KR102693601B1 - 사출 성형가능한 실리콘 조성물 - Google Patents
사출 성형가능한 실리콘 조성물 Download PDFInfo
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- KR102693601B1 KR102693601B1 KR1020207006970A KR20207006970A KR102693601B1 KR 102693601 B1 KR102693601 B1 KR 102693601B1 KR 1020207006970 A KR1020207006970 A KR 1020207006970A KR 20207006970 A KR20207006970 A KR 20207006970A KR 102693601 B1 KR102693601 B1 KR 102693601B1
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- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 84
- 239000000203 mixture Substances 0.000 title claims abstract description 72
- 238000002347 injection Methods 0.000 title claims abstract description 42
- 239000007924 injection Substances 0.000 title claims abstract description 42
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 37
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract description 37
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 31
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 28
- 229910004283 SiO 4 Inorganic materials 0.000 claims abstract description 26
- 229920002050 silicone resin Polymers 0.000 claims abstract description 25
- 239000003054 catalyst Substances 0.000 claims abstract description 22
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 21
- 238000006459 hydrosilylation reaction Methods 0.000 claims abstract description 21
- 229920000642 polymer Polymers 0.000 claims abstract description 14
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims abstract description 9
- 239000003431 cross linking reagent Substances 0.000 claims abstract description 9
- 239000000126 substance Substances 0.000 claims description 51
- 125000004432 carbon atom Chemical group C* 0.000 claims description 47
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 15
- 239000001257 hydrogen Substances 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 229920002554 vinyl polymer Polymers 0.000 claims description 13
- 238000001746 injection moulding Methods 0.000 claims description 10
- 239000004971 Cross linker Substances 0.000 claims description 9
- 239000003112 inhibitor Substances 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 150000003058 platinum compounds Chemical class 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- ACIAHEMYLLBZOI-ZZXKWVIFSA-N Unsaturated alcohol Chemical compound CC\C(CO)=C/C ACIAHEMYLLBZOI-ZZXKWVIFSA-N 0.000 claims 1
- -1 hydrocarbyloxy Chemical group 0.000 abstract description 20
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 16
- 230000003287 optical effect Effects 0.000 description 11
- 230000006698 induction Effects 0.000 description 9
- 239000000047 product Substances 0.000 description 8
- 229910052697 platinum Inorganic materials 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 6
- 239000004205 dimethyl polysiloxane Substances 0.000 description 6
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 6
- 238000000465 moulding Methods 0.000 description 5
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 5
- 239000002683 reaction inhibitor Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 239000004615 ingredient Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000003111 delayed effect Effects 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 125000005375 organosiloxane group Chemical group 0.000 description 3
- 238000007493 shaping process Methods 0.000 description 3
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 3
- 125000005372 silanol group Chemical group 0.000 description 3
- 229910052990 silicon hydride Inorganic materials 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000000748 compression moulding Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- GRGVQLWQXHFRHO-AATRIKPKSA-N (e)-3-methylpent-3-en-1-yne Chemical compound C\C=C(/C)C#C GRGVQLWQXHFRHO-AATRIKPKSA-N 0.000 description 1
