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TWI400476B - Anti-reflective film with excellent scratch resistance and surface slip property - Google Patents

Anti-reflective film with excellent scratch resistance and surface slip property Download PDF

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Publication number
TWI400476B
TWI400476B TW097133215A TW97133215A TWI400476B TW I400476 B TWI400476 B TW I400476B TW 097133215 A TW097133215 A TW 097133215A TW 97133215 A TW97133215 A TW 97133215A TW I400476 B TWI400476 B TW I400476B
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group
film
refractive index
index layer
layer
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TW097133215A
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Chinese (zh)
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TW200946949A (en
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Kwang Hui Choi
Young Ho Cho
Sang Yeol Um
Moon Bok Lee
Jeong Tae Seo
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Toray Advanced Mat Korea Inc
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/418Refractive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/50Properties of the layers or laminate having particular mechanical properties
    • B32B2307/584Scratch resistance
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/746Slipping, anti-blocking, low friction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays

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  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Description

具有優異之刮擦抗性及表面滑動性質的抗反射膜Anti-reflective film with excellent scratch resistance and surface sliding properties

本發明係與一種具有優異之刮擦抗性與表面滑動性質之抗反射薄膜有關,且更明確地係與一種其中該表面摩擦係數係被降低,並提高刮擦抗性以使得該表面滑動性質更優異,藉此避免在該顯示器的位置移動以調整視角時之一輾軋聲或類似聲音,並有效地避免來自一顯示裝置表面的光反射,同時降低生產成本之具有的刮擦抗性與表面滑動性質之抗反射薄膜有關。The present invention relates to an antireflection film having excellent scratch resistance and surface sliding properties, and more specifically to a method in which the surface friction coefficient is lowered and the scratch resistance is improved to make the surface sliding property It is more excellent, thereby avoiding one of the rolling sounds or the like when the position of the display is moved to adjust the viewing angle, and effectively avoiding light reflection from the surface of a display device, while reducing the production cost and having scratch resistance and The anti-reflective film of the surface sliding property is related.

大體而言,一例如電漿顯示面板(PDP)、一陰極射線管(CRT)、一液晶顯示裝置(LCD)等等之顯示器,面對了自外部而入射之光會反射,而使的所顯示的影像難以被看見的問題。特別是在最近的平面顯示器已經變得更大時,解決前述之問題就變得更重要。In general, a display such as a plasma display panel (PDP), a cathode ray tube (CRT), a liquid crystal display device (LCD), or the like faces the light that is incident from the outside and is reflected. The problem that the displayed image is difficult to see. Especially when recent flat panel displays have become larger, it has become more important to solve the aforementioned problems.

為了解決前述之問題,一抗反射或是防眩光處理迄今已經被應用於各種不同的顯示裝置上。藉由一具體例的方式,抗反射薄膜係被應用至各種不同的顯示裝置上。第1圖例示說明一種抗反射薄膜之原理。In order to solve the aforementioned problems, an anti-reflection or anti-glare treatment has hitherto been applied to various display devices. By way of a specific example, the antireflective film is applied to a variety of different display devices. Figure 1 illustrates the principle of an antireflective film.

此一抗反射薄膜已經藉著將一低折射率之材料(MgF2 )塗覆成在一基礎薄膜上的薄膜之方法,或是藉著將一具有高折射率之材料[摻雜有錫之氧化銦(ITO)、摻雜有錫之氧化銻(ATO)、ZnO、TiO2 ,等等]與一具有低折射率之材料(MgF2 、SiO2 ,等等),經由例如沈積、濺散或類似得乾式 塗敷製程來交互地堆疊於一基礎薄膜之方法來加以製造。然而,該乾式塗敷製程過於昂貴而無法將該抗反射薄膜加以商業地製造並行銷。The antireflection film has been coated with a low refractive index material (MgF 2 ) as a film on a base film, or by a material having a high refractive index [doped with tin indium oxide (ITO), doped with antimony (ATO) tin, ZnO, TiO 2, etc.] with a material having a low refractive index (MgF 2, SiO 2, etc.), for example via deposition, sputtering Or a method similar to a dry coating process to alternately stack on a base film. However, the dry coating process is too expensive to commercially manufacture the antireflective film in parallel.

為了要解決前述之缺點,最近濕式塗敷製程已經針對該抗反射薄膜的製造,以及其之實際的商業用途進行嘗試。然而,以該濕式塗敷製程來製造之反射薄膜比起以乾式塗敷製程所製造者的刮擦抗性將會惡化。In order to address the aforementioned shortcomings, recent wet coating processes have been attempted for the manufacture of the antireflective film, as well as its practical commercial use. However, the reflective film produced by the wet coating process will be deteriorated in scratch resistance compared to those manufactured by the dry coating process.

該抗反射薄膜係被提供在例如該PDP、該CRT、該LCD等等之該顯示裝置的最外部位置中,並且具有避免影像品質由於反射來自外部的光而變差之抗反射性、避免外部污染物質之抗污染性、抵抗由於外部的機械摩擦作用所造成的刮擦現象,等等之主要特性。The anti-reflection film is provided in an outermost position of the display device such as the PDP, the CRT, the LCD, or the like, and has an anti-reflection property that prevents image quality from being deteriorated by reflecting light from the outside, and avoids external The main characteristics of the pollution resistance of pollutants, the scratching caused by external mechanical friction, and so on.

除了該等主要特性之外,表面滑動性質最近已經變得重要。如果該表面滑動性質很差,在該顯示裝置被清理或是被移動以調整一視角的時候,就會因為在該架框與抗反射薄膜之間的摩擦而產生輾軋聲,因而使用者就可能會抱怨。In addition to these main characteristics, surface sliding properties have recently become important. If the sliding property of the surface is poor, when the display device is cleaned or moved to adjust a viewing angle, the rolling sound is generated due to the friction between the frame and the anti-reflection film, so the user May complain.

因此,除了前述之主要特性之外該抗反射薄膜必須有具良好的表面滑動性質,而因此將需要又一抗反射薄膜。Therefore, in addition to the above-mentioned main characteristics, the antireflection film must have good surface sliding properties, and thus a further antireflection film will be required.

發明簡要說明Brief description of the invention

本發明係被構思以解決上述之問題,而本發明之一目的係要提供一具有優異之刮擦抗性以及表面滑動性質之抗反射薄膜,其所具有之優異之刮擦抗性以及表面滑動性質 可以有效地避免來自一顯示裝置表面的光反射並同時降低生產成本。The present invention has been conceived to solve the above problems, and it is an object of the present invention to provide an antireflection film having excellent scratch resistance and surface sliding properties, which has excellent scratch resistance and surface sliding. nature It is possible to effectively avoid light reflection from the surface of a display device while reducing production costs.

本發明的上述與進一步之目的和優點,將可在閱讀下列的參照該等圖式之例示說明本發明的較佳具體例之描述內容下,而變得更為明顯。The above and further objects and advantages of the present invention will become more apparent from the written description of the appended claims.

前述目的係藉著提供一具有優異之刮擦抗性與表面滑動性質之抗反射薄膜來達成,其中一包含有一(甲基)丙烯酸酯化合物之硬質塗層110、一包含有一黏合劑樹脂與一導電性顆粒之高折射率層120,以及一包含氟化合物之低折射率層130係被依序堆疊在一基礎薄膜100的至少一側邊上,其中該低折射率層130的表面係具有細微的不平整,並且在該低折射率層130側邊上之靜磨擦係數係等於或少於0.5而一動磨擦係數係等於或少於0.7。The foregoing objects are achieved by providing an antireflection film having excellent scratch resistance and surface sliding properties, wherein a hard coating 110 comprising a (meth) acrylate compound, a resin comprising a binder and a The high refractive index layer 120 of the conductive particles, and a low refractive index layer 130 containing a fluorine compound are sequentially stacked on at least one side of the base film 100, wherein the surface of the low refractive index layer 130 has a fineness The unevenness is, and the static friction coefficient on the side of the low refractive index layer 130 is equal to or less than 0.5 and the dynamic friction coefficient is equal to or less than 0.7.

在此,該低折射率層130相對於100份之重量的黏合劑樹脂係包含有15至25份之重量的二氧化矽。Here, the low refractive index layer 130 contains 15 to 25 parts by weight of cerium oxide with respect to 100 parts by weight of the binder resin.

較佳地,本發明之特徵在於該反射薄膜中之霧度值係少於3.0%。Preferably, the invention is characterized in that the haze value in the reflective film is less than 3.0%.

較佳地,本發明之特徵在於該抗反射薄膜在380nm的波長範圍中,具有一少於5%之透光度。Preferably, the present invention is characterized in that the antireflection film has a transmittance of less than 5% in the wavelength range of 380 nm.

較佳地,本發明之特徵在於該硬質塗層110的厚度係介於1μm與50μm之間。Preferably, the present invention is characterized in that the thickness of the hard coat layer 110 is between 1 μm and 50 μm.

較佳地,本發明之特徵在於該高折射率層120的厚度厚度係介於0.01μm與1.0μm之間,而該低折射率層130的厚度厚度係介於0.01μm與1.0μm之間。Preferably, the present invention is characterized in that the thickness of the high refractive index layer 120 is between 0.01 μm and 1.0 μm, and the thickness of the low refractive index layer 130 is between 0.01 μm and 1.0 μm.

較佳地,本發明之特徵在於該高折射率層120中之導電性顆粒係為金屬氧化物顆粒。Preferably, the present invention is characterized in that the conductive particles in the high refractive index layer 120 are metal oxide particles.

較佳地,本發明之特徵在於該高折射率層120中之該黏合劑樹脂與該導電性顆粒的重量比率係介於10/90至30/70。Preferably, the present invention is characterized in that the weight ratio of the binder resin to the conductive particles in the high refractive index layer 120 is between 10/90 and 30/70.

較佳地,本發明之特徵在於該低折射率層130的氟化合物係包含有在該主鏈中具有乙烯醚結構之氟共聚物。Preferably, the present invention is characterized in that the fluorine compound of the low refractive index layer 130 contains a fluorocopolymer having a vinyl ether structure in the main chain.

較佳地,本發明之特徵在於該低折射率層130係包含有顆粒尺寸為0.001μm至0.2μm的二氧化矽顆粒。Preferably, the present invention is characterized in that the low refractive index layer 130 contains cerium oxide particles having a particle size of from 0.001 μm to 0.2 μm.

較佳地,本發明之特徵在於該二氧化矽顆粒具有一係為二或更多顆粒尺寸之成分類型。Preferably, the invention is characterized in that the cerium oxide particles have a component type which is two or more particle sizes.

較佳地,本發明之特徵在於該低折射率層130進一步含有以下列的化學式1來表示之矽烷連接劑或是其之水解物或其之反應物:[化學式1]R(1)a R(2)b SiX4-(a+b) , 其中,R(1)或R(2)係分別地為一具有烷基、烯基、烯丙基或是鹵素基之烴基基團、環氧基、胺基、氫硫基、甲基丙烯醯氧基,或是氰基;X係為一選自於由烷氧基、烷氧-烷氧基、鹵素基或是醯氧基之可以被水解之取代基;a與b係分別地為0、1或2;而且(a+b)係為1、2或3。Preferably, the present invention is characterized in that the low refractive index layer 130 further contains a decane linking agent represented by the following Chemical Formula 1 or a hydrolyzate thereof or a reactant thereof: [Chemical Formula 1] R(1) a R (2) b SiX 4-(a+b) wherein R(1) or R(2) are each independently a hydrocarbyl group having an alkyl group, an alkenyl group, an allyl group or a halogen group, an epoxy group, An amine group, a thiol group, a methacryloxy group, or a cyano group; the X system is one selected from the group consisting of an alkoxy group, an alkoxy-alkoxy group, a halogen group or a decyloxy group. Substituents; a and b are 0, 1, or 2, respectively; and (a+b) is 1, 2, or 3.

同時,較佳地,本發明之特徵在於該低折射率層中130的該氟化物,係進一步包含有以下列的化學式2來表示之具有矽烷氧基的氟樹脂或是其等之水解物: [化學式2]R(3)c R(4)d SiX4-(c+d) , 其中,R(3)或R(4)係分別地為一具有氟化烷基、烯基、烯丙基、甲基丙烯醯氧基,或是(甲基)丙烯醯基之烴基基團;X係為一選自於由烷氧基、烷氧-烷氧基、鹵素基或是醯氧基之可以被水解之取代基;c與d係分別地為0、1、2或3;並且(c+d)係為1、2或3。Meanwhile, preferably, the present invention is characterized in that the fluoride of 130 in the low refractive index layer further contains a fluororesin having a decyloxy group represented by the following Chemical Formula 2 or a hydrolyzate thereof: [Chemical Formula 2] R(3) c R(4) d SiX 4-(c+d) wherein R(3) or R(4) is a fluorinated alkyl group, an alkenyl group, an allyl group, respectively. a methacryloxy group, or a (meth) acryloyl group; the X system is selected from an alkoxy group, an alkoxy-alkoxy group, a halogen group or a decyloxy group. Hydrolyzed substituent; c and d are 0, 1, 2 or 3, respectively; and (c+d) is 1, 2 or 3.

圖式簡要說明Brief description of the schema

本發明的特徵與優點可以由下列之參照該等隨附的圖式,來加以詳細說明之本發明的較佳具體例而變得明顯,其中:第1圖顯示一抗反射薄膜之原理;第2圖係為概要地顯示依據本發明之該抗反射薄膜的堆疊結構之薄膜的剖面圖。The features and advantages of the present invention will become apparent from the following detailed description of the appended claims. 2 is a cross-sectional view schematically showing a film of a stacked structure of the antireflection film according to the present invention.

較佳具體例之詳細描述Detailed description of preferred embodiments

在下文中,本發明將參照該等具體例以及該等隨附的圖式來加以詳細描述。對習於此藝者而言,那些具體例顯然僅是用於更詳細地例示說明本發明,而本發明的範圍並未侷限於該等具體例。In the following, the invention will be described in detail with reference to the specific examples and the accompanying drawings. For those skilled in the art, the specific examples are obviously only for illustrating the present invention in more detail, and the scope of the present invention is not limited to the specific examples.

