KR20170130628A - Exposing apparatus and exposing method - Google Patents

Abstract

The substrate processing apparatus EX includes a projection optical system PL for projecting a reflected light flux L2 generated from the illumination area IR toward the substrate to form an image of the mask pattern on the substrate, A first light source image is formed so that illumination light from the first light source image is irradiated onto the illumination area, and a first light source image is formed by irradiating the illumination area with light And an illumination optical system (IL) that forms a first conjugate plane that is optically conjugate with the light source image, between the center line and the cylindrical plane.

Description

TECHNICAL FIELD [0001] The present invention relates to an exposure apparatus and an exposing method,

The present invention relates to a substrate processing apparatus and a device manufacturing method.

The present application claims priority based on Japanese Patent Application No. 2012-157810, filed on July 13, 2012, and Japanese Patent Application No. 2012-157811, filed on July 13, 2012, the contents of which are incorporated herein by reference .

BACKGROUND ART As a substrate processing apparatus for patterning an electronic circuit such as a semiconductor integrated device or a display panel, a precise exposure apparatus is widely used. The exposure apparatus generally optically transfers a pattern of an electronic circuit formed on a mask onto a photosensitive (photosensitive) substrate such as a semiconductor wafer or a glass substrate through a projection optical system. The mask used here is usually a circuit pattern formed of a light shielding material such as chrome on a flat quartz plate. In a scanning projection exposure apparatus, while reciprocating the mask in a one-dimensional direction, Is transferred in a step & scan manner so as to align the circuit patterns of the mask in a matrix (two-dimensional) manner on the substrate.

In such a step-and-scan projection exposure apparatus, it is known that the throughput (productivity) is improved by reducing the number of stepping operations (the number of times of acceleration and deceleration of the movable stage for moving the substrate). An exposure apparatus for achieving high throughput by preparing a reflection type cylindrical mask and repeatedly arranging a plurality of circuit patterns in the circumferential direction of the cylindrical surface is disclosed in, for example, Patent Document 1 have.

On the other hand, in the field of producing a large display panel, a scanning type exposure apparatus having a movable stage for mounting a large glass substrate (2 m x m or more), a large glass substrate holding, developing, etching, Various types of process apparatuses and transfer apparatuses are used. These exposure apparatuses, process apparatuses, and transporting apparatuses are all very large and expensive, and are not only expensive to manufacture, but also provide a total cost (manufacturing cost, Waste caused by the disposal process, etc.).

What is attracting attention as a more resource-saving manufacturing method is a printed electronics technology in which an electronic circuit is directly formed on a flexible resin substrate or a plastic substrate by utilizing a high-precision printing technique. A method of manufacturing a display panel by an organic EL by a roll-to-roll method using this technique is disclosed in, for example, Patent Document 2 below. In the roll-to-roll method, a long substrate (film) flexible (flexible) is taken out from a supply roll, and various treatments are performed on the substrate in the middle of a transport path .

As a substrate processing apparatus such as an exposure apparatus, for example, as described in Patent Document 1 below, in order to improve the throughput when a plurality of chip devices are successively projected and exposed in a scanning manner on a semiconductor wafer, Shaped rotary mask is proposed. As a method of manufacturing an electronic device such as a display panel or a solar cell, there is known a roll-to-roll method as disclosed in, for example, Patent Document 2 below. In the roll-to-roll system, a flexible substrate such as a film is transported from a delivery roll to a rotation roll, and various processes are performed on the substrate on the transport path.

Patent Document 1: International Publication No. 2008/029917 Patent Document 2: International Publication No. 2008/129819

In the exposure apparatus disclosed in Patent Document 1, for example, a plurality of shot areas aligned in a line in the scanning exposure direction on the substrate (wafer) can be integrated and scanned and exposed while rotating the cylindrical mask, So that exposure processing with high throughput can be performed. However, in the projection optical system of the exposure apparatus disclosed in Patent Document 1, since the pattern formed on the outer peripheral surface of the cylindrical mask is cylindrical, the quality (image quality) of the pattern image projected onto the substrate is deteriorated Or the projected minimum line width becomes thick, and there is a possibility that a high-precision (faithful) transfer can not be expected.

Also, in the manufacturing method of the display panel by the roll-to-roll method disclosed in Patent Document 2, when the high-resolution patterning can not be performed only by the printing method or the inkjet (droplet) method, do. In this case, it is necessary to carry the flexible sheet substrate stably under the projection system. A possible way to do this is, for example, a method in which the sheet substrate is wound around a portion of the surface of the rotating drum while tension is applied in the longitudinal direction. Also in this method, since the pattern image of the mask by the projection system is projected onto the sheet substrate curved in the cylindrical surface shape, the quality (quality) of the pattern on the substrate is likewise deteriorated or the minimum projected width It may become thicker, and it may be impossible to expect a high-precision (faithful) transfer.

An aspect of the present invention is to provide a projection exposure apparatus capable of accurately projecting a projective image onto a substrate in a projection of a pattern on a cylindrical mask surface or a projection of a pattern onto a cylindrical curved substrate A substrate processing apparatus, and a device manufacturing method.

The above-described exposure apparatus can perform efficient exposure processing, for example, by scanning and moving a substrate (wafer) in synchronization with the rotation while continuously rotating a mask pattern curved in a roll shape. However, since the mask pattern is curved in a cylindrical surface shape, when a part of the mask pattern is projected onto a planar semiconductor wafer through a normal projection optical system, the quality of the projected image (distortion error, anisotropic magnification error, focus Error, etc.) may be reduced.

Another object of the present invention is to provide a substrate processing apparatus and a device manufacturing method which can perform projection exposure with high precision using a curved mask pattern (cylindrical mask) without deteriorating the quality of projected images do.

According to the first aspect of the present invention, there is provided a substrate processing apparatus for projecting and exposing an image of a reflective mask pattern disposed along a cylindrical surface curved at a predetermined radius around a predetermined center line onto a sensitive substrate, A mask holding member that holds the mask pattern along the cylindrical surface and is rotatable around the center line, and a reflective light flux (light flux) generated from an illumination area set on a part of the mask pattern is projected toward the sensitive substrate A projection optical system that forms an image of a part of the mask pattern on the sensitive substrate by projecting the mask pattern onto the photosensitive substrate, and a projection optical system that is disposed in the optical path of the projection optical system to light- , One of the illumination light directed to the illumination area and the reflected light flux generated from the illumination area is passed and the other is reflected (Light source image), which is a source of the illumination light, through the optical splitter and a part of the optical path of the projection optical system, There is provided a substrate processing apparatus provided with an illumination optical system for irradiating an illumination area with a first conjugate surface optically conjugate with the primary light source image between the center line and the cylindrical surface.

According to a second aspect of the present invention, there is provided a substrate processing apparatus for exposing a mask pattern to the sensitive substrate while transporting the substrate in a predetermined direction while rotating the mask holding member by the substrate processing apparatus of the first aspect, And performing subsequent processing using a change in the responsive layer of the susceptible substrate.

According to a third aspect of the present invention, there is provided a substrate processing apparatus for projecting and exposing an image of a reflective mask pattern disposed along a cylindrical surface curved at a predetermined radius around a predetermined center line onto a sensitive substrate, A mask holding member capable of holding the mask pattern along the center line and projecting a reflected light flux generated from an illumination area set on a part of the mask pattern toward the sensitive substrate, And a reflective optical system arranged in the optical path of the projection optical system for illuminating the illumination area with the illumination light directed toward the illumination area and the reflected light flux generated from the illumination area, A light separation unit for passing light from the light source and reflecting the other light, Irradiating the illumination light generated by the illumination light to the illumination area through the light separation part and illuminating the principal ray of the illumination light with a light inclined with respect to the circumferential direction of the cylindrical surface so as to face a predetermined position between the center line and the cylindrical surface A substrate processing apparatus having an optical system is provided.

According to a fourth aspect of the present invention, there is provided a substrate processing apparatus for projecting and exposing an image of a reflective mask pattern disposed along a cylindrical surface curved at a predetermined radius around a predetermined center line onto a sensitive substrate, A mask holding member capable of rotating around the center line and a primary light source image serving as a source of illumination light directed to an illumination area set on a part of the mask pattern, An illumination optical system for irradiating the illumination light from the image light source onto the illumination area and forming a first conjugate plane optically conjugate with the primary light source image between the center line and the cylindrical plane; (Intermediate image plane) of the mask pattern and a part of the mask pattern A concave mirror disposed at or near the position of the intermediate upper surface; and a projection optical system for projecting the reflected light flux reflected by the concave mirror toward the sensitive substrate, 1 projection optical system projects the image formed on the intermediate upper surface onto the sensitive substrate.

According to a fifth aspect of the present invention, there is provided a substrate processing apparatus according to the third aspect, wherein the sensitive substrate is transported in a predetermined direction while rotating the mask holding member to continuously expose the mask pattern to the sensitive substrate, And performing subsequent processing using a change in the sensitive layer of the exposed sensitive substrate.

According to a sixth aspect of the present invention, there is provided an exposure apparatus for projecting and exposing an image of a reflective mask pattern disposed along a cylindrical surface curved at a predetermined radius around a predetermined center line onto a sensitive substrate, A mask holding member which holds the mask pattern and is rotatable around the center line, and an illumination light source which irradiates the illumination light from the light source toward an illumination region set in a part of the mask pattern, An illumination optical system that is inclined with respect to a circumferential direction of the cylindrical surface so as to face a specific position between the center line and the cylindrical surface; and a reflective optical system that guides the reflected luminous flux generated from the illumination area, A first projection optical system for forming an image of a part of the mask pattern on the intermediate upper surface, And a second projection optical system for projecting the image formed on the intermediate top surface onto the sensitive substrate by the first projection optical system after the reflected light flux reflected from the concave mirror is incident on the concave mirror, There is provided an exposure apparatus provided with the exposure apparatus.

According to the aspect of the present invention, it is possible to provide a substrate processing apparatus and a device manufacturing method which can expose a projected image on a substrate with high accuracy and can perform exposure with high efficiency.

According to another aspect of the present invention, there is provided a substrate processing apparatus capable of projecting an image of a curved mask pattern with a high quality and capable of performing projection exposure with high precision at the time of patterning of a high- A device manufacturing method can be provided.

1 is a diagram showing a device manufacturing system according to a first embodiment.
2 is a schematic diagram for explaining an outline of an optical system of an exposure apparatus.
3 is a view showing a light flux incident on the illumination area and a light flux emitted from the illumination area.
4 is a diagram showing a configuration of a substrate processing apparatus (exposure apparatus).
5 is a view showing a configuration from a light source to a second diaphragm member of an illumination optical system.
6 is a view showing a configuration of the first diaphragm member of the illumination optical system.
7A is a view showing a configuration from the first stop member of the illumination optical system to the optical isolator.
Fig. 7B is a view showing a configuration from the first stop member to the optical isolator of the illumination optical system. Fig.
Fig. 8 is a diagram showing the configuration from the light separation unit of the illumination optical system to the upper surface of the projection optical system.
Fig. 9 is a view showing a light separation section according to the first embodiment. Fig.
10 is a view showing a light beam incident on the illumination area and a light beam emitted from the illumination area.
11 is a top view showing a light flux emitted from an illumination area.
12 is a view showing a representative position of an illumination area referred to in a description of a spot.
13 is a diagram showing spots on the first conjugate plane which is a conjugate region with the light source image.
14 is a diagram showing the configuration of a substrate processing apparatus according to the second embodiment.
15 is an enlarged view of a part of the optical system of the exposure apparatus.
16 is a diagram showing a device manufacturing system according to the third embodiment.
17 is a schematic diagram for explaining the optical system of the exposure apparatus according to the third embodiment.
18 is a view showing a light flux incident on an illumination region and a light flux emitted from an illumination region.
19 is a diagram showing a configuration of a substrate processing apparatus (exposure apparatus) according to the third embodiment.
20 is a diagram showing a configuration of a homogenizing optical system.
21 is a view showing a configuration of the first diaphragm member.
22A is a view showing a configuration from a first diaphragm member to a light separation portion.
Fig. 22B is a view showing a configuration from the first diaphragm member to the optical isolator. Fig.
Fig. 23 is a diagram showing a configuration of the optical isolator. Fig.
24 is a view showing a light flux incident on the illumination region and a light flux emitted from the illumination region.
25 is a view showing a light flux emitted from an illumination area.
Fig. 26 is a view showing a representative position of the illumination area referred to in the explanation of spots. Fig.
27 is a diagram showing spots on the first conjugate plane which is a conjugate region with the light source image.
28 is a view showing an optical path in the first projection optical system.
29 is a view showing an optical path in the second projection optical system.
30 is a diagram showing a configuration of a substrate processing apparatus (exposure apparatus) according to the fourth embodiment.
31 is a view showing an optical path in the illumination optical system.
32 is a view showing an optical path in the first projection optical system.
33 is a view showing an optical path in the second projection optical system.
34 is a flowchart showing a device manufacturing method.

[First Embodiment]

1 is a diagram showing a configuration of an example of a device manufacturing system SYS (flexible display manufacturing line) of the present embodiment. Here, the flexible substrate P (sheet, film, or the like) drawn out from the supply roll FR1 passes through the n processing units U1, U2, U3, U4, U5, ... Un, Up to the time of winding on the frame FR2.

In the following description, the XYZ orthogonal coordinate system is set so that the front surface (or back surface) of the substrate P is perpendicular to the XZ plane, and the width direction orthogonal to the carrying direction (long direction) . In the following description, the rotational direction around the X-axis direction is referred to as the? X-axis direction, and the rotational directions around the Y-axis direction and the Z-axis direction are referred to as the?

The substrate P wound on the supply roll FR1 is taken out by the niped drive roller DR1 and conveyed to the processing apparatus U1. The center of the substrate P in the Y-axis direction (width direction) is servo-controlled by the edge position controller EPC1 so as to fall within a range of about 占 퐉 to about 占 퐉 with respect to the target position.

The processing apparatus U1 is a system in which the photosensitive functional liquid (photoresist, photosensitive coupling agent, photosensitive plating reducing agent, UV curable resin liquid, etc.) In a continuous or selective manner. In the processing apparatus U1 is mounted a cylinder roller DR2 on which a substrate P is wound and a photosensitive functional liquid (sensitive functional liquid) on the surface of the substrate P on the cylinder roller DR2 in the same or partially A coating apparatus Gp1 including a coating roller for coating, a solvent contained in the photosensitive functional liquid applied to the substrate P, a drying apparatus Gp2 for rapidly removing moisture, and the like.

The processing unit U2 heats the substrate P conveyed from the processing unit U1 to a predetermined temperature (for example, several tens of degrees Celsius to about 120 degrees Celsius) to form a photosensitive functional layer (sensitive functional layer) In order to stably fix the substrate. In the processing apparatus U2, there are provided a plurality of rollers and air-turn bars for folding and conveying the substrate P, a heating chamber portion HA1 for heating the carried-on substrate P, P is lowered to match the environmental temperature of the subsequent process (the processing apparatus U3, the substrate processing apparatus), the nipped driving roller DR3, and the like.

The processing apparatus U3 (substrate processing apparatus) includes an exposure apparatus and is provided with a circuit pattern for display or a wiring pattern for the photosensitive functional layer (sensitive function layer) of the substrate P transported from the processing apparatus U2 And irradiates patterning light of the corresponding ultraviolet ray. An edge position controller EPC2 for controlling the center of the substrate P in the Y-axis direction (width direction) to a predetermined position, a nipped driving roller DR4, A substrate supporting roll DR5 (substrate supporting member) for supporting the substrate P at the irradiated position and two sets of driving rollers DR6, DR6 for giving a predetermined elongation (DL) to the substrate P, DR7) and the like are provided.

