KR101077457B1 - Process for production of highly pure quaternary ammonium salt - Google Patents
Process for production of highly pure quaternary ammonium salt Download PDFInfo
- Publication number
- KR101077457B1 KR101077457B1 KR1020097007904A KR20097007904A KR101077457B1 KR 101077457 B1 KR101077457 B1 KR 101077457B1 KR 1020097007904 A KR1020097007904 A KR 1020097007904A KR 20097007904 A KR20097007904 A KR 20097007904A KR 101077457 B1 KR101077457 B1 KR 101077457B1
- Authority
- KR
- South Korea
- Prior art keywords
- quaternary ammonium
- tertiary amine
- ammonium salt
- salt
- protonate
- Prior art date
Links
- 150000003242 quaternary ammonium salts Chemical class 0.000 title claims abstract description 55
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000000034 method Methods 0.000 title claims description 9
- 150000003512 tertiary amines Chemical class 0.000 claims abstract description 67
- 125000001453 quaternary ammonium group Chemical group 0.000 claims abstract description 47
- 239000001099 ammonium carbonate Substances 0.000 claims abstract description 22
- 235000012501 ammonium carbonate Nutrition 0.000 claims abstract description 22
- 239000000908 ammonium hydroxide Substances 0.000 claims abstract description 20
- 239000012535 impurity Substances 0.000 claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims abstract description 3
- 150000003839 salts Chemical class 0.000 claims description 25
- -1 2 Chemical class 0.000 claims description 21
- 239000002253 acid Substances 0.000 claims description 16
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 150000001350 alkyl halides Chemical class 0.000 claims description 4
- JTUXXSPUWXPMJQ-UHFFFAOYSA-N chloro(fluoro)boron Chemical compound F[B]Cl JTUXXSPUWXPMJQ-UHFFFAOYSA-N 0.000 claims description 4
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims description 4
- 229910017008 AsF 6 Inorganic materials 0.000 claims description 3
- 229910020366 ClO 4 Inorganic materials 0.000 claims description 3
- 150000001450 anions Chemical class 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 239000003990 capacitor Substances 0.000 description 14
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 description 13
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 11
