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TWI675426B - Method and device for positioning wafer stripping process - Google Patents

Method and device for positioning wafer stripping process Download PDF

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Publication number
TWI675426B
TWI675426B TW107137378A TW107137378A TWI675426B TW I675426 B TWI675426 B TW I675426B TW 107137378 A TW107137378 A TW 107137378A TW 107137378 A TW107137378 A TW 107137378A TW I675426 B TWI675426 B TW I675426B
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TW
Taiwan
Prior art keywords
seat
positioning
wafer
die
stamper
Prior art date
Application number
TW107137378A
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Chinese (zh)
Other versions
TW202017072A (en
Inventor
董聖鑫
黃子葳
Original Assignee
萬潤科技股份有限公司
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Publication date
Application filed by 萬潤科技股份有限公司 filed Critical 萬潤科技股份有限公司
Priority to TW107137378A priority Critical patent/TWI675426B/en
Priority to CN201811337037.8A priority patent/CN111092040A/en
Priority to CN201821852660.2U priority patent/CN209056474U/en
Application granted granted Critical
Publication of TWI675426B publication Critical patent/TWI675426B/en
Publication of TW202017072A publication Critical patent/TW202017072A/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

本發明一種晶片剝折製程的定位方法及裝置,該定位方法包括:使一待剝條晶片被由一剝折機構的可作、上下偏擺之一擺座中推出,而使準備被剝折的最前端之一條狀晶片部位被前移至一壓模與一模座間;使該壓模與該模座相對位移,以將該最前端之該條狀晶片部位拘束限制在該壓模與該模座間作定位;藉此使構造簡單而容易加工,且定位更確實。 The invention relates to a positioning method and device for a wafer peeling process. The positioning method includes: pushing a wafer to be peeled out of a swinging mechanism of a peeling mechanism, which can be prepared to be peeled off. One of the foremost strip-shaped wafer portions is moved forward between a stamper and a die holder; the die and the mold holder are relatively displaced to restrict the foremost strip-shaped wafer portion to the stamper and the die. Positioning between mold bases; this makes the structure simple and easy to process, and the positioning is more reliable.

Description

晶片剝折製程的定位方法及裝置 Positioning method and device for wafer peeling process

本發明係有關於一種定位方法及裝置,尤指一種使用在晶片型電阻的製程中,用以進行將待剝折晶片剝折成條狀晶片的晶片剝折製程的定位方法及裝置。 The present invention relates to a positioning method and device, and more particularly to a positioning method and device for a wafer peeling process for peeling a wafer to be peeled into strip-shaped wafers in a wafer type resistor manufacturing process.

按,一般晶片型的電阻通常採用片狀的晶片加工多層的電鍍層後,再經剝折成條狀晶片,然後再由條狀晶片剝折成粒狀電阻,此類由片狀晶片剝折成條狀晶片的設備一般稱為堆疊機,由條狀晶片剝折成粒狀電阻的設備一般稱為折粒機;由片狀的晶片剝折成條狀晶片的製程可參考例如申請人取得的新型第M448052號「晶片的剝離裝置」、第M445766號「晶片的傳送裝置」、第M445761號「晶片的收集裝置」、第M445762號「晶片的堆疊裝置」等專利案;此類由片狀晶片剝折成條狀晶片的製程中,常將片狀晶片置於例如該第M448052號「晶片的剝離裝置」中的一剝折機構中一擺座上受一推送機構推送,使片狀晶片前端受一定位裝置定位後,藉受偏心輪驅動的連桿帶動該剝折機構的該擺座作上、下擺動,來使片狀晶片受該定位裝置定位的部份被剝折成條狀晶片;其中,該定位裝置可為例如該第M445766號「晶片的傳送裝置」中的傳送輪,該傳送輪受一驅動機構所驅動而可作間歇性轉動;傳送輪的圓周上開設多數嵌槽,傳送輪形成一入料側及一出料側;使物料於傳送輪入料側進入嵌槽,並經傳送輪傳送至出料側受一收集裝置攫取並堆疊收集。 According to the general chip type resistors, a sheet-shaped wafer is usually used to process multiple layers of electroplated layers, and then peeled into strip-shaped wafers, and then stripped from strip-shaped wafers to form granular resistors. The equipment for forming stripe wafers is generally called a stacker, and the equipment for stripping stripe wafers into granular resistors is generally called a pelletizer; the process of stripping wafers from stripe wafers into stripe wafers can be obtained by referring to, for example, the applicant Patents such as the new M448052 "wafer stripping device", M445766 "wafer transfer device", M445761 "wafer collection device", and M445762 "wafer stacking device"; In the process of exfoliating wafers into strip-shaped wafers, the wafers are often placed in a peeling mechanism in, for example, the M448052 "wafer stripping device" on a pendulum and pushed by a pushing mechanism, so that the wafers are wafer-shaped. After the front end is positioned by a positioning device, the swinging seat of the stripping mechanism is driven to swing up and down by a link driven by an eccentric wheel, so that the portion of the sheet-shaped wafer that is positioned by the positioning device is stripped into a strip. Wafer; where The position device may be, for example, a transfer wheel in the M445766 "Transfer Device for Wafers", which is driven by a driving mechanism to be intermittently rotated; a plurality of slots are provided on the circumference of the transfer wheel, and the transfer wheel forms a The feeding side and the discharging side; the material enters the inserting groove on the feeding side of the conveying wheel, and is conveyed to the discharging side by the conveying wheel and is picked up by a collection device and stacked for collection.

惟先前技術中,該定位裝置採用傳送輪的嵌槽作為定位的方式,但因此類片狀晶片的厚度相當薄,相對的該傳送輪的嵌槽必需相當細,使得加工該傳送輪的成本相當高,而且該嵌槽的精度必須相當精確,否則嵌夾定位的效果不容易掌控,容易會有落料情況,仍有待改進之處。 However, in the prior art, the positioning device uses the slot of the transfer wheel as a positioning method, but the thickness of the chip-like wafer is relatively thin, and the slot of the corresponding transfer wheel must be relatively thin, so that the cost of processing the transfer wheel is considerable. High, and the accuracy of the slot must be quite accurate, otherwise the effect of the positioning of the clip is not easy to control, and it is easy to have blanking, which still needs to be improved.

