KR102589684B1 - 반도체 패키지 - Google Patents
반도체 패키지 Download PDFInfo
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- KR102589684B1 KR102589684B1 KR1020180161564A KR20180161564A KR102589684B1 KR 102589684 B1 KR102589684 B1 KR 102589684B1 KR 1020180161564 A KR1020180161564 A KR 1020180161564A KR 20180161564 A KR20180161564 A KR 20180161564A KR 102589684 B1 KR102589684 B1 KR 102589684B1
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- Prior art keywords
- pad
- heat dissipation
- chip
- pattern
- semiconductor package
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- 230000017525 heat dissipation Effects 0.000 claims abstract description 183
- 239000004065 semiconductor Substances 0.000 claims abstract description 107
- 239000000463 material Substances 0.000 claims description 39
- 239000000758 substrate Substances 0.000 claims description 25
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 230000000149 penetrating effect Effects 0.000 claims 2
- 239000010410 layer Substances 0.000 description 89
- 229910000679 solder Inorganic materials 0.000 description 11
- 239000012790 adhesive layer Substances 0.000 description 7
- 239000011810 insulating material Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910007637 SnAg Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920006336 epoxy molding compound Polymers 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
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Abstract
Description
도 2는 본 발명의 일 실시예에 따른 반도체 패키지의 일부 구성요소들의 예시적인 예를 나타내는 평면도이다.
도 3은 도 2의 'A'로 표시된 부분을 확대한 영역에 배치되는 일부 구성요소들의 예시적인 예를 나타낸 부분 확대도이다.
도 4a는 도 3의 I-I'선, II-II'선 및 III-III'선을 따라 취해진 영역을 부분적으로 나타낸 부분 확대 단면도이다.
도 4b는 도 3의 IV-IV'선을 따라 취해진 영역을 부분적으로 나타낸 부분 확대 단면도이다.
도 5는 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 6은 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 7은 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 8은 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 9는 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 설명하기 위하여 도 3의 I-I'선, II-II'선 및 III-III'선을 따라 취해진 영역을 부분적으로 나타낸 부분 확대 단면도이다.
도 10은 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 11은 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 12는 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 13은 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 14는 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 15는 본 발명의 일 실시예에 따른 반도체 패키지의 일부 구성요소들의 변형 예를 나타내는 평면도이다.
도 16은 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 17a는 본 발명의 일 실시예에 따른 반도체 패키지의 일부 구성요소들의 변형 예를 나타내는 평면도이다.
도 17b는 본 발명의 일 실시예에 따른 반도체 패키지의 일부 구성요소들의 변형 예를 나타내는 평면도이다.
도 17c는 본 발명의 일 실시예에 따른 반도체 패키지의 일부 구성요소들의 변형 예를 나타내는 평면도이다.
도 18은 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 19는 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 20은 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 나타내는 단면도이다.
도 21은 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 설명하기 위하여 도 3의 I-I'선, II-II'선 및 III-III'선을 따라 취해진 영역을 부분적으로 나타낸 부분 확대 단면도이다.
도 22는 본 발명의 일 실시예에 따른 반도체 패키지의 변형 예를 설명하기 위하여 도 3의 IV-IV'선을 따라 취해진 영역을 부분적으로 나타낸 부분 확대 단면도이다.
도 23은 본 발명의 일 실시예에 따른 반도체 패키지의 하부 구조물의 변형 예를 나타낸 부분 확대 단면도이다.
도 24는 본 발명의 일 실시예에 따른 반도체 패키지의 상부 구조물의 변형 예를 나타낸 단면도이다.
도 25는 본 발명의 일 실시예에 따른 반도체 패키지의 상부 구조물의 변형 예를 나타낸 단면도이다.
도 26a 내지 도 26c, 도 27a 및 도 27b는 본 발명의 일 실시예에 따른 반도체 패키지 형성 방법의 예시적인 예를 설명하기 위한 단면도들이다.
