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TW202219182A - Polyorganosilsesquioxane, curable composition, cured object, hardcoat film, transfer film, and adhesive sheet - Google Patents

Polyorganosilsesquioxane, curable composition, cured object, hardcoat film, transfer film, and adhesive sheet Download PDF

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TW202219182A
TW202219182A TW110131229A TW110131229A TW202219182A TW 202219182 A TW202219182 A TW 202219182A TW 110131229 A TW110131229 A TW 110131229A TW 110131229 A TW110131229 A TW 110131229A TW 202219182 A TW202219182 A TW 202219182A
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川原寛弘
足立知子
芝本明弘
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日商大賽璐股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
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    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
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    • C09J7/00Adhesives in the form of films or foils

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Abstract

Provided is a polyorganosilsesquioxane which can give cured objects having the high heat resistance characteristic of polyorganosilsesquioxanes and having high surface hardness and flexing characteristics and which is suitable as a material for hardcoat films. This polyorganosilsesquioxane includes a silsesquioxane which is a product of condensation of two or more cage silsesquioxanes that include at least one cage silsesquioxane selected from the group consisting of cage silsesquioxanes represented by the following empirical formulae (1), (2), (3), and (4) and which has a molecular weight of 8,000 or lower. Formula (1): [R1SiO3/2]8[R1SiO2/2(ORc)]1. Formula (2): [R2SiO3/2]6[R2SiO2/2(ORc)]2. Formula (3): [R3SiO3/2]8[R3SiO2/2(ORc)]2. Formula (4): [R4SiO3/2]10[R4SiO2/2(ORc)]2 [Symbols in the formulae are as described in the description.].

Description

聚有機矽倍半氧烷、硬化性組成物、硬化物、硬塗膜、轉印用膜、及接著片Polyorganosiloxane sesquioxane, curable composition, cured product, hard coat film, transfer film, and adhesive sheet

本發明係關於一種聚有機矽倍半氧烷、以及含有該聚有機矽倍半氧烷之硬化性組成物及其硬化物、以及由該硬化物構成之硬塗膜。本發明係關於一種含有該硬化性組成物作為硬塗層之轉印用膜。又,本發明係關於一種含有該硬化性組成物作為接著劑層之接著片。本案主張在2020年8月28日於日本提出申請之特願2020-145085號之優先權,並將其內容援引於此。The present invention relates to a polyorganosiloxane, a curable composition containing the polyorganosiloxane, a cured product thereof, and a hard coating film composed of the cured product. The present invention relates to a transfer film containing the curable composition as a hard coat layer. Furthermore, the present invention relates to an adhesive sheet containing the curable composition as an adhesive layer. This case claims the priority of Japanese Patent Application No. 2020-145085 filed in Japan on August 28, 2020, and the content is incorporated herein by reference.

聚有機矽倍半氧烷(矽倍半氧烷)係藉由使三官能性矽烷水解而獲得之網狀結構型聚合物或多面體團簇。作為矽倍半氧烷,已知有具有無規結構、梯型結構、籠型結構者。目前已知之分子量例如為3000以上之高分子量之矽倍半氧烷其大多數為具有無規結構或梯型結構者。此種高分子矽倍半氧烷例如記載於下述專利文獻1。Polyorganosiloxanes (silsesquioxanes) are network-structured polymers or polyhedral clusters obtained by hydrolyzing trifunctional silanes. As silsesquioxanes, those having a random structure, a ladder structure, and a cage structure are known. Most of the known high molecular weight silsesquioxanes with molecular weight above 3000 have random structure or ladder structure. Such a polymer silsesquioxane is described in Patent Document 1 below, for example.

又,籠型結構之矽倍半氧烷係具有經矽氧烷鍵而三維地使環閉合之結構,且以氧化矽之立方體結構為中心,於各頂點具有有機官能基之物質之總稱。作為該立方體結構,已知主要有作為正六面體結構之八聚物矽倍半氧烷(T 8)、作為側錐五角柱結構之十聚物矽倍半氧烷(T 10)。此種籠型矽倍半氧烷例如記載於下述專利文獻2。 [先前技術文獻] [專利文獻] In addition, the silsesquioxane of the cage structure has a structure in which a ring is three-dimensionally closed by a siloxane bond, and is a general term for substances having an organic functional group at each vertex with a cubic structure of silicon oxide as the center. As the cubic structure, octamer silsesquioxane (T 8 ), which is a regular hexahedral structure, and decamer silsesquioxane (T 10 ), which is a side pyramidal pentagonal structure, are mainly known. Such a cage silsesquioxane is described in Patent Document 2 below, for example. [Prior Art Literature] [Patent Literature]

[專利文獻1]日本特開2013-35918號公報 [專利文獻2]日本特開2000-334881號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2013-35918 [Patent Document 2] Japanese Patent Laid-Open No. 2000-334881

[發明所欲解決之課題][The problem to be solved by the invention]

然而,由目前之高分子量聚有機矽倍半氧烷或籠型矽倍半氧烷所獲得之硬化物有硬度不足之傾向,彎折時之彎曲性亦有極限。因此,目前之該硬化物無法用於要求高硬度及高耐彎曲性之用途,故作為適於硬塗之材料之用途受限。又,目前之高分子矽倍半氧烷隨著分子量變大而難以溶解於有機溶劑等溶劑中,故存在難以加工成適於硬塗之材料等。However, the hardened product obtained from the current high molecular weight polyorganosiloxane or cage silsesquioxane tends to be insufficient in hardness, and has a limit in flexibility during bending. Therefore, the current hardened product cannot be used for applications requiring high hardness and high bending resistance, and thus its use as a material suitable for hard coating is limited. In addition, as the molecular weight of the current polymer silsesquioxane increases, it is difficult to dissolve in solvents such as organic solvents, so it is difficult to process it into a material suitable for hard coating.

因此,本發明之發明之目的在於提供一種聚有機矽倍半氧烷,其可製成既具有作為聚有機矽倍半氧烷之特徵的高耐熱性,又具有高表面硬度及耐彎曲性之硬化物,且適宜作為硬塗膜之材料。又,其目的在於提供一種為高分子量之聚有機矽倍半氧烷且具有於有機溶劑等溶劑中之高溶解性之聚有機矽倍半氧烷。Therefore, the object of the invention of the present invention is to provide a polyorganosiloxane, which can be made into a polyorganosiloxane having high heat resistance, which is characteristic of polyorganosiloxane, and high surface hardness and bending resistance. Hardened product, and suitable as a material for hard coating. Moreover, it aims at providing the polyorganosiloxane sesquioxane which is a high molecular weight polyorganosiloxane and has high solubility in solvents, such as an organic solvent.

又,本發明之發明目的在於提供一種含有該聚有機矽倍半氧烷之硬化性組成物。 進而,本發明之發明目的在於提供一種該硬化性組成物之硬化物、具有作為該硬化物之硬塗層之硬塗膜。 進而,本發明之另一發明目的在於提供一種具有含有該硬化性組成物之硬塗層之轉印膜。 又,本發明之另一發明目的在於提供一種具有含有該硬化性組成物之接著劑層之接著片。 [解決課題之技術手段] Another object of the present invention is to provide a curable composition containing the polyorganosiloxane silsesquioxane. Further, an object of the present invention is to provide a cured product of the curable composition, and a hard coat film having a hard coat layer as the cured product. Furthermore, another object of the present invention is to provide a transfer film having a hard coat layer containing the curable composition. Furthermore, another object of the present invention is to provide an adhesive sheet having an adhesive layer containing the curable composition. [Technical means to solve the problem]

本發明之發明人等發現,含有具有特定組成式之籠型矽倍半氧烷縮合2個以上而得之結構且分子量為8000以下之矽倍半氧烷的硬化性組成物之硬化物既具有高耐熱性又具有優異之表面硬度及耐彎曲性,作為硬塗膜或轉印用膜中之硬塗層、接著片中之接著劑層非常有用。又,亦發現,該矽倍半氧烷為高分子量且於有機溶劑等溶劑中具有高溶解性。本發明係基於該等知識見解而完成。The inventors of the present invention have found that a cured product of a curable composition containing a silsesquioxane having a structure in which two or more clathrate silsesquioxanes having a specific composition formula are condensed and having a molecular weight of 8,000 or less has both It has high heat resistance and excellent surface hardness and bending resistance, and is very useful as a hard coat layer in a hard coat film or a transfer film, and an adhesive layer in an adhesive sheet. In addition, it was found that the silsesquioxane has a high molecular weight and has high solubility in solvents such as organic solvents. The present invention has been completed based on such knowledge.

即,本發明提供一種聚有機矽倍半氧烷,其含有矽倍半氧烷,該矽倍半氧烷是含有選自由下述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷所組成之群中之至少一種之籠型矽倍半氧烷縮合2個以上而得之縮合物且分子量為8000以下。 ・式(1):[R 1SiO 3/2] 8[R 1SiO 2/2(OR c)] 1(式(1)中,R 1分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) ・式(2):[R 2SiO 3/2] 6[R 2SiO 2/2(OR c)] 2(式(2)中,R 2分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(3):[R 3SiO 3/2] 8[R 3SiO 2/2(OR c)] 2(式(3)中,R 3分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(4):[R 4SiO 3/2] 10[R 4SiO 2/2(OR c)] 2(式(4)中,R 4分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) That is, the present invention provides a polyorganosiloxane containing silsesquioxane, and the silsesquioxane is selected from the following compositional formula (1), compositional formula (2), compositional formula (3) ) and at least one of the clathrate silsesquioxanes in the group consisting of the clathrate silsesquioxane represented by the composition formula (4) is a condensate obtained by condensing two or more pieces and having a molecular weight of 8,000 or less.・Formula (1): [R 1 SiO 3/2 ] 8 [R 1 SiO 2/2 (OR c )] 1 (in formula (1), R 1 is each independently a polymerizable functional group-containing group, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom, and at least one is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (2): [R 2 SiO 3/2 ] 6 [R 2 SiO 2/2 (OR c )] 2 (in formula (2), R 2 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, A substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c respectively independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (3): [R 3 SiO 3/2 ] 8 [R 3 SiO 2/2 (OR c )] 2 (in formula (3), R 3 are independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group alkyl group, substituted or unsubstituted alkenyl group, or hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c independently represents an alkyl group with 1 to 4 carbon atoms or a hydrogen atom) ・Formula ( 4): [R 4 SiO 3/2 ] 10 [R 4 SiO 2/2 (OR c )] 2 (in formula (4), R 4 is independently a group containing a polymerizable functional group, substituted or unsubstituted Substituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom , and at least one is a group containing a polymerizable functional group; R c independently represents an alkyl group with 1 to 4 carbon atoms or a hydrogen atom)

又,本發明提供一種上述聚有機矽倍半氧烷,其中,上述含有聚合性官能基之基為下述式(1A)

Figure 02_image001
[式(1A)中,R 1A表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1B)
Figure 02_image003
[式(1B)中,R 1B表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1C)
Figure 02_image005
[式(1C)中,R 1C表示直鏈或支鏈狀之伸烷基] 所表示之基、或下述式(1D)
Figure 02_image007
[式(1D)中,R 1D表示直鏈或支鏈狀之伸烷基] 所表示之基。 Furthermore, the present invention provides the above-mentioned polyorganosiloxane, wherein the polymerizable functional group-containing group is the following formula (1A)
Figure 02_image001
[In formula (1A), R 1A represents a linear or branched alkylene group] The group represented by the following formula (1B)
Figure 02_image003
[In formula (1B), R 1B represents a linear or branched alkylene group] The group represented by the following formula (1C)
Figure 02_image005
[In formula (1C), R 1C represents a linear or branched alkylene group] represented by the group, or the following formula (1D)
Figure 02_image007
A group represented by [in formula (1D), R 1D represents a linear or branched alkylene group].

又,本發明提供一種上述聚有機矽倍半氧烷,其中,相對於上述組成式(1)中之R 1、組成式(2)中之R 2、組成式(3)中之R 3、及組成式(4)中之R 4整體,含有聚合性官能基之基之比率為30%以上。 In addition, the present invention provides the above-mentioned polyorganosiloxane silsesquioxane, wherein, with respect to R 1 in the composition formula (1), R 2 in the composition formula (2), R 3 in the composition formula (3), And R 4 in the composition formula (4) as a whole, the ratio of the group containing a polymerizable functional group is 30% or more.

又,本發明提供一種上述聚有機矽倍半氧烷,其中,下述式(I)所表示之構成單元與下述式(II)所表示之構成單元之莫耳比[式(I)所表示之構成單元/式(II)所表示之構成單元]為1以上500以下。 [R aSiO 3/2]                (I) [式(I)中,R a表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子] [R bSiO 2/2(OR c)]        (II) [式(II)中,R b表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子;R c表示氫原子或碳數1~4之烷基] Furthermore, the present invention provides the above-mentioned polyorganosiloxane, wherein the molar ratio of the structural unit represented by the following formula (I) and the structural unit represented by the following formula (II) [represented by the formula (I) The structural unit represented by the structural unit represented by the formula (II)] is 1 or more and 500 or less. [R a SiO 3/2 ] (I) [In formula (I), R a represents a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, Substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom] [R b SiO 2/2 (OR c )] (II) [In formula (II), R b represents a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, A substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom; R c represents a hydrogen atom or an alkyl group with 1 to 4 carbons]

又,本發明提供一種數量平均分子量為2000~50000之上述聚有機矽倍半氧烷。Furthermore, the present invention provides the above-mentioned polyorganosiloxane sesquioxane having a number average molecular weight of 2,000 to 50,000.

又,本發明提供一種分子量分散度(重量平均分子量/數量平均分子量)為1.0~4.0之上述聚有機矽倍半氧烷。Furthermore, the present invention provides the above-mentioned polyorganosiloxane sesquioxane having a molecular weight dispersion (weight average molecular weight/number average molecular weight) of 1.0 to 4.0.

又,本發明提供一種含有上述聚有機矽倍半氧烷之硬化性組成物。Furthermore, the present invention provides a curable composition containing the above-mentioned polyorganosiloxane sesquioxane.

又,本發明提供一種進而含有硬化觸媒之上述硬化性組成物。Moreover, this invention provides the said curable composition which further contains a hardening catalyst.

又,本發明提供一種上述硬化性組成物,其中,上述硬化觸媒為光或熱聚合起始劑。Moreover, this invention provides the said curable composition in which the said hardening catalyst is a photo- or thermal polymerization initiator.

又,本發明提供一種上述硬化性組成物,其進而含有聚合穩定劑。Moreover, this invention provides the said curable composition which further contains a polymerization stabilizer.

又,本發明提供一種上述硬化性組成物,其為硬塗層形成用硬化性組成物。Moreover, this invention provides the said curable composition which is a curable composition for hard-coat layer formation.

又,本發明提供一種上述硬化性組成物,其為接著劑用硬化性組成物。Moreover, this invention provides the said curable composition which is a curable composition for adhesives.

又,本發明提供一種上述硬化性組成物之硬化物。Furthermore, the present invention provides a cured product of the aforementioned curable composition.

又,本發明提供一種硬塗膜,其積層有基材、及形成於該基材之至少一表面之為上述硬化物之硬塗層。Moreover, this invention provides the hard-coat film which laminated|stacked the base material, and the hard-coat layer which is the said hardened|cured material formed on at least one surface of this base material.

又,本發明提供一種轉印用膜,其積層有基材、及位於形成於該基材之至少一表面之脫模層上之硬塗層,且該硬塗層為含有上述硬化性組成物之層。Further, the present invention provides a transfer film comprising a base material and a hard coat layer formed on a release layer formed on at least one surface of the base material, wherein the hard coat layer contains the above curable composition layer.

又,本發明提供一種上述轉印用膜,其於上述硬塗層上依序進而積層增黏塗層(anchor coat layer)及接著劑層。Moreover, this invention provides the said film for transcription|transfer which further laminated|stacked an anchor coat layer and an adhesive agent layer on the said hard coat layer in this order.

又,本發明提供一種上述轉印用膜,其進而含有至少一層之著色層。Furthermore, the present invention provides the above-mentioned transfer film further comprising at least one coloring layer.

又,本發明提供一種上述轉印用膜,其中,上述硬塗層之厚度為3~150 μm。Moreover, this invention provides the said film for transcription|transfer in which the thickness of the said hard-coat layer is 3-150 micrometers.

又,本發明提供一種接著片,其具有基材及接著劑層,該接著劑層位於該基材上之至少一面,且為含有上述硬化性組成物之層。Furthermore, the present invention provides an adhesive sheet comprising a substrate and an adhesive layer, wherein the adhesive layer is located on at least one side of the substrate and is a layer containing the curable composition.

又,本發明提供一種接著片,其具有基材、增黏塗層及接著劑層,該增黏塗層及該接著劑層位於該基材上之至少一面,該增黏塗層含有矽烷偶合劑,該接著劑層為含有上述硬化性組成物之層;上述接著劑層設置於上述增黏塗層之表面上。 [發明之效果] In addition, the present invention provides an adhesive sheet, which has a substrate, an adhesion-promoting coating and an adhesive layer, the adhesion-promoting coating and the adhesive layer are located on at least one side of the substrate, and the adhesion-promoting coating contains silane A mixture, the adhesive layer is a layer containing the above-mentioned curable composition; the above-mentioned adhesive layer is arranged on the surface of the above-mentioned adhesion-promoting coating. [Effect of invention]

由含有本發明之聚有機矽倍半氧烷之硬化性組成物所獲得之硬化物(例如硬塗層)具有高耐熱性,且具有高表面硬度及耐彎曲性。因此,藉由使用具有該硬塗層之硬塗膜或轉印用膜,可製造具有高表面硬度及耐彎曲性之成型品(製品)。又,本發明之聚有機矽倍半氧烷為高分子量聚有機矽倍半氧烷,且具有於有機溶劑等溶劑中之高溶解性。因此,含有本發明之聚有機矽倍半氧烷之硬塗膜或轉印用膜可減少溶劑之使用量,進而未硬化或半硬化之硬塗層不黏著而能夠捲取成卷狀來操作,可以卷對卷方式操作含有該硬塗層之膜,因此,品質方面與成本方面這兩方面均優異。進而,含有本發明之聚有機矽倍半氧烷作為必需成分之硬化性組成物由於可形成高耐熱性及可撓性優異之硬化物(接著材),故亦可較佳地用作接著劑(例如,積層半導體用硬化性組成物)。The cured product (eg, hard coat layer) obtained from the curable composition containing the polyorganosiloxane sesquioxane of the present invention has high heat resistance, and has high surface hardness and bending resistance. Therefore, by using a hard coat film or a transfer film having the hard coat layer, a molded product (product) having high surface hardness and bending resistance can be produced. Moreover, the polyorganosiloxane sesquioxane of the present invention is a high molecular weight polyorganosiloxane sesquioxane, and has high solubility in solvents such as organic solvents. Therefore, the hard coat or transfer film containing the polyorganosiloxane of the present invention can reduce the amount of solvent used, and the uncured or semi-cured hard coat is not sticky and can be rolled into a roll for operation , the film containing the hard coat layer can be handled in a roll-to-roll manner, so it is excellent both in terms of quality and cost. Furthermore, the curable composition containing the polyorganosiloxane sesquioxane of the present invention as an essential component can form a cured product (adhesive material) with high heat resistance and flexibility, and thus can also be preferably used as an adhesive (For example, a curable composition for laminated semiconductors).

[聚有機矽倍半氧烷] 本發明之聚有機矽倍半氧烷含有矽倍半氧烷,該矽倍半氧烷(以下有時稱為「本發明之縮合矽倍半氧烷」)是含有選自由下述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷所組成之群中之至少一種之籠型矽倍半氧烷縮合2個以上而得之縮合物且分子量為8000以下(較佳為1500~7500,更佳為1800~7000,進而較佳為2000~6500)。 ・式(1):[R 1SiO 3/2] 8[R 1SiO 2/2(OR c)] 1(式(1)中,R 1分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) ・式(2):[R 2SiO 3/2] 6[R 2SiO 2/2(OR c)] 2(式(2)中,R 2分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(3):[R 3SiO 3/2] 8[R 3SiO 2/2(OR c)] 2(式(3)中,R 3分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(4):[R 4SiO 3/2] 10[R 4SiO 2/2(OR c)] 2(式(4)中,R 4分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) [Polyorganosiloxane] The polyorganosiloxane of the present invention contains silsesquioxane, which (hereinafter sometimes referred to as "condensed silsesquioxane of the present invention") It is a clathrate containing at least one selected from the group consisting of clathrate silsesquioxanes represented by the following compositional formula (1), compositional formula (2), compositional formula (3) and compositional formula (4). A condensate obtained by condensing two or more silsesquioxanes has a molecular weight of 8000 or less (preferably 1500-7500, more preferably 1800-7000, and still more preferably 2000-6500).・Formula (1): [R 1 SiO 3/2 ] 8 [R 1 SiO 2/2 (OR c )] 1 (in formula (1), R 1 is each independently a polymerizable functional group-containing group, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom, and at least one is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (2): [R 2 SiO 3/2 ] 6 [R 2 SiO 2/2 (OR c )] 2 (in formula (2), R 2 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, A substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c respectively independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (3): [R 3 SiO 3/2 ] 8 [R 3 SiO 2/2 (OR c )] 2 (in formula (3), R 3 are independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group alkyl group, substituted or unsubstituted alkenyl group, or hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c independently represents an alkyl group with 1 to 4 carbon atoms or a hydrogen atom) ・Formula ( 4): [R 4 SiO 3/2 ] 10 [R 4 SiO 2/2 (OR c )] 2 (in formula (4), R 4 is independently a group containing a polymerizable functional group, substituted or unsubstituted Substituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom , and at least one is a group containing a polymerizable functional group; R c independently represents an alkyl group with 1 to 4 carbon atoms or a hydrogen atom)

組成式(1)中之[R 1SiO 3/2]所表示之構成單元、組成式(2)中之[R 2SiO 3/2]所表示之構成單元、組成式(3)中之[R 3SiO 3/2]所表示之構成單元、及組成式(4)中之[R 4SiO 3/2]所表示之構成單元包含於下述式(I)所表示之構成單元(以下,於本說明書中有時稱為「T3體」)。 [R aSiO 3/2]                (I) The structural unit represented by [R 1 SiO 3/2 ] in the composition formula (1), the structural unit represented by [R 2 SiO 3/2 ] in the composition formula (2), and the [R 2 SiO 3/2 ] in the composition formula (3) The structural unit represented by R 3 SiO 3/2 ] and the structural unit represented by [R 4 SiO 3/2 ] in the composition formula (4) are included in the structural unit represented by the following formula (I) (hereinafter, In this specification, it is sometimes referred to as "T3 body"). [R a SiO 3/2 ] (I)

又,組成式(1)中之[R 1SiO 2/2(OR c)]所表示之構成單元、組成式(2)中之[R 2SiO 2/2(OR c)]所表示之構成單元、組成式(3)中之[R 3SiO 2/2(OR c)]所表示之構成單元、及組成式(4)中之[R 4SiO 2/2(OR c)]所表示之構成單元包含於下述式(II)所表示之構成單元(以下,於本說明書中有時稱為「T2體」)。 [R bSiO 2/2(OR c)]        (II) In addition, the structural unit represented by [R 1 SiO 2/2 (OR c )] in the composition formula (1), and the structure represented by [R 2 SiO 2/2 (OR c )] in the composition formula (2) A unit, a structural unit represented by [R 3 SiO 2/2 (OR c )] in the composition formula (3), and a unit represented by [R 4 SiO 2/2 (OR c )] in the composition formula (4) The structural unit is included in the structural unit represented by the following formula (II) (hereinafter, it may be referred to as "T2 body" in this specification). [R b SiO 2/2 (OR c )] (II)

上述式(I)中之R a、及式(II)中之R b表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子。又,上述式(II)中,R c表示碳數1~4之烷基或氫原子。 R a in the above formula (I) and R b in the formula (II ) represent a polymerizable functional group-containing group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a Substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom. In addition, in the above formula (II), R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom.

若進一步詳細記載上述式(I)所表示之構成單元,則以下述式(I')表示。又,若進一步詳細記載上述式(II)所表示之構成單元,則以下述式(II')表示。下述式(I')所表示之結構中示出之與矽原子鍵結之3個氧原子分別與另一矽原子(未示於式(I')中之矽原子)鍵結。另一方面,下述式(II')所表示之結構中示出之位於矽原子上及下之2個氧原子分別與另一矽原子(未示於式(II')中之矽原子)鍵結。即,上述T3體及T2體均為藉由對應之水解性三官能矽烷化合物之水解及縮合反應所形成之矽倍半氧烷構成單元(即所謂T單元)。

Figure 02_image009
Figure 02_image011
When the structural unit represented by the above formula (I) is described in more detail, it is represented by the following formula (I'). Moreover, if the structural unit represented by the said formula (II) is described in detail, it will be represented by the following formula (II'). In the structure represented by the following formula (I'), the three oxygen atoms shown to be bonded to the silicon atom are respectively bonded to another silicon atom (silicon atom not shown in the formula (I')). On the other hand, two oxygen atoms located above and below the silicon atom shown in the structure represented by the following formula (II') are respectively connected with another silicon atom (the silicon atom not shown in the formula (II')) bond. That is, the above-mentioned T3 body and T2 body are both silsesquioxane structural units (so-called T units) formed by the hydrolysis and condensation reactions of the corresponding hydrolyzable trifunctional silane compounds.
Figure 02_image009
Figure 02_image011

上述式(I')中之R a、式(II')中之R b及R c為與上述相同之基。式(II)中,R c中之烷基通常係源於形成作為本發明之聚有機矽倍半氧烷之原料使用之水解性矽烷化合物中之烷氧基(例如,作為下述式(A)~(C)中之X 1~X 3之烷氧基等)的烷基。 R a in the above formula (I'), and R b and R c in the formula (II') are the same groups as described above. In the formula (II), the alkyl group in R c is usually derived from the alkoxy group in the hydrolyzable silane compound used as the raw material of the polyorganosiloxane of the present invention (for example, as the following formula (A) ) to (C), the alkoxy groups of X 1 to X 3 , etc.) alkyl groups.

上述組成式(1)所表示之籠型矽倍半氧烷係8個[R 1SiO 3/2]所表示之構成單元(T3體)與1個[R 1SiO 2/2(OR c)]所表示之構成單元(T2體)經由矽氧烷鍵(Si-O-Si)相互鍵結而形成籠型結構的矽倍半氧烷。上述組成式(1)所表示之籠型矽倍半氧烷之具體結構只要滿足上述組成式(1),便無特別限定,例如可列舉下述式(1')所表示之籠型矽倍半氧烷等。 The clathrate silsesquioxane represented by the above-mentioned composition formula (1) is composed of eight constituent units (T3 body) represented by [R 1 SiO 3/2 ] and one [R 1 SiO 2/2 (OR c ) ] The constituent units (T2 bodies) represented by silsesquioxane are bonded to each other through siloxane bonds (Si-O-Si) to form a cage-type silsesquioxane. The specific structure of the clathrate silsesquioxane represented by the above composition formula (1) is not particularly limited as long as it satisfies the above composition formula (1), for example, the clathrate silsesquioxane represented by the following formula (1') Hemioxane etc.

Figure 02_image013
Figure 02_image013

式(1')中,R 1a~R 1i分別獨立為與組成式(1)中之R 1相同含義。式(1')中之R c亦與組成式(1)中之R c含義相同。 In formula (1'), R 1a to R 1i each independently have the same meaning as R 1 in composition formula (1). R c in formula (1') also has the same meaning as R c in composition formula (1).

上述組成式(2)所表示之籠型矽倍半氧烷係6個[R 2SiO 3/2]所表示之構成單元(T3體)與2個[R 2SiO 2/2(OR c)]所表示之構成單元(T2體)經由矽氧烷鍵(Si-O-Si)相互鍵結而形成籠型結構之矽倍半氧烷。上述組成式(2)所表示之籠型矽倍半氧烷之具體結構只要滿足上述組成式(2),便無特別限定,例如可列舉下述式(2')或(2'')所表示之籠型矽倍半氧烷等。

Figure 02_image015
Figure 02_image017
The clathrate silsesquioxane represented by the above composition formula (2) is composed of six constituent units (T3 body) represented by [R 2 SiO 3/2 ] and two [R 2 SiO 2/2 (OR c ) The constituent units (T2 bodies) represented by ] are bonded to each other through siloxane bonds (Si-O-Si) to form a silsesquioxane with a cage structure. The specific structure of the cage silsesquioxane represented by the above compositional formula (2) is not particularly limited as long as it satisfies the above compositional formula (2). Said cage silsesquioxane and so on.
Figure 02_image015
Figure 02_image017

式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p分別獨立為與組成式(2)中之R 2相同含義。式(2')、(2'')中之R c亦分別獨立為與組成式(2)中之R c相同含義。 R 2a to R 2h in the formula (2') and R 2i to R 2p in the formula (2'') have the same meaning as R 2 in the composition formula (2), respectively. R c in formulas (2') and (2'') also independently have the same meaning as R c in the composition formula (2).

上述組成式(3)所表示之籠型矽倍半氧烷係8個[R 3SiO 3/2]所表示之構成單元(T3體)與2個[R 3SiO 2/2(OR c)]所表示之構成單元(T2體)經由矽氧烷鍵(Si-O-Si)相互鍵結而形成籠型結構之矽倍半氧烷。上述組成式(3)所表示之籠型矽倍半氧烷之具體結構只要滿足上述組成式(3),便無特別限定,例如可列舉下述式(3')、(3'')或(3''')所表示之籠型矽倍半氧烷。

Figure 02_image019
Figure 02_image021
Figure 02_image023
The clathrate silsesquioxane represented by the above composition formula (3) is composed of eight constituent units (T3 body) represented by [R 3 SiO 3/2 ] and two [R 3 SiO 2/2 (OR c ) The constituent units (T2 bodies) represented by ] are bonded to each other through siloxane bonds (Si-O-Si) to form a silsesquioxane with a cage structure. The specific structure of the cage silsesquioxane represented by the above composition formula (3) is not particularly limited as long as it satisfies the above composition formula (3), for example, the following formulas (3'), (3'') or (3''') represents the cage silsesquioxane.
Figure 02_image019
Figure 02_image021
Figure 02_image023

式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd分別獨立為與組成式(3)中之R 3相同含義。式(3')、(3'')、式(3''')中之R c亦分別獨立為與組成式(3)中之R c相同含義。 R 3a to R 3j in formula (3'), R 3k to R 3t in formula (3''), R 3u to R 3z and R 3aa to R 3dd in formula (3''') are respectively independently It has the same meaning as R 3 in the composition formula (3). R c in formula (3'), (3''), and formula (3''') also independently have the same meaning as R c in composition formula (3).

上述組成式(4)所表示之籠型矽倍半氧烷係10個[R 4SiO 3/2]所表示之構成單元(T3體)與2個[R 4SiO 2/2(OR c)]所表示之構成單元(T2體)經由矽氧烷鍵(Si-O-Si)相互鍵結而形成籠型結構之矽倍半氧烷。上述組成式(4)所表示之籠型矽倍半氧烷之具體結構只要滿足組成式(4),便無特別限定,例如可列舉下述式(4')或(4'')所表示之籠型矽倍半氧烷。

Figure 02_image025
Figure 02_image027
The clathrate silsesquioxane represented by the above composition formula (4) is composed of 10 constituent units (T3 body) represented by [R 4 SiO 3/2 ] and two [R 4 SiO 2/2 (OR c ) The constituent units (T2 bodies) represented by ] are bonded to each other through siloxane bonds (Si-O-Si) to form a silsesquioxane with a cage structure. The specific structure of the cage silsesquioxane represented by the above compositional formula (4) is not particularly limited as long as it satisfies the compositional formula (4). For example, the following formula (4′) or (4″) can be used The cage silsesquioxane.
Figure 02_image025
Figure 02_image027

式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x分別獨立為與組成式(4)中之R 4相同含義。式(4')、(4'')中之R c亦分別獨立為與組成式(4)中之R c相同含義。 R 4a to R 4l in the formula (4') and R 4m to R 4x in the formula (4'') have the same meaning as R 4 in the composition formula (4), respectively. R c in formulas (4') and (4'') also independently have the same meaning as R c in the composition formula (4).

本發明之縮合矽倍半氧烷亦可於無損本發明之發明效果之範圍內包含除上述組成式(1)、組成式(2)、組成式(3)及組成式(4)以外之組成式所表示之籠型矽倍半氧烷。作為除上述組成式(1)、組成式(2)、組成式(3)及組成式(4)以外之組成式,例如可列舉以下之組成式(5)~(8)。 ・式(5):[R 5SiO 3/2] 6[R 5SiO 2/2(OR c)] 3(式(5)中,R 5分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(6):[R 6SiO 3/2] 8[R 6SiO 2/2(OR c)] 3(式(6)中,R 6分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(7):[R 7SiO 3/2] 10[R 7SiO 2/2(OR c)] 1(式(7)中,R 7分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) ・式(8):[R 8SiO 3/2] 12[R 8SiO 2/2(OR c)] 1(式(8)中,R 8分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) The condensed silsesquioxane of the present invention may also include compositions other than the above-mentioned compositional formula (1), compositional formula (2), compositional formula (3) and compositional formula (4) within the range that does not impair the effects of the present invention Cage silsesquioxane represented by the formula. As a compositional formula other than the said compositional formula (1), compositional formula (2), compositional formula (3), and compositional formula (4), the following compositional formulae (5)-(8) are mentioned, for example.・Formula (5): [R 5 SiO 3/2 ] 6 [R 5 SiO 2/2 (OR c )] 3 (in formula (5), R 5 is each independently a polymerizable functional group-containing group, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (6): [R 6 SiO 3/2 ] 8 [R 6 SiO 2/2 (OR c )] 3 (in formula (6), R 6 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, and a substituted or unsubstituted aralkane R c each independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (7): [R 7 SiO 3/2 ] 10 [R 7 SiO 2/2 (OR c )] 1 (in formula (7) , R 7 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group, A substituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of which is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula ( 8): [R 8 SiO 3/2 ] 12 [R 8 SiO 2/2 (OR c )] 1 (in formula (8), R 8 is independently a group containing a polymerizable functional group, substituted or unsubstituted Substituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom , and at least one is a group containing a polymerizable functional group; R c represents an alkyl group with 1 to 4 carbon atoms or a hydrogen atom)

本發明之縮合矽倍半氧烷亦包含混合存在上述組成式(1)~(8)所表示之籠型矽倍半氧烷者。即,本發明之縮合矽倍半氧烷可為包含選自由上述組成式(1)、組成式(2)、組成式(3)、組成式(4)、組成式(5)、組成式(6)、組成式(7)、及組成式(8)所表示之籠型矽倍半氧烷所組成之群中之至少一種之籠型矽倍半氧烷縮合2個以上而得之縮合物。The condensed silsesquioxanes of the present invention also include those in which the cage silsesquioxanes represented by the above-mentioned composition formulae (1) to (8) are mixed. That is, the condensed silsesquioxane of the present invention may contain a composition selected from the above compositional formula (1), compositional formula (2), compositional formula (3), compositional formula (4), compositional formula (5), compositional formula ( 6) Condensates obtained by condensing at least one of the clathrate silsesquioxanes in the group consisting of the clathrate silsesquioxanes represented by the composition formula (7) and the composition formula (8) by condensing two or more .

再者,即便於包含如上述組成式(5)、組成式(6)所示具有3個-OR c所表示之羥基之籠型矽倍半氧烷之情形時,其中之2個進行縮合之情形亦包含於本發明之本發明之縮合矽倍半氧烷。又,當上述組成式(5)、組成式(6)之3個-OR c所表示之羥基全部縮合時,只要無損本發明之發明效果,便亦認為包含於本發明之縮合矽倍半氧烷。 Furthermore, even in the case of including a cage silsesquioxane having three hydroxyl groups represented by -OR c as shown in the above compositional formula (5) and compositional formula (6), two of them are condensed. The case is also included in the condensed silsesquioxane of the present invention. In addition, when all the hydroxyl groups represented by the three -OR c in the above-mentioned composition formula (5) and composition formula (6) are condensed, as long as the effect of the present invention is not impaired, the condensed silsesquioxane of the present invention is also considered to be included in the present invention. alkyl.

上述含有聚合性官能基之基中之「陽離子聚合性官能基」只要為具有陽離子聚合性者,便無特別限定,例如可列舉:環氧基、氧環丁基、乙烯醚基、乙烯基苯基等。 上述含有聚合性官能基之基中之「自由基聚合性官能基」只要為具有自由基聚合性者,便無特別限定,例如可列舉:(甲基)丙烯醯氧基、(甲基)丙烯醯胺基、乙烯基、乙烯基硫基等。 作為聚合性官能基,基於硬化物之表面硬度(例如4H以上)之觀點,較佳為環氧基、(甲基)丙烯醯氧基等,更佳為環氧基。 The "cationic polymerizable functional group" in the above-mentioned polymerizable functional group-containing group is not particularly limited as long as it has cationic polymerizability, and examples thereof include epoxy group, oxycyclobutyl group, vinyl ether group, vinylbenzene group Base et al. The "radical polymerizable functional group" in the above-mentioned polymerizable functional group-containing group is not particularly limited as long as it has radical polymerizability, and examples thereof include (meth)acryloyloxy, (meth)propylene amide group, vinyl group, vinylthio group, etc. As a polymerizable functional group, an epoxy group, a (meth)acryloyloxy group, etc. are preferable from a viewpoint of the surface hardness (for example, 4H or more) of hardened|cured material, and an epoxy group is more preferable.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b中之含有聚合性官能基之基,並無特別限定,較佳為含環氧基之基,基於硬化性組成物之硬化性、硬化物之表面硬度或耐熱性之觀點,較佳為下述式(1A)所表示之基、式(1B)所表示之基、式(1C)所表示之基、式(1D)所表示之基,更佳為下述式(1A)所表示之基、式(1C)所表示之基,進而較佳為下述式(1A)所表示之基。

Figure 02_image001
Figure 02_image003
Figure 02_image005
Figure 02_image007
As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula ( 2 '), and formula ( 2'') in R 2i -R 2p , R 3 in the composition formula (3), R 3a -R 3j in the formula (3'), R 3k -R 3t in the formula (3''), R 3u to R 3z , R 3aa to R 3dd in (3'''), R 4 in formula (4), R 4a to R 4l in formula (4'), in formula (4'') R 4m to R 4x of composition formula (5), R 5 in composition formula (5), R 6 in composition formula (6), R 7 in composition formula (7), R 8 in composition formula (8), formula (I) ) in R a , and the polymerizable functional group-containing group in R b in the formula (II) are not particularly limited, but are preferably epoxy group-containing groups, and are based on the curability and curing properties of the curable composition. From the viewpoint of surface hardness or heat resistance of the object, the base represented by the following formula (1A), the base represented by the formula (1B), the base represented by the formula (1C), and the base represented by the formula (1D) are preferred. , more preferably a group represented by the following formula (1A), a group represented by the following formula (1C), and still more preferably a group represented by the following formula (1A).
Figure 02_image001
Figure 02_image003
Figure 02_image005
Figure 02_image007

上述式(1A)中,R 1A表示直鏈或支鏈狀之伸烷基。作為直鏈或支鏈狀之伸烷基,例如可列舉:亞甲基、甲基亞甲基、二甲基亞甲基、伸乙基、伸丙基、三亞甲基、四亞甲基、五亞甲基、六亞甲基、十亞甲基等碳數1~10之直鏈或支鏈狀之伸烷基。其中,基於硬化物之表面硬度或硬化性之觀點,R 1A較佳為碳數1~4之直鏈狀之伸烷基、碳數3或4之支鏈狀之伸烷基,更佳為伸乙基、三亞甲基、伸丙基,進而較佳為伸乙基、三亞甲基。 In the above formula (1A), R 1A represents a linear or branched alkylene group. Examples of linear or branched alkylene groups include methylene, methylmethylene, dimethylmethylene, ethylidene, propylidene, trimethylene, tetramethylene, Pentamethylene, hexamethylene, decamethylene and other linear or branched alkylene groups having 1 to 10 carbon atoms. Among them, from the viewpoint of the surface hardness or curability of the cured product, R 1A is preferably a linear alkylene group having 1 to 4 carbon atoms, a branched alkylene group having 3 or 4 carbon atoms, more preferably Ethylene, trimethylene, and propylidene are more preferred, and ethylidene and trimethylene are more preferred.

上述式(1B)中,R 1B表示直鏈或支鏈狀之伸烷基,可例示與R 1A相同之基。其中,基於硬化物之表面硬度或硬化性之觀點,R 1B較佳為碳數1~4之直鏈狀之伸烷基、碳數3或4之支鏈狀之伸烷基,更佳為伸乙基、三亞甲基、伸丙基,進而較佳為伸乙基、三亞甲基。 In the above formula (1B), R 1B represents a linear or branched alkylene group, and the same group as R 1A can be exemplified. Among them, from the viewpoint of the surface hardness or hardenability of the cured product, R 1B is preferably a straight-chain alkylene having 1 to 4 carbon atoms, or a branched alkylene having 3 or 4 carbon atoms, more preferably Ethylene, trimethylene, and propylidene are more preferred, and ethylidene and trimethylene are more preferred.

