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KR20010081967A - 기판 센터링장치 - Google Patents

기판 센터링장치 Download PDF

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Publication number
KR20010081967A
KR20010081967A KR1020000071543A KR20000071543A KR20010081967A KR 20010081967 A KR20010081967 A KR 20010081967A KR 1020000071543 A KR1020000071543 A KR 1020000071543A KR 20000071543 A KR20000071543 A KR 20000071543A KR 20010081967 A KR20010081967 A KR 20010081967A
Authority
KR
South Korea
Prior art keywords
substrate
cassette
centering
center
arm
Prior art date
Application number
KR1020000071543A
Other languages
English (en)
Korean (ko)
Inventor
와키타유지
Original Assignee
후쿠나가 다카시
가부시기가이샤쯔바기모도체인
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후쿠나가 다카시, 가부시기가이샤쯔바기모도체인 filed Critical 후쿠나가 다카시
Publication of KR20010081967A publication Critical patent/KR20010081967A/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020000071543A 2000-02-17 2000-11-29 기판 센터링장치 KR20010081967A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000039652A JP2001230304A (ja) 2000-02-17 2000-02-17 基板センタリング装置
JP39652 2000-02-17

Publications (1)

Publication Number Publication Date
KR20010081967A true KR20010081967A (ko) 2001-08-29

Family

ID=18563183

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000071543A KR20010081967A (ko) 2000-02-17 2000-11-29 기판 센터링장치

Country Status (2)

Country Link
JP (1) JP2001230304A (ja)
KR (1) KR20010081967A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7014415B2 (en) 2002-11-29 2006-03-21 Sharp Kabushiki Kaisha Substrate transfer apparatus, method for removing the substrate, and method for accommodating the substrate
KR20150118301A (ko) * 2014-04-14 2015-10-22 동국제강주식회사 후판의 열간 교정을 위한 고온 항복강도 예측방법

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004097928A1 (en) * 2003-04-30 2004-11-11 Sang-Ki Lee Support holder of the substrate and device for centering or feeding using the same
JP2006001658A (ja) * 2004-06-15 2006-01-05 Ishikawajima Harima Heavy Ind Co Ltd 移載装置
JP2008021954A (ja) * 2006-07-10 2008-01-31 Takatori Corp ウエハカセットからのウエハ取り出し方法及び装置
JP5663260B2 (ja) * 2010-10-13 2015-02-04 ラピスセミコンダクタ株式会社 基板の撓み補正装置および基板の取り出し方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7014415B2 (en) 2002-11-29 2006-03-21 Sharp Kabushiki Kaisha Substrate transfer apparatus, method for removing the substrate, and method for accommodating the substrate
KR20150118301A (ko) * 2014-04-14 2015-10-22 동국제강주식회사 후판의 열간 교정을 위한 고온 항복강도 예측방법

Also Published As

Publication number Publication date
JP2001230304A (ja) 2001-08-24

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