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KR20000049327A - Oxidizing processed substraite having catalytic activity - Google Patents

Oxidizing processed substraite having catalytic activity Download PDF

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Publication number
KR20000049327A
KR20000049327A KR1019990044091A KR19990044091A KR20000049327A KR 20000049327 A KR20000049327 A KR 20000049327A KR 1019990044091 A KR1019990044091 A KR 1019990044091A KR 19990044091 A KR19990044091 A KR 19990044091A KR 20000049327 A KR20000049327 A KR 20000049327A
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Prior art keywords
oxide
substrate
aluminum
titanium oxide
photocatalytic activity
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KR1019990044091A
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Korean (ko)
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고형선
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이용균
정우 테크놀러지 주식회사
고형선
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Priority to KR1019990044091A priority Critical patent/KR20000049327A/en
Publication of KR20000049327A publication Critical patent/KR20000049327A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/12Oxidising
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/063Titanium; Oxides or hydroxides thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00Catalysts, in general, characterised by their form or physical properties
    • B01J35/30Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39Photocatalytic properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02Impregnation, coating or precipitation
    • B01J37/0215Coating
    • B01J37/0221Coating of particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02Impregnation, coating or precipitation
    • B01J37/0215Coating
    • B01J37/0225Coating of metal substrates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Catalysts (AREA)

Abstract

PURPOSE: An oxidization treatment base material is provided which forms oxides with anodize-type titanium oxide on a chemically treated plate by an Al and the surface of alloy base material of Al group so that it shows light catalytic activity, deodorization, shock-resistance and contamination-proof characteristics. CONSTITUTION: An oxidization treatment base material is produced as follows: (1) oxides is formed on the aluminum plate and the surface of aluminum alloy base material which contain 1-10 vol% of anodize-type titanium oxide and is 0.1-0.5 micrometer in thickness; (2) the aluminum with above oxides is chemically treated to produce an oxidization film; and (3) the aluminum material is treated with a titanium oxide on the surface of chemical film treatment by Al with light catalytic activity.

Description

촉매활성을 가진 산화처리기재 및 그 제법{Oxidizing processed substraite having catalytic activity}Oxidizing processed substrate having catalytic activity and its preparation {Oxidizing processed substraite having catalytic activity}

본 발명은 촉매활성을 가진 산화처리기재와 그 제조방법에 관한 것으로서, 특히 알루미늄판위에 산화티탄을 부착하여 촉매활성을 가진 기재와 그 제조방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an oxidation treatment substrate having a catalytic activity and a method for producing the same, and more particularly, to a substrate having catalytic activity by attaching titanium oxide on an aluminum plate and a method of manufacturing the same.

종래부터 반도체적 특성을 가진 금속산화물인 산화티탄, 산화철, 산화텅스텐, 산화아연등은 광촉매활성을 가진 것으로 알고 있었다. 그리고 촉매활성을 높이기 위하여 백금 라듐 등을 담지하는 방법도 검토되었다. 그리고 광촉매활성을 가진 물질은 방취 방미(防黴) 방오염 살균등의 효과를 발휘한다는 것도 보고되어 있다. 특히 산화티탄은 자외선영역이 특정 파장의 광을 조사함으로써 우수한 광촉매활성을 함유하며, 강력한 산화반응에 의하여 방취 방미 살균작용을 발휘함으로써 산화티탄을 담지한 금속과 금속산화물 부재를 폐수의 청정화에 이용된다. 이 모든 광촉매활성을 함유한 산화물은 특별한 부착방법이 없어 도막형성중에 산화티탄 미분말을 함유시켜 기기 대응부위에 스프레이 디포지트 스폿으로 도포하는 방법이 제안되었다.Background Art Conventionally, metal oxides having semiconductor characteristics, such as titanium oxide, iron oxide, tungsten oxide, and zinc oxide, have been known to have photocatalytic activity. In addition, in order to increase the catalytic activity, a method of supporting platinum radium or the like was also examined. It is also reported that a substance having a photocatalytic activity exerts effects such as deodorization and anti-fouling antiseptic sterilization. In particular, titanium oxide contains excellent photocatalytic activity by irradiating light of a specific wavelength in the ultraviolet region, and deodorizing and antiseptic sterilization effect by strong oxidation reaction, thereby utilizing titanium oxide-carrying metal and metal oxide members to clean the wastewater. . Since all oxides containing photocatalytic activity do not have a special deposition method, a method has been proposed in which a fine titanium oxide powder is contained during coating film formation to apply a spray deposit spot to the corresponding device.

