KR940004788A - 기밀 밀봉된 집적회로 - Google Patents
기밀 밀봉된 집적회로 Download PDFInfo
- Publication number
- KR940004788A KR940004788A KR1019930017110A KR930017110A KR940004788A KR 940004788 A KR940004788 A KR 940004788A KR 1019930017110 A KR1019930017110 A KR 1019930017110A KR 930017110 A KR930017110 A KR 930017110A KR 940004788 A KR940004788 A KR 940004788A
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- South Korea
- Prior art keywords
- silicon
- ceramic
- integrated circuit
- ceramic layer
- layer
- Prior art date
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- 239000000919 ceramic Substances 0.000 claims abstract 18
- 229910052751 metal Inorganic materials 0.000 claims abstract 5
- 239000002184 metal Substances 0.000 claims abstract 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 15
- 229910052710 silicon Inorganic materials 0.000 claims 15
- 239000010703 silicon Substances 0.000 claims 15
- 239000000463 material Substances 0.000 claims 9
- 238000000034 method Methods 0.000 claims 6
- 239000000203 mixture Substances 0.000 claims 4
- 230000009972 noncorrosive effect Effects 0.000 claims 4
- 229910010293 ceramic material Inorganic materials 0.000 claims 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 2
- 230000004888 barrier function Effects 0.000 claims 2
- 238000005524 ceramic coating Methods 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 238000009792 diffusion process Methods 0.000 claims 2
- 239000008393 encapsulating agent Substances 0.000 claims 2
- 229910052709 silver Inorganic materials 0.000 claims 2
- 239000004332 silver Substances 0.000 claims 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 2
- 239000010937 tungsten Substances 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 239000004593 Epoxy Substances 0.000 claims 1
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 229910001069 Ti alloy Inorganic materials 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims 1
- 229910001080 W alloy Inorganic materials 0.000 claims 1
- DZPJVKXUWVWEAD-UHFFFAOYSA-N [C].[N].[Si] Chemical compound [C].[N].[Si] DZPJVKXUWVWEAD-UHFFFAOYSA-N 0.000 claims 1
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 claims 1
- UBMXAAKAFOKSPA-UHFFFAOYSA-N [N].[O].[Si] Chemical compound [N].[O].[Si] UBMXAAKAFOKSPA-UHFFFAOYSA-N 0.000 claims 1
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 claims 1
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229920003209 poly(hydridosilsesquioxane) Polymers 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 229910000679 solder Inorganic materials 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
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- C04B41/4554—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application the coating or impregnating process including a chemical conversion or reaction the coating or impregnating material being an organic or organo-metallic precursor of an inorganic material
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- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
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- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- Ceramic Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Formation Of Insulating Films (AREA)
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Abstract
본 발명은 주위환경으로부터 보호된 집적회로에 관한 것이다. 이러한 회로는 세라믹 층을 상부 금속 층에 피복시킴으로써 기밀 밀봉된다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (13)
- 상부 금속 층 및 하나 이상의 본드 패드를 갖는 집적 회로에 있어서, 세라믹 층[여기서, 세라딕 층은 (A) 회로를 세라믹 규소-함유 물질을 포함하는 조성 물로 피복시킨 다음 (B) 당해 물질을 세라믹으로 전환시킴을 특징으로 하는 방법에 의해 침착된 규소-함유 세라믹 물질을 포함하고, 본드 패드를 덮고 있는 세라믹 층의 적어도 일부를 제거하여 회로를 서로 연결하기 위해 노출된 본드 패드를 수득함으로써 세라믹 층이 본드 패드와 밀접하게 접촉한다]이 집적회로 위에 피복되어 있음을 특징으로 하는 집적회로.
- 제1항에 있어서, 세라믹 층이 산화 규소, 질화규소, 규소옥시니트라이드, 규소 옥시카바이드, 규소 카보니트라이드, 규소 옥시카보니트라이드 및 탄화규소로 이루어진 그룹 중에서 선택된 집적회로.
- 제1항에 있어서, 예비세라믹 규소-함유 물질이 하이드로겐 실세스퀴옥산 수지인 집적회로.
- 제1항에 있어서, 예비세라믹 규소-함유 물질이 일반식 RnSi(OR)4-n의 가수분해물, 부분 가수분해물 또는 이들의 혼합물(여기서, R은 탄소수 1 내지 20의 지방족, 치환족 또는 방향족 치환체이고, n은 0 내지 3이다)인 집적회로.
