KR101909156B1 - Curable resin composition - Google Patents
Curable resin composition Download PDFInfo
- Publication number
- KR101909156B1 KR101909156B1 KR1020120142783A KR20120142783A KR101909156B1 KR 101909156 B1 KR101909156 B1 KR 101909156B1 KR 1020120142783 A KR1020120142783 A KR 1020120142783A KR 20120142783 A KR20120142783 A KR 20120142783A KR 101909156 B1 KR101909156 B1 KR 101909156B1
- Authority
- KR
- South Korea
- Prior art keywords
- group
- carbon atoms
- unsubstituted
- resin composition
- alkyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 18
- 239000011347 resin Substances 0.000 claims abstract description 26
- 229920005989 resin Polymers 0.000 claims abstract description 26
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 16
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 claims abstract description 11
- 239000000126 substance Substances 0.000 claims abstract description 10
- -1 styreneoxy group Chemical group 0.000 claims abstract description 9
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims description 13
- 238000010526 radical polymerization reaction Methods 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 14
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 125000000524 functional group Chemical group 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 150000003440 styrenes Chemical group 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920000734 polysilsesquioxane polymer Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000000930 thermomechanical effect Effects 0.000 description 2
- PRBBFHSSJFGXJS-UHFFFAOYSA-N (2,2-dimethyl-3-prop-2-enoyloxypropyl) prop-2-enoate;3-hydroxy-2,2-dimethylpropanoic acid Chemical compound OCC(C)(C)C(O)=O.C=CC(=O)OCC(C)(C)COC(=O)C=C PRBBFHSSJFGXJS-UHFFFAOYSA-N 0.000 description 1
- BEQKKZICTDFVMG-UHFFFAOYSA-N 1,2,3,4,6-pentaoxepane-5,7-dione Chemical compound O=C1OOOOC(=O)O1 BEQKKZICTDFVMG-UHFFFAOYSA-N 0.000 description 1
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 1
- QTKPMCIBUROOGY-UHFFFAOYSA-N 2,2,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(F)(F)F QTKPMCIBUROOGY-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 1
- 239000004386 Erythritol Substances 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- KOMDZQSPRDYARS-UHFFFAOYSA-N cyclopenta-1,3-diene titanium Chemical compound [Ti].C1C=CC=C1.C1C=CC=C1 KOMDZQSPRDYARS-UHFFFAOYSA-N 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 239000012933 diacyl peroxide Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- UNXHWFMMPAWVPI-ZXZARUISSA-N erythritol Chemical compound OC[C@H](O)[C@H](O)CO UNXHWFMMPAWVPI-ZXZARUISSA-N 0.000 description 1
- 229940009714 erythritol Drugs 0.000 description 1
- 235000019414 erythritol Nutrition 0.000 description 1
- BLCTWBJQROOONQ-UHFFFAOYSA-N ethenyl prop-2-enoate Chemical compound C=COC(=O)C=C BLCTWBJQROOONQ-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- LUCXVPAZUDVVBT-UHFFFAOYSA-N methyl-[3-(2-methylphenoxy)-3-phenylpropyl]azanium;chloride Chemical compound Cl.C=1C=CC=CC=1C(CCNC)OC1=CC=CC=C1C LUCXVPAZUDVVBT-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 150000004291 polyenes Chemical class 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- RSVDRWTUCMTKBV-UHFFFAOYSA-N sbb057044 Chemical compound C12CC=CC2C2CC(OCCOC(=O)C=C)C1C2 RSVDRWTUCMTKBV-UHFFFAOYSA-N 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/02—Flame or fire retardant/resistant
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/10—Transparent films; Clear coatings; Transparent materials
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Silicon Polymers (AREA)
Abstract
본 발명은 경화형 수지 조성물에 관한 것으로서, 보다 상세하게는 하기 화학식 1의 실세스퀴옥산 수지를 함유함으로써, 이로부터 제조된 성형체는 내열성, 투명성, 내충격성 및 저열팽창성이 높아 유리 대체 재료로 광범위하게 사용할 수 있는 경화형 수지 조성물에 관한 것이다.
[화학식 1]
(식 중, R은 말단에 치환 또는 비치환된 스티렌기를 갖는 탄소수 1 내지4의 알킬기; 말단에 치환 또는 비치환된 스티렌옥시기를 갖는 탄소수 1 내지4의 알킬기; 또는 비닐기로 치환된 벤질옥시기를 말단에 갖는 탄소수 1 내지 4의 알킬기이고, 이때 상기 벤질옥시기는 치환되거나 비치환된 것이며, n은 4 내지 20의 정수임).TECHNICAL FIELD The present invention relates to a curable resin composition, and more particularly, a molded article produced from the silsesquioxane resin of the following formula (1) has a high heat resistance, transparency, impact resistance and low thermal expansion, To a curable resin composition which can be used.
