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KR20160079161A - Method of manufacturing norbornene otical film - Google Patents

Method of manufacturing norbornene otical film Download PDF

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KR20160079161A
KR20160079161A KR1020140189162A KR20140189162A KR20160079161A KR 20160079161 A KR20160079161 A KR 20160079161A KR 1020140189162 A KR1020140189162 A KR 1020140189162A KR 20140189162 A KR20140189162 A KR 20140189162A KR 20160079161 A KR20160079161 A KR 20160079161A
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film
norbornene
monomer
temperature
chemical formula
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Korean (ko)
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이호준
김경수
김용원
하선영
김영수
강혁모
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주식회사 효성
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D7/00Producing flat articles, e.g. films or sheets
    • B29D7/01Films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L45/00Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements

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Abstract

The present invention relates to a method for producing a norbornene optical film. More specifically, the method comprises the following steps: producing a film by emulsifying a norbornene-based resin in a solution, wherein the norbornene-based resin is represented by chemical formula 1 and includes a recurring unit comprising an elongation improved monomer (B) and a polymerization improved monomer (M); elongating the produced film at a predetermined temperature of 140 to 250°C; and relaxing the film to a temperature (T) within a range expressed by equation 1, (extension temperature+5)(B/M)^b <= T <= (extension temperature+7)(B/M)^b. According to the present invention, a bowing phenomenon of the norbornene film is controlled, so an optical axis of a phase difference film can be controlled. In the chemical formula 1, R_1 is hydrogen, or a formyl group substituted by an alkoxy group having 1 to 2 carbons. R_2 is a formyl group substituted by an alkoxy group having 4 or more carbons, or an acetoxy methyl group. m and n are respectively integers of 1 or more. In the equation 1, the measure of the extension temperature and the T is °C. The B/M is a mole ratio of the elongation improved monomer (B) and the polymerization improved monomer (M). The b is -0.094.

Description

노르보넨 광학 필름 제조방법{METHOD OF MANUFACTURING NORBORNENE OTICAL FILM}TECHNICAL FIELD [0001] The present invention relates to a method for manufacturing a norbornene optical film,

본 발명은, 노르보넨 광학 필름 제조방법에 관한 것이다.The present invention relates to a process for producing a norbornene optical film.

렌즈 등의 광학 부품, 액정 표시 소자, 컬러 필터나 EL 표시 소자 기판 등의 디스플레이 기판, 백라이트, 도광판 등의 광학 재료 분야에서는, 종래, 무기 유리가 일반적으로 사용되고 있다. 그러나, 무기 유리에는, 깨지기 쉽고, 유연성이 결여되어 있고, 비중이 크고, 가공성이 나쁜 등의 결점이 있어, 최근의 경량화, 소형·고밀도화의 요구에 응하기 위해서는 불충분하고, 따라서, 투명 수지에 의한 대체가 강하게 요구되고 있다.In the field of optical materials such as optical parts such as lenses, liquid crystal display elements, display substrates such as color filters and EL display element substrates, backlights, and light guide plates, inorganic glass has been generally used. However, the inorganic glass has defects such as fragility, lack of flexibility, large specific gravity, and bad workability. Thus, it is insufficient to meet the recent demand for weight reduction and miniaturization and high density, and therefore, Is strongly required.

투명 수지를 광학 재료 용도에 이용하는데 있어서는, 투명성 이외에도 내열성, 내약품성, 저흡수성 등의 면에서 매우 높은 성능이 요구되고 있다. 예컨대, 표시 소자 기판의 제조에 있어서는, 금속 또는 금속 산화물 박막을 적층시키는 공정에서 고온에서의 가공이 필요하지만, 열에 의한 기판의 변형이나 흡수(吸水)에 의한 치수 변동 등이 큰 문제로 된다.In using a transparent resin for use in optical materials, very high performance is demanded in terms of heat resistance, chemical resistance, low water absorption, etc. in addition to transparency. For example, in manufacturing a display element substrate, it is necessary to process at a high temperature in a step of laminating a metal or a metal oxide thin film, but a large problem such as dimensional change due to deformation of the substrate due to heat or absorption of water (water absorption) is a serious problem.

이 가운데, 기존의 셀룰로오스 계열 위상차 필름의 경우 수분에 의한 위상차 변화가 크게 일어나는 문제점을 가지고 있어(△Ro>5㎚, △Rth>10㎚), 수분에 대한 안정성이 우수한 필름 개발에 대한 요구가 있어왔다. Among them, the conventional cellulose based retardation film has a problem that the phase difference due to moisture changes greatly (ΔRo> 5 nm, ΔRth> 10 nm), and there is a demand for development of a film excellent in stability against moisture come.