The processing apparatus U3 is provided with a drum mask DM in which a reflection type mask pattern M is formed on a cylindrical outer circumferential surface and is rotated around a center line parallel to the Y axis direction, An illumination unit IU for irradiating the pattern M with a slit-shaped illumination light beam extending in the Y-axis direction and an illumination unit IU for irradiating the mask M of the drum mask DM onto a part of the substrate P supported by the substrate support roll DR5. A projection optical system PL for projecting a part of the circumferential direction of the pattern M and a projection optical system PL for projecting a part of the projected pattern onto the substrate P in advance in order to relatively align And an alignment microscope AM for detecting an alignment mark or the like formed thereon.

The processing apparatus U4 is a wet process apparatus that performs at least one of various types of wet processes such as development processing by wet processing, electroless plating processing, and the like for the photosensitive functional layer of the substrate P transported from the processing apparatus U3 wet processing apparatus. The processing apparatus U4 is provided with three treatment tanks BT1, BT2 and BT3 layered in the Z-axis direction, a plurality of rollers for folding and conveying the substrate P by bending, a nipped driving roller DR8, have.

The processing apparatus U5 is a heating and drying apparatus for warming the substrate P transported from the processing apparatus U4 to adjust the moisture content of the substrate P wetted in the wet process to a predetermined value. Thereafter, the substrate P having passed through the last processing unit Un of the series of processes via several processing apparatuses is wound up on the recovery roll FR2 via the nipped driving roller DR9. The edge position controller EPC3 controls the edge position controller EPC3 so that the base of the substrate P in the Y axis direction (width direction) or the Y axis direction judgment (substrate edge) is not scattered in the Y axis direction, The relative positions of the drive roller DR9 and the recovery roll FR2 in the Y-axis direction are sequentially corrected and controlled.

The upper level control device CONT controls the operation of each of the processing devices U1 to Un constituting the manufacturing line in an integrated manner. The upper level control device CONT is based on the monitoring of the processing status and the processing status in each of the processing units U1 to Un, the monitoring of the conveying state of the substrate P between the processing units, the pre / Feedback correction and feed forward correction are also performed.

The substrate P used in the present embodiment is, for example, a flexible substrate such as a foil (foil) made of a metal such as a resin film, stainless steel, or an alloy. The material of the resin film is, for example, polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, polycarbonate resin, Polystyrene resin, and vinyl acetate resin.

It is preferable that the substrate P is selected so that its coefficient of thermal expansion is not remarkably large so that the amount of deformation due to heat received in various processing steps can be substantially ignored. The thermal expansion coefficient may be set to be smaller than a threshold value according to the process temperature or the like, for example, by mixing the inorganic filler with a resin film. The inorganic filler may be, for example, titanium oxide, zinc oxide, alumina, silicon oxide, or the like. The substrate P may be a single layer body made of a very thin glass having a thickness of about 100 mu m manufactured by a float method or the like and may be formed by bonding the above resin film, ) May be used. The substrate P may be obtained by modifying the surface of the substrate P by a predetermined pretreatment in advance and activating the surface of the substrate P. Alternatively, a fine barrier rib structure (concave / convex structure) for precision patterning may be formed on the surface by an imprint method As shown in Fig.

The device manufacturing system SYS of the present embodiment repeatedly executes various processes for manufacturing a device (display panel or the like) with respect to the substrate P or continuously. The substrate P subjected to various treatments is divided (diced) for each device into a plurality of devices. The dimension of the substrate P is, for example, about 10 cm to 2 m in the width direction (Y-axis direction having a short length) and the dimension in the long direction (X-axis direction having a long length) is 10 m or more. The dimension of the substrate P in the width direction (Y-axis direction which is a short length) may be 10 cm or less, or 2 m or more. The dimension of the substrate P in the long direction (X-axis direction which is a long length) may be 10 m or less.

Next, the principle of exposure by the processing apparatus U3 (exposure apparatus EX, substrate processing apparatus) will be described. Fig. 2 is a schematic diagram for explaining the schematic structure of the optical system of the exposure apparatus EX. 3 is an explanatory view showing the state of the light flux incident on the illumination region IR and the light flux emitted from the illumination region IR.

The exposure apparatus EX shown in Fig. 2 is provided with a drum mask DM, an illumination optical system IL, a projection optical system PL, a light separation unit 10, and a deflection member 11. The drum mask DM has an outer peripheral surface of a cylindrical surface (hereinafter referred to as a cylindrical surface 12) and is formed by bending a reflective mask pattern M along the cylindrical surface 12. The cylindrical surface 12 is a surface curved at a predetermined radius around a predetermined center line, for example, at least a part of the outer circumferential surface of a circular column or a cylinder. The drum mask DM is rotatable around the rotation center axis AX1 (center line).

The illumination optical system IL subjects the illumination area IR on the mask pattern M held by the drum mask DM to the illumination light L1 through a part of the projection optical system PL. The illumination optical system IL includes a first optical system 13 forming a light source image L0 that is a source of the illumination light L1 and a second optical system 14 serving as a part of the projection optical system PL ). The illumination light L1 from the light source image L0 passes through the light separation section 10 composed of a base material which becomes the base material of the concave mirror disposed on the pupil plane of the projection optical system PL Is incident on the second optical system 14 after passing through the second optical system 14 and deflected at the reflection plane on the upper side of the deflecting member 11 before being irradiated to the illumination area IR. The projection optical system PL includes a second optical system (optical system) 14 disposed in an optical path between the optical isolator 10, the optical isolator 10, and the illumination area IR.

2, the upper half of the optical axis 14a is a passing portion (transmission portion) 15, and a light source image L0 (for example, a fly - a plurality of point light source images made of eye lenses are gathered) is formed. 2, the lower half portion (lower half portion) of the optical isolator 10 from the optical axis 14a is a concave reflective portion 16.

The projection optical system PL (including the second optical system 14) projects the reflected light flux generated in the illumination area IR toward the substrate P, thereby projecting the mask pattern M And a part of the image is projected onto the substrate P. [ In the following description, the light flux that is generated from the mask pattern M and projected onto the substrate by irradiation of the illumination light L1 is referred to as an imaging light flux L2.

The imaging light flux L2 generated in the illumination area IR is deflected at the reflection plane on the upper side of the deflecting member 11 and is incident on the second optical system 14 and passes through the second optical system 14, And reaches the reflection plane on the lower side of the deflecting member 11 again through the second optical system 14. [ The imaging light beam L2 reflected by the lower reflective surface of the deflecting member 11 forms a middle image Im corresponding to a part of the mask pattern M appearing in the illumination area IR at a position conjugate to the illumination area IR do. This intermediate image Im is re-formed on the substrate P by a projection optical system (indicated by PL2 in Fig. 4) arranged thereafter.

3, the incident angle of the principal ray L1a of the illumination light L1 with respect to the illumination region IR is substantially the same as the incident angle of the principal ray L1 in the circumferential direction of the cylindrical surface 12, L1a, respectively. This is to make each principal ray L2a of the imaging light beam L2 generated from the illumination area IR parallel to each other in a plane perpendicular to the rotation center axis AX1.

In the present embodiment, the illumination optical system IL is arranged so that the principal ray L2a of the imaging light beam L2 is parallel to the main axis L2 (in a telecentric state) in a plane perpendicular to the rotation center axis AX1, So that the illuminating light L1 is irradiated to the illumination area IR. That is, the illumination optical system IL is configured such that the illumination light L1 incident on the illumination area IR is non-telecentric so as to make the incidence side of the imaging light beam L2 into the projection optical system PL telecentric .

Each main ray L1a of the illumination light L1 is set to converge at an intermediate position between the cylindrical surface 12 and the rotation center axis AX1 (near the half of the radius of the cylindrical surface 12) do. Therefore, the intermediate position is a position conjugate with the coplanar surface of the illumination optical system IL (the passing portion 15 of the optical isolator 10 in Fig. 2).

The proceeding direction of each principal ray L2a of the image forming light beam L2 in the plane perpendicular to the rotational axis AX1 is determined by the position on the illumination region IR of each main ray L2a and the position of the rotational center axis AX1, (Diametrical direction) connecting the connecting portions. This is because it is necessary to separate the illumination light L1 and the imaging light flux L2 from each other at the position of the light splitting section 10 with the optical axis 14a therebetween as shown in Fig. 2, the advancing direction of each principal ray L2a of the image forming light beam L2 in the plane perpendicular to the rotational center axis AX1 is the direction perpendicular to the optical axis 14a of the second optical system 14 (Vertical to the paper surface), the paper is inclined at a certain angle within this surface (paper surface).

Next, the structure of the processing apparatus U3 (exposure apparatus EX) will be described in more detail. 4 is a diagram showing the configuration of the exposure apparatus EX. The exposure apparatus EX includes a drum mask DM (mask holding member) which holds the mask pattern M and is rotatable about the rotation center axis AX1, a rotation center axis AX2 which supports the substrate P, And a rotary drum DP (substrate supporting member) rotatable around the rotary drum DP. The illumination optical system IL illuminates the illumination area IR on the mask pattern M held by the drum mask DM with uniform brightness by Koehler illumination.

The projection optical system PL projects the imaging light beam L2 generated from the illumination area IR toward the projection area PR on the substrate P supported on the rotary drum DP by moving a part (In the illumination area IR) on the substrate P.

The projection optical system PL shown in Fig. 4 includes a first projection optical system PL1 for forming a middle image Im of the mask pattern M in the illumination area IR, and a second projection optical system PL2 for projecting the intermediate image Im onto the substrate P. [ 2 projection optical system PL2. The first projection optical system PL1 and the second projection optical system PL2 shown in Fig. 4 can be realized by, for example, arranging a circular image field on a half-mirror surface of a prism mirror (deflecting members 11, 35) And is telecentric as a reflective ocular (refractive) projection optics of the image field type.

The exposure apparatus EX is a so-called scanning exposure apparatus and synchronously rotates the drum mask DM and the rotary drum DP at a predetermined rotation speed ratio so that the image of the mask pattern M held by the drum mask DM, And is repeatedly projected and exposed on the surface (curved surface along the cylindrical surface) of the substrate P supported on the rotary drum DP.

The drum mask DM is a circular columnar or cylindrical member, and a reflective mask pattern M may be formed along the outer peripheral surface (cylindrical surface 12).

The mask pattern M is formed, for example, as a sheet-like mask in which a highly reflective metal film deposited on a flexible glass sheet having a thickness of about 100 mu m is patterned and wound around the outer peripheral surface of the drum mask DM, But may be replaceably mounted to the drum mask DM.

The rotary drum DP (the substrate support roll DR5 in Fig. 1) is a columnar or cylindrical member, and its peripheral surface is cylindrical. The substrate P is supported on the rotary drum DP, for example, by being wound around a part of the outer circumferential surface of the rotary drum DP. The projection area PR onto which the image of the mask pattern M is projected is disposed in the vicinity of the outer peripheral surface of the rotary drum DP.

The substrate P may be suspended by suspending the plurality of conveying rollers, and in this case, the projection area PR may be disposed between the plurality of conveying rollers.

The exposure apparatus EX includes a drive unit for rotationally driving the drum mask DM and the rotary drum DP respectively and a detection unit for detecting the positions of the drum mask DM and the rotary drum DP, A moving section for adjusting the positions of the drum mask DM and the rotary drum DP, and a control section for controlling each section of the exposure apparatus EX.

The control unit of the exposure apparatus EX synchronously rotates the drum mask DM and the rotary drum DP at a predetermined rotation speed ratio by controlling the drive unit based on the detection result of the detection unit. The control unit controls the moving unit based on the detection result of the detection unit to adjust the relative positions of the drum mask DM and the rotary drum DP.

The illumination unit IU shown in Fig. 1 includes the light source 20 shown in Fig. 4 and the first optical system 13 of the illumination optical system IL. The first optical system 13 of the illumination optical system IL forms the light source image L0 that becomes the source of the illumination light L1 by the light emitted from the light source 20 and makes the light intensity distribution of the illumination light L1 uniform .

The light source 20 includes, for example, a lamp light source such as a mercury lamp or a solid light source such as a laser diode or a light emitting diode (LED). The illumination light L 1 emitted from the light source 20 is incident on the surface of the substrate W using an ArF excimer laser such as a bright line (g line, h line, i line), an external light (DUV light) such as a KrF excimer laser (Wavelength: 193 nm).

Fig. 5 is a view showing the configuration from the light source 20 shown in Fig. 4 to the second diaphragm member 26 of the illumination optical system IL. The first optical system 13 shown in Fig. 5 includes an input lens 21, a fly-eye lens 22, a first diaphragm 23, a relay lens 24, a cylindrical lens 25 ), And a second diaphragm member (26).

The input lens 21 is disposed at a position where the illumination light L1 emitted from the light source 20 is incident. The input lens 21 condenses the illumination light L1 to enter the incidence end face 22a of the fly-eye lens 22. The fly-eye lens 22 has a plurality of lens elements 22b arranged two-dimensionally on a plane orthogonal to the optical axis of the input lens 21.

The fly-eye lens 22 spatially divides the illumination light L1 emitted from the input lens 21 for each lens element 22b. A primary light source image (a converged point light source or the like) is formed for each lens element 22b in the exit surface 22c where light is emitted from the fly-eye lens 22. The surface on which the primary light source image is formed is divided into a light separation portion 10 in the vicinity of the hosepoint of the first projection optical system PL1 in Fig. 4 (also the hosopicity of the illumination optical system IL) 40 (the first conjugate plane, shown in Fig. 10 and the like).

The first diaphragm member 23 is a so-called aperture diaphragm (illumination ς diaphragm) and is disposed at or near the exit end face 22c of the fly-eye lens 22.

6 is a view showing a configuration of the first diaphragm member 23 of the illumination optical system IL. As shown in Fig. 6, the first diaphragm member 23 has an elongated circular or elliptical opening 23a through which at least a part of the illumination light L1 from the fly-eye lens 22 passes.

5 and 6, the first diaphragm member 23 is disposed on a plane (parallel to the XY plane) orthogonal to the optical axis of the relay lens 24. The inner dimension (dimension) D1 of the opening 23a in the first direction (X axis direction) is smaller than the inner dimension (dimension) in the second direction (Y axis direction) corresponding to the direction parallel to the rotation center axis AX1 ) D2. The first direction of the inner dimension (dimension) D1 coincides with the circumferential direction of the cylindrical surface 12 in the illumination area IR on the drum mask DM in Fig. 2 or Fig.

The first direction is the direction in which the light is projected in the circumferential direction on the cylindrical surface 12 and the second direction is the direction in which the light is projected in the direction parallel to the rotation center axis AX1 of the cylindrical surface 12. [ That is, the first diaphragm member 23 is arranged so that the diffusion angle NA of the illumination light L1 in the circumferential direction of the cylindrical surface 12 is smaller than the diffusion angle NA in the direction parallel to the rotation center axis AX1 of the cylindrical surface 12 Is smaller than the diffusing angle (NA) of the illumination light L1 of the illumination optical system.

7A and 7B are diagrams showing an example of a specific optical system (lens arrangement) from the first diaphragm 23 to the optical splitting section 10 of the illumination optical system IL shown in Figs. 4 and 5 . Fig. 7A is a plan view showing a plane perpendicular to the rotation center axis AX1. 7B is a plan view on a plane parallel to the rotation center axis AX1.

7A, the opening 23a of the first diaphragm member 23 is biased to one side (+ X axis side) with respect to the optical axis 13a parallel to the Z axis of the first optical system 13 . 7B, the opening 23a of the first diaphragm member 23 is symmetrically arranged with respect to the optical axis 13a of the first optical system 13 in the Y-axis direction. That is, the first diaphragm member 23 is arranged such that the optical axis 13a of the first optical system 13 passes through the center of the opening 23a when viewed in the X-axis direction.

The relay lens 24 is disposed at a position where light passing through the first diaphragm member 23 is incident. The relay lens 24 is provided so as to superpose a light flux from a plurality of primary light source images formed on the fly-eye lens 22. The light from the plurality of primary light source images formed on the emission side (emission side) of the fly-eye lens 22 is uniform in light intensity distribution at the overlapping positions.