- 제1항에 있어서, 세라믹 층이 SiO2피막, SiO2/세라믹 산화물 피막, 규소 피막, 규소 탄소 함유 피막, 규소 질소 함유 피막, 규소 산소 질소 함유 피막, 규소 탄소 질소 함유 피막 및 다이아몬드형 탄소 피막으로부터 선택된 하나 이상의 추가의 세라믹 층에 의해 피복된 집적회로.
- 제1항에 있어서, 노출된 본드 패드를 하나 이상의 비부식성 전도성 층으로 밀봉시킨 집적회로.
- 제6항에 있어서, 비부식성 전도성 층이 금, 은, 텅스텐, 땜납, 은 충전된 에폭시 및 구리로 이루어진 그룹중에서 선택된 물질을 포함하는 집적회로.
- 제1항에 있어서, 노출된 본드 패드를 확산 차단 금속 층 및 비부식성 전도성 층으로 밀봉시킨 집적회로.
- 제8항에 있어서, 확산 차단 금속 층이 티탄, 티탄과 텅스텐의 합금 및 티탄 니트라이드 중에서 선택된 집적회로.
- 제1항에 있어서, 유기 봉입제 및 규소 봉입제 중에서 선택된 물질내에서 서로 연결되고 매봉된 집적회로.
- 제1항에 있어서, 세라믹 피막이 자외선 및 가시광선을 통과시키지 않는 집적회로.
- 상부 금속 층 및 하나 이상의 본드 패드를 갖는 집적 회로를 기밀 밀봉시키는 방법에 있어서, (A) (ⅰ) 회로를 예비세라믹 규소-함유 물질을 포함하는 조성물로 피복시킨 다음, (ⅱ) 당해 물질을 세라믹으로 전환시킴을 특징으로 하는 방법에 의해 규소-함유 세라믹 층을 집적 회로에 피복시키고; (B) 본드 패드를 덮고 있는 규소-함유 세라믹 층의 적어도 일부를 제거함을 특징으로 하는 방법.
- 하나 이상의 세라믹 층이 최소한 1차 불활성 층을 예비 세라믹 규소-함유 물질을 포함하는 조성물로 피복시킨 다음 예비 세라믹 물질을 세라믹 층으로 전환시킴을 특징으로 하는 방법에 의해 침착된 규소-함유 세라믹 물질을 포함함을 특징으로 하는, (A) 본드 패드를 갖는 회로 반조립 부품; (B) 본드 패드 주위의 반조립 부품의 표면을 덮고 있는 하나 이상의 세라믹 층; 및 (C) 본드 패드를 덮고 있는 비부식성 전도성 층을 포함하는 집적회로.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US93708692A | 1992-08-31 | 1992-08-31 | |
US7/937,086 | 1992-08-31 |
Publications (2)
Publication Number | Publication Date |
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KR940004788A true KR940004788A (ko) | 1994-03-16 |
KR100284860B1 KR100284860B1 (ko) | 2001-06-01 |
Family
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KR1019930017110A KR100284860B1 (ko) | 1992-08-31 | 1993-08-31 | 집적회로의 기밀보호방법 |
Country Status (7)
Country | Link |
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US (1) | US5481135A (ko) |
EP (1) | EP0590781B1 (ko) |
JP (1) | JPH06177187A (ko) |
KR (1) | KR100284860B1 (ko) |
CA (1) | CA2104340A1 (ko) |
DE (1) | DE69310851T2 (ko) |
TW (1) | TW450429U (ko) |
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JP3082688B2 (ja) * | 1996-11-05 | 2000-08-28 | ヤマハ株式会社 | 配線形成法 |
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-
1993
- 1993-08-18 CA CA002104340A patent/CA2104340A1/en not_active Abandoned
- 1993-08-19 DE DE69310851T patent/DE69310851T2/de not_active Expired - Fee Related
- 1993-08-19 EP EP93306588A patent/EP0590781B1/en not_active Expired - Lifetime
- 1993-08-20 TW TW085210205U patent/TW450429U/zh unknown
- 1993-08-30 JP JP5214509A patent/JPH06177187A/ja active Pending
- 1993-08-31 KR KR1019930017110A patent/KR100284860B1/ko not_active IP Right Cessation
-
1994
- 1994-03-10 US US08/209,324 patent/US5481135A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
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DE69310851D1 (de) | 1997-06-26 |
EP0590781A1 (en) | 1994-04-06 |
EP0590781B1 (en) | 1997-05-21 |
CA2104340A1 (en) | 1994-03-01 |
KR100284860B1 (ko) | 2001-06-01 |
US5481135A (en) | 1996-01-02 |
TW450429U (en) | 2001-08-11 |
JPH06177187A (ja) | 1994-06-24 |
DE69310851T2 (de) | 1998-01-02 |
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