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KR20020093267A - Fabrication Method of Using Plasma Spray Coation - Google Patents

Fabrication Method of Using Plasma Spray Coation Download PDF

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Publication number
KR20020093267A
KR20020093267A KR1020010031735A KR20010031735A KR20020093267A KR 20020093267 A KR20020093267 A KR 20020093267A KR 1020010031735 A KR1020010031735 A KR 1020010031735A KR 20010031735 A KR20010031735 A KR 20010031735A KR 20020093267 A KR20020093267 A KR 20020093267A
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KR
South Korea
Prior art keywords
photosensitive film
substrate
plasma
coating
flame
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Application number
KR1020010031735A
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Korean (ko)
Inventor
권혁
전영삼
부종욱
Original Assignee
엘지전자 주식회사
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Priority to KR1020010031735A priority Critical patent/KR20020093267A/en
Publication of KR20020093267A publication Critical patent/KR20020093267A/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/22—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc
    • B05B7/222—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc
    • B05B7/224—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc the material having originally the shape of a wire, rod or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C21/00—Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00
    • B05C21/005—Masking devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE: A method for manufacturing microstructure is provided which has superior mass production characteristics by manufacturing the microstructure using plasma spray coating having fast deposition technology. CONSTITUTION: The method for manufacturing structure using plasma spray coating comprises the steps of coating a photosensitive film to a certain height on a substrate; arranging a photomask having certain patterns on the upper part of the substrate, and selectively irradiating light onto the photosensitive film, thereby exposing the photosensitive film to light; forming structure frames consisted of the photosensitive film by removing from the substrate any one photosensitive film of the photosensitive film exposed to light and the photosensitive film not exposed to light; plasma coating step of forming a structure between the structure frames by melting a certain material with flame produced by plasma gas; and removing the structure frames from the substrate, wherein the structure comprises metal, ceramic, oxide, carbide, nitride, or organic compound, and the plasma coating step comprises the steps of oppositely directing the substrate to a position where the flame produced by ionized plasma gas is formed; and coating the melted certain material between the structure frames by providing the produced flame with a wire or powder shaped certain material and melting the certain material after producing a flame by ionizing the gas injected.

Description

플라즈마 스프레이 코팅을 이용한 구조물 제조방법{Fabrication Method of Using Plasma Spray Coation}Fabrication Method of Using Plasma Spray Coation

본 발명은 플라즈마 스프레이 코팅(Plasma spray coating)법을 이용한 초정밀 구조물 제조방법에 관한 것으로, 특히 플라즈마 스프레이 코팅법을 이용하여 최근 많이 연구가 진행되고 있는 마이크로머시닝 기술을 통한 미세한 구조물 제작에 있어 높은 종횡비를 갖는 구조물을 제작하는 것이다.The present invention relates to a method for manufacturing an ultra-precision structure using a plasma spray coating method, in particular, to a high aspect ratio in the production of fine structures using micromachining technology, which has been studied a lot recently using the plasma spray coating method. It is to manufacture a structure having.

플라즈마 스프레이 코팅법은 고온, 고속의 플라즈마 불꽃(plasma flame) 내의 선(wire) 또는 분말 형태의 재료를 공급하여 코팅하는 방법이다.Plasma spray coating is a method of supplying and coating a material in the form of wire or powder in a high temperature, high speed plasma flame.

플라즈마 건(plasma gun)내의 음극과 양극 사이에서 전리된 플라즈마 가스가 대기로 방출되어 고에너지를 형성하는데 이런 고온의 불꽃에 분말을 공급하면 분말은 짧은 시간에 용융되어 기판에 충돌하면서 코팅층(coating layer)을 형성한다.The ionized plasma gas between the cathode and anode in the plasma gun is released into the atmosphere to form high energy. When the powder is supplied to such a high temperature flame, the powder melts in a short time and impinges on the substrate while coating layer (coating layer) ).