依據本發明的一具體例之具有優異之刮擦抗性和表面滑動性質之抗反射薄膜,該表面的摩擦係數係因此被降低以增進刮擦抗性,而該表面的滑動性質係為優異的藉以避免在該顯示裝置的位置被移動以調整一檢視角度或類似 動作時之一輾軋聲,並降低該生產成本。According to an embodiment of the present invention, an antireflection film having excellent scratch resistance and surface sliding properties, the coefficient of friction of the surface is thereby lowered to improve scratch resistance, and the sliding property of the surface is excellent. By avoiding being moved at the position of the display device to adjust a viewing angle or the like One of the action moments is rolling and reducing the production cost.

因此,依據本發明的一具體例之該具有優異之刮擦抗性和表面滑動性質之抗反射薄膜,係被施加至使用一例如電漿顯示面板、一液晶顯示器等等的大尺寸電視之前側表面上。Therefore, the antireflection film having excellent scratch resistance and surface sliding property according to a specific example of the present invention is applied to the front side of a large-sized television using, for example, a plasma display panel, a liquid crystal display or the like. On the surface.

第2圖係為概要地顯示該抗反射薄膜的堆疊結構之一抗反射薄膜的剖面圖。如在該圖式中所顯示的,一硬質塗層110、一高折射率層(以下也稱為"導電性層")120以及一低折射率層(以下也稱為"樹脂層")130係被依序堆疊在該基材薄膜100上(在下文中100+110+120+130也被稱為"堆疊薄膜")。同時,一保護性薄膜140以及在基材薄膜100的另一側邊上之一黏附層150以及一個釋放薄膜160都可以被加以堆疊。Fig. 2 is a cross-sectional view showing an antireflection film which is an outline of a stacked structure of the antireflection film. As shown in the drawing, a hard coat layer 110, a high refractive index layer (hereinafter also referred to as "conductive layer") 120, and a low refractive index layer (hereinafter also referred to as "resin layer") 130 are shown. The substrates are sequentially stacked on the base film 100 (hereinafter, 100+110+120+130 is also referred to as a "stacked film"). Meanwhile, a protective film 140 and an adhesive layer 150 and a release film 160 on the other side of the substrate film 100 may be stacked.

依據本發明的一具體例,該低折射率層的表面滑動性質係被降低,以使得該抗反射薄膜在一反射性外觀上係為優異的,其中在該視角被加以調整時,該刮擦抗性可以被改善而摩擦雜音可以被抑制。同時,該反射薄膜在反射性外觀上係為優異的,並且係具有低表面反射率以及中性色彩。According to a specific example of the present invention, the surface sliding property of the low refractive index layer is lowered so that the antireflection film is excellent in a reflective appearance, wherein the scratch is obtained when the viewing angle is adjusted Resistance can be improved and friction noise can be suppressed. At the same time, the reflective film is excellent in reflective appearance and has low surface reflectance and neutral color.

為了要達成此一目的,本案發明人一再地進行研究並發現了一種其中硬質塗層110、高折射率層(以下也稱為"導電性層")120以及低折射率層(以下也稱為"樹脂層")130係被依序堆疊在該基礎薄膜100的至少一側邊上之該抗反射薄膜,其中在該在低折射率層130的表面摩擦係數中, 靜磨擦係數係為0.5或更少而動磨擦係數係為0.7或更少。In order to achieve this object, the inventors of the present invention have repeatedly conducted research and found a hard coat layer 110, a high refractive index layer (hereinafter also referred to as "conductive layer") 120, and a low refractive index layer (hereinafter also referred to as The "resin layer" 130 is sequentially stacked on the at least one side of the base film 100, wherein the surface friction coefficient of the low refractive index layer 130 is The static friction coefficient is 0.5 or less and the dynamic friction coefficient is 0.7 or less.

同時,本發明也想要藉著將上述抗反射薄膜黏結至一影像顯示側邊或是一前側面板的該表面而將一顯示裝置加以覆蓋。At the same time, the present invention also intends to cover a display device by bonding the antireflection film to an image display side or a surface of a front side panel.

依據本發明的一具體例,包含有該甲基丙烯酸化合物之該硬質塗層110、包含有導電性無機顆粒之該高折射率層120,以及包含有該氟化合物及/或該中空二氧化矽顆粒之低折射率層130,係被堆疊以在該基礎薄膜上形成一經堆疊的薄膜,並且該經堆疊的薄膜之表面係具有係為0.7或更少之動摩擦係數(μk),以及係為0.5或更少之靜摩擦係數(μs),藉以形成可以改良該表面滑動性質與該刮擦抗性以及良好的機械性之抗反射薄膜。此外,該摩擦係數係被降低以改善該滑動性質,因而在該顯示裝置被移動以調整該視角時摩擦雜音可以被抑制。舉例來說,該抗反射薄膜係被應用於一例如電漿顯示面板、一液晶顯示器等等之平面面板的大尺寸電視之前側表面上。According to a specific example of the present invention, the hard coat layer 110 comprising the methacrylic compound, the high refractive index layer 120 containing conductive inorganic particles, and the fluorine compound and/or the hollow ceria are contained. The low refractive index layer 130 of the particles is stacked to form a stacked film on the base film, and the surface of the stacked film has a dynamic friction coefficient (μk) of 0.7 or less, and is 0.5. Or less static friction coefficient (μs), thereby forming an anti-reflection film which can improve the surface sliding property and the scratch resistance as well as good mechanical properties. Further, the coefficient of friction is lowered to improve the sliding property, and thus the friction noise can be suppressed when the display device is moved to adjust the angle of view. For example, the anti-reflective film is applied to a front side surface of a large-sized television such as a plasma display panel, a liquid crystal display or the like.

該用於依據本發明之具有優異之刮擦抗性與表面滑動性質之該抗反射薄膜的基材薄膜100,係較佳地具有一高透光度與低霧度值,以將該基材薄膜100用來作為一顯示裝置的元件(在下文中係被稱為'顯示元件')。舉例來說,在400-800nm的波長範圍內之該透光度係較佳地為40%或更多,更佳地為60%或更多。同時,該霧度值係較佳地為5%或更少量,更佳地為3%或更少。在上述條件中之一或二者未被滿足時,所產生之用來作為顯示元件的薄膜就易於缺 乏影像銳利度。同時,為了要達成滿足銳利度之效果,該可生產之範圍的透光度上限係大約為99.5%而該霧度值之下限中則大約為0.1%。The substrate film 100 for the antireflection film having excellent scratch resistance and surface sliding properties according to the present invention preferably has a high transmittance and a low haze value to the substrate The film 100 is used as an element of a display device (hereinafter referred to as a 'display element'). For example, the transmittance in the wavelength range of 400 to 800 nm is preferably 40% or more, more preferably 60% or more. Meanwhile, the haze value is preferably 5% or less, more preferably 3% or less. When one or both of the above conditions are not satisfied, the resulting film used as a display element is liable to be missing. Lack of image sharpness. Meanwhile, in order to achieve the effect of satisfying the sharpness, the upper limit of the transmittance of the usable range is about 99.5% and the lower limit of the haze value is about 0.1%.

該基材薄膜100並未侷限於特定之類型。其可以適當地選自於用於已知的塑膠基材薄膜的樹脂材料。The base film 100 is not limited to a specific type. It may be suitably selected from resin materials used for known plastic substrate films.

用於基材薄膜100之典型的樹脂材料係為具有以下單元之聚合物或共聚物,該單元係選自於一由酯類、乙烯、丙烯、二乙酸、三乙酸、苯乙烯、碳酸鹽、甲基戊烯、碸類、乙醚乙基酮、醯亞胺、氟、尼龍、丙烯酸、脂肪環狀烯烴等等所構成之群組。A typical resin material for the base film 100 is a polymer or copolymer having the following units selected from the group consisting of esters, ethylene, propylene, diacetic acid, triacetic acid, styrene, carbonate, A group consisting of methylpentene, anthracene, ethyl ether ethyl ketone, quinone imine, fluorine, nylon, acrylic acid, aliphatic cyclic olefin, and the like.

較佳地,在前述的樹脂中需要具有以下單元之聚合物或共聚物,該等單元係選自於由例如聚對苯二甲二乙酯之酯類、例如三醋酸纖維素之乙酸酯類、例如聚甲基丙烯酸甲酯之丙烯酸酯類等等所構成之群組。其等係為較佳的理由在於其等具有非常均勻之透光性、強度與厚度。尤其是,該基材薄膜100係較佳地依據透光性、霧度值以及機械性質,而以具有酯類的單元之聚合物所製成。Preferably, a polymer or copolymer having the following units is selected from the foregoing resins selected from the group consisting of esters of, for example, polyethylene terephthalate, such as cellulose acetate triacetate. For example, a group consisting of polymethyl methacrylate acrylates and the like. The reason why they are preferred is that they have a very uniform light transmittance, strength and thickness. In particular, the base film 100 is preferably made of a polymer having a unit of an ester, depending on light transmittance, haze value, and mechanical properties.

此等聚酯樹脂的具體例包括有聚對苯二甲二乙酯、聚乙烯-2,6-萘二甲酸、聚對苯二甲酸丁二酯,聚乙烯-α,β-雙(2-氯酚基)乙烷-4,4'-二羧酸,等等。同時,只要該等成分未超過20莫耳%,該等二羧酸成分或是二醇成分就可以與此等聚酯共聚合。在其等之中,聚對苯二甲二乙酯通常在品質、經濟效率性等等上係為特別較佳的。Specific examples of such polyester resins include polyethylene terephthalate, polyethylene-2,6-naphthalenedicarboxylic acid, polybutylene terephthalate, polyethylene-α,β-bis(2- Chlorophenolyl)ethane-4,4'-dicarboxylic acid, and the like. Meanwhile, as long as the components do not exceed 20 mol%, the dicarboxylic acid component or the diol component may be copolymerized with the polyesters. Among them, polyethylene terephthalate is generally particularly preferred in terms of quality, economic efficiency, and the like.

其僅能使用此等組成樹脂成分之一種類型或是二或 更多類型之組合。It can only use one type of these constituent resin components or two or A combination of more types.

同時,用於依據本發明之具有優異之刮擦抗性與表面滑動性質之該抗反射薄膜的該基材薄膜100的厚度,並未被侷限於一特定之數值。然而,基於透光度、霧度值與機械性質,該厚度通常係落在5與800μm之間,較佳地為落在10與250μm之間。同時,該基材薄膜100可以藉由已知的方式來將二或更多片之薄膜連結而加以生產。Meanwhile, the thickness of the base film 100 used for the antireflection film having excellent scratch resistance and surface sliding properties according to the present invention is not limited to a specific value. However, based on the transmittance, haze value and mechanical properties, the thickness generally falls between 5 and 800 μm, preferably between 10 and 250 μm. Meanwhile, the base film 100 can be produced by joining two or more sheets of the film in a known manner.

同時,在形成該硬質塗層110之前該基材薄膜100可以經過表面處理(舉例來說,藉由電暈放電、輝光放電、燃燒作用、蝕刻作用、或粗糙化作用,等等)。同時,為了增強黏附作用,該硬質塗層110可以在該施加一作為初始層之塗層(舉例來說,具有聚氨基甲酸酯、聚酯、聚酯丙烯酸酯、聚氨基甲酸丙烯酸酯、聚環氧丙烯酸酯,鈦酸化合物,等等之塗層)之後被形成於該基材薄膜的表面上。特別是,藉由施加一作為初始層之組成物可以提高黏附性,以及例如耐熱性、防水性等等之耐久性也可以被提高,該組成物包含有以一丙烯化合物來接枝至具有一親水性基團之該聚酯樹脂以及交聯劑的共聚物,以將所產生之薄膜用來作為一基材薄膜100。Meanwhile, the base film 100 may be subjected to surface treatment (for example, by corona discharge, glow discharge, combustion, etching, or roughening, etc.) before the formation of the hard coat layer 110. Meanwhile, in order to enhance the adhesion, the hard coat layer 110 may apply a coating as an initial layer (for example, having polyurethane, polyester, polyester acrylate, polyurethane acrylate, poly A coating of an epoxy acrylate, a titanate compound, or the like) is then formed on the surface of the substrate film. In particular, the adhesion can be improved by applying a composition as an initial layer, and durability such as heat resistance, water repellency, and the like can be improved, and the composition contains a propylene compound grafted to have a The polyester resin of the hydrophilic group and the copolymer of the crosslinking agent are used to use the resulting film as a substrate film 100.

在依據本發明之具有優異之刮擦抗性與表面滑動性質之該抗反射薄膜中的該硬質塗層110,係產生在該基材薄膜100上。該層次110基本上應包含有一(甲基)丙烯酸酯化合物。該丙烯酸酯化合物係藉著以活化射線來加以照射而進行自由基聚合作用,並藉此改善所產生之薄膜的耐溶劑 性或是硬度。明確地說,該甲基丙烯酸酯化合物之一具體例係為一單官能基丙烯酸酯化合物,例如甲基(甲基)丙烯酸酯、正-丁基(甲基)丙烯酸酯、聚酯(甲基)丙烯酸酯、月桂基(甲基)丙烯酸酯、羥乙基(甲基)丙烯酸酯、羥丙基(甲基)丙烯酸酯等等。同時,因為該多官能基丙烯酸酯化合物在一個分子中具有二或更多個可以改善耐溶劑性的(甲基)烯丙醯基,其等係特別地適合於本發明。該多官能基丙烯酸酯化合物之一特殊具體例係為異戊四醇三(甲基)丙烯酸酯、異戊四醇四(甲基)丙烯酸酯、二異戊四醇三(甲基)丙烯酸酯、二異戊四醇四(甲基)丙烯酸酯、二異戊四醇五(甲基)丙烯酸酯、二異戊四醇六(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯等等。其僅能使用此等單體之一種類型或是二或更多類型之組合。The hard coat layer 110 in the antireflection film having excellent scratch resistance and surface sliding properties according to the present invention is produced on the base film 100. This level 110 should essentially comprise a (meth) acrylate compound. The acrylate compound is subjected to radical polymerization by irradiation with an actinic ray, thereby improving the solvent resistance of the resulting film. Sex or hardness. Specifically, one of the methacrylate compounds is specifically a monofunctional acrylate compound such as methyl (meth) acrylate, n-butyl (meth) acrylate, polyester (methyl Acrylate, lauryl (meth) acrylate, hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, and the like. Meanwhile, since the polyfunctional acrylate compound has two or more (meth)allyl groups which can improve solvent resistance in one molecule, it is particularly suitable for the present invention. A specific specific example of one of the polyfunctional acrylate compounds is pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, diisopentyl alcohol tri(meth)acrylate. , diisopentyl alcohol tetra (meth) acrylate, diisopentaerythritol penta (meth) acrylate, diisopentaerythritol hexa (meth) acrylate, trimethylolpropane tri (methyl) Acrylate and so on. It can only use one type of these monomers or a combination of two or more types.

