TWI460319B - Crystal growth device and ingot manufacturing method - Google Patents
Crystal growth device and ingot manufacturing method Download PDFInfo
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Description
本發明是有關一種長晶裝置及晶體製造方法,且特別是有關於一種能調整坩鍋內熔湯表面溫梯分佈的長晶裝置及晶體製造方法。The invention relates to a crystal growth device and a crystal production method, and particularly relates to a crystal growth device and a crystal production method capable of adjusting the temperature distribution of a molten steel surface in a crucible.
為了製造藍寶石晶圓,典型的做法是,將被填入高純度氧化鋁原料的長晶裝置加熱至或超過攝氏2100度以熔化該原料,接著經歷一連串程序如鑽取、圓磨、切片、研磨、熱處理、及拋光以取得單晶晶圓。In order to manufacture a sapphire wafer, it is typical to heat the crystal growth apparatus to a high purity alumina raw material to or above 2100 degrees Celsius to melt the material, followed by a series of processes such as drilling, round grinding, slicing, and grinding. , heat treatment, and polishing to obtain a single crystal wafer.
在製造藍寶石單晶時,控制氣泡及控制錯位對於品質上具有重大的影響。錯位可藉由在晶體成長後利用蝕刻方法而被量測。錯位主要是因為熱應力而產生,而熱應力主要是發生在長晶時的晶體內部與外部之溫度差。因此,錯位密度可藉由控制熱應力而被控制。In the manufacture of sapphire single crystals, controlling bubbles and controlling misalignment have a major impact on quality. The misalignment can be measured by an etching method after the crystal is grown. The misalignment is mainly caused by thermal stress, and the thermal stress is mainly the temperature difference between the inside and the outside of the crystal which occurs in the growth of the crystal. Therefore, the dislocation density can be controlled by controlling the thermal stress.
舉例來說,在過往的經驗中,由於長晶裝置通常是在其側面與底部加熱,故導致在晶體的頂部與底部之間具有溫度梯度。上述溫度梯度所產生的熱應力最終導致錯位而影響晶體品質。For example, in past experience, since the crystal growth apparatus is usually heated at its sides and bottom, it has a temperature gradient between the top and bottom of the crystal. The thermal stress generated by the above temperature gradient eventually leads to misalignment and affects the crystal quality.
於是,本發明人有感上述缺失之可改善,乃特潛心研究並配合學理之運用,終於提出一種設計合理且有效改善上述缺失之本發明。Therefore, the present inventors have felt that the above-mentioned deficiencies can be improved, and they have devoted themselves to research and cooperated with the application of the theory, and finally proposed a present invention which is reasonable in design and effective in improving the above-mentioned defects.
本發明實施例在於提供一種長晶裝置及晶體製造方法,其能有效調整熔湯表面的溫梯分佈。The embodiment of the invention provides a crystal growth device and a crystal manufacturing method, which can effectively adjust the temperature distribution of the molten steel surface.
本發明實施例提供一種長晶裝置,包括:一坩鍋;一 坩鍋蓋,其界定有一開口,該坩鍋蓋裝設於該坩鍋上,且該坩鍋與該坩鍋蓋包圍定義出一容置空間,該容置空間經該開口而連通於外;一隔熱單元,其設置於該坩鍋蓋的外表面上;以及數個熱反射環,其設置於該容置空間內且分別懸吊於該坩鍋蓋,而任兩相鄰的熱反射環呈間隔設置,且該些熱反射環與該坩鍋蓋之間各形成有一第一夾角,且該第一夾角為平角,該些熱反射環能在該長晶裝置加熱過程中產生形變,以使每一熱反射環與該坩鍋蓋之間的第一夾角能變化至一第二夾角,而該第二夾角為銳角。The embodiment of the invention provides a crystal growth device, comprising: a crucible; The crucible lid defines an opening, the crucible lid is mounted on the crucible, and the crucible is surrounded by the crucible lid to define an accommodating space, and the accommodating space communicates with the outside through the opening; An insulating unit disposed on an outer surface of the crucible lid; and a plurality of heat reflecting rings disposed in the receiving space and suspended from the crucible lid respectively, and any two adjacent heat reflections The rings are spaced apart, and a first angle is formed between the heat reflecting rings and the crucible cover, and the first angle is a flat angle, and the heat reflecting rings can be deformed during heating of the crystal growth device. The first angle between each heat reflecting ring and the crucible lid can be varied to a second angle, and the second angle is an acute angle.
