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SG10201705205WA - Toroidal plasma abatement apparatus and method - Google Patents

Toroidal plasma abatement apparatus and method

Info

Publication number
SG10201705205WA
SG10201705205WA SG10201705205WA SG10201705205WA SG10201705205WA SG 10201705205W A SG10201705205W A SG 10201705205WA SG 10201705205W A SG10201705205W A SG 10201705205WA SG 10201705205W A SG10201705205W A SG 10201705205WA SG 10201705205W A SG10201705205W A SG 10201705205WA
Authority
SG
Singapore
Prior art keywords
abatement apparatus
toroidal plasma
plasma abatement
toroidal
plasma
Prior art date
Application number
SG10201705205WA
Inventor
Xing Chen
Ilya Pokidov
Feng Tian
Ken Tran
David Lam
Kevin W Wenzel
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Publication of SG10201705205WA publication Critical patent/SG10201705205WA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • H01J37/32449Gas control, e.g. control of the gas flow
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/323Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/76Gas phase processes, e.g. by using aerosols
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321Discharge generated by other radiation
    • H01J37/32339Discharge generated by other radiation using electromagnetic radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357Generation remote from the workpiece, e.g. down-stream
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32623Mechanical discharge control means
    • H01J37/32651Shields, e.g. dark space shields, Faraday shields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3266Magnetic control means
    • H01J37/32669Particular magnets or magnet arrangements for controlling the discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816Pressure
    • H01J37/32834Exhausting
    • H01J37/32844Treating effluent gases
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32917Plasma diagnostics
    • H01J37/32935Monitoring and controlling tubes by information coming from the object and/or discharge
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/20Halogens or halogen compounds
    • B01D2257/206Organic halogen compounds
    • B01D2257/2064Chlorine
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332Coating
    • H01J2237/3321CVD [Chemical Vapor Deposition]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334Etching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645Radiofrequency discharges
    • H05H1/4652Radiofrequency discharges using inductive coupling means, e.g. coils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00Applications of plasma devices
    • H05H2245/10Treatment of gases
    • H05H2245/15Ambient air; Ozonisers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02CCAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00Capture or disposal of greenhouse gases
    • Y02C20/30Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Power Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Plasma Technology (AREA)
  • Treating Waste Gases (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
SG10201705205WA 2013-03-14 2014-03-14 Toroidal plasma abatement apparatus and method SG10201705205WA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201361783360P 2013-03-14 2013-03-14

Publications (1)

Publication Number Publication Date
SG10201705205WA true SG10201705205WA (en) 2017-07-28

Family

ID=50732285

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201705205WA SG10201705205WA (en) 2013-03-14 2014-03-14 Toroidal plasma abatement apparatus and method
SG11201507152RA SG11201507152RA (en) 2013-03-14 2014-03-14 Toroidal plasma abatement apparatus and method

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201507152RA SG11201507152RA (en) 2013-03-14 2014-03-14 Toroidal plasma abatement apparatus and method

Country Status (8)

Country Link
US (3) US9630142B2 (en)
EP (1) EP2969134A1 (en)
JP (2) JP6154953B2 (en)
KR (1) KR102009513B1 (en)
CN (1) CN105209156B (en)
SG (2) SG10201705205WA (en)
TW (1) TWI634938B (en)
WO (1) WO2014152908A1 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105879599A (en) * 2014-12-24 2016-08-24 苏州超等环保科技有限公司 Anti-explosion plasma organic waste gas treatment device
US20160233055A1 (en) * 2015-02-06 2016-08-11 Mks Instruments Inc. Apparatus and Method for Metastable Enhanced Plasma Ignition
CN107810542A (en) 2015-05-21 2018-03-16 普拉斯玛比利提有限责任公司 Peripheral plasma processing unit with Forming Workpiece fixture
JP2017088916A (en) * 2015-11-04 2017-05-25 株式会社神戸製鋼所 Film deposition apparatus using silicon raw material
US11251019B2 (en) * 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device
US20180226234A1 (en) * 2017-02-09 2018-08-09 Applied Materials, Inc. Plasma abatement technology utilizing water vapor and oxygen reagent
JP6863199B2 (en) 2017-09-25 2021-04-21 トヨタ自動車株式会社 Plasma processing equipment
KR101959165B1 (en) * 2018-04-27 2019-03-15 (주)엔노피아 Plasma waste gas processing apparatus and system
US11019715B2 (en) 2018-07-13 2021-05-25 Mks Instruments, Inc. Plasma source having a dielectric plasma chamber with improved plasma resistance
KR102630346B1 (en) * 2018-10-31 2024-01-30 주식회사 뉴파워 프라즈마 Plasma reactor for multi-controlling temperature
GB2582948B (en) * 2019-04-10 2021-12-08 Thermo Fisher Scient Bremen Gmbh Plasma source chamber for a spectrometer
US10553403B1 (en) * 2019-05-08 2020-02-04 Mks Instruments, Inc. Polygonal toroidal plasma source
US11348784B2 (en) 2019-08-12 2022-05-31 Beijing E-Town Semiconductor Technology Co., Ltd Enhanced ignition in inductively coupled plasmas for workpiece processing
CN110718437A (en) * 2019-09-16 2020-01-21 明远精密科技股份有限公司 Remote plasma generating device
CN111088087B (en) * 2019-12-30 2021-07-20 广东瓦格耐电力科技有限公司 Biogas pretreatment device for biogas generator set
US20240194454A1 (en) * 2022-12-08 2024-06-13 Hamamatsu Photonics K.K. Inductively Coupled Plasma Light Source with Direct Gas Injection

