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KR102721696B1 - 광공진기 - Google Patents

광공진기 Download PDF

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Publication number
KR102721696B1
KR102721696B1 KR1020190140178A KR20190140178A KR102721696B1 KR 102721696 B1 KR102721696 B1 KR 102721696B1 KR 1020190140178 A KR1020190140178 A KR 1020190140178A KR 20190140178 A KR20190140178 A KR 20190140178A KR 102721696 B1 KR102721696 B1 KR 102721696B1
Authority
KR
South Korea
Prior art keywords
mirror
optical resonator
optical
front mirror
optical axis
Prior art date
Application number
KR1020190140178A
Other languages
English (en)
Korean (ko)
Other versions
KR20200074852A (ko
Inventor
켄타 타나카
조이치 카와무라
마사후미 요로즈
야스히로 오카다
Original Assignee
스미도모쥬기가이고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스미도모쥬기가이고교 가부시키가이샤 filed Critical 스미도모쥬기가이고교 가부시키가이샤
Publication of KR20200074852A publication Critical patent/KR20200074852A/ko
Application granted granted Critical
Publication of KR102721696B1 publication Critical patent/KR102721696B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08059—Constructional details of the reflector, e.g. shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/086—One or more reflectors having variable properties or positions for initial adjustment of the resonator

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
KR1020190140178A 2018-12-17 2019-11-05 광공진기 KR102721696B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018235278A JP7262217B2 (ja) 2018-12-17 2018-12-17 光共振器
JPJP-P-2018-235278 2018-12-17

Publications (2)

Publication Number Publication Date
KR20200074852A KR20200074852A (ko) 2020-06-25
KR102721696B1 true KR102721696B1 (ko) 2024-10-23

Family

ID=71106184

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020190140178A KR102721696B1 (ko) 2018-12-17 2019-11-05 광공진기

Country Status (4)

Country Link
JP (1) JP7262217B2 (ja)
KR (1) KR102721696B1 (ja)
CN (1) CN111326945B (ja)
TW (1) TWI754854B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7499630B2 (ja) 2020-07-10 2024-06-14 住友重機械工業株式会社 アイリス及びレーザ発振器
JP7535436B2 (ja) 2020-10-23 2024-08-16 住友重機械工業株式会社 レーザ装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2651264B2 (ja) * 1990-06-11 1997-09-10 ファナック株式会社 直線偏光レーザ発振器
JP2009094161A (ja) * 2007-10-04 2009-04-30 Fanuc Ltd アパーチャを備えたレーザ発振器

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JPS4882793A (ja) * 1972-02-04 1973-11-05
JP2662963B2 (ja) * 1987-12-26 1997-10-15 株式会社小松製作所 狭帯域レーザ装置
JPH04307979A (ja) * 1991-04-05 1992-10-30 Mitsubishi Electric Corp レーザ共振器
JPH08191166A (ja) * 1995-01-12 1996-07-23 Toshiba Corp ガスレ−ザ装置
JP3458668B2 (ja) * 1996-08-28 2003-10-20 松下電器産業株式会社 レーザ加工装置
WO1999038234A1 (fr) * 1998-01-22 1999-07-29 Mitsubishi Denki Kabushiki Kaisha Oscillateur a laser a gaz et dispositif de traitement a laser a gaz
AT408163B (de) * 1998-02-25 2001-09-25 Wintner Ernst Dr Lasersystem zur erzeugung ultrakurzer lichtimpulse
DE10063977A1 (de) * 2000-12-14 2002-07-25 Eckhard Zanger Optischer resonanter Frequenzwandler
TWI227582B (en) * 2003-11-28 2005-02-01 Walsin Lihwa Corp External cavity tunable laser system formed from MEMS corner mirror array element
JP5337848B2 (ja) * 2004-07-06 2013-11-06 株式会社小松製作所 高出力ガスレーザ装置
US7387954B2 (en) * 2004-10-04 2008-06-17 Semiconductor Energy Laboratory Co., Ltd. Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device
JP2006156782A (ja) * 2004-11-30 2006-06-15 National Institute Of Information & Communication Technology レーザ発振器
JP2006196827A (ja) * 2005-01-17 2006-07-27 Fanuc Ltd レーザ発振器
JP2007019361A (ja) * 2005-07-11 2007-01-25 Mitsutoyo Corp 周波数安定化レーザ
TWI324423B (en) * 2005-11-01 2010-05-01 Cymer Inc Laser system
WO2008074762A2 (en) * 2006-12-19 2008-06-26 Selex Sensors & Airborne Systems Limited Optical parametric oscillator
JP5147574B2 (ja) * 2008-07-09 2013-02-20 三菱電機株式会社 ガスレーザ発振器
TWI456853B (zh) * 2009-09-30 2014-10-11 Mitsubishi Electric Corp 雷射振盪器及雷射放大器
US8774238B2 (en) * 2011-06-30 2014-07-08 Coherent, Inc. Mode-locked optically pumped semiconductor laser
WO2014046161A1 (ja) 2012-09-21 2014-03-27 国立大学法人 千葉大学 外部共振器レーザ
US9515446B2 (en) * 2013-07-18 2016-12-06 Mitsubishi Electric Corporation Gas laser device
JP6420216B2 (ja) * 2015-07-31 2018-11-07 ファナック株式会社 折返しミラーを備えたレーザ発振器
US9865447B2 (en) * 2016-03-28 2018-01-09 Kla-Tencor Corporation High brightness laser-sustained plasma broadband source
US10177524B2 (en) * 2017-05-23 2019-01-08 Coherent, Inc. Intra-cavity frequency-converted optically-pumped semiconductor laser

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2651264B2 (ja) * 1990-06-11 1997-09-10 ファナック株式会社 直線偏光レーザ発振器
JP2009094161A (ja) * 2007-10-04 2009-04-30 Fanuc Ltd アパーチャを備えたレーザ発振器

Also Published As

Publication number Publication date
TWI754854B (zh) 2022-02-11
JP2020098814A (ja) 2020-06-25
KR20200074852A (ko) 2020-06-25
CN111326945B (zh) 2023-05-05
JP7262217B2 (ja) 2023-04-21
TW202025584A (zh) 2020-07-01
CN111326945A (zh) 2020-06-23

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A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant