JP7028955B2 - 堆積プロセスにおける化学前駆体のバブリングのためのエーロゾルフリー型ベッセル - Google Patents
堆積プロセスにおける化学前駆体のバブリングのためのエーロゾルフリー型ベッセル Download PDFInfo
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- JP7028955B2 JP7028955B2 JP2020504280A JP2020504280A JP7028955B2 JP 7028955 B2 JP7028955 B2 JP 7028955B2 JP 2020504280 A JP2020504280 A JP 2020504280A JP 2020504280 A JP2020504280 A JP 2020504280A JP 7028955 B2 JP7028955 B2 JP 7028955B2
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- 239000012707 chemical precursor Substances 0.000 title claims description 17
- 230000005587 bubbling Effects 0.000 title description 6
- 238000005137 deposition process Methods 0.000 title description 2
- 238000000034 method Methods 0.000 claims description 40
- 239000000443 aerosol Substances 0.000 claims description 18
- 230000007704 transition Effects 0.000 claims description 8
- 239000012530 fluid Substances 0.000 claims description 7
- 238000007598 dipping method Methods 0.000 claims 2
- 239000002243 precursor Substances 0.000 description 13
- 239000007788 liquid Substances 0.000 description 9
- 238000013461 design Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 239000012071 phase Substances 0.000 description 7
- 239000012159 carrier gas Substances 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000000231 atomic layer deposition Methods 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000012705 liquid precursor Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 238000010146 3D printing Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 210000001061 forehead Anatomy 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C3/00—Vessels not under pressure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0311—Closure means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0352—Pipes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Vapour Deposition (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Nozzles (AREA)
Description
本願は、2017年4月10日出願の米国仮出願第62/483,784号に対する出願であり、その全体をここに参照することによって本明細書の内容とする。
開始点、終点、および開始点と終点との間の方向転換を有する流管、および、
開始点から流れるエーロゾルを含む流体、
を含んでおり、その方向転換は、蒸気への相転移のために、エーロゾルフリー型ベッセル中のエーロゾルの滞留時間を最大化し、そして流管は、開始点から終点へと漸次に上昇している。
側壁、
基底部、
蓋、
少なくとも1つの開示された、その蓋に取り付けられたエーロゾルフリー型ベッセル、
その蓋を通過する入口管、および、
その蓋を通過する出口、
を含む容器であり、ここで出口は、最後のエーロゾルフリー型ベッセルの出口と流体連結されている。
少なくとも1つの開示されたエーロゾルフリー型ベッセル、
化学前駆体をプロセス装置へと供給するための容器であって、
側壁、
基底部、
蓋、および、
この蓋を通過する出口、
ここで、この蓋は、開示された少なくとも1つのエーロゾルフリー型ベッセルが取り付けられており、そしてこの出口は、最後のエーロゾルフリー型ベッセルの出口と流体連結されている、ならびに、
容器の出口からの化学前駆体の蒸気、
を含んでいる容器、
を含む装置である。
少なくとも1つのエーロゾルフリー型ベッセルを準備する工程、
容器であって、
側壁、
基底部、
蓋、および、
この蓋を通過する出口、
ここで、この蓋は、開示された少なくとも1つのエーロゾルフリー型ベッセルに取り付けられており、そしてこの出口は、最後のエーロゾルフリー型ベッセルの出口と流体連結されている、
を含む容器を準備する工程、
化学前駆体の蒸気を、前記容器の前記出口からプロセス装置へと供給する工程、
を含む方法である。
Claims (11)
- ベッセルであって、
開始点、終点、および前記開始点と前記終点との間の方向転換を有する流管、ならびに、
前記開始点から流れるエーロゾルを含む流体、
を含んでなり、
前記方向転換が、前記ベッセル中の前記エーロゾルの、蒸気への相転移のための滞留時間を最大化し、そして、
前記流管が、前記開始点から前記終点まで徐々に上昇しており、
前記ベッセルの出口においてエーロゾルを含まない、
ベッセル(但し、前記方向転換がバッフルによって引き起こされるベッセルを除く)。 - 前記流管は、少なくとも円形の一部、少なくとも楕円形の、少なくとも正方形の一部、少なくとも矩形の一部、およびそれらの組み合わせ、からなる群から選択された形状を有する横断面を有しており、前記流管の横断面積は、前記開始点から前記終点まで減少している、請求項1記載のベッセル。
- 前記流管を覆う蓋を更に含む、請求項1記載のベッセル。
- 前記流管が、螺旋または蛇行した形状を有する管である、請求項1記載のベッセル。
- 上部表面をさらに含み、前記ベッセルの前記上部表面が、円形、楕円、正方形、矩形、蛇行した形状、およびそれらの組み合わせから選択された形状を有する、請求項1記載のベッセル。
- 前記流管の前記開始点が、前記ベッセルに入るエーロゾルを低減するようにスクリーンを含む、請求項1記載のベッセル。
- 蒸気への相転移を促進するためのヒータを更に含む、請求項1記載のベッセル。
- 前記ベッセルを容器の蓋または少なくとも1つの他のベッセルに取り付けるための、取り付け用の穴をさらに含む、請求項1記載のベッセル。
- 化学前駆体をプロセス装置へと供給するためのバブラー容器であって、
側壁、
基底部、
蓋、
前記蓋に取り付けられた、少なくとも1つの、請求項1~8のいずれか1項記載のベッセル、
前記蓋を通過する入口管、前記入口管は、前記バブラー容器のための浸漬管である、ならびに、
前記蓋を通過する出口、
を含んでなり、
前記出口が、最後の前記ベッセルの前記出口と流体連結されている、
バブラー容器。 - 化学前駆体をプロセス装置へ貯蔵および供給するための装置であって、
化学前駆体をプロセス装置へと供給するためのバブラー容器であって、
側壁、
基底部、
蓋、
前記蓋に取り付けられた、少なくとも1つの、請求項1~8のいずれか1項記載のベッセル、
前記蓋を通過する入口管、前記入口管は、前記バブラー容器のための浸漬管である、ならびに、
前記蓋を通過する出口、
を含んでなり、
前記出口が、最後の前記ベッセルの前記出口と流体連結されている、
を含むバブラー容器、ならびに、
前記バブラー容器の前記出口からの化学前駆体の蒸気、
含んでなる、装置。 - 化学前駆体をプロセス装置へ貯蔵および供給するための方法であって、
請求項10記載の装置を準備する工程、ならびに、
前記化学前駆体の前記蒸気を、前記バブラー容器の前記出口から前記プロセス装置へと供給する工程、