該用於形成本發明中之該硬質塗層110的構成樹脂成分,可以包含有例如烷基矽酸鹽與其之水解物、膠體二氧化矽、乾燥二氧化矽、濕潤二氧化矽、或是三氧化鈦等等,以及被分散於膠體中之二氧化矽顆粒的無機顆粒,以改善該硬質塗層110的硬度。The constituent resin component for forming the hard coat layer 110 in the present invention may contain, for example, an alkyl phthalate and a hydrolyzate thereof, colloidal cerium oxide, dry cerium oxide, wet cerium oxide, or three. Titanium oxide or the like, and inorganic particles of the cerium oxide particles dispersed in the colloid to improve the hardness of the hard coat layer 110.

該硬質塗層110的厚度係適當地依據其之用途來選定=,但典型地係為1μm至50μm,較佳地為2μm至30μm。The thickness of the hard coat layer 110 is appropriately selected depending on the use thereof, but is typically from 1 μm to 50 μm, preferably from 2 μm to 30 μm.

如果該硬質塗層110的厚度係少於一μm,該層次110的表面硬度將會不足,所以層次110可能會易於被損害而因此並非是較佳的。同時,如果該層次110的厚度是係超過50μm,透光度將會減低而導致霧度值的增加。該經固化 的薄膜也會是脆弱的,而會在該硬質塗層110被彎曲時發生斷解。因此,該少於1μm或超過50μm之厚度並非是較佳的。If the thickness of the hard coat layer 110 is less than one μm, the surface hardness of the layer 110 will be insufficient, so the layer 110 may be easily damaged and thus is not preferred. Meanwhile, if the thickness of the layer 110 is more than 50 μm, the transmittance will be lowered to cause an increase in the haze value. Cured The film will also be fragile and will break when the hard coat 110 is bent. Therefore, the thickness of less than 1 μm or more than 50 μm is not preferable.

在依據本發明之具有優異之刮擦抗性與表面滑動性質之該抗反射薄膜中的該導電性層120,係被形成於該硬質塗層120上。該導電性層120係基本上包含有導電性顆粒與黏合劑成分。本發明的導電性顆粒包括有金屬顆粒或金屬氧化物顆粒。在其等之中,金屬氧化物顆粒因為其等之高透光性而係為較佳地。別地較佳的金屬氧化物顆粒係為氧化銻錫(ATO)顆粒、氧化銻鋅顆粒、氧化銦錫(ITO)顆粒、氧化鋅/氧化鋁顆粒以及氧化銻顆粒。更佳地為氧化銦錫(ITO)顆粒與氧化銻錫(ATO)顆粒。The conductive layer 120 in the antireflection film having excellent scratch resistance and surface sliding properties according to the present invention is formed on the hard coat layer 120. The conductive layer 120 basically contains conductive particles and a binder component. The conductive particles of the present invention include metal particles or metal oxide particles. Among them, metal oxide particles are preferred because of their high light transmittance. Other preferred metal oxide particles are antimony tin oxide (ATO) particles, cerium oxide particles, indium tin oxide (ITO) particles, zinc oxide/alumina particles, and cerium oxide particles. More preferably, it is indium tin oxide (ITO) particles and antimony tin oxide (ATO) particles.

較佳地,所使用之上述的導電性顆粒之平均主要顆粒尺寸係不超過0.5μm(以BET方法所測量之球體相對直徑),但是更佳地係介於0.001和0.3μm之間,又更佳地係介於0.005和0.2μm之間。如果該平均主要顆粒尺寸比上述尺寸大,該等顆粒將會減低所產生之薄膜(導電性層120)的透光性。如果其係比上述尺寸小,該顆粒將可能會易於濃縮,所以所產生之薄膜(導電性層120)的霧度值將會增加。其因此在任一情況中都難以得到所需之霧度值。Preferably, the above-mentioned conductive particles used have an average primary particle size of not more than 0.5 μm (the relative diameter of the sphere measured by the BET method), but more preferably between 0.001 and 0.3 μm, and still more The preferred system is between 0.005 and 0.2 μm. If the average primary particle size is larger than the above size, the particles will reduce the light transmittance of the resulting film (conductive layer 120). If the size is smaller than the above size, the particles may be easily concentrated, so that the haze value of the resulting film (conductive layer 120) will increase. It is therefore difficult in any case to obtain the desired haze value.

在該導電性層120中所包含之黏合劑成分係為丙烯酸酯化合物。該(甲基)丙烯酸化合物係可以藉由照射活性射線之方式而以自由基聚合並且係為較佳的,因為其可以有利地改良該所產生的薄膜之耐溶劑性或硬度。該在一分子 中具有二或更多(甲基)烯丙醯基之多官能基(甲基)丙烯酸化合物,可以改良耐溶劑性而因此在本發明中係為特別較佳的。該化合物之一具體例係為包括有異戊四醇三(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、甘油三(甲基)丙烯酸酯、經修飾的乙烯三羥甲基丙烷三(甲基)丙烯酸酯、三-(2-羥乙基)-異氰酸酯三(甲基)丙烯酸酯等等之三官能基(甲基)丙烯酸酯,以及包括有異戊四醇四(甲基)丙烯酸酯、二異戊四醇五(甲基)丙烯酸酯、二異戊四醇六(甲基)丙烯酸酯等等的四-或更多官能基之(甲基)丙烯酸酯。The binder component contained in the conductive layer 120 is an acrylate compound. The (meth)acrylic compound can be radically polymerized by irradiation of an active ray and is preferred because it can advantageously improve the solvent resistance or hardness of the resulting film. The one molecule Among the polyfunctional (meth)acrylic compounds having two or more (meth)allyl groups, the solvent resistance can be improved, and thus it is particularly preferable in the present invention. A specific example of the compound includes isopentaerythritol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, glycerol tris(meth)acrylate, modified ethylene trishydroxyl Trifunctional (meth) acrylate of methyl propane tri(meth) acrylate, tris-(2-hydroxyethyl)-isocyanate tri(meth) acrylate, and the like, and isopentaerythritol IV A (meth) acrylate having four or more functional groups of (meth) acrylate, diisopentaerythritol penta (meth) acrylate, diisopentaerythritol hexa (meth) acrylate, and the like.

包含在該導電層120中之該黏合劑成分,可以是具有例如羧酸基、磷酸鹽、硫酸基等等之一酸性官能基,以改善該等顆粒之可分散性。明確地說,該具有該酸性官能基之單體的一具體例係為例如丙烯酸、甲基丙烯酸、巴豆酸、2-甲基烯丙醯氧乙基琥珀酸以及2-甲基烯丙醯氧乙基苯二甲酸、例如單(2-烯丙醯氧乙基)酸式磷酸鹽與二苯基-2-(甲基)烯丙醯氧乙基磷酸鹽和2-硫酯(甲基)丙烯酸酯之磷酸(甲基)丙烯酸酯等等。此外,其可以使用一帶有極性化學鍵之該(甲基)丙烯酸酯化合物,例如一醯胺鍵結、胺基甲酸酯鍵結、醚鍵結,等等。同時,例如胺基甲酸酯(甲基)丙烯酸酯寡聚物之該具有一胺基甲酸酯鍵之樹脂係特別為較佳的,因為其具有一較高的極性並且可以導致良好的顆粒可分散性。The binder component contained in the conductive layer 120 may be an acidic functional group having, for example, a carboxylic acid group, a phosphate group, a sulfate group or the like to improve the dispersibility of the particles. Specifically, a specific example of the monomer having the acidic functional group is, for example, acrylic acid, methacrylic acid, crotonic acid, 2-methylallyloxyethyl succinic acid, and 2-methylallyloxyl Ethyl phthalic acid, for example, mono(2-allyl oxyethyl) acid phosphate with diphenyl-2-(methyl)allyl oxyethyl phosphate and 2-thioester (methyl) Acrylate phosphate (meth) acrylate and the like. Further, it may use a (meth) acrylate compound having a polar chemical bond such as a monoamine bond, a urethane bond, an ether bond, or the like. Meanwhile, the resin having a urethane bond such as a urethane (meth) acrylate oligomer is particularly preferable because it has a high polarity and can cause good particles. Dispersibility.

在形成本發明的硬質塗層110與導電性層120的時候,可以使用一起始劑以進一步促進該所施加的黏合劑成 分之固化作用。該起始劑係被用來藉由自由基反應、陽離子反應、陰離子反應、等等方式,起始或促進所施加之黏合劑成分之聚合作用及/或交聯作用,並且其可以是任何傳統上已知的光聚合作用起始劑。In forming the hard coat layer 110 of the present invention and the conductive layer 120, an initiator may be used to further promote the applied adhesive. The solidification effect. The initiator is used to initiate or promote polymerization and/or crosslinking of the applied binder component by means of a radical reaction, a cationic reaction, an anionic reaction, etc., and it may be any conventional A known photopolymerization initiator.

明確地說,該起始劑可以是例如甲基二硫代胺基甲酸鈉硫化物、單硫化苯基苯、單硫化二苯并噻唑,等等之硫化物;例如噻吨酮(thioxanthone)、2-乙基噻吨酮、2-氯基噻吨酮以及2,4-二乙基噻吨酮之噻吨酮衍生物;例如腙與偶氮雙異丁腈等等之偶氮化合物;例如重氮苯鹽等等之重氮化合物;例如安息香、安息香甲醚、安息香乙醚、二苯甲酮、二甲基胺基二苯甲酮、四甲基二胺基二苯甲酮、蒽醌、t-丁基蒽醌、2-甲基蒽醌、2-乙基蒽醌、2-胺基蒽醌、2-氯基蒽醌等等之芳香族羰基化合物;例如p-二甲基胺基甲基苯甲酸酯、p-二甲基胺基乙基苯甲酸酯、D-二甲基胺基丁基苯甲酸酯、p-二乙基胺基異丙基苯甲酸酯等等之二烷基胺基苯甲酸酯;例如二苯甲醯過氧化物、二-t-丁基的過氧化物、二異丙苯過氧化物、異丙苯基氫基過氧化物等等之過氧化物;例如9-苯基吖啶、9-p-甲基氧苯基吖啶、9-乙醯基胺基吖啶、苯并吖啶、等等之吖啶衍生物;例如9,10-二甲基苯并啡 、9-甲基苯并啡 、以及10-甲基氧基苯并啡 等等之啡 衍生物;例如6,4',4"-三甲基氧基-2,3-二苯基喹 啉等等之喹 啉衍生物;2,4,5-三苯基咪唑基之二聚物、2-硝基茀芴、2,4,6-三苯基氧鎓4氟化硼鹽(2,4,6-triphenylpyrylium a fluorinated boron salt)、2,4,6-三 (三氯基甲基)-1,3,5-三氮 、3,3'-羰基雙香豆素、硫代-四甲基二胺基二苯甲酮(thio-Michler’s ketone)、2,4,6-三甲基苯甲醯基二苯基氧化膦、寡聚-(2-羥基-2-甲基-1(4-(1-甲基乙烯基)苯基丙酮、2-苯基-2-二甲基胺基-1-(4-嗎福啉基苯基)-丁酮等等。In particular, the initiator may be, for example, a sodium dithiocarbamate sodium sulfide, a monosulfide phenylbenzene, a dibenzothiazyl monosulfide, or the like; for example, thioxanthone, 2 a thioxanthone derivative of ethylthioxanthone, 2-chlorothioxanthone and 2,4-diethylthioxanthone; an azo compound such as hydrazine and azobisisobutyronitrile; a diazonium compound such as a benzophenone salt; for example, benzoin, benzoin methyl ether, benzoin ethyl ether, benzophenone, dimethylaminobenzophenone, tetramethyldiaminobenzophenone, anthracene, t An aromatic carbonyl compound such as butyl hydrazine, 2-methyl hydrazine, 2-ethyl hydrazine, 2-amino hydrazine, 2-chloro hydrazine or the like; for example, p-dimethylamino group A Benzoyl benzoate, p-dimethylaminoethyl benzoate, D-dimethylaminobutyl benzoate, p-diethylamino isopropyl benzoate, etc. Dialkylamino benzoate; for example, benzamidine peroxide, di-t-butyl peroxide, diisopropylbenzene peroxide, cumyl hydroperoxide, etc. Peroxidation An acridine derivative such as 9-phenyl acridine, 9-p-methyloxyphenyl acridine, 9-acetylindenyl acridine, benzoacridine, etc.; for example 9,10-two a morphine derivative of methylbenzophenone, 9-methylbenzophenan, and 10-methyloxybenzomorph; for example, 6,4',4"-trimethyloxy-2,3- a quinoline derivative of diphenylquinoline or the like; a dimer of 2,4,5-triphenylimidazolyl, 2-nitroindole, 2,4,6-triphenyloxanium 4 fluorinated Boron salt (2,4,6-triphenylpyrylium a fluorinated boron salt), 2,4,6-three (trichloromethyl)-1,3,5-triazo, 3,3'-carbonyl dicoumarin, thio-Michler's ketone, 2, 4,6-trimethylbenzimidyldiphenylphosphine oxide, oligo-(2-hydroxy-2-methyl-1(4-(1-methylvinyl)phenylacetone, 2-phenyl -2-Dimethylamino-1-(4-morpholinophenyl)-butanone and the like.

同時,在形成本發明的硬質塗層110與導電性層120的時候,胺化合物可以被添加至該光聚合作用起始劑,以藉由氧之抑制作用而避免敏感度降低。此個胺化合物之具體例可以包括有,但不侷限於,任何的脂肪族胺化合物或芳香族胺化合物中之任何一者,只要其係為非揮發性的。該胺化合物之一適當的具體例係為三乙醇胺、甲基二乙醇胺以及其等之類似物。Meanwhile, in forming the hard coat layer 110 of the present invention and the conductive layer 120, an amine compound may be added to the photopolymerization initiator to avoid a decrease in sensitivity by inhibition of oxygen. Specific examples of the amine compound may include, but are not limited to, any of any of an aliphatic amine compound or an aromatic amine compound as long as it is nonvolatile. Suitable specific examples of one of the amine compounds are triethanolamine, methyldiethanolamine, and the like.