용융된 분말을 코팅하므로 코팅 속도가 매우 빠르고, 코팅층은 분말의 조성을 거의 그대로 유지하기 때문에 코팅층 조성의 조절이 쉬울 뿐 아니라 복합재료 등도 쉽게 코팅할 수 있으며, 현재까지 내식, 내산화, 내마모 코팅 재료뿐만 아니라 자동차, 항공, 발전 분야, 의학 분야 등에 폭넓게 응용이 되고 있다.The coating speed is very fast because the molten powder is coated, and the coating layer maintains the composition of the powder almost intact, making it easy to control the composition of the coating layer and easily coating composite materials. In addition, it is widely applied in the fields of automobile, aviation, power generation, medicine

반도체 공정과 LIGA 기술을 사용하여 제작되는 정밀 금형, 가속도 센서, 마이크로 모터 등과 같은 미세 구조물을 상기 플라즈마 스프레이 코팅법을 이용하면 종래의 전기 도금(electro-plating) 기술과 차별화하여 몇 가지 장점을 가질 수 있다.Microstructures such as precision molds, acceleration sensors, micromotors, etc., fabricated using the semiconductor process and LIGA technology can have several advantages over the conventional electro-plating technology using the plasma spray coating method. have.

즉, 전기 도금 기술로는 가공할 수 있는 구조물의 재료가 한정되어 있고, 낮은 증착속도를 갖는 단점이 있다.That is, the electroplating technique is limited in the material of the structure that can be processed, and has the disadvantage of having a low deposition rate.

반면에 플라즈마 스프레이 코팅 기술을 적용시에 훨씬 빠른 증착 속도를 보이며, 기존의 금속이나 유기화합물 이외에 세라믹 재료 등 다양한 재료를 증착할 수 있어 활용의 범위가 넓다고 할 수 있다.On the other hand, when plasma spray coating technology is applied, the deposition rate is much faster, and various materials such as ceramic materials can be deposited in addition to existing metals or organic compounds, and thus the range of application is broad.

따라서 본 발명은 상기와 같은 문제점을 해결하기 위해 안출한 것으로서,빠른 증착 기술을 갖는 플라즈마 스프레이 코팅법을 이용하여 미세 구조물을 제조하여 양산성이 좋은 미세 구조물의 제조방법을 제공하는데 그 목적이 있다.Accordingly, the present invention has been made to solve the above problems, and an object thereof is to provide a method for producing a microstructure having good mass productivity by manufacturing a microstructure using a plasma spray coating method having a fast deposition technique.

그리고 플라즈마 스프레이 코팅법으로 증착이 가능한 금속, 세라믹, 유기화합물에 이르기까지 다양한 재료들을 이용하여 반도체 소자 제조 공정 및 마이크로머시닝을 이용하여 미세 구조물을 제조하는 방법을 제공하는데 그 목적이 있다.Another object of the present invention is to provide a method of manufacturing a microstructure using a semiconductor device manufacturing process and micromachining using various materials ranging from metals, ceramics, and organic compounds that can be deposited by plasma spray coating.

도1은 본 발명에 따른 플라즈마 스프레이 건(plasma spray gun)의 단면도 및 플라즈마 스프레이 건(plasma spray gun)을 이용한 코팅 원리 도시도.1 is a cross-sectional view of a plasma spray gun and a coating principle using a plasma spray gun in accordance with the present invention.

도2a 내지 도2f는 본 발명에 따른 플라즈마 스프레이 코팅법에 의한 구조물의 제조 공정 단면도.Figures 2a to 2f are cross-sectional views of the manufacturing process of the structure by the plasma spray coating method according to the present invention.

*도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings

1 : 기판 2 : 감광막1 substrate 2 photosensitive film

3 : 포토마스크 4 : 구조틀3: photomask 4: structure

5 : 코팅층 6 : 구조물5: coating layer 6: structure

상기와 같은 목적을 달성하기 위한 본 발명에 따른 플라즈마 코팅을 이용한 구조물 제조방법의 특징은 기판 상에 감광막을 소정 높이로 도포하는 단계; 소정 패턴을 갖는 포토마스크를 상기 기판 상부에 배치하고 상기 감광막에 선택적으로 빛을 조사하여 노광하는 단계; 상기 노광된 감광막과 노광되지 않은 감광막 중 어느 하나의 감광막을 기판으로부터 제거하여 감광막으로 이루어진 구조틀을 형성하는 단계; 플라즈마 가스에 의해 생성되는 불꽃에 소정 재료를 용융시켜 상기 구조틀 사이에 구조물을 형성하는 플라즈마 코팅 단계; 상기 구조틀을 기판으로부터 제거하는 단계를 포함하여 이루어지는데 있다.Features of the structure manufacturing method using a plasma coating according to the present invention for achieving the above object comprises the steps of applying a photosensitive film to a predetermined height on the substrate; Disposing a photomask having a predetermined pattern on the substrate and selectively irradiating light to the photoresist; Removing a photosensitive film of any one of the exposed photosensitive film and the unexposed photosensitive film from a substrate to form a structure made of a photosensitive film; Plasma coating step of melting a predetermined material in the flame generated by the plasma gas to form a structure between the frame; And removing the structural frame from the substrate.