이러한 도포방법으로는 (박리)이탈되기 쉽고 청소등의 외력을 받았을 때 피막이 간단히 손상되는 장애가 있어 촉매활성의 발현성과 지속성에 문제가 되어 실용화에 문제가 있다. 더욱이 기재를 티탄재로 사용하면 제작비가 알루미늄에 비하여 고가가 되는 문제점이 있다.This coating method is easy to detach and has a problem that the film is easily damaged when subjected to an external force such as cleaning, thereby causing a problem in the expression and persistence of the catalytic activity and thus causing problems in practical use. Moreover, when the base material is used as a titanium material, there is a problem that the manufacturing cost is higher than that of aluminum.

본 발명은 전술한 문제점을 해결하기 위하여 안출한 것으로서, 기재로서는 순 알루미늄을 사용하고 그 표면에는 애노다이즈형 티탄 함유 산화물편을 형성시켜 기재는 가격이 싼 알루미늄을 사용하고 방미 방취등의 효력을 가지고 있는 고가의 촉매활성 산화물을 그위에 견고하게 부착시키고자 하는 목적을 가지고 있다.The present invention has been made to solve the above-mentioned problems, using pure aluminum as the base material and forming anodized titanium-containing oxide pieces on the surface thereof, the base material is a low-cost aluminum and the effect of deodorization and the like Its purpose is to firmly attach expensive catalytically active oxides thereon.

알루미늄 또는 알루미늄기 합금 기재 표면에 화학적 약재를 가지고 알루미늄판 표면에 화학적 산화피막을 생성시키는 방법으로 내식성이 좋은 산화피막이 된다.It has a chemical agent on the surface of an aluminum or aluminum-based alloy base material and forms a chemical oxide film on the surface of the aluminum plate, thereby providing an oxide film having good corrosion resistance.

본 발명은 전술한 목적을 달성하기 위하여 우수한 광촉매활성을 부여하기 위한촉매활성을 가진 산화처리기재의 제조 방법에 있어서, 알루미늄판 및 알루미늄 합금 기재의 표면에 애노다이즈(anodize)형 산화티탄을 체적 9에서 10배 함유하고, 두께 0.1 내지 0.5 마이크로 미터 이상의 산화물편을 형성한 광촉매활성을 가진 알루미늄을 화학적 처리로 산화피막을 생성시킨 Al재 및 Al기 합금재에 광촉매활성을 가진 Al 양극 피막처리 표면위에 티탄 산화 처리하는 것을 특징으로 하는 촉매활성을 가진 산화처리기의 제조방법을 제공한다.The present invention provides a method for producing an oxidation treatment substrate having a catalytic activity for imparting excellent photocatalytic activity in order to achieve the above object, wherein anodized titanium oxide is deposited on the surface of an aluminum plate and an aluminum alloy substrate. Surface of Al anodized film having photocatalytic activity on Al and Al base alloys containing 9 to 10 times and having an aluminum oxide having a photocatalytic activity formed by chemical treatment of an oxide piece having a thickness of 0.1 to 0.5 micrometers or more. It provides a method for producing an oxidation processor having a catalytic activity, characterized in that the titanium oxide treatment.

이하에서 본 발명의 구성을 상세히 설명하면 다음과 같다.Hereinafter, the configuration of the present invention in detail.