在本發明中,有關於該導電性層120的成分之混合比率,該黏合劑成分相對於該等顆粒所需之比率,基於重量係為10/90至30/70,較佳地為15/85至25/75。In the present invention, there is a mixing ratio of the components of the conductive layer 120, and the ratio of the binder component to the particles is 10/90 to 30/70, preferably 15/based on the weight basis. 85 to 25/75.

如果使用低於上述特定數值之較少顆粒的話,所產生之薄膜將可以具有足夠的透光性但是卻會具較差的導電係數。相對地,如果使用超過上述特定數值之較少顆粒的話,所產生之薄膜將會不利地具有較差的物理與化學強度。相對於100份之重量的該黏合劑成分,該所添加之光聚合作用起始劑的含量,通常係為0.1至20份的重量,較佳地為1.0至15.0份的重量。如果該含數量係少於0.1份之重量的話,該光聚合作用過程將會是緩慢而需要長時間光照,以滿足所需之硬度和抗磨蝕性,而該所產生之薄膜有時仍會 維持未固化。在另一方面,如果該所添加之含量係為超過20份的重量,就會減低該薄膜的導電係數、抗磨耗性、抗天候性等等。If less particles are used below the above specified values, the resulting film will have sufficient light transmission but will have a poor conductivity. In contrast, if less particles than the above specified values are used, the resulting film will disadvantageously have poor physical and chemical strength. The content of the photopolymerization initiator to be added is usually from 0.1 to 20 parts by weight, preferably from 1.0 to 15.0 parts by weight, based on 100 parts by weight of the binder component. If the amount is less than 0.1 part by weight, the photopolymerization process will be slow and require long-time illumination to meet the required hardness and abrasion resistance, and the resulting film will sometimes still Maintain uncured. On the other hand, if the added content is more than 20 parts by weight, the conductivity, abrasion resistance, weather resistance and the like of the film are lowered.

在依據本發明之具有優異之刮擦抗性與表面滑動性質之該抗反射薄膜中的該導電性層120的基本成分,係為黏合接劑成分、導電性顆粒以及光聚合作用起始劑。如果有需要的話,可以添加例如聚合作用抑制劑、固化作用催化劑、氧化作用抑制劑、分散劑、勻塗劑、矽烷連接劑等等之添加劑。The basic components of the conductive layer 120 in the antireflection film having excellent scratch resistance and surface sliding properties according to the present invention are a binder component, a conductive particle, and a photopolymerization initiator. If necessary, additives such as a polymerization inhibitor, a curing catalyst, an oxidation inhibitor, a dispersing agent, a leveling agent, a decane coupling agent, and the like may be added.

在本發明中,該導電性層120可以進一步包含有例如聚吡咯和聚苯胺,等等之導電性聚合物,以及例如金屬嵌合(alco1ate)和螫合物等等之有機金屬化合物,以為該導電性層120之成分提供導電性。同時,該導電性層120可以進一步包含有例如烷基矽酸鹽與其之水解物、膠態二氧化矽、乾燥二氧化矽、濕潤二氧化矽或是三氧化鈦等等、分散於膠質中之二氧化矽顆粒等等之無機顆粒,以改良表面硬度。In the present invention, the conductive layer 120 may further contain a conductive polymer such as polypyrrole and polyaniline, and the like, and an organometallic compound such as a metal chimere and a chelate, etc., The composition of the conductive layer 120 provides electrical conductivity. Meanwhile, the conductive layer 120 may further comprise, for example, an alkyl phthalate and a hydrolyzate thereof, colloidal cerium oxide, dry cerium oxide, wet cerium oxide or titanium oxide, etc., dispersed in the colloid. Inorganic particles such as cerium oxide particles to improve surface hardness.

為了要以導電性層120之方式剌提供所需程度之抗靜電能力,其係在該導電性層120上之表面電阻係較佳地為1×1011 ohm/sq或更少,更較佳地為1×1010 ohm/sq或更少。In order to provide the desired degree of antistatic ability in the manner of the conductive layer 120, the surface resistance on the conductive layer 120 is preferably 1 × 10 11 ohm/sq or less, more preferably The ground is 1 x 10 10 ohm/sq or less.

在本發明之該導電性層120的總通透度,在銳利度和透光性的方面係較佳地有40%或更多,更佳地為60%或更多。The total transparency of the conductive layer 120 of the present invention is preferably 40% or more, more preferably 60% or more in terms of sharpness and light transmittance.

同時,在依據本發明之具有優異之刮擦抗性與表面滑 動性質之該抗反射薄膜的樹脂層130,係被提供在該導電性層120上並且係基本上包含有氟化物。At the same time, it has excellent scratch resistance and surface slip in accordance with the present invention. The resin layer 130 of the antireflective film of the movable nature is provided on the conductive layer 120 and substantially contains fluoride.

在本發明中所使用之氟化物係較佳地為那些以熱能或游離輻射來交聯者。該經交聯氟化物可以是具有一交聯基團或是一帶有未飽和基團之氟單體的氟聚合物,或是具有用以提供氟單體與一交聯基團之單體單元的氟聚合物。明確地說,該氟化物係較佳地由在該主鏈具有一乙烯醚結構的氟聚合物所組成。較佳地,該氟聚合物具有一氟-烯烴鏈,其中該氟含量係為重量的30%或更多,該藉由聚苯乙烯換算之數目平均分子量係為500或更多,較佳地為5000或更多。此等氟聚合物係藉著將具有氟-化合物與乙烯醚化合物之固化組成物進行聚合而獲得,較佳地係藉由將該包含有氟-烯烴化合物、可以與該氟-烯烴化合物共聚合的乙烯醚化合物的固化成分,以及在有需要下之欲被混合的反應性乳化劑進行聚合而獲得。該固化組成物係較佳地用來形成該含有作為一成分之反應性乳化劑的氟聚合物。藉著使用該反應性乳化劑,在該塗料液體中所包含的該氟聚合物可以被充分地施加並平坦地施加。該反應性乳化劑之一較佳具體例係特別地為一非離子反應性乳化劑。The fluorides used in the present invention are preferably those which are crosslinked by thermal energy or free radiation. The crosslinked fluoride may be a fluoropolymer having a crosslinking group or a fluorine monomer having an unsaturated group, or a monomer unit having a fluorine monomer and a crosslinking group. Fluoropolymer. Specifically, the fluoride is preferably composed of a fluoropolymer having a vinyl ether structure in the main chain. Preferably, the fluoropolymer has a fluorine-olefin chain, wherein the fluorine content is 30% by weight or more, and the number average molecular weight in terms of polystyrene is 500 or more, preferably For 5000 or more. These fluoropolymers are obtained by polymerizing a cured composition having a fluorine-compound and a vinyl ether compound, preferably by copolymerizing the fluorine-olefin compound with the fluorine-olefin compound. The cured component of the vinyl ether compound and the reactive emulsifier to be mixed if necessary are obtained by polymerization. The cured composition is preferably used to form the fluoropolymer containing a reactive emulsifier as a component. By using the reactive emulsifier, the fluoropolymer contained in the coating liquid can be sufficiently applied and applied flat. A preferred embodiment of one of the reactive emulsifiers is in particular a nonionic reactive emulsifier.

針對於在該樹脂層130中所包含的氟聚合物,該源自於氟烯烴化合物成分之單元係為20至70莫耳%,較佳地為25至65莫耳%,更佳地為30-60莫耳%。The unit derived from the fluoroolefin compound component is 20 to 70 mol%, preferably 25 to 65 mol%, more preferably 30, for the fluoropolymer contained in the resin layer 130. -60 moles %.

如果該源自於氟烯烴化合物成分之該單元的比率係少於20莫耳%,在該所獲得的最終氟共聚物內之該氟含量 可能會太少。因此,該樹脂層130的折射率接著將會變得不夠低。另一方面,如果該源自於氟烯烴化合物成分之該單元的比率係大於70莫耳%,在該塗料液體中的均勻度將會不利地變差,因而其係不易形成一均勻的塗覆薄膜。同時,其在不易達到所需透光性與黏附於該基材上方面也是不利的。對於該氟聚合物而言,該源自於含有該乙烯醚結構的化合物之該單元係為10至70莫耳%,較佳地為15至65莫耳%,更佳地為30至60莫耳%。如果該源自於含有該乙烯醚結構的化合物之該單元係少於10莫耳%,在該塗料液體中之均勻度將會變差,因而其係不易形成一均勻的塗覆薄膜。以比率超過70莫耳%之塗料液體所獲得的該樹脂層130,並不會具有所需之透光性和抗反射性之光學性質。If the ratio of the unit derived from the fluoroolefin compound component is less than 20 mol%, the fluorine content in the final fluorocopolymer obtained It may be too little. Therefore, the refractive index of the resin layer 130 will then become insufficiently low. On the other hand, if the ratio of the unit derived from the fluoroolefin compound component is more than 70 mol%, the uniformity in the coating liquid will be disadvantageously deteriorated, so that it is difficult to form a uniform coating. film. At the same time, it is also disadvantageous in that it is difficult to achieve the desired light transmittance and adhesion to the substrate. For the fluoropolymer, the unit derived from the compound containing the vinyl ether structure is from 10 to 70 mol%, preferably from 15 to 65 mol%, more preferably from 30 to 60 mol. ear%. If the unit derived from the compound containing the vinyl ether structure is less than 10 mol%, the uniformity in the coating liquid will be deteriorated, so that it is difficult to form a uniform coated film. The resin layer 130 obtained by a coating liquid having a ratio of more than 70 mol% does not have the optical properties of the desired light transmittance and antireflection.

對於包含有此一乙烯醚結構的該化合物成分而言,其係較佳地使用一包含一例如氫氧基或環氧基之反應性官能基的單體,因而在該所產生的固化樹脂組成物被用來作為塗料液體時,可以改善該經固化薄膜的強度。該等整個單體與該包含該氫氧基或環氧基之單體的比率係為0-20莫耳%,較佳地為1-20莫耳%,且更佳地為3-15莫耳%。如果該比率係超過20莫耳%,該所產生之樹脂層130會具有較差的光學性質,並且該經固化的薄膜將會變得較弱。對於包含有反應性乳化劑之氟共聚物而言,該源自於該反應性乳化劑成分之該單元的比率通常係為0至10莫耳%,較佳地為0.1至5莫耳%。如果該比率係超過10莫耳%,該所 產生的樹脂層130係具有膠黏性,因而其係難以處理該層次130,並且因為該塗料液體之抗濕性會降低而不會是一較佳的樹脂層。For the component of the compound containing such a vinyl ether structure, it is preferred to use a monomer containing a reactive functional group such as a hydroxyl group or an epoxy group, thereby forming a cured resin composition. When the object is used as a coating liquid, the strength of the cured film can be improved. The ratio of the entire monomer to the monomer comprising the hydroxyl or epoxy group is from 0 to 20 mol%, preferably from 1 to 20 mol%, and more preferably from 3 to 15 mol. ear%. If the ratio is more than 20 mol%, the resulting resin layer 130 may have poor optical properties, and the cured film will become weak. For a fluorocopolymer comprising a reactive emulsifier, the ratio of the unit derived from the reactive emulsifier component is usually from 0 to 10 mol%, preferably from 0.1 to 5 mol%. If the ratio is more than 10 mol%, the institute The resulting resin layer 130 is adhesive, so that it is difficult to handle the layer 130, and since the moisture resistance of the coating liquid is lowered, it is not a preferred resin layer.

同時,該低折射率層130包含有相對於為100份的重量之黏合劑樹脂,係為15-25份之重量的中空二氧化矽。如果該中空二氧化矽顆粒含量係少於15份之重量的話,該折射率就會因此增加而使得抗反射性惡化,也就是說反射率將會增加。另一方面,如果該中空二氧化矽顆粒含量係超過25份之重量的話,該表面的粗糙度就會因此增加而減低該表面滑動性質,而該昂貴的中空二氧化矽也會導致生產成本的增加。Meanwhile, the low refractive index layer 130 contains 15 to 25 parts by weight of hollow cerium oxide with respect to 100 parts by weight of the binder resin. If the hollow cerium oxide particle content is less than 15 parts by weight, the refractive index is thus increased to deteriorate the antireflection property, that is, the reflectance will increase. On the other hand, if the hollow cerium oxide particle content is more than 25 parts by weight, the roughness of the surface is thereby increased to reduce the surface sliding property, and the expensive hollow cerium oxide also causes production cost. increase.

除了該氟聚合物之外,其係較佳地將一交聯化合物混合以產生依據本發明之該樹脂層130。這是因為其可以有效地提供一些固化能力藉以改善固化性質。In addition to the fluoropolymer, it is preferred to mix a crosslinking compound to produce the resin layer 130 according to the present invention. This is because it can effectively provide some curing ability to improve the curing properties.

舉例來說,上述之交聯化合物的一具體例係為胺基化合物,或是例如異戊四醇、多酚、二醇、烷基矽酸易以及其等之水解物等等之含有氫氧基的化合物。該被用來作為一交聯化合物之胺基化合物,可以總共包含有二或更多個可以與存在於該氟化合物中之該氫氧基或環氧基(舉例來說,在該羥基烷基胺基以及該烷氧基烷基胺基中之任何一或二者)反應的胺基。其之一具體例係為三聚氰胺化合物、尿素化合物、苯代三聚氰胺化合物、甘脲化合物等等。該三聚氰胺化合物已知係為一種通常具有一其中氮原子係被鍵結至一三氮雜苯環的骨架之化合物,並且其之一具體例 係為三聚氰胺、烷基三聚氰胺、羥甲基三聚氰胺、烷氧基甲基三聚氰胺,等等。然而,一個分子總共具有二或更多之以下的羥甲基與烷氧基甲基中之任何一者或兩者的基團者係為較佳。特別地,藉著在一鹼性條件下將三聚氰胺與甲醛反應而獲得之羥甲基三聚氰胺、烷氧基甲基三聚氰胺或是其等之衍生物係為較佳的。烷氧基甲基三聚氰胺由於在該固化樹脂成分中所得到之良好的保存穩定性與所得到之良好的可反應性,而係為特別較佳的。For example, a specific example of the above cross-linking compound is an amine-based compound, or a hydrogen-containing oxygen such as isobaerythritol, polyphenol, diol, alkyl decanoic acid, and the like Base compound. The amine-based compound used as a crosslinking compound may contain a total of two or more hydroxyl groups or epoxy groups which may be present in the fluorine compound (for example, in the hydroxyalkyl group) An amine group reacted with an amine group and either or both of the alkoxyalkylamine groups. One specific example thereof is a melamine compound, a urea compound, a benzoguanamine compound, a glycoluril compound, or the like. The melamine compound is known as a compound which generally has a skeleton in which a nitrogen atom is bonded to a triazabenzene ring, and one specific example thereof It is melamine, alkyl melamine, methylol melamine, alkoxymethyl melamine, and the like. However, it is preferred that a molecule has a total of two or more groups of either or both of a methylol group and an alkoxymethyl group. In particular, methylol melamine, alkoxymethyl melamine or the like obtained by reacting melamine with formaldehyde under an alkaline condition is preferred. The alkoxymethyl melamine is particularly preferred because of its good storage stability and good reactivity which is obtained in the cured resin component.

