TW202313328A - Electromagnetic wave shield film - Google Patents
Electromagnetic wave shield film Download PDFInfo
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- TW202313328A TW202313328A TW111109913A TW111109913A TW202313328A TW 202313328 A TW202313328 A TW 202313328A TW 111109913 A TW111109913 A TW 111109913A TW 111109913 A TW111109913 A TW 111109913A TW 202313328 A TW202313328 A TW 202313328A
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- protective layer
- electromagnetic wave
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- wave shielding
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- 239000011241 protective layer Substances 0.000 claims abstract description 169
- 239000010410 layer Substances 0.000 abstract description 79
- 239000000203 mixture Substances 0.000 abstract description 15
- 239000012790 adhesive layer Substances 0.000 description 53
- 239000002245 particle Substances 0.000 description 33
- 239000003822 epoxy resin Substances 0.000 description 22
- 229920000647 polyepoxide Polymers 0.000 description 22
- 229920005989 resin Polymers 0.000 description 22
- 239000011347 resin Substances 0.000 description 22
- 238000012546 transfer Methods 0.000 description 16
- 239000003086 colorant Substances 0.000 description 15
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 14
- 239000000853 adhesive Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 230000001070 adhesive effect Effects 0.000 description 13
- 229920001187 thermosetting polymer Polymers 0.000 description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 12
- 229910052709 silver Inorganic materials 0.000 description 12
- 239000004332 silver Substances 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 239000011230 binding agent Substances 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 11
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 239000002904 solvent Substances 0.000 description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- -1 polypropylene Polymers 0.000 description 8
- 239000011342 resin composition Substances 0.000 description 8
- 230000002349 favourable effect Effects 0.000 description 7
- 239000002923 metal particle Substances 0.000 description 7
- 239000002356 single layer Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 229910000881 Cu alloy Inorganic materials 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 229920005992 thermoplastic resin Polymers 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229910000859 α-Fe Inorganic materials 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 2
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- FWLHAQYOFMQTHQ-UHFFFAOYSA-N 2-N-[8-[[8-(4-aminoanilino)-10-phenylphenazin-10-ium-2-yl]amino]-10-phenylphenazin-10-ium-2-yl]-8-N,10-diphenylphenazin-10-ium-2,8-diamine hydroxy-oxido-dioxochromium Chemical compound O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.Nc1ccc(Nc2ccc3nc4ccc(Nc5ccc6nc7ccc(Nc8ccc9nc%10ccc(Nc%11ccccc%11)cc%10[n+](-c%10ccccc%10)c9c8)cc7[n+](-c7ccccc7)c6c5)cc4[n+](-c4ccccc4)c3c2)cc1 FWLHAQYOFMQTHQ-UHFFFAOYSA-N 0.000 description 1
- STHCTMWQPJVCGN-UHFFFAOYSA-N 2-[[2-[1,1,2-tris[2-(oxiran-2-ylmethoxy)phenyl]ethyl]phenoxy]methyl]oxirane Chemical compound C1OC1COC1=CC=CC=C1CC(C=1C(=CC=CC=1)OCC1OC1)(C=1C(=CC=CC=1)OCC1OC1)C1=CC=CC=C1OCC1CO1 STHCTMWQPJVCGN-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- 241000208340 Araliaceae Species 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 239000001692 EU approved anti-caking agent Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000006230 acetylene black Substances 0.000 description 1
- GZCGUPFRVQAUEE-SLPGGIOYSA-N aldehydo-D-glucose Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C=O GZCGUPFRVQAUEE-SLPGGIOYSA-N 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000006231 channel black Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 239000000805 composite resin Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000006232 furnace black Substances 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000006233 lamp black Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- IGALFTFNPPBUDN-UHFFFAOYSA-N phenyl-[2,3,4,5-tetrakis(oxiran-2-ylmethyl)phenyl]methanediamine Chemical compound C=1C(CC2OC2)=C(CC2OC2)C(CC2OC2)=C(CC2OC2)C=1C(N)(N)C1=CC=CC=C1 IGALFTFNPPBUDN-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0092—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising electro-conductive pigments, e.g. paint, ink, tampon printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/025—Electric or magnetic properties
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Abstract
Description
發明領域 本揭示發明是有關於一種電磁波屏蔽膜。 field of invention The disclosed invention relates to an electromagnetic wave shielding film.
背景技術 迄今,在以智慧型手機或平板終端為首的行動設備等中,為了阻隔從內部產生的電磁波抑或從外部侵入的電磁波,會使用貼合有電磁波屏蔽膜的撓性印刷配線板(FPC)。 Background technique Until now, mobile devices such as smartphones and tablet terminals have used flexible printed circuit boards (FPCs) with electromagnetic shielding films attached to them to block electromagnetic waves generated from inside or from outside.
屏蔽印刷配線板會使用電磁波屏蔽膜(以下,有時僅稱作「屏蔽膜」)。舉例言之,接著於印刷配線板而使用的屏蔽膜具有:金屬層等屏蔽層;導電性接著片,其設置於該屏蔽層表面;及保護層,其用以保護上述屏蔽層。An electromagnetic wave shielding film (hereinafter, sometimes simply referred to as "shielding film") is used for shielding printed wiring boards. For example, the shielding film used next to the printed wiring board has: a shielding layer such as a metal layer; a conductive adhesive sheet provided on the surface of the shielding layer; and a protective layer for protecting the shielding layer.
例如搭載有電漿顯示面板(PDP)、液晶顯示器(LCD)、有機EL顯示器等的影像顯示裝置,對其所使用之電磁波屏蔽膜會要求遮光性。For example, an image display device equipped with a plasma display panel (PDP), a liquid crystal display (LCD), an organic EL display, etc. requires light-shielding properties for the electromagnetic wave shielding film used therein.
近年來,從視辨性等觀點來看,有要求更優異遮光性之電磁波屏蔽膜之傾向。專利文獻1及2中揭示了具備黑色層並提高黑度的電磁波屏蔽體。In recent years, from the viewpoints of visibility and the like, there is a tendency to demand an electromagnetic wave shielding film more excellent in light-shielding properties.
先前技術文獻 專利文獻 專利文獻1:日本特開2009-76824號公報 專利文獻2:日本特開2004-288972號公報 prior art literature patent documents Patent Document 1: Japanese Patent Laid-Open No. 2009-76824 Patent Document 2: Japanese Patent Laid-Open No. 2004-288972
發明概要
發明欲解決之課題
然而,專利文獻1及2中揭示的電磁波屏蔽體,皆藉由令黑色層中的著色劑種類為特定種類來提升黑度。像這樣特定著色劑之種類等限制黑色層組成的方法,即使黑度提升,也會有屏蔽膜或構成屏蔽膜的各層在其他性能方面惡化之情形,像是以往應具備之性能劣化等。
Summary of the invention
The problem to be solved by the invention
However, in the electromagnetic wave shields disclosed in
因此,本揭示發明之目的在於提供一種無論黑色層之構造組成如何都具有優異黑度的電磁波屏蔽膜。Therefore, an object of the disclosed invention is to provide an electromagnetic wave shielding film having excellent blackness regardless of the structural composition of the black layer.
用以解決課題之手段 本揭示發明之發明人等為了達成上述目的精心探討,結果發現,藉由於電磁波屏蔽膜之表面具備含黑色層之保護層,且令保護層表面之形狀為特定形狀,則無論黑色層之構造組成如何都可具有優異黑度。本揭示發明是基於該等見解而完成。 means to solve problems The inventors of the presently disclosed invention have conducted intensive research to achieve the above object, and found that, by providing a protective layer containing a black layer on the surface of the electromagnetic wave shielding film, and making the surface of the protective layer a specific shape, regardless of the structural composition of the black layer It can have excellent blackness in any case. This disclosure invention was completed based on these knowledge.
本揭示發明提供一種電磁波屏蔽膜,其於表面具備保護層,且上述保護層具有黑色保護層,上述保護層表面之最小自相關長度Sal為10μm以下、界面展開面積比Sdr為200%以上,且上述Sdr相對於上述Sal的比[Sdr/Sal]為50以上。The disclosed invention provides an electromagnetic wave shielding film, which has a protective layer on the surface, and the protective layer has a black protective layer, the minimum autocorrelation length Sal on the surface of the protective layer is 10 μm or less, and the interface expansion area ratio Sdr is 200% or more, and The ratio [Sdr/Sal] of the above-mentioned Sdr to the above-mentioned Sal is 50 or more.
上述保護層可具備:位於上述電磁波屏蔽膜內部之黑色保護層;及位於上述電磁波屏蔽膜表面之透明保護層或黑色保護層。The protective layer may include: a black protective layer located inside the electromagnetic wave shielding film; and a transparent protective layer or a black protective layer located on the surface of the electromagnetic wave shielding film.