상기의 기재로서는 순 알루미늄을 사용하고 그 표면에는 애노다이즈(anodize)형 산화티탄이 함유된 산화물편을 형성한 것 및 그 기재로서는 알루미늄기 합금을 사용하여 그 표면에 상기와 같은 애노다이즈(anodize)형 산화티탄이 함유된 산화물편을 형성한 것이 함유되어 있다.Pure aluminum is used as the base material, and an oxide piece containing anodized titanium oxide is formed on the surface thereof, and an aluminum base alloy is used as the base material on the surface thereof. anodize) is formed by forming an oxide piece containing titanium oxide.

그리고 후자의 알루미늄기 합금기재로 사용될 수 있는 알루미늄기 합금으로서는 규소와 마그네슘의 혼합조직으로된 알루미늄기 합금판위에, 백금족 원소 Pd,Ru,Pt,Rh,Os,Ir 중 하나의 원소를 함유한 산화물편이 도포된 것이 있다. 그리고 이렇게 산화 처리된 티탄 광촉매활성은 발현성 및 지속성을 우수하게 하는 좋은 점이 있다.An aluminum base alloy that can be used as the latter aluminum base alloy base is an oxide containing one element of the platinum group elements Pd, Ru, Pt, Rh, Os, and Ir on an aluminum base alloy plate made of a mixed structure of silicon and magnesium. There is a piece coated. In addition, the titanium photocatalytic activity thus oxidized has the advantage of excellent expression and persistence.

알루미늄 또는 알루미늄기 합금 기재 표면에 화학적 약재를 가지고 알루미늄판 표면에 화학적 산화피막을 생성시키는 방법을 사용하면 내식성이 좋은 산화피막이 된다. 즉, NaCO346그램 + CrO314그램을 60그램의 약품으로 하여 물 1리터에 혼합하고 알루미늄판 3 내지 3.3 m2를 15분 침적하여 95 내지 100℃로 처리하고 잘 수세하여 50 내지 80℃에서 건조한 후 그 알루미늄판에 이 효과를 확실히 발휘할 수 있다.By using a chemical agent on the surface of an aluminum or aluminum base alloy base material and creating a chemical oxide film on the surface of the aluminum plate, an oxide film having good corrosion resistance is obtained. That is, 46 grams of NaCO 3 + 14 grams of CrO 3 are mixed into 1 liter of water, and the aluminum plate 3 to 3.3 m 2 is deposited for 15 minutes, treated at 95 to 100 ° C., and washed well at 50 to 80 ° C. After drying, the effect can be exerted on the aluminum sheet.

상기와 같이 광촉매 활성을 가진 산화처리 알루미늄 또는 알루미늄기 합금재를 화학 산화한 후, 산화티탄이 함유된 광반응성 반도체 유해물질 제거제를 스프레이법, 디포지트법 등으로 도포하고, 80~100℃에서 10~20분 건조한 후 산화성 분위기 중에서 200~500℃의 온도범위에서 30~60분 이내에 열산화 처리함이 바람직하다.After chemically oxidizing the oxidation-treated aluminum or aluminum-based alloy material having a photocatalytic activity as described above, a photoreactive semiconductor toxic substance remover containing titanium oxide is applied by a spray method, a deposit method, and the like at 10 to 80 ° C. After drying for 20 minutes, it is preferable to thermally oxidize within 30 to 60 minutes in the temperature range of 200 ~ 500 ℃ in an oxidizing atmosphere.

일반적으로 알루미늄 표면에 화학 산화피막을 형성하고 그 표면에 산화물편을 형성하였으므로, 즉 산화성 분위기 하에서 그 표면에 아주 치밀한 화학적으로 안전한 산화티탄이 형성되기 때문에 상기 산화티탄 미분말을 함유한 피막은 광촉매활성을 발휘함이 가능하다. 더욱이 산화피막 기재에 대한 밀착성이 양호하며, 상술한 코팅피막에 박리(이탈)문제가 없어진다.In general, since the chemical oxide film is formed on the aluminum surface and the oxide piece is formed on the surface, that is, a very fine chemically safe titanium oxide is formed on the surface under an oxidizing atmosphere, the film containing the fine titanium oxide powder exhibits photocatalytic activity. It is possible to exercise. Furthermore, the adhesion to the oxide film substrate is good, and the peeling problem is eliminated in the above-described coating film.