本發明實施例另提供一種晶體製造方法,其步驟包括:提供如上所述之該長晶裝置;於該坩鍋內盛裝一原料;將該些熱反射環懸吊於該坩鍋蓋下方,並該坩鍋蓋上裝設該隔熱單元,而後將該坩鍋蓋裝設於該坩鍋上,使該些熱反射環位於該容置空間內;以及進行該長晶裝置的加熱,以將該原料熔融形成一熔湯,於該長晶裝置加熱過程中,該些熱反射環因受熱而產生形變,以使每一熱反射環與該坩鍋蓋之間呈平角的第一夾角逐漸變化至呈銳角的該第二夾角,進而調整該熔湯表面的垂直溫梯分佈與水平溫梯分佈。The embodiment of the present invention further provides a crystal manufacturing method, the method comprising: providing the crystal growth device as described above; loading a raw material in the crucible; suspending the heat reflection rings under the crucible cover, and The heat insulating unit is mounted on the crucible lid, and then the crucible lid is mounted on the crucible, the heat reflecting rings are located in the receiving space; and the heating of the crystal growth device is performed to The raw material is melted to form a molten soup. During the heating of the crystal growth device, the heat reflecting rings are deformed by heat, so that the first angle between each heat reflecting ring and the crucible cap is gradually changed. The second angle to an acute angle, thereby adjusting the vertical temperature distribution and the horizontal temperature distribution of the molten stone surface.
綜上所述,本發明實施例所提供的長晶裝置及晶體製造方法,其能提高製程參數的可調區間,以控制熔湯表面溫梯分佈,進而減少擴肩急速生長的機率,達到減少晶體之熱應力集中,以提升晶體品質的效果。In summary, the crystal growth device and the crystal manufacturing method provided by the embodiments of the present invention can improve the adjustable interval of the process parameters, thereby controlling the distribution of the temperature gradient on the molten steel surface, thereby reducing the probability of rapid growth of the shoulder expansion and reducing the probability. The thermal stress of the crystal is concentrated to enhance the crystal quality.
為使能更進一步瞭解本發明之特徵及技術內容,請參閱以下有關本發明之詳細說明與附圖,但是此等說明與所附圖式僅係用來說明本發明,而非對本發明的權利範圍作 任何的限制。The detailed description of the present invention and the accompanying drawings are to be understood by the claims Scope Any restrictions.
本發明為一種長晶裝置及晶體製造方法。首先,針對運用在晶體製造方法的長晶裝置作一簡要說明,其後,再接著介紹晶體製造方法。The invention is a crystal growth device and a crystal production method. First, a brief description will be given of a crystal growth apparatus used in a crystal manufacturing method, and thereafter, a crystal production method will be described.
請參閱圖1A和圖1B所示,其為本發明的一實施例,本實施例提供一種長晶裝置100,包括:一坩鍋1、一坩鍋蓋2、一隔熱單元3、數個熱反射環4、及一吊掛單元5。其中,上述坩鍋1為業界常用之器具,故在此不加以詳述。Referring to FIG. 1A and FIG. 1B , which is an embodiment of the present invention, the present embodiment provides a crystal growth apparatus 100 including: a crucible, a crucible cover 2, a thermal insulation unit 3, and a plurality of The heat reflecting ring 4 and a hanging unit 5. Among them, the above-mentioned crucible 1 is an appliance commonly used in the industry, and therefore will not be described in detail herein.
所述坩鍋蓋2的大致中央部位界定有一開口21,並且坩鍋蓋2於開口21旁的部位形成有數個貫穿孔22。所述坩鍋蓋2裝設於坩鍋1上,以使坩鍋1與坩鍋蓋2包圍定義出一容置空間11,而所述容置空間11能經開口21而連通於外。A substantially central portion of the crucible lid 2 defines an opening 21, and a plurality of through holes 22 are formed in the portion of the crucible lid 2 adjacent to the opening 21. The crucible lid 2 is mounted on the crucible 1 so that the crucible 1 and the crucible lid 2 define an accommodating space 11 , and the accommodating space 11 can communicate with the outside through the opening 21 .