The cylindrical lens 25 is arranged in an optical path from the position where the primary light source image is formed to the second diaphragm member 26 in the fly-eye lens 22.

The cylindrical dichroic lens 25 shown in Figs. 7A and 7B is arranged so that the power (refracting power) in the XZ plane is the same as the rotational center axis AX1, as in the cylindrical dichroic lens 25 shown in Figs. (Refracting power) in the YZ plane that is parallel to the YZ plane. The direction in which the power (refractive power) of the cylindrical lens 25 is large coincides with the circumferential direction of the cylindrical surface 12 in the illumination area IR on the drum mask DM in Fig. 2 or Fig.

The second diaphragm member 26 is a so-called field stop and defines the position and shape of the illumination area IR. The second diaphragm member 26 is disposed at or near the conjugate position with the illumination region IR. Light from a plurality of primary light source images formed on the fly-eye lens 22 is superposed on the position of the second diaphragm member 26 by the relay lens 24 and the cylindrical lens 25, The light intensity distribution in the diaphragm member 26 is made uniform. That is, the input lens 21, the fly-eye lens 22, the relay lens 24, and the cylindrical lens 25 constitute a uniformizing optical system 19 for uniformizing the light intensity distribution of the illumination light L1.

The illumination optical system IL is disposed in at least a part of the optical path from the primary light source to the second diaphragm member 26 and is arranged so as to divide the light intensity distribution of the illumination light L1 originating from the primary light source image into a second diaphragm member 26 or a uniformizing optical system 19 which is uniform in the vicinity thereof. In addition, the illumination optical system IL may not be provided with the second diaphragm member 26. In addition, the homogenizing optical system 19 may be configured by using a rod lens instead of the fly-eye lens 22. In this case, the configuration of the illumination optical system IL is appropriately changed so that the outgoing cross-section where the light is emitted from the rod lens becomes optically conjugate with the illumination area IR.

7A and 7B, the first optical system 13 has a lens group 27 disposed in the optical path between the second diaphragm member 26 and the optical separation unit 10. [ The lens group 27 is composed of a plurality of lenses which are axisymmetric about the optical axis 13a of the first optical system 13 as the rotation center. As shown in Fig. 7B, the lens group 27 forms an aspherical surface 28 (second conjugate plane) which is optically conjugate with the first diaphragm member 23 when viewed in the X-axis direction. A light source image L0 (secondary light source image), which is the source of the illumination light L1 irradiated onto the illumination area IR, is formed on the hibernation plane 28 as shown in Fig. 2 (or Fig. 4).

The secondary light source image L0 formed on the coaxial plane 28 of the projection optical system PL has a dimension in the X axis direction as shown in Fig. 2 (or Fig. 4) or Figs. 7A and 7B, Axis direction in parallel with the axis AX1. The X-axis direction in which the dimension of the secondary light source image L0 becomes large coincides with the circumferential direction of the cylindrical surface 12 in the illumination area IR on the drum mask DM in Fig. 2 or Fig.

7A and 7B, the distribution range of the secondary light source image L0 formed on the second conjugate plane (the aspherical surface 28) is in the Y-axis direction parallel to the rotation center axis (center line) AX1 Is set to be smaller than the dimension in the X-axis direction. The X axis direction in which the dimension of the distribution range of the secondary light source image L0 becomes relatively large is set in the circumferential direction of the cylindrical surface 12 in the illumination area IR on the drum mask DM in Fig. .

Incidentally, the lens group 27 is configured to converge, on the hibernation plane 28, a component diffused in the Y-axis direction among the light flux from the primary light source formed on the first diaphragm 23. Since the power of the cylindrical lens 25 differs in the X-axis direction and the Y-axis direction, the component diffused in the X-axis direction from each point on the primary light source image (the aperture of the first diaphragm member 23) , It does not converge to one point on the coplanar surface 28 as shown in Fig. 7A. In other words, when viewed in the Y-axis direction, the moving surface 28 is not optically conjugate with the first diaphragm member 23.

The optical isolator 10 is disposed at or near the elevation 28 so that at least a portion thereof is located on the elevation 28. [ Here, the position of the coincidence plane 28 or its vicinity is a plane substantially equivalent to the Fourier transform plane with respect to the illumination region IR. 2) of the illumination light L1 incident on the illumination area IR on the drum mask DM is defined by the illumination light L1 passing through the light separation part 10 Direction (orientation characteristic) can be defined. As described with reference to Fig. 3, the optical separation section 10 (regulating section) is designed to make the incidence side of the imaging light beam L2 into the projection optical system PL telecentric, (Distribution range) of the illumination light L1 in the optical splitting section 10 so as to be non-telecentric. The optical isolator 10 is disposed in the optical path of the projection optical system PL to light-illuminate the illumination area IR.

8 is a view showing a configuration from the light separation section 10 of the illumination optical system IL to the intermediate upper surface 32 (Im) of the projection optical system PL. Fig. 9 is a plan view showing the optical isolator 10 according to the present embodiment.

8 includes a lens member 30 made of a material through which light is transmitted and a reflecting film 31 (corresponding to the reflecting portion 16 in Fig. 2) formed on the surface of the lens member 30, . The lens member 30 has the same shape as a meniscus lens and has a convex surface on the side of the surface 30a where the illumination light L1 is incident from the first optical system 13, The surface 30b side facing the opposite side is a concave surface. The reflective film 31 is provided on the surface 30b of the lens member 30. [

9, the optical splitting section 10 includes a passing section 15 through which at least a part of the illumination light L1 from the first optical system 13 passes, and a passing section 15 passing through the illumination section IR on the mask pattern M And a reflecting portion 16 for reflecting the imaging light beam L2 (see Fig. 2). The reflection film 31 is formed in the optical separation section 10 except for a part of the surface 30b of the lens member 30 and the passing section 15 is formed in the Z- And is disposed in an area where the reflective film 31 is not formed.

The passing portion 15 is disposed on the -X-axis side with respect to the intersection 13b between the optical axis 13a of the first optical system 13 and the surface 30b. The passing portion 15 is arranged in an area which does not overlap the intersection 13b among the surfaces 30b. 8, the passing portion 15 (light passage window) is elongated in the Y-axis direction parallel to the rotation center axis AX1 of the drum mask DM in the X- And is formed in a circular shape. The longitudinal direction of the elongated circular passing portion 15 corresponds to the circumferential direction of the cylindrical surface 12 in the illumination region IR on the drum mask DM in Fig. 2 (or Fig. 4) or Fig. .

The region where the reflection film 31 is formed in the Z-axis direction is used for the reflection portion 16 in which the imaging light beam L2 is reflected and the region in which the reflection film 31 is formed, Is also used as a regulating portion that defines the passing range of the illumination light L1 that is directed to the illumination light IR. In other words, the reflection film 31 is provided so that the illumination light L1 does not pass through the area other than the passage part 15 in the light separation part 10. [ The reflecting film 31 is arranged so as to include at least a region existing in a position symmetrical to the passing portion 15 with respect to the intersection 13b of the light separation portion 10 so as to reflect the imaging light beam L2 .

Returning to the description of FIG. 8, the second optical system 14 is disposed at a position where the illumination light L1 passing through the passing portion 15 of the light separation portion 10 is incident. The second optical system 14 condenses the illumination light L1 so that the illumination region IR is optically conjugate with the first stop member 23. [ That is, the second optical system 14 and the lens group 27 shown in Figs. 7A and 7B form a surface in the illumination region IR that is optically conjugate with the second diaphragm member 26.

The second optical system 14 is constituted by, for example, a plurality of lenses axially symmetrical about a predetermined center axis (optical axis 14a). The optical axis 14a of the second optical system 14 is set to be coaxial with the optical axis 13a of the first optical system 13, for example. The illumination light L1 incident on the second optical system 14 passes through one side with respect to the plane (YZ plane) including the optical axis 14a of the second optical system 14 and is emitted from the second optical system 14.

The biasing member 11 is disposed at a position where the illumination light L1 emitted from the second optical system 14 enters. The biasing member 11 is, for example, a triangular prism-shaped member having a first reflecting surface 11a and a second reflecting surface 11b perpendicular to each other. The first reflection surface 11a and the second reflection surface 11b are arranged so as to form an angle of approximately 45 DEG C with the optical axis 14a of the second optical system 14, for example.

The illumination light L1 emitted from the second optical system 14 is reflected and deflected by the first reflection surface 11a and is incident on the illumination area IR on the mask pattern M held by the drum mask DM. The illumination light L1 is reflected and diffracted by the mask pattern M, thereby generating an imaging light beam L2. The illumination light L1 incident on the illumination area IR and the imaging light flux L2 emitted from the illumination area IR will be described in detail later with reference to Figs. 9 to 14. Fig.

The imaging light beam L2 emitted from the illumination area IR is incident on the first reflecting surface 11a of the biasing member 11. [ The imaging light beam L2 is deflected by being reflected by the first reflection surface 11a, and is incident on the second optical system 14. [ The imaging light beam L2 incident on the second optical system 14 passes through an optical path different from the illumination light L1 directed to the illumination area IR, as described above with reference to Figs. The optical path of the imaging light beam L2 in the second optical system 14 is located on the side (the + X-axis side) substantially opposite to the optical path of the illumination light L1 with respect to the plane (YZ plane) including the optical axis 14a of the second optical system 14 .

The imaging light flux L2 having passed through the second optical system 14 is incident on the optical splitting section 10. [ 9, the range R1 in which the imaging light beam L2 is incident on the light separating section 10 is a range R2 (the passing portion 15). The range R1 in which the imaging light beam L2 is incident is set to the opposite side of the passing portion 15 with respect to the YZ plane, for example, and serves as the reflecting portion 16 of the light separation portion 10. 3, the principal ray L2a emitted from each point of the illumination region IR has a substantially parallel relationship with respect to each other, and therefore, The light flux generated at each point of the light flux IR is incident on the reflection portion 16 so that spots overlap in the range R2.

As shown in Fig. 8, the image forming light beam L2 incident on the reflecting portion 16 is reflected by the reflecting portion 16 and enters again into the second optical system 14. [ The imaging light beam L2 having passed through the second optical system 14 is incident on the second reflective surface 11b of the deflecting member 11 and is reflected and deflected by the second reflective surface 11b. The advancing direction of the principal ray of the image forming light beam L2 reflected by the second reflecting surface 11b is a direction substantially parallel to the advancing direction of the principal ray when it is emitted from the illumination region IR, 14a in a non-perpendicular direction.

The light flux emitted from each point of the illumination region IR of the imaging light flux L2 passes through the second optical system 14 two times and reaches almost one point on the intermediate image plane 32 which is optically conjugate with the illumination region IR Converge. Thus, the first projection optical system PL1 shown in Fig. 4 among the projection optical systems PL is arranged so that the intermediate image of the part (illumination area IR) of the mask pattern M is the intermediate image 32 (Im) . The intermediate upper surface 32 is a surface that is also optically conjugate with the projection area PR and a visual field stop (third stop member) for defining the position and shape of the projection area PR may be disposed.

The second projection optical system PL2 shown in Fig. 4 is a projection optical system PL2 that is optically conjugate with the optical splitting section 10, for example, instead of the optical splitting section 10 in the optical path of the first projection optical system PL1. And placing the concave mirror 33 at the position. That is, the second projection optical system PL2 includes a third optical system 34 which is the same as the second optical system 14 of the first projection optical system PL1. The imaging light beam L2 having passed through the intermediate upper surface 32 is reflected and deflected by the first reflecting surface 35a of the deflecting member 35 and passes through the third optical system 34 to be incident on the concave mirror 33. [ The imaging light beam L2 incident on the concave mirror 33 is reflected by the second reflecting surface 35b of the deflecting member 35 after passing through the third optical system 34 after being reflected by the concave mirror 33, And is incident on the projection area PR on the substrate P supported on the rotary drum DP. The light flux emitted from each point on the intermediate top surface 32 of the imaging light flux L2 passes through the third optical system 34 twice and is transmitted to each corresponding point in the projection area PR which is optically conjugate with the intermediate top surface 32 . In this manner, the second projection optical system PL2 projects the intermediate image Im formed by the first projection optical system PL1 onto the projection area PR.

Next, the states of the imaging light L1 and the imaging light L2 emitted from the illumination area IR when entering the illumination area IR will be described in more detail.

10 shows a state in which the beam of light (illumination light L1) incident on the illumination region IR and the imaging beam L2 emitted from the illumination region IR are directed in the direction of the rotation center axis AX1 of the drum mask DM XZ plane). Fig. 11 is a top view of the imaging light beam L2 emitted from the illumination area IR, viewed in a direction (Z-axis direction) perpendicular to Fig.

As shown in Fig. 10 (see Fig. 3), the principal ray L1a of the illumination light L1 is reflected by the rotation center axis AX1 and the cylindrical center axis AX2 when viewed in the direction of the rotation center axis AX1 of the drum mask DM A conjugate plane 40 (a conjugate plane with the horn plane 28 of the first projection optical system PL1 in which the secondary light source image is formed) and the first light source image (the first diaphragm 23) Is incident on the illumination region IR. The conjugate plane 40 (first conjugate plane) is disposed, for example, at or near the central position of the rotation center axis AX1 and the illumination region IR. That is to say, the positional relationship between the passing portion 15 of the light separation portion 10 and the reflection portion 16 is determined by taking the radius of the mask pattern M as r, the distance from the rotation center axis AX1 to the conjugate plane 40, Is approximately half of the radius " r ".

Here, the extension line 41 of the main light ray L1a of the illumination light L1 is arranged so as to intersect on the conjugate plane 40 in a cross section orthogonal to the rotation center axis AX1 of the drum mask DM. The intersection 142 of the extension line 41 of the main light ray L1a is continuously arranged on a line parallel to the rotation center axis AX1 of the drum mask DM. That is, the positional relationship between the passing portion 15 of the light separation portion 10 and the reflection portion 16 is determined such that the extension line 41 of the principal ray L1a distributed in the circumferential direction of the cylindrical surface 12 of the illumination light L1, Intersects the line on the conjugate plane 40 parallel to the axis AX1. That is, the illumination optical system IL irradiates the illumination light L1 generated from the light source 20 to the illumination region IR through the optical separation unit 10 and also transmits the principal ray L1a of the illumination light L1 to the rotation center axis AX1 And is directed to a predetermined position between the cylindrical surface 12 and the cylindrical surface 12, as shown in Fig.

The principal ray L1a of the illumination light L1 distributed in the direction parallel to the rotation center axis AX1 of the drum mask DM is incident on the illumination region IR in a substantially parallel relationship with each other. 11, the principal ray L2a of the imaging light beam L2 is incident on the illumination area (light source) in a substantially parallel relationship with each other when viewed in a direction (Z-axis direction) perpendicular to the rotation center axis AX1 of the drum mask DM IR). Here, the principal ray L1a of the illumination light L1 is incident on the illumination region IR from the substantially normal direction (X-axis direction) of the cylindrical surface 12 of the drum mask DM when viewed in the Z axis direction, The principal ray L2a is emitted from the illumination region IR toward the direction of almost the normal (X-axis direction) of the cylindrical surface 12 of the drum mask DM when viewed in the Z-axis direction.

Next, with reference to Figs. 9, 12, and 13, the shape of the pupil on the plane that is in the conjugate with the light source image will be described. 12 is a diagram showing representative positions of the illumination area IR referred to in the description of the pupil. 13 is a diagram showing spots on the conjugate plane 40 which is a conjugate region with the light source image. Here, for convenience of explanation, the light fluxes (the illumination light L1 and the imaging light flux L2) passing through respective points of the illumination area IR are arranged in a direction of the light spot on the surface (the coplanar surface 28 and the conjugate surface 40) The shape is assumed to be caused.