爰是,本發明的目的,在於提供一種可使構件加工、定位更容易、確實的晶片剝折製程的定位方法。 That is, an object of the present invention is to provide a positioning method for a reliable wafer peeling process, which can make component processing and positioning easier.

本發明的另一目的,在於提供一種可使構件加工、定位更容易、確實的晶片剝折製程的定位裝置。 Another object of the present invention is to provide a positioning device which can make the processing and positioning of components easier and more reliable.

本發明的又一目的,在於提供一種用以執行如所述晶片剝折製程的定位方法之裝置。 Another object of the present invention is to provide a device for performing a positioning method such as the wafer peeling process.

依據本發明目的之晶片剝折製程的定位方法,包括:使一待剝條晶片被由一剝折機構的可作、上下偏擺之一擺座中推出,而使準備被剝折的最前端之一條狀晶片部位被前移至一壓模與一模座間;使該壓模與該模座相對位移,以將該最前端之該條狀晶片部位拘束限制在該壓模與該模座間作定位。 The positioning method of the wafer peeling process according to the purpose of the present invention includes: pushing a wafer to be peeled out from a swinging mechanism capable of being operated and tilting up and down to make the front end ready to be peeled. A strip-shaped wafer portion is moved forward between a stamper and a mold holder; the stamper and the mold holder are relatively displaced to restrict the foremost strip-shaped wafer portion to be restricted between the stamper and the mold holder. Positioning.

依據本發明另一目的之晶片剝折製程的定位裝置,包括:設於一可作、上下偏擺之一擺座前端;包括:一上定位機構,設有一壓模;一下定位機構,設有一模座位於該壓模下方;該壓模與該模座可作相對位移。 A positioning device for a wafer peeling process according to another object of the present invention includes: disposed on the front end of a swing seat capable of being tilted up and down; including: an upper positioning mechanism provided with a stamper; a lower positioning mechanism provided with a The die seat is located below the die; the die and the die seat can be relatively displaced.

依據本發明又一目的之晶片剝折製程的定位裝置,包括:用以執行如所述晶片剝折製程的定位方法之裝置,該裝置包括:設有可作、上下偏擺之一擺座的一剝折機構、可拘束限制該條狀晶片的一壓模及一模座。 A positioning device for a wafer peeling process according to another object of the present invention includes: a device for performing the positioning method of the wafer peeling process as described, the device includes: A peeling mechanism, a stamper and a die holder which can restrict the strip wafer.

本發明實施例之晶片剝折製程的定位方法及裝置,由於該壓模與該模座構造簡單而容易加工,且該壓模與該模座之間距可作相對位移, 在該條狀晶片部位被前移至該壓模與該模座間時,因該壓模與該模座相對開張,該條狀晶片部位移入對位容易,且該壓模與該模座相對閉合時,可以最適間隙將該最前端之該條狀晶片部位拘束限制在該壓模與該模座間作定位,使定位更確實。 According to the positioning method and device of the wafer peeling process in the embodiment of the present invention, the structure of the stamper and the die holder is simple and easy to process, and the distance between the stamper and the die holder can be relatively displaced. When the strip-shaped wafer portion is moved forward between the stamper and the mold base, since the stamper is relatively opened with the mold base, the strip-shaped wafer portion is easily moved into alignment, and the stamper and the mold base are relatively closed. At this time, the most suitable front gap of the strip-shaped wafer portion can be restricted to the positioning between the stamper and the die holder, so that the positioning is more reliable.

