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KR920013611A - Method for producing isolation using local polyoxide - Google Patents

Method for producing isolation using local polyoxide

Info

Publication number
KR920013611A
KR920013611A KR1019900021826A KR900021826A KR920013611A KR 920013611 A KR920013611 A KR 920013611A KR 1019900021826 A KR1019900021826 A KR 1019900021826A KR 900021826 A KR900021826 A KR 900021826A KR 920013611 A KR920013611 A KR 920013611A
Authority
KR
South Korea
Prior art keywords
polyoxide
local
producing isolation
isolation
producing
Prior art date
Application number
KR1019900021826A
Other languages
Korean (ko)
Other versions
KR940004252B1 (en
Inventor
이형섭
이규홍
양종수
김대용
Original Assignee
재단법인 한국전자통신연구소
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 재단법인 한국전자통신연구소 filed Critical 재단법인 한국전자통신연구소
Priority to KR1019900021826A priority Critical patent/KR940004252B1/en
Priority to JP3330620A priority patent/JPH05182959A/en
Publication of KR920013611A publication Critical patent/KR920013611A/en
Application granted granted Critical
Publication of KR940004252B1 publication Critical patent/KR940004252B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)
KR1019900021826A 1990-12-26 1990-12-26 Isolation method with local polyoxide KR940004252B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1019900021826A KR940004252B1 (en) 1990-12-26 1990-12-26 Isolation method with local polyoxide
JP3330620A JPH05182959A (en) 1990-12-26 1991-12-13 Method of isolating semiconductor element utilizing local polyoxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900021826A KR940004252B1 (en) 1990-12-26 1990-12-26 Isolation method with local polyoxide

Publications (2)

Publication Number Publication Date
KR920013611A true KR920013611A (en) 1992-07-29
KR940004252B1 KR940004252B1 (en) 1994-05-19

Family

ID=19308494

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900021826A KR940004252B1 (en) 1990-12-26 1990-12-26 Isolation method with local polyoxide

Country Status (1)

Country Link
KR (1) KR940004252B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100227189B1 (en) * 1996-09-23 1999-10-15 김영환 Method of forming an element isolation region in a semiconductor device

Also Published As

Publication number Publication date
KR940004252B1 (en) 1994-05-19

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Legal Events

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A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 19980313

Year of fee payment: 5

LAPS Lapse due to unpaid annual fee