KR20190110826A - Touch sensor and image display device - Google Patents

Abstract

The present invention relates to a touch sensor and image display device. More specifically, the touch sensor comprises: a base layer; a high refractive layer disposed on the base layer; a sensing electrode disposed on the high refractive layer and including a metal pattern and transparent conductive oxide pattern, wherein the metal pattern and transparent conductive oxide pattern are sequentially stacked; and a passivation layer covering the sensing electrode. The refractive indices of the high refractive layer, metal pattern, and transparent conductive oxide pattern satisfy a constant relationship. The refractive index of the passivation layer is greater than 1 and less than or equal to 1.6. The touch sensor according to embodiments of the present invention may lower the reflectance of a display screen and increase the visibility of an image.

Description

Touch Sensors and Image Display Devices {TOUCH SENSOR AND IMAGE DISPLAY DEVICE}

The present invention relates to a touch sensor and an image display device.

Recently, with the development of information technology (IT), the demand for the display field is also presented in various forms. For example, a flat panel display device having features such as thinness, light weight, and low power consumption, for example, a liquid crystal display device, a plasma display panel device, BACKGROUND OF THE INVENTION Electro Luminescent Display devices and Organic Light-Emitting Diode Display devices have been studied.

On the other hand, a touch screen panel, which is an input device that is embedded on the display device and inputs a user's command by selecting an instruction content displayed on the screen with a human hand or an object, is combined with the display device to display an image. BACKGROUND Electronic devices in which display and information input functions are implemented are being developed.

The touch screen panel may be classified into a capacitive type, a light sensing type, a resistive film type, and the like according to an operation method of the touch sensor. In the case of a capacitive touch sensor, when a human hand or an object comes into contact with each other, the sensing position is converted into an electrical signal by detecting a change in capacitance formed by another sensing pattern or a ground electrode.

When the conductive sensing pattern included in the touch sensor is applied to a display device, it is necessary to have high transparency and have improved electrical characteristics (eg, low resistance). It is also necessary to have improved resistance or resistance to external humidity, denaturation by air.

Recently, a flexible display that can be folded or bent has been developed. When the touch sensor is applied to the flexible display, the conductive sensing pattern also needs to have improved flexibility or flexibility.

For example, as disclosed in Korean Patent Application Publication No. 2014-0092366, a touch screen panel in which a touch sensor is coupled to various image display devices has recently been developed, but as described above, a touch sensor having improved optical, electrical, and mechanical properties, or The demand for touch panels continues.

Korean Patent Publication No. 2014-0092366

One object of the present invention is to provide a touch sensor with improved optical, mechanical, and electrical properties.

An object of the present invention is to provide a touch screen panel or an image display device including a touch sensor with improved optical, mechanical, and electrical properties.

1. Base layer; A high refractive layer disposed on the base layer; A sensing electrode disposed on the high refractive layer and including a metal pattern and a transparent conductive oxide pattern sequentially stacked; And a passivation layer covering the sensing electrode.

The refractive index of the high refractive index layer, the metal pattern, and the transparent conductive oxide pattern satisfies Equation 1 below.

Wherein the passivation layer has a refractive index greater than 1 and less than or equal to 1.6:

[Equation 1]

n1> n3> n2

(Wherein n1 is the refractive index of the high refractive index layer, n2 is the refractive index of the metal pattern, and n3 is the refractive index of the transparent conductive oxide pattern)

2. In the above 1, the refractive index of the high refractive index layer is 2.2 to 2.7, the touch sensor.

3. In the above 1, wherein the high refractive layer is a non-conductive, touch sensor.

4. In the above 1, wherein the high refractive layer is TiO ₂ , ZrO ₂ and a mixture thereof, including at least one, the touch sensor.

5. In the above 1, the refractive index of the metal pattern is greater than 0 to less than 1, the touch sensor.

6. In the above 1, the metal pattern is gold (Au), silver (Ag), copper (Cu), aluminum (Al), platinum (Pt), palladium (Pd), chromium (Cr), tungsten (W) , Titanium (Ti), tantalum (Ta), iron (Fe), cobalt (Co), nickel (Ni), zinc (Zn), vanadium (V), niobium (Nb), telenium (Te) and molybdenum (Mo) Touch sensor comprising at least one metal selected from the group consisting of), an alloy of the metal or nanowire of the metal.