그리고, 상기 플라즈마 코팅하는 단계는 전리된 플라즈마 가스에 의해 생성되는 불꽃이 형성되는 위치에 상기 기판을 대향시키는 단계; 주입된 가스를 전리시켜 불꽃을 생성시키고, 상기 생성된 불꽃에 소정 재료의 선, 분말 형태 중 어느 하나를 제공하여 상기 소정 재료를 용융시켜 상기 구조틀 사이에 코팅하는 단계를 포함하여 이루어진다.The plasma coating may include opposing the substrate at a position where a flame generated by the ionized plasma gas is formed; Ionizing the injected gas to generate a flame, and providing the generated flame with any one of a line and powder form of a predetermined material to melt the predetermined material and to coat the structure between the frames.

상기 구조물은 금속, 세라믹, 산화물, 탄화물, 질화물, 유기화합물 중 어느하나를 포함하여 이루어질 수 있다.The structure may include any one of metal, ceramic, oxide, carbide, nitride, and organic compound.

본 발명의 다른 목적, 특성 및 잇점들은 첨부한 도면을 참조한 실시예들의 상세한 설명을 통해 명백해질 것이다.Other objects, features and advantages of the present invention will become apparent from the following detailed description of embodiments taken in conjunction with the accompanying drawings.

본 발명에 따른 플라즈마 코팅을 이용한 구조물 제조방법의 바람직한 실시예에 대하여 첨부한 도면을 참조하여 설명하면 다음과 같다Referring to the accompanying drawings, a preferred embodiment of a structure manufacturing method using a plasma coating according to the present invention will be described as follows.

도1은 본 발명에 따른 플라즈마 스프레이 건(plasma spray gun)의 단면도 및 플라즈마 스프레이 건(plasma spray gun)을 이용한 코팅 원리를 도시한 것으로, 도1에 도시한 바와 같이 플라즈마 스프레이 코팅 장비의 핵심은 플라즈마 건(plasma gun)이라고 불리는 장치이며, 음극 및 양극과, 플라즈마 형성을 위한 가스주입구, 분말주입구로 구성되어 있다.1 is a cross-sectional view of a plasma spray gun and a coating principle using a plasma spray gun according to the present invention. As shown in FIG. It is a device called a plasma gun, and is composed of a cathode and an anode, a gas inlet for forming plasma, and a powder inlet.

상기 두 전극에 전계를 인가하면 플라즈마가 전리되고, 전리된 플라즈마는 대기로 방출되어 고에너지를 형성하여 고온의 불꽃을 발생하게 되고, 분말주입구로부터 상기 불꽃에 분말을 공급하면 분말은 짧은 시간에 용융이 되어 기판에 충돌하면서 코팅층을 형성한다.When the electric field is applied to the two electrodes, the plasma is ionized, and the ionized plasma is released into the atmosphere to form a high energy to generate a high temperature flame. This forms a coating layer while impinging on the substrate.

그리고 고에너지에 의한 플라즈마 스프레이 건의 가열을 방지하기 위한 워터 주입구 및 배출구를 더 포함하여 구성된다.And it further comprises a water inlet and outlet for preventing the heating of the plasma spray gun by high energy.

도2a 내지 도2f는 본 발명에 따른 플라즈마 스프레이 코팅법에 의한 구조물의 제조 공정 단면도로, 마이크로머시닝 및 반도체 소자 제조 공정을 통해 원하는 틀 구조물을 제작한 후, 플라즈마 스프레이 코팅으로 최종적인 구조물을 만드는 방법을 도시하였다.Figure 2a to 2f is a cross-sectional view of the manufacturing process of the structure by the plasma spray coating method according to the present invention, after manufacturing the desired framework structure through the micromachining and semiconductor device manufacturing process, and then the final structure by plasma spray coating method Is shown.

우선, 도2a에 도시한 바와 같이 이후 형성되는 구조물의 지지부로 이용되는 금속 기판 또는 다른 재료의 기판(1)을 준비하여 표면의 불순물 등을 제거하는 세정공정(cleaning process)을 한 다음, 후막 감광막(2)을 원하는 높이로 도포하고, 이 감광막(2)이 감광성을 가지며, 상기 기판(1)과의 접착력(adhesion)이 향상되도록 열처리를 한다.First, as shown in FIG. 2A, a metal substrate or a substrate 1 of another material, which is used as a support for a structure to be formed later, is prepared, and a cleaning process is performed to remove impurities from the surface. (2) is applied to a desired height, and the photosensitive film 2 is subjected to heat treatment so as to have photosensitivity and to improve adhesion to the substrate 1.

