KR20090121159A - Oled deposition apparatus for large size substrate and deposition methodology use the deposition apparatus - Google Patents

Abstract

PURPOSE: An OLED deposition apparatus for a large size substrate and a deposition methodology use the deposition apparatus are provided to secure deposition uniformity while keeping the large size substrate in a steady state. CONSTITUTION: A deposition apparatus for a large size substrate is composed of a crucible, a first deposition apparatus, and a second deposition apparatus. The crucible(310) accepts an organic compound into it, and a jet nozzle is on the crucible and is protruded upward with being opened to discharge a vaporous organic compound. A first deposition apparatus(400) is deposited on an outer sidewall of the organic compound, and the first deposition apparatus is rotated and change deposited organic compound into a vapor when the deposition of the organic compound is finished.

Description

Large-area substrate deposition apparatus and deposition method using the same {OLED Deposition Apparatus for Large Size Substrate and deposition Methodology use the deposition apparatus}

The present invention relates to a large area substrate deposition apparatus and a deposition method using the same.

More specifically, a large-area substrate deposition apparatus for converting the unrefined organic solid powder contained in the crucible apparatus into a vapor state at least two or more stages so that the purification process can be performed during the process of depositing an organic thin film on a large-area substrate. And a deposition method using the same.

Recently, with the rapid development of information and communication technology and the expansion of the market, a flat panel display has been spotlighted as a display device. Such flat panel displays include liquid crystal displays, plasma display panels, organic light emitting diodes, and the like.

Among them, organic light emitting diodes have very good advantages such as fast response speed, lower power consumption than conventional liquid crystal display devices, light weight, and can be made ultra-thin because there is no need for a separate back light device. It is attracting attention as a next generation display device.

In the organic light emitting device, an anode film, an organic thin film, and a cathode film are sequentially coated on a substrate, and a suitable energy difference is formed in the organic film by emitting a voltage between the anode and the cathode, thereby emitting light by itself. That is, the excitation energy left by recombination of injected electrons and holes is generated as light. In this case, since the wavelength of light generated according to the amount of the dopant of the organic material may be adjusted, full color may be realized.

Although the detailed structure of the organic light emitting diode is not shown in the drawing, an anode, a hole injection layer, a hole transport layer, an emission layer, and an electron transport layer are deposited on a substrate. A layer, an electron injection layer, and a cathode are stacked in this order. In this case, ITO (Indium Tin Oxide) having a small sheet resistance and good permeability is mainly used as the anode. The organic thin film is composed of a multilayer of a hole injection layer, a hole transporting layer, a light emitting layer, an electron transporting layer, and an electron injection layer in order to increase luminous efficiency. And so on. In addition, a LiF-Al metal film is used as the cathode. In addition, since the organic thin film is very weak to moisture and oxygen in the air, an encapsulation film is formed on the top to increase the life time of the device.

Meanwhile, organic thin film formation methods developed to date include vacuum deposition method, sputtering method, ion-beam deposition method, pulsed-laser deposition method, molecular beam deposition method, chemical vapor deposition method, and spin coater ( spin coater). Among these, currently commercially available technology is vacuum deposition.

Here, the vacuum evaporation method is to vaporize or sublime the surroundings of the crucible containing the organic material to vaporize or sublime to deposit the organic matter in the vapor (gas) state on the substrate located above the crucible.

Referring to FIG. 1, a configuration of a conventional crucible apparatus is described. An organic material is accommodated in a cylindrical main body 110, and an ejection port 111 is formed at an upper portion thereof to protrude upward and open to eject an organic material in a vapor state. have.

Referring to FIG. 2, an organic thin film deposition process using a conventional crucible apparatus is described. A crucible apparatus accommodating an organic solid powder 120 is provided inside a vacuum chamber (not shown), and a substrate S is formed on the top of the substrate. ) Is located. In this state, when the crucible apparatus is heated by a heater (not shown), the organic matter is evaporated or sublimed and ejected through the jet port 111 in a vapor state. The ejected vapor solidifies on the substrate S to form an organic thin film.

In the case of the organic solid powder as described above, the organic matter solidified on the substrate for purification in the process of purification by workers by scraping to collect the organic solid powder to form, the more the process is to obtain a pure organic solid powder. .

However, in this process, since the worker has to work by hand, it takes a lot of time and effort to obtain the organic solid powder, and there is a problem in that a large amount is lost when scraping the organic solid powder by hand.