산화티탄편은 밀착성이 좋고, 알루미늄 기재 표면에 형성됨을 목적으로 하여 종래부터 채용되어있는 화학 산화법 및 이온 산화법을 채용하여 광촉매활성을 가진 산화물편을 알루미늄 기재 표면에 형성하는 방법을 시도하였으나, 종래의 양극산화법과 이온산화법을 채용하여 산화티탄편을 두껍게 형성하였으나, 광촉매활성도는 우수하게 실현되지 못하였다.Titanium oxide pieces have good adhesion and have been tried to form oxide pieces having photocatalytic activity on the surface of an aluminum substrate by employing conventional chemical oxidation and ion oxidation methods for the purpose of being formed on the surface of an aluminum substrate. Titanium oxide pieces were formed thick by using anodization and ion oxidation, but the photocatalytic activity was not well realized.

그래서 산화티탄의 겔, 졸의 균일성으로부터 그 결정 제조에 이르기까지 광촉매활성능에 부여되는 인자를 포함한 알루미늄재의 표면에 형성된 산화편 중에서 애노다이즈형 산화티탄을 함유할 때 우수한 광촉매활성이 확실히 발휘될 것이 인정되고, 이러한 애노다이즈형 산화티탄은 알루미늄판의 화학산화정도와 Ti의 도체 전도성과 산화분위기에서 가열산화처리를 조합하여 실시함으로서 생성될 것으로 보여졌다.Therefore, excellent photocatalytic activity is reliably exhibited when anodized titanium oxide is contained in the oxide pieces formed on the surface of the aluminum material including the factors imparted to the photocatalytic activity from the uniformity of the gel and the sol of the titanium oxide to the preparation of the crystal. It is recognized that such anodized titanium oxide is produced by combining a chemical oxidation degree of an aluminum plate, a conductor conductivity of Ti, and a heat oxidation treatment in an oxidation atmosphere.

일반적인 화학산화법에 산화물편 형성과 가열산화법을 복합처리하여야 하며, 산화물편은 에탄올 6.2cc~10cc에 산화용으로 0.4cc~1.0cc의 36%의 HCl에, 3cc~10cc TiCl3에 백금족으로 RuCl31g, Pd 1g, S 1g 의 혼합액으로 스프레이 하여 산화물편을 형성시킨다. 산화물편 중에 애노다이즈형 산화티탄이 생성되는 것으로 인하여 광촉매활성이 비약적으로 변화됨을 확인하였다. 우수한 광촉매활성은 상기 복합처리하는 것에 의하여 형성된 산화물편의 두께는 0.1μm 에서 0.5μm범위로 하고 해당 산화물편에 함유된 애노다이즈형 산화티탄 함유량은 1 체적% 이상~10체적%가 되면 우수한 광촉매활성이 확실히 발휘됨을 확인하였다.Oxide fragment formation and heat oxidation method should be combined with general chemical oxidation method. Oxide fragment is 6.2cc ~ 10cc ethanol, 0.4cc ~ 1.0cc 36% HCl for oxidation, 3cc ~ 10cc TiCl 3 and platinum group RuCl 3 Oxide pieces are formed by spraying with a mixed solution of 1 g, Pd 1 g, and S 1 g. It was confirmed that the photocatalytic activity changed drastically due to the generation of anodized titanium oxide in the oxide piece. The excellent photocatalytic activity is that the thickness of the oxide piece formed by the complex treatment is in the range of 0.1 μm to 0.5 μm, and the anodized titanium oxide content contained in the oxide piece is 1 vol% to 10 vol%. It was confirmed that this was manifested.