A‧‧‧片狀晶片 A‧‧‧ Chip Chip

A1‧‧‧電阻部位 A1‧‧‧Resistance part

A2‧‧‧廢料部 A2‧‧‧ Waste Department

A3‧‧‧夾持部 A3‧‧‧Clamping section

A4‧‧‧側邊部 A4‧‧‧side

A41‧‧‧內側邊 A41‧‧‧Inner side

A42‧‧‧外側邊 A42‧‧‧Outer side

A5‧‧‧側邊部 A5‧‧‧side

A51‧‧‧內側邊 A51‧‧‧Inner side

A52‧‧‧外側邊 A52‧‧‧Outer side

A6‧‧‧線痕 A6‧‧‧Line marks

A7‧‧‧待剝條晶片 A7‧‧‧Strip chip

A8‧‧‧條狀晶片 A8‧‧‧Bar Chip

B‧‧‧剝折機構 B‧‧‧ stripping agency

B1‧‧‧擺座 B1‧‧‧Seat

B11‧‧‧樞臂 B11‧‧‧ Pivot arm

B111‧‧‧樞軸部 B111‧‧‧Pivot

B12‧‧‧樞臂 B12‧‧‧ Pivot arm

B13‧‧‧輸送道 B13‧‧‧Conveyor

B2‧‧‧推夾 B2‧‧‧ Push Clip

B3‧‧‧載座 B3‧‧‧carriage

B31‧‧‧側座 B31‧‧‧Side Seat

B311‧‧‧氣壓接頭 B311‧‧‧Pneumatic connector

B312‧‧‧氣嘴 B312‧‧‧gas nozzle

B32‧‧‧底座 B32‧‧‧base

B33‧‧‧旁側座 B33‧‧‧side seat

B34‧‧‧後側座 B34‧‧‧Rear side seat

B35‧‧‧肋部 B35‧‧‧ rib

B4‧‧‧料盒 B4‧‧‧Box

B5‧‧‧驅動件 B5‧‧‧Driver

B6‧‧‧偏心輪 B6‧‧‧eccentric wheel

B7‧‧‧連桿 B7‧‧‧ connecting rod

C‧‧‧定位裝置 C‧‧‧Positioning device

C1‧‧‧上定位機構 C1‧‧‧up positioning mechanism

C11‧‧‧座架 C11‧‧‧seat

C111‧‧‧上座架 C111‧‧‧ Upper Seat

C1111‧‧‧感應器 C1111‧‧‧Sensor

C112‧‧‧側架 C112‧‧‧Side frame

C113‧‧‧側架 C113‧‧‧Side frame

C114‧‧‧空間 C114‧‧‧space

C12‧‧‧上定位模組 C12‧‧‧up positioning module

C121‧‧‧驅動件 C121‧‧‧Driver

C122‧‧‧壓模 C122‧‧‧Compression Mold

C1221‧‧‧軸孔 C1221‧‧‧shaft hole

C1222‧‧‧碟形墊圈 C1222‧‧‧Disc washer

C1223‧‧‧上端部 C1223‧‧‧ Upper end

C1224‧‧‧壓抵面 C1224‧‧‧Pressed face

C1225‧‧‧前側面 C1225‧‧‧Front side

C1226‧‧‧導引槽 C1226‧‧‧Guide groove

C1227‧‧‧扣槽 C1227 ‧‧‧ Buckle

C1228‧‧‧抵模 C1228‧‧‧

C1229‧‧‧內緣 C1229‧‧‧Inner edge

C123‧‧‧驅動座 C123‧‧‧Driver

C1231‧‧‧斜面 C1231‧‧‧ bevel

C1232‧‧‧高位 C1232‧‧‧ high

C1233‧‧‧低位 C1233‧‧‧ low

C1234‧‧‧段差 C1234‧‧‧step difference

C1235‧‧‧感應件 C1235‧‧‧Sensor

C124‧‧‧樞接件 C124‧‧‧ Pivot

C1241‧‧‧頭部 C1241‧‧‧Head

C125‧‧‧固定座 C125‧‧‧Fixed

C1251‧‧‧立座 C1251‧‧‧stand

C1252‧‧‧頂座 C1252‧‧‧Top Block

C1253‧‧‧間隙 C1253‧‧‧ Clearance

C126‧‧‧微調座 C126‧‧‧fine-adjustment seat

C127‧‧‧滑座 C127‧‧‧slide

C1271‧‧‧固定件 C1271‧‧‧Fixed parts

C1272‧‧‧滾輪 C1272‧‧‧roller

C128‧‧‧托座 C128‧‧‧ bracket

C2‧‧‧下定位機構 C2‧‧‧Positioning mechanism

C21‧‧‧模座 C21‧‧‧Mould base

C211‧‧‧對位部 C211‧‧‧Counterpart

C212‧‧‧前側面 C212‧‧‧Front side

C213‧‧‧定位部 C213‧‧‧Positioning Department

C214‧‧‧感應孔 C214‧‧‧Induction hole

C215‧‧‧感應件 C215‧‧‧Sensor

C216‧‧‧擋邊 C216‧‧‧ Rib

C217‧‧‧外緣 C217‧‧‧Rim

圖1係本發明實施例中片狀晶片之立體示意圖。 FIG. 1 is a schematic perspective view of a chip wafer in an embodiment of the present invention.

圖2係本發明實施例中片狀晶片部份放大之立體示意圖。 FIG. 2 is an enlarged perspective view of a part of a chip wafer in an embodiment of the present invention.

圖3係本發明實施例中片狀晶片之立體分解示意圖。 FIG. 3 is a schematic exploded perspective view of a chip wafer in an embodiment of the present invention.

圖4係本發明實施例中待剝條晶片之立體分解示意圖。 FIG. 4 is an exploded perspective view of a wafer to be stripped in an embodiment of the present invention.

圖5係本發明實施例中定位裝置與剝折機構組設之立體示意圖。 FIG. 5 is a schematic perspective view of the assembly of the positioning device and the peeling mechanism in the embodiment of the present invention.

圖6係本發明實施例中定位裝置與剝折機構之立體分解示意圖。 FIG. 6 is an exploded perspective view of the positioning device and the peeling mechanism in the embodiment of the present invention.

圖7係本發明實施例中上定位模組之立體示意圖。 FIG. 7 is a schematic perspective view of an upper positioning module according to an embodiment of the present invention.

圖8係本發明實施例中上定位模組的壓模與固定座樞設之部份剖面示意圖。 FIG. 8 is a schematic cross-sectional view of a part of a die and a fixing seat of an upper positioning module according to an embodiment of the present invention.

圖9係本發明實施例中上定位模組的壓模與固定座樞設之正面示意圖。 FIG. 9 is a schematic front view of a die set and a fixing seat of an upper positioning module according to an embodiment of the present invention.

圖10係本發明實施例中壓模之部份立體示意圖。 FIG. 10 is a schematic partial perspective view of a stamper in an embodiment of the present invention.

圖11係本發明實施例中壓模之扣槽示意圖。 11 is a schematic view of a buckle groove of a stamper in an embodiment of the present invention.

圖12係本發明實施例中下定位機構設於載座之立體分解示意圖。 FIG. 12 is an exploded perspective view of the lower positioning mechanism provided on the carrier in the embodiment of the present invention.

圖13係本發明實施例中下定位機構的模座上置放條狀晶片之部份立體示意圖。 13 is a perspective view of a part of a bar-shaped wafer placed on a die base of a lower positioning mechanism according to an embodiment of the present invention.

圖14係本發明實施例中下定位機構的模座上對位部與定位部之部份示意圖。 FIG. 14 is a partial schematic view of an upper alignment portion and a positioning portion of a die base of a lower positioning mechanism according to an embodiment of the present invention.

圖15係本發明實施例中待剝條晶片的剝折定位操作之示意圖(一)。 15 is a schematic diagram (1) of a peeling positioning operation of a wafer to be stripped in an embodiment of the present invention.

圖16係本發明實施例中待剝條晶片的剝折定位操作之示意圖(二)。 FIG. 16 is a schematic diagram (2) of a peeling positioning operation of a wafer to be stripped in an embodiment of the present invention.