The present invention has been made to solve the above problems of the prior art, an object of the present invention is to convert the organic solid powder contained in the crucible device to a vapor state at least two or more steps to form an organic thin film on a large area substrate The present invention provides a deposition apparatus for a large-area substrate and a deposition method using the same so that a purification process can be performed together during the deposition process.

In addition, another object of the present invention is to convert the organic material deposited in the cylindrical vapor deposition portion into a vapor state while depositing a large-area substrate while rotating the heat shield provided between the cylindrical deposition portion and the heating portion is deposited organic material for deposition The present invention provides a deposition apparatus for a large area substrate and a deposition method using the same, which ensures deposition uniformity while maintaining a stationary state without moving the large area substrate.

In order to achieve the above object, an embodiment of the present invention provides a large-area substrate deposition apparatus for depositing a large-area substrate in a vacuum chamber, wherein the organic material is accommodated therein, and the upper portion protrudes upward. A crucible having an opening formed therein so as to have a jet port through which an organic substance in a vapor state is ejected; A first deposition apparatus which deposits the organic material ejected in the vapor state on an outer wall and converts the deposited organic matter into a vapor state when the organic material deposition is completed; And a second deposition apparatus for depositing the organic substance ejected from the first deposition apparatus on the outer wall and converting the deposited organic substance into a vapor state when the organic substance deposition is completed, and depositing it on the large-area substrate. It is characterized by.

In addition, another embodiment of the present invention is a large-area substrate deposition method using a large-area substrate deposition apparatus for depositing a large-area substrate in a vacuum chamber, (1) after putting the unrefined organic solid powder into the crucible Inputting a start command so that a deposition process is performed; (2) heating a plurality of crucibles; (3) forming a deposition surface on the cylindrical deposition portion of the first deposition apparatus by causing the organic solid powder embedded in the crucible to be ejected through the spout of the crucible in a vapor state; (5) rotating the cylindrical vapor deposition unit; (6) operating the heating unit inherent in the cylindrical deposition unit to convert the organic matter deposited on the deposition surface into a vapor state, and to be discharged to be deposited on the cylindrical deposition unit of the second deposition apparatus; (8) rotating the cylindrical deposition unit of the second deposition apparatus; And (9) converting the organic material of the deposition surface formed in the cylindrical deposition portion of the second deposition apparatus into a vapor state and depositing the vaporized material on one side of the large-area substrate.

As described above, the present invention prior to the process of depositing the organic thin film on a large-area substrate in the purification process to convert the unpurified organic solid powder contained in the crucible apparatus into a vapor state at least two stages to obtain a pure organic solid powder By proceeding, it is possible to eliminate the loss of the organic solid powder generated during purification.

In addition, the present invention has an effect of lowering the overall production cost of the large-area substrate because the organic solid powder refining process is performed automatically, since the manpower that was put into the refining process is not required as in the prior art.

In addition, since the present invention enables deposition of a large area substrate in a vertical state, the large area substrate does not sag, and thus the deposition thickness is uniformly deposited over the entire area of the large area substrate. .

In addition, the present invention by converting the organic material deposited in the cylindrical vapor deposition portion in a vapor state by depositing on a large-area substrate while rotating the heat shield provided between the cylindrical deposition portion and the heating portion is deposited organic matter for deposition, There is an effect of ensuring the deposition uniformity while maintaining a stationary state without moving the area substrate.

DETAILED DESCRIPTION Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings so that those skilled in the art can easily implement the present invention in detail.

Referring to the drawings with respect to the configuration of a large-area substrate deposition apparatus according to the present invention will be described.

(Example 1 of the vapor deposition apparatus for large area substrate)

In the deposition apparatus for a large area substrate according to the present invention, as shown in FIGS. 1 to 3, a vacuum chamber 300 and an organic material are accommodated therein, and an upper portion of the vapor deposition organic material is ejected upwards and is opened. The first deposition apparatus for converting the evaporated organic matter into a vapor state by spraying the crucible 310 having a spout 310 formed therein and the organic material ejected in the vapor state on the outer wall, and the deposition of the organic material is completed, 400 and a second deposition in which the organic material ejected from the first deposition apparatus 400 is deposited on an outer wall, and when the organic material deposition is completed, the organic material is rotated to convert the deposited organic material into a vapor state and ejected to be deposited on a large area substrate. Apparatus 500 and a cooling apparatus 600 provided in the vacuum chamber to remove heat generated when depositing a large area substrate.

The first deposition apparatus 400 and the second deposition apparatus 500 are vertically formed in the vacuum chamber 300.