상기한 원소에 함유된 것에 의하여 애노다이즈형 산화티탄의 생성, 작용을 유효하게 발휘하기 위해서는 적절한 함유량을 가진 원소의 종류에 따라 표준적인 함유량은 0.01~10 중량이며 적절한 것은 0.1~5중량% 범위이다. 산화물편의 두께의 상한은 특히 제한이 없지만, 광촉매활성은 약 10μm 정도가 가장 우수하며, 그 이상의 두께로 해도 그 이상의 성능이 얻어지지는 않는다. 실용성을 고려한다면 일반적으로 10μm 이하가 바람직하다.In order to effectively produce and function anodized titanium oxide by being contained in the above-mentioned elements, the standard content is in the range of 0.01 to 10% by weight, and suitable in the range of 0.1 to 5% by weight, depending on the type of the element having an appropriate content. to be. Although there is no restriction | limiting in particular in the upper limit of the thickness of an oxide piece, Photocatalytic activity is about 10 micrometers most excellent, and even more thickness does not acquire further performance. In consideration of practicality, 10 μm or less is generally preferable.

화학산화피막에 Ti 겔, 졸 RuCl3로된 백금원소 Ru를 포함시켜 코팅한 후 80~100℃에서 건조한 다음, 가열산화처리를 산화성 분위기 200~500℃중에서 실시함이 적당하지만, 유지시간은 30분 정도이다. 또는 산화성 분위기 200 ~500℃ 중에서 충분히 산화되기 위해서는 1시간에서 2시간 산화할 수도 있다.The chemical oxidation film was coated with Ti gel and platinum element Ru made of sol RuCl 3 and dried at 80 ~ 100 ℃, followed by heat oxidation treatment in an oxidizing atmosphere at 200 ~ 500 ℃. Minutes. Or in order to fully oxidize in 200-500 degreeC in oxidizing atmosphere, you may oxidize for 1 hour to 2 hours.

혼합원소(Ti, Ru)의 코팅한 산화편의 두께가 너무 얇으면 가열처리를 해도 산회피막이 성장하지 않으며, 또 가열한 정도가 낮으면 비정질 산화물에서 애노다이즈형 산화물로의 변화가 되지 않으며, 반대로 너무 높으면 결정질 산화물로 생성되는 물건, 루지루형 산화물이 생성되어 어느 쪽이든 본 발명의 의도와 같은 두께의 애노다이즈형 산화티탄 함유량의 산화물량을 얻을 수 없다.If the thickness of the coated oxide (Ti, Ru) coated element is too thin, the acid coating does not grow even if it is heated. If the degree of heating is low, it does not change from amorphous oxide to anodized oxide. If it is too high, the thing produced | generated from a crystalline oxide and a lujiru-type oxide generate | occur | produce, and in either case, the amount of oxides of the anodized titanium oxide content of the thickness as the intention of this invention cannot be obtained.

실시예를 들어서 본 발명의 구성 및 작용효과를 더 구체적으로 설명하자면 다음과 같으나, 본 발명은 본래 아래의 예에 의하여 제한받지 않는다. 전술한 취지에 적합한 정도의 범위 내에서 변경을 가하여 실시 가능하다. 그 모든 것이 본 발명의 기술적 범위에 포함된다.To illustrate the configuration and operation and effect of the present invention in more detail as follows, the present invention is not limited by the following examples. It can implement by making a change within the range of the grade suitable for the above-mentioned effect. All of them are included in the technical scope of the present invention.

실시예 1Example 1

순알루미늄재를 사용하여 해당 순 알루미늄판 합금재를 강알카리액으로 탈지한 후, 잘 세척한 뒤에 중화를 충분히 한 다음, 화학약품 즉 NaCO346그램과 CrO314그램을 물 1리터에 혼합하고 80℃에서 알루미늄판 3 내지 3.3 m2를 15분 침적하여 화학피막을 형성한 후, 80~90℃에서 건조한다.Using the order of an aluminum material and mixing that a pure aluminum plate after degreasing the alloy material with strong alkali solution, a neutralization after washed well enough, and then chemicals i.e. NaCO 3 46 grams and CrO 3 14 grams of 1 liter of water An aluminum plate 3 to 3.3 m 2 is deposited at 80 ° C. for 15 minutes to form a chemical film, and then dried at 80 ° C. to 90 ° C.