上述黑色保護層可位於上述電磁波屏蔽膜表面。The above-mentioned black protective layer may be located on the surface of the above-mentioned electromagnetic wave shielding film.
上述保護層側之明度L *宜為24以下。 The lightness L * on the protective layer side is preferably 24 or less.
上述保護層表面之均方根斜率Sdq宜為2.0以上。The root mean square slope Sdq of the surface of the protective layer is preferably 2.0 or more.
上述保護層側之85°光澤度宜為25以下。The 85° glossiness on the protective layer side is preferably 25 or less.
發明效果 本揭示發明之電磁波屏蔽膜,無論其黑色層之構造組成如何都具有優異黑度。因此,能不變更黑色層之構造組成而維持屏蔽膜之性能並且黑度優異。又,由於黑度優異,因此遮光性優異,在已將屏蔽膜貼合於印刷配線板的狀態下,印刷配線板之美觀抑或於屏蔽膜之保護層表面印字時印字之視辨性以及印刷配線板之電路圖案之隱蔽性優異。 Invention effect The electromagnetic wave shielding film of the disclosed invention has excellent blackness regardless of the structure and composition of the black layer. Therefore, the performance of the shielding film can be maintained without changing the structural composition of the black layer, and the blackness is excellent. In addition, since the blackness is excellent, the light-shielding property is excellent. In the state where the shielding film has been bonded to the printed wiring board, the appearance of the printed wiring board or the visibility of the printed characters when printing on the surface of the protective layer of the shielding film and the printed wiring The concealment of the circuit pattern of the board is excellent.
用以實施發明之形態 [電磁波屏蔽膜] 本揭示發明之電磁波屏蔽膜至少具備保護層。係於上述電磁波屏蔽膜表面具備上述保護層。上述電磁波屏蔽膜亦可具備上述保護層以外的其他層。上述其他層可舉如會發揮電磁波屏蔽性之電磁波屏蔽層、導電性接著劑層等。構成上述電磁波屏蔽膜的各層可分別為單層,亦可為複層。 form for carrying out the invention [Electromagnetic wave shielding film] The electromagnetic shielding film of the disclosed invention has at least a protective layer. The above-mentioned protective layer is provided on the surface of the above-mentioned electromagnetic wave shielding film. The said electromagnetic wave shielding film may be equipped with another layer other than the said protective layer. Examples of the above-mentioned other layers include an electromagnetic wave shielding layer exhibiting electromagnetic wave shielding properties, a conductive adhesive layer, and the like. Each layer constituting the above-mentioned electromagnetic wave shielding film may be a single layer or a multi-layer.
(保護層) 上述保護層具有在上述電磁波屏蔽膜中保護上述電磁波屏蔽層等內部各層之機能。上述保護層至少具備呈現黑色系之保護層(黑色保護層)。上述保護層亦可為具有絕緣性之層體(絕緣保護層)。 (The protective layer) The said protective layer has the function of protecting each internal layer, such as the said electromagnetic wave shielding layer, in the said electromagnetic wave shielding film. The above-mentioned protective layer has at least a black protective layer (black protective layer). The above protective layer may also be an insulating layer (insulating protective layer).
上述保護層可為單層,亦可為複層。當上述保護層為複層時,例如可為材質或硬度抑或彈性模數等物性不同的2層以上積層體。舉例言之,硬度低的外層與硬度高的內層之積層體,其外層具有緩衝效果,故於印刷配線板上對電磁波屏蔽膜進行加熱加壓之步驟時,可緩和施加於金屬層等電磁波屏蔽層之壓力。因此,可抑制電磁波屏蔽層因設置於印刷配線板的高低差而受到破壞。The above-mentioned protective layer may be a single layer or multiple layers. When the protective layer is a multilayer, for example, it may be a laminate of two or more layers having different physical properties such as material, hardness, or modulus of elasticity. For example, a laminate of a low-hardness outer layer and a high-hardness inner layer has a cushioning effect on the outer layer, so that electromagnetic waves applied to the metal layer, etc. Shielding pressure. Therefore, damage to the electromagnetic wave shielding layer due to the level difference provided on the printed wiring board can be suppressed.
當上述保護層為單層時,單層的上述保護層為上述黑色保護層,且上述黑色保護層位於上述電磁波屏蔽膜表面。當上述保護層為複層時,上述保護層中至少一層為上述黑色保護層。又,當上述保護層為複層時,宜於上述電磁波屏蔽膜內部(亦即表面以外)具有至少一層黑色保護層。又,當上述保護層為複層時,位於上述電磁波屏蔽膜表面之上述保護層為透明保護層或黑色保護層是更為理想的。在此情形下,可使位於表面之保護層發揮表面硬度優異等不同於位於內部之黑色保護層之機能。又,當上述保護層為複層時,在具有複數層黑色保護層時,複數層黑色保護層可為組成(著色劑之含量等)或厚度等彼此相同的層體,亦可為相異的層體。When the protective layer is a single layer, the protective layer of the single layer is the black protective layer, and the black protective layer is located on the surface of the electromagnetic wave shielding film. When the protective layer is a multiple layer, at least one of the protective layers is the black protective layer. Also, when the above-mentioned protective layer is a multilayer, it is preferable to have at least one black protective layer inside (that is, outside the surface) of the above-mentioned electromagnetic wave shielding film. Also, when the protective layer is a multiple layer, it is more preferable that the protective layer located on the surface of the electromagnetic wave shielding film is a transparent protective layer or a black protective layer. In this case, the protective layer located on the surface can be made to exhibit a function different from that of the black protective layer located inside, such as excellent surface hardness. In addition, when the above-mentioned protective layer is a multi-layer, when there are multiple layers of black protective layers, the multiple black protective layers may be layers with the same composition (content of coloring agent, etc.) or thickness, or different layers. layers.
利用圖1~圖3,說明上述電磁波屏蔽膜之一實施形態。圖1~圖3分別為截面示意圖,其顯示上述電磁波屏蔽膜之一實施形態。One embodiment of the electromagnetic wave shielding film described above will be described with reference to FIGS. 1 to 3 . 1 to 3 are schematic cross-sectional views showing one embodiment of the above-mentioned electromagnetic wave shielding film.
圖1所示電磁波屏蔽膜1具備:導電性接著劑層4;電磁波屏蔽層3,其鄰接設置於導電性接著劑層4之一面上;及保護層2,其設置於電磁波屏蔽層3之表面(與導電性接著劑層4為相反側之表面)。保護層2是由黑色保護層21單層構成。換言之,電磁波屏蔽膜1依序具備導電性接著劑層4、電磁波屏蔽層3及黑色保護層21。另,亦可不具備電磁波屏蔽層3。The electromagnetic
圖2所示電磁波屏蔽膜1,其保護層2是由黑色保護層21及透明保護層22二層構成,此為與圖1所示電磁波屏蔽膜1不同之處。透明保護層22位於電磁波屏蔽膜1之表面。圖3所示電磁波屏蔽膜1,位於其表面之保護層並非透明保護層22而是黑色保護層23,此為與圖2所示電磁波屏蔽膜1不同之處。The electromagnetic
上述保護層表面(例如圖1~圖3所示2a)之最小自相關長度Sal為10μm以下,宜為9.7μm以下,較佳為6.0μm以下。上述Sal愈小,表示表面的各個凹凸之高度愈小。上述Sal例如為1μm以上,宜為2μm以上。The minimum autocorrelation length Sal of the surface of the protective layer (such as 2a shown in Fig. 1 to Fig. 3 ) is less than 10 μm, preferably less than 9.7 μm, preferably less than 6.0 μm. The smaller the above-mentioned Sal, the smaller the height of each unevenness on the surface. Said Sal is, for example, 1 μm or more, preferably 2 μm or more.
上述保護層表面之界面展開面積比Sdr為200%以上,宜為250%以上,較佳為300%以上。上述Sdr是表示定義區域之展開面積(表面積)相對於定義區域之面積增加多少,完全平坦面之Sdr為0%。The interface development area ratio Sdr of the surface of the protective layer is at least 200%, preferably at least 250%, and preferably at least 300%. The above Sdr indicates how much the expanded area (surface area) of the defined area increases relative to the area of the defined area, and the Sdr of a completely flat surface is 0%.
上述保護層表面之上述Sdr(%)相對於上述Sal(μm)的比[Sdr/Sal]為50以上,宜為53以上,較佳為60以上。The ratio [Sdr/Sal] of the above-mentioned Sdr (%) to the above-mentioned Sal (μm) on the surface of the protective layer is 50 or more, preferably 53 or more, preferably 60 or more.