[Chemical Formula 1]
(Wherein R represents an alkyl group having 1 to 4 carbon atoms having a styrene group or a terminally substituted or unsubstituted styrene group, an alkyl group having 1 to 4 carbon atoms having a styreneoxy group and a terminally substituted or unsubstituted benzyloxy group, Wherein the benzyloxy group is substituted or unsubstituted, and n is an integer of 4 to 20).
Description
본 발명은 투명성, 내열성, 저열팽창성이 우수한 경화성 수지 조성물에 관한 것이다.
The present invention relates to a curable resin composition excellent in transparency, heat resistance and low thermal expansion.
유리는 투명성, 내열성, 치수안정성, 저열팽창성, 화학적 안정성 등을 가지며 가시광선을 투과하여 시야를 방해하지 않는 구조체로 넓은 산업분야에 이용되고 있다. 그러나 비중이 2.5이상으로 무겁고 충격에 약한 단점이 있어 최근 경량, 박형화의 다운 라이징 요구에 따라 상기 단점을 개선하려는 검토가 이루어지고 있다.Glass has transparency, heat resistance, dimensional stability, low thermal expansion, chemical stability, and is a structure that does not interfere with the field of vision by transmitting visible light and is used in a wide industrial field. However, since the specific gravity is over 2.5, it has a disadvantage that it is heavy and has a weak impact. Therefore, it has been studied to improve the above disadvantages according to the demand for downsizing of lightweight and thin.
이와 같은 요구를 충족하기 위하여 유리 대체 소재로 투명 플라스틱이 주목되고 있다. 투명 플라스틱은 폴리메틸메타크릴레이트(PMMA), 지환식 폴리올레핀, 에폭시 수지, 실리콘 수지 등이 있으며, 이중 PMMA나 지환식 폴리올레핀은 뛰어난 투명성으로 유기 유리라 불리고 있고 광학 렌즈나 액정 디스플레이의 도광판(導光板), 광디스크 등의 용도로 사용되고 있다.In order to meet such a demand, transparent plastic is attracting attention as a substitute material for glass. PMMA, alicyclic polyolefin, epoxy resin, silicone resin and the like are known as transparent plastic, and PMMA and alicyclic polyolefin are called organic glass because of their excellent transparency and they are used for optical lenses and light guide plates ), Optical discs, and the like.
그러나 이들은 열변형 온도가 낮아 150 내지 200℃이상의 열프로세스를 수반하는 공정에서는 사용이 제한되는 단점이 있다.However, they have a disadvantage in that their use is limited in a process involving a thermal process of 150 to 200 DEG C or more because of a low heat distortion temperature.
이에 투명성, 내열성이 높으면서 치수 안정성이 뛰어난 폴리실세스퀴옥산 수지를 함유한 경화성 수지 조성물이 제안되고 있다[일본특허공개 제2006-89685호, 한국특허공개 제2011-105338호]. 상기 폴리실세스퀴옥산 수지는 비닐기, 알릴기, 아크릴기, 에폭시기 등의 중합성 작용기를 필수적으로 함유한다.A curable resin composition containing a polysilsesquioxane resin having high transparency and heat resistance and excellent dimensional stability has been proposed (Japanese Patent Laid-Open Publication No. 2006-89685, Korean Patent Laid-Open Publication No. 2011-105338). The polysilsesquioxane resin essentially contains a polymerizable functional group such as a vinyl group, an allyl group, an acrylic group or an epoxy group.
상기와 같이 중합성 작용기의 종류가 한정적인 단점이 있어, 제시된 작용기와 동등 이상의 효과를 나타낼 수 있는 다양한 중합성 작용기에 대한 연구가 요구되고 있는 실정이다.
As described above, there are disadvantages in that the kinds of polymerizable functional groups are limited, and studies on various polymerizable functional groups that can exhibit the same or better effects as the proposed functional groups have been desired.
본 발명은 종래와 동등 이상의 내열성, 투명성, 내충격성 및 저열팽창성을 가질 수 있도록, 신규한 중합성 작용기를 갖는 실세스퀴옥산 수지를 함유하는 경화성 수지 조성물을 제공하는 데 그 목적이 있다.
An object of the present invention is to provide a curable resin composition containing a silsesquioxane resin having a novel polymerizable functional group so as to have heat resistance, transparency, impact resistance and low thermal expansion equivalent to those of the conventional art.
상기 목적을 달성하기 위하여, 본 발명은 하기 화학식 1의 실세스퀴옥산 수지를 함유하는 경화성 수지 조성물을 제공한다.In order to achieve the above object, the present invention provides a curable resin composition containing a silsesquioxane resin represented by the following general formula (1).
(식 중, R은 말단에 치환 또는 비치환된 스티렌기를 갖는 탄소수 1 내지4의 알킬기; 말단에 치환 또는 비치환된 스티렌옥시기를 갖는 탄소수 1 내지4의 알킬기; 또는 비닐기로 치환된 벤질옥시기를 말단에 갖는 탄소수 1 내지 4의 알킬기이고, 이때 상기 벤질옥시기는 치환되거나 비치환된 것이며, n은 4 내지 20의 정수임).(Wherein R represents an alkyl group having 1 to 4 carbon atoms having a styrene group or a terminally substituted or unsubstituted styrene group, an alkyl group having 1 to 4 carbon atoms having a styreneoxy group and a terminally substituted or unsubstituted benzyloxy group, Wherein the benzyloxy group is substituted or unsubstituted, and n is an integer of 4 to 20).
