KR101241070B1 - 연성인쇄회로기판 제조방법 - Google Patents
연성인쇄회로기판 제조방법 Download PDFInfo
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- KR101241070B1 KR101241070B1 KR1020120110476A KR20120110476A KR101241070B1 KR 101241070 B1 KR101241070 B1 KR 101241070B1 KR 1020120110476 A KR1020120110476 A KR 1020120110476A KR 20120110476 A KR20120110476 A KR 20120110476A KR 101241070 B1 KR101241070 B1 KR 101241070B1
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- dry film
- release paper
- film
- clad laminate
- printed circuit
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 37
- 239000000463 material Substances 0.000 claims abstract description 35
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910052802 copper Inorganic materials 0.000 claims abstract description 18
- 239000010949 copper Substances 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 238000004080 punching Methods 0.000 claims abstract description 15
- 238000007747 plating Methods 0.000 claims abstract description 11
- 239000000126 substance Substances 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 7
- 238000000576 coating method Methods 0.000 claims abstract description 7
- 238000012545 processing Methods 0.000 claims abstract description 6
- 230000001678 irradiating effect Effects 0.000 claims abstract description 4
- 238000010791 quenching Methods 0.000 claims abstract 2
- 230000000171 quenching effect Effects 0.000 claims abstract 2
- 238000005452 bending Methods 0.000 abstract description 5
- 238000007796 conventional method Methods 0.000 description 4
- 239000010410 layer Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000012958 reprocessing Methods 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
- H05K3/427—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0044—Mechanical working of the substrate, e.g. drilling or punching
- H05K3/0047—Drilling of holes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
부자재를 굴곡이 요하는 부분에 맞게 타발한 뒤 취부함으로서 노광 작업시에도 단차가 발생되는 것을 방지하는 연성인쇄회로기판 제조방법에 관한 것이다.
Description
도 2는 종래의 연성인쇄회로기판의 제조방법으로 인해 발생된 현상을 나타내는 도면
도 3은 본 발명의 일 실시예에 따른 연성인쇄회로기판의 제조방법에 대한 순서도
도 4는 본 발명의 일 실시예에 따른 연성인쇄회로기판의 제조방법에 의해 단차부에 부자재를 부착된 상태를 나타내는 도면
S20 : 무전해 화학동을 하는 제2 공정
S30 : 드라이필름 및 이형지를 코팅하는 제3공정
S40 : 부자재를 타발하는 제4공정
S50 : 타발된 부자재를 노광필름에 취부하는 제5공정
S60 : 노광하는 제6공정
S70 : 드라이필름 및 이형지를 현상하는 제7공정
S80 : 도금을 하는 제8공정
S90 : 드라이필름 및 이형지를 박리하는 제9공정
Claims (2)
- 한장의 양면 플렉시블 동박적층판에 PTH를 형성하기 위하여 자외선 레이저 드릴 또는 CNC 드릴로 홀(hole)을 가공하는 제1 공정(S10), 상기 한장의 양면 플렉시블 동박적층판에 형성된 홀(hole)에 도전성을 부여하기 위해 무전해 화학동을 하는 제2 공정(S20), 상기 한장의 양면 플렉시블 동박적층판의 양면에 드라이필름 및 이형지를 코팅하는 제3공정(S30), 상기 제3공정(S30)까지 마친 기판에 노광 작업을 하기 전에 굴곡성이 요하는 부분에 취부될 부자재를 타발하는 제4공정(S40), 상기 제4공정(S40)에서 타발된 부자재를 노광필름에 취부하는 제5공정(S50), 상기 제3공정(S30)에서 코팅된 드라이필름 및 이형지의 일면에 부자재가 취부된 노광필름을 올려놓고 UV를 조사하여 회로를 형성하는 제6공정(S60)과, 상기 제6공정(S60)에서 경화되지 않은 드라이필름 및 이형지에 에칭액을 투입하여 PTH의 주변에 위치한 드라이필름 및 이형지를 현상하는 제7공정(S70)과, 상기 제7공정(S70)에서 드라이필름이 제거된 기판의 상부에 도금을 하는 제8공정(S80)과, 상기 제8공정(S80)을 거친 기판의 양면에 위치한 드라이필름 및 이형지를 박리하는 제9공정(S90)을 포함하는 것을 특징으로 하는 연성인쇄회로기판 제조방법