上述式(1C)中,R 1C表示直鏈或支鏈狀之伸烷基,可例示與R 1A相同之基。其中,基於硬化物之表面硬度或硬化性之觀點,R 1C較佳為碳數1~4之直鏈狀之伸烷基、碳數3或4之支鏈狀之伸烷基,更佳為伸乙基、三亞甲基、伸丙基,進而較佳為伸乙基、三亞甲基。 In the above formula (1C), R 1C represents a linear or branched alkylene group, and the same group as R 1A can be exemplified. Among them, from the viewpoint of the surface hardness or hardenability of the cured product, R 1C is preferably a linear alkylene group having 1 to 4 carbon atoms, a branched alkylene group having 3 or 4 carbon atoms, and more preferably Ethylene, trimethylene, and propylidene are more preferred, and ethylidene and trimethylene are more preferred.

上述式(1D)中,R 1D表示直鏈或支鏈狀之伸烷基,可例示與R 1A相同之基。其中,基於硬化物之表面硬度或硬化性之觀點,R 1D較佳為碳數1~4之直鏈狀之伸烷基、碳數3或4之支鏈狀之伸烷基,更佳為伸乙基、三亞甲基、伸丙基,進而較佳為伸乙基、三亞甲基。 In the above formula (1D), R 1D represents a linear or branched alkylene group, and the same group as that of R 1A can be exemplified. Among them, from the viewpoint of the surface hardness or hardenability of the cured product, R 1D is preferably a linear alkylene group having 1 to 4 carbon atoms, a branched alkylene group having 3 or 4 carbon atoms, and more preferably Ethylene, trimethylene, and propylidene are more preferred, and ethylidene and trimethylene are more preferred.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b中之含有聚合性官能基之基,較佳為含環氧基之基,更佳為上述式(1A)所表示之基且R 1A為伸乙基之基[其中,為2-(3',4'-環氧環己基)乙基]。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula ( 2 '), and formula ( 2'') in R 2i -R 2p , R 3 in the composition formula (3), R 3a -R 3j in the formula (3'), R 3k -R 3t in the formula (3''), R 3u to R 3z , R 3aa to R 3dd in (3'''), R 4 in formula (4), R 4a to R 4l in formula (4'), in formula (4'') R 4m to R 4x of composition formula (5), R 5 in composition formula (5), R 6 in composition formula (6), R 7 in composition formula (7), R 8 in composition formula (8), formula (I) ) in R a , and the polymerizable functional group-containing group in R b in the formula (II), preferably an epoxy group-containing group, more preferably a group represented by the above formula (1A) and R 1A It is an ethyl extension group [wherein, it is 2-(3',4'-epoxycyclohexyl)ethyl].

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b之經取代或未經取代之芳基中之芳基,例如可列舉苯基、甲苯基、萘基等。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula ( 2 '), and formula ( 2'') in R 2i -R 2p , R 3 in the composition formula (3), R 3a -R 3j in the formula (3'), R 3k -R 3t in the formula (3''), R 3u to R 3z , R 3aa to R 3dd in (3'''), R 4 in formula (4), R 4a to R 4l in formula (4'), in formula (4'') R 4m to R 4x of composition formula (5), R 5 in composition formula (5), R 6 in composition formula (6), R 7 in composition formula (7), R 8 in composition formula (8), formula (I) ) in R a and the aryl group in the substituted or unsubstituted aryl group of R b in the formula (II), for example, phenyl, tolyl, naphthyl and the like are exemplified.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b之經取代或未經取代之芳烷基中之上述芳烷基,例如可列舉苄基、苯乙基等。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula ( 2 '), and formula ( 2'') in R 2i -R 2p , R 3 in the composition formula (3), R 3a -R 3j in the formula (3'), R 3k -R 3t in the formula (3''), R 3u to R 3z , R 3aa to R 3dd in (3'''), R 4 in formula (4), R 4a to R 4l in formula (4'), in formula (4'') R 4m to R 4x of composition formula (5), R 5 in composition formula (5), R 6 in composition formula (6), R 7 in composition formula (7), R 8 in composition formula (8), formula (I) ) in R a , and R b in the formula (II), as the above-mentioned aralkyl group in the substituted or unsubstituted aralkyl group, for example, a benzyl group, a phenethyl group and the like can be exemplified.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b之經取代或未經取代之環烷基中之環烷基,例如可列舉:環丁基、環戊基、環己基等。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula ( 2 '), and formula ( 2'') in R 2i -R 2p , R 3 in the composition formula (3), R 3a -R 3j in the formula (3'), R 3k -R 3t in the formula (3''), R 3u to R 3z , R 3aa to R 3dd in (3'''), R 4 in formula (4), R 4a to R 4l in formula (4'), in formula (4'') R 4m to R 4x of composition formula (5), R 5 in composition formula (5), R 6 in composition formula (6), R 7 in composition formula (7), R 8 in composition formula (8), formula (I) ) in R a and the cycloalkyl group in the substituted or unsubstituted cycloalkyl group of R b in the formula (II), for example, cyclobutyl, cyclopentyl, cyclohexyl, etc. can be mentioned.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b之經取代或未經取代之烷基中之烷基,例如可列舉:甲基、乙基、丙基、正丁基、異丙基、異丁基、第二丁基、第三丁基、異戊基等直鏈或支鏈狀之烷基。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula ( 2 '), and formula ( 2'') in R 2i -R 2p , R 3 in the composition formula (3), R 3a -R 3j in the formula (3'), R 3k -R 3t in the formula (3''), R 3u to R 3z , R 3aa to R 3dd in (3'''), R 4 in formula (4), R 4a to R 4l in formula (4'), in formula (4'') R 4m to R 4x of composition formula (5), R 5 in composition formula (5), R 6 in composition formula (6), R 7 in composition formula (7), R 8 in composition formula (8), formula (I) ) in R a , and the alkyl group in the substituted or unsubstituted alkyl group of R b in formula (II), for example, methyl, ethyl, propyl, n-butyl, isopropyl , isobutyl, sec-butyl, tert-butyl, isopentyl and other linear or branched alkyl groups.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、及式(I)中之R a、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、及式(II)中之R b之經取代或未經取代之烯基中之烯基,例如可列舉:乙烯基、烯丙基、異丙烯基等直鏈或支鏈狀之烯基。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula ( 2 '), and formula ( 2'') in R 2i -R 2p , R 3 in the composition formula (3), R 3a -R 3j in the formula (3'), R 3k -R 3t in the formula (3''), R 3u to R 3z , R 3aa to R 3dd in (3'''), R 4 in formula (4), R 4a to R 4l in formula (4'), in formula (4'') R 4m to R 4x , R a in formula (I), R 5 in composition formula (5), R 6 in composition formula (6), R 7 in composition formula (7), composition formula ( The alkenyl group in the substituted or unsubstituted alkenyl group of R 8 in 8) and R b in formula (II), for example, linear or branched vinyl, allyl, isopropenyl, etc. can be mentioned. Chain alkenyl.

上述組成式(1)中之R 1中之含有聚合性官能基之基之個數較佳為3~9,更佳為5~9,進而較佳為7~9,進而更佳為9(全部為含有聚合性官能基之基)。上述組成式(2)中之R 2中之含有聚合性官能基之基之個數較佳為3~8,更佳為5~8,進而較佳為7~8,進而更佳為8(全部為含有聚合性官能基之基)。上述組成式(3)中之R 3中之含有聚合性官能基之基之個數較佳為3~10,更佳為5~10,進而較佳為7~10,進而更佳為10(全部為含有聚合性官能基之基)。上述組成式(4)中之R 4中之含有聚合性官能基之基之個數較佳為3~12,更佳為5~12,進而較佳為7~12,進而更佳為12(全部為含有聚合性官能基之基)。該等含有聚合性官能基之基之個數基於製成硬化性組成物時之硬化性、硬化物之表面硬度之觀點,較多者為宜。 The number of groups containing a polymerizable functional group in R 1 in the above compositional formula (1) is preferably 3 to 9, more preferably 5 to 9, still more preferably 7 to 9, still more preferably 9 ( All are groups containing polymerizable functional groups). The number of the polymerizable functional group-containing groups in R 2 in the above compositional formula (2) is preferably 3-8, more preferably 5-8, still more preferably 7-8, still more preferably 8 ( All are groups containing polymerizable functional groups). The number of groups containing a polymerizable functional group in R 3 in the above compositional formula (3) is preferably 3-10, more preferably 5-10, still more preferably 7-10, still more preferably 10 ( All are groups containing polymerizable functional groups). The number of groups containing polymerizable functional groups in R 4 in the above compositional formula (4) is preferably 3-12, more preferably 5-12, more preferably 7-12, still more preferably 12 ( All are groups containing polymerizable functional groups). The number of these polymerizable functional groups-containing groups is preferably larger from the viewpoints of curability when a curable composition is formed and surface hardness of a cured product.

又,於本發明之聚有機矽倍半氧烷中,相對於上述組成式(1)中之R 1、組成式(2)中之R 2、組成式(3)中之R 3、及組成式(4)中之R 4之整體,含有聚合性官能基之基(例如含環氧基之基)之比率(含有聚合性官能基之基之個數/R 1~R 4整體之個數)例如為30%以上,較佳為50%以上,更佳為80%以上。上述含有聚合性官能基之基之比率基於製成硬化性組成物時之硬化性、硬化物之表面硬度之觀點,較多者為宜,較佳為上述值以上。 Moreover, in the polyorganosiloxane sesquioxane of the present invention, with respect to R 1 in the composition formula (1), R 2 in the composition formula (2), R 3 in the composition formula (3), and composition R 4 in formula (4) as a whole, ratio of groups containing polymerizable functional groups (for example, groups containing epoxy groups) (number of groups containing polymerizable functional groups/number of total R 1 to R 4 ) ) is, for example, 30% or more, preferably 50% or more, more preferably 80% or more. The ratio of the above-mentioned polymerizable functional group-containing group is more suitable from the viewpoint of the curability when a curable composition is formed and the surface hardness of the cured product, and more preferably the above-mentioned value or more.

關於本發明之聚有機矽倍半氧烷,上述式(I)所表示之構成單元(T3體)與上述式(II)所表示之構成單元(T2體)之莫耳比[式(I)所表示之構成單元/式(II)所表示之構成單元;T3體/T2體]例如為1以上500以下。再者,上述式(I)所表示之構成單元及式(II)所表示之構成單元包含構成上述組成式(1)、組成式(2)、組成式(3)、及組成式(4)所表示之籠型矽倍半氧烷之T3體與T2體,進而包含該等以外之全部矽倍半氧烷(完全籠型矽倍半氧烷、梯型矽倍半氧烷、無規型矽倍半氧烷等)之T3體與T2體。Regarding the polyorganosiloxane of the present invention, the molar ratio of the structural unit (T3 form) represented by the above formula (I) and the structural unit (T2 form) represented by the above formula (II) [formula (I) The represented structural unit/the structural unit represented by the formula (II); T3 body/T2 body] is, for example, 1 or more and 500 or less. Furthermore, the structural unit represented by the above-mentioned formula (I) and the structural unit represented by the formula (II) include the above-mentioned compositional formula (1), compositional formula (2), compositional formula (3), and compositional formula (4) The T3 body and T2 body of the cage silsesquioxane represented, and further include all silsesquioxanes other than these (complete cage silsesquioxane, ladder silsesquioxane, random silsesquioxane) Silsesquioxane, etc.) T3 body and T2 body.

上述比率[T3體/T2體]之下限值如上所述為1,較佳為2,更佳為3,更佳為4,更佳為6,更佳為7,更佳為8,更佳為8,更佳為10,更佳為20,進而較佳為40。藉由將上述比率[T3體/T2體]設為1以上,製成未硬化或半硬化之硬塗層時之表面容易變得不黏著,耐黏連性提昇,容易捲取成卷狀,可較佳地用作具有耐彎曲性之硬塗層之成分,又,硬化物或硬塗層之表面硬度或接著性顯著提昇。另一方面,上述比率[T3體/T2體]之上限值較佳為500,更佳為400,更佳為300,更佳為100,更佳為50,更佳為40,更佳為30,更佳為25,更佳為20,更佳為18,進而較佳為18。藉由將上述比率[T3體/T2體]設為500以下,與硬化性組成物中之其他成分之相容性提昇,黏度亦得到抑制,因此容易操作,且容易塗佈成硬塗層。The lower limit value of the above ratio [T3 body/T2 body] is 1, preferably 2, more preferably 3, more preferably 4, more preferably 6, more preferably 7, more preferably 8, more preferably 6 as described above. 8 is preferable, 10 is more preferable, 20 is more preferable, and 40 is still more preferable. By setting the above ratio [T3 body/T2 body] to 1 or more, the surface of an uncured or semi-cured hard coat is easily made non-sticky, the blocking resistance is improved, and it is easy to be rolled into a roll. It can be preferably used as a component of a hard coat layer with bending resistance, and the surface hardness or adhesion of the hardened product or hard coat layer can be significantly improved. On the other hand, the upper limit of the ratio [T3 body/T2 body] is preferably 500, more preferably 400, more preferably 300, more preferably 100, more preferably 50, more preferably 40, more preferably 30, more preferably 25, more preferably 20, more preferably 18, and still more preferably 18. By setting the above ratio [T3 body/T2 body] to 500 or less, the compatibility with other components in the curable composition is improved, and the viscosity is also suppressed, so that it is easy to handle and coat as a hard coat layer.

本發明之聚有機矽倍半氧烷除具有上述矽倍半氧烷構成單元[RSiO 3/2](T單元)以外,亦可進而包含選自由[(R) 3SiO 1/2]所表示之構成單元(即所謂M單元)、[(R) 2SiO 2/2]所表示之構成單元(即所謂D單元)、及[SiO 4/2]所表示之構成單元(即所謂Q單元)所組成之群中之至少1種矽氧烷構成單元。再者,作為上述式(I)所表示之構成單元以外之矽倍半氧烷構成單元,此外還可列舉[HSiO 3/2]所表示之構成單元。再者,上述式中之R表示氫原子或一價之有機基。 The polyorganosiloxane of the present invention may further comprise a group selected from the group represented by [(R) 3 SiO 1/2 ] in addition to the above-mentioned silsesquioxane structural unit [RSiO 3/2 ] (T unit). The constituent unit (so-called M unit), the constituent unit represented by [(R) 2 SiO 2/2 ] (the so-called D unit), and the constituent unit represented by [SiO 4/2 ] (the so-called Q unit) At least one siloxane constituent unit in the formed group. In addition, as a silsesquioxane structural unit other than the structural unit represented by the said formula (I), the structural unit represented by [ HSiO3/2 ] can also be mentioned. Furthermore, R in the above formula represents a hydrogen atom or a monovalent organic group.

本發明之聚有機矽倍半氧烷中之上述比率[T3體/T2體]例如可藉由 29Si-NMR圖譜測定來求出。 29Si-NMR圖譜中,上述式(I)所表示之構成單元(T3體)中之矽原子與上述式(II)所表示之構成單元(T2體)中之矽原子於不同之位置(化學位移)顯現訊號(波峰),因此,藉由算出該等各個波峰之積分比,來求出上述比率[T3體/T2體]。上述式(I)所表示之結構(T3體)中之矽原子之訊號出現於-64~-70 ppm,上述式(II)所表示之結構(T2體)中之矽原子之訊號出現於-54~-60 ppm。因此,此時藉由算出-64~-70 ppm之訊號(T3體)與-54~-60 ppm之訊號(T2體)之積分比,可求出上述比率[T3體/T2體]。 The above-mentioned ratio [T3 form/T2 form] in the polyorganosiloxane of the present invention can be determined, for example, by measuring 29 Si-NMR spectrum. In the 29 Si-NMR spectrum, the silicon atom in the structural unit (T3 body) represented by the above formula (I) and the silicon atom in the structural unit (T2 body) represented by the above formula (II) are in different positions (chemical Displacement) shows a signal (peak), therefore, by calculating the integral ratio of these respective peaks, the above ratio [T3 body/T2 body] is obtained. The signal of the silicon atom in the structure (T3 body) represented by the above formula (I) appears at -64 to -70 ppm, and the signal of the silicon atom in the structure (T2 body) represented by the above formula (II) appears at - 54~-60ppm. Therefore, at this time, by calculating the integral ratio of the signal of -64 to -70 ppm (T3 body) and the signal of -54 to -60 ppm (T2 body), the above ratio [T3 body/T2 body] can be obtained.

本發明之聚有機矽倍半氧烷之 29Si-NMR圖譜例如可藉由下述裝置及條件進行測定。 測定裝置:「Brucker AVANCE(600 MHz)」(Brucker公司製造) 溶劑:氘氯仿 累計次數:8000次 測定溫度:25℃ 樣品:聚有機矽倍半氧烷/乙醯丙酮鉻(III)/氘氯仿(1%四甲基矽烷)=2.0:0.10:4.0(重量比) The 29 Si-NMR spectrum of the polyorganosiloxane of the present invention can be measured, for example, by the following apparatus and conditions. Measuring apparatus: "Brucker AVANCE (600 MHz)" (manufactured by Brucker Corporation) Solvent: Deuterochloroform Accumulated number of times: 8000 Measurement temperature: 25°C Sample: Polyorganosiloxane sesquioxane/Chromium(III) acetylacetonate/deuterochloroform (1% tetramethylsilane) = 2.0: 0.10: 4.0 (weight ratio)

本發明之聚有機矽倍半氧烷之上述比率[T3體/T2體]為1以上500以下意味著於本發明之聚有機矽倍半氧烷中,T2體之存在量與T3體同等或者相對較少,進一步進行矽烷醇之水解、縮合反應。The above-mentioned ratio [T3 body/T2 body] of the polyorganosiloxane sesquioxane of the present invention is 1 or more and 500 or less means that in the polyorganosiloxane sesquioxane of the present invention, the T2 body is present in an amount equal to or equal to the T3 body. Relatively few, further hydrolysis and condensation reactions of silanols are carried out.

本發明之聚有機矽倍半氧烷中之各矽倍半氧烷構成單元之比率能夠藉由用以形成該等構成單元之原料(水解性三官能矽烷)之組成來適當調整。The ratio of each silsesquioxane constituent unit in the polyorganosiloxane of the present invention can be appropriately adjusted by the composition of the raw material (hydrolyzable trifunctional silane) for forming these constituent units.

所謂選自由上述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷所組成之群中之至少一種縮合2個以上而得之縮合物即本發明之縮合矽倍半氧烷,係指上述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷中,1種時縮合2個以上(例如2~5,較佳為2~3,更佳為2)、或者2種以上時縮合2個以上(例如2~5,較佳為2~3,更佳為2)而得者。此處,「縮合」係指上述組成式(1)、組成式(2)、組成式(3)及組成式(4)中之-OR c所表示之羥基(-OR c為烷氧基時經水解形成之羥基)彼此脫水而形成矽氧烷鍵(Si-O-Si)。 At least one selected from the group consisting of the clathrate silsesquioxanes represented by the above compositional formula (1), compositional formula (2), compositional formula (3) and compositional formula (4) is condensed with two or more The obtained condensate is the condensed silsesquioxane of the present invention, which refers to the clathrate silsesquioxane represented by the above compositional formula (1), compositional formula (2), compositional formula (3) and compositional formula (4). Among the alkanes, two or more condensed (for example, 2 to 5, preferably 2 to 3, more preferably 2), or two or more condensed (for example, 2 to 5, preferably 2 to 3). , more preferably 2). Here, "condensation" refers to the hydroxyl group represented by -OR c in the above compositional formula (1), compositional formula (2), compositional formula (3) and compositional formula (4) (when -ORc is an alkoxy group) The hydroxyl groups formed by hydrolysis) dehydrate each other to form siloxane bonds (Si-O-Si).

上述組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷由於分子內具有2個-OR c所表示之基,故該等縮合而成之本發明之聚有機矽倍半氧烷具有該等籠型結構呈直線狀連接而成之結構。 Since the clathrate silsesquioxanes represented by the above compositional formula (2), compositional formula (3) and compositional formula (4) have two groups represented by -OR c in the molecule, these condensation The inventive polyorganosiloxane has a structure in which these cage structures are connected in a straight line.

上述組成式(1)所表示之籠型矽倍半氧烷由於分子內僅具有1個-OR c所表示之基,故於上述籠型結構呈直線狀連接而成之結構之末端部進行縮合。 Since the cage-type silsesquioxane represented by the above-mentioned composition formula (1) has only one group represented by -OR c in the molecule, it is condensed at the end of the structure in which the cage-type structures are connected in a straight line. .

又,本發明之縮合矽倍半氧烷亦可為不具有源自上述組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷之籠型結構,而使上述組成式(1)所表示之籠型矽倍半氧烷縮合2個而得者。In addition, the condensed silsesquioxane of the present invention may not have a cage structure derived from the cage silsesquioxane represented by the above-mentioned compositional formula (2), compositional formula (3) and compositional formula (4). , which is obtained by condensing two cage-type silsesquioxanes represented by the above composition formula (1).

關於本發明之縮合矽倍半氧烷,源自上述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷的各籠型構成單元之縮合形態並無特別限定,可為無規型,亦可為嵌段型。The condensed silsesquioxane of the present invention is derived from each cage of the clathrate silsesquioxane represented by the above-mentioned compositional formula (1), compositional formula (2), compositional formula (3) and compositional formula (4). The condensation form of the type constituting unit is not particularly limited, and may be a random type or a block type.

例如,於本發明之縮合矽倍半氧烷包含源自上述式(2')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(2a)所表示之籠型矽倍半氧烷結構之重複結構。

Figure 02_image033
For example, when the condensed silsesquioxane of the present invention includes a cage structure derived from the cage silsesquioxane represented by the above formula (2'), it has the following formula (2a) in the molecule. The repeating structure of the cage silsesquioxane structure.
Figure 02_image033

上述式(2a)中之各標號與上述式(2')含義相同。 又,於本發明之縮合矽倍半氧烷包含源自上述式(2'')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(2b)所表示之籠型矽倍半氧烷結構之重複結構。

Figure 02_image035
Each symbol in the above formula (2a) has the same meaning as the above formula (2'). Furthermore, when the condensed silsesquioxane of the present invention includes a cage structure derived from the cage silsesquioxane represented by the above formula (2″), the molecule has the following formula (2b) in the molecule. Represents the repeating structure of the cage silsesquioxane structure.
Figure 02_image035

上述式(2b)中之各標號與上述式(2'')含義相同。 例如,於本發明之縮合矽倍半氧烷包含源自上述式(3')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(3a)所表示之籠型矽倍半氧烷結構之重複結構。

Figure 02_image037
Each symbol in the above formula (2b) has the same meaning as the above formula (2″). For example, when the condensed silsesquioxane of the present invention includes a cage structure derived from the cage silsesquioxane represented by the above formula (3'), the molecule has the following formula (3a) in the molecule. The repeating structure of the cage silsesquioxane structure.
Figure 02_image037

上述式(3a)中之各標號與上述式(3')含義相同。 又,於本發明之縮合矽倍半氧烷包含源自上述式(3'')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(3b)所表示之籠型矽倍半氧烷結構之重複結構。

Figure 02_image039
Each symbol in the above formula (3a) has the same meaning as the above formula (3'). In addition, when the condensed silsesquioxane of the present invention includes a cage structure derived from the cage silsesquioxane represented by the above formula (3″), the molecule has the following formula (3b) in the molecule. Represents the repeating structure of the cage silsesquioxane structure.
Figure 02_image039

上述式(3b)中之各標號與上述式(3'')含義相同。 又,於本發明之縮合矽倍半氧烷包含源自上述式(3''')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(3c)所表示之籠型矽倍半氧烷結構之重複結構。

Figure 02_image041
Each symbol in the above formula (3b) has the same meaning as the above formula (3″). Furthermore, when the condensed silsesquioxane of the present invention includes a cage-type structure derived from the cage-type silsesquioxane represented by the above formula (3″), it has the following formula (3c) in the molecule Repetition of the cage silsesquioxane structure represented.
Figure 02_image041

上述式(3c)中之各標號與上述式(3''')含義相同。 例如,於本發明之縮合矽倍半氧烷包含源自上述式(4')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(4a)所表示之籠型矽倍半氧烷結構之重複結構。

Figure 02_image043
Each symbol in the above formula (3c) has the same meaning as the above formula (3'''). For example, when the condensed silsesquioxane of the present invention includes a cage structure derived from the cage silsesquioxane represented by the above formula (4'), it has the following formula (4a) in the molecule. The repeating structure of the cage silsesquioxane structure.
Figure 02_image043

上述式(4a)中之各標號與上述式(4')含義相同。 又,於本發明之縮合矽倍半氧烷包含源自上述式(4'')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(4b)所表示之籠型矽倍半氧烷結構之重複結構。

Figure 02_image045
The symbols in the above formula (4a) have the same meanings as those in the above formula (4'). Furthermore, when the condensed silsesquioxane of the present invention includes a cage structure derived from the cage silsesquioxane represented by the above formula (4″), the molecule has the following formula (4b) in the molecule. Represents the repeating structure of the cage silsesquioxane structure.
Figure 02_image045

上述式(4b)中之各標號與上述(4'')含義相同。 例如,於本發明之縮合矽倍半氧烷包含源自上述式(1')所表示之籠型矽倍半氧烷之籠型結構之情形時,於其兩端或一末端具有下述式(1a)所表示之籠型矽倍半氧烷結構及/或下述式(1b)所表示之籠型矽倍半氧烷結構。

Figure 02_image047
Figure 02_image049
Each symbol in the above formula (4b) has the same meaning as the above (4″). For example, when the condensed silsesquioxane of the present invention includes a cage structure derived from the cage silsesquioxane represented by the above formula (1'), both ends or one end thereof has the following formula The cage silsesquioxane structure represented by (1a) and/or the cage silsesquioxane structure represented by the following formula (1b).
Figure 02_image047
Figure 02_image049

上述式(1a)中之各標號與上述(1')含義相同。 上述式(1b)中之R 1j~R 1r與上述(1')中之R 1a~R 1i含義相同。 Each symbol in the above formula (1a) has the same meaning as the above (1'). R 1j to R 1r in the above formula (1b) have the same meanings as R 1a to R 1i in the above formula (1').

本發明之縮合矽倍半氧烷例如包含:2個組成式(1)所表示之籠型矽倍半氧烷之縮合物等1種時之2個以上之縮合物、及上述組成式(1)所表示之籠型矽倍半氧烷與上述組成式(2)所表示之籠型矽倍半氧烷縮合而得者等不同種類之2種以上之縮合物。其中,本發明之縮合矽倍半氧烷較佳為1個上述組成式(1)所表示之籠型矽倍半氧烷與另一上述組成式(1)所表示之籠型矽倍半氧烷之縮合物、或1個上述組成式(1)所表示之籠型矽倍半氧烷與組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷中之任一種之縮合物。The condensed silsesquioxane of the present invention includes, for example, two or more condensates of one type, such as two condensates of clathrate silsesquioxanes represented by the composition formula (1), and two or more condensates of the above-mentioned composition formula (1). ) represented by the clathrate silsesquioxane and the clathrate silsesquioxane represented by the above-mentioned composition formula (2) are obtained by condensing two or more kinds of condensates of different types. Among them, the condensed silsesquioxane of the present invention is preferably one clathrate silsesquioxane represented by the above composition formula (1) and another clathrate silsesquioxane represented by the above composition formula (1) A condensate of alkane, or a clathrate silsesquioxane represented by the above compositional formula (1) and a clathrate silsesquioxane represented by the compositional formulas (2), (3) and (4) The condensate of any of the oxanes.

本發明之縮合矽倍半氧烷中,作為1個上述組成式(1)所表示之籠型矽倍半氧烷與1個上述組成式(2)所表示之籠型矽倍半氧烷之縮合物的矽倍半氧烷例如可列舉:上述式(1')中之-OR c所表示之基與上述式(2')中之2個-OR c所表示之基中之1個縮合而形成之下述式(1a-2a)所表示之縮合矽倍半氧烷。再者,式(1a-2b)中之取代基(R 1a~R 1i及R 2a~R 2h)與式(1a)及式(2b)中之基相同。

Figure 02_image051
In the condensed silsesquioxane of the present invention, the combination of one clathrate silsesquioxane represented by the above composition formula (1) and one clathrate silsesquioxane represented by the above composition formula (2) As the silsesquioxane of the condensate, for example, a group represented by -OR c in the above formula (1') is condensed with one of the groups represented by two -OR c in the above formula (2'). And the condensed silsesquioxane represented by the following formula (1a-2a) is formed. In addition, the substituents (R 1a to R 1i and R 2a to R 2h ) in formula (1a-2b) are the same as those in formula (1a) and (2b).
Figure 02_image051

本發明之縮合矽倍半氧烷中,作為1個上述組成式(1)所表示之籠型矽倍半氧烷與另一上述組成式(1)所表示之籠型矽倍半氧烷之縮合物的矽倍半氧烷例如可列舉:2個上述式(1')中之-OR c所表示之基彼此縮合而形成之下述式(1a-1b)所表示之縮合矽倍半氧烷。再者,式(1a-1b)中之取代基(R 1a~R 1r)與式(1a)及式(1b)中之基相同。

Figure 02_image053
In the condensed silsesquioxane of the present invention, one clathrate silsesquioxane represented by the above-mentioned composition formula (1) and another clathrate silsesquioxane represented by the above-mentioned composition formula (1) are used. Examples of the silsesquioxane of the condensate include: a condensed silsesquioxane represented by the following formula (1a-1b) formed by condensing two groups represented by -OR c in the above formula (1') with each other. alkyl. In addition, the substituents (R 1a to R 1r ) in the formulas (1a-1b) are the same as those in the formulas (1a) and (1b).
Figure 02_image053

本發明之縮合矽倍半氧烷中,作為1個上述組成式(2)所表示之籠型矽倍半氧烷與另一上述組成式(2)所表示之籠型矽倍半氧烷之縮合物的矽倍半氧烷例如可列舉:2個上述式(2')中之-OR c所表示之基彼此縮合而形成之下述式(2a-2a)所表示之縮合矽倍半氧烷。再者,式(2a-2a)中之取代基(R 2a~R 2h)與式(2a)中之基相同。

Figure 02_image055
In the condensed silsesquioxane of the present invention, one clathrate silsesquioxane represented by the above-mentioned composition formula (2) and another clathrate silsesquioxane represented by the above-mentioned composition formula (2) are used. Examples of the silsesquioxane of the condensate include: a condensed silsesquioxane represented by the following formula (2a-2a) formed by condensing two groups represented by -OR c in the above formula (2') with each other. alkyl. In addition, the substituents (R 2a to R 2h ) in the formula (2a-2a) are the same as those in the formula (2a).
Figure 02_image055

本發明之聚有機矽倍半氧烷除本發明之縮合矽倍半氧烷以外,還可包含正六面體結構等氧化矽之立體結構完全未裂解之籠型(結構)矽倍半氧烷(即,完全籠型矽倍半氧烷)、及例如上述組成式(1)、組成式(2)、組成式(3)、組成式(4)等所表示之籠型矽倍半氧烷未經縮合者(即,不完全籠型矽倍半氧烷)等單體籠型矽倍半氧烷。再者,於本說明書中,將上述完全籠型倍半矽氧烷與不完全籠型倍半矽氧烷之兩者合併稱為單體籠型倍半矽氧烷。本發明之聚有機矽倍半氧烷中之單體籠型矽倍半氧烷之含量相對於本發明之聚有機矽倍半氧烷總量,例如為5重量%以上,較佳為10重量%以上,更佳為20重量%以上,例如為50重量%以下,較佳為40重量%以下,更佳為20重量%以下。若上述單體籠型矽倍半氧烷之含量處於上述範圍,則可使製成硬化物時之表面硬度進一步提昇。 In addition to the condensed silsesquioxane of the present invention, the polyorganosiloxane silsesquioxane of the present invention may also include a cage-type (structure) silsesquioxane ( That is, complete clathrate silsesquioxane), and clathrate silsesquioxanes represented by the above-mentioned compositional formula (1), compositional formula (2), compositional formula (3), compositional formula (4), etc. Monomeric cage silsesquioxanes such as those that have been condensed (ie, incomplete cage silsesquioxanes). Furthermore, in this specification, both of the above-mentioned complete cage-type silsesquioxane and incomplete cage-type silsesquioxane are collectively referred to as monomer cage-type silsesquioxane. The content of the monomer cage silsesquioxane in the polyorganosiloxane of the present invention is, for example, 5% by weight or more, preferably 10% by weight relative to the total amount of the polyorganosiloxane of the present invention % or more, more preferably 20% by weight or more, for example, 50% by weight or less, preferably 40% by weight or less, more preferably 20% by weight or less. If the content of the above-mentioned monomeric cage silsesquioxane is in the above-mentioned range, the surface hardness of the cured product can be further improved.

本發明之聚有機矽倍半氧烷亦可具有本發明之縮合矽倍半氧烷以外之籠型矽倍半氧烷。又,本發明之聚有機矽倍半氧烷除籠型矽倍半氧烷以外還可具有梯型或無規型等之矽倍半氧烷結構。又,亦可將該等矽倍半氧烷結構之2個以上加以組合而具有。The polyorganosiloxane of the present invention may also have cage silsesquioxanes other than the condensed silsesquioxane of the present invention. In addition, the polyorganosiloxane of the present invention may have a silsesquioxane structure such as a ladder type or random type in addition to the cage type silsesquioxane. Moreover, you may combine two or more of these silsesquioxane structures.

本發明之聚有機矽倍半氧烷中之本發明之縮合矽倍半氧烷之含量相對於本發明之聚有機矽倍半氧烷總量,為20重量%以上(較佳為25~90重量%,更佳為30~80重量%,進而較佳為40~70重量%)。籠型矽倍半氧烷之含量相對於本發明之聚有機矽倍半氧烷總量,例如含有40~99.5重量%,較佳為含有45~98重量%,更佳為含有50~96重量%。The content of the condensed silsesquioxane of the present invention in the polyorganosiloxane sesquioxane of the present invention is 20% by weight or more (preferably 25-90 wt % relative to the total amount of the polyorganosiloxane sesquioxane of the present invention). % by weight, more preferably 30 to 80% by weight, still more preferably 40 to 70% by weight). The content of cage silsesquioxane relative to the total amount of polyorganosiloxane of the present invention is, for example, 40-99.5 wt %, preferably 45-98 wt %, more preferably 50-96 wt % %.

本發明之聚有機矽倍半氧烷之基於凝膠滲透層析法之標準聚苯乙烯換算之數量平均分子量(Mn)例如為2000~50000,較佳為2500~40000,更佳為3000~30000。藉由將數量平均分子量設為2000以上,製成未硬化或半硬化之硬塗層時之表面容易變得不黏著,耐黏連性提昇,容易捲取成卷狀。因此,藉由將數量平均分子量設為2000以上,可較佳地用作模內射出成型轉印用膜之硬塗層之成分,又,硬化物之耐熱性、耐擦傷性、接著性進一步提昇。另一方面,藉由將數量平均分子量設為50000以下,與硬化性組成物中之其他成分之相容性提昇,進一步提昇硬化物之耐熱性。The number average molecular weight (Mn) of the polyorganosiloxane of the present invention in terms of standard polystyrene conversion based on gel permeation chromatography is, for example, 2,000-50,000, preferably 2,500-40,000, more preferably 3,000-30,000 . By setting the number average molecular weight to 2000 or more, the surface of the uncured or semi-cured hard coat layer is easy to become non-adhesive, the blocking resistance is improved, and it is easy to be wound into a roll. Therefore, by setting the number average molecular weight to 2000 or more, it can be preferably used as a component of a hard coat layer of a transfer film for in-mold injection molding, and the heat resistance, scratch resistance, and adhesion of the cured product are further improved. . On the other hand, by setting the number average molecular weight to be 50,000 or less, the compatibility with other components in the curable composition is improved, and the heat resistance of the cured product is further improved.

本發明之聚有機矽倍半氧烷之基於凝膠滲透層析法之標準聚苯乙烯換算之分子量分散度(Mw/Mn)例如為1.0~4.0,較佳為1.1~3.0,更佳為1.2~2.5。藉由將分子量分散度設為4.0以下,對溶劑之溶解性變良好,硬化物之表面硬度或接著性進一步提昇。另一方面,藉由將分子量分散度設為1.1以上,有容易成為液狀,操作性提昇之傾向。The molecular weight dispersion (Mw/Mn) of the polyorganosiloxane of the present invention based on standard polystyrene conversion based on gel permeation chromatography is, for example, 1.0-4.0, preferably 1.1-3.0, more preferably 1.2 ~2.5. By making the molecular weight dispersity 4.0 or less, the solubility to a solvent becomes favorable, and the surface hardness or adhesiveness of a hardened|cured material improves further. On the other hand, by making the molecular weight dispersion degree 1.1 or more, it becomes easy to become a liquid state, and there exists a tendency for workability|operativity to improve.

再者,本發明之聚有機矽倍半氧烷之數量平均分子量、分子量分散度可藉由GPC測定求出。又,本發明之聚有機矽倍半氧烷中之上述單體籠型矽倍半氧烷及縮合矽倍半氧烷之含量可根據GPC測定中之對應波峰之區域值之面積比求出。GPC測定可藉由下述裝置及條件進行測定。 測定裝置:商品名「GPC Semi-Micro System」(島津製作所(股)公司製造) 檢測器:RI檢測器(昭光Science(股)製造) 管柱:KF-G4A(保護管柱)、KF-602、及KF-603(昭光Science(股)公司製造) 流速:0.6 mL/min 測定溫度:40℃ 測定時間:13 min 注入量:20 μL 析出液:THF、樣品濃度0.1~0.2重量% 分子量:標準聚苯乙烯換算 Furthermore, the number average molecular weight and molecular weight dispersion of the polyorganosiloxane sesquioxane of the present invention can be determined by GPC measurement. In addition, the content of the above-mentioned monomer cage silsesquioxane and condensed silsesquioxane in the polyorganosiloxane of the present invention can be obtained from the area ratio of the area values of the corresponding peaks in the GPC measurement. GPC measurement can be performed by the following apparatus and conditions. Measuring device: Trade name "GPC Semi-Micro System" (manufactured by Shimadzu Corporation) Detector: RI detector (manufactured by Zhaoguang Science Co., Ltd.) Column: KF-G4A (guard column), KF-602, and KF-603 (manufactured by Zhaoguang Science Co., Ltd.) Flow rate: 0.6 mL/min Measurement temperature: 40℃ Measurement time: 13 min Injection volume: 20 μL Precipitate: THF, sample concentration 0.1 to 0.2 wt% Molecular weight: standard polystyrene conversion

本發明之聚有機矽倍半氧烷於空氣環境下之5%重量減少溫度(T d5)並無特別限定,較佳為330℃以上(例如330~450℃),更佳為340℃以上,進而較佳為350℃以上。藉由5%重量減少溫度為330℃以上,有硬化物之耐熱性進一步提昇之傾向。本發明之聚有機矽倍半氧烷為上述比率[T3體/T2體]為1以上500以下且數量平均分子量為2000~50000、分子量分散度為1.0~4.0,藉此其硬化物之5%重量減少溫度成為330℃以上。再者,5%重量減少溫度為耐熱性之指標,其係以一定之升溫速度進行加熱時,與加熱前重量相比減少5%時之溫度。上述5%重量減少溫度可藉由TGA(熱重量分析),於空氣環境下以升溫速度5℃/分鐘之條件進行測定。 The 5% weight reduction temperature (T d5 ) of the polyorganosiloxane sesquioxane of the present invention in an air environment is not particularly limited. More preferably, it is 350 degreeC or more. When the temperature is 330° C. or higher by 5% weight reduction, the heat resistance of the cured product tends to be further improved. In the polyorganosiloxane sesquioxane of the present invention, the ratio [T3 body/T2 body] is 1 or more and 500 or less, the number average molecular weight is 2,000-50,000, and the molecular weight dispersity is 1.0-4.0, which is 5% of the cured product. The weight reduction temperature is 330°C or higher. Furthermore, the 5% weight reduction temperature is an index of heat resistance, and it is the temperature at which the weight is reduced by 5% compared to the weight before heating when heating is performed at a constant temperature increase rate. The above-mentioned 5% weight loss temperature can be measured by TGA (thermogravimetric analysis) under the condition of a temperature increase rate of 5°C/min in an air environment.

本發明之聚有機矽倍半氧烷可藉由公知或慣用之聚矽氧烷之製造方法進行製造,並無特別限定,例如可藉由使1種或2種以上之水解性矽烷化合物水解及縮合之方法進行製造。其中,關於上述水解性矽烷化合物,必須使用水解性三官能矽烷化合物(下述式(A)所表示之化合物)作為必需之水解性矽烷化合物。The polyorganosiloxane of the present invention can be produced by a known or conventional production method of polysiloxane without particular limitation. For example, it can be produced by hydrolyzing one or more hydrolyzable silane compounds Manufactured by the method of condensation. Among them, as the hydrolyzable silane compound, a hydrolyzable trifunctional silane compound (a compound represented by the following formula (A)) must be used as an essential hydrolyzable silane compound.