특히, 오픈 셀 비지니스(Open Cell Business)를 통한 패널 운반이 하나의 트랜드가 되면서, 보상 필름의 고온다습 환경 아래서의 광학 안정성(△Ro<0.5㎚, △Rth<0.5㎚)은, 당해 기술분야에서 매우 요청되고 있는 사항이다. Particularly, as the panel transportation through the open cell business becomes one trend, the optical stability (DELTA Ro <0.5 nm, DELTA Rth <0.5 nm) of the compensation film under the high temperature and high humidity environment It is highly requested.

이 때문에, 투명성, 내열성, 내약품성, 저흡수성 및 광학 특성을 만족시키는 수지로서 환상 올레핀 부가 중합체, 폴리노보넨이 제안되고, 이 중합체를 이용한 액정 표시 기판 재료가 제안되게 되었다(특허 문헌 1 참조).For this reason, a cyclic olefin addition polymer and a polynorbornene have been proposed as resins that satisfy transparency, heat resistance, chemical resistance, low absorbency and optical properties, and a liquid crystal display substrate material using this polymer has been proposed (see Patent Document 1) .

환상 올레핀 부가 중합체, 특히, 폴리노보넨은 유리 전이 온도가 250℃ 이상으로 높으므로, 고온 가공 시의 내열변형성이 우수한 재료이다. 더구나, 폴리노보넨은 흡습성이 매우 낮으므로 사용 환경에서의 습도 변화에 대한 치수 안정성이 우수하고, 또한, 선팽창율이 55ppm 정도로 낮으므로 열 변동에 대한 치수 안정성이 우수하다고 하는 특징을 갖고 있다.The cyclic olefin addition polymer, especially polynorbornene, has a glass transition temperature as high as 250 占 폚 or higher, and therefore is a material excellent in thermal deformation resistance at high temperature processing. Furthermore, since polynorbornene has a very low hygroscopicity, it has excellent dimensional stability against changes in humidity in a use environment, and has a linear expansion coefficient as low as about 55 ppm, and thus has excellent dimensional stability against thermal fluctuations.

그러나 노르보넨 계열 위상차 필름의 대표적 예인 Zeonor (COP, Cyclo-Olefin Polymer)의 경우, 150℃ 수준의 Tg를 가지며 용융 유연법(Melt Casting)을 통해 제막되는데, 용융 유연법은 생산성에 불리한 측면이 있다.However, in the case of Zeonor (COP, Cyclo-Olefin Polymer), which is a representative example of the norbornene series retardation film, it has a Tg of about 150 ° C. and is formed through melt casting. The melt softening method has a disadvantage in productivity .

JP 특개 平05-061026 A (1993.03.12.)JP JP 05-061026 A (March 13, 1993)

노르보넨 계열 위상차 필름 중 NB (개질 PNB)의 경우, 유기 용제에 대한 용해성이 뛰어나, 용액 유연법(Solvent Casting)을 통한 제막이 가능하여, 생산성 측면에서 매우 유리한 장점이 있다.Among the norbornene series retardation films, NB (modified PNB) is excellent in solubility in an organic solvent and can be formed through solution casting, which is advantageous in terms of productivity.

그러나, 용액 유연법은 용매의 건조 공정 조건에 따라, 필름이 휘어지는 보잉(BOWING) 현상이 나타날 수 있는 문제점이 있다.However, the solution casting method has a problem that a bowing phenomenon in which the film is warped may occur depending on the drying process conditions of the solvent.

이에, 본 발명은, 유기 용제에 대한 용해성이 뛰어난 노르보넨 계열 필름을, 용액 유연법에 의해 제조하면서도, 보잉 현상을 억제할 수 있는 제조방법을 제공하고자 한다.Accordingly, an object of the present invention is to provide a production method capable of suppressing the Boeing phenomenon while producing a norbornene series film excellent in solubility in an organic solvent by a solution casting method.