In Fig. 12, reference numerals P1 to P9 denote points on the illumination area IR viewed from the plane in the X-axis direction. The points P1, P2, and P3 are groups (referred to as a first group) of points arranged in the circumferential direction of the cylindrical surface 12 shown in Fig. 10 and the like. The point P1 is located on the + Z-axis side of the illumination region IR, the point P3 is located on the -Z-axis side of the illumination region IR, and the point P2 is located in the center of the point P1 and the point P3. Similarly, the second group of points P4, P5 and P6, the third group of points P7, P8 and P9 are groups of points arranged in the circumferential direction of the cylindrical surface 12, respectively. The first group of points P1 to P3 is arranged at the end on the -Y axis side of the illumination area IR and the third group of points P7 to P9 is arranged on the end on the + Y axis side of the illumination area IR , And the second group of points P4 to P6 is disposed between the first group and the third group.

First, with reference to Figs. 9 and 12, the passage range of the illumination light L1 in the coincidence plane 28 will be described. The principal ray of the illumination light L1 incident on the point P1, point P4 and point P7 arranged in the direction parallel to the rotation center axis AX1 in the illumination region IR shown in Fig. The incidence angles with respect to the illumination area IR are almost equal to each other.

Therefore, the luminous fluxes incident on the point P1, the point P4, and the point P7 become almost the same in the X-axis direction as shown in FIG. Therefore, the light flux incident on the point P1, point P4 and point P7 in the illumination area IR on the drum mask DM becomes a light flux proceeding from substantially the same direction when viewed from the illumination area IR side. Here, all of the light beams incident on the point P1, the point P4, and the point P7 pass through substantially the same range R3 on the hibernation 28 shown in Fig. Similarly, the light beams incident on the point P3, the point P6, and the point P9 arranged in the direction parallel to the rotation center axis AX1 all pass through substantially the same range R4 on the hibernation 28. [

The principal ray of the illumination light L1 incident on the point P1 and the principal ray of the illumination light L1 incident on the point P3 are different in the incident position in the circumferential direction of the illumination region IR and have different incidence angles with respect to the illumination region IR.

Therefore, the position of the passage range (range R3) in which the light beam incident on the point P1 in the illumination area IR passes through the moving surface 28 and the position of the light beam incident on the point P3 in the illumination area IR, (Range R4) is shifted in the X-axis direction.

In Fig. 9, the position in the Y-axis direction of the range R3 is almost equal to the range R4. The position of the range R3 in the X axis direction is further away from the intersection 13b between the optical axis 13a of the first optical system 13 and the optical splitting section 10 than the position in the X axis direction of the range R4.

The passing range of the light beam incident on the point P2, the point P5, and the point P8 arranged in the direction parallel to the rotation center axis AX1 in the illumination area IR shown in Fig. 12 is not shown in Fig. 9 But is disposed between the range R3 and the range R4. Likewise, the light flux passing through an arbitrary point on the line connecting the point P1 and the point P3 passes through the range shifted from the range R3 to the range R4 in accordance with the shift amount from the point P1 of this arbitrary point. Therefore, the passing range on the pupil plane 28 of the illumination light L1 incident on the illumination area IR becomes, for example, a range R2 of an elongated circular shape connecting the range R3 and the range R4.

Thus, when the range R2 of the passing portion 15 is elongated, the principal ray L2a of the image forming light beam L2 distributed in the circumferential direction of the rotation axis AX1 is incident on the illumination region with the illumination light as a parallel light flux (Telecentric state), which is more parallel to each other. This is achieved in addition to setting the light separation section 10 and the preceding illumination optical system such that the conjugate plane 40 is disposed at or near the central position of the rotation center axis AX1 and the illumination region IR.

Next, the shape of the pupil in the conjugate plane 40 will be described with reference to Figs. 10, 12, and 13. Fig. The shape of the pupil in the conjugate plane 40 is such that when the illumination light L1 incident on the illumination region IR is virtually propagated to the inside of the drum mask DM, It corresponds to the shape.

The illumination light L1 (light flux) L1, the point P2, and the point P3, which extend in the circumferential direction in the illumination area IR on the cylindrical surface 12, The principal ray L1a of the incident light L1 is incident. Therefore, assuming that the light beams incident on the point P1, the point P2, and the point P3 are propagated to the inside of the cylindrical surface 12, the positions of the passing ranges on the conjugate plane 40 coincide with each other, And passes through the range R5 shown in Fig. The light beams incident on the points P4, P5 and P6 arranged in the circumferential direction in the illumination region IR on the cylindrical surface 12 all pass through the same range R6, The light beams incident on the point P7, the point P8, and the point P9 arranged in the circumferential direction in the illumination area IR on the light guide plate LR pass through the same range R7.

The principal ray L1a of the illumination light L1 is incident on a point P1, a point P4, and a point P7 arranged in a direction (Y-axis direction) parallel to the rotation center axis AX1 in a substantially parallel relationship with each other. Therefore, if the light beams incident on the point P1, the point P4 and the point P7 are respectively propagated to the inside of the cylindrical surface 12, the light fluxes incident on the conjugate plane 40 The position of the passage range on the surface is shifted. That is, the range R5 is arranged at the end on the -Y axis side on the conjugate plane 40, the range R7 is arranged at the end on the + Y axis side on the conjugate plane 40, and the range R6 is arranged in the middle between the range R5 and the range R7 do. As a result, the illumination light L1 incident on the illumination area IR becomes a range R8 of an elongated circular shape connecting the range R5 and the range R7 to the shape of the pupil in the conjugate plane 40. [

As described above, the principal ray L2a generated at each position of the illumination area IR of the imaging light beam L2 is incident on the cylindrical surface 12 in the circumferential direction of the cylindrical surface 12 and in the direction parallel to the rotational center axis AX1 In each direction, they are almost parallel to each other. Therefore, the projection optical system PL can telecentrically configure the incident side (the exit side of the illumination region IR).

Since the illumination optical system IL is configured so that the imaging light flux L2 incident on the projection optical system PL is close to the parallel light flux in the processing apparatus U3 (exposure apparatus EX) of the present embodiment as described above, It is possible to precisely project and project the image of the curved mast pattern M without complicating the projection optical system PL. Therefore, the processing apparatus U3 can efficiently expose the substrate P by performing the exposure processing while rotating the mask pattern M.

The optical path of the illumination light L1 and the optical path of the imaging light L2 can be separated from each other because the processing unit U3 has the optical isolator 10 disposed on the coplanar surface 28 of the projection optical system PL. Therefore, the processing apparatus U3 can reduce the loss of light quantity and the generation of stray light in the PBS as compared with a configuration in which the optical path is divided by using, for example, a polarization splitter (PBS) or the like . The optical isolator 10 may be constituted by a PBS or the like.

Since the optical separation section 10 defines the passage range of the illumination light L1 directed to the illumination region IR through the passage portion 15, the direction of the principal ray L1a of the illumination light L1 when entering the illumination region IR is It can be defined with high precision. Since the optical separation section 10 defines the passage range of the illumination light L1 using the reflection section 16, it is possible to simplify the configuration and the like.

The relationship (for example, parallel to each other) of the principal ray L1a distributed in the direction parallel to the rotation center axis AX1 of the illumination light L1 is the same as that of the principal ray L2 distributed in the direction parallel to the rotation center axis AX1, L2a < / RTI > relationship (e. G., Parallel to each other). The relationship (for example, parallel to each other) of the principal rays L2a distributed in the circumferential direction of the cylindrical surface 12 in the imaging light beam L2 is the relationship of the principal ray L1a distributed in the circumferential direction of the cylindrical surface 12 of the illumination light L1 (E. G., Non-parallel to each other). Therefore, for example, the diffusion angle NA of the illumination light L1 is set to be an optical member having isotropic power so that the principal ray L2a distributed in the circumferential direction of the cylindrical surface 12 in the imaging light beam L2 becomes a parallel relation to each other The relationship of the principal ray L2a distributed in the direction parallel to the rotation center axis AX1 among the imaging light beams L2 is not parallel to each other.

The diffraction angle of the illumination light L1 reaching the illumination area IR on the cylindrical surface 12 of the drum mask DM is made to correspond to the rotation center axis AX1 by the cylindrical lens 25 (Y-axis direction) and the circumferential direction of the cylindrical surface 12 in the illumination area IR.

That is, the cylindrical lens 25 is arranged such that the principal ray L1a of the principal ray L1a of the illumination light L1 reaching the illumination area IR is parallel to the principal ray L1a parallel to the rotation center axis AX1, The main ray L1a is deflected such that its extension line 41 crosses a line on the conjugate plane 40 parallel to the rotation center axis AX1. Therefore, the principal ray L2a of the image forming light beam L2 distributed in the direction parallel to the rotation central axis AX1 is made substantially parallel to each other, and the principal ray L2a of the image forming light beam L2 distributed in the circumferential direction of the cylindrical surface 12 It can be made almost parallel. As a method of giving anisotropy to the diffusing angle of the illumination light L1, a light guiding member in which an optical fiber is bundled is used and the shape of the light output side of the light guiding member is set to, for example, Shaped or elliptical shape like the opening 23a of the first diaphragm 23 and the light output side thereof may be arranged at the position of the first diaphragm 23 in Fig.

[Second Embodiment]

Next, the second embodiment will be described. In the present embodiment, constituent elements similar to those of the above embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

Fig. 14 is a diagram showing a configuration of a processing apparatus (exposure apparatus EX2) according to the present embodiment. The exposure apparatus EX2 shown in Fig. 14 is different from the first embodiment in that the projection optical system PL is composed of an optical system such as an opener optical system.

The projection optical system PL includes a first projection optical system PL1 for forming a middle image Im of a part of the mask pattern M (illumination area IR), and a second projection optical system PL2 for forming a middle image formed by the first projection optical system PL1 on the substrate P And a second projection optical system PL2 for projecting the light onto the projection area PR on the projection optical system PL. Here, each of the first projection optical system PL1 and the second projection optical system PL2 is composed of an optical system such as an offner optical system.

The elements of the illumination optical system IL arranged from the light source 20 to the optical splitting section 50 can be configured similarly to the first embodiment. The illumination light L1 emitted from the light source 20 passes through the uniformizing optical system 19, so that the light intensity distribution in the second diaphragm member 26 is made uniform. The illumination light L1 having passed through the second diaphragm member 26 is incident on the light separation unit 50 through the lens group 27. [

Fig. 15 is an enlarged view of a part of the illumination optical system IL and the first projection optical system PL1 in Fig. The light separating section 50 includes the passing section 15 and the reflecting section 16 as described in the first embodiment. The light separation unit 50 is disposed at or near the position of the hibernation where the light source image forming the source of the illumination light L1 is formed. The arrangement of the passing portion 15 and the reflecting portion 16 is the same as that of the first embodiment.

The optical isolator 50 has a surface 50a on which the illumination light L1 is incident and a surface 50b facing the opposite side of the surface 50a. The surface 50b is a surface on which the imaging light beam L2 is incident in the optical path of the first projection optical system PL1 and is convex toward the outside (the incidence side of the imaging light beam L2).

The illumination light L1 that has passed through the passing portion 15 of the light separating portion 50 passes through the lens group 51 used for correcting the aberration and is incident on the reflecting surface 53a of the concave mirror 53. [ The reflecting surface 53a is disposed so as to face the surface 50b of the light separation portion 50. [ The reflecting surface 53a of the concave mirror 53 and the surface 50b of the light separating portion 50 are curved surfaces that are disposed at substantially the same center of curvature.

The illumination light L1 incident on the reflecting surface 53a is condensed by being reflected by the reflecting surface 53a and is incident on the reflecting surface 54a of the deflecting member (flat reflecting mirror) 54 while converging. The illumination light L1 incident on the reflection surface 54a of the biasing member 54 is deflected by being reflected by the reflection surface 54a and incident on the illumination region IR through the image adjustment member 55. [ The phase adjusting member 55 is an optical member (a lens element having power) used for adjustment of light intensity distribution, adjustment of a diffusion angle, correction of aberrations, and the like.

The illumination optical system IL as described above has a configuration in which the main light ray L1 of the illumination light L1 incident on the illumination region IR is irradiated to the illumination region IR in order to make the principal rays of the imaging light flux L2 generated in the illumination region IR parallel to each other, So as to intersect the inside of the drum mask DM.

The imaging light beam L2 generated in the illumination area IR is incident on the reflecting surface 54a of the deflecting member 54 through the image adjusting member 55 and reflected by the reflecting surface 54a to be half of the concave mirror 53 And is incident on the slope surface 53a. The image forming light beam L2 incident on the reflecting surface 53a is condensed by being reflected by the reflecting surface 53a and is incident on the reflecting portion 16 of the light separating portion 50 through the lens group 51 while converging. The image forming beam L2 incident on the reflecting portion 16 is reflected by the reflecting portion 16 and passes through the lens group 51 and is incident on the reflecting surface 53a of the concave mirror 53. [ The image forming light beam L2 incident on the reflecting surface 53a is condensed by being reflected by the reflecting surface 53a and is incident on the reflecting surface 56a of the deflecting member (flat reflecting mirror) 56 while converging.

Here, the biasing member 54 and the biasing member 56 are provided so as to pass the imaging light beam L2 between the biasing member 54 and the biasing member 56. [ The image forming light beam L2 incident on the reflecting surface 56a of the biasing member 56 is deflected by being reflected by the reflecting surface 56a and passes through the image adjusting member 57 and is incident on the intermediate top surface 32. [ The phase adjusting member 57 is an optical member having the same function as that of the phase adjusting member 55. In this way, the first projection optical system PL1 forms the intermediate image Im on the intermediate upper surface 32 of a part (illumination area IR) of the mask pattern M.

14, the second projection optical system PL2 is constituted by disposing a convex mirror 60 in place of the optical isolator 50, for example. The imaging light beam L2 having passed through the intermediate upper surface 32 is reflected by the first reflecting surface 61a of the deflecting member 61 and is incident on the concave mirror 62 and is reflected by the concave mirror 62 to be reflected by the convex mirror 60 . The imaging light beam L2 incident on the convex mirror 60 is reflected by the convex mirror 60 and is incident on the concave mirror 62 and is reflected by the concave mirror 62 and then reflected by the second reflecting surface 62 of the deflecting member 61 61b and is incident on the projection area PR on the substrate P supported by the rotary drum DP. The second projection optical system PL2 projects the intermediate image Im of the illumination area IR of the mask pattern M onto the projection area PR on the substrate P. [

[Third embodiment]

Next, the third embodiment will be described. In the present embodiment, constituent elements similar to those of the above embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

16 is a diagram showing a configuration of the device manufacturing system SYS2 (flexible display manufacturing line) of the present embodiment. Here, the flexible substrate P (sheet, film, etc.) drawn out from the supply roll FR1 passes through the n processing units U1, U2, U3, U4, U5, ... Un, And is wound around the frame FR2.

16, the XYZ orthogonal coordinate system is set so that the front side (or back side) of the substrate P is perpendicular to the XZ plane and the direction (width direction) perpendicular to the carrying direction (long direction) of the substrate P is Y axis direction.

Next, the principle of exposure by the processing apparatus U3 (exposure apparatus EX, substrate processing apparatus) of the device manufacturing system SYS2 of the present embodiment will be described. 17 is a schematic view for explaining the optical system of the exposure apparatus EX3. 18 is a view showing the illumination light L1 incident on the illumination area IR and the imaging light beam L2 emitted from the illumination area IR.

The exposure apparatus EX3 shown in Fig. 17 includes a drum mask DM for holding a mask pattern M, an illumination optical system IL, a projection optical system PL, and a rotary drum DP (The substrate support roll DR5 shown in Fig. 16).

The drum mask DM has a cylindrical outer peripheral surface (hereinafter also referred to as a cylindrical surface 12), and a reflective mask pattern M is curved and held in a cylindrical surface shape along the cylindrical surface 12 . The cylindrical surface is a surface curved at a predetermined radius around a predetermined center line (rotation center axis AX1), and is, for example, at least a part of a circular column or an outer peripheral surface of a cylinder.

