KR102229653B1 - 착색 감광성 조성물 - Google Patents
착색 감광성 조성물 Download PDFInfo
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- KR102229653B1 KR102229653B1 KR1020157002545A KR20157002545A KR102229653B1 KR 102229653 B1 KR102229653 B1 KR 102229653B1 KR 1020157002545 A KR1020157002545 A KR 1020157002545A KR 20157002545 A KR20157002545 A KR 20157002545A KR 102229653 B1 KR102229653 B1 KR 102229653B1
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- KR
- South Korea
- Prior art keywords
- group
- substituted
- halogen atom
- carbon atoms
- unsubstituted
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 104
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- 125000005843 halogen group Chemical group 0.000 claims description 77
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- 125000003118 aryl group Chemical group 0.000 claims description 8
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- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
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- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/06—Hydroxy derivatives of triarylmethanes in which at least one OH group is bound to an aryl nucleus and their ethers or esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
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Abstract
상기 일반식(I)의 구체적인 내용은 본 명세서에 기재한 바와 같다.
Description
Claims (6)
- 하기 일반식(I)로 표시되는 화합물로 이루어지는 염료(A), 에틸렌성 불포화 결합을 가지는 중합성 화합물(B) 및 광중합 개시제(C)를 함유하는 착색 감광성 조성물.
(식 중, R1, R2, R3, R20, R21, R22, R23, R24, R25, R26, R27 및 R28은 각각 독립적으로, 수소원자; 할로겐원자; 시아노기, 니트로기, 수산기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 6~12의 아릴기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 7~20의 아릴알킬기; 또는 -X-Y로 표시되는 치환기를 나타내고, X는 산소원자 또는 황원자를 나타내고, Y는 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기, 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 6~12의 아릴기 또는 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 7~20의 아릴알킬기를 나타내고,
R4, R5, R6, R7, R8 및 R9는 각각 독립적으로, 수산기; 할로겐원자; 시아노기, 니트로기, 수산기 혹은 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기; 탄소원자수 1~4의 알킬기, 할로겐원자, 시아노기 혹은 비닐기로 치환되어 있거나 혹은 무치환의 페닐기; 또는 탄소원자수 1~4의 알킬기, 할로겐원자, 시아노기 혹은 비닐기로 치환되어 있거나 혹은 무치환의 벤질기를 나타내고, R4와 R5, R6과 R7, 및 R8과 R9는 연결하여 3~6원환의 복소환을 형성하고 있어도 되고,
R1, R2 및 R3은 할로겐원자이며,
Anq-는 q가의 음이온을 나타내고, q는 1 또는 2를 나타내고, p는 전하를 중성으로 유지하는 계수를 나타낸다.) - 하기 일반식(I)로 표시되는 화합물로 이루어지는 염료(A), 에틸렌성 불포화 결합을 가지는 중합성 화합물(B) 및 광중합 개시제(C)를 함유하는 착색 감광성 조성물.
(식 중, R1, R2, R3, R20, R21, R22, R23, R24, R25, R26, R27 및 R28은 각각 독립적으로, 수소원자; 할로겐원자; 시아노기, 니트로기, 수산기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 6~12의 아릴기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 7~20의 아릴알킬기; 또는 -X-Y로 표시되는 치환기를 나타내고, X는 산소원자 또는 황원자를 나타내고, Y는 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기, 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 6~12의 아릴기 또는 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 7~20의 아릴알킬기를 나타내고,
R4, R5, R6, R7, R8 및 R9는 각각 독립적으로, 수산기; 할로겐원자; 시아노기, 니트로기, 수산기 혹은 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기; 탄소원자수 1~4의 알킬기, 할로겐원자, 시아노기 혹은 비닐기로 치환되어 있거나 혹은 무치환의 페닐기; 또는 탄소원자수 1~4의 알킬기, 할로겐원자, 시아노기 혹은 비닐기로 치환되어 있거나 혹은 무치환의 벤질기를 나타내고, R4와 R5, R6과 R7, 및 R8과 R9는 연결하여 3~6원환의 복소환을 형성하고 있어도 되고,
단, R4, R5, R6, R7, R8 및 R9 중 하나 이상이 시아노기, 니트로기, 수산기 혹은 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 2~8의 알킬기이며,
R1, R2 및 R3 중 적어도 2개가 할로겐원자이며,
Anq-는 q가의 음이온을 나타내고, q는 1 또는 2를 나타내고, p는 전하를 중성으로 유지하는 계수를 나타낸다.) - 제1항 내지 제3항 중 어느 한 항에 있어서,
또한 1종 이상의 색재(단, 하기 일반식(I)로 표시되는 화합물로 이루어지는 염료를 제외함)(D)를 함유하는 착색 감광성 조성물.