바람직하기로, 상기 R은 말단에 비치환된 스티렌기를 갖는 탄소수 1 내지4의 알킬기; 말단에 비치환된 스티렌옥시기를 갖는 탄소수 1 내지4의 알킬기; 또는 비닐기로 치환된 벤질옥시기를 말단에 갖는 탄소수 1 내지 4의 알킬기이며, 이때 상기 벤질옥시기는 비치환된 것이며, n은 4 내지 20의 정수일 수 있다.Preferably, R is an alkyl group having 1 to 4 carbon atoms having an unsubstituted styrene group at the terminal; An alkyl group having 1 to 4 carbon atoms and having an unsubstituted styreneoxy group at the terminal; Or an alkyl group having 1 to 4 carbon atoms having a benzyloxy group substituted with a vinyl group, wherein the benzyloxy group is unsubstituted, and n may be an integer of 4 to 20.
보다 바람직하기로는 상기 화학식 1은 하기 화학식 2 내지 4로 이루어진 군에서 선택된 1종 이상일 수 있다.More preferably, the formula (1) may be at least one selected from the group consisting of the following formulas (2) to (4).
(상기 화학식 2 내지 4에서, n은 4 내지 20의 정수임)(In the above Chemical Formulas 2 to 4, n is an integer of 4 to 20)
상기 경화성 수지 조성물은 화학식 1의 실세스퀴옥산 수지 및 상기 실세스퀴옥산 수지와 라디칼 중합이 가능한 불포화 화합물을 함유할 수 있다.The curable resin composition may contain a silsesquioxane resin of formula (1) and an unsaturated compound capable of radical polymerization with the silsesquioxane resin.
상기 화학식 1의 실세스퀴옥산 수지 및 불포화 화합물은 1:99 내지 99:1 중량비로 함유할 수 있다.
The silsesquioxane resin and the unsaturated compound of Formula 1 may be contained in a weight ratio of 1:99 to 99: 1.
본 발명에 따른 경화성 수지 조성물은 내열성, 투명성, 내충격성 및 저열팽창성이 높은 성형체를 얻을 수 있다. 상기 성형체는 액정표시소자용 기판, 컬러 필터용 기판, 유기 EL 표시 소자용 기판, 전자 페이퍼용 기판, TFT용 기판, 태양전지 기판 등의 투명기판, 터치패널, 투명 전극 부착 필름, 도광판, 보호필름, 편광필름, 위상차 필름, 렌즈시트, 광디스크, 광섬유 등의 광학용 또는 각종 수송기계, 주택의 창재 등의 유리 대체 재료로 광범위하게 사용될 수 있다.
The curable resin composition according to the present invention can obtain a molded article having high heat resistance, transparency, impact resistance and low thermal expansion. The molded article can be used as a substrate for a liquid crystal display element, a substrate for a color filter, a substrate for an organic EL display element, a substrate for an electronic paper, a TFT substrate, a transparent substrate such as a solar cell substrate, a touch panel, , A polarizing film, a phase difference film, a lens sheet, an optical disk, an optical fiber, or various transporting machines, and a window glass for a house.
본 발명은 투명성, 내열성, 저열팽창성이 우수한 경화성 수지 조성물에 관한 것이다.
The present invention relates to a curable resin composition excellent in transparency, heat resistance and low thermal expansion.
이하 본 발명을 상세히 설명하면 다음과 같다.Hereinafter, the present invention will be described in detail.
본 발명의 경화성 수지 조성물은 하기 화학식 1의 실세스퀴옥산 수지를 함유한다. The curable resin composition of the present invention contains a silsesquioxane resin represented by the following formula (1).
[화학식 1] [Chemical Formula 1]
(식 중, R은 말단에 치환 또는 비치환된 스티렌기를 갖는 탄소수 1 내지4의 알킬기; 말단에 치환 또는 비치환된 스티렌옥시기를 갖는 탄소수 1 내지4의 알킬기; 또는 비닐기로 치환된 벤질옥시기를 말단에 갖는 탄소수 1 내지 알킬기이고, 이때 상기 벤질옥시기는 치환되거나 비치환된 것이며, n은 4 내지 20의 정수임).(Wherein R represents an alkyl group having 1 to 4 carbon atoms having a styrene group or a terminally substituted or unsubstituted styrene group, an alkyl group having 1 to 4 carbon atoms having a styreneoxy group and a terminally substituted or unsubstituted benzyloxy group, Wherein the benzyloxy group is substituted or unsubstituted, and n is an integer of 4 to 20).
