝置13可以是一般常見的軸封或磁流體軸封,主要用以隔離真空腔體11的反應空間12與外部的空間,以維持反應空間12的真空。 The shaft sealing device 13 includes an outer tube body 131 and an inner tube body 133. The outer tube body 131 has a accommodating space 132, and the inner tube body 133 has a connecting space 134, such as the outer tube body 131 and the inner tube body. 133 can be a hollow cylinder. The accommodating space 132 of the outer tube body 131 is used for accommodating the inner tube body 133, wherein the outer tube body 131 and the inner tube body 133 are coaxially arranged. The shaft seal device 13 may be a common shaft seal or a magnetic fluid shaft seal, and is mainly used to isolate the reaction space 12 of the vacuum chamber 11 from the external space, so as to maintain the vacuum of the reaction space 12.

驅動單元15連接軸封裝置13的一端,並透過軸封裝置13帶動真空腔體11轉動,例如透過外管體131連接真空腔體11,並透過外管體131帶動真空腔體11轉動。此外驅動單元15並未連接內管體133,因此驅動單元15帶動外管體131及真空腔體11轉動時,內管體133不會隨著轉動。 The driving unit 15 is connected to one end of the shaft sealing device 13, and drives the vacuum chamber 11 to rotate through the shaft sealing device 13, for example, connects to the vacuum chamber 11 through the outer tube body 131, and drives the vacuum chamber 11 to rotate through the outer tube body 131. In addition, the driving unit 15 is not connected to the inner tube body 133, so when the driving unit 15 drives the outer tube body 131 and the vacuum chamber 11 to rotate, the inner tube body 133 will not rotate with it.

驅動單元15可帶動外管體131及真空腔體11以同一方向持續轉動,例如順時針或逆時針方向持續轉動。在不同實施例中,驅動單元15可帶動外管體131及真空腔體11以順時針的方向旋轉一特定角度後,再以逆時針的方向旋轉特定角度,例如特定角度可為360度。真空腔體11轉動時,會攪拌反應空間12內的粉末121,以利於粉末121均勻受熱並與前驅物或非反應氣體接觸。 The driving unit 15 can drive the outer tube body 131 and the vacuum chamber 11 to continuously rotate in the same direction, for example, clockwise or counterclockwise to continuously rotate. In different embodiments, the driving unit 15 can drive the outer tube body 131 and the vacuum chamber 11 to rotate a specific angle in a clockwise direction, and then rotate a specific angle in a counterclockwise direction, for example, the specific angle may be 360 degrees. When the vacuum chamber 11 rotates, it will agitate the powder 121 in the reaction space 12, so that the powder 121 will be evenly heated and contact the precursor or non-reactive gas.

在本新型一實施例中,驅動單元15可為馬達,透過至少一齒輪14連接外管體131,並經由齒輪14帶動外管體131及真空腔體11相對於內管體133轉動。 In an embodiment of the present invention, the driving unit 15 may be a motor, which is connected to the outer tube body 131 through at least one gear 14, and drives the outer tube body 131 and the vacuum chamber 11 to rotate relative to the inner tube body 133 via the gear 14.

內管體133的連接空間134內可設置至少一抽氣管線171、至少一進氣管線173、至少一非反應氣體輸送管線175、一加熱器177及/或一溫度感測單元179,如圖2及圖3所示。 The connecting space 134 of the inner tube body 133 can be provided with at least one gas extraction line 171, at least one gas inlet line 173, at least one non-reactive gas delivery line 175, a heater 177 and/or a temperature sensing unit 179, as shown in FIG. 2 and Figure 3.

抽氣管線171流體連接真空腔體11的反應空間12,並用以抽出反應空間12內的氣體,使得反應空間12為真空狀態,以進行原子層沉積製程。具體而言抽氣管線171可連接一幫浦,並透過幫浦抽出反應空間12內的氣體。 The gas extraction line 171 is fluidly connected to the reaction space 12 of the vacuum chamber 11 and is used to extract gas in the reaction space 12 so that the reaction space 12 is in a vacuum state for the atomic layer deposition process. Specifically, the pumping line 171 can be connected to a pump, and the gas in the reaction space 12 can be pumped out through the pump.