A plurality of crucibles 310 are provided, and the plurality of crucibles 310 are vertically arranged and formed in the vacuum chamber 300. In this case, a valve 320 is provided at each front end of the crucible 310, and a plurality of sensors 330 are provided at each front end of the valve 320, and the organic material is ejected from the valve 320. It is provided to detect the ejection amount of.

When the ejection amount sensing data sensed by the sensor 330 is input to the control apparatus 700, the control apparatus 700 determines whether the ejection amount sensing data is less than the reference ejection amount data, Outputs a valve lock signal to the valve 320, the valve 320 causes the valve 320 to be switched to a locked state in response to the valve lock signal, and thus the valve 320 is converted into a locked state, so that the vacuum chamber ( 300) The inside is maintained in a vacuum state. Although not shown in the drawing, the crucible is provided with a plurality of host crucibles and a plurality of dopant crucibles, and when the organic material included in one host crucible falls, the valve of the crucible is locked and is provided in another host crucible. The organics are ejected in the vapor state. Of course, the dopant crucible ejects the RGB organic matter stored in the crucible in the same way as the host crucible in a vapor state.

The first deposition apparatus 400 is provided with a cylindrical deposition unit 420 in which the organic material of the crucible 310 is deposited, and is provided inside the cylindrical deposition unit 420 so that the surface temperature of the cylindrical deposition unit 420 is arbitrary. The heating unit 440 for generating heat so as to rise to a temperature of the, and the organic material is located between the cylindrical deposition unit 420 and the heating unit 430 and deposited at any position of the cylindrical deposition unit 420 vapor The heat shield 430 is opened to be converted into a state, and the motor 450 for rotating the cylindrical deposition unit 420.

The second deposition apparatus 500 includes a cylindrical deposition unit 520, a heating unit 530, and a heat shield 430, and is configured in the same configuration as the first deposition apparatus 400. Detailed description will be omitted, in the case of the motor 450 may be implemented so that a plurality of deposition apparatus provided in the present invention using a single motor is rotated, the deposition apparatus is provided for each deposition apparatus 400 It can be implemented to be rotationally driven.

The large area substrate deposition apparatus further includes a control apparatus 700 for controlling the rotation driving state of the motor 450 provided in the first deposition apparatus 400 and the second deposition apparatus 500, respectively.

The cooling unit 600 cools the inside of the vacuum chamber 300 by using a gas flow.

Referring to the deposition process of the large-area substrate deposition apparatus configured as described above are as follows.

In the deposition process of the large-area substrate deposition apparatus, as shown in FIGS. 4 and 7, when the unrefined organic solid powder is placed in the pottery 310, a start command is input (P100) to perform the deposition process. The control apparatus 700 allows the crucible 310 to be heated (P110), and the organic solid powder of the heated crucible 310 is ejected (P120) through a spout (not shown) in a vapor state.

The organic solid powder thus ejected is deposited on the cylindrical deposition unit 420 of the first deposition apparatus 400 to form a deposition surface 410 (P130), and when the deposition surface 410 is formed, the control apparatus 700. The motor 450 drives the cylindrical deposition unit 420 to rotate (P140). In this case, the control device 700 prevents the motor 450 from being driven when the deposition surface 410 of the cylindrical deposition unit 420 is positioned at a position opposite to the opening of the heat shield 430.

Then, the temperature of the deposition surface 410 is raised by the heat of the heating unit 440 emitted through the opening of the heat shield 430, the organic material deposited on the deposition surface 410 is converted into a vapor state again in the vacuum chamber Ejected P150 through opening 320 of 300.

The organic material thus released is deposited (P160) on the cylindrical deposition unit 520 of the second deposition apparatus 500, and when the deposition surface 510 is formed on the cylindrical deposition unit 520, the control device (as described above) 700 drives the motor 550 to allow the cylindrical deposition unit 520 to rotate (P170).

Then, the temperature of the deposition surface 510 is increased by the heat of the heating unit 540 emitted through the opening of the heat shield 530, and the organic material deposited on the deposition surface 510 is converted into a vapor state again to form a vacuum chamber. Ejected P180 through opening 330 of 300.

The organic material thus released is deposited (P190) on one side of the large area substrate. At this time, the control device 700 drives the cooling device 600 provided in the vacuum chamber 300 to remove heat generated during the organic material purification process and the process of depositing the organic material on the large-area substrate to the interior of the vacuum chamber 300. Ensure that the temperature is always a constant.