25 : 제1 하부 칩 28 : 기판 31 : 하부 층
34 : 칩 본딩 패드 37 : 패드 구조물 39 : 제1 패드
41 : 제2 패드 44a~44e : 방열 구조물 46 : 제1 방열 패턴
48 : 제2 방열 패턴 50 : 캐핑 패턴 53 : 재배선
56 : 중간 층 63 : 상부 층 68 : 와이어
71 : 하부 몰딩층 80 : 제2 하부 칩 85 : 범프
88 : 언더 필 물질 91 : 접착 층 110a : 상부 구조물
DR : 더미 영역 115: 상부 베이스 120 : 상부 칩
129 : 상부 와이어 132 : 상부 몰드 층 140 : 연결 패턴
140d : 더미 연결 패턴 143 : 빈 공간
Claims (20)
- 하부 구조물;
상기 하부 구조물 상의 상부 구조물; 및
상기 하부 구조물과 상기 상부 구조물 사이에 배치되어 상기 하부 구조물과 상기 상부 구조물을 연결하는 연결 패턴을 포함하되,
상기 하부 구조물은 하부 베이스 및 상기 하부 베이스 상의 제1 하부 칩을 포함하고,
상기 제1 하부 칩은 칩 본딩 패드, 패드 구조물, 및 방열 구조물을 포함하고,
상기 연결 패턴은 상기 상부 구조물과 연결되며 아래로 연장되어 상기 패드 구조물과 연결되고,
상기 패드 구조물은 상기 칩 본딩 패드의 두께 보다 큰 두께를 갖고,
상기 방열 구조물의 적어도 일부는 상기 패드 구조물의 적어도 일부와 동일한 높이 레벨에 배치되고,
상기 칩 본딩 패드는 상기 패드 구조물 및 상기 연결 패턴과 수직 방향에서 중첩하지 않고,
상기 수직 방향은 상기 하부 베이스의 상부면과 수직한 방향인 반도체 패키지.
- 제 1 항에 있어서,
상기 칩 본딩 패드와 상기 패드 구조물을 전기적으로 연결하는 재배선을 더 포함하고,
상기 패드 구조물은 제1 패드 및 상기 제1 패드 상의 제2 패드를 포함하는 반도체 패키지.
- 제 2 항에 있어서,
상기 방열 구조물은 제1 방열 패턴 및 상기 제1 방열 패턴 상의 제2 방열 패턴을 포함하고,
상기 제1 방열 패턴은 상기 제1 패드와 동일한 레벨에 위치하고,
상기 제1 방열 패턴은 상기 제1 패드의 물질과 동일한 물질을 포함하고,
상기 제2 방열 패턴은 상기 제2 패드와 동일한 레벨에 위치하고,
상기 제2 방열 패턴은 상기 제2 패드의 물질과 동일한 물질을 포함하는 반도체 패키지.
- 하부 반도체 패키지;
상기 하부 반도체 패키지 상에 배치되고, 적어도 하나의 칩을 포함하는 상부 반도체 패키지; 및
상기 하부 반도체 패키지와 상기 상부 반도체 패키지 사이에 배치되어 상기 하부 반도체 패키지와 상기 상부 반도체 패키지를 전기적으로 연결하도록 구성된 연결 패턴을 포함하되,
상기 하부 반도체 패키지는 하부 베이스 및 상기 하부 베이스 상에 배치되는 제1 하부 칩을 포함하고,
상기 제1 하부 칩은 칩 패드, 패드 구조물, 방열 구조물, 및 상기 칩 패드와 상기 패드 구조물을 전기적으로 연결하도록 구성된 재배선을 포함하고,
상기 칩 패드는 상기 패드 구조물 및 상기 연결 패턴과 수직 방향에서 중첩하지 않고,
상기 수직 방향은 상기 하부 베이스의 상부면과 수직한 방향인 반도체 패키지.
- 제 4 항에 있어서,
상기 패드 구조물은 제1 패드 및 상기 제1 패드 상의 제2 패드를 포함하고,
상기 칩 패드, 상기 재배선 및 상기 제1 패드는 일체로 형성되는 반도체 패키지.