The illumination optical system IL subjects the illumination area IR on the mask pattern M held by the drum mask DM to the illumination light L1 through a part of the projection optical system PL. The illumination optical system IL includes a first optical system 13 forming a light source image L0 that is a source of the illumination light L1 and a second optical system 14 serving also as a part of the projection optical system PL. The light source image L0 formed by the first optical system 13 is formed in the vicinity of the passing portion 15 (transmitting portion) of the light separation portion 10 and the illumination light L1 traveling from the light source image L0, Is incident on the second optical system 14 through the passing portion 15 and passes through the second optical system 14 and is incident on the illumination region IR.

The projection optical system PL projects the image of the illumination area IR on the mask pattern M onto the substrate P by projecting the reflected light flux generated in the illumination area IR onto the substrate P supported by the rotary drum DP P). The projection optical system PL includes a first projection optical system PL1 for forming a middle image Im of the illumination area IR and a second projection optical system PL for projecting the intermediate image Im formed by the first projection optical system PL1 onto the substrate P. [ And an optical system PL2. The first projection optical system PL includes a light separation section 10 and a second optical system (optical system) 14 disposed in an optical path between the light separation section 10 and the illumination region IR. In the following description, the light flux generated in the mask pattern M illuminated by the illumination light L1 and projected onto the substrate is referred to as an imaging light flux L2.

The imaging light flux L2 generated in the illumination area IR passes through the second optical system 14 of the first projection optical system PL1 and is reflected by the reflection part 16 of the optical splitting part 10, 14 again and is incident on the biasing member 17. [ The imaging light beam L2 incident on the deflecting member 17 is deflected by the deflecting member 17 and is incident on the concave mirror 18.

The light flux (imaging light flux L2) generated from a certain point in the illumination area IR passes through the second optical system 14 two times to form a corresponding point on the intermediate image plane 42 that is optically conjugate with the illumination area IR Convergence point). Thus, the first projection optical system PL1 forms the intermediate image Im on the intermediate upper surface 42 of a part (illumination area IR) of the mask pattern M illuminated by the illumination light L1. The intermediate top surface 42 is a cylindrical surface concave toward the light incidence side (the side of the deflecting member 17) since the illumination area IR is a convex cylindrical surface shape toward the light output side.

The concave cylindrical surface (hereinafter, simply referred to as concave mirror) 18 is disposed at or near the intermediate upper surface 42. The concave mirror 18 is curved in a cylindrical surface shape concave toward the light incidence side along the intermediate upper surface 42. The image forming beam L2 reflected by the concave mirror 18 is projected onto the projection area PR via the optical member (lens, mirror, etc.) of the second projection optical system PL2. The image of the illumination area IR of the mask pattern M is projected onto the projection area PR on the substrate P supported on the rotary drum DP.

Here, it is assumed that the concave mirror 18 is not provided (in the case of a simple flat mirror). In this configuration, the upper surface (image surface) of the second projection optical system PL2 has a cylindrical surface shape concave toward the light incidence side like the upper surface (intermediate upper surface) of the first projection optical system PL1, (The projection area and the direction of the concavo-convex are reversed with respect to the tangent plane of the projection area). For this reason, the defocus increases as the distance from the tangent to the tangent plane in the circumferential direction of the curved projection area increases.

In the exposure apparatus EX3 shown in Fig. 17, the concave mirror 18 converts the upper surface so that the upper surface of the second projection optical system PL2 becomes convex toward the light incidence side. In other words, the concave mirror 18 is arranged so that the center of curvature of the upper surface of the second projection optical system PL2 is located on the same side as the center of curvature of the projection area PR with respect to the projection area PR, As shown in FIG. Therefore, the upper surface of the second projection optical system PL2 has a shape that follows the projection area PR on the substrate P curved in a cylindrical shape. As a result, the exposure apparatus EX3 can accurately It can be faithfully transferred faithfully, and high-precision pattern exposure becomes possible.

18, the angle of incidence of the illumination light L1 with respect to the illumination area IR of the principal ray L1a of the illumination light L1 is set to be smaller than the incident angle of the principal ray L1a of the illumination light L1 on the circumference of the cylindrical surface 12. [ Direction of the principal ray L1a. That is, the principal rays of the illumination light incident on the water surface (object surface) are not parallel to each other, but converge to a half of the radius of the cylindrical surface 12, as in the case of a Qualler illumination method using a normal illumination system. In this way, the principal ray L2a of the reflected light flux (imaging light flux L2) generated at each point in the illumination area IR becomes a state (telecentric) parallel to the circumferential direction of the cylindrical surface 12.

In the present embodiment, the illumination optical system IL is configured as a non-telecentric system in which the principal ray of the illumination light L1 is not parallel with respect to the circumferential direction of the cylindrical surface 12, and the principal ray of the image- To be parallel. Therefore, as shown in Fig. 18, the extension line 41 extending the main light ray L1a of the illumination light L1 crosses at a position half of the radius from the inside of the cylindrical surface 12.

In this imaging light beam L2, the principal ray L2a generated at each point on the illumination region IR is emitted from the illumination region IR, for example, in a parallel relationship with each other. The progress direction of each principal ray L2a when viewed from the direction of the center line (rotation center axis AX1) of the drum mask DM is determined by the position of occurrence of each principal ray L2a on the illumination region IR and the rotation center axis AX1 in the radial direction). 17, the progressing direction of each principal ray L2a when viewed in the direction of the rotation center axis AX1 is, for example, a direction perpendicular to the optical axis 14a of the second optical system 14 Direction.

As described above, the illumination optical system IL is configured so that the incidence side of the first projection optical system PL1 becomes telecentric. However, the imaging light beam L2 passing through the projection optical system PL is, for example, The telecentric relationship may be collapsed due to the aberration or the like generated in the first lens group PL1. The concave mirror 18 is provided so as to adjust the characteristics of the image projected onto the substrate P in consideration of, for example, aberration generated in the first projection optical system PL1. Therefore, even when the curved mast pattern M is used, the exposure apparatus EX3 can be exposed with high precision.

The first projection optical system PL1 is configured, for example, as a reduction optical system having a magnification N times (N <1). That is, the first projection optical system PL1 forms an image of a part of the mask pattern M on the intermediate upper surface 42 at a reduction magnification. With this configuration, the amount of shift from the telecentric relationship of the principal ray L2a in the imaging light flux L2 can be reduced. The projection optical system PL is a so-called optical system for forming an image of a part of the projection area PR of the mask pattern M in the projection area PR at an equal magnification and the second projection optical system PL2, for example, And is configured as a magnification optical system having a magnification of 1 / N.

The first projection optical system PL1 and the second projection optical system PL2 may be all equal optical systems in the case where the projection optical system PL is a uniform optical system as a whole and either one may be a reduction optical system and the other may be a magnification optical system . Further, the projection optical system PL may be a reduction optical system as a whole, or may be a magnification optical system as a whole.

Next, the structure of the processing apparatus U3 (exposure apparatus EX3) will be described in more detail.

19 is a diagram showing the configuration of the exposure apparatus EX3. The exposure apparatus EX3 includes a drum mask DM (mask holding member) which holds the mask pattern M and is rotatable around the rotation center axis AX1, a rotation center axis AX2 which supports the substrate P, And a rotary drum DP (substrate supporting member) rotatable around the rotary drum DP. The rotational center axis AX2 of the rotary drum DP is set substantially parallel to the rotational center axis AX1 of the drum mask DM, for example.

The drum mask DM is a circular columnar or cylindrical member having a predetermined radius, and the outer circumferential surface thereof is a cylindrical surface 12. The mask pattern M is wound on the outer peripheral surface of the drum mask DM, for example, and is releasably mounted on the drum mask DM. The mask pattern M may be formed on the surface of the drum mask DM using a deposition method or the like and may not be released from the drum mask DM. As the releasable mask pattern (M), a chromium layer deposited with an ultra-thin glass sheet (thickness of about 100 탆) is patterned, or a transparent resin or a sheet of plastic is patterned with a light-shielding layer. In any of the cases where the sheet-like mask pattern M is wound around the drum mask DM or the mask pattern M is directly drawn on the surface of the drum mask DM, It is important to precisely grasp the radius (diameter) of the mask pattern M that is curved in the shape.

The rotary drum DP is a circular columnar or cylindrical member having a predetermined radius, and the outer circumferential surface thereof is a cylindrical surface. The substrate P is supported on the rotary drum DP, for example, by being wound around a part of the outer circumferential surface of the rotary drum DP. The projection area PR onto which the image of the mask pattern M is projected is disposed in the vicinity of the outer peripheral surface of the rotary drum DP. The configuration of the substrate supporting member for supporting the substrate P can be appropriately changed. For example, the substrate P may be supported by being suspended on a plurality of conveying rollers, and in this case, the projection area PR may be arranged in a plane between a plurality of conveying rollers.

19, the illumination optical system IL illuminates the illumination area IR on the mask pattern M held by the drum mask DM with a uniform brightness by an illumination method such as a qualifier illumination. The projection optical system PL projects an image forming beam L2 generated in the illumination area IR toward the projection area PR on the substrate P supported on the rotary drum DP by moving a part (In the illumination area IR) is imaged on the projection area PR on the substrate P. [

The exposure apparatus EX3 is a so-called scanning exposure apparatus and the image of the mask pattern M held by the drum mask DM is rotated by the rotation of the drum mask DM and the rotary drum DP at a predetermined rotation rate ratio And the surface of the substrate P supported on the rotary drum DP (the surface curved along the cylindrical surface).

The exposure apparatus EX3 is provided with a rotary drive section for rotationally driving the drum mask DM and the rotary drum DP respectively and a rotary drive section for detecting the positions of the drum mask DM and the rotary drum DP A moving unit for adjusting the position of each of the drum mask DM and rotary drum DP and a control unit for controlling each section of the exposure apparatus EX3.

The control unit of the exposure apparatus EX3 controls the rotation driving unit on the basis of the rotational positions of the drum mask DM and the rotary drum DP detected by the position detecting unit to set the drum mask DM and the rotary drum DP in a predetermined To rotate at a rotational speed ratio of. The control section can adjust the relative positions of the drum mask DM and the rotary drum DP by controlling the moving section based on the detection result of the position detecting section.

Next, the illumination optical system IL will be described in more detail. The first optical system 13 of the illumination optical system IL is constructed by a homogenizing optical system 19 and an m homogenizing optical system 19 disposed in an optical path from the light source 20 to the optical splitting section 10, And a lens group 27 disposed in an optical path leading to the optical path.

The uniformizing optical system 19 forms a plurality of primary light source images by the light emitted from the light source 20 and uniformizes the light intensity distribution by superimposing the light fluxes from the plurality of primary light source images. The illumination light L1 emitted from the homogenizing optical system 19 advances in a direction opposite to the optical axis 27a of the lens group 27 and enters the lens group 27. [ The lens group 27 forms a secondary light source image which is conjugate with the primary light source image formed by the homogenizing optical system 19. [ Here, the lens group 27 is an axisymmetric optical system, and the optical axis 27a of the lens group 27 is referred to as an optical axis 13a of the first optical system 13.

The light source 20 of the present embodiment can be configured in the same manner as the first embodiment, for example. In the present embodiment, the illumination unit IU shown in Fig. 16 includes a light source 20 and a first optical system 13, for example.

20 is a diagram showing the configuration of the homogenizing optical system 19. As shown in Fig. The homogenizing optical system 19 shown in Fig. 20 includes an input lens 21, a fly-eye lens 22, a first diaphragm 23, a relay lens (condenser lens) 24, a cylindrical lens 25 ), And a second diaphragm member (26).

The input lens 21 of the present embodiment can be configured in the same manner as the first embodiment, for example. The optical axis 21a of the input lens 21 of the present embodiment is substantially parallel to the optical axis 27a of the lens group 27 (see FIG. 19), and in the X-axis direction orthogonal to the optical axis 27a, And shifted to the + X-axis side from the position 27a.

The fly-eye lens 22 of the present embodiment can be configured in the same manner as the first embodiment, for example. The fly-eye lens 22 of the present embodiment spatially divides the illumination light L1 emitted from the input lens 21 for each lens element 22b. A light source image (light-converging point) is formed for each lens element 22b in the exit end face 22c where light is emitted from the fly-eye lens 22. The surface on which the primary light source image is formed is optically conjugate with the later explained conjugate plane (first conjugate plane) 40 (shown in Fig. 24 and the like).

The first diaphragm member 23 is a so-called aperture stop and is disposed at or near the exit end face 22c of the fly-eye lens 22 (see Fig. 20). 21 is a view showing a configuration of the first diaphragm member 23. Fig. The first diaphragm member 23 has an elongated circular or elliptical opening 23a passing through at least a part of the illumination light L1 from the fly-eye lens 22, and the center of the opening 23a is, for example, Is substantially coaxial with the optical axis 21a of the input lens 21 (see Fig. 20).

As shown in Fig. 20, the first diaphragm member 23 is disposed on a plane perpendicular to the optical axis 21a of the input lens 21 (parallel to the XY plane). The inner dimension (dimension) D1 of the opening 23a in the first direction (X axis direction) is smaller than the inner dimension (dimension) in the second direction (Y axis direction) corresponding to the direction parallel to the rotation center axis AX1 ) D2. The first direction of the inner dimension (dimension) D1 coincides with the circumferential direction of the cylindrical surface 12 in the illumination area IR on the drum mask DM in Fig. 17 or Fig.

In the present embodiment, the first direction and the second direction can be defined similarly to the first embodiment.

Figs. 22A and 22B are diagrams showing the configurations from the first diaphragm 23 to the optical splitting section 10. Fig. Fig. 22A shows a plan view on a plane orthogonal to the rotation center axis AX1. 22B shows a plan view on a plane parallel to the rotation center axis AX1.

22A, the opening 23a of the first diaphragm 23 is disposed at one side (+ X-axis side) with respect to the optical axis 13a of the first optical system 13. 22B, the opening 23a of the first diaphragm member 23 is symmetrically arranged with respect to the optical axis 13a of the first optical system 13 in the Y-axis direction. That is, the first diaphragm member 23 is arranged such that the optical axis 13a of the first optical system 13 passes through the center of the opening 23a when viewed in the X-axis direction.

The relay lens (condenser lens) 24 is disposed at a position where light passing through the first diaphragm member 23 is incident. The relay lens 24 is provided so as to superpose a light flux from a plurality of primary light source images (light-converging points) formed in the fly-eye lens 22. The illumination light L1 from the plurality of primary light source images formed on the fly-eye lens 22 has a uniform light intensity distribution at the overlapping positions.

The cylindrical lens 25 is arranged in an optical path from the position where the primary light source image is formed to the second diaphragm member 26 in the fly-eye lens 22. The cylindrical lens 25 has a surface including a circular arc in the circumferential direction of the cylindrical surface 12 (mask pattern surface) of the drum mask DM (see FIG. 17), that is, (Power) of the XZ plane perpendicular to the rotational center axis AX1 is larger than the refractive power (power) of the YZ plane parallel to the rotational center axis AX1.

The second diaphragm member 26 is a so-called field stop and defines the position and shape of the illumination area IR. The second diaphragm member 26 is disposed at or near the conjugate position with the illumination region IR. The center position of the aperture through which the illumination light L1 passes in the second diaphragm member 26 is shifted toward the + X axis side by the optical axis 13a of the first optical system 13 as shown in Fig. 22A. 22B, the center position of the aperture through which the illumination light L1 passes in the second diaphragm member 26 is arranged substantially at the same position as the optical axis 13a of the first optical system 13. [

Light from a plurality of primary light source images formed on the fly-eye lens 22 is superposed on the position of the second diaphragm member 26 by the relay lens 24 and the cylindrical lens 25, The light intensity distribution in the diaphragm member 26 is made uniform. That is, the input lens 21, the fly-eye lens 22, the relay lens 24, and the cylindrical lens 25 uniform the light intensity distribution of the illumination light L1.