所述隔熱單元3具有數層環狀隔熱片31,該些隔熱片31層層依序堆疊設置於坩鍋蓋2的外表面上,並且該些隔熱片31的內徑皆大於坩鍋蓋2的開口21。其中,上述該些隔熱片31於圖式中是以彼此接觸堆疊為例,但不排除該些隔熱片31彼此間隔地堆疊設置。再者,該些隔熱片31的內徑自鄰近坩鍋蓋2朝遠離坩鍋蓋2的方向逐層遞增,也就是說,所述坩鍋蓋2的開口21不會被隔熱單元3所遮蔽。並且該些隔熱片31的外緣大致與坩鍋蓋2的外緣切齊。The heat insulating unit 3 has a plurality of layers of annular heat insulating sheets 31, and the heat insulating sheets 31 are sequentially stacked on the outer surface of the crucible lid 2, and the inner diameters of the heat insulating sheets 31 are larger than The opening 21 of the crucible lid 2. The above-mentioned heat insulating sheets 31 are exemplified by being in contact with each other in the drawing, but it is not excluded that the heat insulating sheets 31 are stacked and arranged at intervals. Moreover, the inner diameters of the heat insulating sheets 31 are gradually increased from the adjacent crucible lid 2 in a direction away from the crucible lid 2, that is, the opening 21 of the crucible lid 2 is not blocked by the heat insulating unit 3. Shaded. And the outer edges of the heat insulating sheets 31 are substantially aligned with the outer edges of the crucible lid 2.
藉此,所述長晶裝置100透過隔熱單元3的設置,以使坩鍋1內的熱能受到坩鍋蓋2與隔熱單元3的阻擋而較不易經由發散於外,進而增加保溫效果。再者,所述坩鍋 蓋2以外的溫度梯度受到隔熱單元3的影響而呈現緩緩逐漸下降的趨勢,以利於後續相關引晶步驟。Thereby, the crystal growth apparatus 100 is disposed through the heat insulation unit 3 so that the heat energy in the crucible 1 is blocked by the crucible cover 2 and the heat insulation unit 3, and is less likely to be dissipated outside, thereby increasing the heat retention effect. Furthermore, the crucible The temperature gradient outside the cover 2 is gradually affected by the thermal insulation unit 3 to gradually decrease gradually, so as to facilitate the subsequent related seeding step.
所述熱反射環4大致呈板狀且是由銥、鎢、或鉬等耐熱並具有一定延展性之材料所製成。再者,為便於說明,本實施例是以圖1A所示之熱反射環4作為下述介紹之用,但於實際應用時,熱反射環4亦可依設計者需求而調整為其他態樣。The heat reflecting ring 4 is substantially plate-shaped and is made of a material that is heat-resistant and has a certain ductility such as tantalum, tungsten, or molybdenum. In addition, for convenience of description, the heat-reflecting ring 4 shown in FIG. 1A is used as the following description, but in practical applications, the heat-reflecting ring 4 can also be adjusted to other aspects according to the designer's needs. .
舉例來說,請參閱圖1C和圖1D所示,所述熱反射環4能於其內緣或外緣突出形成有一延伸部43,藉以改變熱反射環4的厚度,進而適用於後續調整熔湯表面的溫梯分佈。或者,所述熱反射環4亦能形成如管狀的構造(圖未示)。For example, as shown in FIG. 1C and FIG. 1D, the heat reflecting ring 4 can be formed with an extending portion 43 at its inner edge or outer edge to change the thickness of the heat reflecting ring 4, and is suitable for subsequent adjustment of the melting. The temperature ladder distribution on the surface of the soup. Alternatively, the heat reflecting ring 4 can also be formed in a tubular configuration (not shown).
復參閱圖1A和圖1B,所述熱反射環4分別懸吊於坩鍋蓋2且設置於容置空間11內,而任兩相鄰的熱反射環4呈等距地間隔設置,藉以透過所述兩熱反射環4的間距達到隔熱的效果。該些熱反射環4與坩鍋蓋2之間各形成有一第一夾角,其中,上述第一夾角於本實施例中以平角(180度)為例。Referring to FIG. 1A and FIG. 1B , the heat reflecting ring 4 is suspended from the crucible cover 2 and disposed in the accommodating space 11 , and any two adjacent heat reflecting rings 4 are equally spaced to pass through. The distance between the two heat reflecting rings 4 reaches the effect of heat insulation. A first angle is formed between the heat reflecting ring 4 and the crucible lid 2, wherein the first angle is exemplified by a flat angle (180 degrees) in the embodiment.