티타늄 TiCl3와 RuCl3를 3:1 비로 수성졸로 만들어 1m2에 3~5g이 되도록 4~5회 코팅하여 매회마다 200~500℃로 산화 분위기 중에서 짧게는 30분, 길게는 1시간에서 2시간 산화처리를 가한다. 산화물편 두께 및 애노다이즈형의 산화티탄량은 0.1~5 중량% 범위이며, 두께는 0.1에서 5μm까지로 하고, 상한은 특별히 제한하지 않는다. 순 알루미늄 화학피막에 대해서는 아래의 광촉매활성도, 탈취, 항균활성조와같이 180도 곡절실험에 의하여 산화물의 밀착성을 평가한다.Titanium TiCl 3 and RuCl 3 were made into an aqueous sol in a 3: 1 ratio and coated 4-5 times to 1-5 g in 3 m to 1 g 2 , each time at 200-500 ° C. for 30 minutes in an oxidizing atmosphere for a short time and for 1 hour to 2 hours Oxidation is applied. The thickness of the oxide piece and the amount of titanium oxide of the anodized type are in the range of 0.1 to 5% by weight, the thickness is from 0.1 to 5 m, and the upper limit is not particularly limited. For the pure aluminum chemical film, the adhesion of the oxide was evaluated by 180 degree bending experiments as shown in the following photocatalytic activity, deodorization, and antibacterial activity tank.

광촉매활성도는 Kl(옥도가리)의 수용액에 각 산화처리한 산화편판을 담가서 자외선강도가 높은 Black light를 조사함으로서 생성되는 원소의 생성속도를 상대적으로 평가한다. 그럼으로서 그 수치가 클수록 광촉매활성이 높은 것으로 판단한다.The photocatalytic activity is evaluated by relatively generating the elements produced by immersing the oxidized platelets oxidized in Kl (Okdori-dori) into black light with high UV intensity. As such, the larger the value, the higher the photocatalytic activity.

탈취효과 각 산화처리된 알루미늄판의 외측에서 일정한 정도의 자외선( Black light (3mW/℃m2)을 조사하면서 일정량의 암모니아를 흘려 출구부에서 암모니아의 농도를 측정함으로서 평가한다. 그래서 그 치수가 적을수록 광촉매활성이 높은 것으로 판단한다. 또한 일반적으로 티타늄기재를 사용한 기재가 알루미늄기재에 비하여 20배 정도의 고가이다. 불용해 양극처럼 극산이나 강한 알카리 용액에 사용하는 것은 아니고, 또한 티탄늄기재를 사용하려면 전해용 정류기도 고압의 DC150볼트 이상을 사용하여야 한다. 고가의 설비가 필요하다. 알루미늄기재에는 설비비가 저렴하다. 알루미늄기재를 사용함으로 설비비가 저렴함을 알 수 있다.Deodorizing effect Evaluated by measuring a certain amount of ammonia at the outlet by irradiating a certain amount of ultraviolet light (Black light (3mW / ℃ m 2 ) on the outside of each oxidized aluminum plate to evaluate the concentration of ammonia. The higher the photocatalytic activity, the more generally the titanium substrate is 20 times more expensive than the aluminum substrate, and it is not used in polar acid or strong alkaline solutions like insoluble anodes, but also in titanium. To this end, the electrolytic rectifier must also use a high voltage DC150 volts or more, expensive equipment is needed, and the equipment cost is low for aluminum materials.

실시예2 : 시판되는 알루미늄판 및 라스(Lath) ,10cm x 20cm x 2mm 탈지알카리처리하는 화학액에서 처리한 다음 충분히 세척한 후, 80~100도씨에 건조한다.Example 2: A commercially available aluminum plate and lath (Lath), 10cm x 20cm x 2mm It is treated in a chemical solution to degreasing alkali, and then washed sufficiently, and dried at 80 ~ 100 ° C.