On the other hand, as shown in Figure 3, the more the deposition apparatus for purifying the organic matter for deposition between the first deposition apparatus 400 and the second deposition apparatus 500 is provided with a higher purity organic material can be obtained. . That is, impurities are included in the organic material are removed by repeatedly performing the deposition process on the organic material before depositing the organic material on the large area substrate.

(Example 2 of the vapor deposition apparatus for large area substrate)

Unlike the first embodiment, the second embodiment does not move the large substrate by allowing the cylindrical evaporation unit 430 to be rotated in the forward or reverse direction, instead of rotating the cylindrical evaporation unit in the forward or reverse direction. In the absence of organic matter, organic materials are deposited on the large substrate. In more detail, as illustrated in FIG. 5, the cylindrical deposition unit 310 in which the organic material of the crucible 310 is deposited and the cylindrical deposition unit 310 are provided in the cylindrical deposition unit 310. Heating unit 440 for generating heat so that the surface temperature is raised to an arbitrary temperature, and is positioned so as to be rotatable between the cylindrical deposition unit 310 and the heating unit 440 and any of the cylindrical deposition unit 310 A first motor which is connected to the heat shield 430 and the cylindrical depositing unit 310 to open only the organic material deposited at the position into a vapor state, so that the cylindrical depositing unit 310 is rotated in the forward or reverse direction 450 and a second motor 550 connected to the heat shield 430 to allow the heat shield 430 to rotate in a forward or reverse direction, and the first motor 450 or the second motor ( Control to drive 550 in the reverse or forward direction The roll apparatus 700 is comprised.

In this case, a plurality of crucibles 310 are provided, and the plurality of crucibles 310 are vertically arranged and formed in the vacuum chamber 300. In this case, a valve 320 is provided at each front end of the crucible 310, and a plurality of sensors 330 are provided at each front end of the valve 320, and the organic material is ejected from the valve 320. It is provided to detect the ejection amount of.

When the ejection amount detection data sensed by the sensor 330 is input to the control device 700, the control device 700 determines whether the ejection amount detection data is smaller than the reference ejection amount data, When the valve lock signal is output to the valve 320, the valve 320 causes the valve 320 to be switched to the locked state in response to the valve lock signal, and thus the valve 320 is converted into the locked state to form a vacuum chamber. 300 is maintained inside the vacuum state. Although not shown in the drawing, the crucible is provided with a plurality of host crucibles and a plurality of dopant crucibles, and when the organic material included in one host crucible falls, the valve of the crucible is locked and is provided in another host crucible. The organics are ejected in the vapor state. Of course, the dopant crucible ejects the RGB organic matter stored in the crucible in the same way as the host crucible in a vapor state.

As described above, the description of the same configuration as in Embodiment 1 of the configuration of Embodiment 2 has been omitted, and the same configuration is the same as the description of Embodiment 1 described above.

Referring to the operation of the deposition apparatus of the large-area substrate configured as described above are as follows.

 As shown in FIG. 5, when the unrefined organic solid powder is placed in the crucible 310 and a start command is inputted so that the deposition process is performed, the control apparatus 700 causes the crucible 310 to be heated and heated. The organic solid powder of the crucible 310 is ejected through a spout (not shown) in a vapor state.

The organic solid powder thus ejected is deposited on the cylindrical deposition unit 420 of the first deposition apparatus 400 to form the deposition surface 410. When the deposition surface 410 is formed, the control device 700 is the first The motor 450 is rotated so that the deposition surface faces the second deposition apparatus 400, and then the second motor 550 is driven to rotate the heat shield 440.

Then, the temperature of the deposition surface 410 is raised by the heat of the heating unit 440 emitted through the opening of the heat shield 430, the organic material deposited on the deposition surface 410 is converted into a vapor state again in the vacuum chamber Emitted through an opening 320 of 300.

The organic material thus discharged is deposited on the cylindrical deposition unit 520 of the second deposition apparatus 500, and when the deposition surface 510 is formed on the cylindrical deposition unit 520, the control device 700 includes the first motor. By driving 450, the deposition surface 510 of the cylindrical deposition unit 520 is rotated to face the large area substrate, and then the second motor 550 is driven to rotate the heat shield 430.

Then, the temperature of the deposition surface 510 is increased by the heat of the heating unit 540 emitted through the opening of the heat shield 530, and the organic material deposited on the deposition surface 510 is converted into a vapor state again to form a vacuum chamber. Emitted through an opening 330 of 300.