7. In the above 1, the transparent conductive oxide pattern is indium tin oxide (ITO), indium zinc oxide (IZO), indium zinc oxide (IZTO), aluminum zinc oxide (AZO), zinc oxide (ZnOx), indium oxide At least one selected from the group consisting of (InOx), tin oxide (SnOx), cadmium tin oxide (CTO), gallium-doped zinc oxide (GZO), zinc tin oxide (ZTO), and indium gallium oxide (IGO), Touch sensor.

8. In the above 1, the refractive index of the transparent conductive oxide pattern is 1.7 to 2.1, Touch sensor.

9. In the above 1, wherein the sensing electrode comprises a mesh pattern structure, the touch sensor.

10. window substrate; And

Window stack comprising a touch sensor according to any one of the above 1 to 9 stacked on one surface of the window substrate.

11. The window laminate of 10 above, further comprising a polarizing layer laminated on the one surface of the window substrate.

12. In the above 11, the upper surface of the polarizing layer is laminated on the one surface of the window substrate, the upper surface of the touch sensor is laminated on the bottom surface of the polarizing layer, the window laminate.

13. In the above 12, further comprising a first adhesive layer for bonding the polarizing layer and the window substrate to each other, and a second adhesive layer for bonding the touch sensor and the polarizing layer to each other, the window laminate.

14. The window laminate of 10 above, further comprising a light shielding pattern formed at a periphery of the one surface of the window substrate.

15. display panel; And a window stack stacked on the display panel and including the touch sensor according to any one of claims 1 to 10.

16. The image display apparatus according to the above 15, further comprising an adhesive layer bonding the display panel and the window stack to each other.

In the touch sensor according to the embodiments of the present invention, the sensing electrode may be formed in a multilayer structure including a metal pattern-transparent conductive oxide pattern stacked structure on the high refractive layer. Therefore, while improving the transmittance of the touch sensor, it is possible to implement a high sensitivity sensing electrode by reducing the channel resistance of the sensing electrode. In addition, flexible characteristics such as folding and bending may be improved together by the metal pattern.

In addition, the touch sensor according to the embodiments of the present invention may have excellent optical characteristics such as transmittance and reflection color, thereby lowering the reflectance of the display screen and increasing the visibility of an image.

The touch sensor has excellent electrical and mechanical reliability and can be effectively applied to an image display device such as a flexible OLED and an LCD device.

1 is a reference diagram showing the measured values of the reflectance for each wavelength band of Example 1, Example 5 and Comparative Example 8 of the present invention.
2 is a schematic cross-sectional view illustrating a touch sensor in accordance with example embodiments.
3 is a schematic cross-sectional view illustrating a touch sensor according to exemplary embodiments.
4 is a schematic cross-sectional view illustrating a touch sensor in accordance with example embodiments.
5 is a schematic diagram illustrating a window stack and an image display device according to example embodiments.

The present invention relates to a touch sensor and an image display device, and more particularly to a base layer; A high refractive layer disposed on the base layer; A sensing electrode disposed on the high refractive layer and including a metal pattern and a transparent conductive oxide pattern sequentially stacked; And a passivation layer covering the sensing electrode, wherein the high refractive index layer, the metal pattern, and the transparent conductive oxide pattern satisfy a constant relationship, and the refractive index of the passivation layer is greater than 1 to 1.6 or less and an image display using the same. Relates to a device. The touch sensor according to the embodiments of the present invention can lower the reflectance of the display screen and increase the visibility of the image.

Hereinafter, with reference to the accompanying drawings, it will be described an embodiment of the present invention in more detail. However, the following drawings attached to the specification are for exemplifying preferred embodiments of the present invention, and together with the contents of the present invention serves to further understand the technical spirit of the present invention, the present invention described in such drawings It should not be construed as limited to matters.

2 through 4 are schematic cross-sectional views illustrating a touch sensor according to example embodiments.

Referring to FIG. 2, the touch sensor includes a base layer 100, a high refractive layer 110 disposed on the base layer 100, a sensing electrode 140 disposed on the high refractive layer 110, and the sensing electrode. It may include a passivation layer 160 covering the. In some embodiments, the touch sensor may further include a passivation layer 160 covering the sensing electrode 140.

