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SG11201909402XA - Aerosol-free vessel for bubbling chemical precursors in a deposition process - Google Patents

Aerosol-free vessel for bubbling chemical precursors in a deposition process

Info

Publication number
SG11201909402XA
SG11201909402XA SG11201909402XA SG11201909402XA SG 11201909402X A SG11201909402X A SG 11201909402XA SG 11201909402X A SG11201909402X A SG 11201909402XA SG 11201909402X A SG11201909402X A SG 11201909402XA
Authority
SG
Singapore
Prior art keywords
tempe
international
parkway
vessel
river
Prior art date
Application number
Other languages
English (en)
Inventor
Charles Michael Birtcher
Gildardo Vivanco
Sergei V Ivanov
William Sheehy
Thomas Andrew Steidl
Original Assignee
Versum Materials Us Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Versum Materials Us Llc filed Critical Versum Materials Us Llc
Publication of SG11201909402XA publication Critical patent/SG11201909402XA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C3/00—Vessels not under pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0311—Closure means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0352—Pipes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Vapour Deposition (AREA)
  • Nozzles (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
SG11201909402X 2017-04-10 2018-04-06 Aerosol-free vessel for bubbling chemical precursors in a deposition process SG11201909402XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762483784P 2017-04-10 2017-04-10
PCT/US2018/026535 WO2018191125A1 (en) 2017-04-10 2018-04-06 Aerosol-free vessel for bubbling chemical precursors in a deposition process

Publications (1)

Publication Number Publication Date
SG11201909402XA true SG11201909402XA (en) 2019-11-28

Family

ID=63793009

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201909402X SG11201909402XA (en) 2017-04-10 2018-04-06 Aerosol-free vessel for bubbling chemical precursors in a deposition process

Country Status (8)

Country Link
US (1) US20200131630A1 (ja)
EP (1) EP3610052A4 (ja)
JP (1) JP7028955B2 (ja)
KR (1) KR102415265B1 (ja)
CN (2) CN108690971B (ja)
SG (1) SG11201909402XA (ja)
TW (1) TWI675120B (ja)
WO (1) WO2018191125A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11201909402XA (en) * 2017-04-10 2019-11-28 Versum Materials Us Llc Aerosol-free vessel for bubbling chemical precursors in a deposition process

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3690638A (en) * 1970-05-15 1972-09-12 Republic Steel Corp Apparatus and method for vaporizing molten metal
US5360572A (en) * 1991-11-29 1994-11-01 The United States Of America As Represented By The Secretary Of The Air Force Aerogel mesh getter
US5887117A (en) * 1997-01-02 1999-03-23 Sharp Kabushiki Kaisha Flash evaporator
US6358323B1 (en) * 1998-07-21 2002-03-19 Applied Materials, Inc. Method and apparatus for improved control of process and purge material in a substrate processing system
EP1374004A2 (en) * 2001-02-28 2004-01-02 Porter Instrument Company, Inc. Flow controller
EP1525337A2 (en) * 2002-07-30 2005-04-27 ASM America, Inc. Sublimation system employing carrier gas
US7464917B2 (en) * 2005-10-07 2008-12-16 Appiled Materials, Inc. Ampoule splash guard apparatus
US8986456B2 (en) * 2006-10-10 2015-03-24 Asm America, Inc. Precursor delivery system
US20160271519A1 (en) * 2013-05-03 2016-09-22 Jayden David Harman Vacuum Condenser
US10107490B2 (en) * 2014-06-30 2018-10-23 Lam Research Corporation Configurable liquid precursor vaporizer
US10563305B2 (en) * 2015-05-13 2020-02-18 Versum Materials Us, Llc Container for chemical precursors in a deposition process
SG11201909402XA (en) * 2017-04-10 2019-11-28 Versum Materials Us Llc Aerosol-free vessel for bubbling chemical precursors in a deposition process

Also Published As

Publication number Publication date
JP7028955B2 (ja) 2022-03-02
EP3610052A1 (en) 2020-02-19
TW201837226A (zh) 2018-10-16
KR20190128265A (ko) 2019-11-15
TWI675120B (zh) 2019-10-21
US20200131630A1 (en) 2020-04-30
EP3610052A4 (en) 2020-12-09
WO2018191125A1 (en) 2018-10-18
CN108690971B (zh) 2020-10-30
JP2020516775A (ja) 2020-06-11
KR102415265B1 (ko) 2022-06-29
CN108690971A (zh) 2018-10-23
CN208501094U (zh) 2019-02-15

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