上述電磁波屏蔽膜中,藉由使上述Sal、上述Sdr及上述比[Sdr/Sal]分別在上述範圍內,因而保護層表面的各個凹凸小且展開表面積大。藉此,可使入射至保護層表面的可見光之反射率降低。因此,只要將保護層表面之形狀設定在上述範圍內,則無論黑色保護層之構造組成如何,相對於未將保護層表面之形狀設定在上述範圍內之情形而言,會具有更優異之黑度。又,上述電磁波屏蔽膜是將保護層表面之Sal及Sdr設定在特定範圍內,並非欲提高保護層表面的凹凸形狀之高度,因此,無需厚厚地設置保護層抑或於後述轉印膜設置用以包埋粒子的脫模處理層等包埋層。因此,相較於習知電磁波屏蔽膜,不會使電磁波屏蔽膜之生產性、抗捲邊性、粒子之耐脫落性等降低。In the above electromagnetic wave shielding film, since the above-mentioned Sal, the above-mentioned Sdr, and the above-mentioned ratio [Sdr/Sal] are respectively within the above-mentioned ranges, each unevenness on the surface of the protective layer is small and the developed surface area is large. Thereby, the reflectance of visible light incident on the surface of the protective layer can be reduced. Therefore, as long as the shape of the surface of the protective layer is set within the above range, no matter what the structural composition of the black protective layer is, compared to the case where the shape of the surface of the protective layer is not set within the above range, it will have a more excellent black color. Spend. In addition, the above-mentioned electromagnetic wave shielding film sets the Sal and Sdr on the surface of the protective layer within a specific range, and does not intend to increase the height of the concave-convex shape on the surface of the protective layer. An embedding layer such as a release treatment layer for embedding particles. Therefore, compared with the conventional electromagnetic wave shielding film, the productivity, curling resistance, particle drop-off resistance, etc. of the electromagnetic wave shielding film will not be reduced.
上述保護層表面之均方根斜率Sdq宜為2.0以上,較佳為3.0以上,更佳為3.5以上。若上述Sdq在2.0以上,便會有保護層表面之黑度提高之傾向。The root-mean-square slope Sdq of the surface of the protective layer is preferably 2.0 or higher, preferably 3.0 or higher, more preferably 3.5 or higher. When said Sdq is 2.0 or more, there exists a tendency for the blackness of the surface of a protective layer to improve.
上述保護層表面之算術平均高度Sa宜為0.4~2.0μm,較佳為0.5~1.5μm。若算術平均高度Sa在上述範圍內,從光澤度與生產性之平衡觀點來看是較為理想的。上述保護層表面之最大波峰高度Sp宜為2.5~9.0μm,較佳為3.0~7.0μm。若最大波峰高度Sp在上述範圍內,從光澤度與生產性之平衡觀點來看是較為理想的。上述保護層表面之最大波谷深度Sv宜為2.0~7.0μm,較佳為3.0~7.0μm。若最大波谷深度Sv在上述範圍內,從光澤度與生產性之平衡觀點來看是較為理想的。上述保護層表面之最大高度Sz宜為6.0~20.0μm,較佳為6.5~15.0μm。若最大高度Sz在上述範圍內,從光澤度與生產性之平衡觀點來看是較為理想的。The arithmetic average height Sa of the surface of the protective layer is preferably 0.4-2.0 μm, more preferably 0.5-1.5 μm. If the arithmetic mean height Sa is within the above range, it is preferable from the viewpoint of the balance between glossiness and productivity. The maximum peak height Sp on the surface of the protective layer is preferably 2.5-9.0 μm, preferably 3.0-7.0 μm. If the maximum peak height Sp is within the above range, it is preferable from the viewpoint of the balance between glossiness and productivity. The maximum trough depth Sv on the surface of the protective layer is preferably 2.0-7.0 μm, more preferably 3.0-7.0 μm. When the maximum trough depth Sv is within the above range, it is preferable from the viewpoint of the balance between glossiness and productivity. The maximum height Sz of the surface of the protective layer is preferably 6.0-20.0 μm, more preferably 6.5-15.0 μm. If the maximum height Sz is within the above range, it is preferable from the viewpoint of the balance between glossiness and productivity.
構成上述保護層的各層宜含有黏結劑成分。上述黏結劑成分可列舉:熱塑性樹脂、熱硬化型樹脂、活性能量線硬化型化合物等。上述黏結劑成分可以僅使用一種,亦可使用二種以上。Each layer constituting the above-mentioned protective layer preferably contains a binder component. Examples of the above-mentioned binder components include thermoplastic resins, thermosetting resins, active energy ray-curing compounds, and the like. The said binder component may use only 1 type, and may use 2 or more types.
上述熱塑性樹脂可舉例如:聚苯乙烯系樹脂、乙酸乙烯酯系樹脂、聚酯系樹脂、聚烯烴系樹脂(例如聚乙烯系樹脂、聚丙烯系樹脂組成物等)、聚醯亞胺系樹脂、丙烯酸系樹脂等。上述熱塑性樹脂可以僅使用一種,亦可使用二種以上。The aforementioned thermoplastic resins include, for example: polystyrene resins, vinyl acetate resins, polyester resins, polyolefin resins (such as polyethylene resins, polypropylene resin compositions, etc.), polyimide resins , Acrylic resin, etc. The above-mentioned thermoplastic resins may be used alone, or two or more kinds may be used.
上述熱硬化型樹脂可列舉:具有熱硬化性的樹脂(熱硬化性樹脂)以及令上述熱硬化性樹脂硬化而得的樹脂兩者。上述熱硬化性樹脂可舉例如:酚系樹脂、環氧系樹脂、胺甲酸酯系樹脂、三聚氰胺系樹脂、醇酸系樹脂等。上述熱硬化型樹脂可以僅使用一種,亦可使用二種以上。Examples of the thermosetting resin include both thermosetting resins (thermosetting resins) and resins obtained by curing the thermosetting resins. Examples of the thermosetting resin include phenolic resins, epoxy resins, urethane resins, melamine resins, and alkyd resins. The above-mentioned thermosetting resins may be used alone, or two or more kinds may be used.
上述環氧系樹脂可舉例如:雙酚型環氧系樹脂、螺環型環氧系樹脂、萘型環氧系樹脂、聯苯型環氧系樹脂、萜烯型環氧系樹脂、環氧丙基醚型環氧系樹脂、環氧丙基胺型環氧系樹脂、酚醛清漆型環氧系樹脂等。The above-mentioned epoxy resins include, for example: bisphenol-type epoxy resins, spiro-ring epoxy resins, naphthalene-type epoxy resins, biphenyl-type epoxy resins, terpene-type epoxy resins, epoxy Propyl ether type epoxy resin, glycidylamine type epoxy resin, novolac type epoxy resin, etc.
上述雙酚型環氧樹脂可舉例如:雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、四溴雙酚A型環氧樹脂等。上述環氧丙基醚型環氧樹脂可舉例如:參(環氧丙氧基苯基)甲烷、肆(環氧丙氧基苯基)乙烷等。上述環氧丙基胺型環氧樹脂可舉例如四環氧丙基二胺基二苯甲烷等。上述酚醛清漆型環氧樹脂可舉例如:甲酚酚醛清漆型環氧樹脂、苯酚酚醛清漆型環氧樹脂、α-萘酚酚醛清漆型環氧樹脂、溴化苯酚酚醛清漆型環氧樹脂等。Examples of the bisphenol epoxy resin include bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, and tetrabromobisphenol A epoxy resin. The above-mentioned glycidyl ether type epoxy resin may, for example, be ginseng(glycidoxyphenyl)methane, tetrakis(glycidoxyphenyl)ethane or the like. As the said glycidylamine type epoxy resin, tetraglycidyl diamino diphenyl methane etc. are mentioned, for example. Examples of the novolak-type epoxy resin include cresol novolac-type epoxy resins, phenol novolac-type epoxy resins, α-naphthol novolac-type epoxy resins, and brominated phenol novolac-type epoxy resins.
上述活性能量線硬化型化合物可列舉:可利用活性能量線照射而硬化的化合物(活性能量線硬化性化合物)以及令上述活性能量線硬化性化合物硬化而得的化合物兩者。活性能量線硬化性化合物並無特殊限制,可舉例如:分子中具有1個以上(宜為2個以上)自由基反應性基(例如(甲基)丙烯醯基)的聚合性化合物等。上述活性能量線硬化型化合物可以僅使用一種,亦可使用二種以上。Examples of the active energy ray-curable compound include both compounds curable by irradiation with active energy ray (active energy ray-curable compound) and compounds obtained by curing the above-mentioned active energy ray-curable compound. The active energy ray-curing compound is not particularly limited, and examples thereof include polymerizable compounds having one or more (preferably two or more) radical reactive groups (such as (meth)acryl groups) in the molecule. The above-mentioned active energy ray-curable compound may be used alone, or two or more kinds may be used.