進氣管線173流體連接真空腔體11的反應空間12,並用以將一前驅物或一非反應氣體輸送至反應空間12,其中非反應氣體可以是氮氣或氬氣等惰性氣體。例如進氣管線173可透過閥件組連接一前驅物儲存槽及一非反應氣體儲存槽,並透過閥件組將前驅物輸送至反應空間12內,使得前驅物沉積粉末121表面。在實際應用時,進氣管線173可能會將一載送氣體(carrier gas)及前驅物一起輸送到反應空間12內。而後透過閥件組將非反應氣體輸送至反應空間12內,並透過抽氣管線171抽氣,以去除反應空間12內的前驅物。在本新型一實施例中,進氣管線173可連接複數個分枝管線,並分別透過各個分枝管線將不同的前驅物依序輸送至反應空間12內。 The gas inlet line 173 is fluidly connected to the reaction space 12 of the vacuum chamber 11 and is used to transport a precursor or a non-reactive gas to the reaction space 12, where the non-reactive gas can be an inert gas such as nitrogen or argon. For example, the gas inlet line 173 may be connected to a precursor storage tank and a non-reactive gas storage tank through a valve assembly, and the precursor can be transported into the reaction space 12 through the valve assembly, so that the precursor deposits on the surface of the powder 121. In practical applications, the gas inlet line 173 may transport a carrier gas and precursors into the reaction space 12 together. Then, the non-reactive gas is transported into the reaction space 12 through the valve assembly, and is pumped through the gas extraction line 171 to remove the precursors in the reaction space 12. In an embodiment of the present invention, the gas inlet pipeline 173 may be connected to a plurality of branch pipelines, and different precursors can be sequentially delivered into the reaction space 12 through each branch pipeline.

此外進氣管線173可增大輸送至反應空間12的非反應氣體的流量,並透過非反應氣體吹動反應空間12內的粉末121,使得粉末121受到非反應氣體的帶動,而擴散到反應空間12的各個區域。 In addition, the gas inlet line 173 can increase the flow rate of the non-reactive gas delivered to the reaction space 12, and blow the powder 121 in the reaction space 12 through the non-reactive gas, so that the powder 121 is driven by the non-reactive gas and diffuses into the reaction space. 12 various areas.

在本新型一實施例中,進氣管線173可包括至少一非反應氣體輸送管線175流體連接真空腔體11的反應空間12,並用以將一非反應氣體輸送至反應空間12,例如非反應氣體輸送管線175可透過閥件組連接一氮氣儲存槽,並透過閥件組將氮氣輸送至反應空間12。非反應氣體用以吹動反應空間12內的粉末121,配合驅動單元15驅動真空腔體11轉動,可有效且均勻的翻攪反應空間12內的粉末121,並在各個粉末121的表面沉積厚度均勻的薄膜。 In an embodiment of the present invention, the gas inlet line 173 may include at least one non-reactive gas delivery line 175 fluidly connected to the reaction space 12 of the vacuum chamber 11, and is used to deliver a non-reactive gas to the reaction space 12, such as non-reactive gas The delivery line 175 can be connected to a nitrogen storage tank through the valve assembly, and deliver the nitrogen to the reaction space 12 through the valve assembly. The non-reactive gas is used to blow the powder 121 in the reaction space 12 and cooperate with the driving unit 15 to drive the vacuum chamber 11 to rotate, which can effectively and uniformly stir the powder 121 in the reaction space 12 and deposit the thickness on the surface of each powder 121 Uniform film.

用以吹動粉末的原子層沉積裝置10的進氣管線173及非反應氣體輸送管線175都用以將非反應氣體輸送至反應空間12,其中進氣管線173輸送的非反應氣體的流量較小,主要用以去除反應空間12內的前驅物,而非反應氣體輸送管線175輸送的非反應氣體的流量較大,主要用以吹動反應空間12內的粉末121。 Both the gas inlet pipe 173 and the non-reactive gas delivery pipe 175 of the atomic layer deposition apparatus 10 used to blow powder are used to deliver the non-reactive gas to the reaction space 12, and the flow of the non-reactive gas delivered by the gas inlet pipe 173 is relatively small. , Which is mainly used to remove the precursors in the reaction space 12, and the non-reactive gas transported by the non-reactive gas delivery line 175 has a relatively large flow rate, which is mainly used to blow the powder 121 in the reaction space 12.

具體而言,進氣管線173及非反應氣體輸送管線175將非反應氣體輸送至反應空間12的時間點不同,因此在實際應用時可不設置非反應氣體輸送管線175,並調整進氣管線173在不同時間點輸送的非反應氣體的流量。當要去除反應空間12內的前驅物時,可降低進氣管線173輸送至反應空間12的非反應氣體的流量,而要吹動反應空間12內的粉末121時,則增加進氣管線173輸送至反應空間12的非反應氣體的流量。 Specifically, the time points at which the gas inlet line 173 and the non-reactive gas conveying line 175 convey the non-reactive gas to the reaction space 12 are different. Therefore, in actual applications, the non-reactive gas conveying line 175 may not be provided, and the gas inlet line 173 may be adjusted in time. The flow of non-reactive gas delivered at different time points. When the precursors in the reaction space 12 are to be removed, the flow rate of the non-reactive gas delivered by the gas inlet line 173 to the reaction space 12 can be reduced, and when the powder 121 in the reaction space 12 is to be blown, the gas inlet line 173 should be added for conveying. The flow rate of the non-reactive gas to the reaction space 12.