The organic material thus released is deposited on one side of the large area substrate. Accordingly, by applying the present invention to the deposition apparatus, it is possible to ensure the deposition uniformity while maintaining a stationary state without moving the large area substrate.

At this time, the control device 700 drives the cooling device 600 provided in the vacuum chamber 300 to remove heat generated during the organic material purification process and the process of depositing the organic material on the large-area substrate to the interior of the vacuum chamber 300. Ensure that the temperature is always a constant.

On the other hand, as shown in Figure 3, the more the deposition apparatus for purifying the organic matter for deposition between the first deposition apparatus 400 and the second deposition apparatus 500 is provided with a higher purity organic material can be obtained. . That is, impurities are included in the organic material are removed by repeatedly performing the deposition process on the organic material before depositing the organic material on the large area substrate.

As mentioned above, although preferred embodiments of the present invention have been described in detail, those skilled in the art to which the present invention pertains may make the present invention without departing from the spirit and scope of the present invention as defined in the appended claims. It will be appreciated that various modifications or changes can be made.

1 is a schematic block diagram for explaining the configuration of a large-area substrate deposition apparatus according to the present invention.

FIG. 2 is a perspective view for describing a configuration of a deposition apparatus applied to FIG. 1.

3 is a view for explaining another embodiment of FIG. 2.

4 is a view for explaining an operating state of the deposition apparatus for a large area substrate according to the present invention.

Figure 5 is a block diagram for explaining another embodiment of a large-area substrate deposition apparatus according to the present invention.

6 is a view for explaining an operating state of another embodiment of FIG.

7 is a process flowchart illustrating a deposition method using a deposition apparatus for a large area substrate according to the present invention.

<Description of the symbols for the main parts of the drawings>

100: large area substrate deposition apparatus

300: vacuum chamber

310: crucible

400, 500: vapor deposition apparatus

410, 510: deposition surface 420, 520: cylindrical deposition portion

430, 530: heat shield 440, 540: heating part

450, 550: motor

600: cooling device

700: control device

Claims (18)