更詳細地說,在長晶裝置100加熱過程中,該些熱反射環4能透過本身的結構設計來產生形變,以使每一熱反射環4與坩鍋蓋2之間的第一夾角(如圖1A)能變化至一第二夾角(如圖2A)。其中,上述第二夾角較佳為銳角(小於90度)。而所述第二夾角除了圖2A所呈現之情況外,熱反射環4亦能透過不同的結構設計而形成如圖2B所示之情況,換言之,實際狀態可依設計者需求來作選擇。In more detail, during the heating of the crystal growth apparatus 100, the heat reflection rings 4 can be deformed by their own structural design so that the first angle between each heat reflection ring 4 and the crucible cover 2 ( Figure 1A) can be varied to a second angle (Figure 2A). Wherein, the second angle is preferably an acute angle (less than 90 degrees). In addition to the second angle shown in FIG. 2A, the heat reflecting ring 4 can also be formed through different structural designs as shown in FIG. 2B. In other words, the actual state can be selected according to the designer's needs.
須說明的是,圖2A所示之第二夾角為較佳的實施態樣 ,也就是說,當該些熱反射環4與坩鍋蓋2之間各形成第二夾角時,每一熱反射環4的內徑自鄰近坩鍋蓋2朝遠離坩鍋蓋2的方向逐漸遞增。藉此,凝結於熱反射環4表面的凝結物201將沿熱反射環4表面而滑落至外側部位(亦即,如圖3,將凝結物201引流至坩鍋1側壁附近),進而避免凝結雜質滴落的問題產生。It should be noted that the second angle shown in FIG. 2A is a preferred embodiment. That is, when the heat reflecting ring 4 and the crucible lid 2 respectively form a second angle, the inner diameter of each heat reflecting ring 4 gradually increases from the adjacent crucible lid 2 away from the crucible lid 2 . Thereby, the condensate 201 condensed on the surface of the heat reflecting ring 4 will slide down to the outer portion along the surface of the heat reflecting ring 4 (that is, as shown in Fig. 3, the condensate 201 is drained to the side of the side wall of the crucible 1), thereby avoiding condensation. The problem of impurity dripping occurs.
而有關熱反射環4透過何種結構設計以於長晶裝置100加熱時產生形變,下述將舉兩個實施態樣作一說明,但並不侷限於此。Regarding the structural design of the heat reflecting ring 4 to cause deformation when the crystal growth apparatus 100 is heated, two embodiments will be described below, but it is not limited thereto.
第一實施態樣:每一熱反射環4具有相對的一第一面41與一第二面42,透過熱反射環4的厚度設計以使熱能自第一面41傳遞至第二面42之後,第一面41與第二面42產生不同的熱膨脹效果。具體來說,於長晶裝置100加熱過程中,每一熱反射環4的第一面41與第二面42分別受到不同的熱應力而產生不同的熱膨脹。如第二面42的熱膨脹程度大於第一面41的熱膨脹程度,以使每一熱反射環4與坩鍋蓋2之間的第一夾角能變化至第二夾角。In a first embodiment, each of the heat reflecting rings 4 has a first surface 41 and a second surface 42 opposite to each other. The thickness of the heat reflecting ring 4 is transmitted through the thickness of the heat reflecting ring 4 to transfer heat energy from the first surface 41 to the second surface 42. The first face 41 and the second face 42 produce different thermal expansion effects. Specifically, during the heating of the crystal growth apparatus 100, the first surface 41 and the second surface 42 of each heat reflection ring 4 are subjected to different thermal stresses to generate different thermal expansions. For example, the degree of thermal expansion of the second surface 42 is greater than the degree of thermal expansion of the first surface 41 such that the first angle between each of the heat reflecting rings 4 and the crucible lid 2 can be varied to a second angle.
第二實施態樣:每一熱反射環4的表面(第一面41或第二面42)形成有至少一刻痕(圖未示)。進一步地說,於長晶裝置100加熱過程中,每一熱反射環4透過其刻痕部位產生應力集中,以使每一熱反射環4與坩鍋蓋2之間的第一夾角能變化至第二夾角。The second embodiment: the surface (the first surface 41 or the second surface 42) of each of the heat reflecting rings 4 is formed with at least one notch (not shown). Further, during the heating of the crystal growth device 100, each heat reflection ring 4 generates a stress concentration through the portion of the heat distortion ring 4, so that the first angle between each heat reflection ring 4 and the crucible cover 2 can be changed to The second angle.
