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KR900019258A - 반도체장치 - Google Patents

반도체장치

Info

Publication number
KR900019258A
KR900019258A KR1019900007075A KR900007075A KR900019258A KR 900019258 A KR900019258 A KR 900019258A KR 1019900007075 A KR1019900007075 A KR 1019900007075A KR 900007075 A KR900007075 A KR 900007075A KR 900019258 A KR900019258 A KR 900019258A
Authority
KR
South Korea
Prior art keywords
semiconductor device
semiconductor
Prior art date
Application number
KR1019900007075A
Other languages
English (en)
Other versions
KR930008022B1 (ko
Inventor
히로시 모모세
유카리 운노
Original Assignee
가부시키가이샤 도시바
도시바 마이크로 일렉트로닉스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 도시바, 도시바 마이크로 일렉트로닉스 가부시키가이샤 filed Critical 가부시키가이샤 도시바
Publication of KR900019258A publication Critical patent/KR900019258A/ko
Application granted granted Critical
Publication of KR930008022B1 publication Critical patent/KR930008022B1/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0611Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
    • H01L27/0617Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
    • H01L27/0623Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with bipolar transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8248Combination of bipolar and field-effect technology
    • H01L21/8249Bipolar and MOS technology
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
KR1019900007075A 1989-05-17 1990-05-17 반도체장치 KR930008022B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1121569A JP2575876B2 (ja) 1989-05-17 1989-05-17 半導体装置
JP1-121569 1989-05-17

Publications (2)

Publication Number Publication Date
KR900019258A true KR900019258A (ko) 1990-12-24
KR930008022B1 KR930008022B1 (ko) 1993-08-25

Family

ID=14814480

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900007075A KR930008022B1 (ko) 1989-05-17 1990-05-17 반도체장치

Country Status (4)

Country Link
EP (1) EP0398247B1 (ko)
JP (1) JP2575876B2 (ko)
KR (1) KR930008022B1 (ko)
DE (1) DE69031717T2 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5700324A (en) * 1994-11-22 1997-12-23 Samsung Electro-Mechanics Co., Ltd. Manufacturing apparatus of composite filter

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3126766B2 (ja) * 1990-12-07 2001-01-22 三菱電機株式会社 半導体装置およびその製造方法
US6352887B1 (en) * 1998-03-26 2002-03-05 Texas Instruments Incorporated Merged bipolar and CMOS circuit and method

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1237712A (en) * 1968-08-30 1971-06-30 Mullard Ltd Semiconductor intergrated circuits
GB1280022A (en) * 1968-08-30 1972-07-05 Mullard Ltd Improvements in and relating to semiconductor devices
JPS5234671A (en) * 1975-07-31 1977-03-16 Matsushita Electronics Corp Semiconductor integrated circuit
US4267557A (en) * 1978-06-08 1981-05-12 Tokyo Shibaura Denki Kabushiki Kaisha Semiconductor device
JPS5734360A (en) * 1980-08-11 1982-02-24 Toshiba Corp Semiconductor device
US4388634A (en) * 1980-12-04 1983-06-14 Rca Corporation Transistor with improved second breakdown capability
EP0219641B1 (de) * 1985-09-13 1991-01-09 Siemens Aktiengesellschaft Integrierte Bipolar- und komplementäre MOS-Transistoren auf einem gemeinsamen Substrat enthaltende Schaltung und Verfahren zu ihrer Herstellung
JPH07101717B2 (ja) * 1987-03-27 1995-11-01 日本電気株式会社 半導体装置の製造方法
JPH01112763A (ja) * 1987-10-27 1989-05-01 Sharp Corp 半導体装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5700324A (en) * 1994-11-22 1997-12-23 Samsung Electro-Mechanics Co., Ltd. Manufacturing apparatus of composite filter

Also Published As

Publication number Publication date
EP0398247A2 (en) 1990-11-22
EP0398247A3 (en) 1992-04-29
JP2575876B2 (ja) 1997-01-29
JPH02303035A (ja) 1990-12-17
DE69031717D1 (de) 1998-01-02
EP0398247B1 (en) 1997-11-19
KR930008022B1 (ko) 1993-08-25
DE69031717T2 (de) 1998-04-09

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Legal Events

Date Code Title Description
A201 Request for examination
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20030801

Year of fee payment: 11

LAPS Lapse due to unpaid annual fee