請參閱圖1,本發明實施例中用以剝折的晶片為一矩形的片狀晶片A,其具有一矩形區域且表面具積層電鍍層的電阻部位A1,依進行剝折成條狀的剝折順序,該電阻部位A1之X軸向前端形成一段無積層電鍍層的廢料部A2,該電阻部位A1之X軸向後端形成一段無積層電鍍層的夾持部A3,該電阻部位A1之Y軸向兩側分別各形成一段較廢料部A2、夾持部A3狹窄的無積層電鍍層的側邊部A4、A5;其中,在本發明實施例中,使該側邊部A4、A5分別各區分出包括靠該電阻部位A1的內側邊A41、A51,以及靠電阻部位A1外側的外側邊A42、A52;其中,該外側邊A42、A52包括電阻部位A1、廢料部A2、夾持部A3的邊側部份,而該內側邊A41、A51則僅包括該電阻部位A1的邊側部份;各部位間的分界係如圖1、2所示地分別各在片狀晶片A下表面刻劃有凹溝狀的線痕A6,該電阻部位A1的下表面劃的線痕A6則呈矩陣排列的矩形格狀(圖中未示),每一矩形格為一電阻元件,未來將剝折成格粒狀的電阻元件。 Please refer to FIG. 1. In the embodiment of the present invention, the wafer used for peeling is a rectangular chip wafer A, which has a rectangular area and a resistive portion A1 with a laminated plating layer on the surface. In the order of folding, the X-axis front end of the resistance portion A1 forms a scrap portion A2 without a plating layer, and the X-axis rear end of the resistance portion A1 forms a clip portion A3 without a plating layer. A side of the non-layered plating layer A4 and A5, which are narrower than the scrap portion A2 and the clamping portion A3, are formed on both sides of the Y axis, respectively. In the embodiment of the present invention, the side edges A4 and A5 are respectively formed. Each section includes the inner sides A41 and A51 that rest on the resistance part A1, and the outer sides A42 and A52 that rest on the outside of the resistance part A1. Among them, the outer sides A42 and A52 include the resistance part A1, the waste part A2, and the clamp. The side part of the holding part A3, and the inner sides A41 and A51 only include the side part of the resistance part A1; the boundaries between the parts are shown in the chip wafers as shown in Figs. 1 and 2 respectively. A groove-like line mark A6 is scribed on the lower surface of A, and a line mark A6 of the lower surface of the resistance portion A1 shows A rectangular lattice (not shown) arranged in matrix, each of a rectangular grid of a resistive element, will next peeling resistance element folded granular cell.

請參閱圖3、4,在進行剝折成條狀晶片A8前,本發明實施例先執行一將該片狀晶片A的該外側邊A42、A52及該廢料部A2列為待剝除部位,並執行一折邊剝除該待剝除部位的程序,使該片狀晶片A剝折該待剝除部位後,該片狀晶片A形成一僅包括該電阻部位A1、夾持部A3及內側邊A41、A51的待剝條晶片A7,本發明實施例中之晶片剝折製程係將該待剝條晶片A7剝折成其上包括有一部份該電阻部位A1連同其二內側邊A41、A51條狀區域部位的條狀晶片A8。 Please refer to FIGS. 3 and 4. Before stripping the wafer A8 into strips, the embodiment of the present invention first executes the outer edges A42 and A52 of the sheet wafer A and the scrap part A2 as the parts to be stripped. And execute a process of peeling off the part to be stripped, so that after the sheet wafer A is stripped off the part to be stripped, the sheet wafer A is formed to include only the resistance part A1, the clamping part A3, and The wafer A7 to be stripped on the inner side A41 and A51. The wafer stripping process in the embodiment of the present invention is to peel the wafer A7 to be stripped to include a portion of the resistance portion A1 together with its two inner sides. A41, A51 are stripe-shaped wafers A8 in stripe areas.

請參閱圖4、5,本發明實施例中的晶片剝折製程的定位方法及裝置,係配合將該待剝條晶片A7剝折成條狀晶片A8的一剝折機構B 進行定位;該剝折機構B,包括:一擺座B1及依待剝折晶片A7在擺座B1上的輸送方向為位於該擺座B1後端可作前後位移的一推夾B2,該擺座B1以兩側的二樞臂B11、B12分別各藉一樞軸部B111共同樞設於一載座B3兩側的二側座B31上,二樞臂B11、B12間設有一供該待剝條晶片A7置於其中並可被該推夾B2推送的輸送道B13;該載座B3下方受立設於一底座B32上的一旁側座B33及一後側座B34所架高,該擺座B1下方的該底座B32上設有一料盒B4供盛放該待剝條晶片A7被剝剩掉落的該支持部A3;該擺座B1的該輸送道B13前端設本發明實施例之該定位裝置C,該擺座B1受以驅動件B5驅動的一偏心輪B6連動一連桿B7而帶動該擺座B1作上、下擺動,藉將待剝條晶片A7置於該擺座B1後,使該待剝條晶片A7後端的該夾持部A3受該推夾B2夾持沿一直線推送流路向前推送,直到該待剝條晶片A7前端受該定位裝置C定位,並藉受該偏心輪B6驅動該連桿B7帶動該擺座B1作上、下擺動,使待剝條晶片A7受該定位裝置C定位的部份被剝折成該條狀晶片A8。 Please refer to FIGS. 4 and 5. The positioning method and device of the wafer peeling process in the embodiment of the present invention are a peeling mechanism B that cooperates with the wafer A7 to be stripped into a strip-shaped wafer A8. Positioning; the peeling mechanism B includes: a swing seat B1 and a conveying direction of the wafer A7 to be peeled on the swing seat B1 is a push clip B2 located at the rear end of the swing seat B1, which can be moved forward and backward, and the swing The seat B1 is pivoted on the two side seats B31 on both sides of a carrier B3 by two pivot arms B11 and B12 on each side by a pivot portion B111. A space for the to-be-peeled is provided between the two pivot arms B11 and B12. The wafer A7 is placed in the conveying path B13 which can be pushed by the pusher clip B2. Below the carrier B3 is elevated by a side seat B33 and a back seat B34 standing on a base B32. The swing seat A base box B4 below B1 is provided with a material box B4 for holding the support A3 where the wafer A7 to be peeled is peeled off; the front end of the conveying path B13 of the swing seat B1 is provided with the positioning of the embodiment of the present invention. Device C, the pendulum seat B1 is driven by an eccentric wheel B6 driven by a driving member B5 in conjunction with a link B7 to drive the pendulum seat B1 to swing up and down. By placing the wafer A7 to be stripped behind the pendulum seat B1, The clamping portion A3 at the rear end of the strip wafer A7 is clamped by the push clip B2 and pushed forward along a straight pushing flow path until the front end of the strip wafer A7 is determined by the positioning device C. And by receiving the eccentric wheel drives the link B7 B6 drives the swing seat as B1, the rocking the article to be stripped A7 by the wafer positioning apparatus positioning portion C of the strip is folded stripped wafer A8.