更具體而言,例如,藉由使用來形成本發明之聚有機矽倍半氧烷中之矽倍半氧烷構成單元(T單元)的水解性矽烷化合物即下述式(a)所表示之化合物、視需要進而使下述式(b)所表示之化合物、下述式(c)所表示之化合物進行水解及縮合之方法,而生成上述組成式(1)、組成式(2)、組成式(3)及/或組成式(4)所表示之籠型矽倍半氧烷,藉由進一步之水解及縮合反應,可製造含有本發明之縮合矽倍半氧烷之本發明之聚有機矽倍半氧烷,該本發明之縮合矽倍半氧烷係上述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷中,1種時縮合2個以上、或2種以上時縮合2個以上而得。

Figure 02_image057
Figure 02_image059
Figure 02_image061
More specifically, for example, the hydrolyzable silane compound used to form the silsesquioxane constituent unit (T unit) in the polyorganosiloxane of the present invention is represented by the following formula (a). The compound, the compound represented by the following formula (b) and the compound represented by the following formula (c) are further hydrolyzed and condensed as necessary to generate the above-mentioned composition formula (1), composition formula (2), composition The clathrate silsesquioxane represented by the formula (3) and/or the compositional formula (4) can be further hydrolyzed and condensed to produce the polyorganic organic compound of the present invention containing the condensed silsesquioxane of the present invention Silsesquioxane, the condensed silsesquioxane of the present invention is the cage-type silsesquioxane represented by the above-mentioned compositional formula (1), compositional formula (2), compositional formula (3) and compositional formula (4). Among the alkanes, two or more are condensed in the case of one kind, or two or more are condensed in the case of two or more kinds.
Figure 02_image057
Figure 02_image059
Figure 02_image061

上述式(A)所表示之化合物為形成本發明之縮合矽倍半氧烷中之[R ASiO 3/2]或[R ASiO 2/2(OR c)]所表示之構成單元之化合物。式(A)中之R A與上述組成式(1)中之R 1、組成式(2)中之R 2、組成式(3)中之R 3、組成式(4)中之R 4(即,籠型矽倍半氧烷中之取代基)同樣地表示含有聚合性官能基之基。關於式(A)中之R A,作為其含有聚合性官能基之基,較佳為上述式(1A)所表示之基、上述式(1B)所表示之基、上述式(1C)所表示之基、上述式(1D)所表示之基,更佳為上述式(1A)所表示之基、上述式(1C)所表示之基,進而較佳為上述式(1A)所表示之基,進而更佳為上述式(1A)所表示之基且R 1A為伸乙基之基[其中,為2-(3',4'-環氧環己基)乙基]。 The compound represented by the above formula (A) is a compound that forms a structural unit represented by [ RA SiO 3/2 ] or [ RA SiO 2/2 (OR c )] in the condensed silsesquioxane of the present invention . R A in the formula (A) and R 1 in the above-mentioned composition formula (1), R 2 in the composition formula (2), R 3 in the composition formula (3), and R 4 in the composition formula ( 4 ) ( That is, the substituent in the cage silsesquioxane) similarly represents a polymerizable functional group-containing group. R A in the formula (A) is preferably a group represented by the above formula (1A), a group represented by the above formula (1B), or a group represented by the above formula (1C) as the group containing a polymerizable functional group. The base represented by the above formula (1D) is more preferably the base represented by the above formula (1A), the base represented by the above formula (1C), and more preferably the base represented by the above formula (1A), More preferably, it is a group represented by the above formula (1A) and R 1A is a group of ethylidene [wherein, it is 2-(3′,4′-epoxycyclohexyl)ethyl].

上述式(A)中之X 1表示烷氧基或鹵素原子。作為X 1中之烷氧基,例如可列舉:甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基等碳數1~4之烷氧基等。又,作為X 1中之鹵素原子,例如可列舉:氟原子、氯原子、溴原子、碘原子等。其中,X 1較佳為烷氧基,更佳為甲氧基、乙氧基。再者,3個X 1可分別相同,亦可不同。 X 1 in the above formula (A) represents an alkoxy group or a halogen atom. Examples of the alkoxy group in X 1 include alkoxy groups having 1 to 4 carbon atoms, such as a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, and an isobutoxy group. Moreover, as a halogen atom in X1, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned, for example. Among them, X 1 is preferably an alkoxy group, more preferably a methoxy group or an ethoxy group. Furthermore, the three X 1s may be the same or different.

上述式(B)所表示之化合物係形成本發明之縮合矽倍半氧烷中之[R BSiO 3/2]或[R BSiO 2/2(OR c)]所表示之構成單元之化合物。式(B)中,R B表示經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、或經取代或未經取代之烯基。式(B)中,R B較佳為經取代或未經取代之芳基、經取代或未經取代之烷基、經取代或未經取代之烯基,更佳為經取代或未經取代之芳基,進而較佳為苯基。 The compound represented by the above formula (B) is a compound that forms a constituent unit represented by [R B SiO 3/2 ] or [R B SiO 2/2 (OR c )] in the condensed silsesquioxane of the present invention . In formula (B), R B represents substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl , or substituted or unsubstituted alkenyl. In formula (B), R B is preferably substituted or unsubstituted aryl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, more preferably substituted or unsubstituted The aryl group is more preferably a phenyl group.

上述式(B)中之X 2表示烷氧基或鹵素原子。作為X 2之具體例,可列舉作為X 1所例示者。其中,X 2較佳為烷氧基,更佳為甲氧基、乙氧基。再者,3個X 2可分別相同,亦可不同。 X 2 in the above formula (B) represents an alkoxy group or a halogen atom. Specific examples of X 2 include those exemplified as X 1 . Among them, X 2 is preferably an alkoxy group, more preferably a methoxy group or an ethoxy group. Furthermore, the three X 2s may be the same or different.

上述式(C)所表示之化合物係形成本發明之縮合矽倍半氧烷中之[HSiO 3/2]或[HSiO 2/2(OR c)]所表示之構成單元之化合物。上述式(C)中,X 3表示烷氧基或鹵素原子。作為X 3之具體例,可列舉作為X 1所例示者。其中,X 3較佳為烷氧基,更佳為甲氧基、乙氧基。再者,3個X 3可分別相同,亦可不同。 The compound represented by the above formula (C) is a compound that forms a constituent unit represented by [HSiO 3/2 ] or [HSiO 2/2 (OR c )] in the condensed silsesquioxane of the present invention. In the above formula (C), X 3 represents an alkoxy group or a halogen atom. Specific examples of X 3 include those exemplified as X 1 . Among them, X 3 is preferably an alkoxy group, more preferably a methoxy group or an ethoxy group. Furthermore, the three X 3s may be the same or different.

作為上述水解性矽烷化合物,亦可併用上述式(A)~(C)所表示之化合物以外之水解性矽烷化合物。例如可列舉上述式(A)~(C)所表示之化合物以外之水解性三官能矽烷化合物、形成M單元之水解性單官能矽烷化合物、形成D單元之水解性二官能矽烷化合物、形成Q單元之水解性四官能矽烷化合物等。As the hydrolyzable silane compound, a hydrolyzable silane compound other than the compounds represented by the above formulae (A) to (C) may be used in combination. For example, hydrolyzable trifunctional silane compounds other than the compounds represented by the above formulae (A) to (C), hydrolyzable monofunctional silane compounds that form M units, hydrolyzable difunctional silane compounds that form D units, and Q units form Hydrolyzable tetrafunctional silane compounds, etc.

上述水解性矽烷化合物之使用量或組成可根據所需之本發明之聚有機矽倍半氧烷之結構來適當進行調整。例如,上述式(A)所表示之化合物之使用量並無特別限定,相對於所使用之水解性矽烷化合物之總量(100莫耳%),較佳為30~100莫耳%,更佳為55~100莫耳%,更佳為65~100莫耳%,進而較佳為80~99莫耳%。The usage amount or composition of the above-mentioned hydrolyzable silane compound can be appropriately adjusted according to the desired structure of the polyorganosiloxane silsesquioxane of the present invention. For example, the use amount of the compound represented by the above formula (A) is not particularly limited, but is preferably 30 to 100 mol % relative to the total amount (100 mol %) of the hydrolyzable silane compound used, more preferably It is 55-100 mol%, more preferably 65-100 mol%, and still more preferably 80-99 mol%.

又,上述式(B)所表示之化合物之使用量並無特別限定,相對於所使用之水解性矽烷化合物之總量(100莫耳%),較佳為0~70莫耳%,更佳為0~60莫耳%,進而較佳為0~40莫耳%,進而更佳為1~15莫耳%。In addition, the usage amount of the compound represented by the above formula (B) is not particularly limited, but is preferably 0 to 70 mol %, more preferably 0 to 70 mol % with respect to the total amount (100 mol %) of the hydrolyzable silane compound used. It is 0 to 60 mol %, more preferably 0 to 40 mol %, and still more preferably 1 to 15 mol %.

進而,式(A)所表示之化合物與式(B)所表示之化合物相對於所使用之水解性矽烷化合物之總量(100莫耳%)的比率(總量之比率)並無特別限定,較佳為60~100莫耳%,更佳為70~100莫耳%,進而較佳為80~100莫耳%。Furthermore, the ratio (total ratio) of the compound represented by the formula (A) and the compound represented by the formula (B) with respect to the total amount (100 mol %) of the hydrolyzable silane compound used is not particularly limited, Preferably it is 60-100 mol%, More preferably, it is 70-100 mol%, More preferably, it is 80-100 mol%.

又,於併用2種以上作為上述水解性矽烷化合物之情形時,該等水解性矽烷化合物之水解及縮合反應既可同時進行,亦可逐次進行。於逐次進行上述反應之情形時,進行反應之順序並無特別限定。Moreover, when two or more types are used together as the said hydrolyzable silane compound, the hydrolysis and condensation reaction of these hydrolyzable silane compounds may be performed simultaneously, and may be performed sequentially. When the above-mentioned reactions are carried out successively, the order of carrying out the reactions is not particularly limited.

上述水解性矽烷化合物之水解及縮合反應可以1階段進行,亦可分成2階段以上來進行,為了效率良好地製造本發明之聚有機矽倍半氧烷,較佳為以2階段以上(較佳為2階段)進行水解及縮合反應。以下,對以2階段進行水解性矽烷化合物之水解及縮合反應之態樣進行說明,但本發明之聚有機矽倍半氧烷之製造方法並不限定於其。The hydrolysis and condensation reaction of the hydrolyzable silane compound can be carried out in one stage or in two or more stages. In order to efficiently produce the polyorganosiloxane sesquioxane of the present invention, it is preferably carried out in two stages or more (preferably For 2 stages) hydrolysis and condensation reactions are carried out. Hereinafter, an aspect in which the hydrolysis and condensation reactions of the hydrolyzable silane compound are carried out in two steps will be described, but the method for producing the polyorganosiloxane of the present invention is not limited thereto.

於以2階段進行本發明之水解及縮合反應之情形時,較佳為於第1階段之水解及縮合反應中,獲得上述比率[T3體/T2體]為1以上且未達20、數量平均分子量例如為1000~3000之聚有機矽倍半氧烷(以下稱為「中間物聚有機矽倍半氧烷」),於第2階段使該中間物聚有機矽倍半氧烷進一步進行水解及縮合反應,藉此可獲得本發明之聚有機矽倍半氧烷。In the case where the hydrolysis and condensation reaction of the present invention are carried out in two stages, it is preferable to obtain the above-mentioned ratio [T3 body/T2 body] in the hydrolysis and condensation reaction of the first stage to be 1 or more and less than 20, and the number average For example, polyorganosiloxane with a molecular weight of 1000-3000 (hereinafter referred to as "intermediate polyorganosiloxane"), in the second stage, the intermediate polyorganosiloxane is further hydrolyzed and Condensation reaction, thereby obtaining the polyorganosiloxane sesquioxane of the present invention.

第1階段之水解及縮合反應既可於溶劑之存在下進行,亦可於未存在下進行。其中,較佳為於溶劑之存在下進行。作為上述溶劑,例如可列舉:苯、甲苯、二甲苯、乙基苯等芳香族烴;二乙醚、二甲氧基乙烷、四氫呋喃、二

Figure 110131229-A0304-12-0059-1
烷等醚;丙酮、甲基乙基酮、甲基異丁基酮等酮;乙酸甲酯、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺;乙腈、丙腈、苯甲腈等腈;甲醇、乙醇、異丙醇、丁醇等醇等。其中,上述溶劑較佳為酮、醚。再者,溶劑既可單獨使用1種,亦可組合2種以上使用。The hydrolysis and condensation reaction of the first stage may be carried out in the presence or absence of a solvent. Among them, it is preferably carried out in the presence of a solvent. Examples of the above-mentioned solvent include aromatic hydrocarbons such as benzene, toluene, xylene, and ethylbenzene; diethyl ether, dimethoxyethane, tetrahydrofuran, diethyl ether,
Figure 110131229-A0304-12-0059-1
Ethers such as alkane; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone; esters such as methyl acetate, ethyl acetate, isopropyl acetate, butyl acetate, etc.; N,N-dimethylformamide , N,N-dimethylacetamide and other amides; acetonitrile, propionitrile, benzonitrile and other nitriles; methanol, ethanol, isopropanol, butanol and other alcohols. Among them, the above-mentioned solvents are preferably ketones and ethers. In addition, a solvent may be used individually by 1 type, and may be used in combination of 2 or more types.

第1階段之水解及縮合反應中之溶劑之使用量並無特別限定,可根據所需之反應時間等,在相對於水解性矽烷化合物之總量100重量份為0~2000重量份之範圍內適當調整。The amount of the solvent used in the hydrolysis and condensation reactions in the first stage is not particularly limited, and may be in the range of 0 to 2,000 parts by weight with respect to 100 parts by weight of the total amount of the hydrolyzable silane compound, depending on the required reaction time, etc. Appropriate adjustments.

第1階段之水解及縮合反應較佳為於觸媒及水之存在下進行。上述觸媒可為酸觸媒,亦可為鹼觸媒,為了抑制環氧基等聚合性官能基之分解,較佳為鹼觸媒。作為上述酸觸媒,例如可列舉:鹽酸、硫酸、硝酸、磷酸、硼酸等無機酸;磷酸酯;乙酸、甲酸、三氟乙酸等羧酸;甲磺酸、三氟甲磺酸、對甲苯磺酸等磺酸;活性白土等固體酸;氯化鐵等路易斯酸等。作為上述鹼觸媒,例如可列舉:氫氧化鋰、氫氧化鈉、氫氧化鉀、氫氧化銫等鹼金屬之氫氧化物;氫氧化鎂、氫氧化鈣、氫氧化鋇等鹼土類金屬之氫氧化物;碳酸鋰、碳酸鈉、碳酸鉀、碳酸銫等鹼金屬之碳酸鹽;碳酸鎂等鹼土類金屬之碳酸鹽;碳酸氫鋰、碳酸氫鈉、碳酸氫鈉、碳酸氫鉀、碳酸氫銫等鹼金屬之碳酸氫鹽;乙酸鋰、乙酸鈉、乙酸鉀、乙酸銫等鹼金屬之有機酸鹽(例如乙酸鹽);乙酸鎂等鹼土類金屬之有機酸鹽(例如乙酸鹽);甲醇鋰、甲醇鈉、乙醇鈉、異丙醇鈉、乙醇鉀、第三丁醇鉀等鹼金屬之烷醇鹽;苯氧化鈉等鹼金屬之酚鹽;三乙胺、N-甲基哌啶、1,8-二吖雙環[5.4.0]十一-7-烯、1,5-二吖雙環[4.3.0]壬-5-烯等胺類(三級胺等);吡啶、2,2'-聯吡啶、1,10-啡啉等含氮芳香族雜環化合物等。再者,觸媒可單獨使用1種,亦可組合2種以上使用。又,觸媒可以溶解或分散於水或溶劑等中之狀態使用。The hydrolysis and condensation reactions in the first stage are preferably carried out in the presence of a catalyst and water. The above-mentioned catalyst may be an acid catalyst or an alkali catalyst, and in order to suppress the decomposition of polymerizable functional groups such as epoxy groups, an alkali catalyst is preferred. Examples of the acid catalyst include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, and boric acid; phosphoric acid esters; carboxylic acids such as acetic acid, formic acid, and trifluoroacetic acid; methanesulfonic acid, trifluoromethanesulfonic acid, and p-toluenesulfonic acid. Sulfonic acid such as acid; solid acid such as activated clay; Lewis acid such as ferric chloride, etc. Examples of the above-mentioned alkali catalyst include hydroxides of alkali metals such as lithium hydroxide, sodium hydroxide, potassium hydroxide, and cesium hydroxide; and hydrogen of alkaline earth metals such as magnesium hydroxide, calcium hydroxide, and barium hydroxide. Oxides; carbonates of alkali metals such as lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate; carbonates of alkaline earth metals such as magnesium carbonate; lithium bicarbonate, sodium bicarbonate, sodium bicarbonate, potassium bicarbonate, cesium bicarbonate Alkaline metal bicarbonate such as lithium acetate, sodium acetate, potassium acetate, cesium acetate and other alkali metal organic acid salts (such as acetate); magnesium acetate and other alkaline earth metal organic acid salts (such as acetate); lithium methoxide , sodium methoxide, sodium ethoxide, sodium isopropoxide, potassium ethoxide, potassium 3-butoxide and other alkali metal alkoxides; sodium phenoxide and other alkali metal phenolates; triethylamine, N-methylpiperidine, 1 ,8-Diazbicyclo[5.4.0]undec-7-ene, 1,5-diazbicyclo[4.3.0]non-5-ene and other amines (tertiary amines, etc.); pyridine, 2,2 '-bipyridine, 1,10-phenanthroline and other nitrogen-containing aromatic heterocyclic compounds, etc. In addition, a catalyst may be used individually by 1 type, and may be used in combination of 2 or more types. In addition, the catalyst may be used in a state of being dissolved or dispersed in water, a solvent, or the like.

第1階段之水解及縮合反應中之上述觸媒之使用量並無特別限定,可在相對於水解性矽烷化合物之總量1莫耳為0.002~0.200莫耳之範圍內適當進行調整。The usage-amount of the said catalyst in the hydrolysis and condensation reaction of a 1st stage is not specifically limited, It can adjust suitably in the range of 0.002-0.200 mol with respect to 1 mol of the total amount of a hydrolyzable silane compound.

第1階段之水解及縮合反應時之水之使用量並無特別限定,可在相對於水解性矽烷化合物之總量1莫耳為0.5~20莫耳之範圍內適當進行調整。The amount of water used in the first-stage hydrolysis and condensation reaction is not particularly limited, and can be appropriately adjusted within the range of 0.5 to 20 mol with respect to 1 mol of the total amount of the hydrolyzable silane compound.

第1階段之水解及縮合反應中之上述水之添加方法並無特別限定,可一次性地添加所使用之水之總量(全部使用量),亦可逐次添加。逐次添加時,既可連續地添加,亦可間歇地添加。The method of adding the above-mentioned water in the hydrolysis and condensation reaction in the first stage is not particularly limited, and the total amount of the water used (total amount used) may be added at one time, or may be added sequentially. In the case of successive addition, it may be added continuously or intermittently.

作為第1階段之水解及縮合反應之反應條件,重要的是選擇如中間物聚有機矽倍半氧烷之上述比率[T3體/T2體]成為1以上且未達20之反應條件。第1階段之水解及縮合反應之反應溫度並無特別限定,較佳為40~100℃,更佳為45~80℃。藉由將反應溫度控制為上述範圍,有能夠更有效率地將上述比率[T3體/T2體]控制為1以上且未達20之傾向。又,第1階段之水解及縮合反應之反應時間並無特別限定,較佳為0.1~10小時,更佳為1.5~8小時。又,第1階段之水解及縮合反應既可在常壓下進行,亦可在加壓下或減壓下進行。再者,進行第1階段之水解及縮合反應時之環境並無特別限定,例如為氮氣環境、氬氣環境等非活性氣體環境下、空氣下等氧存在下等均可,較佳為非活性氣體環境下。As the reaction conditions for the hydrolysis and condensation reactions in the first stage, it is important to select the reaction conditions such that the above-mentioned ratio [T3 body/T2 body] of the intermediate polyorganosiloxane is 1 or more and less than 20. The reaction temperature of the hydrolysis and condensation reaction in the first stage is not particularly limited, but is preferably 40 to 100°C, more preferably 45 to 80°C. By controlling the reaction temperature within the above-mentioned range, the above-mentioned ratio [T3 body/T2 body] tends to be more efficiently controlled to 1 or more and less than 20. In addition, the reaction time of the hydrolysis and condensation reaction in the first stage is not particularly limited, but is preferably 0.1 to 10 hours, more preferably 1.5 to 8 hours. In addition, the hydrolysis and condensation reaction of the first stage may be carried out under normal pressure, under pressure or under reduced pressure. Furthermore, the environment in which the hydrolysis and condensation reactions of the first stage are carried out is not particularly limited. For example, it may be in an inert gas environment such as a nitrogen atmosphere, an argon atmosphere, or in the presence of oxygen such as air, etc., preferably inactive. in a gaseous environment.

藉由上述第1階段之水解及縮合反應,可獲得中間物聚有機矽倍半氧烷。上述第1階段之水解及縮合反應結束後,較佳為進行觸媒之中和以抑制環氧基之開環等聚合性官能基之分解。又,可將中間物聚有機矽倍半氧烷例如藉由水洗、酸洗淨、鹼洗淨、過濾、濃縮、蒸餾、萃取、晶析、再結晶、管柱層析等分離手段、或將該等組合之分離手段等進行分離純化。又,可將含有中間物聚有機矽倍半氧烷之反應溶液供於第1階段之水解及縮合反應。Through the above-mentioned first-stage hydrolysis and condensation reaction, the intermediate polyorganosiloxane can be obtained. After completion of the hydrolysis and condensation reaction in the first stage, it is preferable to perform catalyst neutralization to suppress decomposition of polymerizable functional groups such as ring-opening of epoxy groups. In addition, the intermediate polyorganosiloxane sesquioxane can be separated by, for example, water washing, acid washing, alkali washing, filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, etc., or Separation and purification of these combined separation means, etc. are carried out. Also, the reaction solution containing the intermediate polyorganosiloxane sesquioxane can be used for the hydrolysis and condensation reactions in the first stage.

藉由將利用第1階段之水解及縮合反應而獲得之中間物聚有機矽倍半氧烷供於第2階段之水解及縮合反應,可製造本發明之聚有機矽倍半氧烷。 第2階段之水解及縮合反應既可於溶劑之存在下進行,亦可於未存在下進行。於溶劑之存在下進行第2階段之水解及縮合反應之情形時,可使用第1階段之水解及縮合反應中所列舉之溶劑。作為第2階段之水解及縮合反應之溶劑,可直接使用含有第1階段之水解及縮合反應之反應溶劑、萃取溶劑等之中間物聚有機矽倍半氧烷、或亦可使用將一部分或全部蒸餾去除所得者。又,於含有中間物聚有機矽倍半氧烷之反應溶液中添加沸點高於第1階段之水解及縮合反應所使用之溶劑的高沸點溶劑,繼而進行加熱、蒸餾去除,藉此亦可替換溶劑進行。再者,溶劑既可單獨使用1種,亦可組合2種以上使用。 The polyorganosiloxane of the present invention can be produced by subjecting the intermediate polyorganosiloxane obtained by the hydrolysis and condensation reaction of the first stage to the hydrolysis and condensation reaction of the second stage. The hydrolysis and condensation reaction of the second stage can be carried out in the presence or absence of a solvent. When performing the hydrolysis and condensation reaction of the second stage in the presence of a solvent, the solvents listed in the hydrolysis and condensation reaction of the first stage can be used. As the solvent for the hydrolysis and condensation reaction in the second stage, polyorganosiloxane, an intermediate containing the reaction solvent and extraction solvent for the hydrolysis and condensation reaction in the first stage, can be used as it is, or a part or all of it can be used. The resultant was removed by distillation. In addition, a high-boiling solvent with a boiling point higher than the solvent used in the first-stage hydrolysis and condensation reactions is added to the reaction solution containing the intermediate polyorganosiloxane, followed by heating and distillation to remove, thereby replacing the solvent. In addition, a solvent may be used individually by 1 type, and may be used in combination of 2 or more types.

於第2階段之水解及縮合反應中使用溶劑之情形時,其使用量並無特別限定,可根據所需之反應時間等,在相對於中間物聚有機矽倍半氧烷100重量份為0~2000重量份之範圍內適當調整。When the solvent is used in the hydrolysis and condensation reaction in the second stage, the amount of the solvent used is not particularly limited. According to the required reaction time, etc., it is 0 with respect to 100 parts by weight of the intermediate polyorganosiloxane sesquioxane. Appropriate adjustment within the range of ~2000 parts by weight.

第2階段之水解及縮合反應較佳為於觸媒及水之存在下進行。上述觸媒可使用第1階段之水解及縮合反應中所列舉之觸媒,為了抑制環氧基等聚合性官能基之分解,較佳為鹼觸媒,進而較佳為氫氧化鈉、氫氧化鉀、氫氧化銫等鹼金屬之氫氧化物;碳酸鋰、碳酸鈉、碳酸鉀、碳酸銫等鹼金屬之碳酸鹽。再者,觸媒既可單獨使用1種,亦可組合2種以上使用。又,觸媒可以溶解或分散於水或溶劑等中之狀態使用。又,可將第1階段之水解及縮合反應所使用之觸媒直接用於第2階段之水解及縮合反應。The hydrolysis and condensation reactions in the second stage are preferably carried out in the presence of a catalyst and water. The catalysts listed in the hydrolysis and condensation reactions in the first stage can be used as the above-mentioned catalysts. In order to suppress the decomposition of polymerizable functional groups such as epoxy groups, alkali catalysts are preferred, and sodium hydroxide and hydroxide are more preferred. Hydroxides of alkali metals such as potassium and cesium hydroxide; carbonates of alkali metals such as lithium carbonate, sodium carbonate, potassium carbonate and cesium carbonate. In addition, a catalyst may be used individually by 1 type, and may be used in combination of 2 or more types. In addition, the catalyst may be used in a state of being dissolved or dispersed in water, a solvent, or the like. In addition, the catalyst used for the hydrolysis and condensation reaction in the first stage can be directly used for the hydrolysis and condensation reaction in the second stage.

第2階段之水解及縮合反應中之上述觸媒之使用量並無特別限定,可在相對於中間物聚有機矽倍半氧烷(1000000 ppm)較佳為0.01~10000 ppm、更佳為0.1~1000 ppm之範圍內適當進行調整。The usage amount of the above-mentioned catalyst in the hydrolysis and condensation reaction of the second stage is not particularly limited, and it is preferably 0.01-10,000 ppm, more preferably 0.1 ppm relative to the intermediate polyorganosiloxane sesquioxane (1,000,000 ppm) Adjust appropriately within the range of ~1000 ppm.

第2階段之水解及縮合反應時之水之使用量並無特別限定,可在相對於中間物聚有機矽倍半氧烷(1000000 ppm)較佳為10~100000 ppm、更佳為100~20000 ppm之範圍內適當進行調整。若水之使用量多於100000 ppm,則有聚有機矽倍半氧烷之比率[T3體/T2體]或數量平均分子量不易控制在規定範圍內之傾向。The amount of water used in the hydrolysis and condensation reaction in the second stage is not particularly limited, but it is preferably 10-100,000 ppm, more preferably 100-20,000 ppm relative to the intermediate polyorganosiloxane sesquioxane (1,000,000 ppm). Adjust appropriately within the range of ppm. If the amount of water used exceeds 100,000 ppm, the ratio of polyorganosiloxane sesquioxane [T3 body/T2 body] or the number average molecular weight tends to be difficult to control within the specified range.

第2階段之水解及縮合反應中之上述水之添加方法並無特別限定,可一次性地添加所使用之水之總量(全部使用量),亦可逐次添加。逐次添加時,既可連續地添加,亦可間歇地添加。又,可直接使用第1階段之水解及縮合反應所使用之水,或者亦可使用將一部分蒸餾去除後剩餘之水。The method of adding the above-mentioned water in the hydrolysis and condensation reaction in the second stage is not particularly limited, and the total amount of the water used (the total amount used) may be added at one time, or may be added sequentially. In the case of successive addition, it may be added continuously or intermittently. Moreover, the water used for the hydrolysis and condensation reaction of the 1st stage may be used as it is, or the water remaining after a part of distillation may be used.

作為第2階段之水解及縮合反應之反應條件,重要的是選擇如本發明之聚有機矽倍半氧烷之上述比率[T3體/T2體]成為20以上500以下、數量平均分子量成為2000~50000之反應條件。第2階段之水解及縮合反應之反應溫度視所使用之觸媒而變動,並無特別限定,較佳為5~200℃,更佳為30~150℃,進而較佳為80~120℃。藉由將反應溫度控制在上述範圍內,有可將上述比率[T3體/T2體]、數量平均分子量更有效率地控制在所需範圍之傾向。又,第2階段之水解及縮合反應之反應時間並無特別限定,較佳為0.5~1000小時,更佳為1~500小時,進而較佳為5~200小時。 又,於上述反應溫度之範圍內一面進行水解及縮合反應一面適時地進行採樣,在檢測上述比率[T3體/T2體]、數量平均分子量之同時進行反應,藉此亦可獲得具有所需之比率[T3體/T2體]、數量平均分子量之本發明之聚有機矽倍半氧烷。 As the reaction conditions of the hydrolysis and condensation reaction in the second stage, it is important to select the above-mentioned ratio [T3 body/T2 body] of the polyorganosiloxane sesquioxane of the present invention to be 20 or more and 500 or less, and the number average molecular weight to be 2000 to 2000. 50,000 reaction conditions. The reaction temperature of the hydrolysis and condensation reaction in the second stage varies depending on the catalyst used, and is not particularly limited, but is preferably 5 to 200°C, more preferably 30 to 150°C, and still more preferably 80 to 120°C. By controlling the reaction temperature within the above-mentioned range, the above-mentioned ratio [T3 body/T2 body] and the number average molecular weight tend to be more efficiently controlled within the desired range. In addition, the reaction time of the hydrolysis and condensation reaction in the second stage is not particularly limited, but is preferably 0.5 to 1000 hours, more preferably 1 to 500 hours, and still more preferably 5 to 200 hours. In addition, the hydrolysis and condensation reactions are carried out in the range of the above-mentioned reaction temperature, and sampling is carried out in a timely manner, and the reaction is carried out while detecting the above-mentioned ratio [T3 body/T2 body] and the number average molecular weight. The ratio [T3 body/T2 body], the number average molecular weight of the polyorganosiloxane sesquioxane of the present invention.

第2階段之水解及縮合反應既可在常壓下進行,亦可在加壓下或減壓下進行。再者,進行第2階段之水解及縮合反應時之環境並無特別限定,例如為氮氣環境、氬氣環境等非活性氣體環境下、空氣下等氧存在下等均可,較佳為非活性氣體環境下。The hydrolysis and condensation reaction in the second stage may be carried out under normal pressure, or under increased pressure or reduced pressure. In addition, the environment in which the hydrolysis and condensation reactions of the second stage are carried out is not particularly limited, and for example, it may be in an inert gas environment such as a nitrogen atmosphere, an argon atmosphere, or in the presence of oxygen such as air, etc., preferably inert. in a gaseous environment.

藉由上述第2階段之水解及縮合反應,可獲得本發明之聚有機矽倍半氧烷。上述第2階段之水解及縮合反應結束後,較佳為進行觸媒之中和以抑制環氧基之開環等聚合性官能基之分解。又,可將本發明之聚有機矽倍半氧烷例如藉由水洗、酸洗淨、鹼洗淨、過濾、濃縮、蒸餾、萃取、晶析、再結晶、管柱層析等分離手段、或將該等組合之分離手段等進行分離純化。The polyorganosiloxane of the present invention can be obtained through the hydrolysis and condensation reaction in the second stage. After completion of the hydrolysis and condensation reaction in the second stage, it is preferable to perform catalyst neutralization to suppress decomposition of polymerizable functional groups such as ring-opening of epoxy groups. In addition, the polyorganosiloxane sesquioxane of the present invention can be separated by, for example, water washing, acid washing, alkali washing, filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, etc., or These combined separation means and the like are used for separation and purification.

本發明之聚有機矽倍半氧烷由於含有2個以上之籠型矽倍半氧烷呈直鏈狀縮合之結構之縮合矽倍半氧烷,故認為與以往之聚有機矽倍半氧烷相比,有具有優異之硬化性之傾向。因此,含有本發明之聚有機矽倍半氧烷之硬化性組成物之硬化物具有高表面硬度且耐熱性優異。又,本發明之聚有機矽倍半氧烷於有機溶劑等溶劑中之溶解性優異。「2個以上之籠型矽倍半氧烷呈直鏈狀縮合」意指2個以上之上述組成式(1)、組成式(2)、組成式(3)、及/或組成式(4)所表示之籠型矽倍半氧烷串聯縮合而非三維縮合,結果形成直鏈狀之縮合物。又,即便於本發明之聚有機矽倍半氧烷包含如上述組成式(5)、組成式(6)所示具有3個-OR c所表示之羥基的籠型矽倍半氧烷之情形時,當其中之2個縮合時,相當於「2個以上之籠型矽倍半氧烷呈直鏈狀縮合」。再者,上述機制只不過為推定,不應解釋為本案發明被限定於該等機制。 Since the polyorganosiloxane of the present invention contains a condensed silsesquioxane in which two or more clathrate silsesquioxanes are condensed in a straight chain, it is considered to be different from the conventional polyorganosiloxane silsesquioxane. In contrast, there is a tendency to have excellent hardening properties. Therefore, the cured product of the curable composition containing the polyorganosiloxane sesquioxane of the present invention has high surface hardness and excellent heat resistance. Furthermore, the polyorganosiloxane sesquioxane of the present invention is excellent in solubility in solvents such as organic solvents. "Two or more clathrate silsesquioxanes are linearly condensed" means two or more of the above compositional formula (1), compositional formula (2), compositional formula (3), and/or compositional formula (4) ) represented by the cage-type silsesquioxane condensed in series rather than three-dimensional condensation, resulting in the formation of linear condensate. Also, even if the polyorganosiloxane of the present invention includes a cage silsesquioxane having three hydroxyl groups represented by -OR c as shown in the above-mentioned compositional formulas (5) and (6) When two of them are condensed, it is equivalent to "two or more cage-type silsesquioxanes are condensed in a straight chain". Furthermore, the above-mentioned mechanisms are merely presumptions and should not be construed as being limited to these mechanisms.

[硬化性組成物] 本發明之硬化性組成物為含有上述本發明之聚有機矽倍半氧烷作為必需成分之硬化性組成物(硬化性樹脂組成物)。如下所述,本發明之硬化性組成物亦可進而含有硬化觸媒(例如光陽離子聚合起始劑、自由基聚合性起始劑)或表面調整劑或者表面改質劑、聚合穩定劑、矽烷偶合劑等其他成分。本發明之硬化性組成物可視其用途,用作硬塗層形成用硬化性組成物或接著劑用硬化性組成物(例如積層半導體用硬化性組成物)。於本發明之硬化性組成物中,本發明之聚有機矽倍半氧烷既可單獨使用1種,亦可組合2種以上使用。 [hardenable composition] The curable composition of the present invention is a curable composition (curable resin composition) containing the above-described polyorganosilosilsesquioxane of the present invention as an essential component. As described below, the curable composition of the present invention may further contain a curing catalyst (for example, a photocationic polymerization initiator, a radical polymerization initiator), a surface conditioner or a surface modifier, a polymerization stabilizer, a silane Couplers and other ingredients. The curable composition of the present invention can be used as a curable composition for forming a hard coat layer or a curable composition for an adhesive (eg, a curable composition for laminated semiconductors), depending on the application. In the curable composition of the present invention, the polyorganosiloxane sesquioxane of the present invention may be used alone or in combination of two or more.

本發明之硬化性組成物中之本發明之聚有機矽倍半氧烷之含量(摻合量)並無特別限定,相對於溶劑除外之硬化性組成物之總量(100重量%),較佳為70重量%以上且未達100重量%,更佳為80~99.8重量%,進而較佳為90~99.5重量%。藉由將本發明之聚有機矽倍半氧烷之含量設為70重量%以上,有硬化物之表面硬度或接著性進一步提昇之傾向。另一方面,藉由將本發明之聚有機矽倍半氧烷之含量設為未達100重量%,可含有硬化觸媒,藉此有能夠更有效率地進行硬化性組成物之硬化之傾向。The content (compounding amount) of the polyorganosiloxane of the present invention in the curable composition of the present invention is not particularly limited, and it is more than the total amount (100% by weight) of the curable composition excluding the solvent. Preferably it is 70 weight% or more and less than 100 weight%, More preferably, it is 80 to 99.8 weight%, More preferably, it is 90 to 99.5 weight%. By setting the content of the polyorganosiloxane sesquioxane of the present invention to 70% by weight or more, the surface hardness or adhesiveness of the cured product tends to be further improved. On the other hand, by setting the content of the polyorganosiloxane sesquioxane of the present invention to be less than 100% by weight, a curing catalyst can be contained, whereby the curing of the curable composition tends to be more efficient. .

相對於本發明之硬化性組成物中含有之陽離子硬化性化合物或自由基硬化性化合物之總量(100重量%),本發明之聚有機矽倍半氧烷之比率並無特別限定,較佳為70~100重量%,更佳為75~98重量%,進而較佳為80~95重量%。藉由將本發明之聚有機矽倍半氧烷之含量設為70重量%以上,有硬化物之表面硬度或接著性進一步提昇之傾向。The ratio of the polyorganosiloxane sesquioxane of the present invention is not particularly limited with respect to the total amount (100% by weight) of the cationic curable compound or radical curable compound contained in the curable composition of the present invention, and is preferably It is 70-100 weight%, More preferably, it is 75-98 weight%, More preferably, it is 80-95 weight%. By setting the content of the polyorganosiloxane sesquioxane of the present invention to 70% by weight or more, the surface hardness or adhesiveness of the cured product tends to be further improved.

本發明之硬化性組成物較佳為進而含有硬化觸媒。其中,基於能夠進一步縮短直至不黏著為止之硬化時間之方面,較佳為含有光或熱聚合起始劑作為硬化觸媒,更佳為含有陽離子聚合起始劑或自由基聚合起始劑。再者,本發明之硬化性組成物中,硬化觸媒既可單獨使用1種,亦可組合2種以上使用。The curable composition of the present invention preferably further contains a curing catalyst. Among them, it is preferable to contain a photo- or thermal polymerization initiator as a hardening catalyst, and it is more preferable to contain a cationic polymerization initiator or a radical polymerization initiator from the viewpoint of being able to further shorten the curing time until it does not stick. In addition, in the curable composition of this invention, a hardening catalyst may be used individually by 1 type, and may be used in combination of 2 or more types.

上述陽離子聚合起始劑為能夠使本發明之聚有機矽倍半氧烷等陽離子硬化性化合物之陽離子聚合反應開始或促進之化合物。上述陽離子聚合起始劑並無特別限定,例如可列舉光陽離子聚合起始劑(光酸產生劑)、熱陽離子聚合起始劑(熱酸產生劑)等。The above-mentioned cationic polymerization initiator is a compound capable of initiating or accelerating the cationic polymerization reaction of the cationic curable compound such as the polyorganosiloxane sesquioxane of the present invention. Although the said cationic polymerization initiator is not specifically limited, For example, a photocationic polymerization initiator (photoacid generator), a thermal cationic polymerization initiator (thermal acid generator), etc. are mentioned.

作為上述光陽離子聚合起始劑,可使用公知或慣用之光陽離子聚合起始劑,例如可列舉:鋶鹽(鋶離子與陰離子之鹽)、錪鹽(錪離子與陰離子之鹽)、硒鹽(硒離子與陰離子之鹽)、銨鹽(銨離子與陰離子之鹽)、鏻鹽(鏻離子與陰離子之鹽)、過渡金屬錯合物離子與陰離子之鹽等。該等可單獨使用或組合2種以上使用。As the above-mentioned photocationic polymerization initiator, known or conventional photocationic polymerization initiators can be used, and examples thereof include perium salts (salts of perionium ions and anions), iodonium salts (salts of iodonium ions and anions), selenium salts (salt of selenium ion and anion), ammonium salt (salt of ammonium ion and anion), phosphonium salt (salt of phosphonium ion and anion), transition metal complex ion and salt of anion, etc. These can be used individually or in combination of 2 or more types.

作為上述鋶鹽,例如可列舉:[4-(4-聯苯基硫基)苯基]-4-聯苯基苯基鋶三(五氟乙基)三氟磷酸鹽、三苯基鋶鹽、三對甲苯鋶鹽、三鄰甲苯鋶鹽、三(4-甲氧基苯基)鋶鹽、1-萘基二苯基鋶鹽、2-萘基二苯基鋶鹽、三(4-氟苯基)鋶鹽、三-1-萘基鋶鹽、三-2-萘基鋶鹽、三(4-羥基苯基)鋶鹽、二苯基[4-(苯硫基)苯基]鋶鹽、4-(對甲苯硫基)苯基二(對苯基)鋶鹽等三芳基鋶鹽;二苯基苯甲醯甲基鋶鹽、二苯基4-硝基苯甲醯甲基鋶鹽、二苯基苄基鋶鹽、二苯基甲基鋶鹽等二芳基鋶鹽;苯基甲基苄基鋶鹽、4-羥基苯基甲基苄基鋶鹽、4-甲氧基苯基甲基苄基鋶鹽等單芳基鋶鹽;二甲基苯甲醯甲基鋶鹽、苯甲醯甲基四氫噻吩鎓鹽(phenacyl tetrahydro thiophenium salt)、二甲基苄基鋶鹽等三烷基鋶鹽等。Examples of the above-mentioned perylium salts include [4-(4-biphenylthio)phenyl]-4-biphenylphenyl perylium tris(pentafluoroethyl)trifluorophosphate, and triphenyl perylium salts. , Tri-p-Toluene salt, Tri-o-Toluene salt, Tris (4-methoxyphenyl) Peri salt, 1-naphthyl diphenyl periyl salt, 2-naphthyl diphenyl periyl salt, Tris (4- Fluorophenyl) pericolium salt, tris-1-naphthyl pericanium salt, tris-2-naphthyl pericynium salt, tris(4-hydroxyphenyl) pericolium salt, diphenyl[4-(phenylthio)phenyl] Perylium salts, 4-(p-tolylthio) phenyl di(p-phenyl) pericynium salts and other triaryl pericynium salts; diphenylbenzyl methyl perylate, diphenyl 4-nitrobenzyl methyl Perylium salts, diphenylbenzyl periconium salts, diphenylmethyl perylium salts, and other diaryl periconium salts; Monoaryl periconium salts such as phenylmethylbenzyl perionium salt; dimethylbenzyl methyl perionium salt, benzyl methyl tetrahydrothiophenium salt (phenacyl tetrahydro thiophenium salt), dimethylbenzyl perionium salt Salts and other trialkyl perionate salts, etc.