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 239000003792 electrolyte Substances 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000001514 detection method Methods 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- KOCWJEWXPJKXHS-UHFFFAOYSA-N 1-(methoxymethyl)-1-methylpyrrolidin-1-ium Chemical compound COC[N+]1(C)CCCC1 KOCWJEWXPJKXHS-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- WTKZEGDFNFYCGP-UHFFFAOYSA-O Pyrazolium Chemical compound C1=CN[NH+]=C1 WTKZEGDFNFYCGP-UHFFFAOYSA-O 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- JAJRRCSBKZOLPA-UHFFFAOYSA-M triethyl(methyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(CC)CC JAJRRCSBKZOLPA-UHFFFAOYSA-M 0.000 description 3
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 3
- ZJACZNZOAGQFTP-UHFFFAOYSA-N 1-(ethoxymethyl)-1-methylpyrrolidin-1-ium Chemical compound CCOC[N+]1(C)CCCC1 ZJACZNZOAGQFTP-UHFFFAOYSA-N 0.000 description 2
- SGPKVBVUPTYUET-UHFFFAOYSA-N 1-(methoxymethyl)-1-propylpyrrolidin-1-ium Chemical compound CCC[N+]1(COC)CCCC1 SGPKVBVUPTYUET-UHFFFAOYSA-N 0.000 description 2
- AQTCZOBQVQCQKR-UHFFFAOYSA-N 1-(propoxymethyl)pyrrolidine Chemical compound CCCOCN1CCCC1 AQTCZOBQVQCQKR-UHFFFAOYSA-N 0.000 description 2
- JFLBXOUJTNALFC-UHFFFAOYSA-N 1-ethyl-1-(methoxymethyl)pyrrolidin-1-ium Chemical compound COC[N+]1(CC)CCCC1 JFLBXOUJTNALFC-UHFFFAOYSA-N 0.000 description 2
- QWTKWUKAOVCYBM-UHFFFAOYSA-N 1-methyl-1-(propoxymethyl)pyrrolidin-1-ium Chemical compound CCCOC[N+]1(C)CCCC1 QWTKWUKAOVCYBM-UHFFFAOYSA-N 0.000 description 2
- XJUZRXYOEPSWMB-UHFFFAOYSA-N Chloromethyl methyl ether Chemical compound COCCl XJUZRXYOEPSWMB-UHFFFAOYSA-N 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 229940061627 chloromethyl methyl ether Drugs 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- ZCQWOFVYLHDMMC-UHFFFAOYSA-O hydron;1,3-oxazole Chemical compound C1=COC=[NH+]1 ZCQWOFVYLHDMMC-UHFFFAOYSA-O 0.000 description 2
- CZPWVGJYEJSRLH-UHFFFAOYSA-O hydron;pyrimidine Chemical compound C1=CN=C[NH+]=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-O 0.000 description 2
- 238000004811 liquid chromatography Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 2
- 125000005497 tetraalkylphosphonium group Chemical group 0.000 description 2
- GARJMFRQLMUUDD-UHFFFAOYSA-N 1,1-dimethylpyrrolidin-1-ium Chemical compound C[N+]1(C)CCCC1 GARJMFRQLMUUDD-UHFFFAOYSA-N 0.000 description 1
- MXLZUALXSYVAIV-UHFFFAOYSA-N 1,2-dimethyl-3-propylimidazol-1-ium Chemical compound CCCN1C=C[N+](C)=C1C MXLZUALXSYVAIV-UHFFFAOYSA-N 0.000 description 1
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 1
- PSIOIZDELPYQPO-UHFFFAOYSA-N 1,2-dimethylpyrazol-1-ium Chemical compound CN1C=CC=[N+]1C PSIOIZDELPYQPO-UHFFFAOYSA-N 0.000 description 1
- GMUSNOZEJRLWKH-UHFFFAOYSA-N 1,2-dimethylpyrimidin-1-ium Chemical compound CC1=NC=CC=[N+]1C GMUSNOZEJRLWKH-UHFFFAOYSA-N 0.000 description 1
- XLJSMWDFUFADIA-UHFFFAOYSA-N 1,3-diethylimidazol-1-ium Chemical compound CCN1C=C[N+](CC)=C1 XLJSMWDFUFADIA-UHFFFAOYSA-N 0.000 description 1