本新型的驅動單元15帶動外管體131及真空腔體11轉動時,內管體133及其內部的抽氣管線171、進氣管線173及/或非反應氣體輸送管線175不會隨著轉動,有利於提高進氣管線173及/或非反應氣體輸送管線175輸送至反應空間12的非反應氣體及/或前驅物的穩定度。 When the driving unit 15 of the present invention drives the outer tube body 131 and the vacuum chamber 11 to rotate, the inner tube body 133 and the air suction line 171, the air inlet line 173 and/or the non-reactive gas delivery line 175 inside will not rotate with it , It is beneficial to improve the stability of the non-reactive gas and/or precursor that is delivered to the reaction space 12 by the gas inlet pipe 173 and/or the non-reactive gas delivery pipe 175.

加熱器177用以加熱連接空間134及內管體133,並透過加熱器177加熱內管體133內的抽氣管線171、進氣管線173及/或非反應氣體輸送管線175,以提高抽氣管線171、進氣管線173及/或非反應氣體輸送管線175內的氣體的溫度。例如可提高進氣管線173輸送至反應空間12的非反應氣體及/或前驅物的溫度,並可提高非反應氣體輸送管線175輸送至反應空間12的非反應氣體的溫度。使得非反應氣體及/或前驅物進入反應空間12時,不會造成反應空間12的溫度大幅下降或改變。此外可透過溫度感測單元179量測加熱器177或連接空間134的溫度,以得知加熱器177的工作狀態。當然在真空腔體11的內部、外部或周圍通常會設置另一個加熱裝置16,如圖4所示,其中加熱裝置16鄰近或接觸真空腔體11,並用以加熱真空腔體11及反應空間12。 The heater 177 is used to heat the connection space 134 and the inner tube body 133, and heat the air extraction line 171, the air inlet line 173 and/or the non-reactive gas delivery line 175 in the inner tube body 133 through the heater 177 to improve air extraction The temperature of the gas in the pipeline 171, the gas inlet pipeline 173, and/or the non-reactive gas delivery pipeline 175. For example, the temperature of the non-reactive gas and/or the precursor delivered by the gas inlet line 173 to the reaction space 12 can be increased, and the temperature of the non-reactive gas delivered by the non-reactive gas delivery line 175 to the reaction space 12 can be increased. When non-reactive gases and/or precursors enter the reaction space 12, the temperature of the reaction space 12 will not drop or change significantly. In addition, the temperature of the heater 177 or the connecting space 134 can be measured through the temperature sensing unit 179 to know the working state of the heater 177. Of course, another heating device 16 is usually arranged inside, outside or around the vacuum chamber 11, as shown in FIG. 4, where the heating device 16 is adjacent to or in contact with the vacuum chamber 11 and is used to heat the vacuum chamber 11 and the reaction space 12 .

在本新型實施例中,進氣管線173及/或非反應氣體輸送管線175由軸封裝置13的內管體133延伸至真空腔體11的反應空間12內,並朝反應空間12的一表面的方向延伸。例如進氣管線173及/或非反應氣體輸送管線175由內管體133的連接空間134延伸至真空腔體11的反應空間12,其中延伸至反應空間12的進氣管線173及/或非反應氣體輸送管線175可被定義為一延伸管線172。 In the embodiment of the present invention, the gas inlet pipeline 173 and/or the non-reactive gas delivery pipeline 175 extends from the inner tube body 133 of the shaft sealing device 13 into the reaction space 12 of the vacuum chamber 11 and faces a surface of the reaction space 12 In the direction of extension. For example, the inlet line 173 and/or the non-reactive gas delivery line 175 extends from the connecting space 134 of the inner tube 133 to the reaction space 12 of the vacuum chamber 11, and the inlet line 173 and/or the non-reactive gas line 173 extending to the reaction space 12 The gas delivery line 175 can be defined as an extension line 172.

在本新型一實施例中,反應空間12可為柱狀體,並包括兩個底面122及至少一側面124,其中側面124連接兩個底面122。位於反應空間12內的延伸管線172,朝反應空間12的底面122及側面124方向延伸,例如部分的延伸管線172較靠近反應空間12下半部的側面124。 In an embodiment of the present invention, the reaction space 12 may be a columnar body and includes two bottom surfaces 122 and at least one side surface 124, wherein the side surface 124 is connected to the two bottom surfaces 122. The extension pipeline 172 located in the reaction space 12 extends toward the bottom surface 122 and the side surface 124 of the reaction space 12. For example, a part of the extension pipeline 172 is closer to the side surface 124 of the lower half of the reaction space 12.

延伸管線172可包括複數個出風口1721,其中出風口1721朝向反應空間12的下半部的一表面。例如延伸管線172可經由複數個出風口1721朝反應空間12下半部的側面124吹出非反應氣體,或者是沿著真空腔體11的徑向外的方向吹出非反應氣體。 The extension pipeline 172 may include a plurality of air outlets 1721, wherein the air outlets 1721 face a surface of the lower half of the reaction space 12. For example, the extension pipeline 172 can blow non-reactive gas toward the side surface 124 of the lower half of the reaction space 12 through a plurality of air outlets 1721, or blow non-reactive gas in a direction radially outward of the vacuum chamber 11.