The base layer 100 may be provided as a support layer for forming the sensing electrode 140. In the present specification, the base layer 100 is used to encompass the lower member of the high refractive layer 110. For example, the base layer 100 may include a film-type member or a substrate, or may include an object (eg, a display panel of a display device) on which the sensing electrode 140 is formed.

The base layer 100 may be, for example, glass, plastic, or polyimide (PI), polycarbonate (PC), polyethylene terephthalate (PET), polymethylmethacrylate (PMMA), triacetyl cellulose (TAC), or the like. The same flexible resin may be included.

The high refractive layer 110 may be provided as a barrier to, for example, an organic material that is diffused from the base layer 100. In addition, the high refractive index layer may function as a lower barrier or lower protective layer of the metal pattern 120. In this aspect, the high refractive index layer 110 may exhibit a relatively strong chemical resistance compared to the metal pattern 120 and the transparent conductive oxide 130, in which case the high refractive layer 110 is an unpatterned planar layer Can be provided.

In one embodiment, the high refractive layer 110 may be formed to a thickness of about 10 to 70nm. When the thickness of the high refractive index layer 110 is less than about 10 nm, sufficient barrier function for the organic material may not be implemented. When the thickness of the high refractive index layer 110 exceeds about 70 nm, the resistance of the sensing electrode 140 may be excessively increased and a uniform pattern shape may not be easily implemented. In some embodiments, the thickness of the high refractive layer 110 may be preferably 30 to 50 nm, more preferably 40 nm.

In some embodiments of the present disclosure, the refractive index of the high refractive index layer 110 may range from 1.9 to 2.7. The refractive index of the high refractive layer 110 is 2.1 In the case of the following, the characteristic of reflection color, for example, reflection b *, may become worse. When the refractive index of the high refractive index layer 110 is greater than 2.7, visibility of the image may be deteriorated due to a decrease in transmittance of the touch sensor.

The high refractive index layer 110 may include various compounds within a range satisfying the refractive index. In some embodiments, the high refractive index layer 110 may include at least one selected from metal oxides such as TiO ₂ , ZrO _2, and mixtures thereof. Preferably, the high refractive layer may include TiO ₂ .

In some embodiments of the present disclosure, the high refractive index layer 110 may serve as an insulating layer under the sensing electrode 140 as a non-conductor.

The sensing electrode 140 may include a metal pattern 120 and a transparent conductive oxide pattern 130 sequentially formed on the high refractive layer 110.

In some embodiments of the present disclosure, the refractive index of the metal pattern 120 may range from greater than zero to less than or equal to one. When the refractive index of the metal pattern 120 falls within the above range, optical characteristics such as transmittance and reflection color of the manufactured touch sensor may be improved, and as a result, the reflectance of the display screen may be lowered and the visibility of the image may be improved. . In a preferred embodiment, the refractive index of the metal pattern 120 may be 0.3 to 0.5.

Metal pattern 120 is a non-limiting example, gold (Au), silver (Ag), copper (Cu), aluminum (Al), platinum (Pt), palladium (Pd), chromium (Cr), tungsten (W) ), Titanium (Ti), tantalum (Ta), iron (Fe), cobalt (Co), nickel (Ni), zinc (Zn), telenium (Te), vanadium (V), niobium (Nb), molybdenum ( Metals such as Mo), alloys of these metals (eg, silver-palladium-copper (APC)), nanowires of metals or alloys. In one embodiment, the metal pattern 125 may be formed to include the APC for low resistance and high sensitivity.

As the metal pattern 120 is included in the sensing electrode 140, the flexible characteristics may be improved and the channel resistance may be reduced, compared to the case in which the sensing electrode 140 is formed of only a transparent conductive oxide.

The thickness of the metal pattern 120 is not particularly limited, but may be about 5 to 15 nm. When the thickness of the metal pattern 120 is 5 nm or less, grains may not be formed properly and optical characteristics may deteriorate. When the thickness of the metal pattern 120 is 15 nm or more, the flexible characteristic of the touch sensor may be degraded. When the thickness of the metal pattern 120 falls within the above range, the optical and flexible characteristics of the touch sensor may be improved together. Preferably, the thickness of the metal pattern may be 8 to 12 nm.