上述黑色保護層宜含有著色劑。上述著色劑宜為黑色系著色劑。上述黑色系著色劑可使用公知或慣用之用以呈現黑色的著色劑(顏料、染料等),可舉例如:碳黑(爐黑、槽黑、乙炔黑、熱碳黑、燈黑、松煙等)、石墨、氧化銅、二氧化錳、苯胺黑、苝黑、鈦黑、花青黑、活性碳、肥粒鐵(非磁性肥粒鐵、磁性肥粒鐵等)、磁鐵礦、氧化鉻、氧化鐵、二硫化鉬、鉻錯合物、蒽醌系著色劑、氮化鋯等。黑色系著色劑可以僅使用一種,亦可使用二種以上。又,亦可使用組合、摻合有呈現黑色以外顏色的著色劑而具有黑色系著色劑之機能的著色劑。The above-mentioned black protective layer preferably contains a colorant. The above-mentioned colorant is preferably a black-based colorant. The above-mentioned black coloring agent can use known or customary coloring agents (pigments, dyes, etc.) for presenting black, for example: carbon black (furnace black, channel black, acetylene black, thermal carbon black, lamp black, pine smoke etc.), graphite, copper oxide, manganese dioxide, aniline black, perylene black, titanium black, cyan black, activated carbon, ferrite (non-magnetic ferrite, magnetic ferrite, etc.), magnetite, oxide Chromium, iron oxide, molybdenum disulfide, chromium complexes, anthraquinone colorants, zirconium nitride, etc. One type of black coloring agent may be used, or two or more types may be used. Moreover, the coloring agent which has the function of a black coloring agent by combining and blending the coloring agent which expresses the color other than black can also be used.
在無損本揭示發明之效果範圍內,上述保護層亦可含有上述各成分以外的其他成分。上述其他成分可舉例如:硬化劑、硬化促進劑、塑化劑、阻燃劑、消泡劑、黏度調節劑、抗氧化劑、稀釋劑、防沈劑、填充劑、其他著色劑、調平劑、耦合劑、紫外線吸收劑、賦黏樹脂、抗結塊劑等。上述其他成分可以僅使用一種,亦可使用二種以上。The above-mentioned protective layer may also contain other components other than the above-mentioned components within the scope of not impairing the effects of the presently disclosed invention. Examples of other ingredients mentioned above include hardeners, hardening accelerators, plasticizers, flame retardants, defoamers, viscosity modifiers, antioxidants, diluents, anti-settling agents, fillers, other colorants, leveling agents , coupling agent, ultraviolet absorber, tackifying resin, anti-caking agent, etc. The above-mentioned other components may be used alone or in combination of two or more.
上述保護層之厚度並無特殊限制,可以視需要適當地設定,宜為1~20μm,較佳為2~15μm,更佳為3~10μm。若上述厚度在1μm以上,則可更充分地保護內部之層體。若上述厚度在20μm以下,則柔軟性及撓曲性優異,且經濟上亦是有利的。The thickness of the protective layer is not particularly limited, and can be appropriately set as required, preferably 1-20 μm, preferably 2-15 μm, more preferably 3-10 μm. When the said thickness is 1 micrometer or more, the internal layer body can be protected more fully. When the said thickness is 20 micrometers or less, it will be excellent in softness and flexibility, and it is also economically advantageous.
當上述保護層為複層時,位於電磁波屏蔽膜表面之保護層(例如透明保護層)之厚度宜為0.1~10μm,較佳為0.5~5μm。又,位於電磁波屏蔽膜內部之黑色保護層之厚度宜為0.5~15μm,較佳為1~10μm。When the protective layer is a multiple layer, the thickness of the protective layer (such as a transparent protective layer) located on the surface of the electromagnetic wave shielding film is preferably 0.1-10 μm, preferably 0.5-5 μm. Also, the thickness of the black protective layer located inside the electromagnetic wave shielding film is preferably 0.5-15 μm, preferably 1-10 μm.
(電磁波屏蔽層) 上述電磁波屏蔽層可使用具有電磁波屏蔽性之公知或慣用之屏蔽層。上述電磁波屏蔽層以其中含有金屬層為佳。上述電磁波屏蔽層可為單層、複層中任一者。 (Electromagnetic wave shielding layer) As the above-mentioned electromagnetic wave shielding layer, known or commonly used shielding layers having electromagnetic wave shielding properties can be used. The above-mentioned electromagnetic wave shielding layer preferably contains a metal layer therein. The above-mentioned electromagnetic wave shielding layer may be any one of a single layer and a multi-layer.
構成上述金屬層的金屬可舉例如:金、銀、銅、鋁、鎳、錫、鈀、鉻、鈦、鋅或該等之合金等。上述金屬層宜為金屬板或金屬箔。即,上述金屬層宜為銅板(銅箔)、銀板(銀箔)。The metal constituting the above metal layer can be, for example, gold, silver, copper, aluminum, nickel, tin, palladium, chromium, titanium, zinc or alloys thereof. The aforementioned metal layer is preferably a metal plate or metal foil. That is, the metal layer is preferably a copper plate (copper foil) or a silver plate (silver foil).
上述電磁波屏蔽層之厚度宜為0.01~10μm。若上述厚度在0.01μm以上,可獲得更充分之屏蔽性能。若上述厚度在10μm以下,撓曲性會變得更加良好。The thickness of the electromagnetic wave shielding layer is preferably 0.01-10 μm. If the above-mentioned thickness is more than 0.01 μm, more sufficient shielding performance can be obtained. Flexibility will become more favorable as the said thickness is 10 micrometers or less.
(導電性接著劑層) 上述導電性接著劑層具有例如用以將上述電磁波屏蔽膜接著於印刷配線板的接著性與導電性。導電性接著劑層宜與電磁波屏蔽層鄰接而形成。導電性接著劑層可為單層、複層中任一者。 (conductive adhesive layer) The said conductive adhesive layer has adhesiveness and electroconductivity for bonding the said electromagnetic wave shielding film to a printed wiring board, for example. The conductive adhesive layer is preferably formed adjacent to the electromagnetic wave shielding layer. The conductive adhesive layer may be either a single layer or a multilayer.
上述導電性接著劑層宜含有可發揮作為接著劑之機能的黏結劑成分及導電性粒子。上述黏結劑成分可列舉:熱塑性樹脂、熱硬化型樹脂、活性能量線硬化型化合物等。上述熱塑性樹脂、熱硬化型樹脂及活性能量線硬化型化合物可分別舉例上述針對保護層可含有的黏結劑成分所例示者。上述黏結劑成分可以僅使用一種,亦可使用二種以上。The conductive adhesive layer preferably contains a binder component and conductive particles that can function as an adhesive. Examples of the above-mentioned binder components include thermoplastic resins, thermosetting resins, active energy ray-curing compounds, and the like. The above-mentioned thermoplastic resin, thermosetting resin, and active energy ray-curable compound can be exemplified by the above-mentioned binder components that may be contained in the protective layer, respectively. The said binder component may use only 1 type, and may use 2 or more types.
其中,上述黏結劑成分又以熱硬化型樹脂為佳。在此情形下,在將電磁波屏蔽膜配置於印刷配線板上後,可利用加壓及加熱使黏結劑成分硬化,接著性會變得更加良好。Wherein, the above-mentioned binder component is preferably a thermosetting resin. In this case, after arranging the electromagnetic wave shielding film on the printed wiring board, the adhesive component can be hardened by pressurization and heating, and adhesiveness becomes more favorable.
當上述黏結劑成分含有熱硬化型樹脂時,構成上述黏結劑成分的成分亦可含有用以促進熱硬化反應的硬化劑。上述硬化劑可依照上述熱硬化性樹脂之種類適當地選擇。上述硬化劑可以僅使用一種,亦可使用二種以上。When the above-mentioned binder component contains a thermosetting resin, the components constituting the above-mentioned binder component may also contain a curing agent for promoting a thermosetting reaction. The above-mentioned curing agent can be appropriately selected according to the type of the above-mentioned thermosetting resin. The above curing agents may be used alone or in combination of two or more.
