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PL1632746T3 - Sposób oznaczania fizycznych właściwości warstwy optycznej lub układu warstw - Google Patents

Sposób oznaczania fizycznych właściwości warstwy optycznej lub układu warstw

Info

Publication number
PL1632746T3
PL1632746T3 PL04021243T PL04021243T PL1632746T3 PL 1632746 T3 PL1632746 T3 PL 1632746T3 PL 04021243 T PL04021243 T PL 04021243T PL 04021243 T PL04021243 T PL 04021243T PL 1632746 T3 PL1632746 T3 PL 1632746T3
Authority
PL
Poland
Prior art keywords
refractive index
independent
layer
wavelength
physical parameters
Prior art date
Application number
PL04021243T
Other languages
English (en)
Inventor
Hans-Georg Lotz
JüRGEN SCHROEDER
Original Assignee
Applied Mat Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Mat Gmbh & Co Kg filed Critical Applied Mat Gmbh & Co Kg
Publication of PL1632746T3 publication Critical patent/PL1632746T3/pl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
PL04021243T 2004-09-07 2004-09-07 Sposób oznaczania fizycznych właściwości warstwy optycznej lub układu warstw PL1632746T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP04021243A EP1632746B1 (de) 2004-09-07 2004-09-07 Verfahren zur Bestimmung von physikalischen Eigenschaften einer optischen Schicht oder eines Schichtsystems

Publications (1)

Publication Number Publication Date
PL1632746T3 true PL1632746T3 (pl) 2008-03-31

Family

ID=34926446

Family Applications (1)

Application Number Title Priority Date Filing Date
PL04021243T PL1632746T3 (pl) 2004-09-07 2004-09-07 Sposób oznaczania fizycznych właściwości warstwy optycznej lub układu warstw

Country Status (9)

Country Link
US (1) US7477385B2 (pl)
EP (1) EP1632746B1 (pl)
JP (1) JP4152966B2 (pl)
KR (1) KR100767749B1 (pl)
CN (1) CN1811378A (pl)
AT (1) ATE374924T1 (pl)
DE (1) DE502004005147D1 (pl)
PL (1) PL1632746T3 (pl)
TW (1) TWI266870B (pl)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7930657B2 (en) 2008-01-23 2011-04-19 Micron Technology, Inc. Methods of forming photomasks
EP2128603A1 (en) 2008-05-29 2009-12-02 Applied Materials, Inc. A method for determining an optical property of an optical layer
US20090296100A1 (en) * 2008-05-29 2009-12-03 Applied Materials, Inc. Method for determining an optical property of an optical layer
FR2983762B1 (fr) * 2011-12-09 2014-01-10 Commissariat Energie Atomique Procede de pilotage d'un robot et systeme de pilotage mettant en oeuvre un tel procede
CN102542107B (zh) * 2011-12-28 2013-09-04 浙江大学 一种用于实现氟掺杂氧化锡镀膜玻璃表面色彩控制的方法
CN103363909B (zh) * 2012-03-26 2018-01-02 上海华虹宏力半导体制造有限公司 一种基于反射光谱拟合的快速钴硅化合物质量检测方法
CN103575663B (zh) * 2012-08-07 2016-06-29 中国科学院大连化学物理研究所 一种金属及半导体薄膜材料光学常数的标定方法
US8830464B2 (en) * 2012-11-06 2014-09-09 Kla-Tencor Corporation Film thickness, refractive index, and extinction coefficient determination for film curve creation and defect sizing in real time
WO2014152096A1 (en) * 2013-03-15 2014-09-25 Suncare Research Laboratories, Llc In vitro determination of sunscreen protection based on image analysis of sunscreens applied to skin
US20160210558A1 (en) * 2013-09-09 2016-07-21 Rockwool International A/S System and interface for determining insulation thickness
WO2015091899A1 (de) 2013-12-20 2015-06-25 Schott Ag Optischer filter
CN109298470B (zh) 2016-03-09 2021-02-02 株式会社Lg化学 抗反射膜
US11400044B2 (en) 2017-06-16 2022-08-02 AesculaTech, Inc. Thermoresponsive polymers and uses thereof
WO2019142598A1 (ja) * 2018-01-18 2019-07-25 富士フイルム株式会社 膜厚測定方法
CN109468597B (zh) * 2019-01-08 2020-11-06 京东方科技集团股份有限公司 一种膜层厚度均一性调整方法及其调整装置
CN111337227B (zh) * 2020-04-30 2022-05-10 宜昌南玻显示器件有限公司 一种基于vba的基板光学常数计算方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2840181B2 (ja) * 1993-08-20 1998-12-24 大日本スクリーン製造株式会社 多層膜試料の膜厚測定方法
JP2866559B2 (ja) * 1993-09-20 1999-03-08 大日本スクリーン製造株式会社 膜厚測定方法
JP3520379B2 (ja) * 1994-11-29 2004-04-19 東レエンジニアリング株式会社 光学定数測定方法およびその装置
KR19990070676A (ko) * 1998-02-23 1999-09-15 윤종용 반도체소자의 두께측정방법
IT1306911B1 (it) * 1998-06-30 2001-10-11 Stmicroelettronica Srl Metodo per misurare lo spessore di uno strato di silicio danneggiatoda attacchi con plasma
KR20000018615A (ko) * 1998-09-03 2000-04-06 윤종용 반도체소자의 제조장비
US7304744B1 (en) * 1998-12-24 2007-12-04 Sharp Kabushiki Kaisha Apparatus and method for measuring the thickness of a thin film via the intensity of reflected light
US5999267A (en) * 1999-03-08 1999-12-07 Zawaideh; Emad Nondestructive optical techniques for simultaneously measuring optical constants and thicknesses of single and multilayer films
US6485872B1 (en) * 1999-12-03 2002-11-26 Mks Instruments, Inc. Method and apparatus for measuring the composition and other properties of thin films utilizing infrared radiation
DE10021379A1 (de) * 2000-05-02 2001-11-08 Leica Microsystems Optische Messanordnung insbesondere zur Schichtdickenmessung
TW504565B (en) 2000-11-17 2002-10-01 Ind Tech Res Inst Method of measuring optical constants and thickness of a film deposited on a transparent substrate by transmittance spectra
KR100490325B1 (ko) * 2001-09-21 2005-05-17 케이맥(주) 2차원형 검출기를 이용한 박막 특성 측정 장치 및 그 측정 방법
DE10204943B4 (de) * 2002-02-07 2005-04-21 Leica Microsystems Jena Gmbh Verfahren zur Bestimmung von Schichtdicken
JP4413706B2 (ja) * 2004-08-02 2010-02-10 株式会社堀場製作所 光学特性解析方法、試料測定装置、及び分光エリプソメータ

Also Published As

Publication number Publication date
TWI266870B (en) 2006-11-21
US20060007430A1 (en) 2006-01-12
JP2006078465A (ja) 2006-03-23
CN1811378A (zh) 2006-08-02
KR100767749B1 (ko) 2007-10-18
KR20060046318A (ko) 2006-05-17
DE502004005147D1 (de) 2007-11-15
EP1632746A1 (de) 2006-03-08
JP4152966B2 (ja) 2008-09-17
TW200609503A (en) 2006-03-16
ATE374924T1 (de) 2007-10-15
US7477385B2 (en) 2009-01-13
EP1632746B1 (de) 2007-10-03

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