Transparent conductive oxide pattern 130 is a non-limiting example, indium tin oxide (ITO), indium zinc oxide (IZO), indium zinc oxide (IZTO), aluminum zinc oxide (AZO), zinc oxide (ZnOx), indium Metal oxides having conductivity such as oxide (InOx), tin oxide (SnOx), cadmium tin oxide (CTO), gallium-doped zinc oxide (GZO), zinc tin oxide (ZTO), indium gallium oxide (IGO), and the like. Can be. These may be used alone or in combination of two or more.

In some embodiments, the transparent conductive oxide pattern 130 may be formed of IZO in consideration of improved conductivity and transmittance.

In some embodiments, the thickness of the transparent conductive oxide 130 may be 10 nm to 140 nm. For example, when the thickness of the transparent conductive oxide pattern 130 is less than about 10 nm, a sufficient upper barrier for the metal pattern 120 may not be provided. When the thickness of the transparent conductive oxide pattern 130 exceeds about 140 nm, the transmittance of the touch sensor may be excessively reduced, and an etching process time for forming the sensing electrode 140 may be excessively increased.

In some embodiments of the present disclosure, the refractive index of the transparent conductive oxide pattern 130 is about 1.7 to 2.1. It can have a range. In preferred embodiments of the present invention, the refractive index of the transparent conductive oxide pattern 130 may be 1.8 to 2.0.

When the refractive index of the transparent conductive oxide pattern 130 is within the above range, optical properties such as transmittance and reflection b * characteristics of the touch sensor may be improved. Therefore, the reflectance of the display screen may be lowered and the visibility of the image may be increased. In addition, flexible characteristics such as folding and bending can also be improved.

As described above, the sensing electrode 140 of the touch sensor according to the exemplary embodiments may include a two-layer structure including a metal pattern 120 / transparent conductive oxide pattern 130. As the metal pattern 120 is inserted into the sensing electrode 140, sensitivity and flexibility of the touch sensor may be improved by reducing channel resistance.

In addition, as the metal pattern 120 is positioned between the high refractive index layer 110 and the transparent conductive oxide pattern 130, corrosion and damage of the metal pattern 120 may be blocked.

For example, the high refractive index layer 110, the metal layer, and the transparent conductive oxide layer may be formed on the base layer 100 through a deposition process such as a sputtering process or a coating process of the conductive composition.

Thereafter, the sensing electrode 140 may be formed by sequentially etching the transparent conductive oxide layer and the metal layer through a photolithography process using a first photo mask.

In example embodiments, the sensing electrode 140 may include a mesh pattern structure. For example, the metal pattern 120 or the transparent conductive oxide pattern 130 included in the sensing electrode 140 may be formed in the mesh pattern structure. In some embodiments, the metal pattern 120 and the transparent conductive oxide pattern 130 included in the sensing electrode 140 may be formed in the mesh pattern structure.

The mesh pattern may include an internal structure in the form of a net or honeycomb. The mesh pattern may include a rectangular rectangular mesh structure, a rhombus mesh structure, a hexagonal mesh structure, or the like, and may include a concave polygonal mesh structure.

As the sensing electrode 140 has a mesh pattern structure, a bending characteristic may be improved, and thus a touch sensor having excellent flexibility and elasticity may be implemented.

In embodiments of the present invention, the refractive index relationship between the high refractive index layer 110, the metal pattern 120, and the transparent conductive oxide 130 may satisfy Equation 1 below.

[Equation 1]

n1> n3> n2

In Equation 1, n1 represents a refractive index of the high refractive layer 110, n2 represents a refractive index of the metal pattern 120, and n3 represents a refractive index of the transparent conductive oxide pattern 130.

When the relationship between the refractive index of the high refractive index layer 110, the metal pattern 120 and the transparent conductive oxide 130 described above satisfies Equation 1, optical properties such as transmittance and reflected light characteristics, for example, reflection b * This can be improved. It is preferable that the reflection b * has a value close to zero.