혼합물의 비율은 4.5cc의 이소프로필 알콜, 0.2cc의 (36% 염산), 3g의 삼염화 티타늄, 1g의 RuCl3(염화티타늄)으로 한 이상의 용액으로 알루미늄판 또는 알루미늄 라스에 피막형성한 금속피막을 산화 분위기 중에서 200~500℃로 가열한다. 5회 정도 반복처리하여 희망 두께까지의 산화티탄판이 되게 한다. 30~60분 가열처리한다.The ratio of the mixture was 4.5 cc of isopropyl alcohol, 0.2 cc of (36% hydrochloric acid), 3 g of titanium trichloride, and 1 g of RuCl 3 (titanium chloride) in an aluminum plate or aluminum lath as one or more solutions. It heats at 200-500 degreeC in an oxidizing atmosphere. Repeat this step 5 times to make the titanium oxide plate up to the desired thickness. Heat 30 to 60 minutes.

실시예3 : 시판되는 알루미늄판 및 라스,(metal lath 10cm x 20cm x 2mm) 알카리에 탈지하고 세척한 다음, 화학액에 처리하고 완전히 세척한 후, 80~100도씨에서 건조한다.Example 3: Commercially available aluminum plates and laths (metal lath 10 cm x 20 cm x 2 mm) are degreased and washed with alkali, treated with chemical solution, thoroughly washed and dried at 80 to 100 ° C.

30 중량%의 이소프로필 알콜, 2중량%의 염화파라디움(PdCl 40%), 1중량%의 염화백금(Pt 40%), 5 중량%의 염화티타늄으로 이루어진 혼합액을 스프레이나 디핑으로서 수차례 반복하여 처리한다. 각 처리 때마다 혼합 용액을 칠한 다음 80~100도씨에 건조하고, 다음 산화로에서 200~500℃에서 일시적으로 처리한다. 단 암모니아 또는 휘발성 아밍(Amine)을 혼합하여 환원가스가 된 분위기 중에서 200~500도씨에서 가열하여 소정의 판을 제조한다.A mixture of 30 wt% isopropyl alcohol, 2 wt% palladium chloride (PdCl 40%), 1 wt% platinum chloride (Pt 40%), and 5 wt% titanium chloride is repeatedly sprayed or dipped several times. Process. After each treatment, the mixed solution is painted, dried at 80 to 100 ° C, and then temporarily treated at 200 to 500 ° C. in an oxidation furnace. However, by mixing ammonia or volatile amine (Amine) and heating at 200 ~ 500 ° C in an atmosphere of reducing gas to prepare a predetermined plate.

Al화학처리된 판과 Al기 합금기재의 표면에 anodize형 산화 티탄을 함유한 산화물편을 형성하므로써 싼 비용으로 우수한 광촉매활성을 부여할 수 있고, 탈취, 방충격, 방오염성 살균 작용등을 갖춘 각종용도, 예를 들면 건축자재, 공조기기, 정수설비 등에 사용되는 각종 부자재로서 유효하게 활용할 수 있다.By forming an oxide piece containing anodized titanium oxide on the surface of Al chemically treated plate and Al base alloy base, it is possible to give excellent photocatalytic activity at low cost, and has various deodorization, shockproof, antifouling and sterilizing effect. It can be utilized effectively as various subsidiary materials used for a use, for example, a building material, an air conditioning equipment, a water purification equipment, etc.

