[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

KR950021343A - 정전척크 부착 세라믹 히터 - Google Patents

정전척크 부착 세라믹 히터 Download PDF

Info

Publication number
KR950021343A
KR950021343A KR1019940037555A KR19940037555A KR950021343A KR 950021343 A KR950021343 A KR 950021343A KR 1019940037555 A KR1019940037555 A KR 1019940037555A KR 19940037555 A KR19940037555 A KR 19940037555A KR 950021343 A KR950021343 A KR 950021343A
Authority
KR
South Korea
Prior art keywords
electrostatic chuck
ceramic
ceramic heater
electrode
heat generating
Prior art date
Application number
KR1019940037555A
Other languages
English (en)
Inventor
노부오 가와다
쇼지 가노
고지 하기와라
노부오 아라이
주니찌 아라미
겐지 이시까와
Original Assignee
가나까와 지히로
신에쓰가가꾸고오교 가부시끼가이샤
이노우에 아끼라
도오꾜엘렉트론 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가나까와 지히로, 신에쓰가가꾸고오교 가부시끼가이샤, 이노우에 아끼라, 도오꾜엘렉트론 가부시끼가이샤 filed Critical 가나까와 지히로
Publication of KR950021343A publication Critical patent/KR950021343A/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/345Arrangements for heating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833Details of electrostatic chucks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/10Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H05B3/14Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
    • H05B3/141Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
    • H05B3/143Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Resistance Heating (AREA)
  • Ceramic Products (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Jigs For Machine Tools (AREA)

Abstract

본 발명은 반도체 프로세스에 있어서 승강온(昇降溫) 프로세스에 사용하여도 접합부에 박리가 발생하지 않는 정전척크부착 세라믹히터를 제공하는 것을 목적으로 한다. 본 발명은 정전척크부착 세라믹은 전기절연성 세라믹으로 이루어진 지지기재의 표면에 도전성 세라믹으로 이루어진 정전 척크용 전극을 접합시키고, 이면에는 도전성 세라믹으로 이루어진 발열층을 접합시키며, 그 위에 전기절연성 세라믹으로 이루어지는 피복층을 설치하여 이루어진 정전척크부착 세라믹에 있어서, 이 지지기재, 정전 척크용 전극 및 발열층의 표면거침 Rmax모두를 5㎛이상이 되도록 하여 이루어진 것을 특징으로 한다.

Description

정전척크 부착 세라믹 히터
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 정전척크부착 세라믹히터의 종단 도면이다.

Claims (5)

  1. 전기절연성 세라믹으로 이루어진 지지 기재의 표면에 도전성 세라믹으로 이루어지는 정전 척크용 전극을 접합함과 동시에, 이면에 도전선 세라믹으로 이루어진 발열층을 접합하고, 그들 위에 전기절연성 세라믹으로 이루어진 피복층을 설치한 정전척크부착 세라믹 히터에 있어서, 이 지지기재, 정전 척크용 전극 및 발열층의 표면거침Rmax를 모두 5㎛ 이상으로서 이루어짐을 특징으로 하는 정전척크부착 세라믹히터.
  2. 제1항에 있어서, 지지 기재와 피복층이 질화붕소, 질화붕소와 질화 알루미늄의 혼합물 또는 질화규소이며, 상기 정전척크용 전극 및 발열층이 흑연 또는 탄화규소인 정전척크부착 세라믹히터,
  3. 제2항에 있어서, 정전 척크용 전극, 발열층 및 피복층을 화학기상 증착법으로 제조되는 정전척크부착 세라믹히터.
  4. 제1항 또는 제2항에 있어서, 피복층위에 확산 방지층이 접합되어 있는 정전척크부착 세라믹히터.
  5. 제4항에 있어서, 확산 방지층에 산화 규소 또는 질화 규소인 정전척크부착 세라믹히터.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940037555A 1993-12-27 1994-12-27 정전척크 부착 세라믹 히터 KR950021343A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP33076493 1993-12-27
JP93-330764 1993-12-27
JP94-316374 1994-12-20
JP31637494A JPH07307377A (ja) 1993-12-27 1994-12-20 静電チャック付セラミックスヒーター

Publications (1)

Publication Number Publication Date
KR950021343A true KR950021343A (ko) 1995-07-26