The passivation layer 160 may be formed on the high refractive layer 110 to cover the sensing electrode 140. The passivation layer 160 may include, for example, an inorganic oxide such as silicon oxide or a transparent organic material such as acrylic resin. Preferably, the passivation layer 160 may be formed from an organic resin composition including a thermosetting or photocurable material such as an epoxy compound, an acrylic compound, a melanin compound, or the like.

The refractive index of the passivation layer 160 may be smaller than the refractive index of the transparent conductive oxide pattern 130 of the sensing electrode 140. In embodiments of the present invention, the refractive index of the passivation layer 160 may be greater than 1 to less than 1.6. Preferably, the refractive index of the passivation layer 160 may be 1.4 to 1.6.

When the refractive index of the passivation layer 160 falls within the above range, optical characteristics such as transmittance and reflection b * characteristics of the touch sensor may be improved. Although not bound by theory, it is assumed that light incident on the touch sensor, which is an embodiment of the present invention, is reduced in reflectance of light in visible light (600 nm or more) in a long wavelength band due to interference.

If the refractive index of the passivation layer 160 is less than or equal to 1 or more than 1.6, optical properties may be degraded, such as a decrease in transmittance or a decrease in reflection b * characteristics.

In the present specification, the thickness of the passivation 160 means a thickness measured from an upper surface of the transparent conductive oxide pattern 130 of the sensing electrode 140. Although not limited, in the embodiments of the present invention, the thickness of the passivation layer 160 may be 2 to 4㎛. When the thickness of the passivation layer 160 falls within the above range, the optical and insulating properties of the touch sensor may be improved.

1 is a graph showing the reflectance of each wavelength band of Example 1, Example 5 and Comparative Example 8 of the present invention. In the graph, the x axis represents the wavelength of light (nm) and the y axis represents the reflectance (%).

As shown in FIG. 1, in Examples 1 and 5 including a high refractive material, for example, TiO ₂ , the reflectance at a shorter wavelength band is slightly higher than that of Comparative Example 8, but at a smaller wavelength band, The reflectance was reduced due to this. As a result, embodiments of the present invention including a high refractive index layer have improved optical properties such as transmittance and reflection b * properties.

In some embodiments, the refractive index relationship between the high refractive index layer 110, the metal pattern 120, the transparent conductive oxide 130, and the passivation layer 160 may satisfy Equation 2 below.

[Equation 2]

n1> n3> n4> n2

In Equation 2, n1 is the refractive index of the high refractive index layer 110, n2 is the refractive index of the metal pattern 120, n3 is the refractive index of the transparent conductive oxide pattern 130, n4 is the refractive index of the passivation layer 160 Indicates.

Referring to FIG. 3, an intermediate layer may be provided as a base layer for forming the sensing electrode 140. The intermediate layer may have a single layer or a multilayer structure. In example embodiments, the intermediate layer may include a first intermediate layer 80 and a second intermediate layer 90. At least one of the first intermediate layer 80 or the second intermediate layer 90 may include an organic polymer.

In example embodiments, the first intermediate layer 80 may be included as a functional layer to facilitate subsequent peeling or separation with the carrier substrate. For example, the first intermediate layer 80 may be a polymer organic film, and may be polyimide, polyvinyl alcohol, polyamic acid, polyamide, polyethylene, Polystyrene, polynorbornene, phenylmaleimide copolymer, polyazobenzene, polyphenylenephthalamide, polyester, polymethyl methacrylate It may include a polymer such as methacrylate, polyarylate, cinnamate, coumarin, phthalimidine, chalcone, aromatic acetylene, and the like. These may be used alone or in combination of two or more thereof. In a preferred embodiment, the first intermediate layer 80 may be a cinnamate polymer.

The second intermediate layer 90 may be added to protect the high refractive index layer 110 and the sensing electrode 140 in the peeling process. In addition, the second intermediate layer 90 may be formed to match the refractive index with the high refractive index layer 110. For example, the second intermediate layer 90 may include an inorganic insulating material such as silicon oxide, silicon nitride, silicon oxynitride, or the like, or a polymer-based organic insulating material.