請參閱圖6,本發明實施例中晶片剝折製程的定位裝置C,包括:一上定位機構C1及一下定位機構C2,其中:該上定位機構C1,設有一ㄇ型的座架C11及一設於該座架C11上的一上定位模組C12;其中,該座架C11包括一上座架C111及位於該上座架C111兩側之二側架C112、C113,該座架C11以該二側架C112、C113分別固設於該載座B3的二側座B31上;該二側架C112、C113間形成一空間C114;該上定位模組C12包括一設於該上座架C111上方的一驅動件C121以及設於該二側架C112、C113間之該空間C114中受該驅動件C121驅動可作上、下位移的一壓模C122。 Please refer to FIG. 6, a positioning device C for a wafer peeling process according to an embodiment of the present invention includes: an upper positioning mechanism C1 and a lower positioning mechanism C2, wherein: the upper positioning mechanism C1 is provided with a reed-shaped seat C11 and a An upper positioning module C12 provided on the seat frame C11; wherein, the seat frame C11 includes an upper seat frame C111 and two side frames C112 and C113 located on both sides of the upper seat frame C111, and the seat frame C11 uses the two sides Frames C112 and C113 are respectively fixed on two side seats B31 of the carrier B3; a space C114 is formed between the two side frames C112 and C113; the upper positioning module C12 includes a drive provided above the upper seat frame C111 A piece C121 and a stamper C122 in the space C114 provided between the two side frames C112 and C113 can be moved upward and downward by the driving member C121.

請參閱圖7,該上定位模組C12中的該驅動件C121係以旋轉方式驅動該上座架C111下方之一筒狀的驅動座C123,該驅動座C123筒狀的底部端緣形成一螺旋狀的環形的斜面C1231,該斜面C1231具有一高位C1232及一低位C1233,該高位C1232與該低位C1233間形成一段差C1234,該驅動座C123的旋轉中心軸向呈Z軸向,該驅動座C123的筒狀周緣輻向設有一感應件C1235,該感應件C1235並受上座架C111下方所設的一感應器C1111所感應;該壓模C122以一樞接件C124設於一固定座C125上,該固定座C125上方設有可作水平X、Y軸方向微調的一微調座C126,該微調座C126上方固設於可作上、下滑移的一滑座C127,使該滑座C127可連動該微調座C126及該固定座C125、壓模C122上、下位移,該滑座C127一側固設於上端與該上座架C111下固設的一托座C128上,另一側以一固定件1271在其上設有一滾輪C1272,該滾輪C1272的旋轉中心軸向呈X軸向;該驅動座C123受驅動旋轉時,可以其底部端緣螺旋狀的該斜面C1231抵推該滾輪C1272,使該滾輪C1272連動該滑座C127、微調座C126、固定座C125、壓模C122作上、下位移。 Please refer to FIG. 7. The driving member C121 in the upper positioning module C12 drives a cylindrical driving seat C123 below the upper seat C111 in a rotating manner. The cylindrical bottom end of the driving seat C123 forms a spiral shape. The circular bevel C1231 has a high C1232 and a low C1233. The high C1232 and the low C1233 form a difference C1234. The center of rotation of the drive base C123 is the Z axis. A cylindrical peripheral edge is provided with a sensing element C1235, and the sensing element C1235 is sensed by a sensor C1111 provided under the upper frame C111. The stamper C122 is provided on a fixed seat C125 with a pivoting member C124. Above the fixed seat C125 is a fine adjustment seat C126 which can be used for fine adjustment of the horizontal X and Y axis directions. The fine adjustment seat C126 is fixed above a slide seat C127 which can be moved up and down, so that the slide seat C127 can be linked with the Fine-adjustment seat C126, the fixed seat C125, and die C122 are moved up and down. One side of the slide seat C127 is fixed on a bracket C128 fixed at the upper end and the upper seat frame C111, and the other side is fixed by a fixing member 1271. A roller C1272 is provided thereon, and the rotation center of the roller C1272 It is in the X-axis direction; when the driving seat C123 is driven to rotate, the inclined surface C1231 at the bottom end of the driving seat C1232 can be pushed against the roller C1272, so that the roller C1272 can be linked with the slide C127, the fine adjustment seat C126, the fixed seat C125, The stamper C122 is moved up and down.

請參閱圖8、9,該壓模C122係以水平X軸向的例如螺栓之該樞接件C124螺設固定於該固定座C125的一垂直的Z軸向之立座C1251上,該樞接件C124係位於該壓模C122之Y軸向寬度的約略中央位置,且該樞接件C124穿經該壓模C122之一軸孔C1221的部位係呈樞設狀態,而僅藉該該樞接件C124一端的一頭部C1241以適當緊度在另一端螺入該立座C1251時壓擠碟形墊圈C1222,並且使該壓模C122上端部C1223與該固定座C125的一水平的頂座C1252間保持一微細小的間隙C1253,而使該壓模C122下方底部的一壓抵面C1224可以在一側受力時能以該樞接件C124為中心作適當的弧形偏擺。 Please refer to FIGS. 8 and 9. The stamper C122 is fixed on a vertical Z-axis vertical stand C1251 of the fixed seat C125 by screwing the pivot member C124 such as a bolt in a horizontal X-axis direction. The piece C124 is located at about the center of the Y-axis width of the stamper C122, and the pivotal member C124 passes through a shaft hole C1221 of the stamper C122 in a pivoted state, and only the pivotal member A head C1241 at one end of C124 squeezes the dish washer C1222 when the other end is screwed into the stand C1251 with appropriate tightness, and the upper end C1223 of the die C122 and a horizontal top seat C1252 of the fixed seat C125 are pressed. Maintaining a small gap C1253, so that a pressing surface C1224 at the bottom of the die C122 can make a proper arc deflection around the pivot member C124 when a force is exerted on one side.