三聚氰胺和烷氧基甲基三聚氰胺都沒有特別之限制,兩者均被用來作為一交聯化合物之羥甲基。舉例來說,由該方法所獲得之所有的樹脂形式都可以被使用,該方法係被描述在標題為'PLASTIC MATERIAL[8]UREA MELAMINE RESIN'的文獻中(由Nitgan High School Newspapers Publishing公司所發行)。除了尿素之外,該尿素化合物可以是聚羥甲基尿素、係為其之衍生物的烷氧基甲基尿素、甲基化烏龍(uron)以及具有一烏龍(uron)環之烷氧基甲基烏龍(uron)等等。針對例如尿素衍生物之化合物,在上述的文獻中所描述之所有的樹脂形式都可以被使用。Both melamine and alkoxymethyl melamine are not particularly limited, and both are used as a methylol group of a crosslinking compound. For example, all resin forms obtained by this method can be used, which is described in the document entitled 'PLASTIC MATERIAL[8]UREA MELAMINE RESIN' (issued by Nitgan High School Newspapers Publishing Company) ). In addition to urea, the urea compound may be polyhydroxymethyl urea, an alkoxymethyl urea which is a derivative thereof, a methylated uron, and an alkoxy group having an uron ring. Methyl uron (uron) and so on. For the compound such as a urea derivative, all of the resin forms described in the above documents can be used.

相對於100份的重量之氟共聚物,此等所使用之交聯化合物的含量係為70份或更少之重量,較佳地為3至50份之重量,更佳地為5至30份之重量。如果該所使用之交聯化合物係少於3份的重量,由該塗料所形成之薄膜的耐用性與固化作用就可能會不足。The crosslinking compound is used in an amount of 70 parts by weight or less, preferably 3 to 50 parts by weight, more preferably 5 to 30 parts, per 100 parts by weight of the fluorocopolymer. The weight. If the cross-linking compound used is less than 3 parts by weight, the durability and curing effect of the film formed from the coating may be insufficient.

如果其係超過70份之重量的話,其就難以在與氟聚 合物之反應中避免凝膠化現象。同時,在一些情況中,該經固化的薄膜將會不夠強,因為該所產生之經固化薄膜並不具有低折射率。If the system is more than 70 parts by weight, it is difficult to concentrate with fluorine. Gelation is avoided in the reaction of the compound. At the same time, in some cases, the cured film will not be strong enough because the resulting cured film does not have a low refractive index.

該樹脂層130係較佳地包含具有二氧化矽顆粒及/或矽烷連接劑,及/或一烷氧基矽烷基之氟樹脂以達成抗磨蝕性。The resin layer 130 preferably contains a fluororesin having cerium oxide particles and/or a decane linking agent, and/or an alkoxyalkylene group to achieve abrasion resistance.

該等二氧化矽顆粒係較佳地包含有乾燥二氧化矽、濕潤二氧化矽、分散在膠體中之二氧化矽顆粒等等。該等二氧化矽顆粒的顆粒尺寸通常在平均主要顆粒尺寸(球體相對直徑:BET方法)上係為0.001-0.2μm,較佳地為0.005-0.15μm。The cerium oxide particles preferably comprise dry cerium oxide, wet cerium oxide, cerium oxide particles dispersed in a colloid, and the like. The particle size of the cerium oxide particles is usually 0.001 to 0.2 μm, preferably 0.005 to 0.15 μm, in terms of the average primary particle size (spherical relative diameter: BET method).

如果該平均顆粒尺寸係落在上述之特定範圍裡面,該所產生的薄膜(樹脂層)之透光性將不會減低,並且在改善表面硬度方面也不會有困難。同時,該等二氧化矽顆粒之形狀係較佳地為球狀的或中空的。其可以使用二或更多類型之二氧化矽顆粒,每種類型都分別地具有不同的顆粒尺寸。該等二氧化矽顆粒可以在進行表面處理作用之後加以使用。針對於該表面處理作用,其可以使用例如電漿放電作用、電暈放電、以及運用連接劑之化學表面處理作用。然而,化學表面處理作用係為較佳的。矽烷連接劑係較佳地被用來作為用在化學表面處理作用的連接劑。在該成分的固體中來自二氧化矽顆粒的比率係為5至50%,較佳地為5至40%,更較佳地為5至30%。落在上述之特定範圍裡面的該成分固體中來自二氧化矽顆粒之比率,將會得到 所產生之樹脂層所需的表面硬度,以及例如透光性與低反射率之良好的光學性質。If the average particle size falls within the above specific range, the light transmittance of the resulting film (resin layer) will not be lowered, and there will be no difficulty in improving the surface hardness. At the same time, the shape of the cerium oxide particles is preferably spherical or hollow. It is possible to use two or more types of cerium oxide particles, each of which has a different particle size. These cerium oxide particles can be used after surface treatment. For this surface treatment, it is possible to use, for example, a plasma discharge action, a corona discharge, and a chemical surface treatment using a bonding agent. However, chemical surface treatment is preferred. A decane linker is preferably used as a linker for chemical surface treatment. The ratio of the particles derived from cerium oxide in the solid of the component is from 5 to 50%, preferably from 5 to 40%, more preferably from 5 to 30%. The ratio of the cerium oxide particles in the solids of the component falling within the above specific range will be obtained. The surface hardness required for the resulting resin layer, and good optical properties such as light transmittance and low reflectance.

該矽烷連接劑的成分係為被表示於下之一化合物或是其之水解物。The component of the decane coupling agent is represented by the next compound or a hydrolyzate thereof.

[化學式1][Chemical Formula 1]

R(1)a R(2)b SiX4-(a+b) , 其中,R(1)或R(2)係分別地為一具有烷基、烯基、烯丙基或是鹵素基之烴基基團、環氧基、胺基、氫硫基、甲基丙烯醯氧基,或是氰基;X係為一選自於由烷氧基、烷氧-烷氧基、鹵素基與醯氧基之可以被水解之取代基。在上述的化學式1中,a與b係分別地為0、1或2;而且(a+b)係為1、2或3。較佳地,來自該矽烷連接劑之該成分相對於固體之比率係為5至70%,較佳地為15至65%,更佳地為20至60%。係落在上述之特定範圍裡面之該成分來自該矽烷連接劑的比率,可以得到該所產生之樹脂層的所需之表面硬度,並進一步得到所需之例如透光性與低反射率類似的良好光學性質。R(1) a R(2) b SiX 4-(a+b) wherein R(1) or R(2) is a hydrocarbyl group having an alkyl group, an alkenyl group, an allyl group or a halogen group, respectively. a group, an epoxy group, an amine group, a thiol group, a methacryloxy group, or a cyano group; the X system is one selected from the group consisting of an alkoxy group, an alkoxy-alkoxy group, a halogen group and a decyloxy group. a substituent which can be hydrolyzed. In the above Chemical Formula 1, a and b are respectively 0, 1, or 2; and (a+b) is 1, 2 or 3. Preferably, the ratio of the component from the decane linking agent to solids is from 5 to 70%, preferably from 15 to 65%, more preferably from 20 to 60%. The ratio of the component falling within the above-mentioned specific range from the decane coupling agent can obtain the desired surface hardness of the resulting resin layer, and further obtain a desired ratio such as light transmittance and low reflectance. Good optical properties.

該具有一烷氧基矽烷基之氟樹脂係為被表示於下之一化合物或是其之水解物。The fluororesin having an alkoxyalkylalkyl group is represented by the next compound or a hydrolyzate thereof.

[化學式2][Chemical Formula 2]

R(3)c R(4)d SiX4-(c+d) , 其中,R(3)或R(4)係分別地為一具有氟化烷基、烯基、烯丙基、甲基丙烯醯氧基,或是(甲基)丙烯醯基之烴基 基團;並且X係為一選自於由烷氧基、烷氧-烷氧基、鹵素基或是醯氧基之可以被水解之取代基。在上述的化學式2中,c與d係分別地為0、1、2或3;並且(c+d)係為1、2或3。R(3) c R(4) d SiX 4-(c+d) , wherein R(3) or R(4) is a fluorinated alkyl, alkenyl, allyl, methacrylic acid, respectively An oxy group, or a hydrocarbyl group of a (meth) acrylonitrile group; and the X system is one selected from the group consisting of an alkoxy group, an alkoxy-alkoxy group, a halogen group or a decyloxy group. base. In the above Chemical Formula 2, c and d are respectively 0, 1, 2 or 3; and (c+d) is 1, 2 or 3.

該來自於具有一烷氧基矽烷基之氟樹脂的成分係較佳地相對於該固體的比率為20至90%,較佳地為25至80%,更佳地為30至70%。如果來自該具有一烷氧基矽烷基之氟樹脂的成分之比率係落在上述之特定較佳範圍裡面,該所產生的樹脂層將可以具有足夠的表面硬度,而此外也可以滿足其所需之例如透光性與低反射率以及類似的光學性質。The ratio of the component derived from the fluororesin having an alkoxyalkylalkyl group to the solid is preferably from 20 to 90%, preferably from 25 to 80%, more preferably from 30 to 70%. If the ratio of the component derived from the fluororesin having an alkoxyalkylalkyl group falls within the above specific preferred range, the resulting resin layer will have sufficient surface hardness and, in addition, can satisfy its needs. Such as light transmission and low reflectivity and similar optical properties.

其可以使用固化催化劑以在形成本發明之該樹脂層130時,促使該塗料液體固化。該固化催化劑係較佳地可以促使該矽烷連接劑的縮合反應。該較佳的固化催化劑之一具體例係為酸性化合物。在其等之中,路易斯酸係為最佳的。該路易斯酸的一具體例係為金屬烷氧化物或金屬螫合物,舉例來說,例如像乙醯乙酸基鋁化物等等。It may use a curing catalyst to cause the coating liquid to solidify when the resin layer 130 of the present invention is formed. The curing catalyst preferably promotes the condensation reaction of the decane linking agent. One of the preferred curing catalysts is specifically an acidic compound. Among them, the Lewis acid system is the best. A specific example of the Lewis acid is a metal alkoxide or a metal chelate, such as, for example, an acetonitrile acetate aluminide or the like.

該固化催化劑的含量可以依據需要來適切地決定,而舉例來說係典型地相對於100份的矽烷連接劑之重量為0.1至10份的重量。The content of the curing catalyst can be appropriately determined as needed, and is, for example, typically 0.1 to 10 parts by weight based on 100 parts by weight of the decane coupling agent.

在形成樹脂層130時或是如果在本發明中有需求時都可以添加例如聚合作用抑制劑、氧化抑制劑、分散劑、勻塗劑等等之任何的添加劑。Any of additives such as a polymerization inhibitor, an oxidation inhibitor, a dispersant, a leveling agent, and the like may be added at the time of forming the resin layer 130 or if it is required in the present invention.

為了要使所產生依據本發明之具有優異之刮擦抗性 與表面滑動性質之該抗反射薄膜具有高度透明度,在該堆疊薄膜中之霧度值係被建議為少於3.0%,較佳地為少於2.7%。如果該霧度值係等於或大於3.0%,該透光度可能會不足。In order to produce excellent scratch resistance in accordance with the present invention The antireflection film having surface sliding properties has a high transparency, and the haze value in the stacked film is recommended to be less than 3.0%, preferably less than 2.7%. If the haze value is equal to or greater than 3.0%, the transmittance may be insufficient.

為了要達成在本發明中之該樹脂層130的該表面之良好的抗磨蝕性,該樹脂層的表面需要具有細微的不平整。藉由該不平整,在該表面的不平整與和抗磨蝕性之間的關係,係被認為是會導致下列的作用機制。那是指,當鋼毛滑過該粗糙表面的時候,在該細微不平整的表面上,該鋼毛僅會與該表面的凸出部份接觸,所以該樹脂層的表面之該接觸區域將可以如其所需的減到最少,藉此係特別地可以改良該抗磨蝕性。In order to achieve good abrasion resistance of the surface of the resin layer 130 in the present invention, the surface of the resin layer needs to have fine unevenness. By the unevenness, the relationship between the unevenness of the surface and the abrasion resistance is considered to result in the following mechanism of action. That means that when the steel wool slides over the rough surface, the steel wool will only contact the convex portion of the surface on the fine uneven surface, so the contact area of the surface of the resin layer will It can be minimized as it is required, whereby the abrasion resistance can be particularly improved.

在該樹脂層130的表面上之該算術平均不平整度(Ra)值,係基本上較佳地落在0.003μm與0.025μm之間,更佳地為0.004μm與0.022μm之間,又更佳地在0.004μm與0.020μm之間。如果在該不平整表面上之該算術平均不平整度(Ra)值,係超過上述之特定較佳範圍,在該樹脂層中之霧度值將會比所需要的更高而因此透光性將會減低。如果在該不平整表面上之該算術平均不平整度(Ra)值,係低於上述之特定較佳範圍,其將難以改善該抗磨蝕性。為了要在該樹脂層上形成細微不平整的表面,該樹脂層係較佳地包含有例如膠質二氧化矽、乾燥二氧化矽、濕潤二氧化矽、三氧化鈦、玻璃粉、氧化鋁、碳化矽、氮化矽、等等,或是被分散於膠體中之二氧化矽顆粒之無機的顆粒。較佳 地其係包含有被分散於膠體中之二氧化矽顆粒。The arithmetic mean unevenness (Ra) value on the surface of the resin layer 130 is substantially preferably between 0.003 μm and 0.025 μm, more preferably between 0.004 μm and 0.022 μm, and still more Preferably, it is between 0.004 μm and 0.020 μm. If the arithmetic mean unevenness (Ra) value on the uneven surface exceeds the above-mentioned specific preferred range, the haze value in the resin layer will be higher than required and thus the light transmittance Will be reduced. If the arithmetic mean unevenness (Ra) value on the uneven surface is lower than the specific preferred range described above, it will be difficult to improve the abrasion resistance. In order to form a fine uneven surface on the resin layer, the resin layer preferably contains, for example, colloidal cerium oxide, dry cerium oxide, wet cerium oxide, titanium oxide, glass frit, alumina, carbonization. Niobium, tantalum nitride, etc., or inorganic particles of cerium oxide particles dispersed in a colloid. Better The system contains cerium oxide particles dispersed in a colloid.