- VEJOYRPGKZZTJW-FDGPNNRMSA-N (z)-4-hydroxypent-3-en-2-one;platinum Chemical compound [Pt].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O VEJOYRPGKZZTJW-FDGPNNRMSA-N 0.000 description 1
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- VMAWODUEPLAHOE-UHFFFAOYSA-N 2,4,6,8-tetrakis(ethenyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 VMAWODUEPLAHOE-UHFFFAOYSA-N 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 1
- HMVBQEAJQVQOTI-UHFFFAOYSA-N 3,5-dimethylhex-3-en-1-yne Chemical compound CC(C)C=C(C)C#C HMVBQEAJQVQOTI-UHFFFAOYSA-N 0.000 description 1
- UDWFLRUNFLUOTK-UHFFFAOYSA-N 3,5-dimethyloct-1-yn-3-ol Chemical compound CCCC(C)CC(C)(O)C#C UDWFLRUNFLUOTK-UHFFFAOYSA-N 0.000 description 1
- 125000003542 3-methylbutan-2-yl group Chemical group [H]C([H])([H])C([H])(*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- HTWSCGLHVCBJLZ-UHFFFAOYSA-L 3-oxohexanoate;platinum(2+) Chemical compound [Pt+2].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O HTWSCGLHVCBJLZ-UHFFFAOYSA-L 0.000 description 1
- MQSZOZMNAJHVML-UHFFFAOYSA-N 3-phenylbut-1-yn-1-ol Chemical compound OC#CC(C)C1=CC=CC=C1 MQSZOZMNAJHVML-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 125000002015 acyclic group Chemical group 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 125000005018 aryl alkenyl group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000000490 cinnamyl group Chemical group C(C=CC1=CC=CC=C1)* 0.000 description 1
- 238000013037 co-molding Methods 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 229920005645 diorganopolysiloxane polymer Polymers 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000013020 final formulation Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000004687 hexahydrates Chemical class 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000002174 soft lithography Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/0001—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor characterised by the choice of material
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
- C08G77/08—Preparatory processes characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/05—Alcohols; Metal alcoholates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
- C08L77/12—Polyester-amides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2083/00—Use of polymers having silicon, with or without sulfur, nitrogen, oxygen, or carbon only, in the main chain, as moulding material
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
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Abstract
Description
Claims (10)
- 사출 성형가능한 실리콘 조성물로서,
A) 평균 화학식 I을 갖는 실리콘 수지:
[화학식 I]
[R1 3SiO1/2]a[R2R3SiO2/2]b[SiO4/2]c
(상기 식에서, 각각의 R1, R2, 및 R3은 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌옥시, 또는 하이드록실이고, R2 또는 R3 중 적어도 하나는 알케닐이고, 하첨자 a, b, 및 c는 각각 0보다 크고 a + b + c = 1임),
B) A)와 B)의 중량을 기준으로 0 내지 90% (w/w)의 평균 화학식 II를 갖는 실리콘 수지:
[화학식 II]
[R4 3SiO1/2]d[SiO4/2]e
(상기 식에서, 각각의 R4는 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌옥시, 또는 하이드록실이고, R4 중 적어도 하나는 알케닐이고, 하첨자 d 및 e는 각각 0보다 크고 d + e = 1임),
C) 평균 화학식 III을 갖는 실록산 중합체:
[화학식 III]
[R5 3SiO1/2]f[R6R7SiO2/2]g
(상기 식에서, 각각의 R5 내지 R7은 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 또는 하이드록실이고, R5 내지 R7 중 적어도 하나는 알케닐이고, 하첨자 f 및 g는 각각 0보다 크고 f + g = 1임),
D) 분자당 적어도 2개의 규소-결합된 수소 원자를 갖는 실리콘 가교결합제, 및
E) 하이드로실릴화 촉매를 포함하며,
규소-결합된 수소 원자 대 탄소-탄소 이중 결합의 비가 1.2 내지 2.2이고,
상기 실리콘 가교결합제가 화학식 IV에 따른 것인, 사출 성형가능한 실리콘 조성물:
[화학식 IV]
[HR8 2SiO1/2]h[R9 2SiO2/2]i[R10SiO3/2]j[SiO4/2]k
(상기 식에서, 각각의 R8은 독립적으로 수소이거나, 하이드로카르빌 및 수소이고, 각각의 R9는 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌이고, 각각의 R10은 독립적으로 하이드로카르빌옥시 또는 하이드록실이고, 하첨자 h + i + j + k = 1, h > 0, k > 0, i ≥ 0, j ≥ 0임). - 제1항에 있어서, 억제제를 추가로 포함하는, 조성물.
- 제2항에 있어서, 상기 억제제는 4 내지 10개의 탄소 원자를 갖는 분지형 불포화 알코올인, 조성물.