The illumination optical system IL is disposed in at least a part of the optical path from the primary light source to the second diaphragm member 26 and is arranged so as to divide the light intensity distribution of the illumination light L1 originating from the primary light source image into a second diaphragm member 26 or a uniformizing optical system 19 which is uniform in the vicinity thereof. The illumination optical system IL may not be provided with the second diaphragm member 26 when the projection optical system PL is provided with the visual field diaphragm, for example. In addition, the homogenizing optical system 19 may be configured by using a rod lens instead of the fly-eye lens 22. In this case, the configuration of the illumination optical system IL is appropriately changed so that the exit surface for emitting light in the rod lens becomes optically conjugate with the illumination area IR.

The lens group 27 is composed of, for example, a plurality of lenses that are axisymmetric about a predetermined axis as a rotation center. As shown in Fig. 22B, the lens group 27 forms a moving surface 28 which is optically conjugate with the first stop member 23 when viewed in the X-axis direction. On the aspherical surface 28, a light source image L0 (secondary light source image), which is the source of the illumination light L1 irradiated on the illumination area IR, is formed, as shown in Fig.

The secondary light source image L0 formed on the coplanar surface 28 of the first projection optical system PL1 is projected onto the cylindrical surface 12 of the drum mask DM along the illumination optical path, Is set to be larger than the dimension in the direction of the rotation center axis (center line) AX1.

The distribution range of the secondary light source image L0 formed on the second conjugate plane (the coaxial plane 28) is set such that the distribution range of the secondary light source image L0 is distributed in the cylindrical space of the drum mask DM along the illumination light path. The dimension in the direction of the rotation center axis (center line) AX1 is set to be smaller than the dimension in the circumferential direction of the cylindrical surface 12 when projected on the surface 12.

Incidentally, the lens group 27 is configured to converge, on the hibernation plane 28, a component diffused in the Y-axis direction among the light flux from the primary light source formed on the first diaphragm member 23. [ Here, since the power of the cylindrical lens 25 is different in the X-axis direction and the Y-axis direction, the diffusion from the points on the primary light source image (the aperture 23a of the first diaphragm member 23) Components do not converge at corresponding points on the aspherical surface 28 as shown in Figure 22A. In other words, the coaxial plane 28 is optically conjugate with the first diaphragm member 23 when viewed in the X-axis direction, and may not be optically conjugate with the first diaphragm member 23 when viewed in the Y-axis direction .

The optical separation section 10 of the present embodiment can be configured in the same manner as the first embodiment, for example. The optical separation section 10 of the present embodiment includes a lens member 30 made of a material through which light is transmitted and a reflection film 31 formed on the surface of the lens member 30. The lens member 30 has the same shape as a meniscus lens and has a convex surface on the side of the surface 30a on which the illumination light L1 is incident from the first optical system 13 and a convex surface on the side opposite to the surface 30a The surface 30b side is a concave surface. The surface 30b is, for example, a curved surface including a part of a spherical surface. The reflective film 31 is provided on the surface 30b of the lens member 30. [

23 is a plan view showing the configuration of the optical isolator 10. 23, the optical isolator 10 includes a passing portion 15 through which at least a part of the illumination light L1 from the first optical system 13 passes, And a reflecting portion 16 for reflecting the generated imaging light beam L2 (see Fig. 17). The optical isolator 10 is disposed over the optical path from the primary light source to the illumination area IR and the optical path from the illumination area IR to the intermediate top surface 42. [ The reflecting portion 16 of the optical splitting portion 10 of the present embodiment includes, for example, a reflecting surface (reflecting film 31) curved in a concave shape including a part of a spherical surface.

As shown in Fig. 19, the second optical system 14 is disposed at a position where the illumination light L1 passing through the passing portion 15 of the light separation portion 10 is incident. The second optical system 14 condenses the illumination light L1 so that the illumination region IR is optically conjugate with the first stop member 23. [ That is, the lens group 27 and the second optical system 14 form a surface in the illumination area IR that is optically conjugate with the second stop member 26.

The second optical system 14 is constituted by, for example, a plurality of lenses which are axisymmetric around a predetermined central axis. In the present embodiment, this predetermined central axis is referred to as an optical axis 14a of the second optical system 14. The optical axis 14a of the second optical system 14 is set to be coaxial with the optical axis 13a of the first optical system 13, for example. The illumination light L1 incident on the second optical system 14 passes through one side with respect to the plane (YZ plane) including the optical axis 14a of the second optical system 14 and exits from the second optical system 14. The illumination light L1 emitted from the second optical system 14 is incident on the illumination region IR on the mask pattern M held by the drum mask DM. This illumination light L1 is reflected and diffracted by the mask pattern M, whereby an imaging light beam L2 is generated.

Here, the illumination light L1 when entering the illumination area IR and the imaging light L2 emitted from the illumination area IR will be described in more detail.

24 shows the relationship between the light flux (illumination light L1) incident on the illumination region IR and the imaging light flux L2 emitted from the illumination region IR in the direction of the rotation center axis AX1 of the drum mask DM FIG. FIG. 25 is a top view of the imaging light beam L2 emitted from the illumination area IR, viewed in the direction (Z-axis direction) perpendicular to FIG. 24 and 25 for the illumination light L1 and the imaging light flux L2 in this embodiment are the same as those in Figs. 10 and 11 of the first embodiment, It is omitted.

Next, the shape of the pupil in the plane of the light source and the conjugate plane (the coaxial plane 28 and the conjugate plane 40) will be described. Fig. 26 is a diagram showing a representative position of the illumination area IR referred to in the description of the pupil. 27 is a diagram showing the shape of a pupil in the conjugate plane 40 which is a conjugate region with the light source image. Here, for convenience of explanation, the light fluxes (the illumination light L1 and the imaging light flux L2) passing through respective points of the illumination area IR are arranged in a direction of the light spot on the surface (the coplanar surface 28 and the conjugate surface 40) The shape is assumed to be caused.

26, reference numerals P1 to P9 denote points on the illumination area IR viewed from the plane in the X-axis direction. The point P1, the point P2 and the point P3 are groups (referred to as a first group) of points arranged in the circumferential direction (X direction in the plan view) of the cylindrical surface 12 of the drum mask DM. The point P1 is located on the + X axis side of the illumination region IR, the point P3 is located on the -X axis side of the illumination region IR, and the point P2 is located in the center of the point P1 and the point P3. Similarly, the second group of points P4, P5 and P6, the third group of points P7, P8 and P9 are groups of points arranged in the circumferential direction of the cylindrical surface 12, respectively. The first group of points P1 to P3 is arranged at the end on the -Y axis side of the illumination area IR and the third group of points P7 to P9 is arranged on the end on the + Y axis side of the illumination area IR , And the second group of points P4 to P6 is disposed between the first group and the third group.

First, the range of passage of the illumination light L1 in the moving surface 28 (optical isolator 10) will be described. The principal ray of the illumination light L1 incident on the point P1, the point P4 and the point P7 arranged in the direction parallel to the rotation center axis AX1 (Y axis direction) on the periphery of the illumination area IR shown in Fig. , The incident positions in the circumferential direction of the illumination region IR are almost the same, and the incident angles to the illumination region IR are almost the same. Therefore, the luminous fluxes incident on the point P1, the point P4 and the point P7 are set such that the positions of the passing ranges on the light separation section 10 (the coplanar plane 28) coincide with each other in the X axis direction do. Therefore, as shown in FIG. 23, all of the light beams incident on the point P1, the point P4, and the point P7 pass through the range R3 on the optical splitting section 10 (the focal plane 28). Similarly, all of the light beams incident on the point P3, the point P6, and the point P9 in the illumination area IR arranged in the direction parallel to the rotation center axis AX1 all pass through the range R4 on the hosel surface 28. [

The principal ray of the illumination light L1 incident on the point P1 and the principal ray of the illumination light L1 incident on the point P3 are different in the incident position in the circumferential direction of the illumination region IR (cylindrical surface 12) ) Are different from each other.

Therefore, the passing range (range R3) on the optical splitting section 10 (the aspherical surface 28) through which the light beam incident on the point P1 passes and the optical splitting section 10 (The range R4) on the plane surface 28 is shifted in the X-axis direction on the coplanar surface 28 and shifted in the circumferential direction of the cylindrical surface 12 in the illumination area IR.

In Fig. 23, the position in the Y-axis direction of the range R3 on the cooing plane 28 is almost equal to the range R4. The position of the range R3 in the X axis direction is further away from the intersection 13b between the optical axis 13a of the first optical system 13 and the optical splitting section 10 than the position in the X axis direction of the range R4.

The passing range of the light beam incident on the point P2, point P5, and point P8 arranged in the Y-axis direction parallel to the rotation center axis AX1 in the illumination area IR shown in Fig. 26 is as shown in Fig. 23 But is disposed between the range R3 and the range R4. Likewise, the light flux passing through an arbitrary point on the line connecting the point P1 and the point P3 passes through the range shifted from the range R3 to the range R4 in accordance with the shift amount from the point P1 of this arbitrary point. Therefore, the passing range on the pupil plane 28 of the illumination light L1 incident on the illumination area IR is, for example, a range R2 of elongated circular shape connecting the range R3 and the range R4.

When the range R2 of the passing portion 15 is elongated like this, the principal ray L2a of the image forming light beam L2 distributed in the circumferential direction of the rotational axis AX1 is incident on the illumination region with the illumination light as a parallel light flux (Telecentric state), which is more parallel to each other. This is achieved in addition to setting the light separation section 10 and the preceding illumination optical system such that the conjugate plane 40 is disposed at or near the central position of the rotation center axis AX1 and the illumination region IR.

Next, the shape of the pupil in the conjugate plane 40 will be described. The shape of the pupil in the conjugate plane 40 is determined so that the shape of the spot formed on the conjugate plane 40 and the shape of the spot formed on the conjugate plane 40 become the same when the illumination light L1 incident on the illumination area IR is virtually propagated to the inside of the drum mask DM Almost the same.

The extended line 41 (see FIG. 24) of the main ray L1a is formed on the conjugate plane 40 at almost one point on the point P1, the point P2, and the point P3 in the illumination area IR arranged in the circumferential direction of the cylindrical surface 12 The principal ray L1a of the illumination light L1 is incident. Therefore, assuming that the light beams incident on the point P1, the point P2, and the point P3 are propagated to the inside of the cylindrical surface 12, the positions of the passing ranges on the conjugate plane 40 coincide with each other, And passes through the range R5 shown in Fig. The light fluxes incident on the point P4, the point P5 and the point P6 in the illumination area IR arranged in the circumferential direction of the cylindrical surface 12 all pass through the range R6, The light beams incident on the points P7, P8, and P9 arranged in the circumferential direction all pass through the range R7.

The principal ray L1a of the illumination light L1 is incident on the point P1, the point P4, and the point P7 in the illumination area IR arranged in the direction (Y-axis direction) parallel to the rotation center axis AX1 in a substantially parallel relationship come. Therefore, if the light beams incident on the point P1, the point P4 and the point P7 are respectively propagated to the inside of the cylindrical surface 12, the light fluxes incident on the conjugate plane 40 The position of the passage range on the surface is shifted. That is, the range R5 is arranged at the end on the -Y axis side on the conjugate plane 40, the range R7 is arranged at the end on the + Y axis side on the conjugate plane 40, and the range R6 is arranged in the middle between the range R5 and the range R7 do. As a result, as shown in Fig. 27, the illumination light L1 incident on the illumination area IR becomes the elongated circular-shaped range R8 connecting the range R5 and the range R7 to the shape of the pupil in the conjugate plane 40 .

As described above, the principal ray L2a generated at each position of the illumination area IR of the imaging light beam L2 is incident on the cylindrical surface 12 in the circumferential direction of the cylindrical surface 12 and in the direction parallel to the rotational center axis AX1 In each direction, they are almost parallel to each other. Therefore, the projection optical system PL can be made telecentric on the incident side (the illumination region IR side). 19, the traveling direction of the principal ray L2a of the imaging light beam L2 at the time of emitting from the illumination area IR is such that, when viewed in the direction of the rotation center axis AX1, Perpendicular to the first direction 14a.

Next, the projection optical system PL will be described in more detail. The circular column shape is an optical path that functions as a first projection optical system. 29 is a view showing an optical path functioning as a second projection optical system.

The projection optical system PL includes a first projection optical system PL1 for forming a middle image Im as shown in a circular column shape and a second projection optical system PL2 for projecting the intermediate image Im onto the substrate P, (PL2). The first projection optical system PL1 and the second projection optical system PL2 are telecentric, for example, as a half-image field type reflective ocular molding projection optical system in which a circular image field is divided.

The first projection optical system PL1 shown in Fig. 28 includes a second optical system 14, a light splitting section 10, a deflecting member 17, a lens group 43, and a deflecting member 44. [

The second optical system 14 also serves as a part of the illumination optical system IL as described above and includes a lens group 45 and a lens group 46. The lens group 45 and the lens group 46 form a surface that is conjugate with the light source image formed by the illumination optical system IL (the surface 28 of the first projection optical system PL1).

The lens group 45 includes the optical axis PL2a of the second projection optical system PL2 and the illumination area IR (the XY plane) parallel to the rotation central axis AX1 (see Fig. 19) The mask DM). The lens group 46 includes the optical axis PL2a of the second projection optical system PL2 and is disposed in the illumination area IR (the XY plane) parallel to the rotation central axis AX1 Mask DM) on the opposite side.

The imaging light beam L2 incident on the second optical system 14 passes through an optical path different from the illumination light L1 (see Fig. 19) directed to the illumination region IR. The optical path of the imaging light beam L2 in the second optical system 14 is located on the side (the + X-axis side) substantially opposite to the optical path of the illumination light L1 with respect to the plane (YZ plane) including the optical axis 14a of the second optical system 14 .

The imaging light flux L2 having passed through the second optical system 14 is incident on the optical splitting section 10. [ The range R1 in which the imaging light beam L2 is incident on the light separating section 10 (see FIG. 23) is a range R2 (passing portion 15) in which the illumination light L1 is incident on the light separating section 10 from the first optical system 13, ) In the second embodiment. The range R1 in which the imaging light beam L2 is incident is set to the opposite side of the passing portion 15 with respect to the YZ plane and serves as the reflecting portion 16 of the light separation portion 10, for example. 18, since the principal ray L2a emitted from each point of the illumination region IR has a substantially parallel relationship with each other, the reflection region 16 is located at or near the elevation plane 28. Therefore, The light flux generated at each point of the light flux IR is incident on the reflection portion 16 so that spots overlap in the range R2.

28, the imaging light beam L2 incident on the reflection portion 16 of the light separation portion 10 is reflected by the reflection portion 16 and passes through the lens group 46 of the second optical system 14 , And is incident on the deflecting member (17). The deflecting member 17 is, for example, a prism mirror, and the plane on which the imaging light beam L2 is incident from the light separating unit 10 is a flat reflective surface.

The biasing member 17 is disposed at a position deviated from the optical path of the illumination light L1 so as not to block the illumination light L1 (see FIG. 19) passing through the second optical system 14 and directed to the illumination region IR. Here, the deflecting member 17 shields the imaging light beam L2 reflected by the optical splitting unit 10 so as not to face the drum mask DM. The imaging light beam L2 incident on the deflecting member 17 is deflected by the deflecting member 17 and is incident on the lens group 43. [

The lens group 43 condenses the imaging light beam L2 reflected by the deflecting member 17 so that an intermediate upper surface 42 that is in conjugate with the illumination area IR is formed. The lens group 43 is provided in the projection area PR (e.g., the center of the projection area PR) with respect to the plane (YZ plane) including the optical axis 14a of the second optical system 14 and the rotation center axis AX1 The rotary drum DP). The lens group 43 is configured to be optically equivalent to the lens group 45 of the second optical system 14, for example. The lens group 43 is composed of an optical member such as a lens which is rotationally symmetric around a predetermined axis (optical axis PL2a of the second projection optical system PL2). The optical axis PL2a of the second projection optical system PL2 is set to be orthogonal to the optical axis 14a of the second optical system 14, for example.