본 발명은 상술한 종래 기술의 문제점을 해결하기 위해 안출된 것으로서,SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems of the prior art,

하기 화학식 1로 표현되고, 연신성 향상 모노머(B)와 중합성 향상 모노머(M)로 구성된 반복단위를 포함하는 노르보넨계 수지를 용액 유연시켜 제막하는 단계;Forming a norbornene resin represented by the following formula (1) and containing a repeating unit composed of a drawability improving monomer (B) and a polymerizable monomer (M) by solution pouring;

상기 제막된 필름을 140 내지 250℃ 범위 이내의 소정의 온도로 연신하는 단계; 및Stretching the formed film to a predetermined temperature within a range of 140 to 250 ° C; And

상기 연신된 필름을, 하기 수학식 1로 표현되는 범위 이내 온도(T)로 이완시키는 단계를 순차적으로 포함하여 이루어진 광학 필름의 제조방법을 제공한다.And loosening the stretched film at a temperature (T) within a range expressed by the following equation (1): &lt; EMI ID = 1.0 &gt;

[화학식 1][Chemical Formula 1]

Figure pat00001
Figure pat00001

여기서, R1은, 수소, 또는 탄소수 1 내지 2의 알콕시로 치환된 포르밀기이고, R2는, 탄소수 4 이상의 알콕시로 치환된 포르밀기, 또는 아세톡시 메틸기이며, m, 및 n은, 각각, 1 이상의 정수이다. Wherein R 1 is hydrogen or a formyl group substituted with alkoxy of 1 to 2 carbon atoms, R 2 is a formyl group substituted with alkoxy having 4 or more carbon atoms, or acetoxymethyl group, m and n are each a hydrogen atom, Lt; / RTI &gt;

[수학식 1][Equation 1]

Figure pat00002
Figure pat00002

여기서, 연신온도 및 T의 단위는 ℃이고, B/M는 연신성 향상 모노머(B)와 중합성 향상 모노머(M)의 몰비이며, b는 -0.094이다.Here, the stretching temperature and the unit of T are ° C, B / M is the molar ratio of the extensibility improving monomer (B) to the polymerizable monomer (M), and b is -0.094.

또한 본 발명에 있어서, In the present invention,

상기 연신성 향상 모노머(B)는, 하기 화학식 2 내지 3에서 선택되는 1종 이상의 것이며,The drawability improving monomer (B) is at least one selected from the following formulas (2) to (3)

상기 중합성 향상 모노머(M)는, 하기 화학식 4 내지 5에서 선택되는 1종 이상의 것임을 특징으로 하는 광학 필름의 제조방법을 제공한다.Wherein the polymerizable monomer (M) is at least one selected from the following formulas (4) to (5).

[화학식 2](2)

Figure pat00003
Figure pat00003

[화학식 3](3)

Figure pat00004
Figure pat00004

[화학식 4][Chemical Formula 4]

Figure pat00005
Figure pat00005

[화학식 5][Chemical Formula 5]

Figure pat00006
Figure pat00006

또한 본 발명에 있어서, 연신성 향상 모노머(B) : 중합성 향상 모노머(M) = 5.5 : 4.5 ~ 7.5 : 2.5 몰 공중합 비율인 것을 특징으로 하는 광학 필름의 제조방법을 제공한다.In the present invention, there is also provided a process for producing an optical film characterized in that the copolymer (B): polymerizing property improving monomer (M) = 5.5: 4.5 to 7.5: 2.5 molar copolymerization ratio.

본 발명은, 노보넨 필름의 보잉 현상을 억제하여, 위상차 필름의 광축 제어가 가능한 효과가 있다.The present invention has an effect that the bowing phenomenon of the norbornene film is suppressed and the optical axis of the retardation film can be controlled.

이하, 본 발명에 대하여 상세히 설명한다.
Hereinafter, the present invention will be described in detail.

본 발명은, 하기 화학식 1로 표현되는 반복단위를 포함하는 노르보넨계 수지를 용액 유연시켜 제막하는 단계;The present invention relates to a process for producing a norbornene resin, comprising: forming a norbornene resin containing a repeating unit represented by the following formula (1) by solution pouring;

상기 제막된 필름을 140 내지 250℃ 범위 이내의 어느 특정 온도로 연신하는 단계; 및Stretching the formed film to a specific temperature within a range of 140 to 250 ° C; And

상기 연신된 필름을, 상기 연신 시에 특정된 온도 - 10℃ 내지 상기 연신 시에 특정된 온도 + 10℃ 범위 이내의 온도로 이완 시키는 단계를 순차적으로 포함하여 이루어진 광학 필름의 제조방법이다.And loosening the stretched film to a temperature within a range from a specified temperature at the stretching to a temperature within the range of from the specified temperature at the stretching to the specified temperature at the stretching at +10 ° C.