本新型所述的延伸管線172具有複數個出風口1721,並可透過出風口1721將非反應氣體及/或反應氣體以類似噴灑的方式吹向反應空間12內的粉末121,以利於均勻揚起反應空間12內的粉末121。 The extension pipeline 172 of the present invention has a plurality of air outlets 1721, and the non-reactive gas and/or reaction gas can be blown to the powder 121 in the reaction space 12 in a spray-like manner through the air outlet 1721 to facilitate uniform raising The powder 121 in the reaction space 12.

本新型實施例的內管體133靠近或連接反應空間12的一側可設置一過濾單元139,其中內管體133內的抽氣管線171經由過濾單元139流體連接真空腔體11的反應空間12,而位於內管體133內的進氣管線173及/或非反應氣體輸送管線175則穿過過濾單元139,並在反應空間12內形成延伸管線172,如圖2所示。透過過濾單元139的設置,可避免抽氣管線171抽出反應空間12內的氣體時,將反應空間12內的粉末121一併抽出,而造成粉末121的損耗。 A filter unit 139 can be provided on the side of the inner tube 133 close to or connected to the reaction space 12 in the embodiment of the present invention, wherein the suction line 171 in the inner tube 133 is fluidly connected to the reaction space 12 of the vacuum chamber 11 via the filter unit 139 , And the inlet pipe 173 and/or the non-reactive gas delivery pipe 175 located in the inner tube body 133 pass through the filter unit 139 and form an extension pipe 172 in the reaction space 12, as shown in FIG. 2. The arrangement of the filter unit 139 can prevent the powder 121 in the reaction space 12 from being drawn out when the gas extraction line 171 extracts the gas in the reaction space 12, resulting in the loss of the powder 121.

在本新型一實施例中,延伸管線172的外觀近似L字型或階梯形,並包括三個分段及兩個轉折角,其中轉折角約為90度。延伸管線172的第一分段連接內管體133內的進氣管線173及/或非反應氣體輸送管線175,並朝蓋板111或反應空間12的底面122的方向延伸。延伸管線172的第二分段連接第一分段,其中第二分段與第一分段之間具有一轉折角,且第二分段朝反應空間12的側面124的方向延伸。延伸管線172的第三分段連接第二分段,並朝反應空間12的底面122或蓋板111的方向延伸。當然延伸管線172具 有三個分段及兩個轉折角僅為本新型一實施例,並非本新型權利範圍的限制。 In an embodiment of the present invention, the extension pipeline 172 has an L-shaped or stepped appearance, and includes three sections and two turning angles, where the turning angle is about 90 degrees. The first section of the extension pipeline 172 is connected to the gas inlet pipeline 173 and/or the non-reactive gas delivery pipeline 175 in the inner tube body 133 and extends toward the cover 111 or the bottom surface 122 of the reaction space 12. The second section of the extension pipeline 172 is connected to the first section, wherein there is a turning angle between the second section and the first section, and the second section extends toward the side surface 124 of the reaction space 12. The third section of the extension pipeline 172 is connected to the second section and extends toward the bottom surface 122 of the reaction space 12 or the cover 111. Of course there are 172 extension pipelines The three segments and two turning angles are only an embodiment of the present invention, and are not a limitation of the scope of rights of the present invention.

具體而言,本新型實施例中主要於反應空間12內設置延伸管線172,並使得設置出風口1721的延伸管線172靠近位於反應空間12下半部的粉末121,其中出風口1721朝向粉末121及反應空間12的下半部的側面124吹氣,以揚起反應空間12內的粉末121。 Specifically, in the embodiment of the present invention, an extension pipeline 172 is mainly arranged in the reaction space 12, and the extension pipeline 172 provided with the air outlet 1721 is close to the powder 121 located in the lower half of the reaction space 12, and the air outlet 1721 faces the powder 121 and The side surface 124 of the lower half of the reaction space 12 blows air to raise the powder 121 in the reaction space 12.

在本新型一實施例中,如圖4所示,內管體133由外管體131的容置空間132延伸至真空腔體11的反應空間12,並於反應空間12內形成一凸出管部130。進氣管線173及/或非反應氣體輸送管線175穿過位於反應空間12內的內管體133及/或凸出管部130的管壁,由內管體133延伸至反應空間12內,並在反應空間12內形成延伸管線172。此外於延伸管線172靠近反應空間12下半部的側面124上形成複數個出風口1721。 In an embodiment of the present invention, as shown in FIG. 4, the inner tube body 133 extends from the accommodating space 132 of the outer tube body 131 to the reaction space 12 of the vacuum chamber 11, and a protruding tube is formed in the reaction space 12部130. The gas inlet line 173 and/or the non-reactive gas delivery line 175 passes through the inner tube body 133 and/or the tube wall of the protruding tube portion 130 located in the reaction space 12, and extends from the inner tube body 133 into the reaction space 12, and An extension line 172 is formed in the reaction space 12. In addition, a plurality of air outlets 1721 are formed on the side surface 124 of the extension pipeline 172 close to the lower half of the reaction space 12.