In some embodiments, after the carrier substrate is peeled off from the first intermediate layer 80 through the peeling process, the substrate 70 may be bonded to the bottom surface of the first intermediate layer 80. For example, the substrate 70 may be attached to the first intermediate layer 80 through an adhesive layer. The substrate 70 may include, for example, a flexible resin film such as polyimide, or various optical functional layers such as a polarizing film.

Referring to FIG. 4, an optical functional layer 170 may be stacked on the passivation layer 160. For example, the optical function layer 170 may include a coated polarizer or an elongated polarizer.

The stretched polarizing plate includes a protective film and a polarizer, and after applying an adhesive layer on the protective film, the polarizing plate may be bonded onto the passivation layer 160.

The optical function layer 170 may include a retardation plate, a hard coating layer, a color control layer, and the like.

In some embodiments, the touch sensor may be driven in a mutual capacitive manner.

In some embodiments, the touch sensor may be driven in a self capacitance manner. In this case, each of the sensing electrodes may include an independent island pattern unit pattern, and each of the unit patterns may be connected to a trace or a wire.

The touch sensor may be employed in, for example, a flexible OLED device to provide an image display device having improved bending characteristics and improved durability, reliability, and visibility to an external environment.

5 is a schematic diagram illustrating a window stack and an image display device according to example embodiments.

Referring to FIG. 5, the window stack 250 may include a window substrate 230, a polarization layer 210, and a touch sensor 200 according to the above-described exemplary embodiments.

The window substrate 230 may include, for example, a hard coating film. In one embodiment, the light blocking pattern 235 may be formed on a peripheral portion of one surface of the window substrate 230. The light blocking pattern 235 may include, for example, a color printing pattern, and may have a single layer or a multilayer structure. The bezel part or the non-display area of the image display device may be defined by the light blocking pattern 235.

The polarizing layer 210 may include a coated polarizer or a polarizing plate. The coated polarizer may include a liquid crystal coating layer including a polymerizable liquid crystal compound and a dichroic dye. In this case, the polarization layer 210 may further include an alignment layer for imparting orientation to the liquid crystal coating layer.

For example, the polarizing plate may include a polyvinyl alcohol polarizer and a protective film attached to at least one surface of the polyvinyl alcohol polarizer.

The polarizing layer 210 may be directly bonded to the one surface of the window substrate 230 or may be attached through the first adhesive layer 220.

The touch sensor 200 may be included in the window stack 250 in the form of a film or a panel. In one embodiment, the touch sensor 200 may be coupled to the polarization layer 210 through the second adhesive layer 225.

As shown in FIG. 5, the window substrate 230, the polarizing layer 210, and the touch sensor 200 may be arranged in order from the user's visual recognition side. In this case, since the sensing electrodes of the touch sensor 200 are disposed under the polarization layer 210, the pattern recognition phenomenon may be more effectively prevented.

When the touch sensor 200 includes a substrate, the substrate may include, for example, triacetyl cellulose, triacetyl cellulose, cycloolefin, cycloolefin copolymer, polynorbornene copolymer, and the like. Preferably, the front retardation may be ± 2.5 nm or less.

In one embodiment, the touch sensor 200 may be directly transferred onto the window substrate 230 or the polarizing layer 210. In an exemplary embodiment, the window substrate 230, the touch sensor 200, and the polarization layer 210 may be arranged in order from the user's visual recognition side.

The image display device may include a display panel 360 and the above-described window stack 250 coupled to the display panel 360.

The display panel 360 may include a pixel electrode 310, a pixel defining layer 320, a display layer 330, an opposite electrode 340, and an encapsulation layer 350 disposed on the panel substrate 300. Can be.

A pixel circuit including a thin film transistor TFT may be formed on the panel substrate 300, and an insulating layer covering the pixel circuit may be formed. The pixel electrode 310 may be electrically connected to the drain electrode of the TFT, for example.

The pixel defining layer 320 may be formed on the insulating layer to expose the pixel electrode 310 to define a pixel region. The display layer 330 is formed on the pixel electrode 310, and the display layer 330 may include, for example, a liquid crystal layer or an organic emission layer.

The opposite electrode 340 may be disposed on the pixel defining layer 320 and the display layer 330. The counter electrode 340 may be provided as, for example, a common electrode or a cathode of the image display device. An encapsulation layer 350 may be stacked on the counter electrode 340 to protect the display panel 360.