[화학식 1][Chemical Formula 1]

Figure pat00007
Figure pat00007

여기서, R1은, 수소, 또는 탄소수 1 내지 2의 알콕시로 치환된 포르밀기이고, R2는, 탄소수 4 이상의 알콕시로 치환된 포르밀기, 또는 아세톡시 메틸기이며, m, 및 n은, 각각, 1 이상의 정수이다. Wherein R 1 is hydrogen or a formyl group substituted with alkoxy of 1 to 2 carbon atoms, R 2 is a formyl group substituted with alkoxy having 4 or more carbon atoms, or acetoxymethyl group, m and n are each a hydrogen atom, Lt; / RTI &gt;

상기 반복 단위는, 연신성 향상 모노머(B)와 중합성 향상 모노머(M)로 구성된 것으로서, 예시하면 아래 그림과 같이 표현될 수 있다.The repeating unit is composed of a stretching property improving monomer (B) and a polymerizing property improving monomer (M).

Figure pat00008
Figure pat00008

상기 연신성 향상 모노머(B)는, 하기 화학식 2 내지 3에서 선택되는 1종 이상의 것을 사용할 수 있다.As the drawability improving monomer (B), at least one selected from the following formulas (2) to (3) can be used.

[화학식 2](2)

Figure pat00009
Figure pat00009

[화학식 3](3)

Figure pat00010
Figure pat00010

[화학식 4][Chemical Formula 4]

Figure pat00011
Figure pat00011

[화학식 5][Chemical Formula 5]

Figure pat00012
Figure pat00012

상기 노르보넨계 수지의 분자량은 350,000 내지 600,000g/mol 인 것이 바람직하다. 분자량 350,000g/mol 미만이거나 분자량 600,000g/mol 초과에서는 고형분 함량 증가 혹은 감소에 의한 공정 및 잔류용제 제어에 어려움이 있을 수 있다. The molecular weight of the norbornene resin is preferably 350,000 to 600,000 g / mol. When the molecular weight is less than 350,000 g / mol, or when the molecular weight is more than 600,000 g / mol, it may be difficult to control the process and residual solvent by increasing or decreasing the solid content.

상기 연신성 향상 모노머(B) : 중합성 향상 모노머(M) = 5.5 : 4.5 ~ 7.5 : 2.5 몰 공중합 비율인 것이 바람직하다. 상기 범위 이내일 경우, 당해 기술분야에서 요구되는 필름을 물성을 달성할 수 있게 된다. And the copolymerization ratio is preferably 5.5: 4.5 to 7.5: 2.5: 2.5 in terms of the extensibility improving monomer (B): polymerizing property improving monomer (M). Within the above range, the film properties required in the related art can be achieved.

즉, 본 발명의 필름은, Rth/Ro < 2.7 이고, 전폭의 필름에서 채취한 샘플을 하루 동안 수조에 방치하였을 시에, 위상차 변화량이 △Ro<0.5㎚, △Rth<0.5㎚이고, 필름 두께가 40㎛ 인 경우에, 연신성 120% 이상, 초기 위상차(Rth) 200㎚ 이하, 연신에 따른 위상차 발현성 30㎚/10% 이하, 모듈러스 1300N/㎚2 이상, 광탄성계수(RT) 30×10-12㎡/N이하인 것을 특징으로 한다.
That is, when the film of the present invention has a Rth / Ro < 2.7 and a sample taken from a full width film is allowed to stand in a water bath for one day, the amount of retardation change is? Ro <0.5 nm,? Rth <0.5 nm, Retardation (Rth) of 200 nm or less, a retardation according to stretching of 30 nm / 10% or less, a modulus of 1300 N / nm 2 or more, a photoelastic coefficient (RT) of 30 x 10 -12 m &lt; 2 &gt; / N or less.

이하, 본 발명에 대하여 실시예를 들어 보다 더 상세히 설명한다. 이하의 실시예는 발명의 상세한 설명을 위한 것일 뿐이므로, 이에 의해 권리범위를 제한하려는 의도가 아님을 분명히 해둔다.
Hereinafter, the present invention will be described in more detail by way of examples. It is to be understood that the following embodiments are for the purpose of illustration only and are not intended to limit the scope of the present invention.