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4282267A (en) * 1979-09-20 1981-08-04 Western Electric Co., Inc. Methods and apparatus for generating plasmas
US5773919A (en) * 1986-10-02 1998-06-30 Electron Power Systems Electron spiral toroid
JPH05166595A (en) 1991-12-12 1993-07-02 Fuji Denpa Koki Kk Method for generating plasma of high atmospheric pressure and high density
JPH06166595A (en) 1992-11-27 1994-06-14 Toshiba Ceramics Co Ltd Silicon wafer
US6140752A (en) 1992-12-24 2000-10-31 Electron Power Systems Energy storage device having a plurality of single charged particles and a charge neutralizer
EP0829089B1 (en) * 1995-05-31 2001-10-24 electron Power Systems Energy storage device
US6924455B1 (en) 1997-06-26 2005-08-02 Applied Science & Technology, Inc. Integrated plasma chamber and inductively-coupled toroidal plasma source
US6150628A (en) 1997-06-26 2000-11-21 Applied Science And Technology, Inc. Toroidal low-field reactive gas source
US7569790B2 (en) * 1997-06-26 2009-08-04 Mks Instruments, Inc. Method and apparatus for processing metal bearing gases
US6815633B1 (en) 1997-06-26 2004-11-09 Applied Science & Technology, Inc. Inductively-coupled toroidal plasma source
JP2003506888A (en) 1999-08-06 2003-02-18 アドバンスト・エナジー・インダストリーズ・インコーポレイテッド Inductively coupled annular plasma source apparatus and method for processing gases and materials
US6361706B1 (en) 1999-08-13 2002-03-26 Philips Electronics North America Corp. Method for reducing the amount of perfluorocompound gas contained in exhaust emissions from plasma processing
US6156667A (en) 1999-12-31 2000-12-05 Litmas, Inc. Methods and apparatus for plasma processing
US6558635B2 (en) 2001-03-12 2003-05-06 Bruce Minaee Microwave gas decomposition reactor
US6685803B2 (en) * 2001-06-22 2004-02-03 Applied Materials, Inc. Plasma treatment of processing gases
US6855906B2 (en) * 2001-10-16 2005-02-15 Adam Alexander Brailove Induction plasma reactor
GB0416385D0 (en) 2004-07-22 2004-08-25 Boc Group Plc Gas abatement
EP1831425B1 (en) * 2004-11-08 2011-07-13 MKS Instruments, Inc. Method of disposing metal bearing gases
US20070272299A1 (en) * 2004-12-03 2007-11-29 Mks Instruments, Inc. Methods and apparatus for downstream dissociation of gases
GB0516695D0 (en) 2005-08-15 2005-09-21 Boc Group Plc Microwave plasma reactor
GB0521944D0 (en) * 2005-10-27 2005-12-07 Boc Group Plc Method of treating gas
GB0522088D0 (en) 2005-10-28 2005-12-07 Boc Group Plc Plasma abatement device
GB0523947D0 (en) 2005-11-24 2006-01-04 Boc Group Plc Microwave plasma system
US8932430B2 (en) 2011-05-06 2015-01-13 Axcelis Technologies, Inc. RF coupled plasma abatement system comprising an integrated power oscillator
US20080083701A1 (en) * 2006-10-04 2008-04-10 Mks Instruments, Inc. Oxygen conditioning of plasma vessels
US7969096B2 (en) 2006-12-15 2011-06-28 Mks Instruments, Inc. Inductively-coupled plasma source
US8257455B2 (en) * 2007-07-30 2012-09-04 Korea Institute Of Machinery & Materials Plasma burner and diesel particulate filter trap
DE212007000107U1 (en) * 2007-10-19 2010-09-02 MKS Instruments, Inc., Wilmington Annular plasma chamber for processes with high gas flow rates
KR20100031960A (en) 2008-09-17 2010-03-25 삼성전자주식회사 Plasma generating apparatus
GB0902784D0 (en) 2009-02-19 2009-04-08 Gasplas As Plasma reactor
US8999104B2 (en) 2010-08-06 2015-04-07 Lam Research Corporation Systems, methods and apparatus for separate plasma source control
US9155181B2 (en) 2010-08-06 2015-10-06 Lam Research Corporation Distributed multi-zone plasma source systems, methods and apparatus
US9449793B2 (en) 2010-08-06 2016-09-20 Lam Research Corporation Systems, methods and apparatus for choked flow element extraction

Also Published As

Publication number Publication date
US20180233333A1 (en) 2018-08-16
US20170213704A1 (en) 2017-07-27
JP2016521432A (en) 2016-07-21
US9991098B2 (en) 2018-06-05
SG11201507152RA (en) 2015-10-29
KR102009513B1 (en) 2019-08-09
JP2017199685A (en) 2017-11-02
WO2014152908A1 (en) 2014-09-25
TWI634938B (en) 2018-09-11
TW201501775A (en) 2015-01-16
KR20150131294A (en) 2015-11-24
EP2969134A1 (en) 2016-01-20
US9630142B2 (en) 2017-04-25
JP6474855B2 (en) 2019-02-27
JP6154953B2 (en) 2017-06-28
CN105209156B (en) 2017-05-10
CN105209156A (en) 2015-12-30
US20140262746A1 (en) 2014-09-18

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