- HVVRUQBMAZRKPJ-UHFFFAOYSA-N 1,3-dimethylimidazolium Chemical compound CN1C=C[N+](C)=C1 HVVRUQBMAZRKPJ-UHFFFAOYSA-N 0.000 description 1
- KLHAPWPQFHROAB-UHFFFAOYSA-N 1-(butoxymethyl)-1-methylpyrrolidin-1-ium Chemical compound CCCCOC[N+]1(C)CCCC1 KLHAPWPQFHROAB-UHFFFAOYSA-N 0.000 description 1
- VAXWUEQXZHUQNH-UHFFFAOYSA-N 1-(butoxymethyl)pyrrolidine Chemical compound CCCCOCN1CCCC1 VAXWUEQXZHUQNH-UHFFFAOYSA-N 0.000 description 1
- FQQLPHRTYNPTLT-UHFFFAOYSA-N 1-(ethoxymethyl)pyrrolidine Chemical compound CCOCN1CCCC1 FQQLPHRTYNPTLT-UHFFFAOYSA-N 0.000 description 1
- XAKVXORGVYVQFC-UHFFFAOYSA-N 1-(methoxymethyl)-1-methylpiperidin-1-ium Chemical compound COC[N+]1(C)CCCCC1 XAKVXORGVYVQFC-UHFFFAOYSA-N 0.000 description 1
- PVEWTWYMXOLFFN-UHFFFAOYSA-M 1-(methoxymethyl)-1-methylpyrrolidin-1-ium;hydroxide Chemical compound [OH-].COC[N+]1(C)CCCC1 PVEWTWYMXOLFFN-UHFFFAOYSA-M 0.000 description 1
- GZPMMQGPHXEMSZ-UHFFFAOYSA-N 1-(methoxymethyl)pyrrolidine Chemical compound COCN1CCCC1 GZPMMQGPHXEMSZ-UHFFFAOYSA-N 0.000 description 1
- RMTSCWSMELBQFT-UHFFFAOYSA-N 1-butyl-1-(methoxymethyl)pyrrolidin-1-ium Chemical compound CCCC[N+]1(COC)CCCC1 RMTSCWSMELBQFT-UHFFFAOYSA-N 0.000 description 1
- WVKQECDSKDGQDQ-UHFFFAOYSA-O 1-butyl-1H-triazol-1-ium Chemical compound CCCC[NH+]1C=CN=N1 WVKQECDSKDGQDQ-UHFFFAOYSA-O 0.000 description 1
- MIZPCNCPEWLKOV-UHFFFAOYSA-N 1-butyl-2-methylpyrazol-2-ium Chemical compound CCCCN1C=CC=[N+]1C MIZPCNCPEWLKOV-UHFFFAOYSA-N 0.000 description 1
- AXWLKJWVMMAXBD-UHFFFAOYSA-N 1-butylpiperidine Chemical compound CCCCN1CCCCC1 AXWLKJWVMMAXBD-UHFFFAOYSA-N 0.000 description 1
- XLOSBJZGLWEIFL-UHFFFAOYSA-N 1-butylpyrazin-1-ium Chemical compound CCCC[N+]1=CC=NC=C1 XLOSBJZGLWEIFL-UHFFFAOYSA-N 0.000 description 1
- MGASSKTWAZLFTD-UHFFFAOYSA-N 1-butylpyridazin-1-ium Chemical compound CCCC[N+]1=CC=CC=N1 MGASSKTWAZLFTD-UHFFFAOYSA-N 0.000 description 1
- JSHASCFKOSDFHY-UHFFFAOYSA-N 1-butylpyrrolidine Chemical compound CCCCN1CCCC1 JSHASCFKOSDFHY-UHFFFAOYSA-N 0.000 description 1
- BORIRQGJUNESNT-UHFFFAOYSA-N 1-ethoxy-2-methylpyrrolidine Chemical compound CC1N(CCC1)OCC BORIRQGJUNESNT-UHFFFAOYSA-N 0.000 description 1
- WACRAFUNNYGNEQ-UHFFFAOYSA-N 1-ethyl-1-methylpiperidin-1-ium Chemical compound CC[N+]1(C)CCCCC1 WACRAFUNNYGNEQ-UHFFFAOYSA-N 0.000 description 1
- NIHOUJYFWMURBG-UHFFFAOYSA-N 1-ethyl-1-methylpyrrolidin-1-ium Chemical compound CC[N+]1(C)CCCC1 NIHOUJYFWMURBG-UHFFFAOYSA-N 0.000 description 1
- WQJAOAVHWUDVMV-UHFFFAOYSA-N 1-ethyl-1-propylpiperidin-1-ium Chemical compound CCC[N+]1(CC)CCCCC1 WQJAOAVHWUDVMV-UHFFFAOYSA-N 0.000 description 1