실시예Example

실시예Example 1 One

아래와 같은 Recipe 및 공정을 거쳐 필름을 제작하였다.The film was produced through recipe and process as shown below.

* 공정 : Silica 고압 분산 → Silica Dope Mixing → 제막 (습도 20%) → P/D (95℃) → 연신 (연신 185℃, 이완 184.5℃, 연신율 123.5%) → 수세 → 건조 (70℃) → 권취 (※ 잔류용제 10% 이하 박리, 잔류용제 실질적으로 0% 연신)Process: Silica high pressure dispersion → Silica Dope Mixing → film formation (humidity 20%) → P / D (95 ℃) → stretching (stretching 185 ℃, relaxation 184.5 ℃, elongation 123.5%) → water washing → drying (70 ℃) (* 10% or less of residual solvent, substantially 0% elongation of residual solvent)

* Recipe : ANB (B : M = 6 : 4) + 첨가제 + Silica
* Recipe: ANB (B: M = 6: 4) + Additive + Silica

실시예Example 2 2

실시예 1에서 아래와 같은 아래와 같은 Recipe 및 공정을 거쳐 필름을 제작한 점을 제외하고, 모두 실시예 1과 동일하게 필름을 제작하였다.A film was produced in the same manner as in Example 1, except that the film was produced through the recipe and the process described below in Example 1.

* 공정 : 제막 (습도 20%) → P/D (95℃) → 연신 (연신 185℃, 이완 177℃, 연신율 127%) → 수세 → 건조 (70℃) → 권취 (※ 잔류용제 10% 이하 박리, 잔류용제 실질적으로 0% 연신)* Process: film formation (humidity 20%) → P / D (95 ℃) → stretching (elongation 185 ℃, relaxation 177 ℃, elongation 127%) → water washing → drying (70 ℃) → winding , Residual solvent substantially 0% elongation)

* Recipe : ANB (B : M = 7 : 3) + 첨가제 + Silica
* Recipe: ANB (B: M = 7: 3) + Additive + Silica

비교예Comparative Example 1 One

실시예 1에서 아래와 같은 아래와 같은 Recipe 및 공정을 거쳐 필름을 제작한 점을 제외하고, 모두 실시예 1과 동일하게 필름을 제작하였다.A film was produced in the same manner as in Example 1, except that the film was produced through the recipe and the process described below in Example 1.

* 공정 : 제막 (습도 20%) → P/D (95℃) → 연신 (연신 185℃, 이완 178℃, 연신율 123.5%) → 수세 → 건조 (70℃) → 권취 (※ 잔류용제 10% 이하 박리, 잔류용제 실질적으로 0% 연신)* Process: film formation (humidity 20%) → P / D (95 ° C) → stretching (elongation 185 ° C, relaxation 178 ° C, elongation 123.5%) → water washing → drying (70 ° C) , Residual solvent substantially 0% elongation)

* Recipe : ANB (B : M = 6 : 4) + 첨가제 + Silica
* Recipe: ANB (B: M = 6: 4) + Additive + Silica

비교예Comparative Example 2 2

실시예 1에서 아래와 같은 아래와 같은 Recipe 및 공정을 거쳐 필름을 제작한 점을 제외하고, 모두 실시예 1과 동일하게 필름을 제작하였다.A film was produced in the same manner as in Example 1, except that the film was produced through the recipe and the process described below in Example 1.

* 공정 : 제막 (습도 20%) → P/D (95℃) → 연신 (연신 185℃, 이완 181℃, 연신율 127%) → 수세 → 건조 (70℃) → 권취 (※ 잔류용제 10% 이하 박리, 잔류용제 실질적으로 0% 연신)* Process: film formation (humidity 20%) → P / D (95 ° C) → stretching (elongation 185 ° C, relaxation 181 ° C, elongation 127%) → water washing → drying (70 ° C) , Residual solvent substantially 0% elongation)

* Recipe : ANB (B : M = 6 : 4) + 첨가제 + Silica
* Recipe: ANB (B: M = 6: 4) + Additive + Silica

비교예Comparative Example 3 3

실시예 1에서 아래와 같은 아래와 같은 Recipe 및 공정을 거쳐 필름을 제작한 점을 제외하고, 모두 실시예 1과 동일하게 필름을 제작하였다.A film was produced in the same manner as in Example 1, except that the film was produced through the recipe and the process described below in Example 1.