(식 중, R1, R2, R3, R20, R21, R22, R23, R24, R25, R26, R27 및 R28은 각각 독립적으로, 수소원자; 할로겐원자; 시아노기, 니트로기, 수산기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 6~12의 아릴기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 7~20의 아릴알킬기; 또는 -X-Y로 표시되는 치환기를 나타내고, X는 산소원자 또는 황원자를 나타내고, Y는 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기, 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 6~12의 아릴기 또는 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 7~20의 아릴알킬기를 나타내고,
R4, R5, R6, R7, R8 및 R9는 각각 독립적으로, 수산기; 할로겐원자; 시아노기, 니트로기, 수산기 혹은 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기; 탄소원자수 1~4의 알킬기, 할로겐원자, 시아노기 혹은 비닐기로 치환되어 있거나 혹은 무치환의 페닐기; 또는 탄소원자수 1~4의 알킬기, 할로겐원자, 시아노기 혹은 비닐기로 치환되어 있거나 혹은 무치환의 벤질기를 나타내고, R4와 R5, R6과 R7, 및 R8과 R9는 연결하여 3~6원환의 복소환을 형성하고 있어도 되고,
R1, R2 및 R3은 할로겐원자이며,
Anq-는 q가의 음이온을 나타내고, q는 1 또는 2를 나타내고, p는 전하를 중성으로 유지하는 계수를 나타낸다.)
(식 중, R1, R2, R3, R20, R21, R22, R23, R24, R25, R26, R27 및 R28은 각각 독립적으로, 수소원자; 할로겐원자; 시아노기, 니트로기, 수산기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 6~12의 아릴기; 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 7~20의 아릴알킬기; 또는 -X-Y로 표시되는 치환기를 나타내고, X는 산소원자 또는 황원자를 나타내고, Y는 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기, 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 6~12의 아릴기 또는 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 7~20의 아릴알킬기를 나타내고,
R4, R5, R6, R7, R8 및 R9는 각각 독립적으로, 수산기; 할로겐원자; 시아노기, 니트로기, 수산기 혹은 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 1~8의 알킬기; 탄소원자수 1~4의 알킬기, 할로겐원자, 시아노기 혹은 비닐기로 치환되어 있거나 혹은 무치환의 페닐기; 또는 탄소원자수 1~4의 알킬기, 할로겐원자, 시아노기 혹은 비닐기로 치환되어 있거나 혹은 무치환의 벤질기를 나타내고, R4와 R5, R6과 R7, 및 R8과 R9는 연결하여 3~6원환의 복소환을 형성하고 있어도 되고,
단, R4, R5, R6, R7, R8 및 R9 중 하나 이상이 시아노기, 니트로기, 수산기 혹은 할로겐원자로 치환되어 있거나 혹은 무치환의 탄소원자수 2~8의 알킬기이며,
R1, R2 및 R3 중 적어도 2개가 할로겐원자이며,
Anq-는 q가의 음이온을 나타내고, q는 1 또는 2를 나타내고, p는 전하를 중성으로 유지하는 계수를 나타낸다.) - 제1항 내지 제3항 중 어느 한 항에 기재된 착색 감광성 조성물의 경화물.
- 제5항에 기재된 경화물을 적어도 일부에 구비하여 이루어지는 디스플레이 장치용 컬러 필터.
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JP6064598B2 (ja) * | 2012-12-28 | 2017-01-25 | Jsr株式会社 | 着色組成物、カラーフィルタ及び表示素子 |
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