上述導電性接著劑層中黏結劑成分之含有比例並無特殊限制,相對於導電性接著劑層之總量100質量%,宜為40~98質量%,較佳為50~97質量%,更佳為60~96質量%,再更佳為70~95.5質量%,尤宜為75~95質量%。若上述含有比例在40質量%以上,對印刷配線板之接著性會更加優異。若上述含有比例在98質量%以下,則可足量含有導電性粒子。The content ratio of the adhesive component in the conductive adhesive layer is not particularly limited, but it is preferably 40-98% by mass, more preferably 50-97% by mass, and more preferably 100% by mass of the total amount of the conductive adhesive layer. It is preferably 60-96% by mass, more preferably 70-95.5% by mass, especially preferably 75-95% by mass. When the said content rate is 40 mass % or more, the adhesiveness to a printed wiring board will become more excellent. Electroconductive particle can be contained in sufficient amount as the said content rate is 98 mass % or less.
上述導電性粒子可舉例如:金屬粒子、金屬包樹脂粒子、金屬纖維、碳填料、碳奈米管等。上述導電性粒子可以僅使用一種,亦可使用二種以上。Examples of the above-mentioned conductive particles include metal particles, metal-coated resin particles, metal fibers, carbon fillers, carbon nanotubes, and the like. The said electroconductive particle may use only 1 type, and may use 2 or more types.
上述金屬粒子及構成上述金屬包樹脂粒子之包覆部的金屬可舉例如:金、銀、銅、鎳、鋅等。上述金屬可以僅使用一種,亦可使用二種以上。The said metal particle and the metal which comprise the coating part of the said metal clad resin particle include gold, silver, copper, nickel, zinc, etc., for example. One of the above metals may be used alone, or two or more of them may be used.
具體而言,上述金屬粒子可舉例如:銅粒子、銀粒子、鎳粒子、銀包銅粒子、金包銅粒子、銀包鎳粒子、金包鎳粒子、銀包合金粒子等。上述銀包合金粒子可舉例如:含銅的合金粒子(例如由銅、鎳及鋅之合金構成的銅合金粒子)已被銀包覆的銀包銅合金粒子等。上述金屬粒子可利用電解法、霧化法、還原法等來製作。Specifically, examples of the metal particles include copper particles, silver particles, nickel particles, silver-coated copper particles, gold-coated copper particles, silver-coated nickel particles, gold-coated nickel particles, and silver-coated alloy particles. The above-mentioned silver-clad alloy particles include, for example, silver-clad copper alloy particles in which copper-containing alloy particles (for example, copper alloy particles composed of an alloy of copper, nickel, and zinc) are coated with silver. The above-mentioned metal particles can be produced by an electrolysis method, an atomization method, a reduction method, or the like.
其中,上述金屬粒子又以銀粒子、銀包銅粒子、銀包銅合金粒子為佳。從導電性優異、抑制金屬粒子之氧化及凝集且可降低金屬粒子之成本之觀點來看,尤以銀包銅粒子、銀包銅合金粒子為佳。Among them, the above-mentioned metal particles are preferably silver particles, silver-coated copper particles, and silver-coated copper alloy particles. Silver-coated copper particles and silver-coated copper alloy particles are particularly preferable in view of excellent electrical conductivity, suppression of oxidation and aggregation of metal particles, and reduction in cost of metal particles.
上述導電性粒子之形狀可列舉:球狀、小片狀(鱗片狀)、樹枝狀、纖維狀、無定形(多面體)等。As for the shape of the said electroconductive particle, spherical shape, flake shape (scale shape), dendritic shape, fibrous shape, amorphous shape (polyhedron) etc. are mentioned.
上述導電性粒子之中位直徑(D50)宜為1~50μm,較佳為3~40μm。若上述中位直徑在1μm以上,則導電性粒子之分散性良好而可抑制凝集,並且不易氧化。若上述平均粒徑在50μm以下,導電性會變得良好。上述中位直徑可由以體積為基準的粒度分布測得。The median diameter (D50) of the above-mentioned conductive particles is preferably 1-50 μm, more preferably 3-40 μm. When the said median diameter is 1 micrometer or more, the dispersibility of electroconductive particle will be favorable and aggregation will be suppressed, and it will be hard to oxidize. Electroconductivity will become favorable as the said average particle diameter is 50 micrometers or less. The above-mentioned median diameter can be measured from the volume-based particle size distribution.
上述導電性接著劑層中導電性粒子之含有比率並無特殊限制,相對於導電性接著劑層之總量100質量%,宜為2~80質量%,較佳為5~60質量%,更佳為10~40質量%。若上述含有比率在2質量%以上,導電性會變得更加良好。若上述含有比率在80質量%以下,則可足量含有黏結劑成分,對印刷配線板之密著性會變得更加良好。The content ratio of the conductive particles in the conductive adhesive layer is not particularly limited, but it is preferably 2-80% by mass, more preferably 5-60% by mass, and more preferably 100% by mass of the total amount of the conductive adhesive layer. Preferably, it is 10 to 40% by mass. When the said content ratio is 2 mass % or more, electroconductivity will become more favorable. If the said content ratio is 80 mass % or less, a sufficient amount of adhesive components can be contained, and the adhesiveness to a printed wiring board will become more favorable.
上述導電性接著劑層可以視需要設為具有各向同性導電性或各向異性導電性之層體。當上述導電性接著劑層具有各向異性導電性時,上述電磁波屏蔽膜宜為具有上述電磁波屏蔽層之構造(例如[保護層/電磁波屏蔽層/導電性接著劑層])。當上述導電性接著劑層具有各向同性導電性時,上述電磁波屏蔽膜可為不具上述電磁波屏蔽層之構造(例如[保護層/導電性接著劑層])。The said conductive adhesive layer can be set as the layer body which has isotropic conductivity or anisotropic conductivity as needed. When the conductive adhesive layer has anisotropic conductivity, the electromagnetic wave shielding film preferably has the structure of the electromagnetic wave shielding layer (for example, [protective layer/electromagnetic wave shielding layer/conductive adhesive layer]). When the conductive adhesive layer has isotropic conductivity, the electromagnetic shielding film may have a structure without the electromagnetic shielding layer (for example, [protective layer/conductive adhesive layer]).
在無損本揭示發明之效果範圍內,上述導電性接著劑層亦可含有上述各成分以外的其他成分。上述其他成分可舉如公知或慣用之接著劑層中所含成分。上述其他成分可舉例如:硬化促進劑、塑化劑、阻燃劑、消泡劑、黏度調節劑、抗氧化劑、稀釋劑、防沈劑、填充劑、著色劑、調平劑、耦合劑、紫外線吸收劑、賦黏樹脂、抗結塊劑等。上述其他成分可以僅使用一種,亦可使用二種以上。In the range which does not impair the effect of this disclosure, the said electroconductive adhesive agent layer may contain other components other than the said each component. The above-mentioned other components can be exemplified as the components contained in the known or customary adhesive layer. The other ingredients mentioned above can be for example: hardening accelerators, plasticizers, flame retardants, defoamers, viscosity regulators, antioxidants, diluents, anti-settling agents, fillers, colorants, leveling agents, coupling agents, UV absorbers, tackifying resins, anti-caking agents, etc. The above-mentioned other components may be used alone or in combination of two or more.
上述導電性接著劑層之厚度宜為1~40μm,較佳為5~30μm。若上述厚度在1μm以上,對被接著體之密著強度會變得更加良好。若上述厚度在40μm以下,則可抑制成本,並且可輕薄地設計具備上述導電性接著劑層的製品。另,在構成導電性接著劑層的接著劑成分(黏結劑成分)因加熱等而開始流動並且滲入形成於被接著體的開口部之情形等,此時的導電性接著劑層之厚度是在未滲入上述開口部之區域的接著劑層之厚度。The thickness of the conductive adhesive layer is preferably 1-40 μm, preferably 5-30 μm. When the said thickness is 1 micrometer or more, the adhesive strength with respect to an adherend becomes more favorable. When the said thickness is 40 micrometers or less, cost can be suppressed, and the product provided with the said electroconductive adhesive layer can be designed lightly and thinly. In addition, when the adhesive component (binder component) constituting the conductive adhesive layer begins to flow due to heating or the like and penetrates into the opening formed in the adherend, the thickness of the conductive adhesive layer at this time is The thickness of the adhesive layer in the area that does not penetrate into the opening.
上述電磁波屏蔽膜亦可於保護層側及/或導電性接著劑層側具有分離件(剝離膜)。分離件是以能從上述電磁波屏蔽膜剝離之方式積層。分離件是用以被覆保護層或導電性接著劑層而加以保護的要素,並且會在使用電磁波屏蔽膜時剝下。The above-mentioned electromagnetic wave shielding film may have a separator (peeling film) on the protective layer side and/or the conductive adhesive layer side. The separator is laminated so that it can be peeled off from the electromagnetic wave shielding film. The separator is an element to be protected by covering with a protective layer or a conductive adhesive layer, and it will be peeled off when using the electromagnetic wave shielding film.