* 공정 : 제막 (습도 20%) → P/D (95℃) → 연신 (연신 185℃, 이완 183℃, 연신율 127%) → 수세 → 건조 (70℃) → 권취 (※ 잔류용제 10% 이하 박리, 잔류용제 실질적으로 0% 연신)* Process: film formation (humidity 20%) → P / D (95 ° C) → stretching (elongation 185 ° C, relaxation 183 ° C, elongation 127%) → water washing → drying (70 ° C) , Residual solvent substantially 0% elongation)

* Recipe : ANB (B : M = 6 : 4) + 첨가제 + Silica
* Recipe: ANB (B: M = 6: 4) + Additive + Silica

결과는 하기 표 1과 같았다.
The results are shown in Table 1 below.

Figure pat00013
Figure pat00013

Claims (3)

하기 화학식 1로 표현되고, 연신성 향상 모노머(B)와 중합성 향상 모노머(M)로 구성된 반복단위를 포함하는 노르보넨계 수지를 용액 유연시켜 제막하는 단계;
상기 제막된 필름을 140 내지 250℃ 범위 이내의 소정의 온도로 연신하는 단계; 및
상기 연신된 필름을, 하기 수학식 1로 표현되는 범위 이내 온도(T)로 이완시키는 단계를 순차적으로 포함하여 이루어진 광학 필름의 제조방법.
[화학식 1]
Figure pat00014

여기서, R1은, 수소, 또는 탄소수 1 내지 2의 알콕시로 치환된 포르밀기이고, R2는, 탄소수 4 이상의 알콕시로 치환된 포르밀기, 또는 아세톡시 메틸기이며, m, 및 n은, 각각, 1 이상의 정수이다.
[수학식 1]
Figure pat00015

여기서, 연신온도 및 T의 단위는 ℃이고, B/M는 연신성 향상 모노머(B)와 중합성 향상 모노머(M)의 몰비이며, b는 -0.094이다.
Forming a norbornene resin represented by the following formula (1) and containing a repeating unit composed of a drawability improving monomer (B) and a polymerizable monomer (M) by solution pouring;
Stretching the formed film to a predetermined temperature within a range of 140 to 250 ° C; And
And loosening the stretched film to a temperature (T) within a range expressed by the following equation (1).
[Chemical Formula 1]
Figure pat00014

Wherein R 1 is hydrogen or a formyl group substituted with alkoxy of 1 to 2 carbon atoms, R 2 is a formyl group substituted with alkoxy having 4 or more carbon atoms, or acetoxymethyl group, m and n are each a hydrogen atom, Lt; / RTI &gt;
[Equation 1]
Figure pat00015

Here, the stretching temperature and the unit of T are ° C, B / M is the molar ratio of the extensibility improving monomer (B) to the polymerizable monomer (M), and b is -0.094.
청구항 1에 있어서,
상기 연신성 향상 모노머(B)는, 하기 화학식 2 내지 3에서 선택되는 1종 이상의 것이며,
상기 중합성 향상 모노머(M)는, 하기 화학식 4 내지 5에서 선택되는 1종 이상의 것임을 특징으로 하는 광학 필름의 제조방법.
[화학식 2]
Figure pat00016

[화학식 3]
Figure pat00017

[화학식 4]
Figure pat00018

[화학식 5]
Figure pat00019
The method according to claim 1,
The drawability improving monomer (B) is at least one selected from the following formulas (2) to (3)
Wherein the polymerizable monomer (M) is at least one selected from the following formulas (4) to (5).
(2)
Figure pat00016

(3)
Figure pat00017

[Chemical Formula 4]
Figure pat00018

[Chemical Formula 5]
Figure pat00019
청구항 2에 있어서, 연신성 향상 모노머(B) : 중합성 향상 모노머(M) = 5.5 : 4.5 ~ 7.5 : 2.5 몰 공중합 비율인 것을 특징으로 하는 광학 필름의 제조방법.The process for producing an optical film according to claim 2, wherein the copolymer (B): polymerizing property improving monomer (M) = 5.5: 4.5 to 7.5: 2.5 molar copolymerization ratio.
KR1020140189162A 2014-12-25 2014-12-25 Method of manufacturing norbornene otical film KR20160079161A (en)

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0561026A (en) 1991-06-17 1993-03-12 Nippon Zeon Co Ltd Liquid crystal substrate and liquid crystal display constituted by using this substrate

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0561026A (en) 1991-06-17 1993-03-12 Nippon Zeon Co Ltd Liquid crystal substrate and liquid crystal display constituted by using this substrate

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