を含んでなる、方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762483784P | 2017-04-10 | 2017-04-10 | |
US62/483,784 | 2017-04-10 | ||
PCT/US2018/026535 WO2018191125A1 (en) | 2017-04-10 | 2018-04-06 | Aerosol-free vessel for bubbling chemical precursors in a deposition process |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020516775A JP2020516775A (ja) | 2020-06-11 |
JP7028955B2 true JP7028955B2 (ja) | 2022-03-02 |
Family
ID=63793009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020504280A Active JP7028955B2 (ja) | 2017-04-10 | 2018-04-06 | 堆積プロセスにおける化学前駆体のバブリングのためのエーロゾルフリー型ベッセル |
Country Status (8)
Country | Link |
---|---|
US (1) | US20200131630A1 (ja) |
EP (1) | EP3610052A4 (ja) |
JP (1) | JP7028955B2 (ja) |
KR (1) | KR102415265B1 (ja) |
CN (2) | CN208501094U (ja) |
SG (1) | SG11201909402XA (ja) |
TW (1) | TWI675120B (ja) |
WO (1) | WO2018191125A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7028955B2 (ja) * | 2017-04-10 | 2022-03-02 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | 堆積プロセスにおける化学前駆体のバブリングのためのエーロゾルフリー型ベッセル |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070079759A1 (en) | 2005-10-07 | 2007-04-12 | Applied Materials, Inc. | Ampoule splash guard apparatus |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
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US3690638A (en) * | 1970-05-15 | 1972-09-12 | Republic Steel Corp | Apparatus and method for vaporizing molten metal |
US5360572A (en) * | 1991-11-29 | 1994-11-01 | The United States Of America As Represented By The Secretary Of The Air Force | Aerogel mesh getter |
US5887117A (en) * | 1997-01-02 | 1999-03-23 | Sharp Kabushiki Kaisha | Flash evaporator |
US6358323B1 (en) * | 1998-07-21 | 2002-03-19 | Applied Materials, Inc. | Method and apparatus for improved control of process and purge material in a substrate processing system |
US6694809B2 (en) * | 2001-02-28 | 2004-02-24 | Porter Instrument Company, Inc. | Flow controller |
US7122085B2 (en) * | 2002-07-30 | 2006-10-17 | Asm America, Inc. | Sublimation bed employing carrier gas guidance structures |
US8986456B2 (en) * | 2006-10-10 | 2015-03-24 | Asm America, Inc. | Precursor delivery system |
WO2014178919A1 (en) * | 2013-05-03 | 2014-11-06 | Jayden David Harman | Vacuum condenser |
US10107490B2 (en) * | 2014-06-30 | 2018-10-23 | Lam Research Corporation | Configurable liquid precursor vaporizer |
US10563305B2 (en) * | 2015-05-13 | 2020-02-18 | Versum Materials Us, Llc | Container for chemical precursors in a deposition process |
JP7028955B2 (ja) * | 2017-04-10 | 2022-03-02 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | 堆積プロセスにおける化学前駆体のバブリングのためのエーロゾルフリー型ベッセル |
-
2018
- 2018-04-06 JP JP2020504280A patent/JP7028955B2/ja active Active
- 2018-04-06 KR KR1020197033084A patent/KR102415265B1/ko active IP Right Grant
- 2018-04-06 WO PCT/US2018/026535 patent/WO2018191125A1/en unknown
- 2018-04-06 EP EP18784890.8A patent/EP3610052A4/en active Pending
- 2018-04-06 US US16/603,757 patent/US20200131630A1/en not_active Abandoned
- 2018-04-06 SG SG11201909402X patent/SG11201909402XA/en unknown
- 2018-04-09 CN CN201820494808.3U patent/CN208501094U/zh not_active Expired - Fee Related
- 2018-04-09 CN CN201810312046.5A patent/CN108690971B/zh active Active
- 2018-04-09 TW TW107112052A patent/TWI675120B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070079759A1 (en) | 2005-10-07 | 2007-04-12 | Applied Materials, Inc. | Ampoule splash guard apparatus |
Also Published As
Publication number | Publication date |
---|---|
TWI675120B (zh) | 2019-10-21 |
CN108690971B (zh) | 2020-10-30 |
SG11201909402XA (en) | 2019-11-28 |
EP3610052A1 (en) | 2020-02-19 |
TW201837226A (zh) | 2018-10-16 |
EP3610052A4 (en) | 2020-12-09 |
JP2020516775A (ja) | 2020-06-11 |
KR102415265B1 (ko) | 2022-06-29 |
CN108690971A (zh) | 2018-10-23 |
KR20190128265A (ko) | 2019-11-15 |
CN208501094U (zh) | 2019-02-15 |
US20200131630A1 (en) | 2020-04-30 |
WO2018191125A1 (en) | 2018-10-18 |
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