明確地說,二或更多種之二氧化矽顆粒類型係較佳地被使用,其等之每一種類型都具有一不同的顆粒尺寸分佈。舉例來說,細微的不平整性可以藉著將一種類型之平均顆粒尺寸係介於0.001與0.02μm之間,而另一種類型之平均顆粒尺寸係介於0.02和0.2μm之間的二氧化矽顆粒混合而加以實施。In particular, two or more types of cerium oxide particles are preferably used, each of which has a different particle size distribution. For example, subtle unevenness can be achieved by averaging a type of average particle size between 0.001 and 0.02 μm, while another type of cerium oxide having an average particle size between 0.02 and 0.2 μm. The particles are mixed and implemented.

為了要使得在本發明中的該樹脂層130側邊上之該堆疊薄膜的該表面具有一較低之反射能力,該堆疊薄膜之最大反射能力就必需要少於4%,而其之該最小反射能力需為超過0.2%。In order to make the surface of the stacked film on the side of the resin layer 130 in the present invention have a low reflection ability, the maximum reflection capacity of the stacked film must be less than 4%, and the minimum The reflection capacity needs to be more than 0.2%.

如果該反射力超過上述之特定較佳範圍,環境光源就可以輕易地照亮而無法在該堆疊薄膜的表面上達成低反射能力。If the reflection force exceeds the above-described specific preferred range, the ambient light source can be easily illuminated to achieve low reflection capability on the surface of the stacked film.

為了要在該堆疊薄膜之本發明的該樹脂層130側邊之表面上達成一較低之反射效果,該導電性層120與該樹脂層130之折射率以及厚度的乘積,係分別較佳地為目標光線(通常為可見光)之波長的1/4。因此,就該導電性層120與該樹脂層130而言,每個層次之厚度與折射率(n)的乘積之四倍所得到的數值,係較佳地落於380與780nm之間。那是指,該導電性層120與該樹脂層130之該折射率(n)和該厚度(d)之間的關係,係較佳地分別地符合下列的等式1:[等式1]n.d=λ/4In order to achieve a lower reflection effect on the surface of the side of the resin layer 130 of the present invention, the product of the refractive index and the thickness of the conductive layer 120 and the resin layer 130 are preferably respectively preferably It is 1/4 of the wavelength of the target light (usually visible light). Therefore, the value obtained by the conductive layer 120 and the resin layer 130, which is four times the product of the thickness of each layer and the refractive index (n), preferably falls between 380 and 780 nm. That is, the relationship between the refractive index (n) and the thickness (d) of the conductive layer 120 and the resin layer 130 preferably respectively meets the following Equation 1: [Equation 1] n. d=λ/4

(其中,λ代表可見光線之波長範圍,典型地係為380nmλ780nm)。(where λ represents the wavelength range of visible light, typically 380 nm λ 780nm).

為了要在本發明的該堆疊薄膜上達成一較低的反射能力,該導電性層120之厚度較佳地為0.01至1.0μm,更佳地為0.06至0.12μm。該樹脂層130的厚度較係佳地0.01至1.0μm,更較佳地0.07至0.12μm。同時,如果該導電性層120和樹脂層130之厚度不在該範圍裡面的話,其就不會符合等式1,而在該樹脂層130側邊的堆疊薄膜之表面上就無法達成較低的反射能力。In order to achieve a lower reflectance on the stacked film of the present invention, the thickness of the conductive layer 120 is preferably from 0.01 to 1.0 μm, more preferably from 0.06 to 0.12 μm. The thickness of the resin layer 130 is preferably 0.01 to 1.0 μm, more preferably 0.07 to 0.12 μm. Meanwhile, if the thickness of the conductive layer 120 and the resin layer 130 is not within the range, it does not conform to Equation 1, and a lower reflection cannot be achieved on the surface of the stacked film on the side of the resin layer 130. ability.

為了要在本發明之該樹脂層130側邊的堆疊薄膜之該表面上達成一較低的反射能力,該樹脂層130的折射率係較佳地小於該導電性層120。那是指,樹脂層130的折射率與對導電性層120的折射率之比率,係較佳地少於1.0,更佳地為0.6至0.95。同時,該樹脂層130的折射率係較佳地至多為1.47,更佳地為1.35至1.45。習知技藝係難以形成一具有小於1.35之折射率的一樹脂。如果該樹脂層的折射率係高於1.47的話,所產生之薄膜具有一較高的反射能力。In order to achieve a lower reflectance on the surface of the stacked film on the side of the resin layer 130 of the present invention, the refractive index of the resin layer 130 is preferably smaller than that of the conductive layer 120. That is, the ratio of the refractive index of the resin layer 130 to the refractive index to the conductive layer 120 is preferably less than 1.0, more preferably 0.6 to 0.95. Meanwhile, the refractive index of the resin layer 130 is preferably at most 1.47, more preferably from 1.35 to 1.45. It is difficult to form a resin having a refractive index of less than 1.35. If the refractive index of the resin layer is higher than 1.47, the resulting film has a higher reflective ability.

在下文中,將會描述用於生產依據本發明之具有優異之刮擦抗性與表面滑動性質之抗反射薄膜的方法。Hereinafter, a method for producing an antireflection film having excellent scratch resistance and surface sliding properties according to the present invention will be described.

依據本發明之具有優異之刮擦抗性與表面滑動性質之該抗反射薄膜,可以藉著在該基材薄膜100的至少一側邊上,將一包含有(甲基)丙烯酸酯化合物之硬質塗層110、一包含有導電性顆粒之導電性層120以及一包含有氟化合 物之樹脂層130加以依序堆疊而生產。According to the present invention, the antireflection film having excellent scratch resistance and surface sliding property can be hardened by containing a (meth) acrylate compound on at least one side of the base film 100. The coating layer 110, a conductive layer 120 containing conductive particles, and a fluorine-containing alloy The resin layer 130 of the material is produced by sequentially stacking.

在本發明中之該導電性層120與該樹脂層130可以藉由調配較佳地具有分散於溶劑中之成分的塗料液體、將該塗料液體施加至該基材薄膜上,然後將該塗層乾燥並固化。In the present invention, the conductive layer 120 and the resin layer 130 may be applied to the substrate film by applying a coating liquid preferably having a component dispersed in a solvent, and then applying the coating liquid. Dry and cure.

用於形成本發明的導電性層120之該溶劑係被混合,以改善本發明的組成物之塗覆或印刷可加工性,並同時改善顆粒之可分散性。任何已知的傳統溶劑都可以被使用,只要其可以溶解該黏合劑成分。特別是在本發明中,在該組成物之粘度穩定性與乾燥效率上,該溶劑之一較佳類型係為具有沸點為60至180℃之有機溶劑,一較佳的類型係為具有氧原子之有機溶劑,因為其與金屬顆粒具有良好之相容性。此等有機溶劑之較佳具體例係特別為甲醇、乙醇、異丙醇、正-丁醇、第三丁醇、乙二醇單甲基醚、1-甲氧基-2-丙醇、丙二醇單甲基醚、環己酮、乙酸丁酯、異丙基丙酮、甲基乙基酮、甲基異丁基酮、二乙醯丙酮、乙醯基丙酮,等等。上述之較佳溶劑都可以被獨立地使用,或者其也可以使用其等之二或更多類型之混合物。The solvent used to form the conductive layer 120 of the present invention is mixed to improve the coating or print processability of the composition of the present invention while improving the dispersibility of the particles. Any known conventional solvent can be used as long as it can dissolve the binder component. Particularly in the present invention, in terms of viscosity stability and drying efficiency of the composition, one of the preferred types of the solvent is an organic solvent having a boiling point of 60 to 180 ° C, and a preferred type is an oxygen atom. An organic solvent because of its good compatibility with metal particles. Preferred specific examples of such organic solvents are, in particular, methanol, ethanol, isopropanol, n-butanol, tert-butanol, ethylene glycol monomethyl ether, 1-methoxy-2-propanol, propylene glycol. Monomethyl ether, cyclohexanone, butyl acetate, isopropylacetone, methyl ethyl ketone, methyl isobutyl ketone, diethyl acetonacetone, acetonitrile, and the like. The above preferred solvents may be used independently, or they may be used as a mixture of two or more types thereof.

同時,該有機溶劑的含量可以被決定以使得其可以被用生來產一組成物,該組成物具有可以產生一依據該塗覆方式與印刷方式之良好的可加工性之粘度。然而,其所需之固體含量係適當為不超過重量的60%,較佳地為50%。通常,一適當的方法係包含有將顆粒(b)添加至藉由將該黏接劑溶解於該有機溶劑中而得到的該溶液中;將所產生的混合物以一例如塗料搖擺器、球磨機、沙磨機、3-滾軸混 合器、手工(artwriter)混合器、均質混合器等等之分散機器來加以分散;而接下來加入光聚合作用起始劑並接著將該混合物均勻地溶解。At the same time, the content of the organic solvent can be determined such that it can be used to produce a composition having a viscosity which can produce a good processability according to the coating method and the printing method. However, the solid content required is suitably not more than 60% by weight, preferably 50%. In general, a suitable method comprises adding the particles (b) to the solution obtained by dissolving the binder in the organic solvent; the resulting mixture is, for example, a paint shaker, a ball mill, Sand mill, 3-roller mixing A dispersing machine such as a combiner, an artwriter mixer, a homomixer or the like is dispersed; and then a photopolymerization initiator is added and then the mixture is uniformly dissolved.

同時,該樹脂層130係較佳地將該液體進行施加、乾燥並固化的步驟而形成,該液體係藉著將該由氟化合物所構成之固化組成物分散於至少一類型之溶劑中而產生,該溶劑係選自於由甲醇、乙醇、異丙醇、正-丁醇、第三丁醇、乙二醇單甲基醚、1-甲氧基-2-丙醇、丙二醇單甲基醚、環己酮、乙酸丁酯、異丙基丙酮、甲基乙基酮、甲基異丁基酮、二乙醯丙酮與乙醯基丙酮所構成之群組。Meanwhile, the resin layer 130 is preferably formed by a step of applying, drying and solidifying the liquid, the liquid system being produced by dispersing the cured composition composed of the fluorine compound in at least one type of solvent. The solvent is selected from the group consisting of methanol, ethanol, isopropanol, n-butanol, tert-butanol, ethylene glycol monomethyl ether, 1-methoxy-2-propanol, propylene glycol monomethyl ether a group consisting of cyclohexanone, butyl acetate, isopropylacetone, methyl ethyl ketone, methyl isobutyl ketone, diethyl acetonide and acetonitrile.

在此一情況中,所使用的溶劑之含量可以依據該組成物之粘度、該欲取得之經固化薄膜的厚度、乾燥溫度條件等等,而適當地控制。In this case, the content of the solvent to be used may be appropriately controlled depending on the viscosity of the composition, the thickness of the cured film to be obtained, the drying temperature condition, and the like.

在基材薄膜100的至少一側邊上之依據本發明的該堆疊薄膜之層次結構,係依序為一包含有(甲基)丙烯酸酯化合物之硬質塗層110、一包含有導電性顆粒之導電性層120,以及包含有氟化合物之樹脂層130。該層次結構之另一具體例係藉著在該基材薄膜100的兩個側邊上形成導電性層120而製備,但是在此一情況中,其係較佳地在該等兩個導電性層120之的導電性層120的至少任何一側邊上形成樹脂層130。同時,如果數個導電性層120係被形成在該基材薄膜100的一側邊上,其係較佳地形成數個樹脂層130以使得樹脂層130可以被設置於該基材薄膜100的同一側邊上之最外側表面上。對於該基材薄膜100而言,一初 始層或是一透明導電層可以被形成於該硬質塗層110之相對側邊上。在該樹脂層的表面上也可以形成一抗濕層或是一保護層。該抗濕層與保護層的厚度係較佳地為不超過20nm以不影響該所需之抗反射性。The layered structure of the stacked film according to the present invention on at least one side of the substrate film 100 is sequentially a hard coating layer 110 containing a (meth) acrylate compound, and one containing conductive particles. The conductive layer 120 and the resin layer 130 containing a fluorine compound. Another specific example of the hierarchical structure is prepared by forming the conductive layer 120 on both side edges of the base film 100, but in this case, it is preferable that the two conductive properties are A resin layer 130 is formed on at least either side of the conductive layer 120 of the layer 120. Meanwhile, if a plurality of conductive layers 120 are formed on one side of the base film 100, it is preferable to form a plurality of resin layers 130 such that the resin layer 130 can be disposed on the base film 100. On the outermost surface on the same side. For the substrate film 100, an initial An initial layer or a transparent conductive layer may be formed on opposite sides of the hard coat layer 110. A moisture-resistant layer or a protective layer may also be formed on the surface of the resin layer. The thickness of the moisture barrier layer and the protective layer is preferably not more than 20 nm so as not to affect the desired antireflection property.