上述分離件可舉例如:聚對苯二甲酸乙二酯(PET)膜、聚乙烯膜、聚丙烯膜、經氟系剝離劑或長鏈烷基丙烯酸酯系剝離劑等剝離劑塗佈表面的塑膠膜或紙類等。Examples of the separator include: polyethylene terephthalate (PET) film, polyethylene film, polypropylene film, and one whose surface is coated with a release agent such as a fluorine-based release agent or a long-chain alkyl acrylate-based release agent. Plastic film or paper etc.
上述分離件之厚度宜為10~200μm,較佳為15~150μm。若上述厚度在10μm以上,保護性能會更加優異。若上述厚度在200μm以下,使用時容易剝離分離件。The thickness of the above separator is preferably 10-200 μm, preferably 15-150 μm. When the above-mentioned thickness is 10 μm or more, the protection performance will be more excellent. When the said thickness is 200 micrometers or less, it becomes easy to peel off a separator at the time of use.
上述電磁波屏蔽膜更可在保護層與電磁波屏蔽層間形成有錨固塗佈層。當具有此種構造時,電磁波屏蔽層與保護層之接著性會變得更加良好。The above electromagnetic wave shielding film may further have an anchor coating layer formed between the protective layer and the electromagnetic wave shielding layer. With such a structure, the adhesion between the electromagnetic wave shielding layer and the protective layer becomes better.
形成上述錨固塗佈層的材料可列舉:胺甲酸酯系樹脂、丙烯酸系樹脂、以胺甲酸酯系樹脂為殼且以丙烯酸系樹脂為核的核-殼型複合樹脂、環氧系樹脂、聚醯亞胺系樹脂、聚醯胺系樹脂、三聚氰胺系樹脂、酚系樹脂、脲甲醛系樹脂、使苯酚等封端劑與聚異氰酸酯反應而得的封端異氰酸酯、聚乙烯醇、聚乙烯吡咯啶酮等。上述材料可以僅使用一種,亦可使用二種以上。Examples of materials for forming the above-mentioned anchor coating layer include: urethane-based resins, acrylic resins, core-shell composite resins with urethane-based resins as shells and acrylic resins as cores, and epoxy-based resins. , polyimide resin, polyamide resin, melamine resin, phenol resin, urea-formaldehyde resin, blocked isocyanate obtained by reacting a blocking agent such as phenol with polyisocyanate, polyvinyl alcohol, polyethylene pyrrolidone etc. One of the above materials may be used alone, or two or more of them may be used.
上述電磁波屏蔽膜之保護層側之明度L *宜為24以下。上述明度L *為L *a *b *表色系統中規定之明度。上述明度L *是針對上述保護層在最表面的上述電磁波屏蔽膜從保護層側測得之值,當具有分離件時,則將分離件剝離後再測定。另,在由上述保護層及上述導電性接著劑層構成的積層結構中,從保護層側測得之明度L *在上述範圍內是尤其理想的。若上述明度L *在24以下,則黑度高且隱蔽性更加優異。上述明度L *可基於JIS Z8722(2009)來測定。 The lightness L * of the protective layer side of the electromagnetic shielding film is preferably 24 or less. The above-mentioned lightness L * is the lightness specified in the L * a * b * color system. The above-mentioned lightness L * is a value measured from the protective layer side with respect to the above-mentioned electromagnetic wave shielding film on the outermost surface of the above-mentioned protective layer, and when a separator is provided, the separator is peeled off and then measured. In addition, in the laminated structure composed of the above-mentioned protective layer and the above-mentioned conductive adhesive layer, it is particularly preferable that the lightness L * measured from the protective layer side is within the above-mentioned range. When the above-mentioned lightness L * is 24 or less, the blackness is high and the concealability is further excellent. The said lightness L * can be measured based on JISZ8722 (2009).
上述電磁波屏蔽膜之保護層側之85°光澤度宜為25以下,較佳為22以下。若上述85°光澤度在25以下,在已將屏蔽膜貼合於印刷配線板的狀態下,印刷配線板之電路圖案之隱蔽性會更加優異。另,在由上述保護層及上述導電性接著劑層構成的積層結構中,從保護層側測得之85°光澤度在上述範圍內是尤其理想的。The 85° glossiness of the protective layer side of the electromagnetic shielding film is preferably 25 or less, preferably 22 or less. If the said 85 degree glossiness is 25 or less, the concealment|concealment of the circuit pattern of a printed wiring board will become more excellent in the state which bonded the shielding film to a printed wiring board. In addition, in the laminated structure composed of the above-mentioned protective layer and the above-mentioned conductive adhesive layer, it is particularly preferable that the 85° gloss measured from the protective layer side is within the above-mentioned range.
上述電磁波屏蔽膜之保護層側之60°光澤度宜為2.0以下,較佳為1.5以下。若上述60°光澤度在2.0以下,在已將屏蔽膜貼合於印刷配線板的狀態下,印刷配線板之美觀抑或於屏蔽膜之保護層表面印字時印字之視辨性會更加優異。另,在由上述保護層及上述導電性接著劑層構成的積層結構中,從保護層側測得之60°光澤度在上述範圍內是尤其理想的。The 60° glossiness of the protective layer side of the electromagnetic shielding film is preferably 2.0 or less, preferably 1.5 or less. If the above-mentioned 60° gloss is less than 2.0, the aesthetics of the printed wiring board or the visibility of printed characters when printing on the surface of the protective layer of the shielding film will be more excellent when the shielding film is bonded to the printed wiring board. In addition, in the laminated structure composed of the above-mentioned protective layer and the above-mentioned conductive adhesive layer, it is particularly preferable that the 60° gloss measured from the protective layer side is within the above-mentioned range.
上述光澤度是針對上述保護層在最表面的上述電磁波屏蔽膜從保護層側測得之值,當具有分離件時,則將分離件剝離後再測定。上述光澤度可利用遵行JIS Z8741的方法進行測定。The above-mentioned glossiness is a value measured from the protective layer side with respect to the above-mentioned electromagnetic wave shielding film on the outermost surface of the above-mentioned protective layer, and when there is a separator, the separator is peeled off and then measured. The said glossiness can be measured by the method based on JISZ8741.
上述電磁波屏蔽膜之保護層側之波長450nm的光反射率宜為5.0%以下,較佳為4.0%以下。若上述反射率在5.0%以下,黑度便會進一步提高。另,在由上述保護層及上述導電性接著劑層構成的積層結構中,從保護層側測得之上述反射率在上述範圍內是尤其理想的。The reflectance of light at a wavelength of 450 nm on the protective layer side of the electromagnetic shielding film is preferably 5.0% or less, preferably 4.0% or less. If the above-mentioned reflectance is below 5.0%, the blackness will be further improved. In addition, in the laminated structure composed of the above-mentioned protective layer and the above-mentioned conductive adhesive layer, it is particularly preferable that the above-mentioned reflectance measured from the protective layer side is within the above-mentioned range.
上述電磁波屏蔽膜之保護層側之波長550nm的光反射率宜為5.0%以下,較佳為4.0%以下。若上述反射率在5.0%以下,黑度便會進一步提高。另,在由上述保護層及上述導電性接著劑層構成的積層結構中,從保護層側測得之上述反射率在上述範圍內是尤其理想的。The reflectance of light at a wavelength of 550 nm on the protective layer side of the electromagnetic shielding film is preferably 5.0% or less, preferably 4.0% or less. If the above-mentioned reflectance is below 5.0%, the blackness will be further improved. In addition, in the laminated structure composed of the above-mentioned protective layer and the above-mentioned conductive adhesive layer, it is particularly preferable that the above-mentioned reflectance measured from the protective layer side is within the above-mentioned range.
上述電磁波屏蔽膜之保護層側之波長650nm的光反射率宜為5.0%以下,較佳為4.0%以下。若上述反射率在5.0%以下,黑度便會進一步提高。另,在由上述保護層及上述導電性接著劑層構成的積層結構中,從保護層側測得之上述反射率在上述範圍內是尤其理想的。The reflectance of light at a wavelength of 650 nm on the protective layer side of the electromagnetic shielding film is preferably 5.0% or less, preferably 4.0% or less. If the above-mentioned reflectance is below 5.0%, the blackness will be further improved. In addition, in the laminated structure composed of the above-mentioned protective layer and the above-mentioned conductive adhesive layer, it is particularly preferable that the above-mentioned reflectance measured from the protective layer side is within the above-mentioned range.