- 하부 구조물;
상기 하부 구조물 상의 상부 구조물; 및
상기 하부 구조물과 상기 상부 구조물 사이에 배치되어 상기 하부 구조물과 상기 상부 구조물을 연결하는 연결 패턴을 포함하되,
상기 하부 구조물은 하부 베이스 및 상기 하부 베이스 상의 제1 하부 칩을 포함하고,
상기 제1 하부 칩은 칩 본딩 패드, 패드 구조물, 및 방열 구조물을 포함하고,
상기 연결 패턴은 상기 상부 구조물과 연결되며 아래로 연장되어 상기 패드 구조물과 연결되고,
상기 패드 구조물은 상기 칩 본딩 패드의 두께 보다 큰 두께를 갖고,
상기 방열 구조물의 적어도 일부는 상기 패드 구조물의 적어도 일부와 동일한 높이 레벨에 배치되고,
상기 제1 하부 칩은 상기 칩 본딩 패드와 상기 패드 구조물을 전기적으로 연결되도록 구성된 재배선을 더 포함하고,
상기 패드 구조물은 제1 패드 및 상기 제1 패드 상의 제2 패드를 포함하고,
상기 방열 구조물은 제1 방열 패턴 및 상기 제1 방열 패턴 상의 제2 방열 패턴을 포함하고,
상기 제1 하부 칩은,
실리콘 기판;
상기 실리콘 기판 상의 하부 층;
상기 하부 층 상의 상부 층; 및
상기 하부 층과 상기 상부 층 사이의 중간 층을 더 포함하고,
상기 칩 본딩 패드, 상기 패드 구조물 및 상기 방열 구조물은 상기 하부 층 상에 배치되고,
상기 상부 층 및 상기 중간 층은,
상기 상부 층 및 상기 중간 층을 관통하며 상기 칩 본딩 패드의 적어도 일부를 노출시키는 제1 개구부;
상기 상부 층 및 상기 중간 층을 관통하며 상기 패드 구조물의 적어도 일부를 노출시키는 제2 개구부; 및
상기 상부 층 및 상기 중간 층을 관통하며 상기 방열 구조물의 상기 제1 방열 패턴을 노출시키는 제3 개구부를 포함하고,
상기 제1 방열 패턴은 상기 제1 패드 및 상기 재배선과 동일한 레벨에 배치되고,
상기 제1 방열 패턴은 상기 제1 패드 및 상기 재배선과 동일한 물질을 포함하고,
상기 제2 방열 패턴은 상기 제2 패드와 동일한 물질을 포함하고,
상기 제2 방열 패턴의 물질은 상기 제1 방열 패턴의 물질과 다르고,
상기 제2 방열 패턴 및 상기 제2 패드의 상부면들은 상기 상부 층의 상부면 보다 높은 레벨에 배치되고,
상기 제2 방열 패턴 및 상기 제2 패드 각각의 두께는 상기 제1 방열 패턴, 상기 제1 패드, 상기 칩 본딩 패드 및 상기 재배선 각각의 두께 보다 큰 반도체 패키지.
- 제 1 항에 있어서,
상기 하부 베이스는 제1 베이스 패드를 포함하고,
상기 하부 구조물은 상기 칩 본딩 패드와 상기 제1 베이스 패드를 전기적으로 연결하는 와이어, 및 상기 제1 하부 칩 및 상기 와이어를 덮는 하부 몰드 층을 더 포함하는 반도체 패키지.
- 제 7 항에 있어서,
상기 하부 베이스 상에 실장된 제2 하부 칩을 더 포함하되,
상기 제2 하부 칩은 상기 제1 하부 칩과 상기 하부 베이스 사이에 배치되는 반도체 패키지.
- 제 7 항에 있어서,
상기 하부 몰드 층은 상기 패드 구조물의 적어도 일부를 노출시키는 제1 개구부를 포함하고,
상기 연결 패턴은 상기 상부 구조물과 접촉하며 아래로 연장되어 상기 하부 몰드 층의 상기 제1 개구부에 의해 노출되는 상기 패드 구조물과 접촉하는 반도체 패키지.
- 하부 구조물;
상기 하부 구조물 상의 상부 구조물; 및
상기 하부 구조물과 상기 상부 구조물 사이에 배치되어 상기 하부 구조물과 상기 상부 구조물을 연결하는 연결 패턴을 포함하되,
상기 하부 구조물은 하부 베이스, 상기 하부 베이스 상의 하부 칩, 및 상기 하부 베이스 상에 배치되며 상기 하부 칩을 덮는 하부 몰드 층을 포함하고,
상기 하부 칩은 패드 구조물 및 방열 구조물을 포함하고,
상기 하부 몰드 층의 상부면은 상기 패드 구조물의 상부면 및 상기 방열 구조물의 상부면 보다 높은 높이 레벨에 위치하고,
상기 하부 몰드 층은 상기 패드 구조물의 상부면의 적어도 일부를 노출시키는 제1 개구부를 갖고,
상기 연결 패턴은 상기 상부 구조물과 접촉하며 아래로 연장되어 상기 제1 개구부에 의해 노출되는 상기 패드 구조물과 접촉하고,
상기 방열 구조물의 적어도 일부는 상기 패드 구조물의 적어도 일부와 동일한 높이 레벨에 위치하는 반도체 패키지.
- 제 10 항에 있어서,
상기 패드 구조물은 제1 패드 및 상기 제1 패드 상의 제2 패드를 포함하고,
상기 방열 구조물은 상기 제1 패드 및 상기 제2 패드 중 적어도 하나와 동일한 높이 레벨에 배치되는 방열 패턴을 포함하는 반도체 패키지.