該用來顯示影像之本發明的顯示裝置的該薄膜,係藉著在該樹脂層130上形成一個膠黏或黏性層,並接著將一保護薄膜黏結在該膠黏或黏性層上而加以生產。該膠黏或黏性層並未被侷限於一特定之類型,只要該層次可以藉由黏結或黏附作用來達成黏接效果。該用於形成該黏性或膠黏層之黏結劑或膠黏劑,可以是以橡膠為基礎的、以乙烯聚合作用為基礎的、以縮合聚合作用為基礎的,以熱固化樹脂為基礎的或是以矽為基礎的等等。在前述的具體例之中,典型的以橡膠為基礎之黏合劑或膠黏劑係為以丁二烯-苯乙烯共聚物(SBR)為基礎的、以丁二烯-丙烯晴共聚物(NBR)為基礎的、以氯丁二烯聚合物為基礎的、以異丁烯-異戊二烯共聚物為基礎的(丁基橡膠)等等。典型的以乙烯聚合作用為基礎之黏附劑或膠黏劑,係為以丙烯樹脂為基礎的、以苯乙烯樹脂為基礎的、以乙酸乙烯酯-乙烯共聚物為基礎的或是以氯乙烯-乙酸乙烯酯共聚物為基礎的,等等。典型的以縮合聚合作用為基礎的黏附劑或膠黏劑係為以聚酯樹脂為基礎的。典型的以熱固樹脂為基礎之膠黏劑係為以環氧樹脂為基礎的,以胺基甲酸酯樹脂為基礎的、以福馬林樹脂為基礎的,等等。這些類型之樹脂都可以被獨立地或是將其等之二或更多類型加以混合來使用。The film of the display device of the present invention for displaying an image is formed by forming an adhesive or adhesive layer on the resin layer 130 and then bonding a protective film to the adhesive or adhesive layer. Produced. The adhesive or adhesive layer is not limited to a particular type as long as the layer can be bonded by adhesion or adhesion. The adhesive or adhesive for forming the adhesive or adhesive layer may be based on a rubber-based, ethylene-based polymerization based on condensation polymerization, based on a thermosetting resin. Or based on 矽 and so on. Among the foregoing specific examples, a typical rubber-based adhesive or adhesive is a butadiene-acrylonitrile copolymer (NBR) based on butadiene-styrene copolymer (SBR). Based on a chloroprene polymer based on an isobutylene-isoprene copolymer (butyl rubber) or the like. Typical ethylene-based adhesives or adhesives based on propylene resin, based on styrene resin, based on vinyl acetate-ethylene copolymer or vinyl chloride - Based on vinyl acetate copolymers, and the like. Typical adhesives or adhesives based on condensation polymerization are based on polyester resins. Typical thermoset resin based adhesives are epoxy based, based on urethane resins, based on formalin resins, and the like. These types of resins can be used independently or in combination of two or more of them.

該黏附劑或膠黏劑可以是溶劑類型或非溶劑類型中之任何一種。該黏性層或膠黏層可以例如塗敷作用等等之一般已知的方法,而以上述之黏附劑或膠黏劑來形成。同時,該黏性層或膠黏層可以包含有染色劑。其可以輕易地藉著將含有例如染料和色素之染色材料的染色劑與黏性劑或膠黏劑加以混合而獲得。在含有染色劑的情況中,在550nm下之該堆疊薄膜的透光度係較佳地落在40至80%裡面。同時,如果該薄膜係被用於一電漿顯示器,該透光度範圍可以藉由使用一包含有染色材料之黏性層或膠黏劑層而獲得,由於該所傳輸的光必需是中性灰或是藍灰色,而在該顯示器中所發出之光的色純度與對比將可以被改善。The adhesive or adhesive may be any of a solvent type or a non-solvent type. The adhesive layer or adhesive layer can be formed by a commonly known method such as coating action or the like with the above-mentioned adhesive or adhesive. At the same time, the adhesive layer or adhesive layer may contain a coloring agent. It can be easily obtained by mixing a coloring agent containing a dyeing material such as a dye and a pigment with an adhesive or an adhesive. In the case of containing a coloring agent, the transmittance of the stacked film at 550 nm preferably falls within 40 to 80%. Meanwhile, if the film is used in a plasma display, the transmittance range can be obtained by using a viscous layer or an adhesive layer containing a dyeing material, since the transmitted light must be neutral. Gray or blue-gray, and the color purity and contrast of the light emitted in the display can be improved.

該包含有該保護性薄膜之樹脂材料並未被侷限於任何特定之類型,並且可以適當地選擇用於已知的塑膠基材薄膜之樹脂材料。典型之用於此一保護性薄膜材料的聚合物之樹脂材料係為具有單元之聚合物或共聚物,該單元係為一選自於由酯類、乙烯、丙烯、二乙酸、三乙酸、苯乙烯、碳酸酯、甲基戊烯、碸類、乙醚乙基酮、尼龍、丙烯酸酯、以肪環族烯烴為基礎的樹脂,等等所構成之群組者。就該樹脂材料而言,其係較佳地使用具有單元之聚合物,該單元係為一選自於由例如聚乙烯或聚丙烯之以乙烯或丙烯為基礎的樹脂,或是例如聚對苯二甲酸乙酯之以酯類為基礎的樹脂,等等所構成之群組者。特別是,在透光性與機械性質的方面,其係較佳地使用一包含具有以酯為基礎之樹脂的聚合物之單元的基材薄膜。The resin material containing the protective film is not limited to any particular type, and a resin material for a known plastic substrate film can be appropriately selected. A typical resin material for the polymer of the protective film material is a polymer or copolymer having a unit selected from the group consisting of esters, ethylene, propylene, diacetic acid, triacetic acid, and benzene. A group consisting of ethylene, carbonate, methylpentene, anthracene, diethyl ether ethyl ketone, nylon, acrylate, a resin based on a fatty cycloolefin, and the like. In the case of the resin material, it is preferred to use a polymer having a unit selected from an ethylene or propylene-based resin such as polyethylene or polypropylene, or, for example, polyparaphenylene. A group of ethylenic diesters based on ester-based resins, and the like. In particular, in terms of light transmittance and mechanical properties, it is preferred to use a substrate film comprising a unit of a polymer having an ester-based resin.

用於一依據本發明之顯示裝置的該薄膜係藉著將一黏性層或膠黏層夾置於一顯示裝置的該薄膜上,並將其黏結於一LCD、電漿顯示面板(PDP)、電致發光顯示裝置(ELD)、CRT,或是行動數位助理等等之前側面板的顯示器表面及/或表面上。The film for use in a display device according to the present invention is formed by sandwiching an adhesive layer or an adhesive layer on the film of a display device and bonding it to an LCD, plasma display panel (PDP). , the electroluminescent display device (ELD), the CRT, or the mobile digital assistant, etc. on the display surface and/or surface of the front side panel.

其可以藉著將一黏性層或膠黏層夾置於一顯示裝置的該薄膜上,並將其黏結於一例如LCD、電漿顯示面板(PDP)、電致發光顯示裝置(ELD)、CRT,或是行動數位助理等等之該顯示裝置的該顯示側邊上,而得到一顯示裝置螢幕。It can be adhered to the film of a display device by a sticky layer or an adhesive layer, and bonded to, for example, an LCD, a plasma display panel (PDP), an electroluminescent display device (ELD), The CRT, or the mobile digital assistant or the like, is displayed on the display side of the display device to obtain a display device screen.

層合該在該顯示側邊上及/或該顯示裝置之前側面板的表面上之堆疊薄膜的該方法並未侷限於一特定的類型,但是舉例來說,該用於一顯示裝置或是一顯示器之包含有該堆疊薄膜之薄膜,可以藉由將一黏性層或者膠黏層施加於該顯示器元件或是基材薄膜100上、將該膠黏層以一壓軋滾筒施加至該薄膜100而使得該堆疊薄膜中之該樹脂層130可以是該表面層,並藉此將該顯示元件在夾合了黏性或膠黏層下與該基材薄膜100黏結。The method of laminating the stacked film on the display side and/or the surface of the front side panel of the display device is not limited to a particular type, but for example, for a display device or a The display comprises a film of the stacked film, which can be applied to the display element or the substrate film 100 by applying an adhesive layer or an adhesive layer to the film 100 by a nip roll. The resin layer 130 in the stacked film may be the surface layer, and thereby the display element is bonded to the substrate film 100 under the adhesive or adhesive layer.

以下將參照該等圖式來描述一電漿顯示面板之前側保護板(PDP前側面板)的具體例,其中其可以使用依據本發明之具有優異之刮擦抗性與表面滑動性質之該抗反射薄膜,但是應該要注意的是本發明不應該被侷限於該具體例。依據本發明之具有優異之刮擦抗性與表面滑動性質之該抗反射薄膜,係被層合於一玻璃層、丙烯酸層、聚碳酸 酯層等等的兩個側邊上,而將一黏性層或膠黏層夾合於該基材薄膜100得側邊上。在該PDP前測面板之保護薄膜的透明基材與該膠黏層150之間,可以具有一電磁波屏蔽層、一近紅外光屏蔽層、一紫外線屏蔽層等等。A specific example of a front side protective plate (PDP front side panel) of a plasma display panel will be described below with reference to the drawings, wherein the anti-reflection having excellent scratch resistance and surface sliding properties according to the present invention can be used. Film, but it should be noted that the present invention should not be limited to this specific example. The antireflection film having excellent scratch resistance and surface sliding property according to the present invention is laminated on a glass layer, an acrylic layer, and a polycarbonate On both sides of the ester layer or the like, a viscous layer or an adhesive layer is sandwiched on the side of the base film 100. The transparent substrate of the protective film of the front panel of the PDP and the adhesive layer 150 may have an electromagnetic wave shielding layer, a near-infrared light shielding layer, an ultraviolet shielding layer and the like.

同時,本發明也需要藉著將上述的抗反射薄膜黏結至一影像顯示裝置側邊或是一前側面板的表面上,而將一顯示裝置加以覆蓋。At the same time, the present invention also needs to cover a display device by bonding the anti-reflection film described above to the side of an image display device or the surface of a front side panel.

在下文中,本發明將以該等具體例與比較具體例來更詳細地描述。Hereinafter, the present invention will be described in more detail with the specific examples and comparative examples.

[具體例1][Specific example 1]

形成一個硬質塗層(110)Form a hard coating (110)

該包含有多官能基之以丙烯為基礎的樹脂塗層材料(50%的固體)(KZ7528,其可以自JSR公司取得),係使用一個微型凹版塗覆器而以係為100μm的厚度,來施加於包含有聚酯薄膜(Lumirror,其可以自Dorey公司取得)之該基材薄膜100之該表面上。在於80℃下將該塗層乾燥5分鐘之後,能量為1.0J/cm2 的紫外線係照射至其上以固化該塗層,並因而形成一具有大約為10.0μm之厚度的硬質塗層110。The polyfunctional propylene-based resin coating material (50% solids) (KZ7528, available from JSR Corporation) is a micro-gravure coater with a thickness of 100 μm. It is applied to the surface of the base film 100 containing a polyester film (Lumirror, available from Dorey Corporation). After the coating was dried at 80 ° C for 5 minutes, an ultraviolet ray having an energy of 1.0 J/cm 2 was irradiated thereon to cure the coating, and thus a hard coat layer 110 having a thickness of about 10.0 μm was formed.

形成一高折射率層(120)Forming a high refractive index layer (120)

該包含有銦氧化亞錫(ITO)之塗層材料(其具有10%之固體)(HRA-196,其可以自Japan Chemical公司取得)係被溶解在異丙醇中。該混合物係被攪拌以產生塗料液體。該所產生之塗料液體然後使用一個微型凹版塗覆器來施加於該硬質塗層110的表面上,而該塗層係於80℃下乾燥5分 鐘,並接著以能量為1.0J/cm2 的紫外線來照射以固化該塗層,並產生厚度為大約為0.1μm之高折射率層120,而而其之一折射率係為(n)=1.62。The coating material containing indium tin oxide (ITO), which has 10% solids (HRA-196, available from Japan Chemical Co., Ltd.), was dissolved in isopropanol. The mixture is agitated to produce a coating liquid. The resulting coating liquid is then applied to the surface of the hard coat layer 110 using a micro gravure applicator which is dried at 80 ° C for 5 minutes and then at an energy of 1.0 J/cm 2 . Ultraviolet rays were irradiated to cure the coating, and a high refractive index layer 120 having a thickness of about 0.1 μm was produced, and one of the refractive indices was (n) = 1.62.

形成一個低折射率層(130)Forming a low refractive index layer (130)

該包含有氟共聚物(氟基烯烴/乙烯醚共聚物)之塗層材料(其具有10%之固體,相對於100份之的重量之黏合劑樹脂(LR-S3020,其可以自TORAY公司取得),中空二氧化矽係為15份的重量)係被溶解在異丙醇中。該所產生之混合物係被攪拌以產生塗料液體,其然後使用一個微型凹版塗覆器來施加於該高折射率層120的表面上,以產生一厚度大約為112至116nm的層次,而該塗層係於80℃下乾燥5分鐘,並接著以能量為1.0J/cm2 的紫外線來照射以固化該塗層,並形成大約為0.1μm之厚度的低折射率層130,而其之一折射率係為(n)=1.39。The coating material comprising a fluorocopolymer (fluoroolefin/vinyl ether copolymer) having 10% solids relative to 100 parts by weight of binder resin (LR-S3020, which is available from TORAY Corporation) The hollow cerium oxide is 15 parts by weight) dissolved in isopropyl alcohol. The resulting mixture is agitated to produce a coating liquid which is then applied to the surface of the high refractive index layer 120 using a micro-gravure applicator to produce a layer having a thickness of approximately 112 to 116 nm. The layer was dried at 80 ° C for 5 minutes, and then irradiated with ultraviolet rays having an energy of 1.0 J/cm 2 to cure the coating layer, and a low refractive index layer 130 having a thickness of about 0.1 μm was formed, and one of the layers was refracted. The rate is (n) = 1.39.

[具體例2][Specific example 2]

一基材薄膜100、一硬質塗層110,以及一高折射率層120,係在與具體例1中之相同的條件與相同的方法下形成。接著,該包含有氟共聚物(氟基烯烴/乙烯醚共聚物)之塗層材料(其具有10%之固體,相對於100份之的重量之黏合劑樹脂(TU-2207,其可以自JSR公司取得),中空二氧化矽係為20份的重量)係被溶解在異丙醇中。該所產生之混合物係被攪拌以產生塗料液體,其接著使用一個微型凹版塗覆器來施加於該高折射率層120上,以產生一厚度大約為106至110nm的層次。該塗層係於80℃下乾燥5分鐘並 以能量為1.0J/cm2 的紫外線來照射以固化該塗層,並形成厚度大約為0.1μm之低折射率層130,而其之一折射率係為(n)=1.39。A base film 100, a hard coat layer 110, and a high refractive index layer 120 were formed under the same conditions and in the same manner as in Specific Example 1. Next, the coating material comprising a fluorocopolymer (fluoroolefin/vinyl ether copolymer) having 10% solids relative to 100 parts by weight of binder resin (TU-2207, which may be from JSR The company obtained), the hollow cerium oxide is 20 parts by weight) is dissolved in isopropyl alcohol. The resulting mixture is agitated to produce a coating liquid which is then applied to the high refractive index layer 120 using a micro-gravure applicator to produce a layer having a thickness of approximately 106 to 110 nm. The coating was dried at 80 ° C for 5 minutes and irradiated with ultraviolet rays having an energy of 1.0 J/cm 2 to cure the coating, and a low refractive index layer 130 having a thickness of about 0.1 μm was formed, and one of the refractive indices was formed. The system is (n) = 1.39.