이어 도2b에 도시한 바와 같이 UV 또는 X선으로 평행광 노광기를 이용하여 원하고자 하는 구조의 평면 형상이 제조되어 있는 포토마스크(3)를 통하여 후막 감광막(2)을 노광한다.Subsequently, as shown in FIG. 2B, the thick film photosensitive film 2 is exposed through a photomask 3 in which a planar shape of a desired structure is manufactured using a parallel light exposure machine with UV or X-rays.

이어 도2c에 도시한 바와 같이, 노광 공정후 음성 감광막(negative photoresist)을 이용하여 상기 포토마스크(3)를 통해 노광되지 않은 부분이 제거하기 위해 현상공정을 거치고, 이후 열처리 과정을 거쳐 후막 감광막으로 패터닝(patterning)된 구조틀(4)을 완성한다.Then, as shown in Figure 2c, after the exposure process using a negative photoresist (negative photoresist) through the photomask (3) is subjected to a development process to remove the unexposed, and then subjected to a heat treatment process to a thick film photoresist The patterned framework 4 is completed.

이어 도2d에 도시한 바와 같이, 후막 감광막으로 형성된 구조틀(4)에 도1에 도시한 바와 같은 플라즈마 스프레이 코팅 장치를 이용하여 원하고자 하는 재료를 빠른 증착 속도로 코팅을 하여 코팅층(5)을 형성한다.Next, as shown in FIG. 2D, a coating layer 5 is formed on the structural frame 4 formed of the thick film photoresist by coating a desired material at a high deposition rate using a plasma spray coating apparatus as shown in FIG. 1. do.

스프레이 코팅을 진행하여 틀을 넘치도록 코팅을 한 후, 필요시에 오버플로우(overflow)된 재료를 화학적·기계적 연마(chemical mechanical polishing)를 통하여 원하는 높이만큼 연마하여 제거함으로써 도2e에 도시한 바와 같이, 전체구조물의 평활도를 향상시키고, 이후 형성되는 구조물의 높이를 조절한다.After coating by spray coating to overflow the mold, the overflowed material may be polished and removed to a desired height through chemical and mechanical polishing, as shown in FIG. 2E. , Improve the smoothness of the entire structure, and then adjust the height of the structure formed.

마지막으로 후막 감광막으로 이루어진 구조틀(4)을 선택적 식각 기술로 제거하여 도2f에 도시한 바와 같이 원하는 구조물(6)을 완성한다.Finally, the structural frame 4 made of the thick film photoresist film is removed by a selective etching technique to complete the desired structure 6 as shown in FIG. 2F.

상기 구조물(7)은 상기 플라즈마 스프레이 건에 의해 용융이 가능한 재료로 형성될 수 있으며, 코팅 재료로는 금속과 산화물(oxide)은 물론 세라믹, 탄화물(carbide), 질화물(nitride) 및 유기화합물(polymer)에 이르기까지 다양하게 이용된다.The structure 7 may be formed of a material that can be melted by the plasma spray gun, and the coating material may be ceramics, carbides, nitrides, and polymers as well as metals and oxides. It is used in various ways.

이러한 구조물(7)은 복제를 여러번하여 제품을 만들 수 정밀 금형이 될 수 있으며 세라믹 구조물, 플라스틱 구조물 등 원하는 형태의 다양한 미세 구조물이 제작 가능하며, 이러한 미세 구조는 마이크로 필터(filter), 마이크로 노즐(nozzle), 마이크로 커넥터(connector), 기어(gear), 가속도 센서 등 다양한 소자에 적용된다.Such a structure (7) can be a precision mold to make a product by replicating many times, and can be produced in a variety of microstructures of the desired shape, such as ceramic structures, plastic structures, such microstructures, such as a micro filter (micro filter), It is applied to various devices such as nozzles, micro connectors, gears, and acceleration sensors.

이상에서 설명한 바와 같은 본 발명에 따른 플라즈마 코팅을 이용한 구조물 제조방법은 다음과 같은 효과가 있다.Structure manufacturing method using a plasma coating according to the present invention as described above has the following effects.