Claims (5)

우수한 광촉매활성을 부여하기 위한촉매활성을 가진 산화처리기재의 제조 방법에 있어서, Al 또는 합금재는 양극 피막 처리한 후 산화성 분위기 중에서 가열처리함으로써 상기 기재의 표면에 산화물편을 형성하는 광촉매활성을 가진 피막처리는 황산 12 내지 20에서 전위 12내지 20 볼트로 피막처리하여, 수세를 충분히 한 후, 50 내지 80 도씨에서 건조한후에 상기 알루미늄판 및 알루미늄 합금 기재의 표면에 애노다이즈(anodize)형 산화티탄을 체적 9에서 10배 함유하고, 두께 0.1 내지 0.5 마이크로 미터 이상의 산화물편을 형성한 광촉매활성을 가진 알루미늄을 화학적 처리로 산화피막을 생성시킨 Al재 및 Al기 합금재에 광촉매활성을 가진 Al 양극 피막처리 표면위에 티탄 산화 처리하는 것을 특징으로 하는 촉매활성을 가진 산화처리기의 제조방법.In the method for producing an oxidation treatment base material having a catalyst activity for imparting excellent photocatalytic activity, Al or alloy material is a film having a photocatalytic activity for forming an oxide piece on the surface of the substrate by heat treatment in an oxidizing atmosphere after anodizing. The treatment was coated with a potential of 12 to 20 volts at 12 to 20 volts of sulfuric acid, followed by sufficient washing with water, followed by drying at 50 to 80 degrees Celsius, followed by anodizing titanium oxide on the surface of the aluminum plate and the aluminum alloy substrate. Al anode film treatment having photocatalytic activity on Al and Al base alloys containing 9 to 10 times the volume and having an aluminum oxide having a photocatalytic activity formed by chemical treatment of an oxide piece having a thickness of 0.1 to 0.5 micrometers or more. A method for producing an oxidation processor having catalytic activity, characterized in that titanium oxide is treated on a surface. 제 1 항에 있어서, 순 Al 기재 또는 Si, Mg, Cu의 합금 기재에 청구 1항에 기재된 산화물 처리기의 제조방법.The method for producing an oxide processor according to claim 1, wherein the pure Al substrate or an alloy substrate of Si, Mg, Cu is claimed. 제 1 항에 있어서, Al 및 Al 합금기재의 표면에 형성된 산화물편의 두께가 0.1 내지 0.5 마이크로미터 이상으로 그 산화물편 중에 함유된 anodize형 산화티탄의 함유량이 1 체적 9 이상의 산화처리된 티탄편재를 가지는 제조방법.The oxide piece according to claim 1, wherein the oxide piece formed on the surface of the Al and Al alloy base material has a thickness of 0.1 to 0.5 micrometers or more and the content of the anodize titanium oxide contained in the oxide piece is 1 volume 9 or more. Manufacturing method. 제 1 항에 있어서, Al 및 Al합금재 표면에 도막형성재 중에 산화티탄의 미분말을 함유시켜 이것을 기기, 기재의 대응부위에 스프레이, 디포지트, 스폿 등으로 도포하는 것을 특징으로 하는 촉매활성을 가진 산화처리기재의 제조방법.2. The catalytic activity according to claim 1, wherein fine powders of titanium oxide are contained in the coating film forming material on the surfaces of Al and Al alloys and applied to the corresponding portions of the apparatus and the substrate by spraying, depositing, spots, and the like. Method for producing an oxidation treatment substrate. 제 1 항에 있어서, 상기 산화티탄의 졸을 도막형성재의 대응부위에 스프레이 depisit spot 등으로 도포하여, 1차 50 내지 80도 씨에서 건조한 후 산화분위기 200~500℃에서 가열 산화처리 함으로써 기재의 표면에 산화물편을 형성하고 이에 더해 양호하게 처리하는 것을 특징으로 하는 티탄 광촉매활성을 가진 산화처리 Al판 및 Al기 합금재의 제조방법.The surface of the substrate according to claim 1, wherein the sol of the titanium oxide is applied to a corresponding portion of the coating film-forming material by spray depisit spot or the like, dried at the first 50 to 80 ° C, and heat-oxidized at an oxidation atmosphere of 200 to 500 ° C. A method of producing an oxide-treated Al plate and an Al-based alloy material having a titanium photocatalytic activity, characterized in that an oxide piece is formed on the substrate and treated well.
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