The imaging light beam L2 reflected by the deflecting member 17 and passed through the lens group 43 is incident on the reflecting surface 44a of the deflecting member 44 and deflected by the reflecting surface 44a to be deflected to form the concave mirror 18 . The deflecting member 17 is, for example, a prism mirror, and the reflecting surface 44a is substantially flat.

The second projection optical system PL2 shown in Fig. 29 includes a concave mirror 18, a deflecting member 44, a lens group 43, a lens group 47, and a concave mirror 48.

The concave mirror 18 shown in Figs. 28 and 29 is disposed at or near the intermediate upper surface 42 where the intermediate image Im is formed by the first projection optical system PL1. That is, the light flux emitted from each point on the illumination area IR of the imaging light flux L2 converges on each corresponding point (conjugate point) on the concave mirror 18 and is reflected at each point thereof. The surface of the concave mirror 18 on which the imaging light beam L2 is incident from the biasing member 44 is a generally cylindrical reflecting surface. The radius of curvature of the concave mirror 18 is set to be substantially equal to the radius of curvature of the illumination region IR irrespective of the magnification of the first projection optical system PL1.

The image forming beam L2 reflected by the concave mirror 18 advances in the direction of non-parallel to the advancing direction at the time of incidence on the concave mirror 18 and is incident on the deflecting member 44. [ The angle of incidence of the image forming light beam L2 reflected by the concave mirror 18 with respect to the deflecting member 44 becomes different from the angle of incidence with respect to the deflecting member 44 when it is directed toward the concave mirror 18. [ As a result, the image forming optical flux L2 reflected from the concave mirror 18 and the biasing member 44 is different from the optical path (see Fig. 28) of the imaging light beam L2 when the biasing member 17 is directed to the deflecting member 44 And enters the lens group 43 through the lens group 43. [

The imaging light beam L2 having passed through the lens group 43 is incident on the lens group 47 without being blocked by the deflecting member 17. [ In other words, the deflecting member 17 is located at a position where the image forming beam L2 reflected by the optical splitting unit 10 is incident, and after being reflected by the concave mirror 18, the image forming beam L2 reflected by the deflecting member 44 is incident And is disposed at a position where it is not.

The lens group 47 condenses the image forming light beam L2 that has been reflected by the deflecting member 44 and passed through the lens group 43 so as to form a coplanar surface 47a which is conjugate with the coplanar surface 28 of the first projection optical system PL1 do. The lens group 47 is configured to be optically equivalent to the lens group 46 of the second optical system 14, for example. The lens group 47 is composed of, for example, a lens which is rotationally symmetric around a predetermined axis (optical axis PL2a of the second projection optical system PL2).

The imaging light beam L2 reflected by the deflecting member 44 and passing through the lens group 43 and the lens group 47 is incident on the concave mirror 48. [ The concave mirror 48 is disposed, for example, at or near the position of the coinciding plane 47a in the second projection optical system PL2. The concave mirror 48 is configured as a reflecting surface, for example, in which the incident end face on the side where the imaging light beam L2 is incident is curved in a spherical shape. In the concave mirror 48, at least the region where the imaging light beam L2 is incident is a reflection surface.

In addition, the concave mirror 48 may not be a part of the area where the imaging light beam L2 is incident on the incidence plane. For example, the concave mirror 48 can function as a diaphragm member by making a part of the region where the image-forming light beam L2 is incident in the incident plane through a transmission portion through which the image-forming light beam L2 passes. Instead of at least part of the transmissive portion, an absorbing portion for absorbing the imaging light beam L2 may be provided.

The imaging light beam L2 reflected by the concave mirror 48 passes through the lens group 47 and the lens group 43 and is projected onto the projection area PR. The light flux from each point on the intermediate upper surface 42 of the imaging light beam L2 passes through the lens group 43 and the lens group 47 twice to form a surface conjugate with the intermediate upper surface 42 (The upper surface of the substrate PL2) (the conjugate point). In this way, the intermediate image Im formed on the intermediate upper surface 42 by the first projection optical system PL1 is projected onto the upper surface of the second projection optical system PL2.

The upper surface of the second projection optical system PL2 is set at substantially the same position as the projection area PR on the substrate P supported on the outer circumferential surface of the rotary drum DP, Is projected and exposed to the projection area PR. In this exposure apparatus EX3, the concave mirror 18 converts the upper surface of the second projection optical system PL2 so as to match the shape of the projection region PR, so that the image of the illumination region IR is faithfully projected do.

Incidentally, as described with reference to Fig. 25 and the like, the illumination optical system IL is configured such that the principal ray L2a of the imaging light beam L2 when it is incident on the projection optical system PL is substantially parallel to each other. However, the image forming light beam L2 that has passed through at least a part of the projection optical system PL may be sheeted from a relationship in which principal rays are parallel to each other due to, for example, aberration. There is a possibility that the precision of exposure may be lowered because the relationship between the principal rays of the image-forming light beam L2 at the time of entering the projection area PR and the relationship between them becomes parallel to each other.

Here, the projection optical system PL may be provided with a correcting section for correcting the direction of the principal ray of the imaging light beam L2 so as to approximate a nearly parallel relationship. This correction portion may be disposed at any position in the optical path from the illumination area IR to the projection area PR. However, the closer to the intermediate top surface 42, the more effectively the direction of the principal ray L2a of the imaging light beam L2 can be corrected.

For example, the concave mirror 18 is an optical member that is disposed closest to the intermediate top surface 42 of the projection optical system PL, and the above-described correction portion can be constructed using the concave mirror 18. For example, in the concave mirror 18, one or both of the shape and position of the reflecting surface may be set such that the principal ray of the imaging light beam L2 reaching the coaxial plane 47a of the second projection optical system PL2 is parallel to each other good.

That is, the shape of the concave mirror 18 may be set such that the cross-sectional shape orthogonal to the Y-axis direction, for example, is different from the circular shape so that the principal rays of the imaging light beam L2 become parallel to each other. The position of the concave mirror 18 is set such that the distance between the upper surface of the second projection optical system PL2 and the projection area PR is equal to or smaller than the depth of focus so that the principal rays of the imaging light beam L2 become parallel to each other, Or may be shifted from the upper surface 42 and disposed.

The above-described correction unit may include one or both of the biasing member 17 and the biasing member 44. [ For example, the reflecting surface 44a of the deflecting member 44 may be curved such that the principal ray of the imaging light beam L2 reaching the moving surface 47a of the second projection optical system PL2 is parallel to each other. This also applies to the biasing member 17.

Since the deflecting member 44 is arranged closer to the intermediate upper surface 42 than the deflecting member 17, the direction of the principal ray can be effectively adjusted by using the above-described correcting unit. Since the image forming light beam L2 directed to the intermediate upper surface 42 is incident on the deflecting member 17 and the image forming light beam L2 emitted from the intermediate upper surface 42 is not incident on the deflecting member 17 in adjusting the direction of the main light ray of the imaging light beam L2 Design freedom is high. The concave mirror 18, the deflection member 17, and the deflection member 44 may or may not include other optical members in the above-described correction unit.

Since the illumination optical system IL is configured so that the imaging light flux L2 incident on the projection optical system PL is close to the parallel light flux in the processing apparatus U3 (exposure apparatus EX3) of the present embodiment as described above, The projection of the curved mask pattern M can be precisely projected without complicating the projection optical system PL. Therefore, by performing the exposure processing while rotating the mask pattern M, the processing apparatus U3 can expose the substrate P efficiently and with high precision.

In order to project the image of the mask pattern M curved in the shape of a cylinder onto the cylindrical substrate P, the concave mirror 18 having a cylindrical reflecting surface is provided at the intermediate upper surface , The upper surface of the second projection optical system PL2 is changed to follow the projection area PR and the processing unit U3 is switched to the illumination area IR with respect to the scanning exposure direction (the circumferential direction of the mask pattern M) And the width of the projection area PR can be ensured widely, so that the exposure can be performed with high productivity and high accuracy.

Since the optical isolator 10 is disposed on the coplanar surface 28 of the first projection optical system PL1, the processing unit U3 employs a lacquer illumination method in which the optical path of the illumination light L1 and the optical path of the imaging light L2 are separated . Therefore, the processing unit U3 can reduce the loss of the light amount in the PBS and the generation of stray light, as compared with the configuration in which the optical path is divided by using, for example, a polarization splitter (PBS) or the like. In the case where the light source 20 is a laser light source or the like and the loss of the light amount loss can be reduced by using the polarization characteristic of the illumination light, such a light separation section 10 may be formed of PBS or the like.

Since the optical separation section 10 (regulating section) defines the passage range of the illumination light L1 directed to the illumination area IR through the passage part 15, the light separation part 10 The direction of L1a can be defined with high accuracy. Since the optical separation section 10 defines the passage range of the illumination light L1 using the reflection section 16, it is possible to simplify the configuration and the like.

The relationship (for example, parallel to each other) of the principal ray L1a distributed in the direction parallel to the rotation center axis AX1 of the illumination light L1 is the same as that of the principal ray L2 distributed in the direction parallel to the rotation center axis AX1, L2a &lt; / RTI &gt; relationship (e. G., Parallel to each other). The relationship (for example, parallel to each other) of the principal rays L2a distributed in the circumferential direction of the cylindrical surface 12 in the imaging light beam L2 is the relationship of the principal ray L1a distributed in the circumferential direction of the cylindrical surface 12 of the illumination light L1 (E. G., Non-parallel to each other). Therefore, for example, the diffusion angle NA of the illumination light L1 is set to be an optical member having isotropic power so that the principal ray L2a distributed in the circumferential direction of the cylindrical surface 12 in the imaging light beam L2 becomes a parallel relation to each other The relationship of the principal ray L2a distributed in the direction parallel to the rotation center axis AX1 among the imaging light beams L2 is not parallel to each other.

In this embodiment, the diffraction angle of the illumination light L1 (principal ray) is controlled by the cylindrical dichroic mirror 25 so that the direction in which the rotation center axis AX1 of the drum mask DM extends and the circumference of the cylindrical surface 12 Direction. That is, the cylindrical lens 25 is arranged so that the principal ray L1a of the principal ray L1a of the illumination light L1 reaching the illumination region IR is parallel to the principal ray L1a arranged in the direction parallel to the rotation center axis AX1, (Set) the main ray L1a extending in the circumferential direction of the optical axis AX1 so as to cross the extension line 41 of the principal ray L1 in the circumferential direction of the optical axis AX1. Therefore, the principal ray L2a of the image forming light beam L2 distributed in the direction parallel to the rotation central axis AX1 is made substantially parallel to each other, and the principal ray L2a of the image forming light beam L2 distributed in the circumferential direction of the cylindrical surface 12 It can be made almost parallel. As a method of giving anisotropy to the diffusing angle of the illumination light L1, a method of adjusting the shape of the light output side of the light guiding member by using a light guiding member bundled with an optical fiber may be used as in the first embodiment .

[Fourth Embodiment]

Next, the fourth embodiment will be described. In the present embodiment, constituent elements similar to those of the above embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

30 is a diagram showing a configuration of a processing apparatus (exposure apparatus EX4) according to the present embodiment. Fig. 31 is a view showing an optical path functioning as an illumination optical system IL in the configuration of Fig. 30. Fig. 32 is a view showing an optical path functioning as a first projection optical system PL1 in the configuration of Fig. Fig. 33 is a view showing an optical path functioning as the second projection optical system PL2 in the configuration of Fig. 30. Fig.

The projection optical system PL includes a first projection optical system PL1 for forming a middle image Im of a part of the mask pattern M (illumination area IR), and a second projection optical system PL2 for forming a middle image formed by the first projection optical system PL1 on the substrate P And a second projection optical system PL2 for projecting the light onto the projection area PR on the projection optical system PL. Here, each of the first projection optical system PL1 and the second projection optical system PL2 is composed of an optical system such as an opener optical system. The illumination optical system IL illuminates the illumination area IR with the illumination light L1 through a part of the first projection optical system PL1.

The illumination optical system IL can be configured in the same manner as in the third embodiment, for example, with respect to the element (homogenizing optical system 19) arranged from the light source to the first diaphragm 23. The illumination light L1 emitted from the light source passes through the uniformizing optical system 19, so that the light intensity distribution in the first diaphragm member 23 becomes uniform.

The illumination optical system IL shown in Fig. 31 includes a light separating portion 50, a phase adjusting member 51, a concave mirror 52, a lens group 53, a convex mirror 54, a biasing member 55, And an upper adjustment member (56).

The illumination light L1 having passed through the first diaphragm member 23 is incident on the reflecting portion 57 of the light separating portion 50 through the phase adjusting member 51. [ The phase adjusting member 51 is provided with an aberration or the like in order to adjust phase characteristics (image characteristics) on the secondary light source formed on the surface in the conjugate with the primary light source image. The phase adjusting member 51 may be appropriately omitted.

The reflecting portion 57 of the light separating portion 50 is located at a position where the imaging light L2 (see FIG. 30) passing through the projection optical system PL is not incident at the position where the illumination light L1 is incident from the homogenizing optical system 19 Respectively. The reflecting portion 57 of the light separating portion 50 is, for example, a prism mirror, and the plane on which the illumination light L1 is incident from the homogenizing optical system 19 is a flat reflective surface.

The illumination light L1 incident on the reflecting portion 57 is deflected by being reflected by the reflecting portion 57 and is incident on the concave mirror 52. [ The illumination light L 1 reflected by the reflecting portion 57 and incident on the concave mirror 52 is reflected by the concave mirror 52 and is incident on the convex mirror 54 through the lens group 53.

The concave mirror 52 has a reflecting surface including a part of a spherical surface and has a primary light source image (the first diaphragm member 23 shown in Fig. 20) formed in the homogenizing optical system 19, And the pupil plane 28, which is a conjugate area. That is, the secondary light source image is formed on the hibernation plane 28. [

The lens group 53 is suitably provided to adjust the phase characteristics on the secondary light source on the coplanar surface 28, and includes, for example, a field lens. The convex mirror 54 has, for example, a reflecting surface including a part of a spherical surface, and is provided so that its center of curvature coincides with the concave mirror 52. Here, an axis connecting the center of the concave mirror 52 and the center of the convex mirror 54 is referred to as an optical axis ILa (an optical axis PL1a of the first projection optical system PL1) of the illumination optical system IL. The convex mirror 54 and the concave mirror 52 are provided such that light (illumination light L1, imaging light beam L2) reflected by the convex mirror 54 is incident again on the concave mirror 52. [

The illumination light L1 from the concave mirror 52 is incident on the -X-axis side of the convex mirror 54 with respect to the optical axis ILa of the illumination optical system IL and is reflected by the convex mirror 54 to be incident on the concave mirror 52 ). The illumination light L1 reflected by the convex mirror 54 and incident on the concave mirror 52 is reflected by the concave mirror 52 and is incident on the deflection member 55 and deflected by being reflected by the deflection member 55, And is incident on the illumination area IR through the member 56.

The biasing member 55 is, for example, a prism mirror, and is a reflecting surface having a planar surface on which the illumination light L1 is incident from the concave mirror 52. [ Like the phase adjusting member 51, the phase adjusting member 56 is suitably provided in consideration of an aberration or the like.

32, the first projection optical system PL1 includes a phase adjusting member 56, a biasing member 55, a concave mirror 52, a lens group 53, a convex mirror 54, 58).