- QNXMTMCQDZQADU-UHFFFAOYSA-N 1-ethyl-1-propylpyrrolidin-1-ium Chemical compound CCC[N+]1(CC)CCCC1 QNXMTMCQDZQADU-UHFFFAOYSA-N 0.000 description 1
- IRGDPGYNHSIIJJ-UHFFFAOYSA-N 1-ethyl-2,3-dimethylimidazol-3-ium Chemical compound CCN1C=C[N+](C)=C1C IRGDPGYNHSIIJJ-UHFFFAOYSA-N 0.000 description 1
- MLYBVSISIUUHHY-UHFFFAOYSA-N 1-ethyl-2-methylpyrazin-1-ium Chemical compound CC[N+]1=CC=NC=C1C MLYBVSISIUUHHY-UHFFFAOYSA-N 0.000 description 1
- BOFPDEISADDIGX-UHFFFAOYSA-N 1-ethyl-2-methylpyrazol-2-ium Chemical compound CCN1C=CC=[N+]1C BOFPDEISADDIGX-UHFFFAOYSA-N 0.000 description 1
- ALNWCYLRUYXLCD-UHFFFAOYSA-O 1-ethyl-2H-triazol-1-ium Chemical compound CC[NH+]1C=CN=N1 ALNWCYLRUYXLCD-UHFFFAOYSA-O 0.000 description 1
- NJMWOUFKYKNWDW-UHFFFAOYSA-N 1-ethyl-3-methylimidazolium Chemical compound CCN1C=C[N+](C)=C1 NJMWOUFKYKNWDW-UHFFFAOYSA-N 0.000 description 1
- IWDFHWZHHOSSGR-UHFFFAOYSA-N 1-ethylimidazole Chemical compound CCN1C=CN=C1 IWDFHWZHHOSSGR-UHFFFAOYSA-N 0.000 description 1
- FLNMQGISZVYIIK-UHFFFAOYSA-N 1-ethylpyrazole Chemical compound CCN1C=CC=N1 FLNMQGISZVYIIK-UHFFFAOYSA-N 0.000 description 1
- OEIMXYNKWKCFOE-UHFFFAOYSA-N 1-ethylpyridazin-1-ium Chemical compound CC[N+]1=CC=CC=N1 OEIMXYNKWKCFOE-UHFFFAOYSA-N 0.000 description 1
- OIDIRWZVUWCCCO-UHFFFAOYSA-N 1-ethylpyridin-1-ium Chemical compound CC[N+]1=CC=CC=C1 OIDIRWZVUWCCCO-UHFFFAOYSA-N 0.000 description 1
- ONQBOTKLCMXPOF-UHFFFAOYSA-N 1-ethylpyrrolidine Chemical compound CCN1CCCC1 ONQBOTKLCMXPOF-UHFFFAOYSA-N 0.000 description 1
- OGLIVJFAKNJZRE-UHFFFAOYSA-N 1-methyl-1-propylpiperidin-1-ium Chemical compound CCC[N+]1(C)CCCCC1 OGLIVJFAKNJZRE-UHFFFAOYSA-N 0.000 description 1
- YQFWGCSKGJMGHE-UHFFFAOYSA-N 1-methyl-1-propylpyrrolidin-1-ium Chemical compound CCC[N+]1(C)CCCC1 YQFWGCSKGJMGHE-UHFFFAOYSA-N 0.000 description 1
- MCTWTZJPVLRJOU-UHFFFAOYSA-N 1-methyl-1H-imidazole Chemical compound CN1C=CN=C1 MCTWTZJPVLRJOU-UHFFFAOYSA-N 0.000 description 1
- RGPPCBVEBOWHLY-UHFFFAOYSA-N 1-methyl-2-propylpyrazol-1-ium Chemical compound CCCN1C=CC=[N+]1C RGPPCBVEBOWHLY-UHFFFAOYSA-N 0.000 description 1
- JWAWEQBUZOGIBZ-UHFFFAOYSA-O 1-methyl-2h-triazol-1-ium Chemical compound C[N+]1=CC=NN1 JWAWEQBUZOGIBZ-UHFFFAOYSA-O 0.000 description 1
- MTGKCDNVVMKVRH-UHFFFAOYSA-N 1-methyl-3-propyl-2h-pyrimidin-1-ium Chemical compound CCCN1C[N+](C)=CC=C1 MTGKCDNVVMKVRH-UHFFFAOYSA-N 0.000 description 1
- XLKPEAFVZSNDOE-UHFFFAOYSA-N 1-methylpyridazin-1-ium Chemical compound C[N+]1=CC=CC=N1 XLKPEAFVZSNDOE-UHFFFAOYSA-N 0.000 description 1
- VAUFFDKLUVJZTG-UHFFFAOYSA-O 1-propyl-2h-triazol-1-ium Chemical compound CCC[N+]1=CC=NN1 VAUFFDKLUVJZTG-UHFFFAOYSA-O 0.000 description 1