上述反射率是針對上述保護層在最表面的上述電磁波屏蔽膜從保護層側測得之值,當具有分離件時,則將分離件剝離後再測定。上述反射率可利用遵行JIS Z8722的方法進行測定。The above-mentioned reflectance is a value measured from the protective layer side with respect to the above-mentioned electromagnetic wave shielding film on the outermost surface of the above-mentioned protective layer, and when there is a separator, the separator is peeled off and then measured. The said reflectance can be measured by the method based on JISZ8722.
上述電磁波屏蔽膜宜為印刷配線板用途,且以撓性印刷配線板(FPC)用途尤佳。The above-mentioned electromagnetic wave shielding film is preferably used for printed wiring boards, and is particularly preferably used for flexible printed wiring boards (FPC).
(電磁波屏蔽膜之製造方法)
說明上述電磁波屏蔽膜之製造方法之一實施形態。製作圖1所示之電磁波屏蔽膜1時,首先,個別製作保護層2及電磁波屏蔽層3之積層體、與導電性接著劑層4。然後,將個別製作的積層體與導電性接著劑層4加以貼合(積層法)。另,針對不具電磁波屏蔽層3的電磁波屏蔽膜,則是個別製作保護層2與導電性接著劑層4,然後,將保護層2與導電性接著劑層4加以貼合。
(Manufacturing method of electromagnetic wave shielding film)
One embodiment of the manufacturing method of the above-mentioned electromagnetic shielding film will be described. When producing the electromagnetic
保護層2例如可藉由將用以形成保護層2的樹脂組成物塗佈(塗覆)於分離件等轉印膜上,並且視需要去除溶劑及/或局部硬化而形成。於上述轉印膜之用以塗佈上述樹脂組成物之表面形成有凹凸形狀。藉由這樣的方式來形成上述保護層,可將源自上述凹凸形狀之形狀轉印至保護層表面。上述轉印膜表面之凹凸形狀,可利用公知或慣用方法來製作,如噴砂處理、將粒子包埋於構成轉印膜的各層中以使其於轉印膜表面突出之方法等。又,藉由適當地進行噴砂條件或包埋粒子大小之調整等來設計形成於轉印膜表面的凹凸形狀,可調整保護層表面之Sal、Sdr等表面參數。然後,上述轉印膜可於上述電磁波屏蔽膜中作為分離件使用。The
於上述轉印膜之具有凹凸形狀之表面上亦可設置有脫模處理層。上述脫模處理層可舉如:利用聚矽氧系、長鏈烷基系、氟系、硫化鉬等剝離處理劑進行表面處理而形成的層體。另,當具有脫模處理層時,可適當設定脫模處理層之厚度或形狀以使表面的凹凸形狀不會消失,即,使轉印膜具有上述凹凸形狀。A release treatment layer may also be provided on the surface of the above-mentioned transfer film having a concave-convex shape. Examples of the above-mentioned release treatment layer include layers formed by surface treatment with a release treatment agent such as silicone-based, long-chain alkyl-based, fluorine-based, or molybdenum sulfide. In addition, when there is a release treatment layer, the thickness and shape of the release treatment layer can be appropriately set so that the unevenness of the surface does not disappear, that is, the transfer film has the above-mentioned unevenness.
形成上述保護層的樹脂組成物除了例如上述保護層中所含各成分外,還包含溶劑(溶媒)。溶劑可舉例如:甲苯、丙酮、甲基乙基酮、甲醇、乙醇、丙醇、二甲基甲醯胺等。樹脂組成物之固體成分濃度可依照形成的保護層之厚度等適當地設定。The resin composition forming the above-mentioned protective layer contains, for example, a solvent (vehicle) in addition to each component contained in the above-mentioned protective layer. Examples of solvents include toluene, acetone, methyl ethyl ketone, methanol, ethanol, propanol, dimethylformamide and the like. The solid content concentration of the resin composition can be appropriately set in accordance with the thickness of the formed protective layer and the like.
上述樹脂組成物之塗佈可使用公知塗佈法。舉例言之,可使用凹版輥式塗佈機、反向輥式塗佈機、接觸輥式塗佈機、模唇塗佈機浸漬輥式塗佈機、棒式塗佈機、刀式塗佈機、噴霧塗佈機、缺角輪塗佈機、直接塗佈機、狹縫式模具塗佈機等塗佈機。A known coating method can be used for coating of the said resin composition. For example, gravure roll coater, reverse roll coater, touch roll coater, lip coater dip roll coater, rod coater, knife coater can be used Coating machine, spray coating machine, notch wheel coating machine, direct coating machine, slot die coating machine and other coating machines.
其次,在已形成於轉印膜上的保護層2表面形成電磁波屏蔽層3。電磁波屏蔽層3之形成宜利用蒸鍍法或濺鍍法來進行。上述蒸鍍法及濺鍍法可採用公知或慣用方法。如此一來,製作出保護層2/電磁波屏蔽層3之積層體。Next, the electromagnetic
另一方面,製作導電性接著劑層4時,例如可將用以形成導電性接著劑層4的接著劑組成物塗佈(塗覆)於分離膜等暫時基材或基材上,並且視需要去除溶劑及/或局部硬化而形成導電性接著劑層4。On the other hand, when producing the conductive
上述接著劑組成物除了例如上述導電性接著劑層中所含各成分外,還包含溶劑(溶媒)。溶劑可舉如:上述針對樹脂組成物可含有的溶劑所例示者。上述接著劑組成物之固體成分濃度可依照形成的導電性接著劑層之厚度等適當地設定。The above-mentioned adhesive composition contains, for example, a solvent (vehicle) in addition to each component contained in the above-mentioned conductive adhesive layer. As a solvent, what was illustrated about the solvent which can be contained in the said resin composition is mentioned, for example. The solid content concentration of the above-mentioned adhesive composition can be appropriately set in accordance with the thickness of the conductive adhesive layer to be formed, and the like.
上述接著劑組成物之塗佈可使用公知塗佈法。可舉例如:上述針對塗佈樹脂組成物所使用的塗佈機。A known coating method can be used for coating the above-mentioned adhesive composition. For example, the above-mentioned coater used for coating the resin composition can be mentioned.
接著,將分別製作的積層體之露出面(電磁波屏蔽層3側)與導電性接著劑層4加以貼合,製作出電磁波屏蔽膜1。Next, the exposed surface (the side of the electromagnetic wave shielding layer 3 ) of the separately produced laminate was bonded to the conductive
作為上述積層法以外的其他態樣,電磁波屏蔽膜1亦可藉由依序積層各層的方法來製造(直接塗佈法)。舉例言之,圖1所示之電磁波屏蔽膜1可依下述來製造:於上述積層體之電磁波屏蔽層3表面,塗佈(塗覆)用以形成導電性接著劑層4的接著劑組成物,並且視需要去除溶劑及/或局部硬化而形成導電性接著劑層4。The electromagnetic
可使用上述電磁波屏蔽膜來製作屏蔽印刷配線板。舉例言之,藉由將上述電磁波屏蔽膜之導電性接著劑層貼合於印刷配線板(例如覆蓋層),可製得於印刷配線板上貼合有上述電磁波屏蔽膜的屏蔽印刷配線板。上述屏蔽印刷配線板中,上述導電性接著劑層可藉由例如後續的加熱加壓處理而熱硬化。A shielded printed wiring board can be produced using the above electromagnetic wave shielding film. For example, by bonding the conductive adhesive layer of the above electromagnetic wave shielding film to a printed wiring board (such as a cover layer), a shielded printed wiring board with the above electromagnetic wave shielding film bonded to the printed wiring board can be produced. In the above-mentioned shielded printed wiring board, the conductive adhesive layer can be thermally cured by, for example, subsequent heat and pressure treatment.
實施例 以下,基於實施例,更詳細地說明本揭示發明之電磁波屏蔽膜之一實施形態,惟本揭示發明之電磁波屏蔽膜並非僅限於該等實施例。 Example Hereinafter, one embodiment of the electromagnetic wave shielding film of the disclosed invention will be described in more detail based on examples, but the electromagnetic wave shielding film of the disclosed invention is not limited to these examples.