- 제1항에 있어서,
상기 부자재를 타발하는 제4공정(S40)에서 타발되는 부자재는 PI계열 또는 PET계열을 사용하는 것을 특징으로 하는 연성인쇄회로기판 제조방법
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120110476A KR101241070B1 (ko) | 2012-10-05 | 2012-10-05 | 연성인쇄회로기판 제조방법 |
CN201310163009.XA CN103717015B (zh) | 2012-10-05 | 2013-05-06 | 柔性印刷电路板制造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120110476A KR101241070B1 (ko) | 2012-10-05 | 2012-10-05 | 연성인쇄회로기판 제조방법 |
Publications (1)
Publication Number | Publication Date |
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KR101241070B1 true KR101241070B1 (ko) | 2013-03-11 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020120110476A Active KR101241070B1 (ko) | 2012-10-05 | 2012-10-05 | 연성인쇄회로기판 제조방법 |
Country Status (2)
Country | Link |
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KR (1) | KR101241070B1 (ko) |
CN (1) | CN103717015B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101369150B1 (ko) * | 2013-10-15 | 2014-03-04 | 주식회사 에스아이 플렉스 | 단차 지그를 이용한 인쇄공법 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107041068B (zh) * | 2016-02-04 | 2019-10-25 | 毅嘉科技股份有限公司 | 电路板结构及其制造方法 |
CN114269071B (zh) * | 2021-12-08 | 2024-04-26 | 江苏普诺威电子股份有限公司 | 多层板的通孔填孔制作工艺 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100477378B1 (ko) | 2003-03-21 | 2005-03-18 | 주식회사 에스아이 플렉스 | 다층 연성 인쇄회로기판의 제조방법 |
KR100731819B1 (ko) | 2006-02-22 | 2007-06-22 | (주)인터플렉스 | 다층 연성인쇄회로기판의 제조방법 |
KR20070076590A (ko) * | 2006-01-19 | 2007-07-25 | (주)플렉스컴 | 리지드 플렉시블 인쇄회로기판의 제조방법 |
JP2011211131A (ja) | 2010-03-31 | 2011-10-20 | Toshiba Hokuto Electronics Corp | フレキシブルプリント配線板およびその製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101310571A (zh) * | 2005-11-15 | 2008-11-19 | 三井金属矿业株式会社 | 印刷线路板及其制造方法和使用方法 |
CN101534613B (zh) * | 2008-03-14 | 2012-06-13 | 富葵精密组件(深圳)有限公司 | 一种具有断差结构的电路板的制作方法 |
CN201709016U (zh) * | 2009-10-19 | 2011-01-12 | 嘉联益科技股份有限公司 | 一种可挠式软性电路板的结构 |
CN101990369B (zh) * | 2010-08-03 | 2012-08-29 | 广东达进电子科技有限公司 | 一种陶瓷基挠性电路板的制造方法 |
-
2012
- 2012-10-05 KR KR1020120110476A patent/KR101241070B1/ko active Active
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2013
- 2013-05-06 CN CN201310163009.XA patent/CN103717015B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100477378B1 (ko) | 2003-03-21 | 2005-03-18 | 주식회사 에스아이 플렉스 | 다층 연성 인쇄회로기판의 제조방법 |
KR20070076590A (ko) * | 2006-01-19 | 2007-07-25 | (주)플렉스컴 | 리지드 플렉시블 인쇄회로기판의 제조방법 |
KR100731819B1 (ko) | 2006-02-22 | 2007-06-22 | (주)인터플렉스 | 다층 연성인쇄회로기판의 제조방법 |
JP2011211131A (ja) | 2010-03-31 | 2011-10-20 | Toshiba Hokuto Electronics Corp | フレキシブルプリント配線板およびその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101369150B1 (ko) * | 2013-10-15 | 2014-03-04 | 주식회사 에스아이 플렉스 | 단차 지그를 이용한 인쇄공법 |
Also Published As
Publication number | Publication date |
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CN103717015B (zh) | 2016-12-28 |
CN103717015A (zh) | 2014-04-09 |
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