作為上述二苯基[4-(苯硫基)苯基]鋶鹽,例如可使用二苯基[4-(苯硫基)苯基]鋶六氟銻酸鹽、二苯基[4-(苯硫基)苯基]鋶六氟磷酸鹽等。As the above-mentioned diphenyl[4-(phenylthio)phenyl]perylium salt, for example, diphenyl[4-(phenylthio)phenyl]perylium hexafluoroantimonate, diphenyl[4-( Phenylthio) phenyl] perilinium hexafluorophosphate and the like.

作為上述錪鹽,例如可列舉:商品名「UV9380C」(邁圖高新材料日本有限公司製造,雙(4-十二烷基苯基)錪=六氟銻酸鹽45%烷基環氧丙基醚溶液)、商品名「RHODORSIL PHOTOINITIATOR 2074」(Rhodia Japan(股)製造,四(五氟苯基)硼酸鹽=[(1-甲基乙基)苯基](甲基苯基)錪)、商品名「WPI-124」(和光純藥工業(股)公司製造)、二苯基錪鹽、二對甲苯錪鹽、雙(4-十二烷基苯基)錪鹽、雙(4-甲氧基苯基)錪鹽等。Examples of the above-mentioned iodonium salt include: trade name "UV9380C" (manufactured by Momentive High-Tech Materials Japan Co., Ltd., bis(4-dodecylphenyl) iodonium=hexafluoroantimonate 45% alkylglycidyl ether solution), trade name "RHODORSIL PHOTOINITIATOR 2074" (manufactured by Rhodia Japan Co., Ltd., tetrakis(pentafluorophenyl)borate=[(1-methylethyl)phenyl](methylphenyl)idium), Trade name "WPI-124" (manufactured by Wako Pure Chemical Industries, Ltd.), diphenyl iodonium salt, di-p-toluene iodonium salt, bis(4-dodecylphenyl) iodonium salt, bis(4-methyl) oxyphenyl) iodonium salt, etc.

作為上述硒鹽,例如可列舉:三苯基硒鹽、三對甲苯硒鹽、三鄰甲苯硒鹽、三(4-甲氧基苯基)硒鹽、1-萘基二苯基硒鹽等三芳基硒鹽;二苯基苯甲醯甲基硒鹽、二苯基苄基硒鹽、二苯基甲基硒鹽等二芳基硒鹽;苯基甲基苄基硒鹽等單芳基硒鹽;二甲基苯甲醯甲基硒鹽等三烷基硒鹽等。Examples of the selenium salt include triphenylselenide, tri-p-tolueneselenide, tri-o-tolueneselenide, tris(4-methoxyphenyl)selenide, 1-naphthyldiphenylselenide, and the like. Triaryl selenide; diaryl selenide such as diphenylbenzyl selenide, diphenylbenzyl selenide, diphenylmethyl selenide; monoaryl such as phenylmethyl benzyl selenide Selenium salts; trialkyl selenium salts such as dimethylbenzyl methyl selenium salt, etc.

作為上述銨鹽,例如可列舉:四甲基銨鹽、乙基三甲基銨鹽、二乙基二甲基銨鹽、三乙基甲基銨鹽、四乙基銨鹽、三甲基正丙基銨鹽、三甲基正丁基銨鹽等四烷基銨鹽;N,N-二甲基吡咯啶鎓鹽、N-乙基-N-甲基吡咯啶鎓鹽等吡咯啶鎓鹽(pyrrolidinium salt);N,N'-二甲基咪唑啉鎓鹽、N,N'-二乙基咪唑啉鎓鹽等咪唑啉鎓鹽(imidazolinium salt);N,N'-二甲基四氫嘧啶鎓鹽、N,N'-二乙基四氫嘧啶鎓鹽等四氫嘧啶鎓鹽(tetrahydro pyrimidinium salt);N,N-二甲基

Figure 110131229-A0304-12-0020-6
啉鎓鹽、N,N-二乙基
Figure 110131229-A0304-12-0020-6
啉鎓鹽等
Figure 110131229-A0304-12-0020-6
啉鎓鹽(morpholinium salt);N,N-二甲基哌啶鎓鹽、N,N-二乙基哌啶鎓鹽等哌啶鎓鹽(piperidinium salt);N-甲基吡啶鎓鹽、N-乙基吡啶鎓鹽等吡啶鎓鹽(pyridinium salt);N,N'-二甲基咪唑鎓鹽等咪唑鎓鹽(imidazolium salt);N-甲基喹啉鎓鹽等喹啉鎓鹽(quinolium salt);N-甲基異喹啉鎓鹽等異喹啉鎓鹽;苄基苯并噻唑鎓鹽等噻唑鎓鹽(thiazonium salt);苄基吖啶鎓鹽等吖啶鎓鹽(acridinium)等。As said ammonium salt, tetramethyl ammonium salt, ethyl trimethyl ammonium salt, diethyl dimethyl ammonium salt, triethyl methyl ammonium salt, tetraethyl ammonium salt, trimethyl ammonium salt, trimethyl ammonium salt, for example Tetraalkylammonium salts such as propylammonium salt, trimethyl-n-butylammonium salt; N,N-dimethylpyrrolidinium salt, N-ethyl-N-methylpyrrolidinium salt and other pyrrolidinium salts (pyrrolidinium salt); N,N'-dimethylimidazolinium salt, N,N'-diethylimidazolinium salt and other imidazolinium salts (imidazolinium salt); N,N'-dimethyl tetrahydro Pyrimidinium salts, N,N'-diethyltetrahydropyrimidinium salts and other tetrahydropyrimidinium salts (tetrahydro pyrimidinium salt); N,N-dimethyl
Figure 110131229-A0304-12-0020-6
Linonium salt, N,N-diethyl
Figure 110131229-A0304-12-0020-6
phosphonium salts, etc.
Figure 110131229-A0304-12-0020-6
Morpholinium salts (morpholinium salts); N,N-dimethylpiperidinium salts, N,N-diethylpiperidinium salts and other piperidinium salts (piperidinium salts); N-methylpyridinium salts, N-methylpyridinium salts -Pyridinium salts such as ethylpyridinium salts (pyridinium salts); N,N'-dimethylimidazolium salts and other imidazolium salts (imidazolium salts); salt); isoquinolinium salts such as N-methyl isoquinolinium salts; thiazonium salts such as benzyl benzothiazolium salts (thiazonium salts); benzyl acridinium salts and other acridinium salts (acridinium), etc. .

作為上述鏻鹽,例如可列舉:四苯基鏻鹽、四對甲苯鏻鹽、四(2-甲氧基苯基)鏻鹽等四芳基鏻鹽;三苯基苄基鏻鹽等三芳基鏻鹽;三乙基苄鏻鹽、三丁基苄鏻鹽、四乙基鏻鹽、四丁基鏻鹽、三乙基苯甲醯甲基鏻鹽等四烷基鏻鹽等。Examples of the phosphonium salts include tetraarylphosphonium salts such as tetraphenylphosphonium salts, tetra-p-toluenephosphonium salts, and tetrakis(2-methoxyphenyl)phosphonium salts; and triarylphosphonium salts such as triphenylbenzylphosphonium salts. Phosphonium salts; tetraalkylphosphonium salts such as triethylbenzylphosphonium salt, tributylbenzylphosphonium salt, tetraethylphosphonium salt, tetrabutylphosphonium salt, triethylbenzylmethylphosphonium salt, etc.

作為上述過渡金屬錯合物離子之鹽,例如可列舉:(η5-環戊二烯基)(η6-甲苯)Cr +、(η5-環戊二烯基)(η6-二甲苯)Cr +等鉻錯合物陽離子之鹽;(η5-環戊二烯基)(η6-甲苯)Fe +、(η5-環戊二烯基)(η6-二甲苯)Fe +等鐵錯合物陽離子之鹽等。 Examples of the salts of the transition metal complex ions include (η5-cyclopentadienyl)(η6-toluene)Cr + , (η5-cyclopentadienyl)(η6-xylene)Cr + and the like Salts of chromium complex cations; salts of iron complex cations such as (η5-cyclopentadienyl) (η6-toluene) Fe + , (η5-cyclopentadienyl) (η6-xylene) Fe + Wait.

作為構成上述鹽之陰離子,例如可列舉:SbF 6 -、PF 6 -、BF 4 -、(CF 3CF 2) 3PF 3 -、(CF 3CF 2CF 2) 3PF 3 -、(C 6F 5) 4B -、(C 6F 5) 4Ga -、磺酸根陰離子(三氟甲磺酸根陰離子、五氟乙磺酸根陰離子、九氟丁磺酸根陰離子、甲磺酸根陰離子、苯磺酸根陰離子、對甲苯磺酸根陰離子等)、(CF 3SO 2) 3C -、(CF 3SO 2) 2N -、過鹵酸根離子、鹵化磺酸根離子、硫酸根離子、碳酸根離子、鋁酸根離子、六氟鉍酸根離子、羧酸根離子、芳基硼酸根離子、硫氰酸根離子、硝酸根離子等。 Examples of anions constituting the above salts include SbF 6 - , PF 6 - , BF 4 - , (CF 3 CF 2 ) 3 PF 3 - , (CF 3 CF 2 CF 2 ) 3 PF 3 - , (C 6 ). F 5 ) 4 B - , (C 6 F 5 ) 4 Ga - , sulfonate anion (trifluoromethanesulfonate anion, pentafluoroethanesulfonate anion, nonafluorobutanesulfonate anion, mesylate anion, benzenesulfonate anion anion, p-toluenesulfonate anion, etc.), (CF 3 SO 2 ) 3 C - , (CF 3 SO 2 ) 2 N - , perhalogenate ion, halogenated sulfonate ion, sulfate ion, carbonate ion, aluminate ion ion, hexafluorobismuthate ion, carboxylate ion, arylborate ion, thiocyanate ion, nitrate ion, etc.

作為上述熱陽離子聚合起始劑,例如可列舉:芳基鋶鹽、芳基錪鹽、芳烴-離子錯合物、四級銨鹽、鋁螯合物、三氟化硼胺錯合物等。Examples of the thermal cationic polymerization initiator include aryl perionium salts, aryl iodonium salts, aromatic hydrocarbon-ion complexes, quaternary ammonium salts, aluminum chelates, boron trifluoride amine complexes, and the like.

作為上述芳基鋶鹽,例如可列舉六氟銻酸鹽等。於本發明之硬化性組成物中,例如可使用:商品名「SP-66」、「SP-77」(以上由ADEKA(股)製造);商品名「San-Aid SI-60L」、「San-Aid SI-80L」、「San-Aid SI-100L」、「San-Aid SI-150L」(以上由三新化學工業(股)公司製造)等市售品。作為上述鋁螯合物,例如可列舉:乙醯乙酸乙基鋁二異丙酯、三(乙醯乙酸乙酯)合鋁(Tris(ethyl acetoacetato)aluminum)等。又,作為上述三氟化硼胺錯合物,例如可列舉:三氟化硼單乙基胺錯合物、三氟化硼咪唑錯合物、三氟化硼哌啶錯合物等。As said aryl perionium salt, hexafluoroantimonate etc. are mentioned, for example. In the curable composition of the present invention, for example, trade names "SP-66" and "SP-77" (the above are manufactured by ADEKA Corporation); trade names "San-Aid SI-60L", "San-Aid SI-60L", "San-Aid SI-60L" -Aid SI-80L", "San-Aid SI-100L", "San-Aid SI-150L" (the above are manufactured by Sanxin Chemical Industry Co., Ltd.) and other commercial products. As said aluminum chelate compound, ethyl aluminum diisopropyl acetoacetate, Tris (ethyl acetoacetato) aluminum, etc. are mentioned, for example. Moreover, as said boron trifluoride amine complex, a boron trifluoride monoethylamine complex, a boron trifluoride imidazole complex, a boron trifluoride piperidine complex, etc. are mentioned, for example.

上述自由基聚合起始劑為能夠使本發明之聚有機矽倍半氧烷等之自由基硬化性化合物之自由基聚合反應開始或促進之化合物。作為上述自由基聚合起始劑,例如可列舉光自由基聚合起始劑、熱自由基聚合起始劑等。The above-mentioned radical polymerization initiator is a compound capable of initiating or accelerating the radical polymerization reaction of radically curable compounds such as polyorganosiloxane of the present invention. As said radical polymerization initiator, a photo radical polymerization initiator, a thermal radical polymerization initiator, etc. are mentioned, for example.

作為上述光自由基聚合起始劑,例如可列舉:二苯甲酮、苯乙酮二苯乙二酮、二苯乙二酮二甲基酮、安息香、安息香甲醚、安息香乙醚、安息香異丙醚、二甲氧基苯乙酮、二甲氧基苯基苯乙酮、二乙氧基苯乙酮、二苯基二硫醚、鄰苯甲醯苯甲酸甲酯、4-二甲基胺基苯甲酸乙酯(日本化藥(股)製造,商品名「kayacure EPA」等)、2,4-二乙基-9-氧硫𠮿

Figure 110131229-0000-3
(日本化藥(股)製造,商品名「kayacure DETX」等)、2-甲基-1-[4-(甲基)苯基]-2-
Figure 110131229-A0304-12-0020-6
啉基丙酮-1(Ciba-Geigy(股)製造,商品名「Irgacure 907」等)、1-羥基環己基苯基酮(Ciba-Geigy(股)製造,商品名「Irgacure 184」等)、2-二甲基胺基-2-(4-
Figure 110131229-A0304-12-0020-6
啉基)苯甲醯基-1-苯基丙烷等之2-胺基-2-苯甲醯基-1-苯基烷烴化合物、四(第三丁基過氧基羰基)二苯甲酮、二苯乙二酮、2-羥基-2-甲基-1-苯基-丙烷-1-酮、4,4-雙二乙基胺基二苯甲酮等胺基苯衍生物、2,2'-雙(2-氯苯基)-4,5,4',5'-四苯基-1,2'-聯咪唑(保土谷化學(股)製造,商品名「B-CIM」等)等咪唑化合物、2,6-雙(三氯甲基)-4-(4-甲氧基萘-1-基)-1,3,5-三
Figure 110131229-A0304-12-0000-4
等鹵甲基化三
Figure 110131229-A0304-12-0000-4
化合物、2-三氯甲基-5-(2-苯并呋喃-2-基-乙烯基)-1,3,4-
Figure 110131229-A0304-12-0059-1
二唑等鹵甲基
Figure 110131229-A0304-12-0059-1
二唑化合物等。又,視需要可添加光敏劑。Examples of the photoradical polymerization initiator include benzophenone, acetophenone diacetophenone, benzoin dimethyl ketone, benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl Ether, dimethoxyacetophenone, dimethoxyphenylacetophenone, diethoxyacetophenone, diphenyldisulfide, methyl o-benzoic acid benzoate, 4-dimethylamine Ethyl benzoate (manufactured by Nippon Kayaku Co., Ltd., trade name "kayacure EPA", etc.), 2,4-diethyl-9-oxothioate
Figure 110131229-0000-3
(manufactured by Nippon Kayaku Co., Ltd., trade name "kayacure DETX", etc.), 2-methyl-1-[4-(methyl)phenyl]-2-
Figure 110131229-A0304-12-0020-6
Linoacetone-1 (manufactured by Ciba-Geigy Co., Ltd., trade name "Irgacure 907", etc.), 1-hydroxycyclohexyl phenyl ketone (manufactured by Ciba-Geigy Co., Ltd., trade name "Irgacure 184", etc.), 2 -Dimethylamino-2-(4-
Figure 110131229-A0304-12-0020-6
2-Amino-2-benzyl-1-phenyl alkane compounds such as olinyl)benzyl-1-phenylpropane, tetrakis(tert-butylperoxycarbonyl)benzophenone, Aminobenzene derivatives such as benzophenone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 4,4-bisdiethylaminobenzophenone, 2,2 '-Bis(2-chlorophenyl)-4,5,4',5'-tetraphenyl-1,2'-biimidazole (manufactured by Hodogaya Chemical Co., Ltd., trade name "B-CIM", etc.) Isoimidazole compound, 2,6-bis(trichloromethyl)-4-(4-methoxynaphthalen-1-yl)-1,3,5-tris
Figure 110131229-A0304-12-0000-4
isohalomethylated tris
Figure 110131229-A0304-12-0000-4
Compound, 2-trichloromethyl-5-(2-benzofuran-2-yl-vinyl)-1,3,4-
Figure 110131229-A0304-12-0059-1
Halomethyl such as oxadiazole
Figure 110131229-A0304-12-0059-1
oxadiazole compounds, etc. Moreover, a photosensitizer may be added as needed.

作為熱自由基聚合起始劑,例如可列舉:氫過氧化物、二烷基過氧化物、過氧酯、二醯基過氧化物、過氧化二碳酸酯、過氧縮酮、酮過氧化物等(具體而言,為苯甲醯基過氧化物、過氧化(-2-乙基己酸)第三丁酯、2,5-二甲基-2,5-二(2-乙基己醯基)過氧己烷、過氧化苯甲酸第三丁酯、第三丁基過氧化物、異丙苯氫過氧化物、雙異苯丙基過氧化物、二第三丁基過氧化物、2,5-二甲基-2,5-二丁基過氧己烷、2,4-二氯苯甲醯基過氧化物、1,4-二(2-第三丁基過氧基異丙基)苯、1,1-雙(第三丁基過氧基)-3,3,5-三甲基環己烷、甲基乙基酮過氧化物、過氧化(2-乙基己酸)-1,1,3,3-四甲基丁酯等)等有機過氧化物類。Examples of thermal radical polymerization initiators include hydroperoxides, dialkyl peroxides, peroxyesters, diacyl peroxides, peroxydicarbonates, peroxyketals, and ketone peroxides. (specifically, benzalkonium peroxide, (-2-ethylhexanoic acid) tert-butyl peroxide, 2,5-dimethyl-2,5-bis(2-ethyl) Hexyl) peroxyhexane, tert-butyl peroxybenzoate, tert-butyl peroxide, cumene hydroperoxide, bisisophenylpropyl peroxide, di-tert-butyl peroxide compound, 2,5-dimethyl-2,5-dibutylperoxyhexane, 2,4-dichlorobenzyl peroxide, 1,4-bis(2-tert-butylperoxy isopropyl)benzene, 1,1-bis(tert-butylperoxy)-3,3,5-trimethylcyclohexane, methyl ethyl ketone peroxide, (2-ethyl peroxide) hexanoic acid)-1,1,3,3-tetramethylbutyl ester, etc.) and other organic peroxides.

關於本發明之硬化性組成物中之上述硬化觸媒之含量(摻合量),相對於本發明之聚有機矽倍半氧烷及下述其他陽離子硬化性化合物之總量100重量份,較佳為0.01~3.0重量份,更佳為0.05~3.0重量份,進而較佳為0.1~1.0重量份(例如為0.3~1.0重量份)。藉由將硬化觸媒之含量設為0.01重量份以上,可使硬化反應有效率且充分地進行,有硬化物之表面硬度或接著性進一步提昇之傾向。另一方面,藉由將硬化觸媒之含量設為3.0重量份以下,有硬化性組成物之保存性進一步提昇,或抑制硬化物之著色之傾向。The content (compounding amount) of the above-mentioned hardening catalyst in the curable composition of the present invention is 100 parts by weight in total with respect to the polyorganosiloxane sesquioxane of the present invention and the following other cationic curable compounds. Preferably it is 0.01-3.0 weight part, More preferably, it is 0.05-3.0 weight part, More preferably, it is 0.1-1.0 weight part (for example, 0.3-1.0 weight part). By setting the content of the hardening catalyst to be 0.01 part by weight or more, the hardening reaction can be efficiently and sufficiently advanced, and the surface hardness and adhesiveness of the hardened product tend to be further improved. On the other hand, by setting the content of the hardening catalyst to be 3.0 parts by weight or less, the preservability of the curable composition is further improved, or the coloring of the hardened material tends to be suppressed.

本發明之硬化性組成物亦可進而含有本發明之聚有機矽倍半氧烷以外之陽離子硬化性化合物(有時稱為「其他陽離子硬化性化合物」)及/或本發明之聚有機矽倍半氧烷以外之自由基硬化性化合物(有時稱為「其他自由基硬化性化合物」)。作為其他陽離子硬化性化合物,可使用公知或慣用之陽離子硬化性化合物,可列舉:本發明之聚有機矽倍半氧烷以外之環氧化合物、氧環丁烷化合物、乙烯醚化合物等。再者,於本發明之硬化性組成物中,其他陽離子硬化性化合物既可單獨使用1種,亦可組合2種以上。The curable composition of the present invention may further contain cationic curable compounds other than the polyorganosiloxane of the present invention (sometimes referred to as "other cationic curable compounds") and/or the polyorganosiloxane of the present invention Radical hardening compounds other than hemioxanes (sometimes referred to as "other free radical hardening compounds"). As other cationic curable compounds, well-known or conventional cationic curable compounds can be used, and examples thereof include epoxy compounds, oxetane compounds, vinyl ether compounds, and the like other than the polyorganosiloxane of the present invention. Furthermore, in the curable composition of the present invention, other cationic curable compounds may be used alone or in combination of two or more.

作為上述環氧化合物,可使用分子內具有1個以上之環氧基(環氧乙烷環)之公知或慣用之化合物,並無特別限定,例如可列舉脂環式環氧化合物(脂環式環氧樹脂)、芳香族環氧化合物(芳香族環氧樹脂)、脂肪族環氧化合物(脂肪族環氧樹脂)等。As the epoxy compound, well-known or conventional compounds having one or more epoxy groups (ethylene oxide ring) in the molecule can be used, and are not particularly limited, and examples thereof include alicyclic epoxy compounds (alicyclic epoxy compounds). epoxy resin), aromatic epoxy compound (aromatic epoxy resin), aliphatic epoxy compound (aliphatic epoxy resin), etc.

作為上述脂環式環氧化合物,可列舉分子內具有1個以上脂環與1個以上環氧基之公知或慣用之化合物,並無特別限定,例如可列舉:(1)分子內具有構成脂環之鄰接之2個碳原子與氧原子所構成之環氧基(稱為「脂環環氧基」)之化合物;(2)脂環上以單鍵直接鍵結有環氧基之化合物;(3)分子內具有脂環及環氧丙基醚基之化合物(環氧丙基醚型環氧化合物)等。The above-mentioned alicyclic epoxy compound includes known or customary compounds having one or more alicyclic rings and one or more epoxy groups in the molecule, and is not particularly limited. For example, (1) having a constituent lipid in the molecule Compounds with epoxy groups (called "alicyclic epoxy groups") formed by two adjacent carbon atoms and oxygen atoms adjacent to the ring; (2) compounds with epoxy groups directly bonded to the alicyclic ring with a single bond; (3) Compounds having alicyclic and glycidyl ether groups in the molecule (glycidyl ether type epoxy compounds) and the like.

作為上述(1)分子內具有脂環環氧基之化合物,可列舉下述式(i)所表示之化合物。

Figure 02_image063
As a compound which has an alicyclic epoxy group in said (1) molecule|numerator, the compound represented by following formula (i) is mentioned.
Figure 02_image063

上述式(i)中,Y表示單鍵或連結基(具有1個以上之原子之二價基)。作為上述連結基,例如可列舉:二價烴基、碳-碳雙鍵之一部分或全部經環氧化之伸烯基(alkenylene group)、羰基、醚鍵、酯鍵、碳酸酯基、醯胺基、該等連結複數個而成之基等。In the above formula (i), Y represents a single bond or a linking group (a divalent group having one or more atoms). Examples of the above-mentioned linking group include a divalent hydrocarbon group, an alkenylene group in which a part or all of a carbon-carbon double bond is epoxidized, a carbonyl group, an ether bond, an ester bond, a carbonate group, an amide group, The basis etc. which are formed by connecting a plurality of these.

作為上述二價烴基,可列舉碳數1~18之直鏈或支鏈狀之伸烷基、二價之脂環式烴基等。作為碳數1~18之直鏈或支鏈狀之伸烷基,例如可列舉:亞甲基、甲基亞甲基、二甲基亞甲基、伸乙基、伸丙基、三亞甲基等。作為上述二價之脂環式烴基,例如可列舉:1,2-伸環戊基、1,3-伸環戊基、亞環戊基、1,2-伸環己基、1,3-伸環己基、1,4-伸環己基、亞環己基等二價之伸環烷基(包括亞環烷基)等。As said divalent hydrocarbon group, a C1-C18 linear or branched alkylene group, a divalent alicyclic hydrocarbon group, etc. are mentioned. Examples of linear or branched alkylene groups having 1 to 18 carbon atoms include methylene, methylmethylene, dimethylmethylene, ethylidene, propylidene, and trimethylene. Wait. Examples of the above-mentioned divalent alicyclic hydrocarbon group include 1,2-cyclopentylene, 1,3-cyclopentylene, cyclopentylene, 1,2-cyclohexylene, 1,3-cyclopentylene Cyclohexyl, 1,4-cyclohexylene, cyclohexylene and other divalent cycloalkylene groups (including cycloalkylene), etc.

作為上述碳-碳雙鍵之一部分或全部經環氧化之伸烯基(有時稱為「環氧化伸烯基」)中之伸烯基,例如可列舉:伸乙烯基、伸丙烯基、1-伸丁烯基、2-伸丁烯基、伸丁二烯基、伸戊烯基、伸己烯基、伸庚烯基、伸辛烯基等碳數2~8之直鏈或支鏈狀之伸烯基等。作為上述環氧化伸烯基,較佳為碳-碳雙鍵全部經環氧化之伸烯基,更佳為碳-碳雙鍵全部經環氧化之碳數2~4之伸烯基。Examples of alkenylene groups in alkenylene groups in which a part or the whole of the carbon-carbon double bond is epoxidized (sometimes referred to as "epoxidized alkenylene groups") include vinylidene groups, propenylene groups, 1 -Butenylene, 2-butenyl, butadienyl, pentenyl, hexenyl, heptenyl, octenyl and other straight or branched chains with 2 to 8 carbon atoms Alkenyl and so on. The epoxidized alkenylene group is preferably an alkenylene group in which all carbon-carbon double bonds are epoxidized, and more preferably an alkenylene group with 2 to 4 carbon atoms in which all carbon-carbon double bonds are epoxidized.

作為上述式(i)所表示之脂環式環氧化合物之代表例,可列舉(3,4,3',4'-二環氧基)聯環己烷、下述式(i-1)~(i-10)所表示之化合物等。再者,下述式(i-5)、(i-7)中之l、m分別表示1~30之整數。下述式(i-5)中,R'為碳數1~8之伸烷基,其中,較佳為亞甲基、伸乙基、伸丙基、伸異丙基等碳數1~3之直鏈或支鏈狀之伸烷基。下述式(i-9)、(i-10)中之n1~n6分別表示1~30之整數。又,作為上述式(i)所表示之脂環式環氧化合物,此外還可列舉例如2,2-雙(3,4-環氧環己基)丙烷、1,2-雙(3,4-環氧環己基)乙烷、2,3-雙(3,4-環氧環己基)環氧乙烷、雙(3,4-環氧環己基甲基)醚等。

Figure 02_image065
Figure 02_image067
Typical examples of the alicyclic epoxy compound represented by the above formula (i) include (3,4,3',4'-diepoxy)bicyclohexane and the following formula (i-1) The compounds represented by ~(i-10), etc. In addition, l and m in following formula (i-5) and (i-7) each represent the integer of 1-30. In the following formula (i-5), R' is an alkylene group having 1 to 8 carbon atoms, and among them, preferably a methylene group, an ethylidene group, a propylidene group, an isopropylidene group and the like having 1 to 3 carbon atoms straight-chain or branched-chain alkylene. In the following formulae (i-9) and (i-10), n1 to n6 each represent an integer of 1 to 30. Moreover, as an alicyclic epoxy compound represented by the said formula (i), for example, 2,2-bis(3,4-epoxycyclohexyl)propane, 1,2-bis(3,4- Epoxycyclohexyl)ethane, 2,3-bis(3,4-epoxycyclohexyl)ethylene oxide, bis(3,4-epoxycyclohexylmethyl)ether, etc.
Figure 02_image065
Figure 02_image067

作為上述(2)脂環上以單鍵直接鍵結有環氧基之化合物,例如可列舉下述式(ii)所表示之化合物等。

Figure 02_image069
Examples of the compound in which an epoxy group is directly bonded by a single bond to the alicyclic ring (2) include compounds represented by the following formula (ii).
Figure 02_image069

式(ii)中,R''為自p元醇之結構式去除p個羥基(-OH)而得之基(p價之有機基),p、n分別表示自然數。作為p元醇[R''(OH) p],可列舉2,2-雙(羥基甲基)-1-丁醇等多元醇(碳數1~15之醇等)等。p較佳為1~6,n較佳為1~30。於p為2以上時,各()內(外側之括弧內)之基中之n可相同亦可不同。作為上述式(ii)所表示之化合物,具體可列舉:2,2-雙(羥基甲基)-1-丁醇之1,2-環氧基-4-(2-環氧乙烷基)環己烷加成物[例如商品名「EHPE3150」(Daicel(股)製造)等]等。 In formula (ii), R'' is a group obtained by removing p hydroxyl groups (-OH) from the structural formula of p-valent alcohol (a p-valent organic group), and p and n represent natural numbers, respectively. Examples of the p-valent alcohol [R''(OH) p ] include polyhydric alcohols such as 2,2-bis(hydroxymethyl)-1-butanol (alcohols having 1 to 15 carbon atoms, etc.), and the like. p is preferably 1-6, and n is preferably 1-30. When p is 2 or more, n in the bases within each ( ) (within the outer brackets) may be the same or different. Specific examples of the compound represented by the above formula (ii) include: 1,2-epoxy-4-(2-oxiranyl) of 2,2-bis(hydroxymethyl)-1-butanol Cyclohexane adduct [for example, trade name "EHPE3150" (manufactured by Daicel Co., Ltd.), etc.] and the like.

作為上述之(3)分子內具有脂環及環氧丙基醚基之化合物,例如可列舉脂環式醇(例如脂環式多元醇)之環氧丙基醚。更詳細而言,例如可列舉:將2,2-雙[4-(2,3-環氧丙氧基)環己基]丙烷、2,2-雙[3,5-二甲基-4-(2,3-環氧丙氧基)環己基]丙烷等雙酚A型環氧化合物氫化而得之化合物(氫化雙酚A型環氧化合物);將雙[鄰,鄰-(2,3-環氧丙氧基)環己基]甲烷、雙[鄰,對-(2,3-環氧丙氧基)環己基]甲烷、雙[對,對-(2,3-環氧丙氧基)環己基]甲烷、雙[3,5-二甲基-4-(2,3-環氧丙氧基)環己基]甲烷等雙酚F型環氧化合物氫化而得之化合物(氫化雙酚F型環氧化合物);氫化聯苯酚型環氧化合物;氫化苯酚酚醛清漆型環氧化合物;氫化甲酚酚醛清漆型環氧化合物;雙酚A之氫化甲酚酚醛清漆型環氧化合物;氫化萘型環氧化合物;由三苯酚甲烷獲得之環氧化合物之氫化環氧化合物;下述芳香族環氧化合物之氫化環氧化合物等。As a compound which has an alicyclic ring and a glycidyl ether group in the molecule of said (3), the glycidyl ether of an alicyclic alcohol (for example, an alicyclic polyol) is mentioned, for example. More specifically, for example, 2,2-bis[4-(2,3-glycidoxy)cyclohexyl]propane, 2,2-bis[3,5-dimethyl-4- (2,3-glycidoxy)cyclohexyl]propane and other bisphenol A-type epoxy compounds hydrogenated compounds (hydrogenated bisphenol A-type epoxy compounds); bis[o,o-(2,3 -Glycidoxy)cyclohexyl]methane, bis[o,p-(2,3-glycidoxy)cyclohexyl]methane, bis[p,p-(2,3-glycidoxy) ) cyclohexyl]methane, bis[3,5-dimethyl-4-(2,3-glycidoxy)cyclohexyl]methane and other bisphenol F-type epoxy compounds hydrogenated compounds (hydrogenated bisphenol F type epoxy compound); Hydrogenated biphenol type epoxy compound; Hydrogenated phenol novolac type epoxy compound; Hydrogenated cresol novolac type epoxy compound; Hydrogenated cresol novolac type epoxy compound of bisphenol A; Hydrogenated naphthalene type epoxy compounds; hydrogenated epoxy compounds of epoxy compounds obtained from trisphenol methane; hydrogenated epoxy compounds of the following aromatic epoxy compounds, etc.

作為上述芳香族環氧化合物,例如可列舉:由雙酚類與表鹵醇之縮合反應獲得之表雙型(epi-bis-type)環氧丙基醚型環氧樹脂;藉由使該等表雙型環氧丙基醚型環氧樹脂與上述雙酚類進一步加成反應而獲得之高分子量表雙型環氧丙基醚型環氧樹脂;藉由使酚類與醛進行縮合反應而獲得多元醇類,使該多元醇類進而與表鹵醇進行縮合反應而獲得之酚醛清漆-烷基型環氧丙基醚型環氧樹脂;於茀環之9位上鍵結有2個苯酚骨架且在自該等苯酚骨架之羥基去除氫原子後之氧原子上分別直接鍵結或經由伸烷氧基鍵結有環氧丙基之環氧化合物等。Examples of the above-mentioned aromatic epoxy compound include epi-bis-type glycidyl ether-type epoxy resins obtained by condensation reaction of bisphenols and epihalohydrin; Epibis-glycidyl ether-type epoxy resin is a high molecular weight epibis-glycidyl ether-type epoxy resin obtained by further addition reaction of the above-mentioned bisphenols; Polyols are obtained, and the polyols are further subjected to condensation reaction with epihalohydrin to obtain a novolac-alkyl glycidyl ether type epoxy resin; 2 phenols are bonded to the 9-position of the perylene ring The skeleton is directly bonded to the oxygen atom after removing the hydrogen atom from the hydroxyl group of the phenol skeleton, or an epoxy compound bonded with a glycidyl group through an alkyleneoxy group, and the like.

作為上述脂肪族環氧化合物,例如可列舉:q元之不具有環狀結構之醇(q為自然數)之環氧丙基醚;一元或多元羧酸之環氧丙酯;環氧化亞麻仁油、環氧化大豆油、環氧化蓖麻油等具有雙鍵之油脂之環氧化物;環氧化聚丁二烯等聚烯烴(包含聚二烯烴)之環氧化物等。Examples of the above-mentioned aliphatic epoxy compound include: glycidyl ether of an alcohol (q is a natural number) of q-valent alcohol without a cyclic structure; glycidyl ester of monovalent or polyvalent carboxylic acid; epoxidized linseed Oil, epoxidized soybean oil, epoxidized castor oil and other epoxidized oils and fats with double bonds; epoxidized epoxidized of polyolefins (including polydiene) such as epoxidized polybutadiene, etc.

作為上述氧雜環丁烷化合物,可列舉分子內具有1個以上之氧環丁烷環之公知或慣用之化合物。作為上述乙烯醚化合物,可列舉分子內具有1個以上之乙烯醚基之公知或慣用之化合物。As said oxetane compound, the well-known or conventional compound which has one or more oxetane rings in a molecule|numerator is mentioned. As said vinyl ether compound, the well-known or conventional compound which has one or more vinyl ether groups in a molecule|numerator is mentioned.

作為其他自由基硬化性化合物,可使用公知或慣用之自由基硬化性化合物,並無特別限定,例如可列舉本發明之聚有機矽倍半氧烷以外之(甲基)丙烯酸化合物。作為上述(甲基)丙烯酸化合物,可列舉分子內具有1個以上之(甲基)丙烯酸基之公知或慣用之化合物。As another radical curable compound, a well-known or conventional radical curable compound can be used, and it does not specifically limit, For example, the (meth)acrylic compound other than the polyorganosiloxane of this invention is mentioned. As said (meth)acrylic compound, the well-known or usual compound which has one or more (meth)acrylic groups in a molecule|numerator is mentioned.

本發明之硬化性組成物中之其他陽離子硬化性化合物及/或其他自由基硬化性化合物之含量(摻合量)並無特別限定,相對於本發明之聚有機矽倍半氧烷、其他陽離子硬化性化合物及其他自由基硬化性化合物之總量(100重量%;陽離子硬化性化合物與自由基硬化性化合物之總量),較佳為50重量%以下(例如0~50重量%),更佳為30重量%以下(例如0~30重量%),進而較佳為10重量%以下。The content (blending amount) of other cationic curable compounds and/or other radical curable compounds in the curable composition of the present invention is not particularly limited. The total amount of the curable compound and other radical curable compounds (100% by weight; the total amount of the cation curable compound and the radical curable compound) is preferably 50% by weight or less (for example, 0 to 50% by weight), more Preferably it is 30 weight% or less (for example, 0 to 30 weight%), More preferably, it is 10 weight% or less.

本發明之硬化性組成物亦可進而含有聚合穩定劑。聚合穩定劑係具有如下作用之化合物:藉由捕獲陽離子而抑制陽離子聚合之進行,聚合穩定劑之陽離子之捕獲能力會飽和,於失活之階段使聚合進行。藉由使本發明之硬化性組成物含有聚合穩定劑,在進行塗佈、乾燥而形成接著劑層之後,可長期抑制聚合之進行,在謀求接著性之時間點進行加熱,藉此可形成表現優異之接著性且保存穩定性優異之接著劑層。於本發明之硬化性組成物為接著劑用硬化性組成物之情形時,較佳為含有聚合穩定劑。The curable composition of the present invention may further contain a polymerization stabilizer. The polymerization stabilizer is a compound having the function of inhibiting the progress of cationic polymerization by trapping cations, saturating the cation-capturing ability of the polymerization stabilizer, and enabling the polymerization to proceed at the stage of deactivation. By including the polymerization stabilizer in the curable composition of the present invention, after coating and drying to form an adhesive layer, the progress of the polymerization can be suppressed for a long time, and the adhesive layer can be heated by heating at a point in time when the adhesiveness is obtained. An adhesive layer with excellent adhesiveness and excellent storage stability. When the curable composition of the present invention is a curable composition for an adhesive, it is preferable to contain a polymerization stabilizer.