而有關上述熱反射環4懸吊於坩鍋蓋2的方式,下述舉一種吊掛單元5作一說明,但不侷限於此。所述吊掛單元5包括數個桿狀的固定件51(如:螺絲)及與固定件51搭配的數個定位件52(如:螺帽)。再者,每一熱反射環4形 成有數個通孔44,每一通孔44的尺寸小於每一定位件52的尺寸,且每一熱反射環4的通孔44數量等同於所述固定件51的數量。Regarding the manner in which the heat reflecting ring 4 is suspended from the crucible lid 2, a hanging unit 5 will be described below, but is not limited thereto. The hanging unit 5 includes a plurality of rod-shaped fixing members 51 (such as screws) and a plurality of positioning members 52 (such as nuts) that are matched with the fixing members 51. Furthermore, each heat reflecting ring has a shape of 4 There are a plurality of through holes 44 each having a size smaller than that of each of the positioning members 52, and the number of the through holes 44 of each of the heat reflecting rings 4 is equal to the number of the fixing members 51.
所述固定件51裝設(如:穿設)於坩鍋蓋2的貫穿孔22,而固定件51穿出於坩鍋蓋2的部位依序穿過該些熱反射環4的通孔44。當固定件51穿出熱反射環4的通孔44時,以定位件52裝設(如:螺鎖)於固定件51,藉以達到擋止熱反射環4的效果,亦即,該些熱反射環4將透過定位件52而定位於該些固定件51,進而懸吊於坩鍋蓋2。The fixing member 51 is disposed (eg, is worn) in the through hole 22 of the crucible cover 2, and the fixing member 51 passes through the through hole 44 of the heat reflecting ring 4 through the portion of the crucible cover 2 in sequence. . When the fixing member 51 passes through the through hole 44 of the heat reflecting ring 4, the positioning member 52 is installed (eg, screwed) on the fixing member 51, thereby achieving the effect of blocking the heat reflecting ring 4, that is, the heat. The reflection ring 4 will be positioned on the fixing members 51 through the positioning member 52 and then suspended from the crucible cover 2 .
其中,每一熱反射環4與每一固定件51之間留有餘隙,以容許該些熱反射環4與坩鍋蓋2之間的夾角變化。換言之,所述餘隙能提供熱反射環4產生形變時所需的空間,藉以避免熱反射環4因形變而與固定件51產生干涉而造成損壞。There is a clearance between each of the heat reflecting rings 4 and each of the fixing members 51 to allow an angle change between the heat reflecting rings 4 and the crucible cover 2. In other words, the clearance can provide the space required for the heat reflecting ring 4 to deform, so as to prevent the heat reflecting ring 4 from being damaged by the deformation of the fixing member 51 due to the deformation.
以上已介紹完長晶裝置100,下述接著針對如何將所述長晶裝置100運用在晶體製造方法作一說明。請參閱圖1A和圖3所示,晶體製造方法之步驟包括如下:實施一準備步驟:提供如上所述之長晶裝置100(在此以圖1A所示之長晶裝置100為例),並於坩鍋1內盛裝一原料(圖未示)。其後,將該些熱反射環4透過吊掛單元5懸吊於坩鍋蓋2下方,並坩鍋蓋2上裝設隔熱單元3,而後將坩鍋蓋2裝設於坩鍋1上,使該些熱反射環4位於容置空間11內。其中,上述原料的材質可以是氧化鋁、矽、或其他材質,在此不加以限制。The crystal growth apparatus 100 has been described above, and the following description will be made on how to apply the crystal growth apparatus 100 to the crystal production method. Referring to FIG. 1A and FIG. 3, the steps of the crystal manufacturing method include the following steps: performing a preparation step of providing the crystal growth apparatus 100 as described above (here, the crystal growth apparatus 100 shown in FIG. 1A is taken as an example), and A raw material is contained in the crucible 1 (not shown). Thereafter, the heat reflecting rings 4 are suspended from the crucible cover 2 through the hanging unit 5, and the heat insulating unit 3 is mounted on the crucible lid 2, and then the crucible lid 2 is mounted on the crucible 1 The heat reflecting rings 4 are located in the accommodating space 11. The material of the raw material may be alumina, tantalum or other materials, and is not limited herein.