在本新型另一實施例中,如圖5所示,進氣管線173及/或非反應氣體輸送管線175可不由內管體133的連接空間134延伸至反應空間12內。換言之,真空腔體11的反應空間12內未設置延伸管線172,而是在內管體133及/或凸出管部130靠近真空腔體11下半部的管壁上設置複數個出風口1331,其中出風口穿過凸出管部130的管壁,並朝向反應空間12下半部的一表面或側面124的方向。 In another embodiment of the present invention, as shown in FIG. 5, the gas inlet line 173 and/or the non-reactive gas delivery line 175 may not extend from the connection space 134 of the inner tube body 133 to the reaction space 12. In other words, the extension pipeline 172 is not provided in the reaction space 12 of the vacuum chamber 11, but a plurality of air outlets 1331 are provided on the inner tube body 133 and/or the protruding tube portion 130 near the lower half of the vacuum chamber 11 , Wherein the air outlet passes through the tube wall of the protruding tube portion 130 and faces a surface or side surface 124 of the lower half of the reaction space 12.

抽氣管線171、進氣管線173、非反應氣體輸送管線175、加熱器177及/或溫度感測單元179延伸至凸出管部130內,其中進氣管線173或非反應氣體輸送管線175流體連接位於凸出管部130或內管體133的管壁上的出風口1331。具體而言,設置在凸出管部130或內管體133的管壁上的出風口 1331朝向反應空間12的下半部的側面124,使得進氣管線173或非反應氣體輸送管線175可經由出風口1331朝反應空間12下半部的側面124吹出非反應氣體,並以非反應氣體吹動反應空間12內的粉末121。在本新型一實施例中,進氣管線173或非反應氣體輸送管線175可被整合在內管體133的內表面,並連接設置在內管體133上的出風口1331。 The gas extraction pipeline 171, the gas inlet pipeline 173, the non-reactive gas delivery pipeline 175, the heater 177, and/or the temperature sensing unit 179 extend into the protruding pipe portion 130, wherein the gas inlet pipeline 173 or the non-reactive gas delivery pipeline 175 is fluid The air outlet 1331 on the pipe wall of the protruding pipe 130 or the inner pipe body 133 is connected. Specifically, the air outlet provided on the tube wall of the protruding tube portion 130 or the inner tube body 133 1331 faces the side surface 124 of the lower half of the reaction space 12, so that the gas inlet line 173 or the non-reactive gas delivery line 175 can blow the non-reactive gas toward the side surface 124 of the lower half of the reaction space 12 through the air outlet 1331, and use the non-reactive gas The powder 121 in the reaction space 12 is blown. In an embodiment of the present invention, the air inlet line 173 or the non-reactive gas delivery line 175 may be integrated on the inner surface of the inner tube body 133 and connected to the air outlet 1331 provided on the inner tube body 133.

在本新型另一實施例中,如圖6所示,內管體133由外管體131的容置空間132延伸至反應空間12內,並於真空腔體11的反應空間12內設置凸出管部130。凸出管部130連接反應空間12的一側可設置過濾單元139,而進氣管線173及/或非反應氣體輸送管線175穿過過濾單元139,由內管體133延伸至反應空間12內,並於反應空間12內形成延伸管線172。此外延伸管線172靠近反應空間12下半部的側面124的管壁上可設置複數個出風口1721,並經由出風口1721朝反應空間12下半部的側面124吹出非反應氣體。 In another embodiment of the present invention, as shown in FIG. 6, the inner tube body 133 extends from the accommodating space 132 of the outer tube body 131 into the reaction space 12, and a protrusion is provided in the reaction space 12 of the vacuum chamber 11 Pipe 130. A filter unit 139 can be provided on the side of the protruding pipe 130 connected to the reaction space 12, and the gas inlet line 173 and/or the non-reactive gas delivery line 175 passes through the filter unit 139 and extends from the inner pipe body 133 into the reaction space 12. And an extension pipeline 172 is formed in the reaction space 12. In addition, a plurality of air outlets 1721 may be provided on the pipe wall of the extension pipeline 172 close to the side 124 of the lower half of the reaction space 12, and non-reactive gas can be blown out toward the side 124 of the lower half of the reaction space 12 through the air outlets 1721.

在實際應用時,可調整延伸管線172的出風口1721的高度,或者是控制反應空間12內粉末121的量,使得真空腔體11靜置不轉動時,反應空間12內的粉末121不會覆蓋延伸管線172的出風口1721,以減少粉末121的損耗。此外可於延伸管線172的出風口1721設置另一過濾單元,以進一步減少粉末121的損耗。 In actual application, the height of the air outlet 1721 of the extension pipeline 172 can be adjusted, or the amount of the powder 121 in the reaction space 12 can be controlled, so that when the vacuum chamber 11 is not rotating, the powder 121 in the reaction space 12 will not cover The air outlet 1721 of the pipeline 172 is extended to reduce the loss of the powder 121. In addition, another filter unit can be provided at the air outlet 1721 of the extension pipeline 172 to further reduce the loss of the powder 121.

在本新型另一實施例中,延伸管線172可持續將非反應氣體輸送至反應空間12,並可調整非反應氣體的流量。具體而言,延伸管線172輸出非反應氣體的模式可包括攪動模式及一般模式,在攪動模式下延伸管線172輸出的非反應氣體的流量較大,並可以輸出的非反應氣體攪動反應空間12內的粉末121。在一般模式下延伸管線172輸出的非反應氣體的流量較小, 可能無法攪動反應空間12內的粉末121,但在一般模式下輸出的非反應氣體會在延伸管線172的出風口1721形成正壓,以防止粉末121由出風口1721進入延伸管線172。 In another embodiment of the present invention, the extension pipeline 172 can continuously transport the non-reactive gas to the reaction space 12 and can adjust the flow rate of the non-reactive gas. Specifically, the non-reactive gas output mode of the extension line 172 may include agitation mode and general mode. In the agitation mode, the flow rate of the non-reactive gas output by the extension line 172 is relatively large, and the output non-reactive gas can agitate the reaction space 12的粉121。 The powder 121. In the normal mode, the flow rate of the non-reactive gas output from the extension line 172 is small, It may not be possible to agitate the powder 121 in the reaction space 12, but the non-reactive gas output in the normal mode will form a positive pressure at the air outlet 1721 of the extension line 172 to prevent the powder 121 from entering the extension line 172 from the air outlet 1721.

在本新型一實施例中,用以吹動粉末的原子層沉積裝置10亦可包括一承載板191及至少一固定架193,其中承載板191可為一板體,用以承載驅動單元15、真空腔體11及軸封裝置13。例如承載板191連接驅動單元15,並透過驅動單元15連接軸封裝置13及真空腔體11。此外軸封裝置13及/或真空腔體11亦可透過至少一支撐架連接承載板191,以提高連接的穩定度。 In an embodiment of the present invention, the atomic layer deposition apparatus 10 for blowing powder may also include a carrying plate 191 and at least one fixing frame 193, wherein the carrying plate 191 may be a plate for carrying the driving unit 15, Vacuum chamber 11 and shaft sealing device 13. For example, the carrying plate 191 is connected to the driving unit 15, and the shaft sealing device 13 and the vacuum chamber 11 are connected through the driving unit 15. In addition, the shaft sealing device 13 and/or the vacuum chamber 11 can also be connected to the bearing plate 191 through at least one support frame to improve the stability of the connection.

承載板191可透過至少一連接軸195連接固定架193,其中固定架193的數量可為兩個,並分別設置在承載板191的兩側。承載板191可以連接軸195為軸心相對於固定架193轉動,以改變驅動單元15、軸封裝置13及真空腔體11的仰角,以利於在各個粉末121的表面形成厚度均勻的薄膜。 The carrying plate 191 can be connected to the fixing frame 193 through at least one connecting shaft 195, wherein the number of the fixing frame 193 can be two, and the fixing frame 193 can be arranged on both sides of the carrying plate 191, respectively. The bearing plate 191 can rotate relative to the fixed frame 193 with the shaft 195 as the axis to change the elevation angle of the driving unit 15, the shaft sealing device 13 and the vacuum chamber 11, so as to facilitate the formation of a thin film of uniform thickness on the surface of each powder 121.

在本新型一實施例中,如圖7所示,進氣管線173及/或非反應氣體輸送管線175由軸封裝置13的內管體133延伸至真空腔體11的反應空間12內,並在反應空間12內形成一延伸管線172,其中延伸管線172朝真空腔體11的底面122或蓋板111的方向延伸。延伸管線172上設置至少一出風口1721,其中出風口1721朝向真空腔體11的側面124或底面122或蓋板111,以吹動反應空間12內的粉末121。 In an embodiment of the present invention, as shown in FIG. 7, the gas inlet line 173 and/or the non-reactive gas delivery line 175 extends from the inner tube body 133 of the shaft sealing device 13 into the reaction space 12 of the vacuum chamber 11, and An extension pipeline 172 is formed in the reaction space 12, wherein the extension pipeline 172 extends toward the bottom surface 122 of the vacuum chamber 11 or the cover 111. At least one air outlet 1721 is provided on the extension pipeline 172, wherein the air outlet 1721 faces the side 124 or the bottom surface 122 or the cover 111 of the vacuum chamber 11 to blow the powder 121 in the reaction space 12.