作為上述聚合穩定劑,例如可列舉:癸二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、聚([6-(1,1,3,3-四甲基丁基)亞胺基-1,3,5-三

Figure 110131229-A0304-12-0000-4
-2,4-二基][(2,2,6,6-四甲基-4-哌啶基)亞胺基]六亞甲基[(2,2,6,6-四甲基-4-哌啶基)亞胺基])、1,2,3,4-丁烷四羧酸四(2,2,6,6-四甲基-4-哌啶基)酯、苯甲酸2,2,6,6-四甲基-4-哌啶基酯、(混合2,2,6,6-四甲基-4-哌啶基/十三烷基)-1,2,3,4-丁烷四羧酸酯、3,9-雙(2,3-二第三丁基-4-甲基苯氧基)-2,4,8,10-四氧雜-3,9-二磷雜螺[5.5]十一烷、混合(2,2,6,6-四甲基-4-哌啶基/β,β,β',β'-四甲基-3-9-[2,4,8,10-四氧雜螺[5.5]十一烷]二乙基)-1,2,3,4-丁烷四羧酸酯、聚([6-N-
Figure 110131229-A0304-12-0020-6
啉基-1,3,5-三
Figure 110131229-A0304-12-0000-4
-2,4-二基][(2,2,6,6-四甲基-4-哌啶基)亞胺基]六亞甲基[(2,2,6,6-四甲基-4-哌啶基)亞胺基])、[N-(2,2,6,6-四甲基-4-哌啶基)-2-甲基-2-(2,2,6,6-四甲基-4-哌啶基)亞胺基]丙醯胺、商品名「LA-77」、「LA-67」、「LA-57」(以上由ADEKA(股)製造)、商品名「TINUVIN123」、「TINUVIN152」(以上由Ciba Japan(股)公司製造)等受阻胺(hindered amine)系化合物;或(4-羥基苯基)二甲基鋶甲基亞硫酸鹽(例如商品名「San-Aid SI助劑」,三新化學工業(股)公司製造)等鋶硫酸鹽系化合物、商品名「Adekastab PEP-36」(ADEKA(股)製造)等亞磷酸鹽系化合物等。其中,基於更不易產生接著劑於乾燥過程中之局部硬化,硬化物對被接著體之接著性更優異之觀點,較佳為鋶硫酸鹽系化合物、亞磷酸鹽系化合物。As the above-mentioned polymerization stabilizer, for example, bis(2,2,6,6-tetramethyl-4-piperidinyl) sebacate, poly([6-(1,1,3,3-tetramethyl) Methylbutyl)imino-1,3,5-tris
Figure 110131229-A0304-12-0000-4
-2,4-Diyl][(2,2,6,6-tetramethyl-4-piperidinyl)imino]hexamethylene[(2,2,6,6-tetramethyl- 4-Piperidinyl)imino]), 1,2,3,4-butanetetracarboxylic acid tetrakis(2,2,6,6-tetramethyl-4-piperidinyl)ester, benzoic acid 2 ,2,6,6-Tetramethyl-4-piperidinyl ester, (mixed 2,2,6,6-tetramethyl-4-piperidinyl/tridecyl)-1,2,3, 4-Butanetetracarboxylate, 3,9-bis(2,3-di-tert-butyl-4-methylphenoxy)-2,4,8,10-tetraoxa-3,9- Diphosphaspiro[5.5]undecane, mixed (2,2,6,6-tetramethyl-4-piperidinyl/β,β,β',β'-tetramethyl-3-9-[ 2,4,8,10-Tetraoxaspiro[5.5]undecane]diethyl)-1,2,3,4-butanetetracarboxylate, poly([6-N-
Figure 110131229-A0304-12-0020-6
Lino-1,3,5-tris
Figure 110131229-A0304-12-0000-4
-2,4-Diyl][(2,2,6,6-tetramethyl-4-piperidinyl)imino]hexamethylene[(2,2,6,6-tetramethyl- 4-Piperidinyl)imino]), [N-(2,2,6,6-tetramethyl-4-piperidinyl)-2-methyl-2-(2,2,6,6 -Tetramethyl-4-piperidinyl)imino]propionamide, trade name "LA-77", "LA-67", "LA-57" (the above are manufactured by ADEKA Corporation), trade name Hindered amine compounds such as "TINUVIN123" and "TINUVIN152" (manufactured by Ciba Japan Co., Ltd.); San-Aid SI Additives", bisulfite-based compounds such as Sanshin Chemical Industry Co., Ltd.), and phosphite-based compounds such as trade name "Adekastab PEP-36" (manufactured by ADEKA Co., Ltd.). Among them, from the viewpoint that local hardening of the adhesive during the drying process is less likely to occur, and the adhesiveness of the cured product to the adherend is more excellent, perylene sulfate-based compounds and phosphite-based compounds are preferred.

上述聚合穩定劑既可單獨使用1種,亦可組合2種以上使用。於本發明之接著劑用硬化性組成物中,尤以含有2種以上之聚合穩定劑為佳。藉此,有接著劑用硬化性組成物之保存穩定性顯著優異,更不易產生接著劑於乾燥過程中之局部硬化,硬化物對被接著體之接著性更進一步優異之傾向。作為上述2種以上之聚合穩定劑,較佳為至少含有鋶硫酸鹽系化合物、亞磷酸鹽系化合物。The said polymerization stabilizer may be used individually by 1 type, and may be used in combination of 2 or more types. In the curable composition for adhesives of the present invention, it is preferable to contain two or more kinds of polymerization stabilizers in particular. Thereby, the storage stability of the curable composition for adhesives is remarkably excellent, and local hardening of the adhesive during the drying process is less likely to occur, and the adhesiveness of the cured product to the adherend tends to be further excellent. As the above-mentioned two or more kinds of polymerization stabilizers, it is preferable to contain at least a permanyl sulfate-based compound and a phosphite-based compound.

於本發明之硬化性組成物含有上述聚合穩定劑之情形時,其含量(摻合量)並無特別限定,相對於本發明之聚有機矽倍半氧烷(含有其他陽離子硬化性化合物時,為聚有機矽倍半氧烷與其他陽離子硬化性化合物之總量)100重量份,較佳為0.005重量份以上,且較佳為0.01~10重量份,進而較佳為0.02~1重量份。當上述含量為0.005重量份以上時,有更難產生接著劑於乾燥過程中之局部硬化,硬化物對被接著體之接著性更優異之傾向。於使用2種以上之聚合穩定劑之情形時,聚合穩定劑之總量相對於本發明之聚有機矽倍半氧烷(含有其他陽離子硬化性化合物時,為聚有機矽倍半氧烷與其他陽離子硬化性化合物之總量)100重量份,較佳為0.1~10重量份,更佳為0.2~1重量份。When the curable composition of the present invention contains the above-mentioned polymerization stabilizer, its content (compounding amount) is not particularly limited. is the total amount of polyorganosiloxane sesquioxane and other cationic curable compounds) 100 parts by weight, preferably 0.005 parts by weight or more, preferably 0.01-10 parts by weight, and more preferably 0.02-1 part by weight. When the above-mentioned content is 0.005 parts by weight or more, local hardening of the adhesive during the drying process is more difficult to occur, and the adhesiveness of the hardened product to the adherend tends to be more excellent. In the case of using two or more kinds of polymerization stabilizers, the total amount of the polymerization stabilizers is relative to the polyorganosiloxane sesquioxane of the present invention (when other cationic curable compounds are contained, the polyorganosiloxane sesquioxane and other The total amount of the cationic curable compound) is 100 parts by weight, preferably 0.1 to 10 parts by weight, more preferably 0.2 to 1 part by weight.

於本發明之硬化性組成物含有上述聚合穩定劑及硬化觸媒之情形時,聚合穩定劑之含量(摻合量)並無特別限定,相對於硬化觸媒100重量份,較佳為1重量份以上,更佳為3~200重量份,進而較佳為5~150重量份。當上述含量為1重量份以上時,有更難產生接著劑於乾燥過程中之局部硬化,硬化物對被接著體之接著性更優異之傾向。於使用2種以上之聚合穩定劑之情形時,聚合穩定劑之總量相對於硬化觸媒100重量份,較佳為100~200重量份,更佳為110~150重量份。When the curable composition of the present invention contains the above-mentioned polymerization stabilizer and hardening catalyst, the content (compounding amount) of the polymerization stabilizer is not particularly limited, but is preferably 1 weight part relative to 100 parts by weight of the hardening catalyst part or more, more preferably 3 to 200 parts by weight, still more preferably 5 to 150 parts by weight. When the above-mentioned content is 1 part by weight or more, local hardening of the adhesive during the drying process is more difficult to occur, and the adhesiveness of the hardened product to the adherend tends to be more excellent. When two or more kinds of polymerization stabilizers are used, the total amount of the polymerization stabilizers is preferably 100 to 200 parts by weight, more preferably 110 to 150 parts by weight, relative to 100 parts by weight of the hardening catalyst.

本發明之硬化性組成物較佳為可進而含有溶劑。溶劑例如可列舉水、有機溶劑等,只要為可將本發明之聚有機矽倍半氧烷及視需要使用之添加物溶解,且不抑制聚合者,便無特別限制。Preferably, the curable composition of the present invention may further contain a solvent. Examples of the solvent include water, organic solvents, and the like, and are not particularly limited as long as they can dissolve the polyorganosiloxane sesquioxane of the present invention and an optional additive, and do not inhibit polymerization.

溶劑較佳為使用1種或2種以上之沸點(1大氣壓時)為170℃以下之溶劑(例如甲苯、乙酸丁酯、甲基異丁基酮、二甲苯、1,3,5-三甲苯、丙二醇單甲醚、丙二醇單甲醚乙酸酯、環己酮等)。It is preferable to use one or more solvents whose boiling point (at 1 atmosphere) is 170°C or lower (such as toluene, butyl acetate, methyl isobutyl ketone, xylene, 1,3,5-trimethylbenzene) , propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, cyclohexanone, etc.).

溶劑根據硬化性組成物之用途適量使用即可。溶劑之使用量以本發明之硬化性組成物所含之不揮發分之濃度計,例如為30~80重量%左右,較佳為40~70重量%,更佳為50~60重量%。若溶劑之使用量過量,則有硬化性組成物之黏度降低而難以形成適度膜厚之層之傾向。另一方面,若溶劑之使用量過少,則有硬化性組成物之黏度變得過高而難以均勻塗佈之傾向。The solvent may be used in an appropriate amount according to the application of the curable composition. The amount of the solvent used is, for example, about 30 to 80% by weight, preferably 40 to 70% by weight, and more preferably 50 to 60% by weight, based on the concentration of the nonvolatile matter contained in the curable composition of the present invention. When the amount of the solvent used is excessive, the viscosity of the curable composition tends to decrease, and it tends to be difficult to form a layer with an appropriate film thickness. On the other hand, when the usage-amount of a solvent is too small, the viscosity of a curable composition becomes too high, and there exists a tendency for it to become difficult to apply|coat uniformly.

本發明之硬化性組成物可進而含有以下慣用之添加劑作為其他任意之成分:沈澱氧化矽、濕式氧化矽、發煙氧化矽(fumed silica)、煅燒氧化矽、氧化鈦、氧化鋁、玻璃、石英、鋁矽酸、氧化鐵、氧化鋅、碳酸鈣、碳黑、碳化矽、氮化矽、氮化硼等無機填充劑;將該等填充劑藉由有機鹵矽烷(halosilane)、有機烷氧基矽烷、有機矽氮烷等有機矽化合物進行處理而得之無機填充劑;聚矽氧樹脂、環氧樹脂、氟樹脂等有機樹脂微粉末;銀、銅等導電性金屬粉末等填充劑、硬化助劑、穩定劑、難燃劑、難燃助劑、補強材料、成核劑、潤滑劑、蠟、塑化劑、脫模劑、耐衝擊改良劑、色相改良劑、透明化劑、流變調整劑、加工性改良劑、著色劑、抗靜電劑、分散劑、表面調整劑、表面改質劑、消光劑、消沫劑、抑泡劑、消泡劑、抗菌劑、防腐劑、黏度調整劑、增黏劑、光敏劑、發泡劑等。該等添加劑可單獨使用,或組合2種以上使用。The curable composition of the present invention may further contain the following conventional additives as other optional components: precipitated silica, wet silica, fumed silica, calcined silica, titanium oxide, alumina, glass, Inorganic fillers such as quartz, aluminosilicate, iron oxide, zinc oxide, calcium carbonate, carbon black, silicon carbide, silicon nitride, boron nitride; Inorganic fillers obtained by processing organosilicon compounds such as siloxanes and organosilazanes; fine powders of organic resins such as polysiloxanes, epoxy resins and fluororesins; fillers such as conductive metal powders such as silver and copper, hardened Additives, stabilizers, flame retardants, flame retardant additives, reinforcing materials, nucleating agents, lubricants, waxes, plasticizers, mold release agents, impact modifiers, hue modifiers, clearing agents, rheology Conditioner, processability improver, colorant, antistatic agent, dispersant, surface conditioner, surface modifier, matting agent, antifoaming agent, antifoaming agent, antifoaming agent, antibacterial agent, preservative, viscosity adjustment agent, tackifier, photosensitizer, foaming agent, etc. These additives may be used alone or in combination of two or more.

本發明之硬化性組成物並無特別限定,可藉由將上述各成分於室溫下或視需要加熱,同時進行攪拌、混合來製備。再者,本發明之硬化性組成物可以將預先混合各成分而得者直接使用之單液系組成物之形式使用,例如亦可以將分別保管之2種以上之成分於使用前以規定比率進行混合而使用之多液系(例如2液系)組成物之形式使用。The curable composition of the present invention is not particularly limited, and can be prepared by stirring and mixing the above-mentioned components at room temperature or as necessary while heating. Furthermore, the curable composition of the present invention can be used in the form of a single-liquid composition that is obtained by mixing the components in advance and used as it is. It is used in the form of a multi-liquid system (eg 2-liquid system) composition that is mixed and used.

本發明之硬化性組成物並無特別限定,較佳為於常溫(約25℃)為液體。更具體而言,關於本發明之硬化性組成物,作為稀釋成溶劑20%之液[例如甲基異丁基酮之比率為20重量%之硬化性組成物(溶液)]於25℃時之黏度,較佳為300~20000 mPa・s,更佳為500~10000 mPa・s,進而較佳為1000~8000 mPa・s。藉由將上述黏度設為300 mPa・s以上,有硬化物之耐熱性進一步提昇之傾向。另一方面,藉由將上述黏度設為20000 mPa・s以下,有硬化性組成物之製備或操作較為容易,又,硬化物中不易殘存氣泡之傾向。再者,本發明之硬化性組成物之黏度係使用黏度計(商品名「MCR301」,AntonPaar公司製造),以擺動角5%、頻率0.1~100(1/s)、溫度:25℃之條件進行測定。The curable composition of the present invention is not particularly limited, but is preferably liquid at normal temperature (about 25°C). More specifically, regarding the curable composition of the present invention, as a solution diluted to a solvent of 20% [for example, a curable composition (solution) with a ratio of 20% by weight of methyl isobutyl ketone] at 25°C. The viscosity is preferably 300 to 20000 mPa·s, more preferably 500 to 10000 mPa·s, and still more preferably 1000 to 8000 mPa·s. By setting the above viscosity to 300 mPa·s or more, the heat resistance of the cured product tends to be further improved. On the other hand, by setting the viscosity to 20,000 mPa·s or less, the preparation and handling of the curable composition are easy, and there is a tendency that air bubbles are less likely to remain in the cured product. In addition, the viscosity of the curable composition of the present invention is determined by using a viscometer (trade name "MCR301", manufactured by Anton Paar Corporation) under the conditions of a swing angle of 5%, a frequency of 0.1 to 100 (1/s), and a temperature of 25°C to measure.

[硬化物] 藉由使本發明之硬化性組成物中之陽離子硬化性化合物或自由基硬化性化合物進行聚合反應,可使該硬化性組成物硬化,能夠獲得硬化物(有時稱為「本發明之硬化物」)。硬化方法可自周知之方法中適當選擇,並無特別限定,例如可列舉活性能量線之照射及/或進行加熱之方法。作為上述活性能量線,例如可使用紅外線、可見光線、紫外線、X射線、電子束、α射線、β射線、γ射線等之任一種。其中,基於操作性優異之方面,較佳為紫外線。 [hardened product] By polymerizing the cationic curable compound or the radical curable compound in the curable composition of the present invention, the curable composition can be cured, and a cured product (sometimes referred to as "the cured product of the present invention") can be obtained. ”). A hardening method can be suitably selected from a well-known method, and it does not specifically limit, For example, the method of irradiation of an active energy ray and/or heating is mentioned. As the above-mentioned active energy rays, for example, any of infrared rays, visible rays, ultraviolet rays, X rays, electron beams, alpha rays, beta rays, and gamma rays can be used. Among them, ultraviolet rays are preferable in terms of excellent handleability.

關於藉由照射活性能量線而使本發明之硬化性組成物硬化時之條件(活性能量線之照射條件等),可根據所照射之活性能量線之種類或能量、硬化物之形狀或尺寸等來適當進行調整,並無特別限定,於照射紫外線之情形時,例如較佳為設為1~1000 mJ/cm 2左右。再者,活性能量線之照射時,例如可使用高壓水銀燈、超高壓水銀燈、氙氣燈、碳弧、金屬鹵素燈、太陽光、LED燈、雷射等。活性能量線之照射後,可進一步實施加熱處理(退火、熟化)而進一步進行硬化反應。 Conditions for curing the curable composition of the present invention by irradiating active energy rays (irradiation conditions of active energy rays, etc.) can be determined according to the type and energy of the irradiated active energy rays, the shape or size of the cured product, and the like. Although it does not specifically limit to adjust suitably, when irradiating an ultraviolet-ray, it is preferable to set it as about 1-1000 mJ/cm< 2 >, for example. In addition, when irradiating an active energy ray, for example, a high pressure mercury lamp, an ultra-high pressure mercury lamp, a xenon lamp, a carbon arc, a metal halide lamp, sunlight, an LED lamp, a laser, etc. can be used. After the irradiation of the active energy ray, heat treatment (annealing, aging) may be further performed to further advance the hardening reaction.

另一方面,使本發明之硬化性組成物藉由加熱而硬化時之條件並無特別限定,例如較佳為30~200℃,更佳為50~190℃。硬化時間可適當設定。On the other hand, the conditions at the time of hardening the curable composition of this invention by heating are not specifically limited, For example, 30-200 degreeC is preferable, and 50-190 degreeC is more preferable. The hardening time can be set appropriately.

如上所述,本發明之硬化性組成物藉由使其硬化而能夠形成具有高表面硬度及耐熱性且耐彎曲性及加工性優異之硬化物。因此,本發明之硬化性組成物可作為用以形成硬塗膜中之硬塗層之「硬塗層形成用硬化性組成物」(有時稱為「硬塗液」或「硬塗劑」等)或積層半導體用接著劑來適宜使用。使用本發明之硬化性組成物作為硬塗層形成用硬化性組成物且具有由該組成物形成之硬塗層的硬塗膜可維持高硬度及高耐熱性且具有可撓性,適合以卷對卷方式進行製造或加工。又,於使用本發明之硬化性組成物作為接著性用硬化性組成物之情形時,可以低溫進行硬化,可形成耐龜裂性、耐熱性、對被接著體之接著性及密接性優異之硬化物,因此,即便賦予冷熱衝擊,接著層亦不會產生龜裂或剝離,可形成具可靠性之裝置。As described above, the curable composition of the present invention can be cured to form a cured product having high surface hardness and heat resistance, and excellent in bending resistance and workability. Therefore, the curable composition of the present invention can be used as a "hard coat layer forming curable composition" (sometimes referred to as "hard coat liquid" or "hard coat agent") for forming a hard coat layer in a hard coat film. etc.) or adhesives for laminated semiconductors are suitably used. Using the curable composition of the present invention as a curable composition for forming a hard coat layer and having a hard coat layer formed from the composition can maintain high hardness and high heat resistance, and has flexibility, and is suitable for use in rolls. Manufactured or processed in roll form. In addition, when the curable composition of the present invention is used as the adhesive curable composition, it can be cured at a low temperature, and it is possible to form a product with excellent crack resistance, heat resistance, adhesion to the adherend, and adhesion. Therefore, even if a thermal shock is given, the adhesive layer will not be cracked or peeled off, and a reliable device can be formed.

又,本發明之硬化性組成物在設置於基材上之脫模層上進行塗佈、乾燥而得之未硬化或半硬化之硬塗層之表面變得不黏著,耐黏連性提昇,因此,能夠捲取成卷狀來操作,進而,藉由將該硬塗層轉印於成型品表面並使之硬化,可形成具有高表面硬度之硬塗層。因此,本發明之硬化性組成物亦可作為用以形成耐彎曲性優異之硬塗層的硬塗層形成用硬化性組成物來適宜使用。In addition, the surface of the uncured or semi-cured hard coat layer obtained by coating and drying the curable composition of the present invention on the release layer provided on the substrate becomes non-sticky, and the blocking resistance is improved, Therefore, it can be wound up and handled in a roll shape, and further, by transferring and hardening the hard coat layer on the surface of the molded product, a hard coat layer having a high surface hardness can be formed. Therefore, the curable composition of the present invention can also be suitably used as a hard coat layer forming curable composition for forming a hard coat layer having excellent bending resistance.

[硬塗膜] 本發明之硬塗膜為積層有基材、及形成於該基材之至少一表面之硬塗層而成者,且上述硬塗層為由本發明之硬化性組成物(硬塗層形成用硬化性組成物)所形成之硬塗層(本發明之硬化性組成物之硬化物層)。圖9係表示本發明之硬塗膜之一實施方式之示意圖(剖面圖)。1表示硬塗膜,11表示硬塗層,12表示基材。 [Hard coat] The hard coat film of the present invention is formed by laminating a substrate and a hard coat layer formed on at least one surface of the substrate, and the hard coat layer is composed of the curable composition of the present invention (hard coat layer for forming a hard coat layer) The hard coat layer (hardened layer of the curable composition of the present invention) formed. FIG. 9 is a schematic diagram (cross-sectional view) showing one embodiment of the hard coat film of the present invention. 1 represents a hard coat film, 11 represents a hard coat layer, and 12 represents a base material.

再者,本發明之硬塗膜中之硬塗層可僅形成於上述基材之一表面(單面),亦可形成於兩表面(兩面)。Furthermore, the hard coat layer in the hard coat film of the present invention may be formed only on one surface (one side) of the above-mentioned substrate, or may be formed on both surfaces (both sides).

又,本發明之硬塗膜中之硬塗層可僅形成於上述基材之各表面之一部分,亦可形成於整個面。Moreover, the hard-coat layer in the hard-coat film of this invention may be formed in only a part of each surface of the said base material, and may be formed in the whole surface.

本發明之硬塗膜中之基材為硬塗膜之基材,且係指構成硬塗層以外之部分。作為上述基材,可使用塑膠基材、金屬基材、陶瓷基材、半導體基材、玻璃基材、紙基材、木基材(木製基材)、表面為塗裝表面之基材等公知或慣用之基材,並無特別限定。其中,較佳為塑膠基材(由塑膠材料構成之基材)。The base material in the hard coat film of the present invention is the base material of the hard coat film, and refers to a portion other than the hard coat layer. As the above-mentioned substrates, known plastic substrates, metal substrates, ceramic substrates, semiconductor substrates, glass substrates, paper substrates, wood substrates (wood substrates), and substrates whose surfaces are painted surfaces can be used. Or the commonly used base material is not particularly limited. Among them, plastic substrates (substrates composed of plastic materials) are preferred.

構成上述塑膠基材之塑膠材料並無特別限定,例如可列舉:聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)等聚酯;聚醯亞胺;聚碳酸酯;聚醯胺;聚縮醛;聚伸苯醚;聚苯硫醚;聚醚碸;聚醚醚酮;降莰烯系單體之均聚物(加成聚合物或開環聚合物等)、降莰烯與乙烯之共聚物等降莰烯系單體與烯烴系單體之共聚物(加成聚合物或開環聚合物等環狀烯烴共聚物等)、該等之衍生物等環狀聚烯烴;乙烯系聚合物(例如聚甲基丙烯酸甲酯(PMMA)等丙烯酸系樹脂、聚苯乙烯、聚氯乙烯、丙烯腈-苯乙烯-丁二烯樹脂(ABS樹脂)等);亞乙烯基系聚合物(例如聚偏二氯乙烯等);三乙醯纖維素(TAC)等纖維素系樹脂;環氧樹脂;酚系樹脂;三聚氰胺樹脂;尿素樹脂;順丁烯二醯亞胺樹脂;聚矽氧等各種塑膠材料。再者,上述塑膠基材可為僅由1種塑膠材料構成者,亦可為由2種以上之塑膠材料構成者。The plastic material constituting the plastic base material is not particularly limited, for example, polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN); polyimide; polycarbonate Ester; polyamide; polyacetal; polyphenylene ether; polyphenylene sulfide; polyether; polyether ether ketone; ), copolymers of norbornene-based monomers and olefin-based monomers such as copolymers of norbornene and ethylene (addition polymers or cyclic olefin copolymers such as ring-opening polymers, etc.), their derivatives, etc. Cyclic polyolefins; vinyl polymers (such as acrylic resins such as polymethyl methacrylate (PMMA), polystyrene, polyvinyl chloride, acrylonitrile-styrene-butadiene resin (ABS resin), etc.); Vinylidene-based polymers (eg, polyvinylidene chloride, etc.); cellulose-based resins such as triacetyl cellulose (TAC); epoxy resins; phenol-based resins; melamine resins; urea resins; maleic diarylene Amine resin; polysiloxane and other plastic materials. Furthermore, the above-mentioned plastic base material may be composed of only one kind of plastic material, or may be composed of two or more kinds of plastic materials.

其中,作為上述塑膠基材,於旨在獲得透明性優異之硬塗膜作為本發明之硬塗膜之情形時,較佳為使用透明性優異之基材(透明基材),更佳為聚酯膜(例如PET、PEN)、環狀聚烯烴膜、聚碳酸酯膜、TAC膜、PMMA膜。Among them, as the above-mentioned plastic substrate, in the case of obtaining a hard coat film with excellent transparency as the hard coat film of the present invention, it is preferable to use a substrate (transparent substrate) with excellent transparency, more preferably a polymer Ester films (eg PET, PEN), cyclic polyolefin films, polycarbonate films, TAC films, PMMA films.

上述塑膠基材亦可視需要含有抗氧化劑、紫外線吸收劑、耐光穩定劑、熱穩定劑、結晶成核劑、難燃劑、難燃助劑、填充劑、塑化劑、耐衝擊性改良劑、補強劑、分散劑、抗靜電劑、發泡劑、抗菌劑等其他添加劑。再者,添加劑既可單獨使用1種,亦可組合2種以上使用。The above plastic substrates may also contain antioxidants, ultraviolet absorbers, light-resistant stabilizers, heat stabilizers, crystal nucleating agents, flame retardants, flame retardant additives, fillers, plasticizers, impact resistance improvers, Reinforcing agent, dispersing agent, antistatic agent, foaming agent, antibacterial agent and other additives. In addition, an additive may be used individually by 1 type, and may be used in combination of 2 or more types.

上述塑膠基材既可具有單層構成,亦可具有多層(積層)構成,其構成(結構)並無特別限定。例如,上述塑膠基材亦可為於塑膠膜之至少一表面形成有本發明之硬塗層以外之層(有時稱為「其他層」)即具有「塑膠膜/其他層」或「其他層/塑膠膜/其他層」等積層構成之塑膠基材。作為上述其他層,例如可列舉本發明之硬塗層以外之硬塗層等。再者,作為構成上述其他層之材料,例如可列舉上述塑膠材料等。The above-mentioned plastic base material may have a single-layer structure or a multi-layer (lamination) structure, and the structure (structure) is not particularly limited. For example, the above-mentioned plastic substrate may also have a layer other than the hard coat layer of the present invention (sometimes referred to as "other layer") formed on at least one surface of the plastic film, that is, "plastic film/other layer" or "other layer" /plastic film/other layers" and other laminated plastic substrates. As said other layer, the hard coat layer other than the hard coat layer of this invention, etc. are mentioned, for example. In addition, as a material which comprises the said other layer, the said plastic material etc. are mentioned, for example.

亦可對上述塑膠基材之表面之一部分或全部實施粗化處理、易接著處理、抗靜電處理、噴砂處理(砂無光澤(sand matt)處理)、電暈放電處理、電漿處理、化學蝕刻處理、水無光澤(water matt)處理、火焰處理、酸處理、鹼處理、氧化處理、紫外線照射處理、矽烷偶合劑處理等公知或慣用之表面處理。再者,上述塑膠基材可為未延伸膜,亦可為延伸膜。Roughening treatment, easy bonding treatment, antistatic treatment, sandblasting treatment (sand matt treatment), corona discharge treatment, plasma treatment, chemical etching can also be applied to a part or all of the surface of the above-mentioned plastic substrate Treatment, water matt treatment, flame treatment, acid treatment, alkali treatment, oxidation treatment, ultraviolet irradiation treatment, silane coupling agent treatment and other well-known or conventional surface treatments. Furthermore, the above-mentioned plastic substrate may be an unstretched film or a stretched film.

上述塑膠基材例如可藉由如下公知或慣用之方法進行製造:將上述塑膠材料成形為膜狀而製成塑膠基材(塑膠膜)之方法;視需要進一步於上述塑膠膜上形成適當之層(例如上述其他層等),或對上述塑膠膜實施適當之表面處理之方法等。再者,上述塑膠基材亦可使用市售品。The above-mentioned plastic base material can be manufactured by, for example, the following well-known or conventional methods: a method of forming the above-mentioned plastic material into a film shape to make a plastic base material (plastic film); if necessary, further appropriate layers are formed on the above-mentioned plastic film (such as the above-mentioned other layers, etc.), or the method of applying appropriate surface treatment to the above-mentioned plastic film, etc. In addition, a commercial item can also be used for the said plastic base material.

上述基材之厚度並無特別限定,例如可自0.01~10000 μm之範圍內適當選擇。The thickness of the said base material is not specifically limited, For example, it can select suitably from the range of 0.01-10000 micrometers.

本發明之硬塗膜中之硬塗層為構成本發明之硬塗膜中之至少一表面層之層,且該層(硬化物層)係藉由硬化物(樹脂硬化物)所形成,該硬化物(樹脂硬化物)係藉由使本發明之硬化性組成物(硬塗層形成用硬化性組成物)硬化而獲得。The hard coat layer in the hard coat film of the present invention is a layer constituting at least one surface layer in the hard coat film of the present invention, and the layer (hardened material layer) is formed by a hardened material (resin hardened material), the The cured product (resin cured product) is obtained by curing the curable composition (curable composition for forming a hard coat layer) of the present invention.

本發明之硬塗層之厚度(於基材之兩面具有硬塗層時為各硬塗層之厚度)並無特別限定,較佳為1~200 μm,更佳為3~150 μm。即便本發明之硬塗層較薄(例如厚度5 μm以下)時,亦能夠維持表面之高硬度(例如,使鉛筆硬度為3H以上)。又,即便本發明之硬塗層較厚(例如厚度50 μm以上)時,亦不易發生因硬化收縮等所引起之龜裂產生等不良情況,因此,仍可藉由厚膜化而顯著提高鉛筆硬度(例如,使鉛筆硬度為9H以上)。The thickness of the hard coat layer of the present invention (the thickness of each hard coat layer when the substrate has a hard coat layer on both surfaces) is not particularly limited, but is preferably 1 to 200 μm, more preferably 3 to 150 μm. Even when the hard coat layer of the present invention is thin (for example, the thickness is 5 μm or less), the high hardness of the surface can be maintained (for example, the pencil hardness is set to 3H or more). In addition, even when the hard coat layer of the present invention is thick (for example, the thickness is 50 μm or more), inconveniences such as cracks caused by hardening shrinkage and the like are less likely to occur. Therefore, the thickening of the film can still significantly improve the pencil lead. Hardness (for example, make pencil hardness 9H or more).

硬塗層之霧度並無特別限定,於厚度50 μm時,較佳為1.5%以下,更佳為1.0%以下。再者,霧度之下限並無特別限定,例如為0.1%。藉由將霧度設為1.0%以下,例如有適用於要求非常高之透明性之用途(例如觸控面板等顯示器之表面保護片等)之傾向。本發明之硬塗層之霧度可依據JIS K7136進行測定。The haze of the hard coat layer is not particularly limited, but when the thickness is 50 μm, it is preferably 1.5% or less, more preferably 1.0% or less. In addition, the lower limit of the haze is not particularly limited, but is, for example, 0.1%. By setting the haze to 1.0% or less, it tends to be suitable for applications requiring very high transparency (for example, surface protection sheets for displays such as touch panels). The haze of the hard coat layer of the present invention can be measured according to JIS K7136.

硬塗層之全光線穿透率並無特別限定,於厚度50 μm時,較佳為85%以上,更佳為90%以上。再者,全光線穿透率之上限並無特別限定,例如為99%。藉由將全光線穿透率設為85%以上,例如有適用於要求非常高之透明性之用途(例如觸控面板等顯示器之表面保護片等)之傾向。本發明之硬塗層之全光線穿透率可依據JIS K7361-1進行測定。The total light transmittance of the hard coat layer is not particularly limited, but when the thickness is 50 μm, it is preferably 85% or more, more preferably 90% or more. Furthermore, the upper limit of the total light transmittance is not particularly limited, for example, it is 99%. By setting the total light transmittance to 85% or more, it tends to be suitable for applications requiring very high transparency (such as surface protection sheets for displays such as touch panels). The total light transmittance of the hard coat layer of the present invention can be measured according to JIS K7361-1.

本發明之硬塗膜進而亦可於本發明之硬塗層表面具有表面保護膜。藉由使本發明之硬塗膜具有表面保護膜,有硬塗膜之沖切加工性進一步提昇之傾向。於如此具有表面保護膜之情形時,例如即便為硬塗層之硬度非常高,沖切加工時容易產生來自基材之剝離或龜裂者,亦不會產生此種問題而可使用湯姆森刀片(Thomson blade)進行沖切加工。上述表面保護膜可使用公知或慣用之表面保護膜。The hard coat film of the present invention may further have a surface protective film on the surface of the hard coat layer of the present invention. By making the hard coat film of this invention have a surface protective film, there exists a tendency for the punching workability of a hard coat film to further improve. In the case of such a surface protection film, for example, even if the hardness of the hard coating is very high, peeling or cracking from the substrate is likely to occur during punching, and such problems will not occur, and Thomson blades can be used. (Thomson blade) for punching. As the above-mentioned surface protection film, a well-known or conventional surface protection film can be used.

本發明之硬塗膜可依據公知或慣用之硬塗膜之製造方法進行製造,其製造方法並無特別限定,例如可藉由在上述基材之至少一表面塗佈本發明之硬化性組成物(硬塗層形成用硬化性組成物),視需要將溶劑以乾燥方式去除後,使該硬化性組成物(硬化性組成物層)硬化來製造。使硬化性組成物硬化時之條件並無特別限定,例如可自上述形成硬化物時之條件中適當選擇。The hard coat film of the present invention can be manufactured according to a known or conventional manufacturing method of a hard coat film, and the manufacturing method is not particularly limited. For example, the curable composition of the present invention can be coated on at least one surface of the above-mentioned substrate. (The curable composition for hard-coat layer formation) is produced by hardening the curable composition (curable composition layer) after removing the solvent by drying if necessary. The conditions for curing the curable composition are not particularly limited, and can be appropriately selected, for example, from the above-mentioned conditions for forming the cured product.

本發明之硬塗膜中之本發明之硬塗層由於係由能夠形成耐彎曲性及加工性優異之硬化物之本發明之硬化性組成物(硬塗層形成用硬化性組成物)所形成之硬塗層,故本發明之硬塗膜能夠以卷對卷方式進行製造。藉由以卷對卷方式製造本發明之硬塗膜,可顯著提高其生產性。作為以卷對卷方式製造本發明之硬塗膜之方法,可採用公知或慣用之卷對卷方式之製造方法,並無特別限定,例如可列舉包括如下步驟(步驟A~C)作為必需步驟,且連續地實施該等步驟(步驟A~C)之方法等:步驟A,將捲繞成卷狀之基材捲出;步驟B,於捲出之基材之至少一表面塗佈本發明之硬化性組成物(硬塗層形成用硬化性組成物),繼而,視需要將溶劑以乾燥方式去除後使該硬化性組成物(硬化性組成物層)硬化,藉此形成本發明之硬塗層;及步驟C,其後將所獲得之硬塗膜再次捲取成捲筒。再者,該方法亦可包含步驟A~C以外之步驟。The hard coat layer of the present invention in the hard coat film of the present invention is formed from the curable composition of the present invention (curable composition for forming a hard coat layer) capable of forming a cured product excellent in bending resistance and workability Therefore, the hard coating film of the present invention can be produced in a roll-to-roll manner. By producing the hard coat film of the present invention in a roll-to-roll manner, the productivity can be remarkably improved. As a method for producing the hard coat film of the present invention by a roll-to-roll method, a well-known or conventional roll-to-roll method can be used, and it is not particularly limited. For example, the following steps (steps A to C) are included as necessary steps. , and continuously implement the methods of these steps (steps A to C), etc.: step A, unrolling the rolled substrate; step B, coating the present invention on at least one surface of the rolled substrate The curable composition (curable composition for forming a hard coat layer), and then, if necessary, the solvent is removed by drying and then the curable composition (curable composition layer) is cured, thereby forming the hard coating of the present invention. coating; and step C, after which the hard coat film obtained is rewound into a roll. Furthermore, the method may also include steps other than steps A to C.

本發明之硬塗膜之厚度並無特別限定,可自1~10000 μm之範圍內適當選擇。The thickness of the hard coat film of the present invention is not particularly limited, and can be appropriately selected from the range of 1 to 10000 μm.

本發明之硬塗膜之硬塗層表面之鉛筆硬度較佳為4H以上,更佳為5H以上,進而較佳為6H以上。再者,鉛筆硬度可依據JIS K5600-5-4中記載之方法進行評價。The pencil hardness of the hard coat surface of the hard coat film of the present invention is preferably 4H or more, more preferably 5H or more, and still more preferably 6H or more. In addition, the pencil hardness can be evaluated according to the method described in JIS K5600-5-4.

本發明之硬塗膜之霧度並無特別限定,較佳為1.5%以下,更佳為1.0%以下。再者,霧度之下限並無特別限定,例如為0.1%。藉由將霧度設為1.0%以下,例如有適用於要求非常高之透明性之用途(例如觸控面板等顯示器之表面保護片等)之傾向。本發明之硬塗膜之霧度例如藉由使用上述透明基材作為基材,可容易地控制在上述範圍內。再者,霧度可依據JIS K7136進行測定。The haze of the hard coat film of the present invention is not particularly limited, but is preferably 1.5% or less, more preferably 1.0% or less. In addition, the lower limit of the haze is not particularly limited, but is, for example, 0.1%. By setting the haze to 1.0% or less, it tends to be suitable for applications requiring very high transparency (for example, surface protection sheets for displays such as touch panels). The haze of the hard coat film of the present invention can be easily controlled within the above-mentioned range by using, for example, the above-mentioned transparent base material as a base material. In addition, haze can be measured based on JISK7136.

本發明之硬塗膜之全光線穿透率並無特別限定,較佳為85%以上,更佳為90%以上。再者,全光線穿透率之上限並無特別限定,例如為99%。藉由將全光線穿透率設為90%以上,例如有適用於要求非常高之透明性之用途(例如觸控面板等顯示器之表面保護片等)之傾向。本發明之硬塗膜之全光線穿透率例如藉由使用上述透明基材作為基材,可容易地控制在上述範圍內。再者,全光線穿透率可依據JIS K7361-1進行測定。The total light transmittance of the hard coat film of the present invention is not particularly limited, but is preferably 85% or more, more preferably 90% or more. Furthermore, the upper limit of the total light transmittance is not particularly limited, for example, it is 99%. By setting the total light transmittance to 90% or more, it tends to be suitable for applications requiring very high transparency (such as surface protection sheets for displays such as touch panels, etc.). The total light transmittance of the hard coat film of the present invention can be easily controlled within the above-mentioned range, for example, by using the above-mentioned transparent base material as a base material. In addition, the total light transmittance can be measured according to JIS K7361-1.

本發明之硬塗膜由於既可維持高硬度及高耐熱性又具有可撓性,能夠以卷對卷方式進行製造或加工,因此具有高品質,生產性亦優異。於在本發明之硬塗層表面具有表面保護膜之情形時,沖切加工性亦優異。因此,可較佳地用於要求此種特性之所有用途。本發明之硬塗膜例如既可用作各種製品中之表面保護膜、各種製品之構件或零件中之表面保護膜等,亦可用作各種製品或者其構件或零件之構成材料。作為上述製品,例如可列舉:液晶顯示器、有機EL顯示器等顯示裝置;觸控面板等輸入裝置;太陽電池;各種家電製品;各種電氣、電子製品;可攜式電子終端(例如遊戲機、個人電腦、輸入板、智慧型手機、行動電話等)之各種電氣、電子製品;各種光學機器等。又,作為將本發明之硬塗膜用作各種製品或者其構件或零件之構成材料之態樣,例如可列舉使用於觸控面板中之硬塗膜及透明導電膜之積層體等之態樣等。The hard coat film of the present invention has flexibility while maintaining high hardness and high heat resistance, and can be produced or processed in a roll-to-roll system, and therefore has high quality and excellent productivity. In the case where the hard coat layer of the present invention has a surface protective film, punching workability is also excellent. Therefore, it can be preferably used for all applications requiring such properties. The hard coating film of the present invention can be used, for example, as a surface protective film in various products, a surface protective film in various products or components, and the like, and can also be used as a constituent material for various products or their components or parts. Examples of such products include: display devices such as liquid crystal displays and organic EL displays; input devices such as touch panels; solar cells; various household electrical appliances; various electrical and electronic products; , input boards, smart phones, mobile phones, etc.) various electrical and electronic products; various optical machines, etc. Moreover, as an aspect of using the hard coat film of the present invention as a constituent material of various products or its members or parts, for example, an aspect of a laminate of a hard coat film and a transparent conductive film used in a touch panel, etc. can be mentioned. Wait.