Family

ID=26568634

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940037555A KR950021343A (ko) 1993-12-27 1994-12-27 정전척크 부착 세라믹 히터

Country Status (4)

Country Link
US (1) US5665260A (ko)
JP (1) JPH07307377A (ko)
KR (1) KR950021343A (ko)
TW (1) TW287294B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113396535A (zh) * 2019-02-21 2021-09-14 京瓷株式会社 试样保持工具

Families Citing this family (61)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3208029B2 (ja) * 1994-11-22 2001-09-10 株式会社巴川製紙所 静電チャック装置およびその作製方法
JPH09213781A (ja) * 1996-02-01 1997-08-15 Tokyo Electron Ltd 載置台構造及びそれを用いた処理装置
EP0803900A3 (en) * 1996-04-26 1999-12-29 Applied Materials, Inc. Surface preparation to enhance the adhesion of a dielectric layer
US6037572A (en) * 1997-02-26 2000-03-14 White Consolidated Industries, Inc. Thin film heating assemblies
US5901030A (en) * 1997-12-02 1999-05-04 Dorsey Gage, Inc. Electrostatic chuck employing thermoelectric cooling
JPH11157953A (ja) 1997-12-02 1999-06-15 Nhk Spring Co Ltd セラミックスと金属との構造体及びそれを用いた静電チャック装置
JPH11260534A (ja) * 1998-01-09 1999-09-24 Ngk Insulators Ltd 加熱装置およびその製造方法
US5886866A (en) * 1998-07-06 1999-03-23 Applied Materials, Inc. Electrostatic chuck having a combination electrode structure for substrate chucking, heating and biasing
JP3725430B2 (ja) 1999-04-06 2005-12-14 東京エレクトロン株式会社 電極およびプラズマ処理装置
US6462928B1 (en) 1999-05-07 2002-10-08 Applied Materials, Inc. Electrostatic chuck having improved electrical connector and method
US6310755B1 (en) * 1999-05-07 2001-10-30 Applied Materials, Inc. Electrostatic chuck having gas cavity and method
US6490146B2 (en) 1999-05-07 2002-12-03 Applied Materials Inc. Electrostatic chuck bonded to base with a bond layer and method
JP2001077182A (ja) * 1999-06-09 2001-03-23 Ibiden Co Ltd 半導体製造・検査装置用セラミック基板
WO2001011921A1 (fr) * 1999-08-09 2001-02-15 Ibiden Co., Ltd. Dispositif de chauffe en ceramique
JP2001118664A (ja) * 1999-08-09 2001-04-27 Ibiden Co Ltd セラミックヒータ
US6835916B2 (en) 1999-08-09 2004-12-28 Ibiden, Co., Ltd Ceramic heater
EP1133214B1 (en) * 1999-09-07 2005-08-10 Ibiden Co., Ltd. Ceramic heater
ATE301916T1 (de) * 1999-11-19 2005-08-15 Ibiden Co Ltd Keramisches heizgerät
US6410172B1 (en) 1999-11-23 2002-06-25 Advanced Ceramics Corporation Articles coated with aluminum nitride by chemical vapor deposition
JP2001297857A (ja) * 1999-11-24 2001-10-26 Ibiden Co Ltd 半導体製造・検査装置用セラミックヒータ
EP1137321A1 (en) * 1999-11-30 2001-09-26 Ibiden Co., Ltd. Ceramic heater
JP4209057B2 (ja) * 1999-12-01 2009-01-14 東京エレクトロン株式会社 セラミックスヒーターならびにそれを用いた基板処理装置および基板処理方法
WO2002091457A1 (fr) * 1999-12-09 2002-11-14 Ibiden Co., Ltd. Plaque ceramique pour appareil de production/controle de semi-conducteurs
US6494955B1 (en) 2000-02-15 2002-12-17 Applied Materials, Inc. Ceramic substrate support
JP2001253777A (ja) * 2000-03-13 2001-09-18 Ibiden Co Ltd セラミック基板
US6693789B2 (en) * 2000-04-05 2004-02-17 Sumitomo Osaka Cement Co., Ltd. Susceptor and manufacturing method thereof
EP1274280A1 (en) * 2000-04-14 2003-01-08 Ibiden Co., Ltd. Ceramic heater