바람직하기로, 상기 R은 말단에 비치환된 스티렌기를 갖는 탄소수 1 내지4의 알킬기; 말단에 비치환된 스티렌옥시기를 갖는 탄소수 1 내지4의 알킬기 또는 비닐기로 치환된 벤질옥시기를 말단에 갖는 탄소수 1 내지 알킬기이며, n은 4 내지 20의 정수인 것이 좋다.Preferably, R is an alkyl group having 1 to 4 carbon atoms having an unsubstituted styrene group at the terminal; An alkyl group having 1 to 4 carbon atoms having an unsubstituted styreneoxy group at the terminal, or a benzyloxy group substituted with a vinyl group at the terminal thereof, and n is an integer of 4 to 20.
보다 바람직하기로, 상기 화학식 1은 하기 화학식 2 내지 4로 이루어진 군에서 선택된 1종 이상인 것이 좋다.More preferably, the formula (1) is at least one selected from the group consisting of the following formulas (2) to (4).
[화학식 2](2)
[화학식 3](3)
[화학식 4][Chemical Formula 4]
(상기 화학식 2 내지 4에서, n은 4 내지 20의 정수임)(In the above Chemical Formulas 2 to 4, n is an integer of 4 to 20)
상기 화학식 1의 실세스퀴옥산 수지는 합성되거나 시판되는 제품을 사용할 수 있다. 합성 방법으로는 등과 같은 실록산 화합물을 극성 용매 및 알칼리성 촉매 존재하에서 가수분해 반응시키는 동시에 부분 축합시켜 얻어진 가수분해 생성물, 비극성 용매 및 알칼리성 촉매 존재하에서 재축합시켜 얻을 수 있다(일본특허공개 제2004-143449 참조)The silsesquioxane resin of Formula 1 may be synthesized or commercially available. As a synthesis method , Etc., in the presence of a polar solvent and an alkaline catalyst, and at the same time partial condensation, in the presence of a hydrolysis product, a non-polar solvent and an alkaline catalyst (see Japanese Patent Application Laid-Open No. 2004-143449)
본 발명의 경화성 수지 조성물은 상기 화학식 1의 실세스퀴옥산 수지 및 상기 실세스퀴옥산 수지와 라디칼 중합이 가능한 불포화 화합물을 함유하는 것이 바람직하다.The curable resin composition of the present invention preferably contains the silsesquioxane resin of formula (1) and the silsesquioxane resin and an unsaturated compound capable of radical polymerization.
상기 실세스퀴옥산 수지와 라디칼 중합이 가능한 불포화 화합물은 예를 들면 구조 단위의 반복수가 2 내지 20 정도의 중합체인 반응성의 올리고머 또는 저분자량, 저점도의 반응성 모노머를 들 수 있다. Examples of the unsaturated compound capable of radical polymerization with the silsesquioxane resin include a reactive oligomer such as a polymer having a repeating number of the structural unit of 2 to 20 or a reactive monomer having a low molecular weight and a low viscosity.
구체적으로는 반응성의 올리고머로는 에폭시아크릴레이트, 에폭시화아크릴레이트, 우레탄아크릴레이트, 불포화 폴리에스테르, 폴리에스테르아크릴레이트, 폴리에테르아크릴레이트, 비닐아크릴레이트, 폴리엔/티올, 실리콘아크릴레이트, 폴리부타디엔, 폴리스티릴에틸메타크릴레이트 등이 사용될 수 있다. Specific examples of the reactive oligomer include epoxy acrylate, epoxylated acrylate, urethane acrylate, unsaturated polyester, polyester acrylate, polyether acrylate, vinyl acrylate, polyene / thiol, silicone acrylate, polybutadiene , Polystyrylethyl methacrylate, and the like.
또한 반응성 모노머로는 스티렌, 아세트산비닐, 디비닐벤젠, N-비닐피롤리돈, 부틸아크릴레이트, 2-에틸헥실아크릴레이트, n-헥실아크릴레이트, 시클로헥실아크릴레이트, n-데실아크릴레이트, 이소보닐아크릴레이트, 디시클로펜테닐옥시에틸아크릴레이트, 페녹시에틸아크릴레이트, 트리플루오로에틸메타크릴레이트 등의 단관능 모노머 또는 디시클로펜타닐디아크릴레이트, 트리프로필렌글리콜디아크릴레이트, 1,6-헥산디올디아크릴레이트, 비스페놀A디글리시딜에테르디아크릴레이트, 테트라에틸렌글리콜디아크릴레이트, 히드록시피발린산네오펜틸글리콜디아크릴레이트, 트리메틸올프로판트리아크릴레이트, 펜타에리스리톨트리아크릴레이트, 펜타에리스리톨테트라아크릴레이트, 디펜타에리스리톨헥사아크릴레이트 등의 다관능 모노머가 사용될 수 있다.Examples of the reactive monomer include styrene, vinyl acetate, divinylbenzene, N-vinylpyrrolidone, butyl acrylate, 2-ethylhexyl acrylate, n-hexyl acrylate, cyclohexyl acrylate, Monofunctional monomers such as dicyclopentenyl acrylate, dicyclopentenyloxyethyl acrylate, phenoxyethyl acrylate, and trifluoroethyl methacrylate, or dicyclopentanyl diacrylate, tripropylene glycol diacrylate, 1,6- Hexanediol diacrylate, bisphenol A diglycidyl ether diacrylate, tetraethylene glycol diacrylate, hydroxypivalic acid neopentyl glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, penta Polyfunctional monomers such as erythritol tetraacrylate, dipentaerythritol hexaacrylate and the like are used .