In some embodiments, the display panel 360 and the window stack 250 may be coupled through the adhesive layer 260. For example, the thickness of the adhesive layer 260 may be greater than the thickness of each of the first and second adhesive layers 220 and 225, and the viscoelasticity at −20 to 80 ° C. may be about 0.2 MPa or less. In this case, noise from the display panel 360 can be shielded, and interfacial stress can be alleviated during bending to suppress damage to the window stack 250. In one embodiment, the viscoelasticity may be about 0.01 to 0.15 MPa.

Hereinafter, experimental examples including preferred embodiments are provided to help understanding of the present invention, but these examples are only for exemplifying the present invention, and do not limit the appended claims, and the scope and spirit of the present invention. It is apparent to those skilled in the art that various changes and modifications to the embodiments can be made within the scope, and such variations and modifications are within the scope of the appended claims.

Examples and Comparative Examples

On the glass substrate, the triple layer and the passivation layer of the lower film / metal layer / upper film were formed with the thickness and components shown in Table 1 below. The passivation layer was formed of a composition for forming a passivation layer containing the acrylic organic material.

division Bottom film Metal layer
(APC)
(nm) Top film Passivation layer ingredient thickness
(nm) Refractive index ingredient thickness
(nm) Refractive index Refractive index thickness
(Μm) Example 1 TiO ₂ 45 2.3 10 IZO 45 2.0 1.5 2 Example 2 TiO ₂ 45 2.3 10 IZO 45 2.0 1.5 3 Example 3 TiO ₂ 45 2.3 10 IZO 45 2.0 1.4 2 Example 4 TiO ₂ 45 2.3 10 IZO 45 2.0 1.6 2 Example 5 TiO ₂ 45 2.3 10 IZO 36 2.0 1.5 2 Example 6 TiO ₂ 45 2.3 10 ITO 45 1.9 1.5 2 Example 7 TiO ₂ 45 2.3 10 ITO 45 1.9 1.5 3 Example 8 TiO ₂ 45 2.3 10 IZO 45 2.0 1.2 2 Comparative Example 1 TiO ₂ 45 2.3 10 IZO 45 2.0 1.8 2 Comparative Example 2 ITO 45 1.9 10 ITO 45 1.9 1.5 2 Comparative Example 3 IZO 45 2.0 10 IZO 45 2.0 1.5 2 Comparative Example 4 ITO 45 1.9 10 IZO 45 2.0 1.5 2

Experimental Example

(1) Optical property measurement

The transmittance of the triple layer of the Examples and Comparative Examples was measured using CM3700D (Minolta Co., Ltd.). In addition, the value of the reflection b * which is the color visually recognized by the reflection was measured. The measurement results are shown in Table 2 below.

In the optical characteristic measurement value, the transmittance, which is a degree of light transmission, is better, and the reflection b * value is closer to zero.

Among them, reflectances of wavelength bands of Example 1, Example 5, and Comparative Example 8 were measured and shown in FIG. 1. In FIG. 1, the x-axis is the wavelength of light (nm) and the y-axis is the reflectance (%).

(2) electrical resistance measurement

The sheet resistance of the structures of Examples and Comparative Examples was measured using a 4 Point Probe sheet resistance meter (Napson). The measurement results are shown in Table 2 below.

division Transmittance (%) Reflection b * Sheet resistance
(Ω / □) Example 1 80.6 -6.3 10.1 Example 2 80.6 -6.3 10.1 Example 3 81.0 -6.8 10.1 Example 4 80.4 -4.8 10.1 Example 5 80.3 -2.1 9.9 Example 6 80.3 -3.3 9.7 Example 7 80.3 -3.3 9.7 Example 8 83.0 -2.0 9.8 Comparative Example 1 78.0 7.4 9.8 Comparative Example 2 76.4 7.7 9.9 Comparative Example 3 77.2 7.3 10.1 Comparative Example 4 76.8 7.5 10.0

Referring to Table 2, in the embodiments where the lower layer, the metal layer, and the upper layer satisfy a predetermined refractive index relationship, and the refractive index of the passivation layer satisfies the scope of the present invention, the optical properties such as refractive index and reflective b * characteristics are excellent. On the other hand, in the case of Comparative Example 1 in which the refractive index of the passivation layer is outside the range defined by the present invention, the optical properties, in particular, the transmittance were lower than those in the Examples.