實施一加熱步驟:進行長晶裝置100的加熱,以將原料熔融形成一熔湯200。而於長晶裝置100加熱過程中,該 些熱反射環4因受熱而產生形變,以使每一熱反射環4與坩鍋蓋2之間的第一夾角逐漸變化至第二夾角,進而調整熔湯200表面的垂直溫梯分佈與水平溫梯分佈。A heating step is performed: heating of the crystal growth apparatus 100 to melt the raw material to form a molten soup 200. In the heating process of the crystal growth device 100, The heat reflecting rings 4 are deformed by heat, so that the first angle between each heat reflecting ring 4 and the crucible cover 2 is gradually changed to the second angle, thereby adjusting the vertical temperature distribution and level of the surface of the molten stone 200. The temperature ladder is distributed.
更詳細地說,當每一熱反射環4與坩鍋蓋2之間的第一夾角逐漸變化至第二夾角時,每一熱反射環4的內徑自鄰近坩鍋蓋2朝遠離坩鍋蓋2的方向逐漸遞增,並且熔湯200因蒸發而凝結於每一熱反射環4的凝結物201,其沿每一熱反射環4表面滑落至熔湯200的外側部位,進而避免凝結雜質滴落的問題產生。In more detail, when the first angle between each heat reflecting ring 4 and the crucible cover 2 gradually changes to the second angle, the inner diameter of each heat reflecting ring 4 is from the adjacent crucible cover 2 away from the crucible lid The direction of 2 gradually increases, and the melt 200 condenses on the condensate 201 of each heat reflecting ring 4 due to evaporation, and slides along the surface of each heat reflecting ring 4 to the outer portion of the molten stone 200, thereby preventing condensation of impurities from falling. The problem arises.
其後,對熔湯200進行引晶步驟以形成晶體(圖略),其中,由於隔熱單元3與熱反射環4的設置,使長晶裝置100於坩鍋1的內部與外部不會有溫度驟降之情事產生,以達到提升晶體品質的效果。而有關具體的引晶步驟屬於業界常用之技術手段,在此則不加以詳述。Thereafter, the molten crystal 200 is subjected to a seeding step to form a crystal (not shown), wherein the crystal growth unit 100 does not have the inside and the outside of the crucible 1 due to the arrangement of the heat insulating unit 3 and the heat reflecting ring 4. The sudden drop in temperature occurs to achieve the effect of improving crystal quality. The specific seeding step is a common technical means in the industry and will not be described in detail here.
附帶說明一點,有關上述隔熱片31的層數、熱反射環4的層數、及熱反射環4與坩鍋蓋2之角度,其能夠搭配熔湯200表面溫梯的分佈狀況而加以調整。Incidentally, the number of layers of the heat insulating sheet 31, the number of layers of the heat reflecting ring 4, and the angle between the heat reflecting ring 4 and the crucible lid 2 can be adjusted in accordance with the distribution of the surface temperature of the melt 200. .
根據本發明實施例,上述的長晶裝置及晶體製造方法,其能提高製程參數的可調區間,以控制熔湯表面溫梯分佈,進而減少擴肩急速生長的機率,達到減少晶體之熱應力集中以提升晶體品質的效果。再者,長晶裝置更是能透過熱反射環與坩鍋蓋夾有銳角,且每一熱反射環的內徑自鄰近坩鍋蓋朝遠離坩鍋蓋的方向逐漸遞增,以達到避免凝結雜質影響長晶的效果。According to an embodiment of the invention, the above-mentioned crystal growth device and crystal manufacturing method can improve the adjustable interval of the process parameters, thereby controlling the distribution of the temperature gradient on the molten steel surface, thereby reducing the probability of rapid growth of the shoulder expansion, and reducing the thermal stress of the crystal. Focus on improving the quality of the crystal. Furthermore, the crystal growth device can be acutely angled with the crucible lid through the heat reflecting ring, and the inner diameter of each heat reflecting ring is gradually increased from the adjacent crucible lid away from the crucible lid to avoid the influence of condensation impurities. The effect of crystal growth.
以上所述僅為本發明之實施例,其並非用以侷限本發明之專利範圍。The above description is only an embodiment of the present invention, and is not intended to limit the scope of the invention.