이외에도 각종 반응성 올리고머, 모노머를 사용할 수 있고, 이들은 각각 단독 또는 2종 이상 혼합사용 할 수 있다.In addition, various reactive oligomers and monomers may be used, and these may be used alone or in combination of two or more.
상기 화학식 1의 실세스퀴옥산 수지 및 불포화 화합물은 10:90 내지 90:10중량비, 바람직하기로는 20:80 내지 80:20중량비로 함유할 수 있다. 상기 화학식 1의 실세스퀴옥산 수지의 함량이 10중량비 미만이면 내열성 개선력이 부족할 수 있으며, 90중량비를 초과하는 경우에는 점도가 상승하여 공정성이 부족할 수 있다.The silsesquioxane resin of Formula 1 and the unsaturated compound may be contained in a weight ratio of 10:90 to 90:10 by weight, preferably 20:80 to 80:20 by weight. If the content of the silsesquioxane resin of the formula (1) is less than 10 parts by weight, the heat resistance improving ability may be insufficient. When the content exceeds 90 parts by weight, the viscosity may increase and the processability may be insufficient.
상기 경화성 수지 조성물은 중합 개시제를 추가로 사용할 수 있으며, 상기 중합 개시제는 알킨페논계, 아실포스핀옥사이드계, 티타노센계 등의 광중합 개시제; 케톤퍼옥사이드계, 퍼옥시케탈계, 하이드로퍼옥사이드계, 디알킬퍼옥사이드계, 디아실퍼옥사이드계, 퍼옥시디카보네이트계, 퍼옥시에스테르계 등의 열중합 개시제가 사용될 수 있다.The curable resin composition may further contain a polymerization initiator. The polymerization initiator may be a photopolymerization initiator such as an alkyne phonon-based, acylphosphine oxide-based or titanocene-based initiator; Ketone peroxide type, peroxyketal type, hydroperoxide type, dialkyl peroxide type, diacyl peroxide type, peroxydicarbonate type, peroxy ester type and the like can be used.
상기 경화성 수지 조성물은 본 발명의 목적을 벗어나지 않는 범위내에서 유기/무기 필러, 가소제, 난연제, 열안정제, 산화방지제, 광안정제, 자외선 흡수제, 활제(滑劑), 대전방지제, 이형제, 발포제, 핵제(核劑), 착색제, 가교제 및 분산 조제 등의 첨가제를 추가로 함유할 수 있다.
The curable resin composition may contain an organic or inorganic filler, a plasticizer, a flame retardant, a heat stabilizer, an antioxidant, a light stabilizer, an ultraviolet absorber, a lubricant, an antistatic agent, a releasing agent, A nucleating agent, a coloring agent, a cross-linking agent, and a dispersing assistant.
이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시하나, 하기 실시예는 본 발명을 예시하는 것일 뿐 본 발명의 범주 및 기술사상 범위 내에서 다양한 변경 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 특허청구범위에 속하는 것도 당연한 것이다.
It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the present invention. Such variations and modifications are intended to be within the scope of the appended claims.
합성예Synthetic example 1: 화학식 2 합성(일본특허공개 제2004-143449 참조) 1: Synthesis of Formula 2 (see Japanese Patent Application Laid-Open No. 2004-143449)
교반기, 적하 깔때기 및 온도계를 구비한 반응 용기에, 2-프로판올 100ml와 염기성 촉매로 10중량% 테트라메틸암모늄하이드록시드 수용액 4g을 투입하였다. 적하 깔때기에 이소프로필알콜(IPA) 30ml와 30g을 넣고 반응 용기를 교반하면서, 실온에서 1시간에 걸쳐 적하하였다. 상기 적하가 완료되면 실온에서 24시간 추가 교반하고, 감압하에서 IPA를 제거한 후, 톨루엔 150ml로 용해하고 무수 황산마그네슘이 패킹된 관을 통과시켜서 탈수하였다. In a reaction vessel equipped with a stirrer, a dropping funnel and a thermometer, 100 ml of 2-propanol and 4 g of a 10 wt% tetramethylammonium hydroxide aqueous solution were added with a basic catalyst. 30 ml of isopropyl alcohol (IPA) was added to the dropping funnel , And the reaction vessel was added dropwise with stirring at room temperature over 1 hour. When the dropwise addition was completed, the solution was further stirred at room temperature for 24 hours. After removal of IPA under reduced pressure, 150 ml of toluene was dissolved and dehydrated by passing anhydrous magnesium sulfate through a packed tube.