In Comparative Examples 2 and 3, which are ITO / APC / ITO structures, optical properties such as poor transmittance were obtained as compared with Examples.

In the case of Comparative Example 4, which is an IZO / APC / ITO structure, optical properties, such as a decrease in transmittance and reflection b * characteristics, were obtained in comparison with Examples.

70: base material 80: first intermediate layer
90: second intermediate layer 100: base layer
110: high refractive layer 120: metal pattern
130: transparent metal oxide pattern 140: sensing electrode
160: passivation layer 170: optical functional layer
200: base substrate 205: pixel defining film
210: display layer 215: electrode
220, 230: first and second interlayer insulating films
240: optical layer 250: window substrate
400a: upper cover 400b: lower cover
410: main board 420: display panel
430: touch sensor 440: circuit structure

Claims (16)

Base layer;
A high refractive layer disposed on the base layer;
A sensing electrode disposed on the high refractive layer and including a metal pattern and a transparent conductive oxide pattern sequentially stacked; And
And a passivation layer covering the sensing electrode.
The refractive index of the high refractive index layer, the metal pattern, and the transparent conductive oxide pattern satisfies Equation 1 below.
Wherein the passivation layer has a refractive index greater than 1 and less than or equal to 1.6:
[Equation 1]
n1>n3> n2
(Wherein n1 is the refractive index of the high refractive index layer, n2 is the refractive index of the metal pattern, and n3 is the refractive index of the transparent conductive oxide pattern) The touch sensor of claim 1, wherein the high refractive index layer has a refractive index of 2.2 to 2.7. The touch sensor of claim 1, wherein the high refractive layer is an insulator. The touch sensor of claim 1, wherein the high refractive layer comprises at least one selected from TiO ₂ , ZrO _2, and mixtures thereof. The touch sensor of claim 1, wherein the refractive index of the metal pattern is greater than 0 to 1 or less. The method of claim 1, wherein the metal pattern is gold (Au), silver (Ag), copper (Cu), aluminum (Al), platinum (Pt), palladium (Pd), chromium (Cr), tungsten (W), titanium (Ti), tantalum (Ta), iron (Fe), cobalt (Co), nickel (Ni), zinc (Zn), vanadium (V), niobium (Nb), telenium (Te) and molybdenum (Mo) At least one metal selected from the group consisting of, the alloy of the metal or nanowire of the metal, the touch sensor. The method of claim 1, wherein the transparent conductive oxide pattern is indium tin oxide (ITO), indium zinc oxide (IZO), indium zinc oxide (IZTO), aluminum zinc oxide (AZO), zinc oxide (ZnOx), indium oxide (InOx) ), A touch sensor comprising at least one selected from the group consisting of tin oxide (SnOx), cadmium tin oxide (CTO), gallium-doped zinc oxide (GZO), zinc tin oxide (ZTO) and indium gallium oxide (IGO). . The touch sensor of claim 1, wherein a refractive index of the transparent conductive oxide pattern is 1.7 to 2.1. The touch sensor of claim 1, wherein the sensing electrode comprises a mesh pattern structure. Window substrates; And
A window laminate comprising the touch sensor according to any one of claims 1 to 9 stacked on one surface of the window substrate. The window laminate of claim 10, further comprising a polarizing layer laminated on the one surface of the window substrate. The window laminate according to claim 11, wherein an upper surface of the polarizing layer is laminated on the one surface of the window substrate, and an upper surface of the touch sensor is laminated on the bottom surface of the polarizing layer. The window laminate according to claim 12, further comprising a first adhesive layer for bonding the polarizing layer and the window substrate to each other, and a second adhesive layer for bonding the touch sensor and the polarizing layer to each other. The window laminate of claim 10, further comprising a light shielding pattern formed at a periphery of the one surface of the window substrate. Display panel; And
An image display device comprising a window stack stacked on the display panel and comprising a touch sensor according to any one of claims 1 to 9. The image display device according to claim 15, further comprising an adhesive layer for bonding the display panel and the window stack to each other.

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