- 제1항 또는 제2항에 있어서, 각각의 R1은 독립적으로 메틸 또는 하이드록실이고, 각각의 R2는 독립적으로 비닐 또는 메틸이고, 각각의 R3은 메틸이고, 각각의 R4는 독립적으로 비닐 또는 하이드록실이고, 각각의 R5는 독립적으로 비닐, 메틸, 또는 하이드록실이고, 규소-결합된 수소 원자 대 탄소-탄소 이중 결합의 비가 1.5 내지 2.2인, 조성물.
- 삭제
- 제1항에 있어서, 상기 하이드로실릴화 촉매는 백금의 화합물을 포함하는, 조성물.
- 사출 성형가능한 실리콘 조성물의 제조 방법으로서,
A) 평균 화학식 I을 갖는 실리콘 수지:
[화학식 I]
[R1 3SiO1/2]a[R2R3SiO2/2]b[SiO4/2]c
(상기 식에서, 각각의 R1, R2, 및 R3은 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌옥시, 또는 하이드록실이고, R2 또는 R3 중 적어도 하나는 알케닐이고, 하첨자 a, b, 및 c는 각각 0보다 크고 a + b + c = 1임),
B) A)와 B)의 중량을 기준으로 0 내지 90% (w/w)의 평균 화학식 II를 갖는 실리콘 수지:
[화학식 II]
[R4 3SiO1/2]d[SiO4/2]e
(상기 식에서, 각각의 R4는 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌옥시, 또는 하이드록실이고, R4 중 적어도 하나는 알케닐이고, 하첨자 d 및 e는 각각 0보다 크고 d + e = 1임),
C) 평균 화학식 II를 갖는 실록산 중합체:
[화학식 II]
[R5 3SiO1/2]f[R6R7SiO2/2]g
(상기 식에서, 각각의 R5 내지 R7은 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 또는 하이드록실이고, R5 내지 R7 중 적어도 하나는 알케닐이고, 하첨자 f 및 g는 각각 0보다 크고 f + g = 1임),
D) 분자당 적어도 2개의 규소-결합된 수소 원자를 갖는 실리콘 가교결합제, 및
E) 하이드로실릴화 촉매
를 배합하여 상기 사출 성형가능한 조성물을 형성하는 단계를 포함하고,
상기 실리콘 가교결합제가 화학식 IV에 따른 것인, 방법:
[화학식 IV]
[HR8 2SiO1/2]h[R9 2SiO2/2]i[R10SiO3/2]j[SiO4/2]k
(상기 식에서, 각각의 R8은 독립적으로 수소이거나, 하이드로카르빌 및 수소이고, 각각의 R9는 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌이고, 각각의 R10은 독립적으로 하이드로카르빌옥시 또는 하이드록실이고, 하첨자 h + i + j + k = 1, h > 0, k > 0, i ≥ 0, j ≥ 0임). - 조성물을 사출 성형하는 방법으로서,
사출 성형가능한 실리콘 조성물을 금형 내로 사출하는 단계로서, 상기 사출 성형가능한 실리콘 조성물은
A) 평균 화학식 I을 갖는 실리콘 수지:
[화학식 I]
[R1 3SiO1/2]a[R2R3SiO2/2]b[SiO4/2]c
(상기 식에서, 각각의 R1, R2, 및 R3은 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌옥시, 또는 하이드록실이고, R2 또는 R3 중 적어도 하나는 알케닐이고, 하첨자 a, b, 및 c는 각각 0보다 크고 a + b + c = 1임),
B) A)와 B)의 중량을 기준으로 0 내지 90% (w/w)의 평균 화학식 II를 갖는 실리콘 수지:
[화학식 II]
[R4 3SiO1/2]d[SiO4/2]e
(상기 식에서, 각각의 R4는 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌옥시, 또는 하이드록실이고, R4 중 적어도 하나는 알케닐이고, 하첨자 d 및 e는 각각 0보다 크고 d + e = 1임),
C) 평균 화학식 III을 갖는 실록산 중합체:
[화학식 III]
[R5 3SiO1/2]f[R6R7SiO2/2]g