以上所述者,僅為本新型之一較佳實施例而已,並非用來限定本新型實施之範圍,即凡依本新型申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾,均應包括於本新型之申請專利範圍內。 The foregoing is only one of the preferred embodiments of the present invention, and is not used to limit the scope of implementation of the present invention, that is, all the equivalent changes and changes in the shape, structure, characteristics and spirit described in the scope of the patent application of the present invention Modifications should be included in the scope of the patent application for this new model.

10:用以吹動粉末的原子層沉積裝置 10: Atomic layer deposition device for blowing powder

11:真空腔體 11: Vacuum chamber

111:蓋板 111: cover

1111:內表面 1111: inner surface

113:腔體 113: Cavity

115:監控晶圓 115: monitor wafer

12:反應空間 12: reaction space

121:粉末 121: powder

122:底面 122: Bottom

124:側面 124: side

13:軸封裝置 13: Shaft seal device

131:外管體 131: Outer tube body

132:容置空間 132: accommodating space

133:內管體 133: inner tube body

134:連接空間 134: Connecting Space

139:過濾單元 139: filter unit

14:齒輪 14: Gear

15:驅動單元 15: drive unit

171:抽氣管線 171: Extraction line

172:延伸管線 172: Extension pipeline

1721:出風口 1721: air outlet

173:進氣管線 173: intake line

175:非反應氣體輸送管線 175: Non-reactive gas pipeline

177:加熱器 177: heater

Claims (9)