請參閱圖9~11,該壓模C122的前側面C1225設有接近兩側緣的二Z軸向槽溝狀的導引槽C1226;該壓模C122的該壓抵面C1224於靠近該前側面C1225設有一內凹的Y軸向之扣槽C1227,該扣槽C1227與該前側面C1225間設有一下凸狀的抵模C1228,該抵模C1228下方底面為一平面並高於該壓抵面C1224的平面,其段差約比該條狀晶片A8;的厚度略微稍大一些;該扣槽C1227於相對該抵模C1228的另一側形成一傾斜的內緣C1229;該導引槽C1226底端與該扣槽C1227交匯貫通。 Please refer to FIGS. 9 to 11. The front side C1225 of the stamper C122 is provided with two Z-axis groove-shaped guide grooves C1226 near the edges of the two sides; the pressing surface C1224 of the stamper C122 is near the front side. C1225 is provided with a concave Y-axis buckle groove C1227. The buckle groove C1227 and the front side C1225 are provided with a convex mold C1228. The bottom surface of the mold C1228 is flat and higher than the pressing surface. The plane of C1224 has a step difference that is slightly greater than the thickness of the strip-shaped wafer A8; the buckle groove C1227 forms an inclined inner edge C1229 on the other side of the die C1228; the bottom end of the guide groove C1226 Intersect with this buckle groove C1227.

請參閱圖5、12,該下定位機構C2設有一約略矩形立方體之模座C21,該模座C21設於該載座B3的一橫設於該二側座B31間的肋部B35上,並位於該二側座B31間,且對應地位於該擺座B1輸送方向的前方固設之定位;該模座C21上表面設有一Y軸向長條凸起狀的對位部C211,而使該對位部C211與該模座C21前側面C212間形成設有一段寬度與該條狀晶片A8的X軸向寬度約略相當且較該對位部C211為低的水平長條面狀之定位部C213;該載座B3的該側座B31外側上設有氣壓接頭B311,可接設氣壓源以提供氣體自該側座B31處的該樞軸部B111上的氣嘴B312朝向該定位部C213吹氣進行清潔。 Please refer to FIGS. 5 and 12. The lower positioning mechanism C2 is provided with a substantially rectangular cube-shaped mold base C21. The mold base C21 is disposed on a rib B35 of the carrier B3 and disposed between the two side seats B31. It is located between the two side seats B31 and correspondingly located in the forward direction of the swing seat B1 in the conveying direction; the upper surface of the mold seat C21 is provided with a Y-axis long convex-shaped alignment portion C211, so that the Between the alignment portion C211 and the front side C212 of the mold base C21, a horizontal strip-shaped positioning portion C213 having a width approximately equal to the X-axis width of the strip-shaped wafer A8 and lower than the alignment portion C211 is formed. ; There is a gas pressure connector B311 on the outside of the side seat B31 of the carrier B3, and a pressure source can be connected to provide gas from the air nozzle B312 on the pivot portion B111 at the side seat B31 to blow toward the positioning portion C213 Clean it.

請參閱圖12、13,該條狀晶片A8的Y軸向長度較該模座C21及定位部C213長,而使該條狀晶片A8的該內側邊A41、A51外露於該模座C21及定位部C213的兩側之外;該對位部C211上設有接近兩側緣的二Z軸向的感應孔C214,該載座B3的該肋部B35上設有在Y1軸向相隔間距的二感應件C215,該感應件C215可經該模座C21的對位部C211上之該感應孔C214作Z軸向檢測,以檢測該定位部C213上的該條狀晶片A8狀況。 Please refer to FIGS. 12 and 13. The Y-axis length of the strip wafer A8 is longer than the mold base C21 and the positioning portion C213, and the inner sides A41 and A51 of the strip wafer A8 are exposed to the mold base C21 and The positioning portion C213 is outside of both sides; the alignment portion C211 is provided with two Z-axis sensing holes C214 near the edges of the two sides, and the rib B35 of the carrier B3 is provided with a spaced interval in the Y1 axis. Two sensing elements C215, which can be detected in the Z-axis direction through the sensing hole C214 in the alignment portion C211 of the mold base C21 to detect the condition of the strip wafer A8 on the positioning portion C213.

請參閱圖14,該對位部C211朝該定位部C213的一側形成一往後傾斜一θ角的下前上後之擋邊C216,該對位部C211朝相對於該定位部C213的另一側形成一傾斜的外緣C217。 Please refer to FIG. 14, the alignment portion C211 forms a lower front, up and down rib C216 inclined backward at an angle of θ toward one side of the positioning portion C213, and the alignment portion C211 faces another position opposite to the positioning portion C213. An inclined outer edge C217 is formed on one side.

請參閱圖13、15,當該待剝條晶片A7被由該擺座B1中推出向前時,準備被剝折的最前端該條狀晶片A8部位將前移至該定位裝置C的下定位機構C2中該模座C21的定位部C213上,該條狀晶片A8前端並抵及該擋邊C216而止位,同時如圖10、13所示被該感應件C215經由該導引槽C1226底端與該扣槽C1227交匯貫通處往上透經該導引槽C1226,以對該條狀晶片A8置放狀況執行偵測的程序;請參閱圖16,然後該上定位機構C1驅動該壓模C122下抵,使該壓模C122的該壓抵面C1224靠抵該下定位機構C2中該模座C21的上表面,並以該扣槽C1227扣罩該對位部C211,此時該壓模C122的該壓抵面C1224藉圖9中該樞接件C124所提供的受力時可自由擺動的功能,一方面可以平整貼靠該模座C21的上表面,另一方面可以使該抵模C1228底面貼靠但未壓抵該定位部C213上的該條狀晶片A8,使該條狀晶片A8被拘束限制在定位部C213上方與該抵模C1228底面間作定位,再藉該擺座B1被驅動作、上下偏擺,而將該最前端該條狀晶片A8剝折,剝折後的該條狀晶片A8則留置於該定位部C213上方與該抵模C1228底面間。 Please refer to FIGS. 13 and 15, when the strip wafer A7 to be stripped is pushed forward from the swing base B1, the strip-shaped wafer A8 which is ready to be stripped is moved forward to the lower position of the positioning device C. On the positioning portion C213 of the mold base C21 in the mechanism C2, the front end of the strip-shaped wafer A8 stops against the rib C216, and at the same time, as shown in FIGS. 10 and 13, the induction member C215 passes through the bottom of the guide groove C1226. The end and the intersection of the buckle slot C1227 pass through the guide slot C1226 upwards to perform a detection procedure for the placement status of the strip wafer A8; see FIG. 16, and then the upper positioning mechanism C1 drives the stamper. C122 is pressed down, so that the pressing surface C1224 of the stamper C122 abuts the upper surface of the die holder C21 in the lower positioning mechanism C2, and buckles the positioning portion C211 with the buckle groove C1227. At this time, the stamper The pressing surface C1224 of C122 can freely swing under the force provided by the pivot member C124 in FIG. 9. On the one hand, it can abut against the upper surface of the mold base C21 on the other hand, and on the other hand, it can make the pressing mold. C1228 The bottom surface of the strip-shaped wafer A8 is abutted but not pressed against the positioning portion C213, so that the strip-shaped wafer A8 is restricted to the positioning portion C213. The square and the bottom surface of the die C1228 are positioned, and then the pendulum seat B1 is driven and tilted up and down to peel the strip-shaped wafer A8 at the forefront, and the stripped wafer A8 is left in place. Between the top of the positioning portion C213 and the bottom surface of the die C1228.