[比較具體例1][Comparative Example 1]

對於一堆疊薄膜而言,進行與具體例1相同的方法來形成一基材薄膜100、一硬質塗層110,以及一高折射率層120。接著,該包含有氟共聚物(氟基烯烴/乙烯醚共聚物)之塗層材料(其具有10%之固體,相對於100份之的重量之黏合劑樹脂(LR-S3000,其可以自TORAY公司取得),中空二氧化矽係為40份的重量)係被溶解在異丙醇中。該所產生之混合物係被攪拌以產生塗料液體,其接著使用一個微型凹版塗覆器來施加於該高折射率層120上,以產生一厚度大約為112至116nm的層次。該塗層係於80℃下乾燥5分鐘並以能量為1.0J/cm2 的紫外線來照射以固化該塗層,並形成厚度大約為0.1μm之低折射率層130,而其之一折射率係為(n)=1.37。For a stacked film, a substrate film 100, a hard coat layer 110, and a high refractive index layer 120 were formed in the same manner as in Concrete 1. Next, the coating material comprising a fluorocopolymer (fluoroolefin/vinyl ether copolymer) having 10% solids relative to 100 parts by weight of binder resin (LR-S3000, which can be from TORAY The company obtained), the hollow cerium oxide is 40 parts by weight) is dissolved in isopropyl alcohol. The resulting mixture is agitated to produce a coating liquid which is then applied to the high refractive index layer 120 using a micro-gravure applicator to produce a layer having a thickness of approximately 112 to 116 nm. The coating was dried at 80 ° C for 5 minutes and irradiated with ultraviolet rays having an energy of 1.0 J/cm 2 to cure the coating, and a low refractive index layer 130 having a thickness of about 0.1 μm was formed, and one of the refractive indices was formed. The system is (n) = 1.37.

在該等具體例1和2中之低折射率層130的折射率係為1.39,而在該比較具體例中之低折射率層130的折射率係為1.37,其之原因在相較於傳統的塗層材料(LR-S3000,其可以自TORAY公司取得)所使用者,該經改良的塗層材 料係具有較低含量之中空二氧化矽(LR-S3020,TU-2207)。因為在該經改良的塗層材料中之中空二氧化矽的含量,比起傳統塗層材料之中空二氧化矽含量已經減少大約50%所以表面粗糙度將會降低,其可以提高表面滑動性質並增加刮擦抗性。The refractive index of the low refractive index layer 130 in the specific examples 1 and 2 is 1.39, and the refractive index of the low refractive index layer 130 in the comparative example is 1.37, which is due to the comparison with the conventional one. The coating material (LR-S3000, which can be obtained from TORAY), the modified coating material The system has a lower content of hollow cerium oxide (LR-S3020, TU-2207). Since the content of hollow cerium oxide in the modified coating material is reduced by about 50% compared to the hollow cerium oxide content of the conventional coating material, the surface roughness will be lowered, which can improve the surface sliding property and Increase scratch resistance.

在以下內容,將詳細地描述在本發明中之一評估與測量方法。In the following, one of the evaluation and measurement methods in the present invention will be described in detail.

[實驗1:鋼毛硬度之評估][Experiment 1: Evaluation of steel wool hardness]

在鋼毛#0000以250gf /cm2 的負載來回移動十次之後,計算刮痕之數目。依據該刮痕的數量,將硬度區分為下列的5個層級(層級5:沒有刮痕,層級4:1-5條刮痕,層級3:5-10條刮痕,層級2:超過10條刮痕,層級1:在整個表面上都是刮痕)。After the steel wool # 0000 ten times back and forth movement of a load of 250g f / cm 2, the number of scratches calculated. According to the number of scratches, the hardness is divided into the following five levels (level 5: no scratches, level 4: 1-5 scratches, level 3: 5-10 scratches, level 2: more than 10 Scratch, level 1: scratches on the entire surface).

[實驗2:霧度值的測定][Experiment 2: Determination of haze value]

霧度值係以自Sgasikenki公司取得之直接讀數霧度值電腦來進行測量。The haze value was measured using a direct reading haze value computer obtained from Sgasikenki.

[實驗3:表面電阻之評估(抗靜電能力)][Experiment 3: Evaluation of surface resistance (antistatic ability)]

表面電阻係以自Mitsubishi Uka公司取得之HIRESTA來進行測量。The surface resistance was measured by HIRESTA obtained from Mitsubishi Uka Corporation.

[實驗4:反射能力之測定][Experiment 4: Determination of reflectivity]

反射能力係以自Hitachi Keisoku公司取得之分光光度計U-3410來進行測量。刮痕係以320至400號的防水砂紙來均勻地形成於該樣本薄膜之另一側邊上,而黑色塗層材料係被施加於其上以完全地排除來自於另一側反射現 象。針對於該樹脂層表面,其之測量係在6-10度之入射光進行。在此,所側得之標準的反射能力係代表在380nmλ780nm的波長範圍內之最小值。The reflectance was measured by a spectrophotometer U-3410 obtained from Hitachi Keisoku Corporation. The scratches were uniformly formed on the other side of the sample film with a waterproof sandpaper of 320 to 400, and a black coating material was applied thereto to completely exclude the reflection phenomenon from the other side. For the surface of the resin layer, the measurement is performed at incident light of 6-10 degrees. Here, the standard reflection ability of the side is represented at 380 nm. λ The minimum value in the wavelength range of 780 nm.

[實驗5:摩擦係數之測定][Experiment 5: Determination of friction coefficient]

在此係使用TOYOSEIKI公司的TR型號之摩擦測量器,而且日本DENSHIKAGAKU公司的單一編碼器U-228係被用來進行測量。該測量係以美國材料試驗學會D1894的標準為基礎。一欲進行測量的薄膜係被差置於該上端與下端板件之間,而且其之靜態與動態摩擦係數係在200±5g的重量以及152±30毫米的測定速度之條件下加以測量。Here, a TR type friction gauge of TOYOSEIKI Co., Ltd. is used, and a single encoder U-228 of DENSHIKAGAKU of Japan is used for measurement. The measurement is based on the standards of the American Society for Testing and Materials D1894. A film to be measured was placed between the upper and lower end plates, and its static and dynamic coefficients of friction were measured at a weight of 200 ± 5 g and a measurement speed of 152 ± 30 mm.

由前述說明可知,習於此藝者將可以瞭解各種不同的修改和變化,可以在不背離本發明之真實精神與範圍下完成。應該要了解的是前述說明僅係用於例示說明,而不是要用來侷限由該申請專利範圍所界定之本發明的範圍。It will be apparent to those skilled in the art that various modifications and changes can be made without departing from the true spirit and scope of the invention. It is to be understood that the foregoing description is intended to be illustrative and not restrictive of the scope of the invention

100‧‧‧基礎薄膜100‧‧‧Basic film

110‧‧‧硬質塗層110‧‧‧hard coating

120‧‧‧高折射率層120‧‧‧High refractive index layer

130‧‧‧低折射率層130‧‧‧Low refractive index layer

140‧‧‧保護性薄膜140‧‧‧Protective film

150‧‧‧黏附層150‧‧‧Adhesive layer

160‧‧‧釋放薄膜160‧‧‧ release film

第1圖顯示一抗反射薄膜之原理;第2圖係為概要地顯示依據本發明之該抗反射薄膜的堆疊結構之薄膜的剖面圖。Fig. 1 shows the principle of an antireflection film; Fig. 2 is a cross-sectional view schematically showing a film of a stacked structure of the antireflection film according to the present invention.

100‧‧‧基礎薄膜100‧‧‧Basic film

110‧‧‧硬質塗層110‧‧‧hard coating

120‧‧‧高折射率層120‧‧‧High refractive index layer

130‧‧‧低折射率層130‧‧‧Low refractive index layer

140‧‧‧保護性薄膜140‧‧‧Protective film

150‧‧‧黏附層150‧‧‧Adhesive layer

160‧‧‧釋放薄膜160‧‧‧ release film

Claims (11)

一種具有優異之刮擦抗性及表面滑動性質的抗反射薄膜,其中一含有(甲基)丙烯酸酯化合物之硬質塗層、一含有一黏合劑樹脂與導電性顆粒之高折射率層,以及一含有氟化合物之低折射率層係被依序堆疊在一基礎薄膜的至少一側上,其中該低折射率層之表面係具有細微的不平整,且在該低折射率層側上之一靜磨擦係數係等於或少於0.5,而一動磨擦係數係等於或少於0.5,且其中該靜摩擦係數及動摩擦係數根據ASTM D 1894之標準被測量,且該高折射率層的厚度係介於0.01μm與1.0μm之間且該低折射率層的厚度係介於0.01μm與1.0μm之間。 An antireflection film having excellent scratch resistance and surface sliding properties, wherein a hard coating layer containing a (meth) acrylate compound, a high refractive index layer containing a binder resin and conductive particles, and The low refractive index layer containing the fluorine compound is sequentially stacked on at least one side of the base film, wherein the surface of the low refractive index layer has fine unevenness, and one of the sides of the low refractive index layer is static The coefficient of friction is equal to or less than 0.5, and the coefficient of dynamic friction is equal to or less than 0.5, and wherein the coefficient of static friction and the coefficient of dynamic friction are measured according to the standard of ASTM D 1894, and the thickness of the high refractive index layer is 0.01 μm. The thickness of the low refractive index layer is between 1.0 μm and 1.0 μm. 如申請專利範圍第1項的薄膜,其中該低折射率層包含有相對於100份的重量之該黏合劑樹脂係為15至25份的重量之中空二氧化矽(silica)。 The film of claim 1, wherein the low refractive index layer comprises hollow silica having a weight of from 15 to 25 parts by weight relative to 100 parts by weight of the binder resin. 如申請專利範圍第1項的薄膜,其中在該抗反射薄膜中之霧度值係少於3.0%。 The film of claim 1, wherein the anti-reflective film has a haze value of less than 3.0%. 如申請專利範圍第1項的薄膜,其中該硬質塗層之厚度係介於1μm與50μm之間。 The film of claim 1, wherein the hard coating has a thickness of between 1 μm and 50 μm. 如申請專利範圍第1項的薄膜,其中該高折射率層之該等導電性顆粒係為金屬氧化物顆粒。 The film of claim 1, wherein the conductive particles of the high refractive index layer are metal oxide particles. 如申請專利範圍第1項的薄膜,其中在該高折射率層中之該黏合劑樹脂與該等導電性顆粒之重量比值係為10/90至30/70。 The film of claim 1, wherein the weight ratio of the binder resin to the conductive particles in the high refractive index layer is from 10/90 to 30/70. 如申請專利範圍第1項的薄膜,其中該低折射率層的該氟化合物係為在主鏈中具有乙烯醚結構之含氟共聚物。 The film of claim 1, wherein the fluorine compound of the low refractive index layer is a fluorine-containing copolymer having a vinyl ether structure in a main chain. 如申請專利範圍第1項的薄膜,其中該低折射率層包含有顆粒尺寸係為0.001μm至0.2μm之二氧化矽顆粒。 The film of claim 1, wherein the low refractive index layer comprises cerium oxide particles having a particle size of from 0.001 μm to 0.2 μm. 如申請專利範圍第8項的薄膜,其中該等二氧化矽顆粒具有係為二或更多種類型之成分的顆粒尺寸分佈。 The film of claim 8, wherein the cerium oxide particles have a particle size distribution of two or more types of components. 如申請專利範圍第1項的薄膜,其中該低折射率層係進一步含有以下列的化學式1來表示的矽烷連接劑或其之水解物或是其之反應物:[化學式1]R(1)a R(2)b SiX4-(a+b) ,其中,R(1)或R(2)係為一具有烷基、烯基、烯丙基或是鹵素基之烴基基團、環氧基、胺基、氫硫基、甲基丙烯醯氧基,或是氰基;X係為一選自於烷氧基、烷氧-烷氧基、鹵素基或是醯氧基之可以被水解之取代基;而a與b係分別地為0、1或2;並且(a+b)係為1、2或3。The film of claim 1, wherein the low refractive index layer further contains a decane linking agent represented by the following Chemical Formula 1 or a hydrolyzate thereof or a reactant thereof: [Chemical Formula 1] R (1) a R (2) b SiX 4- (a + b), wherein, R (1) or R (2) is based having a hydrocarbon group, an alkenyl group, an allyl group or a group of a halogen group, an epoxy a group, an amine group, a hydrogenthio group, a methacryloxy group, or a cyano group; the X system is selected from an alkoxy group, an alkoxy-alkoxy group, a halogen group or a decyloxy group to be hydrolyzed. a substituent; and a and b are 0, 1, or 2, respectively; and (a+b) is 1, 2, or 3. 如申請專利範圍第1項的薄膜,其中在該低折射率層中之氟化物係進一步含有以下列的化學式2來表示的具有一烷氧基矽烷基之氟樹脂或是其之水解物:[化學式2]R(3)c R(4)d SiX4-(c+d) ,其中,R(3)或R(4)係為一具有氟化烷基、烯基、烯丙基、甲基丙烯醯氧基,或是(甲基)丙烯醯基之烴基基 團;X係為一選自於烷氧基、烷氧-烷氧基、鹵素基或是醯氧基之可以被水解之取代基;而c與d係分別地為0、1、2或3;並且(c+d)係為1、2或3。The film of claim 1, wherein the fluoride in the low refractive index layer further contains a fluororesin having an alkoxyalkylalkyl group represented by the following Chemical Formula 2 or a hydrolyzate thereof: Chemical formula 2] R(3) c R(4) d SiX 4-(c+d) wherein R(3) or R(4) is a fluorinated alkyl group, an alkenyl group, an allyl group, a group a propylene oxy group, or a (meth) acrylonitrile group; the X system is selected from an alkoxy group, an alkoxy-alkoxy group, a halogen group or a decyloxy group. a substituent; and c and d are 0, 1, 2 or 3, respectively; and (c+d) is 1, 2 or 3.
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