플라즈마 스프레이 코팅을 금형 등과 같은 미세 구조물에 적용시에 일반적인 도금 방법에 비해 빠른 증착속도를 가지므로 양산에서 유리하고, 다양한 재료를 이용하여 증착할 수 있기 때문에 다양한 재질과 성질을 갖는 구조물을 제조하여 다양한 소자에 적용하는 효과가 있다.When plasma spray coating is applied to microstructures such as molds, it is faster in mass production than general plating methods, so it is advantageous in mass production and can be deposited using various materials. It is effective to apply to the device.

이상 설명한 내용을 통해 당업자라면 본 발명의 기술 사상을 이탈하지 아니하는 범위에서 다양한 변경 및 수정이 가능함을 알 수 있을 것이다.Those skilled in the art will appreciate that various changes and modifications can be made without departing from the spirit of the present invention.

따라서, 본 발명의 기술적 범위는 실시예에 기재된 내용으로 한정되는 것이아니라 특허 청구의 범위에 의하여 정해져야 한다.Therefore, the technical scope of the present invention should not be limited to the contents described in the embodiments, but should be defined by the claims.

Claims (3)

기판 상에 감광막을 소정 높이로 도포하는 단계;Applying a photoresist film to a predetermined height on the substrate; 소정 패턴을 갖는 포토마스크를 상기 기판 상부에 배치하고 상기 감광막에 선택적으로 빛을 조사하여 노광하는 단계;Disposing a photomask having a predetermined pattern on the substrate and selectively irradiating light to the photoresist; 상기 노광된 감광막과 노광되지 않은 감광막 중 어느 하나의 감광막을 기판으로부터 제거하여 감광막으로 이루어진 구조틀을 형성하는 단계;Removing a photosensitive film of any one of the exposed photosensitive film and the unexposed photosensitive film from a substrate to form a structure made of a photosensitive film; 플라즈마 가스에 의해 생성되는 불꽃에 소정 재료를 용융시켜 상기 구조틀 사이에 구조물을 형성하는 플라즈마 코팅 단계;Plasma coating step of melting a predetermined material in the flame generated by the plasma gas to form a structure between the frame; 상기 구조틀을 기판으로부터 제거하는 단계를 포함하여 이루어지는 것을 특징으로 하는 플라즈마 코팅을 이용한 구조물 제조방법.Removing the structure from the substrate comprising a structure manufacturing method using a plasma coating, characterized in that it comprises. 제1항에 있어서,The method of claim 1, 상기 구조물은 금속, 세라믹, 산화물, 탄화물, 질화물, 유기화합물 중 어느 하나를 포함하는 것을 특징으로 하는 플라즈마 코팅을 이용한 구조물 제조방법.The structure is a structure manufacturing method using a plasma coating comprising any one of metal, ceramic, oxide, carbide, nitride, organic compound. 제1항에 있어서, 상기 플라즈마 코팅 단계는The method of claim 1, wherein the plasma coating step 전리된 플라즈마 가스에 의해 생성되는 불꽃이 형성되는 위치에 상기 기판을 대향시키는 단계;Opposing the substrate at a location where a flame generated by the ionized plasma gas is formed; 주입된 가스를 전리시켜 불꽃을 생성시키고, 상기 생성된 불꽃에 소정 재료의 선, 분말 형태 중 어느 하나를 제공하여 상기 소정 재료를 용융시켜 상기 구조틀 사이에 코팅하는 단계를 포함하는 것을 특징으로 하는 플라즈마 코팅을 이용한 구조물 제조방법.Ionizing the injected gas to generate a flame, and providing the generated flame with any one of a line and a powder form of a predetermined material to melt and coat the predetermined material between the structural frames. Structure manufacturing method using the coating.
KR1020010031735A 2001-06-07 2001-06-07 Fabrication Method of Using Plasma Spray Coation KR20020093267A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102403216B1 (en) 2022-03-15 2022-05-30 (주)위드엘씨 Coating composition for protecting anodic oxide layer and element of semiconductor manufacturing apparatus using the smae
KR102507838B1 (en) 2022-07-25 2023-03-08 (주)위드엘씨 Coating composition for protecting anodic oxide layer, having fluorine-containing alkoxy silane

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102403216B1 (en) 2022-03-15 2022-05-30 (주)위드엘씨 Coating composition for protecting anodic oxide layer and element of semiconductor manufacturing apparatus using the smae
KR102507838B1 (en) 2022-07-25 2023-03-08 (주)위드엘씨 Coating composition for protecting anodic oxide layer, having fluorine-containing alkoxy silane

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