상기에서 의 가수분해 산물 10g이 얻어지며, 이를 딘스탁(Dean-Stark)장치에 넣고, 톨루엔 50ml와 10중량%의 테트라메틸암모늄하이드록시드 수용액 2g을 추가한 후 130℃에서 물을 증류 제거하면서 5시간 동안 톨루엔을 환류 가열하여 재축합 반응을 수행하였다.In the above, 10 g of the hydrolyzate of hydrolyzed product was obtained. This was put into a Dean-Stark apparatus, and 50 ml of toluene and 2 g of a 10% by weight aqueous solution of tetramethylammonium hydroxide were added, and water was distilled off at 130 ° C for 5 hours Toluene was refluxed for reflux condensation.
이후에 상기 반응용액을 10중량% 구연산으로 중화시킨 후, 포화 식염수로 세정하여 무수 황산마그네슘이 패킹된 관을 통과시켜 탈수하고, 농축하여 재축합화합물인 의 실세스퀴옥산 수지를 8.2g 얻었다. 이때, 상기 n은 4 내지 20의 정수이며 이중 8 내지 12의 정수가 90중량% 이상인 혼합물 형태이다(LC/MS로 분석)
Thereafter, the reaction solution was neutralized with 10 wt% citric acid, washed with saturated saline, dehydrated by passing anhydrous magnesium sulfate through a packed tube, and concentrated to obtain a recondensed compound Of silsesquioxane resin was obtained. Herein, n is an integer of 4 to 20, and is in the form of a mixture having an integer of 8 to 12 in an amount of 90 wt% or more (analyzed by LC / MS)
합성예Synthetic example 2: 화학식 3 합성 2: Synthesis of Formula 3
상기 합성예 1과 동일하게 실시하되, 대신에 을 이용하여 의 실세스퀴옥산 수지를 8.3g 얻었다. 이때, 상기 n은 4 내지 20의 정수이며 이중 8 내지 12의 정수가 90중량% 이상인 혼합물 형태이다(LC/MS로 분석)
The reaction was carried out in the same manner as in Synthesis Example 1, Instead of Using Of silsesquioxane resin was obtained. Herein, n is an integer of 4 to 20, and is in the form of a mixture having an integer of 8 to 12 in an amount of 90 wt% or more (analyzed by LC / MS)
합성예Synthetic example 3: 화학식 4 합성 3: Synthesis of formula 4
상기 합성예 1과 동일하게 실시하되, 대신에 을 이용하여 의 실세스퀴옥산 수지를 8.1g 얻었다. 이때, 상기 n은 4 내지 20의 정수이며 이중 8 내지 12의 정수가 90중량% 이상인 혼합물 형태이다(LC/MS로 분석)
The reaction was carried out in the same manner as in Synthesis Example 1, Instead of Using Of silsesquioxane resin was obtained. Herein, n is an integer of 4 to 20, and is in the form of a mixture having an integer of 8 to 12 in an amount of 90 wt% or more (analyzed by LC / MS)
비교 compare 합성예Synthetic example 1 One
상기 합성예 1과 동일하게 실시하되, 대신에 메타크릴옥시프로필트리메톡시실란을 사용하여 의 실세스퀴옥산 수지를 8.2g 얻었다. 이때, 상기 n은 4 내지 20의 정수이며 이중 8 내지 12의 정수가 90중량% 이상인 혼합물 형태이다(LC/MS로 분석)
The reaction was carried out in the same manner as in Synthesis Example 1, Instead of using methacryloxypropyltrimethoxysilane Of silsesquioxane resin was obtained. Herein, n is an integer of 4 to 20, and is in the form of a mixture having an integer of 8 to 12 in an amount of 90 wt% or more (analyzed by LC / MS)
실시예Example 1 One
합성예 1의 실세스퀴옥산 수지 20중량부, 트리메틸올프로판트리아크릴레이트 30중량부, 디비닐벤젠 50중량부, 광중합 개시제로 1-하이드록시시클로헥실페닐케톤 3중량부를 혼합하고 탈포하여 액상의 경화성 수지 조성물을 얻었다. The silsesquioxane resin of Synthesis Example 1 20 parts by weight of trimethylolpropane triacrylate, 50 parts by weight of divinylbenzene and 3 parts by weight of 1-hydroxycyclohexyl phenyl ketone as a photopolymerization initiator were mixed and defoamed to obtain a liquid curable resin composition.
상기 얻어진 수지 조성물을 자동도공기로 두께 100㎛가 되도록 실리콘 처리된 이형필름이 형성된 PET에 도공하고, 40W/cm의 고압 수은 램프를 이용해서 4000mJ/㎠의 적산 노광량으로 경화시킨 후, 이형필름을 박리하여 성형체를 분리하여 얻었다.
The obtained resin composition was applied to a PET film having a silicone-treated release film formed thereon so as to have a thickness of 100 占 퐉 with air and then cured at a total exposure dose of 4000 mJ / cm2 using a 40 W / cm high pressure mercury lamp, And peeled off to obtain a molded article.