[轉印用膜] 本發明之轉印用膜(轉印用硬塗膜)為具有基材、且在形成於該基材之至少一表面之脫模層上具有未硬化或半硬化之硬塗層的膜,且上述未硬化或半硬化之硬塗層為含有本發明之硬化性組成物(硬塗層形成用硬化性組成物(以下有時稱為「本發明之硬塗劑」)之層。此處,未硬化係指本發明之硬塗層形成用硬化性組成物(硬塗劑)所含之本發明之聚有機矽倍半氧烷之聚合性官能基未發生聚合反應的狀態。又,半硬化係指該聚合性官能基之一部分發生聚合反應且殘存有未反應之聚合性官能基之狀態。再者,本說明書中,有時將由本發明之硬化性組成物(硬塗劑)形成之未硬化或半硬化之硬塗層簡稱為「硬塗層」,將轉印於成型品並硬化而得之硬塗層稱為「硬化硬塗層」。圖10係表示本發明之轉印用膜之一實施方式之示意圖(剖面圖)。2表示轉印用膜,21表示基材,22表示脫模層,23表示硬塗層(未硬化或半硬化之硬塗層),24表示增黏塗層,25表示著色層,26表示接著劑層。 [Film for transfer] The film for transfer (hard coat film for transfer) of the present invention is a film having a base material and an uncured or semi-cured hard coat layer on a release layer formed on at least one surface of the base material, and The above-mentioned uncured or semi-cured hard coat layer is a layer containing the curable composition of the present invention (curable composition for forming a hard coat layer (hereinafter sometimes referred to as "the hard coat agent of the present invention"). Here, Uncured refers to a state in which the polymerizable functional group of the polyorganosiloxane sesquioxane of the present invention contained in the curable composition (hard coat agent) for forming a hard coat layer of the present invention has not undergone a polymerization reaction. It refers to a state in which a part of the polymerizable functional group undergoes a polymerization reaction and an unreacted polymerizable functional group remains. In addition, in this specification, the unreacted polymer formed by the curable composition (hard coat agent) of the present invention may be used. A hardened or semi-hardened hard coat is abbreviated as "hard coat", and a hard coat obtained by transferring and hardening to a molded product is called "hardened hard coat". Fig. 10 shows the transfer film of the present invention Schematic diagram (cross-sectional view) of one embodiment. 2 denotes a transfer film, 21 denotes a substrate, 22 denotes a release layer, 23 denotes a hard coat (uncured or semi-cured hard coat), and 24 denotes a tackifier Coating, 25 denotes a colored layer, and 26 denotes an adhesive layer.

本發明之轉印用膜中之基材為轉印用膜之基材,且係指構成含有本發明之硬塗層之轉印層以外的部分。此處,轉印層係於本發明之轉印用膜中除形成有脫模層之基材以外之層,且係指轉印於成型品表面之部分。The base material in the film for transfer of the present invention is the base of the film for transfer, and refers to a portion other than the transfer layer that constitutes the hard coat layer of the present invention. Here, the transfer layer refers to a layer other than the base material on which the mold release layer is formed in the transfer film of the present invention, and refers to a portion transferred to the surface of a molded product.

作為上述基材,可使用上述硬塗膜所列舉之基材,其中尤以塑膠基材(塑膠膜)作為基材為佳。上述基材之厚度例如可自0.01~10000 μm之範圍內適當選擇,基於成型性或形狀追隨性、操作性等觀點,較佳為2~250 μm,更佳為5~100 μm,進而較佳為20~100 μm。As the above-mentioned base material, the base material exemplified by the above-mentioned hard coating film can be used, and among them, a plastic base material (plastic film) is preferably used as the base material. The thickness of the above-mentioned base material can be appropriately selected from, for example, a range of 0.01 to 10,000 μm, and from the viewpoints of moldability, shape followability, workability, etc., preferably 2 to 250 μm, more preferably 5 to 100 μm, still more preferably 20 to 100 μm.

本發明之轉印用膜中之脫模層係構成本發明之轉印用膜中之基材之至少一表面層的層,且該層係用以使轉印層自基材容易剝離而設置。藉由設置脫模層,可將轉印層自轉印用膜確實且容易地轉印至被轉印體(成型品),可確實地剝離基材。The mold release layer in the transfer film of the present invention is a layer that constitutes at least one surface layer of the substrate in the transfer film of the present invention, and the layer is provided to make the transfer layer easy to peel from the substrate . By providing the mold release layer, the transfer layer can be surely and easily transferred from the transfer film to the transfer target body (molded article), and the base material can be surely peeled off.

於本發明之轉印用膜中,脫模層與硬塗層之剝離強度並無特別限定,較佳為30~500 mN/24 mm,更佳為40~300 mN/24 mm,進而較佳為50~200 mN/24 mm。藉由使剝離強度處於該範圍,有通常之操作時硬塗層不會剝離,在轉印至成型品之同時可容易地剝離硬塗層之傾向。本發明之硬塗層與脫模層之剝離強度可依據JIS Z0237進行測定。In the transfer film of the present invention, the peeling strength between the release layer and the hard coat layer is not particularly limited, but is preferably 30-500 mN/24 mm, more preferably 40-300 mN/24 mm, and more preferably 50 to 200 mN/24 mm. When the peel strength is within this range, the hard coat layer tends to be easily peeled off at the time of transfer to a molded product without peeling off the hard coat layer during normal handling. The peel strength of the hard coat layer and the mold release layer of the present invention can be measured according to JIS Z0237.

再者,本發明之轉印膜中之脫模層可僅形成於上述基材之一表面(單面),亦可形成於兩表面(兩面)。又,本發明之轉印用膜中之脫模層可僅形成於上述基材之各表面之一部分,亦可形成於整個面。Furthermore, the mold release layer in the transfer film of the present invention may be formed only on one surface (one side) of the above-mentioned substrate, or may be formed on both surfaces (both sides). In addition, the mold release layer in the film for transfer of the present invention may be formed only on a part of each surface of the above-mentioned base material, or may be formed on the entire surface.

作為形成脫模層之成分,可無特別限制地使用公知公用之脫模劑,例如可使用選自不飽和酯系樹脂、環氧系樹脂、環氧-三聚氰胺系樹脂、胺基醇酸系樹脂、丙烯酸系樹脂、三聚氰胺系樹脂、矽系樹脂、氟系樹脂、纖維素系樹脂、尿素樹脂系樹脂、聚烯烴系樹脂、石蠟系樹脂、環烯烴系樹脂中之至少一種。基於在轉印層中本發明之硬塗層與和其接觸之上述脫模層之剝離性之觀點,上述脫模層較佳為三聚氰胺系樹脂、環烯烴系樹脂,更佳為2-降莰烯-乙烯共聚物等環烯烴共聚物樹脂(COC樹脂)。As a component for forming the release layer, a publicly known release agent can be used without particular limitation. For example, a release agent selected from the group consisting of unsaturated ester resin, epoxy resin, epoxy-melamine resin, and amino alkyd resin can be used. , At least one of acrylic resin, melamine resin, silicone resin, fluorine resin, cellulose resin, urea resin, polyolefin resin, paraffin resin and cycloolefin resin. From the viewpoint of releasability between the hard coat layer of the present invention and the above-mentioned mold release layer in contact with the transfer layer, the above-mentioned mold release layer is preferably a melamine-based resin or a cycloolefin-based resin, and more preferably 2-norcambe Cyclic olefin copolymer resins (COC resins) such as olefin-ethylene copolymers.

將脫模層形成於基材表面之方法亦可無特別限制地使用公知公用之脫模處理法。例如可將上述樹脂分散或溶解於溶劑(例如甲醇、丁醇等醇類、甲苯、二甲苯等芳香族烴、四氫呋喃等),利用棒式塗佈、邁耶棒式塗佈、凹版塗佈、輥塗等公知之塗佈方法進行塗佈、乾燥,在80~200℃下進行加熱,藉此可形成脫模層。脫模層之厚度亦無特別限定,通常可自0.01~5 μm、較佳為0.1~3.0 μm之範圍內進行選擇。As the method of forming the mold release layer on the surface of the base material, a publicly known mold release treatment method may be used without particular limitation. For example, the above-mentioned resin can be dispersed or dissolved in a solvent (for example, alcohols such as methanol and butanol, aromatic hydrocarbons such as toluene and xylene, tetrahydrofuran, etc.), and can be applied by bar coating, Meyer bar coating, gravure coating, A mold release layer can be formed by a known coating method such as roll coating, drying, and heating at 80 to 200°C. The thickness of the mold release layer is also not particularly limited, and can be usually selected from the range of 0.01 to 5 μm, preferably 0.1 to 3.0 μm.

本發明之轉印用膜中之硬塗層為構成上述脫模層中之至少一表面層之層,且為使本發明之硬化性組成物(硬塗劑)乾燥而得之未硬化層、或經局部硬化而得之半硬化層。半硬化之硬塗層可藉由將未硬化之硬塗層利用上述活性能量線照射或加熱以使硬化局部進行而形成。本發明之未硬化或半硬化之硬塗層具有手指接觸表面時不會附著樹脂之低黏性及優異之耐黏連性,能夠捲繞成卷狀進行操作。The hard coat layer in the transfer film of the present invention is a layer constituting at least one surface layer of the above-mentioned mold release layer, and is an uncured layer obtained by drying the curable composition (hard coat agent) of the present invention, Or a semi-hardened layer obtained by partial hardening. The semi-hardened hard coat layer can be formed by irradiating or heating the unhardened hard coat layer with the above-mentioned active energy rays to locally advance hardening. The uncured or semi-cured hard coat layer of the present invention has low viscosity and excellent blocking resistance, and can be wound into a roll for operation without resin adhering to the surface when fingers touch the surface.

再者,本發明之轉印用膜中之硬塗層可僅形成於上述基材之一脫模層(單面),亦可形成於兩脫模層(兩面)。又,本發明之轉印用膜中之本發明之硬塗層可僅形成於上述脫模層之各表面之一部分,亦可形成於整個面。Furthermore, the hard coat layer in the transfer film of the present invention may be formed only on one release layer (one side) of the above-mentioned base material, or may be formed on both release layers (both sides). Moreover, the hard-coat layer of this invention in the film for transcription|transfer of this invention may be formed in only one part of each surface of the said mold release layer, and may be formed in the whole surface.

於本發明之轉印用膜之脫模層上積層硬塗層之方法並無特別限定,可列舉如下方法:利用公知之方法於脫模層上塗佈本發明之硬化性組成物(硬塗劑)並使之乾燥而形成未硬化之硬塗層;或者進而對未硬化之硬塗層進行活性能量線照射或加熱而形成半硬化之硬塗層。本發明之硬化性組成物(硬塗劑)之塗佈方法可無限制地使用公知之塗佈方法,例如可列舉棒式塗佈機塗佈、邁耶棒塗佈、氣刀塗佈、凹版塗佈、膠版印刷、軟版印刷、網版印刷等。形成硬塗層時之加熱溫度並無特別限定,較佳為可自50~200℃適當選擇。加熱時間亦無特別限定,較佳為可自1~60分鐘適當選擇。對硬塗層照射活性能量線之條件並無特別限定,例如能夠自上述形成硬化物時之條件適當選擇。The method for laminating the hard coat layer on the mold release layer of the transfer film of the present invention is not particularly limited, and examples include the following method: apply the curable composition (hard coat layer) of the present invention on the mold release layer by a known method. agent) and make it dry to form an unhardened hard coating; or further irradiate or heat the unhardened hard coating with active energy rays to form a semi-hardened hard coating. As the coating method of the curable composition (hard coat agent) of the present invention, known coating methods can be used without limitation, for example, bar coater coating, Meyer bar coating, air knife coating, and gravure coating are exemplified Coating, offset printing, flexographic printing, screen printing, etc. The heating temperature at the time of forming the hard coat layer is not particularly limited, but it is preferably appropriately selected from 50 to 200°C. The heating time is also not particularly limited, but it is preferably appropriately selected from 1 to 60 minutes. The conditions for irradiating the active energy ray to the hard coat layer are not particularly limited, and can be appropriately selected, for example, from the above-mentioned conditions at the time of forming the cured product.

本發明之轉印用膜中之硬塗層之厚度(於基材之兩面具有硬塗層之情形時,為各硬塗層之厚度)並無特別限定,較佳為1~200 μm,更佳為3~150 μm。即便硬塗層較薄(例如厚度5 μm以下)時,亦可維持表面之高硬度(例如使鉛筆硬度為5H以上)。又,即便硬塗層較厚(例如厚度50 μm以上)時,亦不易發生因硬化收縮等所引起之龜裂產生等不良情況,因此,仍可藉由厚膜化而顯著提高鉛筆硬度(例如使鉛筆硬度為9H以上)。The thickness of the hard coat layer in the transfer film of the present invention (in the case of having a hard coat layer on both sides of the substrate, the thickness of each hard coat layer) is not particularly limited, but is preferably 1-200 μm, more Preferably, it is 3 to 150 μm. Even when the hard coat layer is thin (for example, the thickness is less than 5 μm), the high hardness of the surface can be maintained (for example, the pencil hardness is more than 5H). In addition, even when the hard coat layer is thick (for example, the thickness is more than 50 μm), it is not easy to cause problems such as cracks caused by hardening shrinkage. Therefore, the pencil hardness can still be significantly improved by thickening the film (for example Make the pencil hardness 9H or more).

本發明之轉印用膜中之硬塗層之霧度並無特別限定,於厚度50 μm時,較佳為1.5%以下,更佳為1.0%以下。再者,霧度之下限並無特別限定,例如為0.1%。藉由將霧度設為1.0%以下,例如於使用本發明之轉印用膜作為加飾膜之情形時,能夠鮮明地轉印花紋、圖樣等,故較佳。本發明之硬塗層之霧度可依據JIS K7136進行測定。The haze of the hard coat layer in the transfer film of the present invention is not particularly limited, but when the thickness is 50 μm, it is preferably 1.5% or less, more preferably 1.0% or less. In addition, the lower limit of the haze is not particularly limited, but is, for example, 0.1%. By setting the haze to 1.0% or less, for example, when the film for transfer of the present invention is used as a decorative film, a pattern, a pattern, etc. can be clearly transferred, which is preferable. The haze of the hard coat layer of the present invention can be measured according to JIS K7136.

本發明之轉印用膜中之硬塗層之全光線穿透率並無特別限定,於厚度50 μm時,較佳為85%以上,更佳為90%以上。再者,全光線穿透率之上限並無特別限定,例如為99%。藉由將全光線穿透率設為85%以上,例如於使用本發明之轉印用膜作為加飾膜之情形時,能夠鮮明地轉印花紋、圖樣等,故較佳。本發明之硬塗層之全光線穿透率可依據JIS K7361-1進行測定。The total light transmittance of the hard coat layer in the transfer film of the present invention is not particularly limited, but when the thickness is 50 μm, it is preferably 85% or more, more preferably 90% or more. Furthermore, the upper limit of the total light transmittance is not particularly limited, for example, it is 99%. By setting the total light transmittance to 85% or more, for example, when the transfer film of the present invention is used as a decorative film, patterns, patterns, etc. can be clearly transferred, which is preferable. The total light transmittance of the hard coat layer of the present invention can be measured according to JIS K7361-1.

本發明之轉印用膜較佳為於硬塗層上依序進而積層增黏塗層及接著劑層。進而,於使用本發明之轉印用膜作為加飾膜之情形時,積層至少一層之著色層。著色層之積層位置並無特別限定,較佳為於增黏塗層與接著劑層之間積層1層或2層以上之態樣。The transfer film of the present invention is preferably formed by sequentially laminating an adhesion-promoting coating layer and an adhesive layer on the hard coating layer. Furthermore, in the case of using the transfer film of the present invention as a decorative film, at least one coloring layer is laminated. The lamination position of the colored layer is not particularly limited, but it is preferably a state in which one layer or two or more layers are laminated between the tackifier coating layer and the adhesive layer.

本發明之轉印用膜中之增黏塗層係用以使硬塗層與接著劑層或著色層等之密接性提昇而設置。增黏塗層較佳為透明或半透明之層,以使著色層之花紋、圖樣等鮮明地轉印,可使用酚樹脂、醇酸樹脂、三聚氰胺系樹脂(例如甲基化三聚氰胺樹脂、丁基化三聚氰胺樹脂、甲醚化三聚氰胺樹脂、丁醚化三聚氰胺樹脂、甲基丁基混合醚化三聚氰胺樹脂等)、環氧系樹脂(例如雙酚A型環氧樹脂、雙酚F型環氧樹脂、多官能環氧樹脂、可撓性環氧樹脂、溴化環氧樹脂、環氧丙酯型環氧樹脂、高分子型環氧樹脂、聯苯型環氧樹脂等)、尿素樹脂、不飽和聚酯樹脂、胺酯(urethane)系樹脂[例如可藉由具有2個以上異氰酸基之聚異氰酸酯化合物(O=C=N-R-N=C=O)與具有2個以上羥基之多元醇化合物(HO-R'-OH)、聚胺(H 2N-R''-NH 2)、或水等具有活性氫(-NH 2,-NH,-CONH-等)之化合物等之反應而獲得之胺酯樹脂]、熱硬化性聚醯亞胺、聚矽氧樹脂等熱硬化性樹脂;或氯乙烯-乙酸乙烯酯共聚物樹脂、丙烯酸樹脂(例如丙烯酸多元醇系樹脂等)、氯化橡膠、聚醯胺樹脂、硝化棉樹脂、環狀聚烯烴系樹脂等熱塑性樹脂等中之單獨1種、或2種以上之混合物,較佳為環氧系樹脂。 The adhesion-promoting coating layer in the transfer film of the present invention is provided in order to improve the adhesion between the hard coat layer and the adhesive layer, the coloring layer, and the like. The adhesion-promoting coating is preferably a transparent or translucent layer, so that the patterns and patterns of the colored layer can be clearly transferred. Phenol resin, alkyd resin, melamine resin (such as methylated melamine resin, butyl resin, etc.) can be used. melamine resin, methyl etherified melamine resin, butyl etherified melamine resin, methyl butyl mixed etherified melamine resin, etc.), epoxy resins (such as bisphenol A type epoxy resin, bisphenol F type epoxy resin, Multifunctional epoxy resin, flexible epoxy resin, brominated epoxy resin, glycidyl ester type epoxy resin, polymer type epoxy resin, biphenyl type epoxy resin, etc.), urea resin, unsaturated polymer Ester resins, urethane resins [for example, polyisocyanate compounds with two or more isocyanate groups (O=C=NRN=C=O) and polyol compounds with two or more hydroxyl groups (HO -R'-OH), polyamine (H 2 N-R''-NH 2 ), or water and other compounds with active hydrogen (-NH 2 , -NH, -CONH-, etc.) ester resin], thermosetting polyimide, polysiloxane and other thermosetting resins; or vinyl chloride-vinyl acetate copolymer resin, acrylic resin (such as acrylic polyol-based resin, etc.), chlorinated rubber, poly The amide resin, nitrocellulose resin, and thermoplastic resins such as cyclic polyolefin-based resins are used alone or in combination of two or more, preferably epoxy-based resins.

上述增黏塗層用樹脂亦可在無損本發明之效果之範圍內進而含有蠟、氧化矽、塑化劑、調平劑、界面活性劑、分散劑、消泡劑、紫外線吸收劑、紫外線穩定劑、抗氧化劑等慣用之添加劑作為其他任意之成分。該等添加劑可單獨使用1種,或組合2種以上使用。The above-mentioned resin for tackifying coating may further contain wax, silicon oxide, plasticizer, leveling agent, surfactant, dispersant, defoamer, ultraviolet absorber, ultraviolet stabilizer, etc. Agents, antioxidants and other commonly used additives are used as other optional ingredients. These additives may be used alone or in combination of two or more.

增黏塗層可將使上述樹脂溶解於溶劑而得之塗佈液利用棒式塗佈、邁耶棒式塗佈、凹版塗佈、輥塗等公知之塗佈方法塗佈於本發明之硬塗層上並進行乾燥,視需要進行加熱而形成。形成增黏塗層時進行加熱時之溫度並無特別限定,較佳為可自50~200℃適當選擇。加熱時間亦無特別限定,較佳為可自10秒~60分鐘適當選擇。The tackifying coating can be applied to the hard coating of the present invention by a known coating method such as bar coating, Meyer bar coating, gravure coating, roll coating, etc. The coating is applied and dried, optionally heated to form. The temperature at the time of heating during the formation of the tackifier coating is not particularly limited, and it is preferably appropriately selected from 50 to 200°C. The heating time is also not particularly limited, but it is preferably appropriately selected from 10 seconds to 60 minutes.

增黏塗層之厚度通常為0.1~20 μm左右,較佳為0.5~5 μm之範圍。The thickness of the adhesion-promoting coating is usually about 0.1-20 μm, preferably in the range of 0.5-5 μm.

本發明之增黏塗層可使用市售之增黏塗佈劑來形成。作為市售之增黏塗佈劑,例如可列舉:K468HP Anchor(東洋油墨股份有限公司製造之環氧樹脂系增黏塗佈劑)、TM-VMAC(大日精化工業股份有限公司製造之丙烯酸多元醇樹脂系增黏塗佈劑)等。The tackifying coating of the present invention can be formed using a commercially available tackifying coating agent. As a commercially available tackifier coating agent, for example, K468HP Anchor (Epoxy resin based tackifier coating agent manufactured by Toyo Ink Co., Ltd.), TM-VMAC (Acrylic polyamide manufactured by Dainisei Chemical Co., Ltd.) Alcohol resin-based tackifying coating agent), etc.

本發明之轉印用膜中之接著劑層係用以將轉印層(包含硬塗層、視需要積層之增黏塗層、及著色層)接著性良好地轉印至成型品而設置。作為接著劑層,可列舉由感熱接著劑或加壓接著劑等構成者,於本發明中,較佳為視需要藉由加熱及加壓,而對成型品表現密接性之熱密封層。作為接著劑層所使用之樹脂,例如可使用丙烯酸樹脂、氯乙烯系樹脂、乙酸乙烯酯系樹脂、氯乙烯-乙酸乙烯酯系共聚樹脂、苯乙烯-丙烯酸系共聚樹脂、聚酯系樹脂、聚醯胺系樹脂等樹脂中之單獨1種或2種以上之混合物,較佳為丙烯酸系樹脂、氯乙烯-乙酸乙烯酯系共聚樹脂。The adhesive layer in the transfer film of the present invention is provided to transfer the transfer layer (including a hard coat layer, an adhesion-promoting coat layer if necessary, and a coloring layer) to a molded article with good adhesion. As an adhesive layer, what consists of a heat sensitive adhesive, a pressure adhesive, etc. is mentioned, In this invention, the heat sealing layer which expresses adhesiveness to a molded article by heating and pressurization as needed is preferable. As resins used for the adhesive layer, for example, acrylic resins, vinyl chloride-based resins, vinyl acetate-based resins, vinyl chloride-vinyl acetate-based copolymer resins, styrene-acrylic copolymer resins, polyester-based resins, poly Among resins such as amide-based resins, one kind alone or a mixture of two or more kinds thereof is preferably an acrylic-based resin and a vinyl chloride-vinyl acetate-based copolymer resin.

作為本發明之接著劑層所使用之丙烯酸系樹脂,例如可列舉:聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸乙酯、聚(甲基)丙烯酸丁酯、(甲基)丙烯酸甲酯-(甲基)丙烯酸丁酯共聚物、(甲基)丙烯酸甲酯-苯乙烯共聚物等丙烯酸系樹脂;經氟等改質之改質丙烯酸樹脂,該等可以1種或以2種以上之混合物之形式使用。此外,亦可使用使(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯等(甲基)丙烯酸烷基酯與(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸2-羥基-3-苯氧基丙酯等分子中具有羥基之(甲基)丙烯酸酯共聚而獲得之丙烯酸多元醇酯。又,作為氯乙烯-乙酸乙烯酯系共聚物樹脂,通常可使用乙酸乙烯酯含量為5~20質量%左右、平均聚合度350~900左右者。亦可視需要使氯乙烯-乙酸乙烯酯系共聚物樹脂進而與順丁烯二酸、反丁烯二酸等羧酸進行共聚。此外,作為副成分之樹脂,亦可視需要適當混合其他樹脂,例如熱塑性聚酯系樹脂、熱塑性胺酯系樹脂、氯化聚乙烯、氯化聚丙烯等氯化聚烯烴系樹脂等樹脂。As the acrylic resin used for the adhesive layer of the present invention, for example, polymethyl(meth)acrylate, polyethyl(meth)acrylate, polybutyl(meth)acrylate, and (meth)acrylic acid may be mentioned. Acrylic resins such as methyl ester-(meth)butyl acrylate copolymer, methyl (meth)acrylate-styrene copolymer, etc.; modified acrylic resins modified with fluorine, etc., these can be 1 type or 2 types Use in the form of a mixture of the above. In addition, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, etc. can also be used. Alkyl (meth)acrylate and 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, etc. Acrylic polyol esters obtained by copolymerizing (meth)acrylates with hydroxyl groups. Moreover, as a vinyl chloride-vinyl acetate type copolymer resin, the vinyl acetate content of about 5-20 mass % and the average degree of polymerization of about 350-900 can be used normally. If necessary, vinyl chloride-vinyl acetate-based copolymer resin may be further copolymerized with carboxylic acids such as maleic acid and fumaric acid. In addition, other resins such as thermoplastic polyester-based resin, thermoplastic urethane-based resin, chlorinated polyethylene, chlorinated polypropylene and other resins such as chlorinated polyolefin-based resins can also be appropriately mixed as the subcomponent resin as necessary.

接著劑層可將上述樹脂之1種或2種以上之溶液或乳液等製成可塗佈之形態者利用棒式塗佈、邁耶棒式塗佈、凹版塗佈、輥塗等公知之塗佈方法進行塗佈、乾燥,並視需要進行加熱而形成。形成接著劑層時進行加熱時之溫度較佳為可自50~200℃適當選擇。加熱時間較佳為可自10秒~60分鐘適當選擇。For the adhesive layer, a solution or emulsion of one or more of the above-mentioned resins can be made into a form that can be applied. Well-known coating methods such as bar coating, Meyer bar coating, gravure coating, and roll coating are used. The cloth method is applied, dried, and formed by heating if necessary. The temperature at the time of heating at the time of forming an adhesive bond layer can be suitably selected from 50-200 degreeC suitably. The heating time can be suitably selected from 10 seconds to 60 minutes.

基於可使轉印用膜接著性良好且有效率地轉印至成型品之方面,接著劑層之厚度較佳為0.1~10 μm左右,更佳為0.5~5 μm。The thickness of the adhesive layer is preferably about 0.1 to 10 μm, and more preferably 0.5 to 5 μm, because the film for transfer can be efficiently transferred to a molded product with good adhesion.

接著劑層中可摻合:二苯甲酮系化合物、苯并三唑系化合物、草醯苯胺(oxanilide)系化合物、氰基丙烯酸酯系化合物、水楊酸酯系化合物等有機系紫外線吸收劑;或如鋅、鈦、鈰、錫、鐵等之氧化物般無機系的具有紫外線吸收能力之微粒子添加劑。又,作為添加劑,亦可視需要適當使用著色顏料、白色顏料、體質顏料、填充劑、抗靜電劑、抗氧化劑、螢光增白劑等。The adhesive layer can be blended with organic ultraviolet absorbers such as benzophenone-based compounds, benzotriazole-based compounds, oxanilide-based compounds, cyanoacrylate-based compounds, and salicylate-based compounds ; Or, such as oxides of zinc, titanium, cerium, tin, iron, etc., inorganic microparticle additives with ultraviolet absorbing ability. Moreover, as an additive, a coloring pigment, a white pigment, an extender, a filler, an antistatic agent, an antioxidant, a fluorescent whitening agent, etc. may be used suitably as needed.

上述接著劑亦可使用市售品。作為市售之接著劑,例如可列舉:K588HP Adhesive gloss A varnish(東洋油墨股份有限公司製造之氯乙烯-乙酸乙烯酯共聚樹脂系接著劑)、PSHP780(東洋油墨股份有限公司製造之丙烯酸系樹脂系接著劑)等。A commercial item can also be used for the said adhesive agent. Examples of commercially available adhesives include K588HP Adhesive gloss A varnish (vinyl chloride-vinyl acetate copolymer resin adhesive manufactured by Toyo Ink Co., Ltd.), PSHP780 (acrylic resin type manufactured by Toyo Ink Co., Ltd.) then agent) etc.

本發明之轉印膜中之著色層係於製成用以將圖樣層及/或隱蔽層轉印至成型品之加飾膜時所設置者。此處,圖樣層係用以表現花紋或文字等及圖案狀之圖樣所設置之層,隱蔽層通常為整面滿版(solid)層,該層係用以掩蔽射出樹脂等之著色等而設置。隱蔽層有時設置於圖樣層之內側以使圖樣層之圖樣明顯,此外還會僅由隱蔽層形成裝飾層。The coloring layer in the transfer film of the present invention is provided when the decorative film for transferring the design layer and/or the concealment layer to the molded product is formed. Here, the pattern layer is a layer provided for expressing patterns, characters, etc. and pattern-like patterns, and the concealing layer is usually a solid layer, which is provided for masking the coloring of the injection resin, etc. . The concealment layer is sometimes arranged inside the pattern layer to make the pattern of the pattern layer obvious, and the decorative layer is also formed only by the concealment layer.

本發明之圖樣層係為了表現花紋或文字等及圖案狀之圖樣而設置之層。圖樣層之圖樣任意,例如可列舉由木紋、石紋、布紋、粒紋、幾何花紋、文字等構成之圖樣。The pattern layer of the present invention is a layer provided for expressing patterns, characters, etc. and pattern-like patterns. The pattern of the pattern layer is arbitrary, and examples thereof include patterns composed of wood grains, stone grains, cloth grains, grain patterns, geometric patterns, characters, and the like.

著色層通常係於上述硬塗層或增黏塗層上印刷油墨並藉由凹版印刷、膠版印刷、絲網印刷、自轉印片之轉印印刷、昇華轉印印刷、噴墨印刷等公知之印刷法而形成,藉此可形成於硬塗層與接著劑層之間、或增黏塗層與接著劑層之間。著色層之厚度基於設計性之觀點,較佳為3~40 μm,更佳為10~30 μm。The coloring layer is usually printed with ink on the above-mentioned hard coating or tackifying coating, and is printed by well-known printing such as gravure printing, offset printing, screen printing, transfer printing of self-transfer sheet, sublimation transfer printing, inkjet printing, etc. It is formed by the method, whereby it can be formed between the hard coat layer and the adhesive layer, or between the tackifying coating and the adhesive layer. From the viewpoint of designability, the thickness of the colored layer is preferably 3 to 40 μm, more preferably 10 to 30 μm.

作為用於形成著色層之印刷油墨之黏合劑樹脂,可較佳地列舉聚酯系樹脂、聚胺酯系樹脂、丙烯酸系樹脂、乙酸乙烯酯系樹脂、氯乙烯-乙酸乙烯酯系共聚物樹脂、纖維素系樹脂等,較佳為僅以丙烯酸系樹脂為主成分、或以丙烯酸系樹脂與氯乙烯-乙酸乙烯酯系共聚物樹脂之混合物為主成分。該等之中,將丙烯酸系樹脂、氯乙烯-乙酸乙烯酯系共聚物樹脂或其他丙烯酸系樹脂混合時,印刷適應性、成形適應性變得更良好,故較佳。此處,作為丙烯酸系樹脂,可列舉:聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸乙酯、聚(甲基)丙烯酸丁酯、(甲基)丙烯酸甲酯-(甲基)丙烯酸丁酯共聚物、(甲基)丙烯酸甲酯-苯乙烯共聚物等丙烯酸系樹脂、經氟等改質之改質丙烯酸樹脂,可以該等中之1種或以2種以上之混合物之形式使用。此外,亦可使用使(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯等(甲基)丙烯酸烷基酯與(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸2-羥基-3-苯氧基丙酯等分子中具有羥基之(甲基)丙烯酸酯進行共聚而獲得之丙烯酸多元醇酯。又,作為氯乙烯-乙酸乙烯酯系共聚物樹脂,通常使用乙酸乙烯酯含量為5~20質量%左右、平均聚合度350~900左右者。亦可視需要使氯乙烯-乙酸乙烯酯系共聚物樹脂進而與順丁烯二酸、反丁烯二酸等羧酸進行共聚。丙烯酸系樹脂與氯乙烯-乙酸乙烯酯系共聚物樹脂之混合比為丙烯酸系樹脂/氯乙烯-乙酸乙烯酯系共聚物樹脂=1/9~9/1(質量比)左右。此外,作為副成分之樹脂,可視需要適當混合其他樹脂,例如熱塑性聚酯系樹脂、熱塑性胺酯系樹脂、氯化聚乙烯、氯化聚丙烯等氯化聚烯烴系樹脂等樹脂。Preferable examples of binder resins for printing inks for forming the colored layer include polyester-based resins, polyurethane-based resins, acrylic-based resins, vinyl acetate-based resins, vinyl chloride-vinyl acetate-based copolymer resins, fibers It is preferable that a plain resin etc. contain only an acrylic resin as a main component, or a mixture of an acrylic resin and a vinyl chloride-vinyl acetate type copolymer resin as a main component. Among these, when an acrylic resin, a vinyl chloride-vinyl acetate-based copolymer resin, or other acrylic resin is mixed, the printing suitability and the molding suitability become more favorable, which is preferable. Here, as acrylic resin, polymethyl (meth)acrylate, polyethyl (meth)acrylate, polybutyl (meth)acrylate, methyl (meth)acrylate-(methyl) Acrylic resins such as butyl acrylate copolymer, methyl (meth)acrylate-styrene copolymer, etc., and modified acrylic resins modified with fluorine, etc., may be one of these or a mixture of two or more of them. use. In addition, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, etc. can also be used. Alkyl (meth)acrylate and 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, etc. An acrylic polyol ester obtained by copolymerizing a (meth)acrylate having a hydroxyl group. Moreover, as a vinyl chloride-vinyl acetate type copolymer resin, the vinyl acetate content of about 5-20 mass % and the average degree of polymerization of about 350-900 are generally used. If necessary, vinyl chloride-vinyl acetate-based copolymer resin may be further copolymerized with carboxylic acids such as maleic acid and fumaric acid. The mixing ratio of the acrylic resin and the vinyl chloride-vinyl acetate copolymer resin is about acrylic resin/vinyl chloride-vinyl acetate copolymer resin=1/9 to 9/1 (mass ratio). In addition, other resins such as thermoplastic polyester-based resins, thermoplastic urethane-based resins, chlorinated polyethylene, chlorinated polypropylene and other chlorinated polyolefin-based resins can be appropriately mixed as the subcomponent resins as necessary.

作為上述著色層所使用之著色劑,可使用由鋁、鉻、鎳、錫、鈦、磷化鐵、銅、金、銀、黃銅等金屬、合金、或金屬化合物之鱗片狀箔粉構成之金屬顏料;由雲母狀氧化鐵、二氧化鈦被覆雲母、二氧化鈦被覆氧氯化鉍、氧氯化鉍、二氧化鈦被覆滑石、魚鱗箔、著色二氧化鈦被覆雲母、鹼性碳酸鉛等之箔粉構成之珠光(pearl)顏料;鋁酸鍶、鋁酸鈣、鋁酸鋇、硫化鋅、硫化鈣等螢光顏料;二氧化鈦、鋅白、三氧化二銻等白色無機顏料;鋅白、紅丹、朱紅、群青、鈷藍、鈦黃、黃鉛、碳黑等無機顏料;異吲哚啉酮黃、漢薩黃A、喹吖酮紅、永固紅(permanent red)4R、酞青藍、陰丹士林藍RS、苯胺黑等有機顏料(亦包含染料)中之1種或混合2種以上使用。As the colorant used in the above-mentioned coloring layer, a scaly foil powder composed of metals, alloys, or metal compounds such as aluminum, chromium, nickel, tin, titanium, iron phosphide, copper, gold, silver, and brass can be used. Metallic pigments; pearlescent (pearl) consisting of mica-like iron oxide, titanium dioxide-coated mica, titanium dioxide-coated bismuth oxychloride, bismuth oxychloride, titanium dioxide-coated talc, fish scale foil, colored titanium dioxide-coated mica, alkaline lead carbonate, etc. ) pigments; fluorescent pigments such as strontium aluminate, calcium aluminate, barium aluminate, zinc sulfide, calcium sulfide; white inorganic pigments such as titanium dioxide, zinc white, antimony trioxide; zinc white, red red, vermilion, ultramarine, cobalt Inorganic pigments such as blue, titanium yellow, yellow lead, carbon black; isoindolinone yellow, Hansa yellow A, quinacridone red, permanent red 4R, phthalocyanine blue, indanthrene blue RS , nigrosine and other organic pigments (including dyes) 1 type or a mixture of 2 or more types.

此種著色層係用以對本發明之轉印用膜賦予設計性而設置之層,為了提昇設計性,亦可進而形成金屬薄膜層等。金屬薄膜層之形成可使用鋁、鉻、金、銀、銅等金屬,利用真空蒸鍍、濺鍍等方法進行製膜。該金屬薄膜層可設置於整個面,亦可局部設置成圖案狀。Such a coloring layer is a layer provided to give designability to the transfer film of the present invention, and further, a metal thin film layer or the like may be formed in order to improve designability. For the formation of the metal thin film layer, metals such as aluminum, chromium, gold, silver, and copper can be used, and the film can be formed by methods such as vacuum evaporation and sputtering. The metal thin film layer can be arranged on the entire surface, or can be partly arranged in a pattern.

用於形成著色層之印刷油墨除上述成分以外,還可適當添加沈澱防止劑、硬化觸媒、紫外線吸收劑、抗氧化劑、調平劑、增黏劑、消泡劑、潤滑劑等。印刷油墨可以將上述成分溶解或分散於常用溶劑之態樣提供。溶劑只要為使黏合劑樹脂溶解或分散者即可,可使用有機溶劑及/或水。作為有機溶劑,可列舉:甲苯、二甲苯等烴類、丙酮、甲基乙基酮等酮類、乙酸乙酯、乙酸賽璐蘇、丁基賽璐蘇乙酸酯等酯類、醇類。In addition to the above-mentioned components, the printing ink used to form the coloring layer may be appropriately added with a precipitation inhibitor, a hardening catalyst, an ultraviolet absorber, an antioxidant, a leveling agent, a tackifier, a defoaming agent, a lubricant, and the like. Printing inks can be provided in the form of dissolving or dispersing the above components in common solvents. As a solvent, what is necessary is just to melt|dissolve or disperse|distribute a binder resin, and an organic solvent and/or water can be used. Examples of the organic solvent include hydrocarbons such as toluene and xylene, ketones such as acetone and methyl ethyl ketone, ethyl acetate, esters such as cellulose acetate and butyl cellulose acetate, and alcohols.

本發明之轉印用膜除積層有上述基材、脫模層、硬塗層、增黏塗層、接著劑層、著色層以外,視需要還以任意之順序積層低反射層、抗靜電層、紫外線吸收層、近紅外線阻斷層、電磁波吸收層等。In addition to the above-mentioned base material, mold release layer, hard coat layer, tackifier coat layer, adhesive layer, and coloring layer, the transfer film of the present invention may be further laminated with a low-reflection layer and an antistatic layer in an arbitrary order if necessary. , UV absorbing layer, near-infrared blocking layer, electromagnetic wave absorbing layer, etc.

本發明之轉印用膜之厚度並無特別限定,可自1~10000 μm之範圍內適當選擇,基於成型性或形狀追隨性、操作性等觀點,較佳為2~250 μm,更佳為5~150 μm,進而較佳為25~150 μm。The thickness of the transfer film of the present invention is not particularly limited, and can be appropriately selected from the range of 1 to 10,000 μm, and is preferably 2 to 250 μm, more preferably 2 to 250 μm, from the viewpoints of formability, shape followability, and workability. 5 to 150 μm, more preferably 25 to 150 μm.

本發明之轉印用膜之硬塗層由於不黏著且耐黏連性優異,能夠捲取成卷狀進行操作,故適宜用作模內射出成型之轉印用膜。例如,於由固定模具與可動模具組成之模具內,用搬送輥等連續地搬送本發明之轉印用膜,使基材膜側與固定模具面接觸,適當地調整位置後,使可動模具移動來鎖模。然後,將預先經熱熔融之熱塑性樹脂於高溫高壓下自轉印用膜之轉印層側射出填充至模具內,急速冷卻後打開模具,便可取出本發明之硬塗層被轉印至最表面之成型品(模內成型品)。Since the hard coat layer of the transfer film of the present invention is non-adhesive and has excellent blocking resistance, it can be wound into a roll and handled, so it is suitable for use as a transfer film for in-mold injection molding. For example, in a mold composed of a fixed mold and a movable mold, the transfer film of the present invention is continuously conveyed by a conveying roller or the like, the base film side is brought into contact with the surface of the fixed mold, and the movable mold is moved after the position is appropriately adjusted. to lock the mold. Then, the pre-heated thermoplastic resin is injected and filled into the mold from the transfer layer side of the transfer film under high temperature and high pressure. After rapid cooling, the mold is opened, and the hard coat layer of the present invention can be taken out and transferred to the outermost surface. The molded product (in-mold molded product).

於上述成型品之本發明之硬塗層為未硬化或半硬化之情形時,可對該硬塗層照射活性能量線及/或進行加熱而使硬塗層硬化。對硬塗層照射活性能量線及/或進行加熱時之條件並無特別限定,例如能夠自上述形成硬化物時之條件中適當選擇。When the hard coat layer of the present invention of the above-mentioned molded article is uncured or semi-cured, the hard coat layer can be cured by irradiating the hard coat layer with active energy rays and/or by heating. The conditions for irradiating active energy rays and/or heating the hard coat layer are not particularly limited, and for example, can be appropriately selected from the above-mentioned conditions for forming a cured product.

本發明之轉印用膜之轉印層被轉印至成型品之後,於成型品之最表面形成本發明之硬化硬塗層,因此,可使成型品表面之鉛筆硬度非常高,較佳為5H以上,更佳為6H以上。再者,鉛筆硬度可依據JIS K5600-5-4中記載之方法進行評價。After the transfer layer of the transfer film of the present invention is transferred to the molded product, the hardened hard coat layer of the present invention is formed on the outermost surface of the molded product. Therefore, the pencil hardness of the surface of the molded product can be very high, preferably 5H or more, more preferably 6H or more. In addition, the pencil hardness can be evaluated according to the method described in JIS K5600-5-4.