The imaging light beam L2 emitted from the illumination area IR is incident on the deflecting member 55 through the image adjusting member 56 and deflected by being reflected by the deflecting member 55. [ The imaging light beam L2 deflected by the deflecting member 55 is incident on the concave mirror 52 through an optical path different from the optical path of the illumination light L1 from the concave mirror 52 shown in Fig. 31 toward the deflecting member 55. [ The imaging light beam L2 incident on the concave mirror 52 passes through an optical path different from the illumination light L1 and passes through the lens group 53 and is incident on the convex mirror 54. [ The position at which the imaging light beam L2 is incident on the convex mirror 54 is disposed on the side opposite to the incident position of the illumination light L1 (+ X axis side) with respect to the optical axis PL1a of the first projection optical system PL1.

The imaging light beam L2 reflected by the convex mirror 54 passes through the lens group 53 and enters the concave mirror 52 and is reflected by the concave mirror 52. [ The image forming light beam L2 reflected by the concave mirror 52 is incident on the image adjusting member 58 through the passing portion 59 of the light separating portion 50. [ Here, the passing portion 59 of the light separation portion 50 is an area where the reflection portion 57 is not provided. That is, the reflecting portion 57 is disposed at a position where the imaging light beam L2 reflected by the concave mirror 52 is not incident after being reflected by the convex mirror 54. [ In this manner, the light separation section 50 is provided so as to define the passing range of the illumination light L1.

The light flux emitted from each point on the illumination area IR among the imaging light fluxes L2 converges to almost one point on the intermediate image plane 42 which is conjugate with the illumination area IR by passing through the optical path as described above. In other words, an image of the illumination area IR is formed on the intermediate upper surface 42. The phase adjusting member 56 and the phase adjusting member 58 are suitably provided in order to adjust the phase characteristics of the intermediate phase Im by adding an aberration or the like. One or both of the upper regulating member 56 and the upper regulating member 58 may be appropriately omitted.

33, the second projection optical system PL2 includes a concave mirror 60, a phase adjusting member 58, a deflecting member 61, a concave mirror 62, a lens group 63, a convex mirror 64 ), A biasing member (65), and a top adjustment member (66).

The concave mirror 60 is disposed at or near the intermediate upper surface 42. Is formed in a cylindrical surface shape concave toward the incidence side of the imaging light beam L2 so as to follow the shape of the intermediate image Im formed by the first projection optical system PL1. The concave mirror 60 converts the shape of the upper surface of the second projection optical system PL2 so as to follow the projection area PR, as described in the third embodiment.

The image forming light beam L2 incident on the concave mirror 60 is reflected by the concave mirror 60 and is incident on the deflecting member 61 through the image adjusting member 58. The deflecting member 61 is, for example, a prism mirror, and the plane on which the imaging light beam L2 from the concave mirror 60 is incident is a flat reflective surface. The biasing member 61 is a position at which the image forming light beam L2 reflected by the concave mirror 60 is incident is an image formed from the concave mirror 52 (see Fig. 32) of the first projection optical system PL1 toward the concave mirror 60 And is disposed at a position not blocking the light flux L2.

The imaging light beam L2 incident on the deflecting member 61 is deflected by being deflected by the deflecting member 61 and is incident on the concave mirror 62. [ The imaging light beam L2 incident on the concave mirror 62 is reflected by the concave mirror 62 and passes through the lens group 63 to be incident on the convex mirror 64. [

The concave mirror 62 condenses the imaging light beam L2 so as to form a dynamic surface 67 that is conjugate with the dynamic surface 28 of the first projection optical system PL1 shown in Fig. The concave mirror 62 is configured to be optically equivalent to, for example, the concave mirror 52 of the first projection optical system PL1. The concave mirror 62 has, for example, a curved reflecting surface including a part of a spherical surface.

The lens group 63 is suitably provided with an aberration or the like to adjust the characteristics of the image formed on the projection area PR, for example, and includes a field lens or the like.

The convex mirror 64 is disposed at or near the conjugate position with the concave surface 67. [ The convex mirror 64 is configured to be optically equivalent to, for example, the convex mirror 54 of the first projection optical system PL1. The convex mirror 64 has, for example, a curved reflecting surface including a part of a spherical surface, and the center of curvature of the reflecting surface is set to a position substantially equal to the center of curvature of the concave mirror 62. [

The image forming beam L2 reflected by the convex mirror 64 passes through the lens group 63 and enters again into the concave mirror 62 and is reflected by the concave mirror 62 and is incident on the deflecting member 65. [ The imaging light beam L2 incident on the deflecting member 65 is deflected by being reflected by the deflecting member 65 and passes through the image adjusting member 66 and is incident on the projection area PR.

The second projection optical system PL2 has the second projection optical system PL2 for forming the intermediate image Im of the illumination area IR formed on the intermediate upper surface 42 on the upper surface of the second projection optical system PL2 The upper surface is set at or near the position of the projection area PR on the substrate P supported on the rotary drum DP and the image of the illumination area IR is projected onto the projection area PR on the substrate P. [ Is exposed.

In the processing apparatus U3 (exposure apparatus EX4) of the present embodiment as described above, the illumination optical system IL is configured such that the principal ray of the imaging light beam L2 incident on the projection optical system PL is close to the parallel system, Even if the projection optical system PL is not complicated, projection of the image of the curved mask pattern M can be performed with high precision. Therefore, by performing the exposure processing while rotating the mask pattern M, the processing apparatus U3 can expose the substrate P efficiently and with high precision.

Further, the processing apparatus U3 projects the image of the curved mask pattern M onto the curved substrate P. In the processing unit U3, the concave mirror 18 converts the upper surface of the second projection optical system PL2 so as to follow the projection area PR, so that the processing unit U3 can be exposed with high precision. Further, for example, by providing the correction section so that the imaging light beam L2 approaches telecentricity, the processing apparatus U3 can be exposed with high precision. This correction section can be constituted by using, for example, at least one of the concave mirror 60, the image adjustment member 58, and the biasing member 61. [

The optical path of the illumination light L1 and the optical path of the imaging light beam L2 can be separated from each other because the processing unit U3 has the optical isolator 10 disposed on the coplanar surface 28 of the first projection optical system PL1. Therefore, the processing apparatus U3 can reduce the loss of light quantity and the generation of stray light, as compared with a configuration in which the optical path is divided by using, for example, a polarization splitter or the like.

The technical scope of the present invention is not limited to the above-described embodiments. For example, one or more of the elements described in the above embodiments may be omitted. The elements described in each of the above embodiments can be appropriately combined.

In each of the embodiments described above, the projection area PR on the substrate P is curved in the shape of a cylinder, but the projection area PR may be a flat surface.

That is, in the case where the substrate P is a rigid substrate on which the substrate P is not substantially deformed, or where a certain range including the projection region PR can be maintained flat on a flexible sheet-like substrate, With such an exposure apparatus of each embodiment, such a flat (planar) substrate P can be similarly exposed.

For example, the substrate P may be exposed as a rigid substrate or the like on which the substrate P is not substantially deformed. The substrate P may be transported such that the projection region PR on the substrate P has a planar shape and the exposure apparatus may expose the substrate P. [

In each of the embodiments described above, an example of an exposure apparatus of the single lens type having one illumination optical system and one projection optical system has been described. However, the exposure apparatus may be configured to include a plurality of illumination optical systems and a set of projection optical systems, A so-called multi-lens type exposure apparatus may be used in which a plurality of the photosensitive drums DM and the rotary drums DP are arranged in the direction in which the rotational center axes AX2 and AX1 extend.

In the first and third embodiments, the passing range of the illumination light L1 is defined by using the reflecting portion 16 of the light separating portion 10. However, the light passing portion may be formed in a light shielding portion provided separately from the reflecting portion 16 The passage range may be defined. The light shielding portion may absorb light incident on the outside of the passing portion 15, for example, and shield the light so as not to pass through the light splitting portion 10. The passing portion 15 may be, for example, a gap (opening) arranged to pass through the illumination light L1.

[Device Manufacturing Method]

Next, the device manufacturing method of the above embodiment will be described. 34 is a flowchart showing a device manufacturing method according to the above embodiment. Some of the steps in this flowchart are performed in the device manufacturing system (SYS, SYS2) (flexible display manufacturing line) shown in Fig. 1 or Fig. However, in order to carry out all the steps of the flowchart in Fig. 34, it is necessary to prepare a plurality of manufacturing processing apparatuses.

In the device manufacturing method shown in Fig. 34, the function and performance of a device such as an organic EL display panel is designed first (step 201). Next, based on the design of the device, a mask pattern M is produced (step 202). In addition, a substrate such as a transparent film or a sheet as a base of the device or a metal foil of a very thin film is prepared by purchase, manufacture, or the like (step 203).

Next, the prepared substrate is put into a production line of a roll type or a patch type, and a TFT back plan layer such as an electrode or wiring, an insulating film, or a semiconductor film constituting the device or an organic EL light- (Step 204). Step 204 typically includes a step of forming a resist pattern on the film on the substrate and a step of etching the film using the resist pattern as a mask. The resist pattern is formed by uniformly forming a resist film on the surface of the substrate, a step of exposing the resist film of the substrate with exposure light patterned through the mask pattern (M) according to each of the above embodiments , And a step of developing the resist film on which the latent image of the mask pattern is formed by the exposure is performed.

As a typical example of an additive process which does not use a conventional register process for resource saving, in the case of flexible device manufacture using printing technology or the like, a functional photosensitive layer (functional Sensitive layer, a photosensitive silane coupling material, and the like) by a coating method, and the exposure apparatus shown in each of the above-described embodiments is used to expose the patterned light via the drum mask DM onto the flexible substrate A step of forming a hydrophilic (hydrophilic) part and a water repellent part in the functional photosensitive layer by irradiating the functional photosensitive layer (functional responsive layer) with the hydrophilic property of the functional photosensitive layer; A step of forming a metallic pattern by electroless plating, a so-called low-temperature wet process at 120 占 폚 or less, and the like are carried out.

Next, depending on the device to be manufactured, for example, a substrate may be diced or cut, or another substrate manufactured by another process, for example, a sheet-like color filter having a sealing function A process of bonding a thin glass substrate or the like is performed, and a device (display panel) is assembled (step 205). Then, a post-process such as inspection is performed on the device (step 206). As described above, a device can be manufactured. In the device manufacturing method in the above embodiment, the processing apparatus (substrate processing apparatus) conveys the sensitive substrate in a predetermined direction while rotating the drum mask (mask holding member), and continuously exposes the mask pattern to the sensitive substrate And performing a subsequent process using a change in the sensitive layer of the exposed sensitive substrate.

10: optical isolator, 12: cylindrical surface,
15: passing portion, 16: reflecting portion,
18: Concave mirror, 19: Homing optical system,
23: first stop member, 25: cylindrical lens,
26: second stop member, 28: hibernation,
40: conjugate plane, 41: extension line,
42: intermediate top surface, 50: light separation portion,
57: reflection part, 60: concave mirror,
IL: illumination optical system, IR: illumination area,
Im: intermediate image, L0: light source image,
L1: illumination light, L2: imaging light flux,
L2a: main light line, M: mask pattern,
P: substrate, PL: projection optical system,
PR: projection area, PL1: first projection optical system,
PL2: second projection optical system, U3: processing device.

Claims (16)

An exposure apparatus for projecting and exposing an image of a reflective mask pattern disposed along a cylindrical surface curved at a predetermined radius around a predetermined center line on a sensitive substrate,
A mask holding member that holds the mask pattern along the cylindrical surface and is rotatable around the center line,
Wherein an illumination light from a light source is irradiated toward an illumination area set on a part of the mask pattern and an extension line of a main light ray of the illumination light distributed in a circumferential direction of the cylindrical surface is irradiated to a specific position between the center line and the cylindrical surface An illumination optical system in which the principal ray is inclined with respect to the circumferential direction of the cylindrical surface,
A first projection optical system for guiding a reflected light flux generated from the illumination area by irradiation of the illumination light to an intermediate image plane and forming an image of a part of the mask pattern on the intermediate image plane,
A concave mirror disposed at or near the intermediate upper surface,
And a second projection optical system for projecting the image formed on the intermediate top surface onto the sensitive substrate by the first projection optical system after the reflected light flux reflected from the concave mirror is incident.

The method according to claim 1,
Wherein the concave mirror is a concave cylindrical mirror curved into a concave cylindrical surface shape toward the light incidence side along the intermediate top surface.
The method of claim 2,
Wherein the specific position at which the extension line of the principal ray of the illumination light distributed in the circumferential direction of the cylindrical surface crosses is set at or near the center position of the centerline and the cylindrical surface.
The method of claim 3,
And a distance from the center line to the specific position is set to about 1/2 of a radius of the cylindrical surface of the mask pattern.
The method according to any one of claims 1 to 4,
Wherein the illumination optical system includes a first optical member whose refractive power in a circumferential direction of the cylindrical surface of the mask pattern is larger than refractive power in a direction along the center line.
The method according to any one of claims 1 to 4,
Wherein the illumination optical system has a hibernation where a light source image of a light source for generating the illumination light is formed,
And a diffusion angle of the illumination light for irradiating the illumination area in the circumferential direction of the cylindrical surface of the mask pattern is made smaller than a diffusion angle of the illumination light for irradiating the illumination area in the direction along the center line And a second optical member for setting the second optical member.
An exposure method for exposing an image of a reflective mask pattern formed on a cylindrical outer peripheral surface of a drum mask rotatable about a predetermined center line to a photosensitive substrate,
The illumination light directed to the illumination area set in a part of the outer circumferential surface of the drum mask is irradiated from the illumination optical system set in the center between the center line and the outer circumferential surface in a first conjugate plane optically conjugate with the position of the light source of the illumination light And,
And forming an image of a part of the mask pattern on the sensitive substrate through a projection optical system for projecting a reflected light flux generated from the illumination area of the drum mask toward the sensitive substrate.
The method of claim 7,
Wherein the illumination optical system sets the first illumination light to a non-telecentric state with respect to the circumferential direction of the outer circumferential surface of the drum mask by setting the first conjugate plane at the center between the center line and the outer circumferential surface, And setting the illumination light in a telecentric state with respect to a direction in which the center line of the drum mask extends.
The method according to claim 7 or 8,
The first conjugate plane is set parallel to the center line,
Wherein an extension line of each principal ray distributed in the circumferential direction of the peripheral surface of the principal ray of the illumination light reaching the illumination region is set to intersect the line on the first conjugate plane.
The method of claim 9,
Wherein the first conjugate plane is disposed at or near a center of the center line and the illumination area.
The method of claim 10,
Wherein the projection optical system has a hibernation on which a light source image of the light source formed by the illumination optical system is formed.
The method of claim 11,
Wherein the light source image formed on the moving surface of the projection optical system is set so that the dimension along the circumferential direction of the outer circumferential surface is larger than the dimension along the direction of the center line.
The method of claim 12,
In the illumination optical system,
A diaphragm member disposed at or near a position optically conjugate with the illumination region;
Wherein the optical member is disposed in an optical path from the light source to the diaphragm member and the refractive power along the circumferential direction of the outer circumferential surface is larger than the refractive power along the direction of the center line.
14. The method of claim 13,
Wherein each of the principal rays of the principal ray of the illumination light reaching the illumination region and arranged in the circumferential direction of the outer circumference of the optical member crosses a line on the first conjugate plane and each principal ray arranged in the direction of the centerline, Wherein the first and second light sources are parallel to each other.
15. The method of claim 14,
Wherein the illumination optical system is provided with at least a part of an optical path extending from the light source to the diaphragm member and having a uniformizing optical system for uniforming the light intensity distribution of the illumination light from the light source at or near the position of the diaphragm member Way.
16. The method of claim 15,
A second conjugate plane which is optically conjugate with the first conjugate plane and in which the light source image is located is formed by the homogenizing optical system,
Wherein the distribution range of the light source image formed on the second conjugate plane is set so that the dimension along the direction of the center line becomes smaller than the dimension along the circumferential direction of the outer peripheral face.

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