실시예Example 2 2
상기 실시예 1과 동일하게 실시하되, 합성예 1의 30중량부, 트리메틸올프로판트리아크릴레이트 70중량부, 광중합 개시제로 1-하이드록시시클로헥실페닐케톤 3중량부를 사용하여 성형체를 얻었다.
The procedure of Example 1 was repeated except that the compound of Synthesis Example 1 , 70 parts by weight of trimethylolpropane triacrylate, and 3 parts by weight of 1-hydroxycyclohexyl phenyl ketone as a photopolymerization initiator.
실시예Example 3 3
상기 실시예 2과 동일하게 실시하되, 합성예 1의 대신에 합성예 2의 를 사용하여 성형체를 얻었다.
The procedure of Example 2 was repeated except that the compound of Synthesis Example 1 Instead of Synthesis Example 2 To obtain a molded article.
실시예Example 4 4
상기 실시예 2과 동일하게 실시하되, 합성예 1의 대신에 합성예 3 의 를 사용하여 성형체를 얻었다.
The procedure of Example 2 was repeated except that the compound of Synthesis Example 1 Instead of Synthesis Example 3 To obtain a molded article.
비교예Comparative Example 1 One
상기 실시예 1과 동일하게 실시하되, 합성예 1의 실세스퀴옥산 수지 대신에 비교 합성예 1의 실세스퀴옥산 수지를 사용하여 성형체를 얻었다.
A molded product was obtained in the same manner as in Example 1 except that the silsesquioxane resin of Comparative Synthesis Example 1 was used instead of the silsesquioxane resin of Synthesis Example 1.
실험예Experimental Example
상기 실시예 및 비교예에서 얻어진 성형체의 물성을 하기와 같은 방법으로 측정하고 그 결과를 하기 표 1에 나타내었다.
The physical properties of the molded articles obtained in the above Examples and Comparative Examples were measured by the following methods, and the results are shown in Table 1 below.
1.유리전이온도1. Glass transition temperature
DSC측정장비 (TA사 Q1000)를 이용하여 성형제 3mg을 N2분위기에서 승온속도 10℃/min의 조건하에서 측정하였다.Using a DSC measuring instrument (TA company Q1000), the molding compound (3 mg) was measured under an N 2 atmosphere at a heating rate of 10 ° C / min.
2. 열팽창 계수2. Thermal expansion coefficient
열기계 분석장치(Bruker AXS 제품 TMA4030SA)를 이용하고 열기계 분석(TMA)법에 기초하여, 승온속도 5℃/min의 조건에서 50℃에서 150℃에 서의 열팽창량의 변화를 측정하였다.
Based on the thermomechanical analysis (TMA) method using a thermomechanical analyzer (Bruker AXS product TMA4030SA), the change in the thermal expansion at 150 占 폚 at 50 占 폚 was measured at a rate of 5 占 폚 / min.
3. 광선 투과율3. Light Transmittance
자외가시 분광 광도계(히타치세이사쿠쇼사 제품 U4000)를 이용하여 성형체의 400 내지 800nm의 광에서의 광투과율 스펙트럼을 측정하고 대표값으로 파장 550nm의 광의 투과율을 나타냈다.
The light transmittance spectrum of light of 400 to 800 nm of the molded article was measured using a spectrophotometer (U4000 manufactured by Hitachi Seisakusho Co., Ltd.) at an extracellular time, and the transmittance of light with a wavelength of 550 nm was represented as a typical value.
상기 표 2와 같이, 본 발명에 따라 화학식 1의 실세스퀴옥산 수지를 함유한 실시예 1 내지 4의 경화성 수지 조성물은 비교예 1과 동등 이상의 유리전이온도, 광선투과율을 유지하면서 열팽창계수가 낮다는 것을 확인할 수 있었다.As shown in Table 2, the curable resin compositions of Examples 1 to 4 containing the silsesquioxane resin of Chemical Formula 1 according to the present invention had a low coefficient of thermal expansion while maintaining a glass transition temperature and a light transmittance equal to or higher than those of Comparative Example 1 .
Claims (5)
상기 화학식 1의 실세스퀴옥산 수지 및 불포화 화합물은 10:90 내지 90:10 중량비로 함유하는 것인 경화성 수지 조성물:
[화학식 1]
(식 중, R은 말단에 치환 또는 비치환된 스티렌기를 갖는 탄소수 1 내지 4의 알킬기; 말단에 치환 또는 비치환된 스티렌옥시기를 갖는 탄소수 1 내지 4의 알킬기; 또는 비닐기로 치환된 벤질옥시기를 말단에 갖는 탄소수 1 내지 4의 알킬기이고, n은 4 내지 20의 정수임).
A silsesquioxane resin represented by the following formula (1); And an unsaturated compound capable of radical polymerization with the silsesquioxane resin,
Wherein the silsesquioxane resin and the unsaturated compound of Formula 1 are contained in a weight ratio of 10:90 to 90:10.
[Chemical Formula 1]
(Wherein R represents an alkyl group having 1 to 4 carbon atoms having a styrene group or a terminally substituted or unsubstituted styrene group, an alkyl group having 1 to 4 carbon atoms having a styreneoxy group and a terminally substituted or unsubstituted benzyloxy group, And n is an integer of 4 to 20).