A large area substrate deposition apparatus for depositing a large area substrate in a vacuum chamber, A crucible in which an organic material is accommodated therein, and an ejection opening for protruding upward and opening is formed therein to eject the organic material in a vapor state; A first deposition apparatus which deposits the organic material ejected in the vapor state on an outer wall and converts the deposited organic matter into a vapor state when the organic material deposition is completed; And A second deposition apparatus for depositing the organic substance ejected from the first deposition apparatus on an outer wall, converting the deposited organic substance into a vapor state when the organic substance deposition is completed, and depositing the deposited organic substance on a large area substrate; Evaporation apparatus for a large-area substrate, characterized in that provided including. The method of claim 1, The first deposition apparatus and the second deposition apparatus, the deposition apparatus for a large area substrate, characterized in that formed in the vacuum chamber vertically. The method of claim 1, And the deposition apparatus for a large area substrate further comprises at least one or more of the same deposition apparatuses as the first deposition apparatus between the first deposition apparatus and the second deposition apparatus. The method of claim 1, The crucible is provided with a plurality, the plurality of crucibles are arranged in a vertical chamber, the deposition apparatus for a large area substrate. The method according to claim 1 or 4, A valve is provided at each front end of the crucible, and a plurality of sensors are provided at the front end of each of the valves to detect an ejection amount of the organic material ejected from the valve, and the ejection amount detected by the sensor. When the sensing data is input to the control device, the control device determines whether the ejection amount sensing data is less than the standard ejection amount data, and if it is less, outputs a valve lock signal to the valve. Device. The method of claim 1, The first deposition apparatus and the second deposition apparatus include a cylindrical deposition unit in which the organic material of the crucible is deposited, and a heating unit which is provided inside the cylindrical deposition unit to generate heat so that the surface temperature of the cylindrical deposition unit is raised to an arbitrary temperature. And a heat shield disposed between the cylindrical deposition unit and the heating unit and opened to convert only the organic material deposited at an arbitrary position of the cylindrical deposition unit into a vapor state. Deposition apparatus for a large area substrate, characterized in that consisting of. The method of claim 1, The apparatus for depositing a large area substrate further comprises a cooling device provided in the vacuum chamber to remove heat generated during deposition of the large area substrate. The method of claim 2, The first deposition apparatus and the second deposition apparatus each include a motor for rotating the cylindrical deposition unit. The method of claim 8, The apparatus for depositing a large area substrate, the apparatus for depositing a large area substrate further comprises a control device for controlling a rotational driving state of a motor provided in each of the first deposition apparatus and the second deposition apparatus. The method of claim 7, wherein The cooling device is a deposition apparatus for a large area substrate, characterized in that for cooling the inside of the vacuum chamber using a gas flow (gas flow). The crucible is formed with an organic material housed therein, the upper part of which is formed with a spout for protruding upward and opening to eject a vaporized organic material, and the organic material ejected in the vapor state is deposited on the outer wall. The first deposition apparatus for converting and depositing the rotated organic substance into a vapor state and the organic substance ejected from the first deposition apparatus are deposited on an outer wall, and when the organic substance deposition is completed, the rotated and deposited organic substance is vaporized. In the vapor deposition apparatus for a large-area substrate provided with a second deposition apparatus for converting and ejecting to be deposited on a large-area substrate, for depositing a large-area substrate in a vacuum chamber, A cylindrical vapor deposition unit in which the organic material of the crucible is deposited; A heating unit provided inside the cylindrical deposition unit to generate heat to increase a surface temperature of the cylindrical deposition unit to an arbitrary temperature; A heat shield disposed rotatably between the cylindrical deposition unit and the heating unit and opened to convert only the organic material deposited at any position of the cylindrical deposition unit into a vapor state; A first motor connected to the cylindrical deposition unit to rotate the cylindrical deposition unit in a forward or reverse direction; A second motor connected to the heat shield to allow the heat shield to rotate in a forward or reverse direction; And A control device for driving the first motor or the second motor in a reverse direction or a forward direction; Evaporation apparatus for a large-area substrate, characterized in that provided including. The method of claim 11, The first deposition apparatus and the second deposition apparatus, the deposition apparatus for a large area substrate, characterized in that formed in the vacuum chamber vertically. The method of claim 11, And the deposition apparatus for a large area substrate further comprises at least one or more of the same deposition apparatuses as the first deposition apparatus between the first deposition apparatus and the second deposition apparatus. The method of claim 11, The crucible is provided with a plurality, the plurality of crucibles are arranged in a vertical chamber, the deposition apparatus for a large area substrate. The method according to claim 11 or 14, A valve is provided at each front end of the crucible, and a plurality of sensors are provided at the front end of each of the valves to detect an ejection amount of the organic material ejected from the valve, and the ejection amount detected by the sensor. When the sensing data is input to the control device, the control device determines whether the ejection amount sensing data is less than the standard ejection amount data, and if less, outputs a valve lock signal to the valve. Device. The method of claim 11, The apparatus for depositing a large area substrate further comprises a cooling device provided in the vacuum chamber to remove heat generated during deposition of the large area substrate. In a large area substrate deposition method using a large area substrate deposition apparatus for depositing a large area substrate in a vacuum chamber, (1) inputting an initiation command so that the evaporation process takes place after putting the crude organic solid powder into a crucible; (2) heating a plurality of crucibles; (3) forming a deposition surface on the cylindrical deposition portion of the first deposition apparatus by causing the organic solid powder embedded in the crucible to be ejected through the spout of the crucible in a vapor state; (4) rotating the cylindrical deposition portion; (5) a process of depositing the cylindrical deposition portion of the second deposition apparatus by operating the heating portion inherent in the cylindrical deposition portion to convert the organic matter deposited on the deposition surface into a vapor state to be discharged; (6) rotating the cylindrical deposition unit of the second deposition apparatus; And (7) converting the organic material of the deposition surface formed in the cylindrical deposition unit of the second deposition apparatus into a vapor state and depositing on one side of the large-area substrate. Substrate deposition method using. In a large area substrate deposition method using a large area substrate deposition apparatus for depositing a large area substrate in a vacuum chamber, (1) inputting an initiation command so that the evaporation process takes place after putting the crude organic solid powder into a crucible; (2) heating a plurality of crucibles; (3) forming a deposition surface on the cylindrical deposition portion of the first deposition apparatus by causing the organic solid powder embedded in the crucible to be ejected through the spout of the crucible in a vapor state; (4) rotating the cylindrical deposition portion; (5) a process of depositing the cylindrical deposition portion of the second deposition apparatus by operating the heating portion inherent in the cylindrical deposition portion to convert the organic matter deposited on the deposition surface into a vapor state to be discharged; (6) rotating the cylindrical deposition unit of the second deposition apparatus; And (7) rotating the heat shield provided in the second deposition apparatus to convert the organic material of the deposition surface formed on the cylindrical deposition unit into a vapor state and depositing it on one side of the large-area substrate. Substrate deposition method using a large-area substrate deposition apparatus.

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