- 제 11 항에 있어서,
상기 방열 구조물은 상기 제2 패드와 동일한 물질로 형성되는 방열 패턴 및 상기 방열 패턴 상의 캐핑 패턴을 포함하고,
상기 방열 패턴의 적어도 일부는 상기 제2 패드의 적어도 일부와 동일한 높이 레벨에 위치하고,
상기 연결 패턴은 상기 캐핑 패턴의 물질과 동일한 물질을 포함하고,
상기 연결 패턴 및 상기 캐핑 패턴은 상기 방열 패턴 및 상기 제2 패드의 물질과 다른 물질을 포함하는 반도체 패키지.
- 제 10 항에 있어서,
상기 제1 개구부 내에 배치되는 상기 연결 패턴은 폭이 넓어지다가 좁아지는 변곡 부를 갖는 반도체 패키지.
- 제 10 항에 있어서,
상기 제1 개구부는 상기 패드 구조물의 상부면 및 상기 패드 구조물의 측면의 적어도 일부를 노출시키는 반도체 패키지.
- 제 10 항에 있어서,
상기 하부 몰드 층은 상기 방열 구조물의 상부면을 덮는 반도체 패키지.
- 제 10 항에 있어서,
상기 하부 몰드 층은 상기 방열 구조물의 적어도 일부를 노출시키는 제2 개구부를 더 포함하는 반도체 패키지.
- 제 16 항에 있어서,
상기 제2 개구부에 의해 노출되는 상기 방열 구조물과 접촉하며 상부로 연장되어 상기 상부 구조물과 접촉하는 더미 패턴을 더 포함하되,
상기 더미 패턴은 상기 연결 패턴의 물질과 동일한 물질을 포함하는 반도체 패키지.
- 하부 구조물;
상기 하부 구조물 상에 배치되며 상기 하부 구조물과 이격되는 상부 구조물; 및
상기 하부 구조물과 상기 상부 구조물 사이에 배치되어 상기 하부 구조물과 상기 상부 구조물을 연결하는 연결 패턴을 포함하되,
상기 하부 구조물은 하부 베이스, 상기 하부 베이스 상의 제1 하부 칩, 상기 제1 하부 칩과 상기 하부 베이스 사이의 제2 하부 칩, 및 상기 제1 하부 칩을 덮는 하부 몰드 층을 포함하고,
상기 제1 하부 칩은 기판 및 상기 기판 상에 배치되는 칩 본딩 패드, 패드 구조물 및 방열 구조물을 포함하고,
상기 하부 몰드 층의 상부면은 상기 패드 구조물의 상부면 및 상기 방열 구조물의 상부면 보다 높은 높이 레벨에 위치하고,
상기 하부 몰드 층은 상기 패드 구조물의 상부면의 적어도 일부를 노출시키는 제1 개구부를 갖고,
상기 연결 패턴은 상기 제1 개구부에 의해 노출되는 상기 패드 구조물과 상기 상부 구조물을 연결하고,
상기 방열 구조물의 적어도 일부는 상기 패드 구조물의 적어도 일부와 동일한 높이 레벨에 위치하는 반도체 패키지.
- 제 18 항에 있어서,
상기 하부 구조물과 상기 상부 구조물 사이의 빈 공간을 더 포함하되,
상기 빈 공간은 상기 연결 패턴의 측면의 적어도 일부를 노출시키는 반도체 패키지.
- 제 18 항에 있어서,
상기 제1 하부 칩은 상기 기판 상에 배치되어 상기 칩 본딩 패드와 상기 패드 구조물을 전기적으로 연결하는 재배선을 더 포함하고,
상기 하부 구조물은 상기 제1 하부 칩의 상기 칩 본딩 패드와 상기 하부 베이스의 베이스 패드를 전기적으로 연결하는 와이어를 더 포함하고,
상기 방열 구조물은 방열 패턴 및 상기 방열 패턴 상의 캐핑 패턴을 포함하고,
상기 패드 구조물은 제1 패드 및 상기 제1 패드 상의 제2 패드를 포함하고,
상기 재배선은 상기 제1 패드와 상기 칩 본딩 패드를 전기적으로 연결하고,
상기 방열 패턴은 상기 제2 패드의 물질과 동일한 물질로 형성되고,
상기 연결 패턴은 상기 캐핑 패턴의 물질과 동일한 물질을 포함하는 반도체 패키지.
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US17/376,570 US11600545B2 (en) | 2018-12-14 | 2021-07-15 | Semiconductor devices including a lower semiconductor package, an upper semiconductor package on the lower semiconductor package, and a connection pattern between the lower semiconductor package and the upper semiconductor package |
US18/178,170 US12057366B2 (en) | 2018-12-14 | 2023-03-03 | Semiconductor devices including a lower semiconductor package, an upper semiconductor package on the lower semiconductor package, and a connection pattern between the lower semiconductor package and the upper semiconductor package |
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