實施例1~3及比較例1~3
(形成保護層)
將包含聚酯系樹脂及作為硬化劑之胺基系樹脂的樹脂溶液(固體成分:35質量%),塗佈於轉印膜之脫模處理面上,所述轉印膜係已製作成保護層表面形成具有表1所示表面參數之形狀,並且利用加熱來去除溶劑,藉此形成透明保護層。
接著,將環氧樹脂中混合有碳黑的樹脂溶液(固體成分:20質量%),塗佈於上述透明保護層表面,並且利用加熱來去除溶劑,藉此形成黑色保護層。如此一來,製作出轉印膜上依序積層有透明保護層(厚度1μm)及黑色保護層(厚度3μm)的保護層。Next, a resin solution (solid content: 20 mass %) mixed with carbon black in epoxy resin was applied to the surface of the transparent protective layer, and the solvent was removed by heating, thereby forming a black protective layer. In this manner, a protective layer in which a transparent protective layer (
(形成導電性接著劑層) 將環氧樹脂中混合有銅粉的接著劑組成物(固體成分:30質量%),塗佈於已將表面進行脫模處理的PET膜之脫模處理面上,並且利用加熱來去除溶劑,藉此形成導電性接著劑層(厚度10μm)。 (Formation of conductive adhesive layer) An adhesive composition (solid content: 30% by mass) in which copper powder is mixed with epoxy resin is applied to the release-treated surface of a PET film whose surface has been subjected to a release treatment, and the solvent is removed by heating. In this way, a conductive adhesive layer (thickness: 10 μm) was formed.
(製作電磁波屏蔽膜) 將所製得之上述導電性接著劑層與上述保護層之黑色保護層面加以貼合,製作出由導電性接著劑層/黑色保護層/透明保護層之構造構成的電磁波屏蔽膜。 (Making electromagnetic wave shielding film) The above-mentioned conductive adhesive layer and the black protective layer of the above-mentioned protective layer were bonded together to produce an electromagnetic wave shielding film composed of a conductive adhesive layer/black protective layer/transparent protective layer.
(評價) 針對實施例及比較例中製得的各電磁波屏蔽膜,如下述般進行評價。評價結果記載於表1中。 (evaluate) About each electromagnetic wave shielding film produced in the Example and the comparative example, it evaluated as follows. The evaluation results are shown in Table 1.
(1)保護層之表面參數 使用共焦顯微鏡(商品名「OPTELICS HYBRID」,雷瑟科(Lasertec)公司製,物鏡100倍),遵行ISO25178,在已自電磁波屏蔽膜剝離轉印膜而露出的透明保護層表面,針對該透明保護層表面的任意5處上所形成的凹凸形狀,測定算術平均高度Sa、最大波峰高度Sp、最大波谷深度Sv、最大高度Sz、最小自相關長度Sal、均方根斜率Sdq及界面展開面積比Sdr。另,S濾波器之截止波長設為0.0025mm,L濾波器之截止波長設為0.8mm。 (1) Surface parameters of the protective layer Using a confocal microscope (trade name "OPTELICS HYBRID", manufactured by Lasertec, objective lens 100 times), complying with ISO25178, on the surface of the transparent protective layer exposed by peeling the transfer film from the electromagnetic wave shielding film, the transparent Measure the arithmetic mean height Sa, maximum peak height Sp, maximum trough depth Sv, maximum height Sz, minimum autocorrelation length Sal, root mean square slope Sdq and interface expansion area ratio of the concave-convex shape formed on any 5 places on the surface of the protective layer Sdr. In addition, the cutoff wavelength of the S filter is set to 0.0025mm, and the cutoff wavelength of the L filter is set to 0.8mm.
(2)光澤度 使用攜帶型光澤計(商品名「加特納微型光澤儀(Gardner micro gloss)」,畢克(BYK)公司製),在已自電磁波屏蔽膜剝離轉印膜而露出的透明保護層表面,測定該透明保護層表面上所形成的凹凸形狀之60°光澤度及85°光澤度。 (2) Gloss Using a portable glossmeter (trade name "Gardner micro gloss", manufactured by BYK), measured on the surface of the transparent protective layer exposed by peeling the transfer film from the electromagnetic wave shielding film. 60° glossiness and 85° glossiness of the concave-convex shape formed on the surface of the transparent protective layer.
(3)反射率 使用分光測色計(商品名「CM-26d」,柯尼卡美能達(KONICA MINOLTA)股份有限公司製),遵行JIS Z8722(條件c),針對已自電磁波屏蔽膜剝離轉印膜而露出的透明保護層表面,測定波長450nm、550nm及650nm各自的光反射率。 (3) reflectivity Using a spectrophotometer (trade name "CM-26d", manufactured by KONICA MINOLTA Co., Ltd.), in accordance with JIS Z8722 (condition c), the exposed color of the transfer film from the electromagnetic wave shielding film was measured. On the surface of the transparent protective layer, the light reflectances at wavelengths of 450 nm, 550 nm, and 650 nm were measured.
(4)明度L *使用分光測色計(商品名「Ci64UV」,愛色麗(X-rite)公司製),針對已自電磁波屏蔽膜剝離轉印膜而露出的透明保護層表面測定明度L *。 (4) Lightness L * Lightness L was measured on the surface of the transparent protective layer exposed by peeling the transfer film from the electromagnetic wave shielding film using a spectrophotometer (trade name "Ci64UV", manufactured by X-rite Co., Ltd.) * .
[表1] [Table 1]
由表1可知,相對於Sal、Sdr及[Sdr/Sal]中至少一者不在特定範圍內的電磁波屏蔽膜(比較例1~3),實施例之電磁波屏蔽膜其明度較低且黑度更優異。因此,基於本實施例,可確認無論黑色層之組成如何,藉由具備具有特定表面形狀之保護層,可提升黑度。As can be seen from Table 1, compared with the electromagnetic wave shielding films (comparative examples 1-3) in which at least one of Sal, Sdr and [Sdr/Sal] is not in a specific range, the electromagnetic wave shielding films of the embodiments have lower lightness and blackness. excellent. Therefore, based on this example, it was confirmed that blackness can be improved by having a protective layer having a specific surface shape regardless of the composition of the black layer.
1:電磁波屏蔽膜
2:保護層
2a:保護層表面
3:電磁波屏蔽層
4:導電性接著劑層
21,23:黑色保護層
22:透明保護層
1: Electromagnetic wave shielding film
2:
圖1為截面示意圖,其顯示本揭示發明之電磁波屏蔽膜之一實施形態。 圖2為截面示意圖,其顯示本揭示發明之電磁波屏蔽膜之另一實施形態。 圖3為截面示意圖,其顯示本揭示發明之電磁波屏蔽膜又另一實施形態。 FIG. 1 is a schematic cross-sectional view showing an embodiment of an electromagnetic wave shielding film disclosed in the present invention. Fig. 2 is a schematic cross-sectional view showing another embodiment of the electromagnetic wave shielding film of the disclosed invention. Fig. 3 is a schematic cross-sectional view showing yet another embodiment of the electromagnetic shielding film of the disclosed invention.
1:電磁波屏蔽膜 1: Electromagnetic wave shielding film
2:保護層 2: Protective layer
2a:保護層表面 2a: Protective layer surface
3:電磁波屏蔽層 3: Electromagnetic wave shielding layer
4:導電性接著劑層 4: Conductive adhesive layer
21:黑色保護層 21: Black protective layer
Claims (6)
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JP2021101445 | 2021-06-18 | ||
JP2021-101445 | 2021-06-18 |
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TW202313328A true TW202313328A (en) | 2023-04-01 |
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TW111109913A TW202313328A (en) | 2021-06-18 | 2022-03-17 | Electromagnetic wave shield film |
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JP (1) | JP7566151B2 (en) |
KR (1) | KR20240023018A (en) |
CN (1) | CN117280881A (en) |
TW (1) | TW202313328A (en) |
WO (1) | WO2022265101A1 (en) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004288972A (en) | 2003-03-24 | 2004-10-14 | Shin Etsu Polymer Co Ltd | Electromagnetic wave shielding body and its manufacturing method |
JP2009076824A (en) | 2007-09-25 | 2009-04-09 | Sony Chemical & Information Device Corp | Blackening method of mesh body for electromagnetic wave shielding, and mesh body for electromagnetic wave shielding |
JP5796690B1 (en) | 2015-02-02 | 2015-10-21 | 東洋インキScホールディングス株式会社 | Electromagnetic shielding sheet and printed wiring board |
CN111800997B (en) * | 2016-09-06 | 2023-08-29 | 拓自达电线株式会社 | Electromagnetic wave shielding film |
WO2018212146A1 (en) * | 2017-05-15 | 2018-11-22 | 日本電気硝子株式会社 | Transparent product and method for producing transparent product |
JP6599956B2 (en) * | 2017-10-23 | 2019-10-30 | ファナック株式会社 | Machine tool machining condition selection device |
JP6978994B2 (en) * | 2018-02-20 | 2021-12-08 | タツタ電線株式会社 | Transfer film |
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- 2022-06-17 KR KR1020237036476A patent/KR20240023018A/en active Search and Examination
- 2022-06-17 WO PCT/JP2022/024340 patent/WO2022265101A1/en active Application Filing
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WO2022265101A1 (en) | 2022-12-22 |
JP7566151B2 (en) | 2024-10-11 |
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