JP2002141257A (ja) * 2000-05-24 2002-05-17 Ibiden Co Ltd 半導体製造・検査装置用セラミックヒータ
JP3516392B2 (ja) 2000-06-16 2004-04-05 イビデン株式会社 半導体製造・検査装置用ホットプレート
US6809299B2 (en) * 2000-07-04 2004-10-26 Ibiden Co., Ltd. Hot plate for semiconductor manufacture and testing
EP1255284A1 (en) * 2000-07-19 2002-11-06 Ibiden Co., Ltd. Semiconductor manufacturing/testing ceramic heater
EP1304729A1 (en) * 2000-07-19 2003-04-23 Ibiden Co., Ltd. Semiconductor manufacturing/testing ceramic heater, production method for the ceramic heater and production system for the ceramic heater
US20040035846A1 (en) * 2000-09-13 2004-02-26 Yasuji Hiramatsu Ceramic heater for semiconductor manufacturing and inspecting equipment
CN1299322C (zh) * 2000-11-16 2007-02-07 麦特逊技术股份有限公司 电阻加热一热处理系统用的装置和方法
JPWO2002043441A1 (ja) * 2000-11-24 2004-04-02 イビデン株式会社 セラミックヒータ、および、セラミックヒータの製造方法
JP2002170651A (ja) * 2000-11-29 2002-06-14 Ibiden Co Ltd セラミックヒータ
US6554907B2 (en) 2001-01-02 2003-04-29 Applied Materials, Inc. Susceptor with internal support
US6623563B2 (en) * 2001-01-02 2003-09-23 Applied Materials, Inc. Susceptor with bi-metal effect
US6538872B1 (en) 2001-11-05 2003-03-25 Applied Materials, Inc. Electrostatic chuck having heater and method
US6730175B2 (en) 2002-01-22 2004-05-04 Applied Materials, Inc. Ceramic substrate support
WO2003098115A1 (fr) * 2002-05-16 2003-11-27 Nippon Electric Glass Co., Ltd. Plaque de cuisson superieure
JP3963788B2 (ja) * 2002-06-20 2007-08-22 信越化学工業株式会社 静電吸着機能を有する加熱装置
JP2004146567A (ja) * 2002-10-24 2004-05-20 Sumitomo Electric Ind Ltd 半導体製造装置用セラミックスヒーター
JP4302428B2 (ja) * 2003-05-09 2009-07-29 信越化学工業株式会社 静電吸着機能を有するウエーハ加熱装置
JP4077430B2 (ja) * 2003-07-31 2008-04-16 佳知 高石 骨密度評価装置および骨密度評価方法
JP4309714B2 (ja) * 2003-08-27 2009-08-05 信越化学工業株式会社 静電吸着機能を有する加熱装置
JP4278046B2 (ja) * 2003-11-10 2009-06-10 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 ヒータ機構付き静電チャック
US7697260B2 (en) * 2004-03-31 2010-04-13 Applied Materials, Inc. Detachable electrostatic chuck
US20060088692A1 (en) * 2004-10-22 2006-04-27 Ibiden Co., Ltd. Ceramic plate for a semiconductor producing/examining device
US8226769B2 (en) 2006-04-27 2012-07-24 Applied Materials, Inc. Substrate support with electrostatic chuck having dual temperature zones
KR100794960B1 (ko) * 2006-06-07 2008-01-16 (주)나노테크 하이브리드형 히터 제조방법
US9275887B2 (en) 2006-07-20 2016-03-01 Applied Materials, Inc. Substrate processing with rapid temperature gradient control
US7589950B2 (en) * 2006-10-13 2009-09-15 Applied Materials, Inc. Detachable electrostatic chuck having sealing assembly
CN102308380B (zh) * 2009-02-04 2014-06-04 马特森技术有限公司 用于径向调整衬底的表面上的温度轮廓的静电夹具系统及方法
JP5543123B2 (ja) * 2009-03-30 2014-07-09 大日本スクリーン製造株式会社 熱処理用サセプタおよび熱処理装置
EP2293050B1 (en) * 2009-04-07 2016-09-07 ANBE SMT Co. Heating apparatus for x-ray inspection
JP6017781B2 (ja) * 2011-12-07 2016-11-02 新光電気工業株式会社 基板温調固定装置及びその製造方法
CN103428909A (zh) * 2013-07-12 2013-12-04 罗日良 一种发热管成型工艺
CN103369750A (zh) * 2013-08-08 2013-10-23 罗日良 一种发热管成型工艺
JP6708518B2 (ja) * 2016-08-09 2020-06-10 新光電気工業株式会社 基板固定装置及びその製造方法
JP6587223B1 (ja) * 2018-07-30 2019-10-09 Toto株式会社 静電チャック