(상기 식에서, 각각의 R5 내지 R7은 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 또는 하이드록실이고, R5 내지 R7 중 적어도 하나는 알케닐이고, 하첨자 f 및 g는 각각 0보다 크고 f + g = 1임),
D) 분자당 적어도 2개의 규소-결합된 수소 원자를 갖는 실리콘 가교결합제, 및
E) 하이드로실릴화 촉매를 포함하는, 단계, 및
상기 사출된 성형가능한 조성물을 상기 사출된 성형가능한 조성물을 경화시키는 조건에 처하게 하는 단계를 포함하고,
상기 실리콘 가교결합제가 화학식 IV에 따른 것인, 방법:
[화학식 IV]
[HR8 2SiO1/2]h[R9 2SiO2/2]i[R10SiO3/2]j[SiO4/2]k
(상기 식에서, 각각의 R8은 독립적으로 수소이거나, 하이드로카르빌 및 수소이고, 각각의 R9는 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌이고, 각각의 R10은 독립적으로 하이드로카르빌옥시 또는 하이드록실이고, 하첨자 h + i + j + k = 1, h > 0, k > 0, i ≥ 0, j ≥ 0임). - 사출 성형된 물품으로서,
사출 성형가능한 실리콘 조성물을 사출 성형함으로써 제조되는 물품을 포함하며, 상기 사출 성형가능한 실리콘 조성물은
A) 평균 화학식 I을 갖는 실리콘 수지:
[화학식 I]
[R1 3SiO1/2]a[R2R3SiO2/2]b[SiO4/2]c
(상기 식에서, 각각의 R1, R2, 및 R3은 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌옥시, 또는 하이드록실이고, R2 또는 R3 중 적어도 하나는 알케닐이고, 하첨자 a, b, 및 c는 각각 0보다 크고 a + b + c = 1임),
B) A)와 B)의 중량을 기준으로 0 내지 90% (w/w)의 평균 화학식 II를 갖는 실리콘 수지:
[화학식 II]
[R4 3SiO1/2]d[SiO4/2]e
(상기 식에서, 각각의 R4는 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌옥시, 또는 하이드록실이고, R4 중 적어도 하나는 알케닐이고, 하첨자 d 및 e는 각각 0보다 크고 d + e = 1임),
C) 평균 화학식 II를 갖는 실록산 중합체:
[화학식 II]
[R5 3SiO1/2]f[R6R7SiO2/2]g
(상기 식에서, 각각의 R5 내지 R7은 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌, 또는 하이드록실이고, R5 내지 R7 중 적어도 하나는 알케닐이고, 하첨자 f 및 g는 각각 0보다 크고 f + g = 1임),
D) 분자당 적어도 2개의 규소-결합된 수소 원자를 갖는 실리콘 가교결합제, 및
E) 하이드로실릴화 촉매를 포함하고,
상기 실리콘 가교결합제가 화학식 IV에 따른 것인, 사출 성형된 물품:
[화학식 IV]
[HR8 2SiO1/2]h[R9 2SiO2/2]i[R10SiO3/2]j[SiO4/2]k
(상기 식에서, 각각의 R8은 독립적으로 수소이거나, 하이드로카르빌 및 수소이고, 각각의 R9는 독립적으로 1 내지 10개의 탄소 원자를 갖는 하이드로카르빌이고, 각각의 R10은 독립적으로 하이드로카르빌옥시 또는 하이드록실이고, 하첨자 h + i + j + k = 1, h > 0, k > 0, i ≥ 0, j ≥ 0임). - 삭제
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JP2020531623A (ja) | 2020-11-05 |
CN110997814B (zh) | 2022-08-23 |
US11453149B2 (en) | 2022-09-27 |
EP3673015B1 (en) | 2024-01-03 |
EP3673015A1 (en) | 2020-07-01 |
CN110997814A (zh) | 2020-04-10 |
KR20200035454A (ko) | 2020-04-03 |
JP7220703B2 (ja) | 2023-02-10 |
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