使用本發明之轉印用膜藉由模內射出成型法所製造之成型品(模內成型品)由於表面硬度非常高,圖樣、花紋被鮮明地轉印,故可較佳地用於要求此種特性之所有成型品。本發明之轉印用膜例如適宜用於汽車之儀錶盤等車內外飾件、家電製品之殼體等要求高表面硬度及耐擦傷性、設計性、耐久性之各種外裝成型品。The molded product (in-mold molded product) produced by the in-mold injection molding method using the transfer film of the present invention has a very high surface hardness, and the pattern and pattern are vividly transferred, so it can be preferably used for the required application. All moldings of this characteristic. The transfer film of the present invention is suitable for various exterior moldings requiring high surface hardness, scratch resistance, design, and durability, such as interior and exterior trim parts such as dashboards of automobiles, and housings of home appliances.

[接著片] 藉由使用本發明之硬化性組成物(接著性用硬化性組成物、積層半導體用硬化性組成物),可獲得於基材之至少一面具有由本發明之硬化性組成物形成之接著劑層之接著片。圖11係本發明之接著片之一實施方式之示意圖(剖面圖)。3表示接著片,31表示接著劑層,32表示基材,33表示增黏塗層。 [continued film] By using the curable composition of the present invention (curable composition for adhesives, curable composition for laminated semiconductors), it is possible to obtain a substrate having an adhesive layer formed of the curable composition of the present invention on at least one side of the substrate. Next film. FIG. 11 is a schematic diagram (sectional view) of one embodiment of the adhesive sheet of the present invention. 3 denotes an adhesive sheet, 31 denotes an adhesive layer, 32 denotes a substrate, and 33 denotes an adhesion promoting coating.

上述接著片例如可藉由將本發明之硬化性組成物(接著性用硬化性組成物、積層半導體用硬化性組成物)塗佈於基材,進而視需要進行乾燥來獲得。塗佈方法並無特別限定,可使用周知慣用之手段。又,乾燥之手段或條件亦無特別限定,條件可設定為儘可能去除溶劑等揮發成分之條件,且可使用周知慣用之手段。於本發明之硬化性組成物含有相對於Celloxide 2021P(Daicel(股)製造)100重量份添加1重量份而獲得之組成物於130℃之熱硬化時間為3.5分鐘以上的聚合起始劑之情形時,藉由進行加熱乾燥,可抑制硬化反應之進行且迅速地去除溶劑等揮發分,從而形成接著劑層。如此獲得之接著劑層具有如下特性:於未達50℃時不具有接著性,藉由在能夠抑制對半導體晶片等電子零件之損傷的溫度進行加熱而表現接著性,其後迅速地硬化。上述接著片不僅包含片狀,還包含膜狀、帶狀、板狀等類似片狀之形態。The said adhesive sheet can be obtained by apply|coating the curable composition (curable composition for adhesiveness, curable composition for laminated semiconductors) of this invention to a base material, and drying as needed, for example. The coating method is not particularly limited, and well-known and conventional means can be used. In addition, the drying means and conditions are not particularly limited either, and the conditions can be set to remove volatile components such as solvents as much as possible, and well-known and conventional means can be used. In the case where the curable composition of the present invention contains a polymerization initiator whose thermosetting time at 130° C. is 3.5 minutes or more for the composition obtained by adding 1 part by weight to 100 parts by weight of Celloxide 2021P (manufactured by Daicel Co., Ltd.) At the time of heating and drying, the progress of the curing reaction can be suppressed, and the volatile matter such as the solvent can be quickly removed, thereby forming an adhesive layer. The adhesive layer obtained in this way has the characteristics of not having adhesiveness at a temperature lower than 50° C., showing adhesiveness by heating at a temperature capable of suppressing damage to electronic components such as semiconductor wafers, and then rapidly curing. The above-mentioned adhesive sheet includes not only a sheet shape, but also a form similar to a sheet shape such as a film shape, a tape shape, and a plate shape.

上述接著片可為僅於基材之單面側具有接著劑層之單面接著片,亦可為於基材之兩面側具有接著劑層之雙面接著片。於上述接著片為雙面接著片之情形時,至少一接著劑層為由本發明之硬化性組成物形成之接著劑層即可,另一者可為該接著劑層,亦可為該接著劑層以外之接著劑層(其他接著劑層)。The above-mentioned adhesive sheet may be a single-sided adhesive sheet having an adhesive layer only on one side of the substrate, or a double-sided adhesive sheet having an adhesive layer on both sides of the substrate. When the above-mentioned adhesive sheet is a double-sided adhesive sheet, at least one adhesive layer may be an adhesive layer formed from the curable composition of the present invention, and the other may be the adhesive layer or the adhesive. Adhesive layers other than layers (other adhesive layers).

本發明之接著片中之基材可使用周知慣用之基材(用於接著片之基材),並無特別限定,例如可列舉:塑膠基材、金屬基材、陶瓷基材、半導體基材、玻璃基材、紙基材、木基材、表面為塗裝表面之基材等。又,本發明之接著片中之基材可為所謂剝離襯墊。再者,本發明之接著片可為僅具有1層基材者,亦可為具有2層以上者。又,上述基材之厚度並無特別限定,例如可自1~10000 μm之範圍內適當選擇。The substrate in the adhesive sheet of the present invention can be a well-known and conventional substrate (the substrate used for the adhesive sheet), which is not particularly limited, for example, plastic substrates, metal substrates, ceramic substrates, semiconductor substrates , glass substrates, paper substrates, wood substrates, substrates whose surfaces are painted surfaces, etc. In addition, the base material in the adhesive sheet of the present invention may be a so-called release liner. In addition, the adhesive sheet of this invention may have only 1 layer of base material, and may have 2 or more layers. In addition, the thickness of the said base material is not specifically limited, For example, it can select suitably from the range of 1-10000 micrometers.

上述接著片可為僅具有1層由本發明之硬化性組成物形成之接著劑層者,亦可為具有2層以上之該接著劑層者。又,上述接著片中之接著劑層之厚度並無特別限定,例如可自0.1~10000 μm之範圍內適當選擇。The above-mentioned adhesive sheet may have only one adhesive layer formed of the curable composition of the present invention, or may have two or more layers of the adhesive layer. In addition, the thickness of the adhesive layer in the said adhesive sheet is not specifically limited, For example, it can select suitably from the range of 0.1-10000 micrometers.

又,作為上述接著片之另一態樣,藉由使用矽烷偶合劑及本發明之聚有機矽倍半氧烷,可獲得耐龜裂性、耐熱性、對被接著體之接著性及密接性優異之接著片。具體而言,於基材之至少一面具有含有矽烷偶合劑之增黏塗層、及由含有本發明之聚有機矽倍半氧烷之硬化性組成物所形成之接著劑層,且該接著劑層設置於上述增黏塗層之表面上的接著片,其耐龜裂性、耐熱性、對被接著體之接著性及密接性優異。In addition, as another aspect of the above-mentioned adhesive sheet, by using a silane coupling agent and the polyorganosiloxane sesquioxane of the present invention, crack resistance, heat resistance, adhesion to an adherend, and adhesion can be obtained Excellent sticker. Specifically, at least one side of the substrate has an adhesion-promoting coating layer containing a silane coupling agent and an adhesive layer formed from a curable composition containing the polyorganosiloxane sesquioxane of the present invention, and the adhesive is The adhesive sheet in which the layer is provided on the surface of the tackifier coating layer is excellent in crack resistance, heat resistance, adhesiveness to the adherend, and adhesion.

又,於上述接著片之另一態樣中,接著片可為僅具有1層上述增黏塗層者,亦可為具有2層以上之增黏塗層者。又,增黏塗層之厚度例如可自0.001~10000 μm之範圍內適當選擇。Moreover, in another aspect of the above-mentioned adhesive sheet, the adhesive sheet may have only one layer of the above-mentioned tackifying coating layer, or may have two or more layers of the tackifying coating layer. In addition, the thickness of the tackifier coating can be appropriately selected from, for example, a range of 0.001 to 10,000 μm.

上述接著片亦可為除具有基材、接著劑層、及增黏塗層以外,還可具有其他層(例如中間層、底塗層等)者。The above-mentioned adhesive sheet may have other layers (for example, an intermediate layer, a primer layer, etc.) in addition to the base material, the adhesive layer, and the tackifying coating.

藉由使用上述接著片,可獲得於接著片之接著劑層貼附有被接著層(被接著體)的積層物。並且,於使用上述接著片所獲得之該積層物為半導體晶片之三維積層體之情形時,相較於以往之半導體,為高積體且更省電力,故若使用該積層物,則可提昇封裝密度並且提供更小型且高性能之電子機器。By using the said adhesive sheet, the laminated body which adhered the to-be-adhered layer (to-be-adhered body) to the adhesive bond layer of an adhesive sheet can be obtained. In addition, when the laminate obtained by using the above-mentioned adhesive sheet is a three-dimensional laminate of semiconductor wafers, compared with conventional semiconductors, the laminate is highly integrated and power-saving, so using the laminate can improve the Packing density and provide smaller and high-performance electronic machines.

本說明書中所揭示之各種態樣可與本說明書中所揭示之其他任何特徵進行組合。 各實施方式中之各構成及其等之組合等為一例,可於不脫離本發明之主旨之範圍內適當進行構成之附加、省略、置換、及其他變更。本發明僅由申請專利範圍限定,而不受實施方式限定。 [實施例] The various aspects disclosed in this specification can be combined with any other feature disclosed in this specification. The respective configurations and combinations thereof in each embodiment are examples, and additions, omissions, substitutions, and other modifications of the configurations can be appropriately made within the scope of not departing from the gist of the present invention. The present invention is limited only by the scope of the patent application and is not limited by the embodiments. [Example]

以下,基於實施例,更詳細地說明本發明,但本發明並不限定於該等實施例。Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples.

產物之數量平均分子量、分子量分散度之測定係按以下之GPC條件進行測定。又,產物中之單體籠型矽倍半氧烷、縮合矽倍半氧烷之含量係根據GPC測定中之對應波峰之區域值之面積比求得。又,產物中之T2體與T3體之比率[T3體/T2體]之測定係藉由利用Brucker公司製造之NMR(600 MHz)進行之 29Si-NMR圖譜測定來實施。 The number-average molecular weight and molecular weight dispersion of the product were measured under the following GPC conditions. In addition, the content of monomeric cage silsesquioxane and condensed silsesquioxane in the product was obtained according to the area ratio of the area values of the corresponding peaks in the GPC measurement. In addition, the measurement of the ratio of T2 form and T3 form in the product [T3 form/T2 form] was carried out by measuring 29 Si-NMR spectrum using NMR (600 MHz) manufactured by Brucker Corporation.

[GPC條件] 測定裝置:商品名「GPC Semi-Micro system」(島津製作所(股)公司製造) 檢測器:RI檢測器(昭光Science(股)公司製造) 管柱:KF-G4A(保護管柱)、KF-602、及KF-603(昭光Science(股)公司製造) 流速:0.6 mL/min 測定溫度:40℃ 測定時間:13 min 注入量:20 μL 析出液:THF、樣品濃度0.1~0.2重量% 分子量:標準聚苯乙烯換算 [GPC conditions] Measuring device: Trade name "GPC Semi-Micro system" (manufactured by Shimadzu Corporation) Detector: RI detector (manufactured by Zhaoguang Science Co., Ltd.) Column: KF-G4A (guard column), KF-602, and KF-603 (manufactured by Zhaoguang Science Co., Ltd.) Flow rate: 0.6 mL/min Measurement temperature: 40℃ Measurement time: 13 min Injection volume: 20 μL Precipitate: THF, sample concentration 0.1 to 0.2 wt% Molecular weight: standard polystyrene conversion

又,UPLC-MS係藉由以下之裝置及條件進行。 [UPLC條件] 測定裝置:ACQUITY UPLC H-Class(Waters公司製造) 檢測器、檢測條件:下述MS條件 管柱:ACQUITY UPLC HSS PFP 2.1×100 mm×1.8 μm 流動相A:5 mM甲酸銨水溶液 流動相B:乙腈/THF=6/4 洗浄溶劑:乙腈/THF=6/4 流速:0.35 mL/min 樣品溫度:10℃ 管柱溫度:40℃ 注入量:2.0 μL In addition, UPLC-MS was performed by the following apparatus and conditions. [UPLC condition] Measuring device: ACQUITY UPLC H-Class (manufactured by Waters) Detector, detection conditions: the following MS conditions Column: ACQUITY UPLC HSS PFP 2.1×100 mm×1.8 μm Mobile phase A: 5 mM ammonium formate in water Mobile phase B: acetonitrile/THF=6/4 Cleaning solvent: acetonitrile/THF=6/4 Flow rate: 0.35 mL/min Sample temperature: 10℃ Column temperature: 40℃ Injection volume: 2.0 μL

[MS條件] 測定裝置:Xevo-G2XS QTOFMS(Waters公司製造) 離子化模式:ESI+(敏感度模式) 測定方法:MSE 毛細管電壓:3.2 kV 錐孔電壓:30 V 源補償電壓:80 V 脫溶劑氣體:1000 L/hr(200℃) 錐孔氣體:50 L/hr 離子源加熱器:80℃ 掃描範圍:m/z=100~3000 掃描時間:0.4 sec 碰撞能量:30~50 eV(MSE高能量) 鎖定質量:亮氨酸腦啡肽(Leucine Enkephalin) [MS condition] Measuring device: Xevo-G2XS QTOFMS (manufactured by Waters) Ionization mode: ESI+ (sensitivity mode) Measurement method: MSE Capillary voltage: 3.2 kV Cone voltage: 30 V Source compensation voltage: 80 V Desolvation gas: 1000 L/hr (200℃) Cone gas: 50 L/hr Ion source heater: 80℃ Scanning range: m/z=100~3000 Scan time: 0.4 sec Collision energy: 30~50 eV (MSE high energy) Lock in quality: Leucine Enkephalin

實施例 1 :本發明之含環氧基之聚有機矽倍半氧烷之製造( 1 於安裝有溫度計、攪拌裝置、回流冷凝器、及氮氣導入管、迪安-斯塔克管之1000毫升燒瓶(反應容器)中,於氮氣氣流下添加2-(3,4-環氧環己基)乙基三甲氧基矽烷277.2毫莫耳(68.30 g)、苯基三甲氧基矽烷3.0毫莫耳(0.56 g)、及丙酮275.4 g,並升溫至50℃。向如此獲得之混合物中歷時5分鐘添加5%碳酸鉀水溶液7.74 g(以碳酸鉀計為2.8毫莫耳)後,歷時20分鐘添加水2800.0毫莫耳(50.40 g)。再者,添加期間,不使溫度顯著上升。其後,保持為50℃,於氮氣氣流下進行5小時縮聚反應。 其後,添加甲基異丁基酮230.5 g,於減壓下使溫度自50℃升溫至90℃,進行蒸餾去除直至系統內之丙酮(0.0%)、甲基異丁基酮(30.32%)、水(0.23%)。其後,保持90℃攪拌11小時,添加甲基異丁基酮273.2 g,用水273.2 g水洗5次,使導電率為1.5 uS/cm以下進行濃縮,獲得無色透明之液體61.1 g。對產物進行分析,結果數量平均分子量為4736、分子量分散度為2.54、單體籠型矽倍半氧烷(滯留時間7.6~8.3分鐘)之含量為6.7%、縮合籠型矽倍半氧烷(滯留時間4.9~7.6分鐘)之含量為93.3%,[T3體/T2體]為46.5。 將 29Si-NMR圖譜示於圖1,將GPC圖示於圖2。 Example 1 : Manufacture of the epoxy-containing polyorganosiloxane sesquioxane of the present invention ( 1 ) 1000 units equipped with a thermometer, a stirring device, a reflux condenser, a nitrogen introduction pipe, and a Dean-Stark pipe 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane 277.2 mmol (68.30 g), phenyltrimethoxysilane 3.0 mmol, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane 277.2 mmol (68.30 g), 3.0 mmol of phenyltrimethoxysilane were added to a ml flask (reaction vessel) under nitrogen flow. (0.56 g), and 275.4 g of acetone, and heated up to 50 degreeC. To the thus obtained mixture, 7.74 g of a 5% aqueous potassium carbonate solution (2.8 mmol as potassium carbonate) was added over 5 minutes, and then 2800.0 mmol (50.40 g) of water was added over 20 minutes. In addition, during the addition period, the temperature was not significantly increased. Then, the polycondensation reaction was carried out under nitrogen flow for 5 hours while maintaining at 50°C. Then, 230.5 g of methyl isobutyl ketone was added, the temperature was raised from 50°C to 90°C under reduced pressure, and the acetone (0.0%) and methyl isobutyl ketone (30.32%) in the system were removed by distillation. , water (0.23%). After that, the mixture was stirred at 90° C. for 11 hours, 273.2 g of methyl isobutyl ketone was added, washed with 273.2 g of water 5 times, and concentrated to a conductivity of 1.5 uS/cm or less to obtain 61.1 g of a colorless and transparent liquid. The product was analyzed, and the results showed that the number average molecular weight was 4736, the molecular weight dispersion was 2.54, the content of monomer cage silsesquioxane (retention time 7.6 to 8.3 minutes) was 6.7%, and the condensed cage silsesquioxane ( Retention time 4.9 to 7.6 minutes) was 93.3%, and [T3 body/T2 body] was 46.5. The 29 Si-NMR spectrum is shown in FIG. 1 , and the GPC diagram is shown in FIG. 2 .

將實施例1中獲得之含環氧基之聚有機矽倍半氧烷以上述UPLC-MS條件進行測定。將滯留時間3.86分鐘及1.81分鐘時檢測到之MS圖譜分別示於圖3、圖4。根據圖5所示之分子式C 144H 234O 45Si 18(Z=2)之MS模擬圖、圖6所示之分子式C 128H 210O 41Si 16(Z=2)之MS模擬圖之比較,能夠分別鑑定出滯留時間3.86分鐘之波峰之矽倍半氧烷為組成式(1)(全部R 1為2-(3',4'-環氧環己基)乙基)所表示之籠型矽倍半氧烷縮合2個而得之縮合矽倍半氧烷、滯留時間1.81分鐘之波峰之矽倍半氧烷為組成式(1)(全部R 1為2-(3',4'-環氧環己基)乙基)所表示之籠型矽倍半氧烷與組成式(2)(全部R 2為2-(3',4'-環氧環己基)乙基)所表示之籠型矽倍半氧烷縮合而得之縮合矽倍半氧烷。以下表示滯留時間3.86分鐘及1.81分鐘之波峰之縮合矽倍半氧烷之推定結構。 ・滯留時間3.86分鐘之波峰之矽倍半氧烷

Figure 02_image071
The epoxy-containing polyorganosiloxane obtained in Example 1 was measured under the above-mentioned UPLC-MS conditions. The MS spectra detected at the retention times of 3.86 minutes and 1.81 minutes are shown in Fig. 3 and Fig. 4, respectively. According to the comparison between the MS simulation diagram of the molecular formula C 144 H 234 O 45 Si 18 (Z=2) shown in FIG. 5 and the MS simulation diagram of the molecular formula C 128 H 210 O 41 Si 16 (Z=2) shown in FIG. 6 , the silsesquioxane with the peak of retention time of 3.86 minutes can be identified as the cage type represented by the composition formula (1) (all R 1 are 2-(3',4'-epoxycyclohexyl)ethyl) The condensed silsesquioxane obtained by condensing two silsesquioxanes, and the silsesquioxane with the peak of the retention time of 1.81 minutes is the composition formula (1) (all R 1 are 2-(3',4'- Cage silsesquioxane represented by epoxycyclohexyl)ethyl) and cage represented by composition formula (2) (all R 2 are 2-(3',4'-epoxycyclohexyl)ethyl) Condensed silsesquioxane obtained by condensation of silsesquioxane. The estimated structure of the condensed silsesquioxane at the peaks of residence time 3.86 minutes and 1.81 minutes is shown below.・Silsesquioxane with peak retention time of 3.86 minutes
Figure 02_image071

上述式中之全部R 1為2-(3',4'-環氧環己基)乙基。 ・滯留時間1.81分鐘之波峰之矽倍半氧烷

Figure 02_image073
上述式中之全部R 1及R 2為2-(3',4'-環氧環己基)乙基。 All R 1 in the above formula are 2-(3',4'-epoxycyclohexyl)ethyl.・Silsesquioxane with peak retention time of 1.81 minutes
Figure 02_image073
All of R 1 and R 2 in the above formula are 2-(3',4'-epoxycyclohexyl)ethyl.

實施例 2 :本發明之含環氧基之聚有機矽倍半氧烷之製造( 2 於安裝有溫度計、攪拌裝置、回流冷凝器、及氮氣導入管、迪安-斯塔克管之1000毫升燒瓶(反應容器)中,於氮氣氣流下添加2-(3,4-環氧環己基)乙基三甲氧基矽烷277.2毫莫耳(68.30 g)、苯基三甲氧基矽烷3.0毫莫耳(0.56 g)、及丙酮275.4 g,並升溫至50℃。向如此獲得之混合物中歷時5分鐘添加5%碳酸鉀水溶液7.74 g(以碳酸鉀計為2.8毫莫耳)後,歷時20分鐘添加水2800.0毫莫耳(50.40 g)。再者,添加期間,不使溫度顯著上升。其後,保持50℃,於氮氣氣流下進行5小時縮聚反應。 其後,添加甲基異丁基酮230.5 g,於減壓下使溫度自50℃升溫至90℃,進行蒸餾去除直至系統內之丙酮(0.0%)、甲基異丁基酮(20.58%)、水(0.35%)。其後,保持90℃攪拌42小時,添加甲基異丁基酮273.2 g,用水273.2 g水洗6次,使導電率為1.5uS/cm以下進行濃縮,獲得無色透明之液體50.0 g。對產物進行分析,結果數量平均分子量為9843、分子量分散度為2.89、單體籠型矽倍半氧烷(滯留時間7.6~8.3分)之含量為1.9%、縮合矽倍半氧烷(滯留時間4.7~7.6分鐘)之含量為98.1%,[T3體/T2體]為196.2。 將 29Si-NMR圖譜示於圖7,將GPC圖示於圖8。 Example 2 : Manufacture of the epoxy-containing polyorganosiloxane sesquioxane of the present invention ( 2 ) 1000 meters equipped with a thermometer, a stirring device, a reflux condenser, a nitrogen introduction pipe, and a Dean-Stark pipe 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane 277.2 mmol (68.30 g), phenyltrimethoxysilane 3.0 mmol, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane 277.2 mmol (68.30 g), 3.0 mmol of phenyltrimethoxysilane were added to a ml flask (reaction vessel) under nitrogen flow. (0.56 g), and 275.4 g of acetone, and heated up to 50 degreeC. To the thus obtained mixture, 7.74 g of a 5% aqueous potassium carbonate solution (2.8 mmol as potassium carbonate) was added over 5 minutes, and then 2800.0 mmol (50.40 g) of water was added over 20 minutes. In addition, during the addition period, the temperature was not significantly increased. After that, the polycondensation reaction was carried out under nitrogen flow for 5 hours while maintaining at 50°C. Then, 230.5 g of methyl isobutyl ketone was added, the temperature was raised from 50°C to 90°C under reduced pressure, and the acetone (0.0%) and methyl isobutyl ketone (20.58%) in the system were removed by distillation. , water (0.35%). Then, the mixture was stirred at 90° C. for 42 hours, 273.2 g of methyl isobutyl ketone was added, washed 6 times with 273.2 g of water, and concentrated to a conductivity of 1.5 uS/cm or less to obtain 50.0 g of a colorless and transparent liquid. The product was analyzed, and the results showed that the number average molecular weight was 9843, the molecular weight dispersion was 2.89, the content of monomer cage silsesquioxane (retention time 7.6-8.3 minutes) was 1.9%, and condensed silsesquioxane (retention time 7.6-8.3 minutes) was 1.9%. 4.7 to 7.6 minutes) was 98.1%, and [T3 body/T2 body] was 196.2. The 29 Si-NMR spectrum is shown in FIG. 7 , and the GPC diagram is shown in FIG. 8 .

比較例 1 :含環氧基之聚有機矽倍半氧烷之製造於安裝有溫度計、攪拌裝置、回流冷凝器、及氮氣導入管、迪安-斯塔克管之1000毫升燒瓶(反應容器)中,於氮氣氣流下添加苯基三甲氧基矽烷3.0毫莫耳(0.56 g)、及丙酮275.4 g,並升溫至50℃。向如此獲得之混合物中歷時5分鐘添加5%碳酸鉀水溶液7.74 g(以碳酸鉀計為2.8毫莫耳)後,歷時20分鐘添加水2800.0毫莫耳(50.40 g)。又,在開始滴加碳酸鉀之同時,開始滴加2-(3,4-環氧環己基)乙基三甲氧基矽烷277.2毫莫耳(68.30 g),2小時後結束滴加。再者,添加期間,不使溫度顯著上升。其後,保持50℃,於氮氣氣流下進行5小時縮聚反應。 其後,添加甲基異丁基酮230.5 g,用水(273.2 g)水洗6次。使導電率為1.5 uS/cm以下進行濃縮,獲得白濁之液體50.0 g。 Comparative Example 1 : Manufacture of epoxy-containing polyorganosiloxane sesquioxane in a 1000 ml flask (reaction vessel) equipped with a thermometer, a stirring device, a reflux condenser, and a nitrogen introduction tube and a Dean-Stark tube In the middle, 3.0 mmol (0.56 g) of phenyltrimethoxysilane and 275.4 g of acetone were added under nitrogen flow, and the temperature was raised to 50°C. To the thus obtained mixture, 7.74 g of a 5% aqueous potassium carbonate solution (2.8 mmol as potassium carbonate) was added over 5 minutes, and then 2800.0 mmol (50.40 g) of water was added over 20 minutes. Furthermore, 277.2 mmol (68.30 g) of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane was started dropwise at the same time as the dropwise addition of potassium carbonate was started, and the dropwise addition was terminated after 2 hours. In addition, during the addition period, the temperature was not significantly increased. After that, the polycondensation reaction was carried out under nitrogen flow for 5 hours while maintaining at 50°C. Then, 230.5 g of methyl isobutyl ketones were added, and it washed with water (273.2 g) 6 times. It was concentrated so that the conductivity was 1.5 uS/cm or less to obtain 50.0 g of a cloudy liquid.

[溶劑溶解性之評價] 向上述實施例、比較例中獲得之產物50~60 g中添加丙酮或氯仿2 L,對溶劑溶解性進行評價。將完全溶解而成為澄清之溶液之情形評價為「完全溶解」,將一部分未溶解而白濁之情形評價為「白濁」。將結果示於表1。 [Evaluation of Solvent Solubility] 2 L of acetone or chloroform was added to 50 to 60 g of the products obtained in the above Examples and Comparative Examples, and the solvent solubility was evaluated. When the solution was completely dissolved and became a clear solution, it was evaluated as "completely dissolved", and when a part was not dissolved and became cloudy, it was evaluated as "cloudy". The results are shown in Table 1.

[表1] (表1) 樣品 丙酮 氯仿 實施例1 完全溶解 完全溶解 實施例2 完全溶解 完全溶解 比較例1 白濁 白濁 [Table 1] (Table 1) sample acetone Chloroform Example 1 completely dissolved completely dissolved Example 2 completely dissolved completely dissolved Comparative Example 1 cloudy cloudy

參考例 1 :硬塗膜之製造製作實施例1中獲得之含環氧基之聚有機矽倍半氧烷100重量份、甲基異丁基酮(關東化學(股)公司製造)20重量份、及硬化觸媒1([二苯基[4-(苯硫基)苯基]鋶三(五氟乙基)三氟磷酸鹽])1重量份之混合溶液,將其用作硬塗液(硬化性組成物)。 將上述獲得之硬塗液以硬化後之硬塗層之厚度成為5 μm之方式使用線棒塗佈器流延塗佈於PET膜(商品名「KEB03W」,杜邦帝人薄膜(股)公司製造)上之後,於70℃之烘箱內放置(預烘烤)10分鐘,繼而照射紫外線(照射條件(照射量):312 mJ/cm 2、照射強度:80 W/cm 2)。最後於80℃進行2小時熱處理(熟化),藉此使上述硬塗液之塗佈膜硬化,製作具有硬塗層之硬塗膜。 Reference Example 1 : Manufacture of hard coating film 100 parts by weight of epoxy-containing polyorganosiloxane obtained in Example 1, 20 parts by weight of methyl isobutyl ketone (manufactured by Kanto Chemical Co., Ltd.) , and a mixed solution of 1 part by weight of hardening catalyst 1 ([diphenyl[4-(phenylthio)phenyl]permanium tris(pentafluoroethyl)trifluorophosphate]), which was used as a hard coating solution (hardening composition). The hard coating solution obtained above was cast-coated on a PET film (trade name "KEB03W", manufactured by DuPont Teijin Film Co., Ltd.) using a wire bar coater so that the thickness of the hard coating layer after hardening became 5 μm. After the coating, it was placed in an oven at 70° C. (pre-baking) for 10 minutes, and then irradiated with ultraviolet rays (irradiation conditions (irradiation amount): 312 mJ/cm 2 , irradiation intensity: 80 W/cm 2 ). Finally, heat treatment (aging) was performed at 80° C. for 2 hours to harden the coating film of the above-mentioned hard coating liquid, and a hard coating film having a hard coating layer was produced.

對於上述獲得之硬塗膜,利用以下之方法進行各種評價。 (1)霧度及全光線穿透率 使用HAZE METER(日本電色工業(股)製造,NDH-300A),對上述獲得之硬塗膜之霧度及全光線穿透率進行測定。 About the hard coat film obtained above, various evaluations were performed by the following method. (1) Haze and total light transmittance The haze and total light transmittance of the hard coat film obtained above were measured using HAZE METER (NDH-300A, manufactured by Nippon Denshoku Kogyo Co., Ltd.).

(2)表面硬度(鉛筆硬度) 依據JIS K5600-5-4,對上述獲得之硬塗膜之硬塗層表面之鉛筆硬度進行評價。 (2) Surface hardness (pencil hardness) According to JIS K5600-5-4, the pencil hardness of the hard coat surface of the hard coat film obtained above was evaluated.

(3)耐熱性(5%重量減少溫度(T d5)) 除使用玻璃板代替PET膜以外,使用切割器,將利用與上述相同之方法獲得之硬塗膜之硬塗層切削出約5 mg,將其作為樣品。使用示差熱重量分析裝置(Seiko Instruments(股)製造,TG/DTA6300),以下述條件測定上述樣品之5%重量減少溫度。 測定溫度範圍:25~550℃ 升溫速度:10℃/分鐘 氣體環境:氮氣 (3) Heat resistance (5% weight reduction temperature (T d5 )) About 5 mg of the hard coat layer of the hard coat film obtained by the same method as above was cut out using a cutter except that a glass plate was used instead of the PET film , as a sample. Using a differential thermogravimetric analyzer (manufactured by Seiko Instruments Co., Ltd., TG/DTA6300), the 5% weight loss temperature of the above-mentioned sample was measured under the following conditions. Measurement temperature range: 25 to 550°C Heating rate: 10°C/min Gas environment: nitrogen

(4)耐擦傷性 以負載1000 g/cm 2使#0000鋼絲絨於上述獲得之硬塗膜之硬塗層表面往返100次,對有無硬塗層表面產生之劃痕及其條數進行確認,按以下之基準對耐擦傷性進行評價。 ◎(耐擦傷性極佳):劃痕條數為0條 ○(耐擦傷性良好):劃痕條數為1~10條 ×(耐擦傷性不良):劃痕條數超過10條 (4) Scratch resistance: Make #0000 steel wool reciprocate 100 times on the hard coat surface of the hard coat film obtained above with a load of 1000 g/cm 2 , and check whether there are scratches on the hard coat surface and the number of lines. , and the scratch resistance was evaluated according to the following criteria. ◎ (excellent scratch resistance): 0 scratches ○ (good scratch resistance): 1 to 10 scratches × (poor scratch resistance): more than 10 scratches

(5)耐彎曲性(圓筒形心軸法);依據心軸試驗 使用圓筒形心軸,依據JIS K5600-5-1對上述獲得之硬塗膜之耐彎曲性進行評價。 (5) Bending resistance (cylindrical mandrel method); according to mandrel test The bending resistance of the hard coat film obtained above was evaluated according to JIS K5600-5-1 using a cylindrical mandrel.

以下,記載與本發明相關之發明變化。 [附記1]一種聚有機矽倍半氧烷,其含有矽倍半氧烷,該矽倍半氧烷是含有選自由下述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷所組成之群中之至少一種之籠型矽倍半氧烷縮合2個以上而得之縮合物且分子量為8000以下。 ・式(1):[R 1SiO 3/2] 8[R 1SiO 2/2(OR c)] 1(式(1)中,R 1分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) ・式(2):[R 2SiO 3/2] 6[R 2SiO 2/2(OR c)] 2(式(2)中,R 2分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(3):[R 3SiO 3/2] 8[R 3SiO 2/2(OR c)] 2(式(3)中,R 3分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(4):[R 4SiO 3/2] 10[R 4SiO 2/2(OR c)] 2(式(4)中,R 4分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) [附記2]如附記1中記載之聚有機矽倍半氧烷,其中,上述矽倍半氧烷係選自由下述組成式(5)~(8)所表示之籠型矽倍半氧烷所組成之群中之至少一種進而縮合而得之縮合物。 ・式(5):[R 5SiO 3/2] 6[R 5SiO 2/2(OR c)] 3(式(5)中,R 5分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(6):[R 6SiO 3/2] 8[R 6SiO 2/2(OR c)] 3(式(6)中,R 6分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(7):[R 7SiO 3/2] 10[R 7SiO 2/2(OR c)] 1(式(7)中,R 7分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) ・式(8):[R 8SiO 3/2] 12[R 8SiO 2/2(OR c)] 1(式(8)中,R 8分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) [附記3]如附記1或2中記載之聚有機矽倍半氧烷,其中,上述含有聚合性官能基之基為陽離子聚合性官能基(較佳為環氧基、氧環丁基、乙烯醚基、或乙烯基苯基)。 [附記4]如附記1至3中任一項記載之聚有機矽倍半氧烷,其中,上述含有聚合性官能基之基為自由基聚合性官能基(較佳為(甲基)丙烯醯氧基、(甲基)丙烯醯胺基、乙烯基、或乙烯基硫基)。 [附記5]如附記1至4中任一項記載之聚有機矽倍半氧烷,其中,上述聚合性官能基為環氧基、或(甲基)丙烯醯氧基。 [附記6]如附記1至5中任一項記載之聚有機矽倍半氧烷,其中,上述含有聚合性官能基之基為下述式(1A)

Figure 02_image001
[式(1A)中,R 1A表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1B)
Figure 02_image003
[式(1B)中,R 1B表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1C)
Figure 02_image005
[式(1C)中,R 1C表示直鏈或支鏈狀之伸烷基] 所表示之基、或下述式(1D)
Figure 02_image007
[式(1D)中,R 1D表示直鏈或支鏈狀之伸烷基] 所表示之基。 [附記7]如附記6記載之聚有機矽倍半氧烷,其中,上述式(1A)、(1B)、(1C)、及(1D)中,R 1A、R 1B、R 1C、及R 1D分別為碳數1~4之直鏈狀之伸烷基、或碳數3或4之支鏈狀之伸烷基(較佳為伸乙基、三亞甲基、或伸丙基,更佳為伸乙基、或三亞甲基)。 [附記8]如附記1至7中任一項記載之聚有機矽倍半氧烷,其中,上述組成式(1)中,R 1中之含有聚合性官能基之基之個數為3~9(較佳為5~9,更佳為7~9,進而較佳為9)。 [附記9]如附記1至8中任一項記載之聚有機矽倍半氧烷,其中,上述組成式(2)中,R 2中之含有聚合性官能基之基之個數為3~8(較佳為5~8,更佳為7~8,進而較佳為8)。 [附記10]如附記1至9中任一項記載之聚有機矽倍半氧烷,其中,上述組成式(3)中,R 3中之含有聚合性官能基之基之個數為3~10(較佳為5~10,更佳為7~10,進而較佳為10)。 [附記11]如附記1至10中任一項記載之聚有機矽倍半氧烷,其中,上述組成式(4)中,R 4中之含有聚合性官能基之基之個數較佳為3~12(較佳為5~12,更佳為7~12,進而較佳為12)。 [附記12]如附記1至11中任一項記載之聚有機矽倍半氧烷,其中,相對於上述組成式(1)中之R 1、組成式(2)中之R 2、組成式(3)中之R 3、及組成式(4)中之R 4之整體,含有聚合性官能基之基之比率為30%以上(較佳為50%以上,更佳為80%以上)。 [附記13]如附記1至12中任一項記載之聚有機矽倍半氧烷,其中,下述式(I)所表示之構成單元(T3體)與下述式(II)所表示之構成單元(T2體)之莫耳比[式(I)所表示之構成單元/式(II)所表示之構成單元;T3體/T2體]為1以上(較佳為2以上,更佳為3以上,更佳為4以上,更佳為6以上,更佳為7以上,更佳為8以上,更佳為10以上,更佳為15以上,進而較佳為20以上)。 [R aSiO 3/2]                (I) [式(I)中,R a表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子] [R bSiO 2/2(OR c)]        (II) [式(II)中,R b表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、或者經取代或未經取代之烯基;R c表示氫原子或碳數1~4之烷基] [附記14]如附記13記載之聚有機矽倍半氧烷,其中,上述(T3體)與(T2體)之莫耳比[T3體/T2體]為500以下(較佳為400以下,更佳為300以下,更佳為100以下,更佳為50以下,更佳為40以下,更佳為30以下,進而較佳為25以下)。 [附記15]如附記1至14中任一項記載之聚有機矽倍半氧烷,其為上述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷中,1種時縮合2~5(較佳為2~3,更佳為2)、或者2種以上時縮合2~5(較佳為2~3,更佳為2)而得者。 [附記16]如附記1至15中任一項記載之聚有機矽倍半氧烷,其含有單體籠型矽倍半氧烷。 [附記17]如附記1至16中任一項記載之聚有機矽倍半氧烷,其中,單體籠型矽倍半氧烷之含量相對於上述聚有機矽倍半氧烷總量為5重量%以上(較佳為10重量%以上,更佳為20重量%以上)。 [附記18]如附記17中記載之聚有機矽倍半氧烷,其中,上述單體籠型矽倍半氧烷之含量相對於上述聚有機矽倍半氧烷總量為50重量%以下(較佳為40重量%以下,更佳為20重量%以下)。 [附記19]如附記1至18中任一項記載之聚有機矽倍半氧烷,其中,上述聚有機矽倍半氧烷中之縮合矽倍半氧烷之含量相對於上述聚有機矽倍半氧烷總量為20重量%以上(較佳為25~90重量%,更佳為30~80重量%,進而較佳為40~70重量%)。 [附記20]如附記19中記載之聚有機矽倍半氧烷,其中,上述縮合矽倍半氧烷之基於凝膠滲透層析法之標準聚苯乙烯換算之數量平均分子量(Mn)為2000~50000(較佳為2500~40000,更佳為3000~30000)。 [附記21]如附記1至20中任一項記載之聚有機矽倍半氧烷,其中,基於凝膠滲透層析法之標準聚苯乙烯換算之數量平均分子量(Mn)為2000~50000(較佳為2500~40000,更佳為3000~30000)。 [附記22]如附記1至21中任一項記載之聚有機矽倍半氧烷,其中,基於凝膠滲透層析法之標準聚苯乙烯換算之分子量分散度(Mw/Mn)為1.0~4.0(較佳為1.1~3.0,更佳為1.2~2.5)。 [附記23]如附記1至22中任一項記載之聚有機矽倍半氧烷,其中,空氣環境下之5%重量減少溫度(T d5)為330℃以上(例如為330~450℃,較佳為340℃以上,進而較佳為350℃以上)。 [附記24]一種硬化性組成物,其含有附記1至23中任一項記載之聚有機矽倍半氧烷。 [附記25]如附記24中記載之硬化性組成物,其中,聚有機矽倍半氧烷之含量相對於溶劑除外之硬化性組成物之總量(100重量%)為70重量~100重量%(較佳為80~99.8重量%,進而較佳為90~99.5重量%)。 [附記26]如附記22或23中記載之硬化性組成物,其中,相對於陽離子硬化性化合物或自由基硬化性化合物之總量(100重量%),上述聚有機矽倍半氧烷之比率為70~100重量%(較佳為75~98重量%,更佳為80~95重量%)。 [附記27]如附記24至26中任一項記載之硬化性組成物,其含有硬化觸媒。 [附記28]如附記27記載之硬化性組成物,其含有光聚合起始劑或熱聚合起始劑作為上述硬化觸媒。 [附記29]如附記27或28中記載之硬化性組成物,其含有陽離子聚合起始劑或自由基聚合起始劑作為上述硬化觸媒。 [附記30]如附記29記載之硬化性組成物,其中,上述陽離子聚合起始劑為光陽離子聚合起始劑、或熱陽離子聚合起始劑。 [附記31]如附記30記載之硬化性組成物,其中,上述光陽離子聚合起始劑係選自由鋶鹽、錪鹽、硒鹽、銨鹽、鏻鹽、及過渡金屬錯合物離子與陰離子之鹽所組成之群中之一種以上之光陽離子聚合起始劑。 [附記32]如附記30記載之硬化性組成物,其中,上述熱陽離子聚合起始劑係選自由芳基鋶鹽、芳基錪鹽、芳烴-離子錯合物、四級銨鹽、鋁螯合物、及三氟化硼胺錯合物所組成之群中之一種以上之化合物。 [附記33]如附記29記載之硬化性組成物,其中,上述自由基聚合起始劑為光自由基聚合起始劑、熱自由基聚合起始劑。 [附記34]如附記33記載之硬化性組成物,其中,上述光自由基聚合起始劑係選自由2-胺基-2-苯甲醯-1-苯基烷烴化合物、咪唑化合物、鹵甲基化三
Figure 110131229-A0304-12-0000-4
化合物、及鹵甲基
Figure 110131229-A0304-12-0059-1
二唑化合物所組成之群中之1種以上之光自由基聚合起始劑。 [附記35]如附記33記載之硬化性組成物,其中,上述熱自由基聚合起始劑為有機過氧化物類。 [附記36]如附記27至35中任一項記載之硬化性組成物,其含有上述聚有機矽倍半氧烷以外之其他陽離子硬化性化合物及/或上述聚有機矽倍半氧烷以外之其他自由基硬化性化合物。 [附記37]如附記36記載之硬化性組成物,其中,上述硬化觸媒之含量相對於上述聚有機矽倍半氧烷及上述其他之陽離子硬化性化合物之總量100重量份為0.01~3.0重量份(較佳為0.05~3.0重量份,更佳為0.1~1.0重量份,進而較佳為0.3~1.0重量份)。 [附記38]如附記36或37中記載之硬化性組成物,其中,上述其他陽離子硬化性化合物包含上述聚有機矽倍半氧烷以外之環氧化合物、氧環丁烷化合物、或乙烯醚化合物。 [附記39]如附記38記載之硬化性組成物,其中,上述環氧化合物為脂環式環氧化合物、芳香族環氧化合物、或脂肪族環氧化合物。 [附記40]如附記36至39中任一項記載之硬化性組成物,其含有上述聚有機矽倍半氧烷以外之(甲基)丙烯酸化合物作為上述其他自由基硬化性化合物。 [附記41]如附記36至40中任一項記載之硬化性組成物,其中,上述其他陽離子硬化性化合物及/或上述其他自由基硬化性化合物之含量(摻合量)相對於上述聚有機矽倍半氧烷、上述其他陽離子硬化性化合物、及上述其他自由基硬化性化合物之總量為50重量%以下(較佳為30重量%以下,更佳為10重量%以下)。 [附記42]如附記24至41中任一項記載之硬化性組成物,其含有聚合穩定劑。 [附記43]如附記42記載之硬化性組成物,其中,上述聚合穩定劑為選自由受阻胺系化合物、鋶硫酸鹽系化合物、及亞磷酸鹽系化合物所組成之群中之1種以上之聚合穩定劑。 [附記44]如附記42或43中記載之硬化性組成物,其中,上述聚合穩定劑之含量相對於上述聚有機矽倍半氧烷100重量份為0.005重量份以上(較佳為0.01~10重量份,進而較佳為0.02~1重量份)。 [附記45]如附記42至44中任一項記載之硬化性組成物,其含有上述聚合穩定劑及硬化觸媒,聚合穩定劑之含量相對於硬化觸媒100重量份為1重量份以上(較佳為3~200重量份,更佳為5~150重量份)。 [附記44]如附記24至45中任一項記載之硬化性組成物,其含有溶劑。 [附記45]如附記44記載之硬化性組成物,其中,上述溶劑之沸點為170℃以下。 [附記46]如附記44或45中記載之硬化性組成物,其中,上述溶劑之使用量以上述硬化性組成物所含之不揮發分之濃度計為30~80重量%(較佳為40~70重量%,更佳為50~60重量%)。 [附記47]如附記24至46中任一項記載之硬化性組成物,其於常溫(約25℃)為液體。 [附記48]如附記24至47中任一項記載之硬化性組成物,其於25℃之黏度為300~20000 mPa・s(較佳為500~10000 mPa・s,更佳為1000~8000 mPa・s)。 [附記49]如附記24至48中任一項記載之硬化性組成物,其為硬塗層形成用硬化性組成物。 [附記50]如附記24至48中任一項記載之硬化性組成物,其為接著劑用硬化性組成物。 [附記51]一種硬化物,其為附記24至50中任一項記載之硬化性組成物之硬化物。 [附記52]一種硬塗膜,其積層有基材、及為附記51記載之硬化物之硬塗層。 [附記53]如附記52記載之硬塗膜,其中,上述基材為塑膠基材、金屬基材、陶瓷基材、半導體基材、玻璃基材、紙基材、木基材、或表面為塗裝表面之基材。 [附記54]如附記52或53中記載之硬塗膜,其中,上述基材之厚度為0.01~10000 μm。 [附記55]如附記52至54中任一項記載之硬塗膜,其中,上述硬塗層之厚度為1~200 μm(較佳為3~150 μm)。 [附記56]如附記52至55中任一項記載之硬塗膜,其中,上述硬塗層之厚度為50 μm時之霧度為1.5%以下(較佳為1.0%以下)。 [附記57]如附記52至56中任一項記載之硬塗膜,其中,上述硬塗層之厚度為50 μm時之霧度為0.1%以上。 [附記58]如附記52至57中任一項記載之硬塗膜,其中,上述硬塗層之厚度為50 μm時之全光線穿透率為85%以上(較佳為90%以上)。 [附記59]如附記52至58中任一項記載之硬塗膜,其於上述硬塗層表面具有表面保護膜。 [附記60]如附記52至59中任一項記載之硬塗膜,其厚度為1~10000 μm。 [附記61]一種轉印用膜,其積層有基材、及位於形成於該基材之至少一表面之脫模層上之硬塗層,該硬塗層為含有附記49記載之硬化性組成物之層。 [附記62]如附記61記載之轉印用膜,其中,上述脫模層與上述硬塗層之剝離強度為30~500 mN/24 mm(較佳為40~300 mN/24 mm,更佳為50~200 mN/24 mm)。 [附記63]如附記61或62中記載之轉印用膜,其於上述硬塗層上依序進而積層增黏塗層及接著劑層。 [附記64]如附記63記載之轉印用膜,其中,上述增黏塗層之厚度為0.1~20 μm(較佳為0.5~5 μm)之範圍。 [附記65]如附記61至64中任一項記載之轉印用膜,其中,接著劑層之厚度為0.1~10 μm(較佳為0.5~5 μm)。 [附記66]如附記61至65中任一項記載之轉印用膜,其進而含有至少一層之著色層。 [附記67]如附記66記載之轉印用膜,其中,上述著色層係於製成用以將圖樣層及/或隱蔽層轉印至成型品之加飾膜時所設置者。 [附記68]一種接著片,其具有基材及接著劑層,該接著劑層位於該基材之至少一面,且為含有附記50記載之硬化性組成物之層。 [附記69]一種附記50記載之硬化性組成物之用途,其用於具有基材、及位於該基材之至少一面之接著劑層之接著片中之接著劑層。 [附記70]一種接著片,其具有基材、增黏塗層及接著劑層,該增黏塗層及該接著劑層位於該基材之至少一面,該增黏塗層含有矽烷偶合劑,該接著劑層為含有附記50記載之硬化性組成物之層;上述接著劑層設置於上述增黏塗層之表面上。 [附記71]一種附記22至48中任一項記載之硬化性組成物之用途,其用作硬塗層形成用硬化性組成物。 [附記72]一種附記22至48中任一項記載之硬化性組成物之用途,其用作接著劑用硬化性組成物。 [附記73]一種附記51記載之硬化物之用途,其用於具有基材與硬塗層之硬塗膜中之硬塗層。 [附記74]一種附記49記載之硬化性組成物之用途,其用於具有基材、且在形成於該基材之至少一表面之脫模層上形成有硬塗層之轉印用膜中之硬塗層。 [附記75]一種附記50記載之硬化性組成物之用途,其用於具有基材、增黏塗層及接著劑層的接著片中之接著劑層,該增黏塗層及該接著劑層位於該基材之至少一面,該增黏塗層含有矽烷偶合劑,且該接著劑層設置於該增黏塗層之表面上。 [產業上之可利用性] Hereinafter, the invention changes related to this invention are described. [Supplementary Note 1] A polyorganosiloxane containing silsesquioxane, the silsesquioxane containing a compound selected from the following compositional formula (1), compositional formula (2), compositional formula (3) A condensate obtained by condensing at least one clathrate silsesquioxane of at least one of the group consisting of the clathrate silsesquioxane represented by the composition formula (4) and having a molecular weight of 8,000 or less.・Formula (1): [R 1 SiO 3/2 ] 8 [R 1 SiO 2/2 (OR c )] 1 (in formula (1), R 1 is each independently a polymerizable functional group-containing group, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom, and at least one is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (2): [R 2 SiO 3/2 ] 6 [R 2 SiO 2/2 (OR c )] 2 (in formula (2), R 2 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, A substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c respectively independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (3): [R 3 SiO 3/2 ] 8 [R 3 SiO 2/2 (OR c )] 2 (in formula (3), R 3 are independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group alkyl group, substituted or unsubstituted alkenyl group, or hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c independently represents an alkyl group with 1 to 4 carbon atoms or a hydrogen atom) ・Formula ( 4): [R 4 SiO 3/2 ] 10 [R 4 SiO 2/2 (OR c )] 2 (in formula (4), R 4 is independently a group containing a polymerizable functional group, substituted or unsubstituted Substituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom , and at least one is a group containing a polymerizable functional group; R c independently represents an alkyl group with 1 to 4 carbon atoms or a hydrogen atom) [Supplementary Note 2] The polyorganosiloxane sesquioxane as described in Supplementary Note 1, wherein, The above-mentioned silsesquioxane is a condensate obtained by condensing at least one selected from the group consisting of clathrate silsesquioxanes represented by the following composition formulae (5) to (8).・Formula (5): [R 5 SiO 3/2 ] 6 [R 5 SiO 2/2 (OR c )] 3 (in formula (5), R 5 is each independently a polymerizable functional group-containing group, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (6): [R 6 SiO 3/2 ] 8 [R 6 SiO 2/2 (OR c )] 3 (in formula (6), R 6 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, and a substituted or unsubstituted aralkane R c each independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (7): [R 7 SiO 3/2 ] 10 [R 7 SiO 2/2 (OR c )] 1 (in formula (7) , R 7 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group, A substituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of which is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula ( 8): [R 8 SiO 3/2 ] 12 [R 8 SiO 2/2 (OR c )] 1 (in formula (8), R 8 is independently a group containing a polymerizable functional group, substituted or unsubstituted Substituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom , and at least one is a group containing a polymerizable functional group; R c represents an alkyl group with 1 to 4 carbon atoms or a hydrogen atom) [Appendix 3] The polyorganosiloxane as described in appendix 1 or 2, wherein, The above-mentioned polymerizable functional group-containing group is a cationically polymerizable functional group (preferably an epoxy group, an oxycyclobutyl group, a vinyl ether group, or a vinyl phenyl group). [Supplementary Note 4] The polyorganosiloxane sesquioxane according to any one of Supplementary Notes 1 to 3, wherein the polymerizable functional group-containing group is a radically polymerizable functional group (preferably (meth)acrylonitrile) oxy, (meth)acrylamido, vinyl, or vinylthio). [Supplementary Note 5] The polyorganosiloxane sesquioxane according to any one of Supplementary Notes 1 to 4, wherein the polymerizable functional group is an epoxy group or a (meth)acryloyloxy group. [Supplementary Note 6] The polyorganosiloxane sesquioxane according to any one of Supplementary Notes 1 to 5, wherein the polymerizable functional group-containing group is the following formula (1A)
Figure 02_image001
[In formula (1A), R 1A represents a linear or branched alkylene group] The group represented by the following formula (1B)
Figure 02_image003
[In formula (1B), R 1B represents a linear or branched alkylene group] The group represented by the following formula (1C)
Figure 02_image005
[In formula (1C), R 1C represents a linear or branched alkylene group] represented by the group, or the following formula (1D)
Figure 02_image007
A group represented by [in formula (1D), R 1D represents a linear or branched alkylene group]. [Supplementary Note 7] The polyorganosiloxane sesquioxane according to Supplementary Note 6, wherein in the above formulae (1A), (1B), (1C), and (1D), R 1A , R 1B , R 1C , and R 1D is respectively a straight-chain alkylene with 1 to 4 carbon atoms, or a branched alkylene with 3 or 4 carbons (preferably ethylidene, trimethylene, or propylidene, more preferably For ethylene, or trimethylene). [Supplementary Note 8] The polyorganosiloxane sesquioxane according to any one of Supplementary Notes 1 to 7, wherein, in the above compositional formula (1), the number of groups containing a polymerizable functional group in R 1 is 3 to 3 9 (preferably 5 to 9, more preferably 7 to 9, still more preferably 9). [Supplementary Note 9] The polyorganosiloxane sesquioxane according to any one of Supplementary Notes 1 to 8, wherein, in the above compositional formula (2), the number of groups containing a polymerizable functional group in R 2 is 3 to 3 8 (preferably 5 to 8, more preferably 7 to 8, still more preferably 8). [Supplementary Note 10] The polyorganosiloxane sesquioxane according to any one of Supplementary Notes 1 to 9, wherein, in the above compositional formula (3), the number of groups containing a polymerizable functional group in R 3 is 3 to 3 10 (preferably 5-10, more preferably 7-10, still more preferably 10). [Supplementary Note 11] The polyorganosiloxane sesquioxane according to any one of Supplementary Notes 1 to 10, wherein, in the above compositional formula (4), the number of groups containing a polymerizable functional group in R 4 is preferably 3 to 12 (preferably 5 to 12, more preferably 7 to 12, further preferably 12). [Supplementary Note 12] The polyorganosiloxane according to any one of Supplementary Notes 1 to 11, wherein, with respect to R 1 in the composition formula (1), R 2 in the composition formula (2), and composition formula R 3 in (3) and R 4 in the compositional formula (4) as a whole have a ratio of groups containing a polymerizable functional group of 30% or more (preferably 50% or more, more preferably 80% or more). [Supplementary Note 13] The polyorganosiloxane according to any one of Supplementary Notes 1 to 12, wherein the structural unit (T3 body) represented by the following formula (I) and the compound represented by the following formula (II) The molar ratio of the constituent unit (T2 body) [constituent unit represented by formula (I)/constituent unit represented by formula (II); T3 body/T2 body] is 1 or more (preferably 2 or more, more preferably 3 or more, more preferably 4 or more, more preferably 6 or more, more preferably 7 or more, more preferably 8 or more, more preferably 10 or more, more preferably 15 or more, still more preferably 20 or more). [R a SiO 3/2 ] (I) [In formula (I), R a represents a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, Substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom] [R b SiO 2/2 (OR c )] (II) [In formula (II), R b represents a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, Substituted or unsubstituted alkyl group, or substituted or unsubstituted alkenyl group; R c represents a hydrogen atom or an alkyl group with 1 to 4 carbon atoms] [Supplementary Note 14] Polyorganosilicon sesquises as described in Supplementary Note 13 Oxane, wherein the molar ratio of the above (T3 body) and (T2 body) [T3 body/T2 body] is 500 or less (preferably 400 or less, more preferably 300 or less, more preferably 100 or less, more preferably 50 or less, more preferably 40 or less, more preferably 30 or less, still more preferably 25 or less). [Supplementary Note 15] The polyorganosiloxane silsesquioxane according to any one of Supplementary Notes 1 to 14, which is represented by the above compositional formula (1), compositional formula (2), compositional formula (3) and compositional formula (4). Among the cage-type silsesquioxanes indicated, one type of silsesquioxane condenses 2-5 (preferably 2-3, more preferably 2), or two or more types condense 2-5 (preferably 2-3, more The best is the winner of 2). [Supplementary Note 16] The polyorganosiloxane according to any one of Supplementary Notes 1 to 15, which contains monomeric cage silsesquioxane. [Supplementary Note 17] The polyorganosiloxane silsesquioxane according to any one of Supplementary Notes 1 to 16, wherein the content of the monomer cage silsesquioxane relative to the total amount of the polyorganosiloxane silsesquioxane is 5 % by weight or more (preferably 10% by weight or more, more preferably 20% by weight or more). [Supplementary Note 18] The polyorganosiloxane silsesquioxane according to Supplementary Note 17, wherein the content of the monomer cage silsesquioxane is 50% by weight or less relative to the total amount of the polyorganosiloxane silsesquioxane ( Preferably it is 40 weight% or less, More preferably, it is 20 weight% or less). [Supplementary Note 19] The polyorganosiloxane according to any one of Supplementary Notes 1 to 18, wherein the content of the condensed silsesquioxane in the above-mentioned polyorganosiloxane is two times that of the above-mentioned polyorganosiloxane. The total amount of hemioxane is 20% by weight or more (preferably 25 to 90% by weight, more preferably 30 to 80% by weight, and still more preferably 40 to 70% by weight). [Supplementary Note 20] The polyorganosiloxane sesquioxane as described in Supplementary Note 19, wherein the number-average molecular weight (Mn) of the above-mentioned condensed silsesquioxane in terms of standard polystyrene based on gel permeation chromatography is 2000 ~50000 (preferably 2500 to 40000, more preferably 3000 to 30000). [Supplementary Note 21] The polyorganosiloxane sesquioxane according to any one of Supplementary Notes 1 to 20, wherein the number average molecular weight (Mn) in terms of standard polystyrene conversion based on gel permeation chromatography is 2000 to 50000 ( Preferably it is 2500-40000, More preferably, it is 3000-30000). [Supplementary Note 22] The polyorganosiloxane sesquioxane according to any one of Supplementary Notes 1 to 21, wherein the molecular weight dispersion (Mw/Mn) in terms of standard polystyrene based on gel permeation chromatography is 1.0~ 4.0 (preferably 1.1 to 3.0, more preferably 1.2 to 2.5). [Supplementary Note 23] The polyorganosiloxane sesquioxane according to any one of Supplementary Notes 1 to 22, wherein the 5% weight reduction temperature (T d5 ) in an air environment is 330°C or higher (for example, 330 to 450°C, Preferably it is 340 degreeC or more, More preferably, it is 350 degreeC or more). [Supplementary Note 24] A curable composition containing the polyorganosiloxane sesquioxane according to any one of Supplementary Notes 1 to 23. [Supplementary Note 25] The curable composition according to Supplementary Note 24, wherein the content of the polyorganosiloxane sesquioxane is 70 to 100% by weight relative to the total amount (100% by weight) of the curable composition excluding the solvent (80-99.8weight% is preferable, More preferably, it is 90-99.5weight%). [Supplementary Note 26] The curable composition according to Supplementary Note 22 or 23, wherein the ratio of the polyorganosiloxane sesquioxane to the total amount (100% by weight) of the cationic curable compound or the radical curable compound It is 70 to 100 weight% (preferably 75 to 98 weight%, more preferably 80 to 95 weight%). [Supplementary Note 27] The curable composition according to any one of Supplementary Notes 24 to 26, which contains a hardening catalyst. [Supplementary Note 28] The curable composition according to Supplementary Note 27, which contains a photopolymerization initiator or a thermal polymerization initiator as the curing catalyst. [Supplementary Note 29] The curable composition according to Supplementary Note 27 or 28, which contains a cationic polymerization initiator or a radical polymerization initiator as the curing catalyst. [Supplementary Note 30] The curable composition according to Supplementary Note 29, wherein the cationic polymerization initiator is a photocationic polymerization initiator or a thermal cationic polymerization initiator. [Supplementary Note 31] The curable composition according to Supplementary Note 30, wherein the photocationic polymerization initiator is selected from the group consisting of pernium salts, iodonium salts, selenium salts, ammonium salts, phosphonium salts, and transition metal complex ions and anions One or more photocationic polymerization initiators in the group consisting of salts. [Supplementary Note 32] The curable composition as described in Supplementary Note 30, wherein the thermal cationic polymerization initiator is selected from the group consisting of aryl perionium salts, aryl iodonium salts, aromatic hydrocarbon-ion complexes, quaternary ammonium salts, and aluminum chelate One or more compounds in the group consisting of boron trifluoride amine complex and boron trifluoride amine complex. [Supplementary Note 33] The curable composition according to Supplementary Note 29, wherein the radical polymerization initiator is a photoradical polymerization initiator or a thermal radical polymerization initiator. [Supplementary Note 34] The curable composition according to Supplementary Note 33, wherein the photoradical polymerization initiator is selected from the group consisting of 2-amino-2-benzyl-1-phenylalkane compounds, imidazole compounds, halomethyl compounds base three
Figure 110131229-A0304-12-0000-4
Compounds, and halomethyl
Figure 110131229-A0304-12-0059-1
One or more photo-radical polymerization initiators in the group consisting of oxadiazole compounds. [Supplementary Note 35] The curable composition according to Supplementary Note 33, wherein the thermal radical polymerization initiator is an organic peroxide. [Supplementary Note 36] The curable composition according to any one of Supplementary Notes 27 to 35, which contains other cationic curable compounds other than the above-mentioned polyorganosilosilsesquioxane and/or other than the above-mentioned polyorganosilsesquioxane Other free radical hardening compounds. [Appendix 37] The curable composition according to appendix 36, wherein the content of the hardening catalyst is 0.01 to 3.0 parts by weight relative to 100 parts by weight of the total amount of the polyorganosiloxane and the other cationic curable compounds. parts by weight (preferably 0.05 to 3.0 parts by weight, more preferably 0.1 to 1.0 parts by weight, still more preferably 0.3 to 1.0 parts by weight). [Supplementary Note 38] The curable composition according to Supplementary Note 36 or 37, wherein the other cationic curable compound comprises an epoxy compound, an oxetane compound, or a vinyl ether compound other than the above-mentioned polyorganosiloxane . [Supplementary Note 39] The curable composition according to Supplementary Note 38, wherein the epoxy compound is an alicyclic epoxy compound, an aromatic epoxy compound, or an aliphatic epoxy compound. [Supplementary Note 40] The curable composition according to any one of Supplementary Notes 36 to 39, which contains a (meth)acrylic compound other than the polyorganosiloxane sesquioxane as the other radical curable compound. [Supplementary Note 41] The curable composition according to any one of Supplementary Notes 36 to 40, wherein the content (compounding amount) of the above-mentioned other cationic curable compound and/or the above-mentioned other radical curable compound is relative to the above-mentioned polyorganic The total amount of silsesquioxane, the above-mentioned other cation-curable compound, and the above-mentioned other radical-curable compound is 50% by weight or less (preferably 30% by weight or less, more preferably 10% by weight or less). [Supplementary Note 42] The curable composition according to any one of Supplementary Notes 24 to 41, which contains a polymerization stabilizer. [Supplementary Note 43] The curable composition according to Supplementary Note 42, wherein the polymerization stabilizer is at least one selected from the group consisting of hindered amine-based compounds, perylene sulfate-based compounds, and phosphite-based compounds Polymeric stabilizer. [Supplementary Note 44] The curable composition according to Supplementary Note 42 or 43, wherein the content of the polymerization stabilizer is 0.005 parts by weight or more (preferably 0.01 to 10 parts by weight relative to 100 parts by weight of the polyorganosiloxane sesquioxane) parts by weight, more preferably 0.02 to 1 part by weight). [Supplementary Note 45] The curable composition according to any one of Supplementary Notes 42 to 44, which contains the above-mentioned polymerization stabilizer and hardening catalyst, and the content of the polymerization stabilizer is 1 part by weight or more relative to 100 parts by weight of the hardening catalyst ( Preferably it is 3-200 weight part, More preferably, it is 5-150 weight part). [Supplementary Note 44] The curable composition according to any one of Supplementary Notes 24 to 45, which contains a solvent. [Supplementary Note 45] The curable composition according to Supplementary Note 44, wherein the boiling point of the solvent is 170°C or lower. [Supplementary Note 46] The curable composition according to Supplementary Note 44 or 45, wherein the amount of the solvent used is 30 to 80% by weight (preferably 40% by weight) based on the concentration of the nonvolatile matter contained in the curable composition. to 70% by weight, more preferably 50 to 60% by weight). [Supplementary Note 47] The curable composition according to any one of Supplementary Notes 24 to 46, which is liquid at normal temperature (about 25°C). [Supplementary Note 48] The curable composition according to any one of Supplementary Notes 24 to 47, wherein the viscosity at 25°C is 300 to 20000 mPa·s (preferably 500 to 10000 mPa·s, more preferably 1000 to 8000 mPa·s). mPa·s). [Supplementary Note 49] The curable composition according to any one of Supplementary Notes 24 to 48, which is a curable composition for forming a hard coat layer. [Supplementary Note 50] The curable composition according to any one of Supplementary Notes 24 to 48, which is a curable composition for an adhesive. [Supplementary Note 51] A hardened product, which is the hardened product of the curable composition according to any one of Supplementary Notes 24 to 50. [Supplementary Note 52] A hard coat film comprising a base material and a hard coat layer which is the cured product according to Supplementary Note 51 in layers. [Supplementary Note 53] The hard coating film as described in Supplementary Note 52, wherein the substrate is a plastic substrate, a metal substrate, a ceramic substrate, a semiconductor substrate, a glass substrate, a paper substrate, a wood substrate, or a surface of The substrate for the coated surface. [Supplementary Note 54] The hard coat film according to Supplementary Note 52 or 53, wherein the base material has a thickness of 0.01 to 10000 μm. [Supplementary Note 55] The hard coat film according to any one of Supplementary Notes 52 to 54, wherein the thickness of the hard coat layer is 1 to 200 μm (preferably 3 to 150 μm). [Supplementary Note 56] The hard coat film according to any one of Supplementary Notes 52 to 55, wherein the haze when the thickness of the hard coat layer is 50 μm is 1.5% or less (preferably 1.0% or less). [Supplementary Note 57] The hard coat film according to any one of Supplementary Notes 52 to 56, wherein the haze when the thickness of the hard coat layer is 50 μm is 0.1% or more. [Supplementary Note 58] The hard coat film according to any one of Supplementary Notes 52 to 57, wherein the total light transmittance when the thickness of the hard coat layer is 50 μm is 85% or more (preferably 90% or more). [Supplementary Note 59] The hard coat film according to any one of Supplementary Notes 52 to 58, which has a surface protection film on the surface of the hard coat layer. [Supplementary Note 60] The hard coat film according to any one of Supplementary Notes 52 to 59, which has a thickness of 1 to 10000 μm. [Supplementary Note 61] A transfer film comprising a base material and a hard coat layer formed on a release layer formed on at least one surface of the base material, the hard coat layer having the curable composition described in Supplementary Note 49 layer of things. [Supplementary Note 62] The transfer film according to Supplementary Note 61, wherein the peel strength between the mold release layer and the hard coat layer is 30 to 500 mN/24 mm (preferably 40 to 300 mN/24 mm, more preferably 40 to 300 mN/24 mm). 50 to 200 mN/24 mm). [Supplementary Note 63] The transfer film according to Supplementary Note 61 or 62, wherein an adhesion promoter coating layer and an adhesive layer are further laminated on the hard coat layer in this order. [Supplementary Note 64] The transfer film according to Supplementary Note 63, wherein the thickness of the tackifier coating layer is in the range of 0.1 to 20 μm (preferably 0.5 to 5 μm). [Supplementary Note 65] The transfer film according to any one of Supplementary Notes 61 to 64, wherein the adhesive layer has a thickness of 0.1 to 10 μm (preferably 0.5 to 5 μm). [Supplementary Note 66] The transfer film according to any one of Supplementary Notes 61 to 65, further comprising at least one coloring layer. [Supplementary Note 67] The transfer film according to Supplementary Note 66, wherein the colored layer is provided when a decorative film for transferring the design layer and/or the concealment layer to a molded article is formed. [Supplementary Note 68] An adhesive sheet comprising a substrate and an adhesive layer, the adhesive layer being located on at least one side of the substrate and containing the curable composition described in Supplementary Note 50. [Supplementary Note 69] A use of the curable composition according to Supplementary Note 50, which is used for an adhesive layer in an adhesive sheet having a substrate and an adhesive layer on at least one side of the substrate. [Supplementary Note 70] An adhesive sheet comprising a substrate, an adhesion-promoting coating and an adhesive layer, the adhesion-promoting coating and the adhesive layer being located on at least one side of the substrate, and the adhesion-promoting coating containing a silane coupling agent, The adhesive layer is a layer containing the curable composition described in Supplementary Note 50; the adhesive layer is provided on the surface of the adhesion-promoting coating. [Supplementary Note 71] Use of the curable composition according to any one of Supplementary Notes 22 to 48 as a curable composition for forming a hard coat layer. [Supplementary Note 72] Use of the curable composition according to any one of Supplementary Notes 22 to 48, as a curable composition for an adhesive. [Supplementary Note 73] Use of the cured product according to Supplementary Note 51, which is used as a hard coat layer in a hard coat film having a base material and a hard coat layer. [Supplementary Note 74] A use of the curable composition described in Supplementary Note 49, which is used in a transfer film having a base material and a hard coat layer formed on a release layer formed on at least one surface of the base material hard coating. [Supplementary Note 75] A use of the curable composition described in Supplementary Note 50, which is used for an adhesive layer in an adhesive sheet having a substrate, an adhesion-promoting coating and an adhesive layer, the adhesion-promoting coating and the adhesive layer On at least one side of the substrate, the adhesion-promoting coating contains a silane coupling agent, and the adhesive layer is disposed on the surface of the adhesion-promoting coating. [Industrial Availability]

本發明之聚有機矽倍半氧烷能夠用作硬塗膜、或接著片原料。The polyorganosiloxane sesquioxane of the present invention can be used as a raw material for a hard coating film or an adhesive sheet.

1:硬塗膜 11:硬塗層 12:基材 2:轉印用膜 21:基材 22:脫模層 23:硬塗層(未硬化或半硬化之硬塗層) 24:增黏塗層 25:著色層 26:接著劑層 3:接著片 31:接著劑層 32:基材 33:增黏塗層 1: Hard coating 11: Hard coating 12: Substrate 2: Film for transfer 21: Substrate 22: Release layer 23: Hard coating (unhardened or semi-hardened hard coating) 24: Tackifier coating 25: Shading Layer 26: Adhesive layer 3: Next film 31: Adhesive layer 32: Substrate 33: Tackifier coating

[圖1]係實施例1中獲得之本發明之含環氧基之縮合矽倍半氧烷之 29Si-NMR圖譜。 [圖2]係實施例1中獲得之本發明之含環氧基之縮合矽倍半氧烷之GPC圖。 [圖3]係實施例1中獲得之本發明之含環氧基之縮合矽倍半氧烷之UPLC-MS圖。 [圖4]係實施例1中獲得之本發明之含環氧基之縮合矽倍半氧烷之UPLC-MS圖。 [圖5]係分子式C 144H 234O 45Si 18(Z=2)之MS模擬圖。 [圖6]係分子式C 128H 210O 41Si 16(Z=2)之MS模擬圖。 [圖7]係實施例2中獲得之本發明之含環氧基之縮合矽倍半氧烷之 29Si-NMR圖譜。 [圖8]係實施例2中獲得之本發明之含環氧基之縮合矽倍半氧烷之GPC圖。 [圖9]係表示本發明之硬塗膜之一實施方式之示意圖(剖面圖)。 [圖10]係表示本發明之轉印用膜之一實施方式之示意圖(剖面圖)。 [圖11]係表示本發明之接著片之一實施方式之示意圖(剖面圖)。 Fig. 1 is a 29 Si-NMR spectrum of the epoxy group-containing condensed silsesquioxane of the present invention obtained in Example 1. [Fig. FIG. 2 is a GPC chart of the epoxy group-containing condensed silsesquioxane of the present invention obtained in Example 1. FIG. FIG. 3 is a UPLC-MS chart of the epoxy group-containing condensed silsesquioxane of the present invention obtained in Example 1. FIG. FIG. 4 is a UPLC-MS chart of the epoxy group-containing condensed silsesquioxane of the present invention obtained in Example 1. FIG. [ Fig. 5 ] It is an MS simulation diagram of the molecular formula C 144 H 234 O 45 Si 18 (Z=2). [ Fig. 6 ] It is an MS simulation diagram of the molecular formula C 128 H 210 O 41 Si 16 (Z=2). FIG. 7 is a 29 Si-NMR spectrum of the epoxy group-containing condensed silsesquioxane of the present invention obtained in Example 2. FIG. FIG. 8 is a GPC chart of the epoxy group-containing condensed silsesquioxane of the present invention obtained in Example 2. FIG. It is a schematic diagram (sectional drawing) which shows one Embodiment of the hard-coat film of this invention. 10 is a schematic view (sectional view) showing one embodiment of the transfer film of the present invention. Fig. 11 is a schematic view (sectional view) showing one embodiment of the adhesive sheet of the present invention.

Claims (20)

一種聚有機矽倍半氧烷,其含有矽倍半氧烷,該矽倍半氧烷是含有選自由下述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷所組成之群中之至少一種之籠型矽倍半氧烷縮合2個以上而得之縮合物且分子量為8000以下; ・式(1):[R 1SiO 3/2] 8[R 1SiO 2/2(OR c)] 1(式(1)中,R 1分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) ・式(2):[R 2SiO 3/2] 6[R 2SiO 2/2(OR c)] 2(式(2)中,R 2分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(3):[R 3SiO 3/2] 8[R 3SiO 2/2(OR c)] 2(式(3)中,R 3分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(4):[R 4SiO 3/2] 10[R 4SiO 2/2(OR c)] 2(式(4)中,R 4分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子)。 A polyorganosiloxane containing silsesquioxane, the silsesquioxane is selected from the following compositional formula (1), compositional formula (2), compositional formula (3) and compositional formula ( 4) A condensate obtained by condensing at least one of the clathrate silsesquioxanes in the group consisting of the indicated clathrate silsesquioxane and having a molecular weight of 8000 or less; ・Formula (1): [ R 1 SiO 3/2 ] 8 [R 1 SiO 2/2 (OR c )] 1 (in formula (1), R 1 is each independently a polymerizable functional group-containing group, a substituted or unsubstituted aryl group , substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom, and at least one is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (2): [R 2 SiO 3/2 ] 6 [R 2 SiO 2/2 (OR c ) ] 2 (in formula (2), R 2 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted aralkyl group, Cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c independently represents carbon number 1-4 alkyl group or hydrogen atom) ・Formula ( 3 ): [ R3SiO3/2 ] 8 [R3SiO2 /2 ( ORc )] 2 functional group, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted an unsubstituted alkenyl group or a hydrogen atom, and at least one of which is a group containing a polymerizable functional group; R c independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (4): [R 4 SiO 3/2 ] 10 [R 4 SiO 2/2 (OR c )] 2 (in formula (4), R 4 is independently a polymerizable functional group-containing group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, substituted or unsubstituted cycloalkyl group, substituted or unsubstituted alkyl group, substituted or unsubstituted alkenyl group, or hydrogen atom, and at least one of which is polymer-containing group of sexual functional groups; R c independently represents an alkyl group with 1 to 4 carbon atoms or a hydrogen atom). 如請求項1之聚有機矽倍半氧烷,其中,上述含有聚合性官能基之基為下述式(1A)
Figure 03_image079
[式(1A)中,R 1A表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1B)
Figure 03_image081
[式(1B)中,R 1B表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1C)
Figure 03_image083
[式(1C)中,R 1C表示直鏈或支鏈狀之伸烷基] 所表示之基、或下述式(1D)
Figure 03_image085
[式(1D)中,R 1D表示直鏈或支鏈狀之伸烷基] 所表示之基。
The polyorganosiloxane as claimed in claim 1, wherein the above-mentioned polymerizable functional group-containing group is the following formula (1A)
Figure 03_image079
[In formula (1A), R 1A represents a linear or branched alkylene group] The group represented by the following formula (1B)
Figure 03_image081
[In formula (1B), R 1B represents a linear or branched alkylene group] The group represented by the following formula (1C)
Figure 03_image083
[In formula (1C), R 1C represents a linear or branched alkylene group] represented by the group, or the following formula (1D)
Figure 03_image085
A group represented by [in formula (1D), R 1D represents a linear or branched alkylene group].
如請求項1或2之聚有機矽倍半氧烷,其中,相對於上述組成式(1)中之R 1、組成式(2)中之R 2、組成式(3)中之R 3、及組成式(4)中之R 4之整體,含有聚合性官能基之基之比率為30%以上。 The polyorganosiloxane sesquioxane of claim 1 or 2, wherein, with respect to R 1 in the above composition formula (1), R 2 in the composition formula (2), R 3 in the composition formula ( 3 ), And the whole of R 4 in the composition formula (4), the ratio of the group containing a polymerizable functional group is 30% or more. 如請求項1或2之聚有機矽倍半氧烷,其中,下述式(I) [R aSiO 3/2]                (I) [式(I)中,R a表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子] 所表示之構成單元與下述式(II) [R bSiO 2/2(OR c)]        (II) [式(II)中,R b表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子;R c表示氫原子或碳數1~4之烷基] 所表示之構成單元之莫耳比[式(I)所表示之構成單元/式(II)所表示之構成單元]為1以上500以下。 The polyorganosiloxane sesquioxane of claim 1 or 2, wherein the following formula (I) [R a SiO 3/2 ] (I) [in formula (I), R a represents a polymer containing a polymerizable functional group aryl, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted The structural unit represented by the alkenyl group or hydrogen atom] is the same as the following formula (II) [R b SiO 2/2 (OR c )] (II) [In formula (II), R b represents a polymerizable functional group , substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted A substituted alkenyl group, or a hydrogen atom; R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms] Molar ratio of the constituent unit represented by [the constituent unit represented by formula (I)/represented by formula (II)] The constituent unit] is 1 or more and 500 or less. 如請求項1或2之聚有機矽倍半氧烷,其數量平均分子量為2000~50000。For example, the polyorganosiloxane sesquioxane of claim 1 or 2 has a number-average molecular weight of 2,000 to 50,000. 如請求項1或2之聚有機矽倍半氧烷,其分子量分散度(重量平均分子量/數量平均分子量)為1.0~4.0。As claimed in claim 1 or 2, the polyorganosiloxane sesquioxane has a molecular weight dispersion (weight average molecular weight/number average molecular weight) of 1.0 to 4.0. 一種硬化性組成物,其含有請求項1至6中任一項之聚有機矽倍半氧烷。A curable composition containing the polyorganosiloxane of any one of claims 1 to 6. 如請求項7之硬化性組成物,其進而含有硬化觸媒。The curable composition according to claim 7, which further contains a curable catalyst. 如請求項8之硬化性組成物,其中,上述硬化觸媒為光或熱聚合起始劑。The curable composition according to claim 8, wherein the curing catalyst is a photo- or thermal polymerization initiator. 如請求項7之硬化性組成物,其進而含有聚合穩定劑。The curable composition according to claim 7, which further contains a polymerization stabilizer. 如請求項7之硬化性組成物,其為硬塗層形成用硬化性組成物。The curable composition according to claim 7, which is a curable composition for forming a hard coat layer. 如請求項7之硬化性組成物,其為接著劑用硬化性組成物。The curable composition according to claim 7, which is a curable composition for an adhesive. 一種硬化物,其為請求項7至12中任一項之硬化性組成物之硬化物。A cured product, which is the cured product of the curable composition of any one of claims 7 to 12. 一種硬塗膜,其積層有基材、及為請求項13之硬化物之硬塗層。A hard coat film comprising a base material and a hard coat layer which is the hardened product of claim 13 in layers. 一種轉印用膜,其積層有基材、及位於形成於該基材之至少一表面之脫模層上之硬塗層,該硬塗層為含有請求項11之硬化性組成物之層。A transfer film comprising a substrate and a hard coat layer formed on a release layer formed on at least one surface of the substrate, wherein the hard coat layer is a layer containing the curable composition of claim 11. 如請求項15之轉印用膜,其於上述硬塗層上依序進而積層增黏塗層(anchor coat layer)及接著劑層。The transfer film of claim 15, wherein an anchor coat layer and an adhesive layer are sequentially laminated on the hard coat layer. 如請求項15之轉印用膜,其進而含有至少一層之著色層。The transfer film according to claim 15, further comprising at least one coloring layer. 如請求項15之轉印用膜,其中,上述硬塗層之厚度為3~150 μm。The transfer film according to claim 15, wherein the thickness of the hard coat layer is 3 to 150 μm. 一種接著片,其具有基材及接著劑層,該接著劑層位於該基材上之至少一面,且為含有請求項12之硬化性組成物之層。An adhesive sheet comprising a base material and an adhesive layer, wherein the adhesive layer is located on at least one side of the base material and is a layer containing the curable composition of claim 12. 一種接著片,其具有基材、增黏塗層及接著劑層,該增黏塗層及該接著劑層位於該基材上之至少一面,該增黏塗層含有矽烷偶合劑,該接著劑層為含有請求項12之硬化性組成物之層;上述接著劑層設置於上述增黏塗層之表面上。An adhesive sheet, which has a base material, an adhesion-promoting coating and an adhesive layer, the adhesion-promoting coating and the adhesive layer are located on at least one side of the base material, the adhesion-promoting coating contains a silane coupling agent, and the adhesive agent The layer is a layer containing the curable composition of claim 12; the above-mentioned adhesive layer is provided on the surface of the above-mentioned adhesion-promoting coating.
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