[2] The compound according to claim 1, wherein R is an alkyl group having 1 to 4 carbon atoms and having a styrene group at the terminal thereof; An alkyl group having 1 to 4 carbon atoms and having an unsubstituted styreneoxy group at the terminal; Or an alkyl group having 1 to 4 carbon atoms having a benzyloxy group substituted with a vinyl group at the terminal thereof, and n is an integer of 4 to 20;
[화학식 2]
[화학식 3]
[화학식 4]
(상기 화학식 2 내지 4에서, n은 4 내지 20의 정수임)
The curable resin composition according to claim 2, wherein the formula (1) is at least one selected from the group consisting of the following formulas (2) to (4)
(2)
(3)
[Chemical Formula 4]
(In the above Chemical Formulas 2 to 4, n is an integer of 4 to 20)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120142783A KR101909156B1 (en) | 2012-12-10 | 2012-12-10 | Curable resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120142783A KR101909156B1 (en) | 2012-12-10 | 2012-12-10 | Curable resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20140074619A KR20140074619A (en) | 2014-06-18 |
KR101909156B1 true KR101909156B1 (en) | 2018-10-17 |
Family
ID=51127671
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020120142783A Active KR101909156B1 (en) | 2012-12-10 | 2012-12-10 | Curable resin composition |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR101909156B1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115746305B (en) * | 2022-11-17 | 2023-09-19 | 万华化学集团股份有限公司 | Phenyl polysiloxane and preparation method and application thereof |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2939016B2 (en) * | 1991-08-26 | 1999-08-25 | 信越化学工業株式会社 | Method for producing 3- (vinylphenyloxy) propylsilane compound |
JP2501064B2 (en) * | 1992-03-05 | 1996-05-29 | 信越化学工業株式会社 | Organic silicon compounds |
TWI338701B (en) * | 2002-09-30 | 2011-03-11 | Nippon Steel Chemical Co | Cage-type silsesquioxanes resin cotaining functional group and manufacture method thereof |
JP4409397B2 (en) * | 2004-09-27 | 2010-02-03 | 新日鐵化学株式会社 | Silicone resin composition and molded body |
-
2012
- 2012-12-10 KR KR1020120142783A patent/KR101909156B1/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR20140074619A (en) | 2014-06-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101216817B1 (en) | Curable composition and cured product thereof | |
TWI465466B (en) | Hardened composition and hardened product thereof | |
KR100991928B1 (en) | Silicone resin composition and molded body | |
KR101715672B1 (en) | Curable composition, transparent heat-resistant material, and use thereof | |
US8530546B2 (en) | Curable composition comprising inorganic oxide microparticles that are surface-modified with maleimide groups | |
JP7390890B2 (en) | Benzotriazole compounds | |
KR102095315B1 (en) | Cage silsesquioxane compound, curable resin composition using the same and its cured resin | |
KR102004493B1 (en) | Ladder-like silsesquioxane polymer and resin composition for optical film comprising the same | |
CN104321376A (en) | Curable composition and cured material of the same | |
WO2013094585A1 (en) | Glass fiber composite resin substrate | |
JP5315829B2 (en) | Curable hard coat agent composition | |
KR101532334B1 (en) | Photocurable Resin Compositions Having High Refractive Index | |
WO2015022965A1 (en) | Polymerizable composition containing reactive silicone compound | |
KR101532341B1 (en) | Photocurable Resin Compositions Having High Refractive Index | |
CN102205679A (en) | Gas obstruction laminate film | |
WO2010095475A1 (en) | (meth)acrylate resin and process for producing same, and curable resin composition, cured object obtained therefrom, and plastic lens | |
KR101909156B1 (en) | Curable resin composition | |
KR20140021634A (en) | Curable silicone resin composition and cured silicone resin | |
KR101403067B1 (en) | Ultraviolet-curable coating material composition and hard coating film by employing the same | |
CN105392827A (en) | Resin sheet and use thereof | |
KR20130042393A (en) | Uv curable resin composition and prism sheet using the same | |
WO2013146651A1 (en) | (meth)acrylate containing cyclic ether group | |
JP6894835B2 (en) | Active energy ray-curable composition and cured product | |
CN113396169A (en) | Photocurable silicone resin composition, silicone resin molded article obtained by curing the same, and method for producing the molded article | |
JP2008291198A (en) | Acrylic resin composition and molded article from the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20121210 |
|
PG1501 | Laying open of application | ||
A201 | Request for examination | ||
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20170725 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20121210 Comment text: Patent Application |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20180202 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20180726 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20181011 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20181012 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
PR1001 | Payment of annual fee |
Payment date: 20210908 Start annual number: 4 End annual number: 4 |
|
PR1001 | Payment of annual fee |
Payment date: 20230904 Start annual number: 6 End annual number: 6 |
|
PR1001 | Payment of annual fee |
Payment date: 20240911 Start annual number: 7 End annual number: 7 |