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4900396A (en) * 1987-08-19 1990-02-13 Agency Of Industrial Science And Technology Method of forming modified layer and pattern
KR950013501B1 (ko) * 1990-10-05 1995-11-08 스미토모 일렉트릭 인더스트리즈, 엘티디. 다이아몬드피복 경질재료, 드로우어웨이 인서트 및 그 제조방법
JPH0750736B2 (ja) * 1990-12-25 1995-05-31 日本碍子株式会社 ウエハー加熱装置及びその製造方法
US5166856A (en) * 1991-01-31 1992-11-24 International Business Machines Corporation Electrostatic chuck with diamond coating
US5155652A (en) * 1991-05-02 1992-10-13 International Business Machines Corporation Temperature cycling ceramic electrostatic chuck
JPH04345019A (ja) * 1991-05-22 1992-12-01 Toshiba Ceramics Co Ltd 半導体用処理部材
JP3081279B2 (ja) * 1991-06-03 2000-08-28 電気化学工業株式会社 ホットプレート
JPH0513555A (ja) * 1991-07-01 1993-01-22 Toto Ltd 静電チヤツク及び静電チヤツクに対する電圧印加方法
US5343022A (en) * 1992-09-29 1994-08-30 Advanced Ceramics Corporation Pyrolytic boron nitride heating unit
US5384682A (en) * 1993-03-22 1995-01-24 Toto Ltd. Electrostatic chuck

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113396535A (zh) * 2019-02-21 2021-09-14 京瓷株式会社 试样保持工具
CN113396535B (zh) * 2019-02-21 2024-01-19 京瓷株式会社 试样保持工具

Also Published As

Publication number Publication date
US5665260A (en) 1997-09-09
TW287294B (ko) 1996-10-01
JPH07307377A (ja) 1995-11-21

Similar Documents

Publication Publication Date Title
KR950021343A (ko) 정전척크 부착 세라믹 히터
KR950021342A (ko) 정전척크 부착 세라믹 히터
JPH08227933A (ja) 静電吸着機能を有するウエハ加熱装置
KR101502925B1 (ko) 내부식성 적층 세라믹스 부재
KR950033389A (ko) 세라믹 히터 및 그의 제조방법
KR950034652A (ko) 정전척
JPH0727962B2 (ja) 温度サイクル動作型セラミック静電式チャック
WO2003047312A1 (fr) Dispositif chauffant en ceramique
US6535371B1 (en) Layered ceramic/metallic assembly, and an electrostatic chuck using such an assembly
KR940006220A (ko) 열처리장치
KR970077471A (ko) 오염물 격납층을 구비한 기질 지지 척 및 그 제작 방법
PT991500E (pt) Corpo abrasivo flexivel
JP4004086B2 (ja) 静電チャック装置
KR20060097562A (ko) 정전 척
TW344125B (en) Semiconductor device and its manufacture
JP2004023024A (ja) 静電吸着機能を有する加熱装置
EP1065913A2 (en) Pyrolytic boron nitride radiation heater
ATE181199T1 (de) Elektrisches heizelement
EP0202877A3 (en) Integrated circuit device and manufacturing method thereof
JPS63314790A (ja) 加熱要素
KR950021341A (ko) 정전척크 부착 세라믹 히터
KR890015655A (ko) 티타늄 카바이드 및 티타늄 니트라이드의 복합물층으로 피복된 그래파이트 경납땜용 고정구(fixture)
KR960043075A (ko) 더미 웨이퍼
KR970009470A (ko) 박막형 전열기
JP3224629B2 (ja) ガス供給用部材及び成膜装置

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
NORF Unpaid initial registration fee