100‧‧‧長晶裝置100‧‧‧ crystal growth device
1‧‧‧坩鍋1‧‧‧坩锅
11‧‧‧容置空間11‧‧‧ accommodating space
2‧‧‧坩鍋蓋2‧‧‧坩 pot lid
21‧‧‧開口21‧‧‧ openings
22‧‧‧貫穿孔22‧‧‧through holes
3‧‧‧隔熱單元3‧‧‧Insulation unit
31‧‧‧隔熱片31‧‧‧Insulation
4‧‧‧熱反射環4‧‧‧Hot reflection ring
41‧‧‧第一面41‧‧‧ first side
42‧‧‧第二面42‧‧‧ second side
43‧‧‧延伸部43‧‧‧Extension
44‧‧‧通孔44‧‧‧through hole
5‧‧‧吊掛單元5‧‧‧ hanging unit
51‧‧‧固定件(如:螺絲)51‧‧‧Fixed parts (eg screws)
52‧‧‧定位件(如:螺帽)52‧‧‧ Positioning parts (eg nuts)
200‧‧‧熔湯200‧‧‧ molten soup
201‧‧‧凝結物201‧‧‧Condensate
圖1A為本發明長晶裝置未加熱時的平面示意圖(一)。Fig. 1A is a plan view (I) of the crystal growth apparatus of the present invention when it is not heated.
圖1B為圖1A的局部立體示意圖。FIG. 1B is a partial perspective view of FIG. 1A.
圖1C為本發明長晶裝置未加熱時的平面示意圖(二)。Fig. 1C is a plan view (2) of the crystal growth apparatus of the present invention when it is not heated.
圖1D為本發明長晶裝置未加熱時的平面示意圖(三)。Fig. 1D is a plan view (3) of the crystal growth apparatus of the present invention when it is not heated.
圖2A為本發明長晶裝置加熱後的平面示意圖(一)。2A is a schematic plan view (I) of the crystal growth apparatus of the present invention after heating.
圖2B為本發明長晶裝置加熱後的平面示意圖(二)。2B is a plan view (2) of the crystal growth apparatus of the present invention after heating.
圖3為本發明晶體製造方法的步驟示意圖。Figure 3 is a schematic view showing the steps of a method for producing a crystal of the present invention.
100‧‧‧長晶裝置100‧‧‧ crystal growth device
1‧‧‧坩鍋1‧‧‧坩锅
11‧‧‧容置空間11‧‧‧ accommodating space
2‧‧‧坩鍋蓋2‧‧‧坩 pot lid
21‧‧‧開口21‧‧‧ openings
22‧‧‧貫穿孔22‧‧‧through holes
3‧‧‧隔熱單元3‧‧‧Insulation unit
31‧‧‧隔熱片31‧‧‧Insulation
4‧‧‧熱反射環4‧‧‧Hot reflection ring
41‧‧‧第一面41‧‧‧ first side
42‧‧‧第二面42‧‧‧ second side
44‧‧‧通孔44‧‧‧through hole
5‧‧‧吊掛單元5‧‧‧ hanging unit
51‧‧‧固定件(如:螺絲)51‧‧‧Fixed parts (eg screws)
52‧‧‧定位件(如:螺帽)52‧‧‧ Positioning parts (eg nuts)
200‧‧‧熔湯200‧‧‧ molten soup
201‧‧‧凝結物201‧‧‧Condensate
Claims (9)
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CN201310031697.4A CN103911656B (en) | 2012-12-28 | 2013-01-28 | Crystal growth device and crystal manufacturing method |
CN 201320046849 CN203112960U (en) | 2012-12-28 | 2013-01-28 | Crystal growth device |
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Citations (1)
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CN102534809A (en) * | 2010-12-20 | 2012-07-04 | 江西同人电子材料有限公司 | Crystal growth furnace |
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CN85100534B (en) * | 1985-04-01 | 1988-08-03 | 中国科学院上海光学精密机械研究所 | High-temperature-resistant crystal growth device by temperature gradient method |
US5922127A (en) * | 1997-09-30 | 1999-07-13 | Memc Electronic Materials, Inc. | Heat shield for crystal puller |
TW200930851A (en) * | 2008-01-03 | 2009-07-16 | Green Energy Technology Inc | Crystal growth furnace having guiding structure for overflow slurry |
CN201411509Y (en) * | 2009-06-26 | 2010-02-24 | 哈尔滨工大奥瑞德光电技术有限公司 | Single crystal furnace body for growth of big sapphire with size over 300 mm |
KR101263082B1 (en) * | 2010-11-15 | 2013-05-09 | 주식회사 엘지실트론 | Sapphire Ingot Grower |
CN202247014U (en) * | 2011-09-28 | 2012-05-30 | 刘小梅 | Round platform-shaped heat shield for sapphire single crystal furnace |
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