本發明實施例晶片剝折製程的定位方法及裝置,由於該壓模C122與該模座C21構造簡單而容易加工,且該壓模C122與該模座C21之間距可作相對位移,在該條狀晶片A8部位被前移至該壓模C122與該模座C21間時,因該壓模C122與該模座C21相對開張,該條狀晶片A8部位移入對位容易,且該壓模C122與該模座C21相對閉合時,可以最適間 隙將該最前端之該條狀晶片A8部位拘束限制在該壓模C122與該模座C21間作定位,使定位更確實。 The positioning method and device for the wafer peeling process in the embodiment of the present invention, because the stamper C122 and the die holder C21 have a simple structure and are easy to process, and the distance between the stamper C122 and the die holder C21 can be relatively displaced. When the portion of the wafer A8 is moved forward between the stamper C122 and the die holder C21, since the stamper C122 and the die holder C21 are relatively opened, the stripe wafer A8 is easily moved into alignment, and the stamper C122 and When the mold base C21 is relatively closed, it can be optimally placed. The gap restricts the foremost part of the strip-shaped wafer A8 to the positioning between the stamper C122 and the die holder C21, so that the positioning is more reliable.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。 However, the above are only the preferred embodiments of the present invention. When the scope of implementation of the present invention cannot be limited by this, that is, the simple equivalent changes and modifications made according to the scope of the patent application and the description of the invention, All are still within the scope of the invention patent.

Claims (17)