一種用以吹動粉末的原子層沉積裝置,包括:一真空腔體,包括一反應空間用以容置複數個粉末;一軸封裝置,包括一外管體及一內管體,其中該外管體具有一容置空間,用以容置該內管體,其中該內管體由該外管體的該容置空間延伸至該真空腔體的該反應空間,並在該反應空間內形成一凸出管部;一驅動單元,透過該軸封裝置的該外管體連接該真空腔體,並經由該外管體帶動該真空腔體轉動;至少一抽氣管線,位於該內管體內,流體連接該真空腔體的該反應空間,並用以抽出該反應空間內的一氣體;及至少一進氣管線,穿過該凸出管部的一管壁,由該內管體延伸至該反應空間內,並在該反應空間內形成一延伸管線,其中該延伸管線包括複數個出風口朝向該反應空間的一側面,該延伸管線經由該複數個出風口朝該反應空間的該側面的方向吹出一非反應氣體,以吹動該反應空間內的該粉末。 An atomic layer deposition device for blowing powder, including: a vacuum chamber, including a reaction space for accommodating a plurality of powders; a shaft sealing device, including an outer tube body and an inner tube body, wherein the outer tube The body has an accommodating space for accommodating the inner tube body, wherein the inner tube body extends from the accommodating space of the outer tube body to the reaction space of the vacuum chamber, and forms a space in the reaction space A protruding tube portion; a driving unit that connects the vacuum chamber through the outer tube body of the shaft sealing device, and drives the vacuum chamber to rotate through the outer tube body; at least one suction line is located in the inner tube body, Fluidly connected to the reaction space of the vacuum chamber and used to extract a gas in the reaction space; and at least one gas inlet line, passing through a pipe wall of the protruding pipe portion, and extending from the inner pipe body to the reaction In the space, an extension pipeline is formed in the reaction space, wherein the extension pipeline includes a plurality of air outlets facing a side surface of the reaction space, and the extension pipeline blows out toward the side of the reaction space through the plurality of air outlets A non-reactive gas to blow the powder in the reaction space. 如請求項1所述的用以吹動粉末的原子層沉積裝置,其中該延伸管線的該複數個出風口朝向該反應空間的下半部的該側面。 The atomic layer deposition apparatus for blowing powder according to claim 1, wherein the plurality of air outlets of the extension pipeline face the side surface of the lower half of the reaction space. 如請求項2所述的用以吹動粉末的原子層沉積裝置,其中該反應空間為一柱狀體,包括兩個底面及該側面,該側面連接該兩個底面,而該延伸管線朝向該反應空間的該底面及該側面的方向延伸。 The atomic layer deposition apparatus for blowing powder according to claim 2, wherein the reaction space is a columnar body including two bottom surfaces and the side surface, the side surface connects the two bottom surfaces, and the extension pipeline faces the The direction of the bottom surface and the side surface of the reaction space extends. 如請求項1所述的用以吹動粉末的原子層沉積裝置,其中該進氣管線包括至少一非反應氣體輸送管線,該非反應氣體輸送管線由該內管體延伸至該反應空間內並形成該延伸管線。 The atomic layer deposition apparatus for blowing powder according to claim 1, wherein the gas inlet pipeline includes at least one non-reactive gas delivery pipeline, and the non-reactive gas delivery pipeline extends from the inner tube body into the reaction space and forms The extension pipeline. 如請求項1所述的用以吹動粉末的原子層沉積裝置,包括一過濾單元位於該內管體連接該反應空間的一側。 The atomic layer deposition device for blowing powder according to claim 1, including a filter unit located on the side of the inner tube connected to the reaction space. 一種用以吹動粉末的原子層沉積裝置,包括:一真空腔體,包括一反應空間用以容置複數個粉末;一軸封裝置,包括一外管體及一內管體,其中該外管體具有一容置空間,用以容置該內管體;一過濾單元,位於該內管體連接該反應空間的一側;一驅動單元,透過該軸封裝置的該外管體連接該真空腔體,並經由該外管體帶動該真空腔體轉動;至少一抽氣管線,位於該內管體內,經由該過濾單元流體連接該真空腔體的該反應空間,並用以抽出該反應空間內的一氣體;及至少一進氣管線,位於該內管體內,穿過該過濾單元由該內管體延伸至該反應空間內,並在該反應空間內形成一延伸管線,其中該延伸管線包括至少一出風口朝向該反應空間的一側面或一底面,該延伸管線經由該出風口朝該反應空間的該側面或該底面的方向吹送一非反應氣體,以吹動該反應空間內的該粉末。 An atomic layer deposition device for blowing powder, including: a vacuum chamber, including a reaction space for accommodating a plurality of powders; a shaft sealing device, including an outer tube body and an inner tube body, wherein the outer tube The body has an accommodating space for accommodating the inner tube body; a filter unit located on the side of the inner tube body connected to the reaction space; a driving unit connected to the vacuum through the outer tube body of the shaft seal device The cavity is driven by the outer tube to rotate the vacuum chamber; at least one suction line is located in the inner tube and is fluidly connected to the reaction space of the vacuum chamber through the filter unit, and is used to draw out the reaction space And at least one gas inlet line located in the inner tube body, extending through the filter unit from the inner tube body into the reaction space, and forming an extension pipeline in the reaction space, wherein the extension pipeline includes At least one air outlet faces a side surface or a bottom surface of the reaction space, and the extension pipeline blows a non-reactive gas in the direction of the side surface or the bottom surface of the reaction space through the air outlet port to blow the powder in the reaction space . 如請求項6所述的用以吹動粉末的原子層沉積裝置,其中該內管體由該外管體的該容置空間延伸至該真空腔體的該反應空間,並在該反應空間內形成一凸出管部,而該過濾單元則位於該凸出管部連接該反應空間的一側。 The atomic layer deposition apparatus for blowing powder according to claim 6, wherein the inner tube body extends from the accommodating space of the outer tube body to the reaction space of the vacuum chamber, and is in the reaction space A protruding tube portion is formed, and the filter unit is located on the side where the protruding tube portion is connected to the reaction space. 一種用以吹動粉末的原子層沉積裝置,包括:一真空腔體,包括一反應空間用以容置複數個粉末;一軸封裝置,包括一外管體及一內管體,其中該外管體具有一容置空間,用以容置該內管體,而該內管體由該外管體的該容置空間延伸至該真空腔體的該 反應空間,並在該反應空間內形成一凸出管部,其中該凸出管部包括複數個出風口,穿過該凸出管部的一管壁,並朝向該反應空間的一側面的方向;一驅動單元,透過該軸封裝置的該外管體連接該真空腔體,並經由該外管體帶動該真空腔體轉動;至少一抽氣管線,位於該內管體內,流體連接該真空腔體的該反應空間,並用以抽出該反應空間內的一氣體;及至少一進氣管線,位於該內管體及該凸出管部內,流體連接該複數個出風口,並經由該複數個出風口將一非反應氣體朝該反應空間的該側面的方向吹送,以吹動該反應空間內的該粉末。 An atomic layer deposition device for blowing powder, including: a vacuum chamber, including a reaction space for accommodating a plurality of powders; a shaft sealing device, including an outer tube body and an inner tube body, wherein the outer tube The body has an accommodating space for accommodating the inner tube body, and the inner tube body extends from the accommodating space of the outer tube body to the vacuum chamber A reaction space, and a protruding pipe portion is formed in the reaction space, wherein the protruding pipe portion includes a plurality of air outlets, passing through a pipe wall of the protruding pipe portion, and facing a side of the reaction space ; A drive unit, connected to the vacuum chamber through the outer tube body of the shaft sealing device, and drive the vacuum chamber to rotate through the outer tube body; at least one air extraction pipeline located in the inner tube body, fluidly connected to the vacuum The reaction space of the cavity is used to extract a gas in the reaction space; and at least one gas inlet line is located in the inner tube body and the protruding tube part, and is fluidly connected to the plurality of air outlets and passes through the plurality of air outlets. The air outlet blows a non-reactive gas toward the side of the reaction space to blow the powder in the reaction space. 如請求項8所述的用以吹動粉末的原子層沉積裝置,其中該進氣管線包括至少一非反應氣體輸送管線流體連接該複數個出風口。 The atomic layer deposition apparatus for blowing powder according to claim 8, wherein the gas inlet pipeline includes at least one non-reactive gas conveying pipeline fluidly connected to the plurality of gas outlets.
TW110204615U 2021-04-26 2021-04-26 Atomic layer deposition device for blowing powder TWM619828U (en)

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