一種晶片剝折製程的定位方法,包括:使一待剝條晶片被由一剝折機構的可作、上下偏擺之一擺座中推出,而使準備被剝折的最前端之一條狀晶片部位被前移至一壓模與一模座間;使該壓模與該模座相對位移,以將該最前端之該條狀晶片部位拘束限制在該壓模與該模座間作定位。 A positioning method for a wafer peeling process includes: pushing a wafer to be peeled out from a swinging mechanism capable of being operated and tilting up and down to make one of the foremost strip-shaped wafers ready to be peeled. The part is moved forward between a stamper and a die holder; the stamper and the die holder are relatively displaced to restrict the foremost strip-shaped wafer portion to be positioned between the stamper and the die holder. 如申請專利範圍第1項所述晶片剝折製程的定位方法,其中,該壓模可作上、下位移;該模座設於固設之定位。 For example, the positioning method of the wafer peeling process described in item 1 of the scope of the patent application, wherein the die can be moved up and down; the die seat is set at a fixed position. 如申請專利範圍第1項所述晶片剝折製程的定位方法,其中,該壓模與該模座相對位移時,該壓模可受力作擺動。 According to the positioning method of the wafer peeling process described in item 1 of the scope of patent application, when the stamper and the die seat are relatively displaced, the stamper can be forced to swing. 如申請專利範圍第1項所述晶片剝折製程的定位方法,其中,更包括一對該模座上一供該條狀晶片部位置放的一定位部執行吹氣的清潔程序。 The positioning method of the wafer peeling process according to item 1 of the scope of the patent application, further comprising a pair of positioning portions on the mold base for the strip-shaped wafer portion to perform a cleaning process of blowing air. 如申請專利範圍第1項所述晶片剝折製程的定位方法,其中,更包括以一感應件對該模座上一定位部上該條狀晶片部位置放狀況執行偵測的程序。 According to the positioning method of the wafer peeling process described in item 1 of the scope of the patent application, it further includes a procedure for detecting the position of the strip-shaped wafer portion on a positioning portion on a mold base by using an induction component. 一種晶片剝折製程的定位裝置,設於一可作、上下偏擺之一擺座前端;包括:一上定位機構,設有一壓模;一下定位機構,設有一模座位於該壓模下方;該壓模與該模座可作相對位移。 A positioning device for a wafer peeling process is provided at the front end of a swing seat that can be used as an upper and lower swing; including: an upper positioning mechanism provided with a stamper; a lower positioning mechanism provided with a mold seat under the stamper; The pressing die and the die base can be relatively displaced. 如申請專利範圍第6項所述晶片剝折製程的定位裝置,其中,該上定位機構設有一座架及一設於該座架上的上定位模組;該座架包括一 上座架及位於該上座架兩側之二側架;該上定位模組包括一設於該上座架上方的一驅動件以及設於該二側架間受該驅動件驅動的該壓模。 For example, the positioning device of the wafer peeling process described in item 6 of the patent application scope, wherein the upper positioning mechanism is provided with a frame and an upper positioning module provided on the seat frame; the seat frame includes a The upper seat frame and two side frames located on both sides of the upper seat frame; the upper positioning module includes a driving member disposed above the upper seat frame and the stamper driven between the two side frames and driven by the driving member. 如申請專利範圍第7項所述晶片剝折製程的定位裝置,其中,該上定位模組中的該驅動件係以旋轉方式驅動該上座架下方之一驅動座,該驅動座的底部端緣形成一螺旋狀的環形斜面抵推一滾輪,而使該壓模作上、下位移。 According to the positioning device of the wafer peeling process described in item 7 of the scope of patent application, wherein the driving member in the upper positioning module drives a driving seat below the upper seat in a rotating manner, and a bottom edge of the driving seat A helical annular inclined surface is formed to push against a roller, so that the stamper is displaced up and down. 如申請專利範圍第8項所述晶片剝折製程的定位裝置,其中,該驅動座的周緣設有一感應件,該感應件並受一感應器所感應。 According to the positioning device of the wafer peeling process described in item 8 of the scope of the patent application, wherein a periphery of the driving base is provided with a sensing element, and the sensing element is sensed by a sensor. 如申請專利範圍第6項所述晶片剝折製程的定位裝置,其中,該壓模以一樞接件設於一固定座上,該壓模下方底部的一壓抵面可以在一側受力時能以該樞接件為中心作適當的弧形偏擺;該固定座上方設有可作水平X、Y軸方向微調的一微調座。 According to the positioning device of the wafer peeling process described in claim 6 of the patent application scope, wherein the stamper is provided on a fixed base by a pivot joint, a pressing surface at the bottom of the stamper can be stressed on one side When the pivot joint is used as the center, an appropriate arc-shaped deflection can be made; a fine adjustment seat which can be used for fine adjustment of the horizontal X and Y axis directions is arranged above the fixed seat. 如申請專利範圍第10項所述晶片剝折製程的定位裝置,其中,該微調座上方固設於可作上、下滑移的一滑座,使該滑座可連動該微調座及該固定座、壓模上、下位移。 For example, the positioning device of the wafer peeling process described in claim 10 of the patent scope, wherein the upper part of the fine adjustment base is fixed on a slide base which can be moved up and down, so that the slide base can be linked with the fine adjustment base and the fixed position. Displacement of seat and die. 如申請專利範圍第11項所述晶片剝折製程的定位裝置,其中,該上定位機構設有一座架,該座架包括一上座架及位於該上座架兩側之二側架,該滑座一側固設於上端與該上座架下方固設的一托座上,另一側以一固定件在其上設有一滾輪。 For example, the positioning device of the wafer peeling process described in claim 11 of the patent application scope, wherein the upper positioning mechanism is provided with a frame, the seat frame includes an upper seat frame and two side frames on both sides of the upper seat frame, and the slide seat One side is fixed on a bracket fixed on the upper end and under the upper seat frame, and a roller is arranged on the other side with a fixing member. 如申請專利範圍第11項所述晶片剝折製程的定位裝置,其中,該壓模的前側面設有導引槽;該模座設有作檢測的感應件。 For example, the positioning device of the wafer peeling process according to item 11 of the patent application scope, wherein the front side of the stamper is provided with a guide groove; and the die base is provided with a sensing element for detection. 如申請專利範圍第6項所述晶片剝折製程的定位裝置,其中, 該壓模的一壓抵面於靠近一前側面設有一扣槽,該扣槽與該前側面間設有一抵模;該模座上表面設有一對位部,該對位部與該模座一前側面間設有一定位部。 The positioning device of the wafer peeling process according to item 6 of the patent application scope, wherein: A pressing groove of the pressing die is provided with a buckling groove near a front side, and a buckling die is provided between the buckling groove and the front side; the upper surface of the die seat is provided with a pair of positioning portions, and the positioning portion and the die seat are provided. A positioning portion is provided between a front side surface. 如申請專利範圍第11項所述晶片剝折製程的定位裝置,其中,該模座設於一載座上並位於二側座間,且位於該擺座輸送方向的前方固設之定位。 According to the positioning device of the wafer peeling process described in item 11 of the scope of the patent application, the mold base is located on a carrier and located between two side bases, and is fixedly positioned in front of the swing base in the conveying direction. 如申請專利範圍第15項所述晶片剝折製程的定位裝置,其中,該載座的該側座可接設氣壓源以提供氣體自該側座處朝向該模座的一定位部吹氣進行清潔。 According to the positioning device of the wafer peeling process described in claim 15 of the scope of the patent application, the side seat of the carrier can be connected to a pressure source to provide gas from the side seat toward a positioning portion of the mold seat. clean. 一種晶片剝折製程的定位裝置,包括:用以執行如申請專利範圍第1至5項中任一項所述晶片剝折製程的定位方法之裝置,該裝置包括:設有可作、上下偏擺之一擺座的一剝折機構、可拘束限制該條狀晶片的一壓模及一模座。 A positioning device for a wafer peeling process, comprising: a device for performing a positioning method for a wafer peeling process as described in any one of claims 1 to 5 of the scope of patent application, the device includes: A peeling mechanism of a pendulum seat can restrain a die and a die seat of the strip-shaped wafer.
TW107137378A 2018-10-23 2018-10-23 Method and device for positioning wafer stripping process TWI675426B (en)

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TW107137378A TWI675426B (en) 2018-10-23 2018-10-23 Method and device for positioning wafer stripping process
CN201811337037.8A CN111092040A (en) 2018-10-23 2018-11-12 Positioning method and device for chip peeling and folding process
CN201821852660.2U CN209056474U (en) 2018-10-23 2018-11-12 Positioning device for chip peeling and folding process

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Citations (4)

* Cited by examiner, † Cited by third party
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TW314065U (en) * 1997-01-14 1997-08-21 Yageo Corp Chip resistor stripping, arranging, and aligning machine
TW348760U (en) * 1997-01-14 1998-12-21 Yageo Corp Stripped apparatus for chip resistance
TW529615U (en) * 2002-07-30 2003-04-21 All Ring Tech Co Ltd An arrangement machine for chips
TWM448052U (en) * 2012-07-13 2013-03-01 All Ring Tech Co Ltd Chip peeling device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW314065U (en) * 1997-01-14 1997-08-21 Yageo Corp Chip resistor stripping, arranging, and aligning machine
TW348760U (en) * 1997-01-14 1998-12-21 Yageo Corp Stripped apparatus for chip resistance
TW529615U (en) * 2002-07-30 2003-04-21 All Ring Tech Co Ltd An arrangement machine for chips
TWM448052U (en) * 2012-07-13 2013-03-01 All Ring Tech Co Ltd Chip peeling device

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