- VTDIWMPYBAVEDY-UHFFFAOYSA-N 1-propylpiperidine Chemical compound CCCN1CCCCC1 VTDIWMPYBAVEDY-UHFFFAOYSA-N 0.000 description 1
- BDMFEFZOOOYCKN-UHFFFAOYSA-N 1-propylpyrazole Chemical compound CCCN1C=CC=N1 BDMFEFZOOOYCKN-UHFFFAOYSA-N 0.000 description 1
- ZZUBADFFZKAPJC-UHFFFAOYSA-N 1-propylpyridazin-1-ium Chemical compound CCC[N+]1=CC=CC=N1 ZZUBADFFZKAPJC-UHFFFAOYSA-N 0.000 description 1
- CRTKBIFIDSNKCN-UHFFFAOYSA-N 1-propylpyridin-1-ium Chemical compound CCC[N+]1=CC=CC=C1 CRTKBIFIDSNKCN-UHFFFAOYSA-N 0.000 description 1
- HLNRRPIYRBBHSQ-UHFFFAOYSA-N 1-propylpyrrolidine Chemical compound CCCN1CCCC1 HLNRRPIYRBBHSQ-UHFFFAOYSA-N 0.000 description 1
- UINDRJHZBAGQFD-UHFFFAOYSA-N 2-ethyl-1-methylimidazole Chemical compound CCC1=NC=CN1C UINDRJHZBAGQFD-UHFFFAOYSA-N 0.000 description 1
- NNVXLFSTYHBTRD-UHFFFAOYSA-N 3-azoniaspiro[2.4]heptane Chemical compound C1C[N+]11CCCC1 NNVXLFSTYHBTRD-UHFFFAOYSA-N 0.000 description 1
- VAJZCFLYJRMBFN-UHFFFAOYSA-N 4,4-dimethylmorpholin-4-ium Chemical compound C[N+]1(C)CCOCC1 VAJZCFLYJRMBFN-UHFFFAOYSA-N 0.000 description 1
- MDFCOVMXWLWCSF-UHFFFAOYSA-N 4-azoniaspiro[3.4]octane Chemical compound C1CC[N+]21CCCC2 MDFCOVMXWLWCSF-UHFFFAOYSA-N 0.000 description 1
- LMRKVKPRHROQRR-UHFFFAOYSA-N 4-butylmorpholine Chemical compound CCCCN1CCOCC1 LMRKVKPRHROQRR-UHFFFAOYSA-N 0.000 description 1
- NWORVTSPNLVHSH-UHFFFAOYSA-N 4-ethyl-4-methylmorpholin-4-ium Chemical compound CC[N+]1(C)CCOCC1 NWORVTSPNLVHSH-UHFFFAOYSA-N 0.000 description 1
- VRQUKNXRQCZCOW-UHFFFAOYSA-N 4-ethyl-4-propylmorpholin-4-ium Chemical compound CCC[N+]1(CC)CCOCC1 VRQUKNXRQCZCOW-UHFFFAOYSA-N 0.000 description 1
- HVCNXQOWACZAFN-UHFFFAOYSA-N 4-ethylmorpholine Chemical compound CCN1CCOCC1 HVCNXQOWACZAFN-UHFFFAOYSA-N 0.000 description 1
- RZWDVVAASLNVBS-UHFFFAOYSA-N 4-methyl-4-propylmorpholin-4-ium Chemical compound CCC[N+]1(C)CCOCC1 RZWDVVAASLNVBS-UHFFFAOYSA-N 0.000 description 1
- NMILGIZTAZXMTM-UHFFFAOYSA-N 4-propylmorpholine Chemical compound CCCN1CCOCC1 NMILGIZTAZXMTM-UHFFFAOYSA-N 0.000 description 1
- NZSICTQUKULOSA-UHFFFAOYSA-N 5-azoniaspiro[4.4]nonane Chemical compound C1CCC[N+]21CCCC2 NZSICTQUKULOSA-UHFFFAOYSA-N 0.000 description 1
- XKVUYEYANWFIJX-UHFFFAOYSA-N 5-methyl-1h-pyrazole Chemical compound CC1=CC=NN1 XKVUYEYANWFIJX-UHFFFAOYSA-N 0.000 description 1
- HOTNVZSJGHTWIU-UHFFFAOYSA-N 6-azoniaspiro[5.5]undecane Chemical compound C1CCCC[N+]21CCCCC2 HOTNVZSJGHTWIU-UHFFFAOYSA-N 0.000 description 1
- DOPDQVLMTMEESK-UHFFFAOYSA-N CCCCN(CCC)OCC Chemical compound CCCCN(CCC)OCC DOPDQVLMTMEESK-UHFFFAOYSA-N 0.000 description 1
- RGSSJDPUQVEJIL-UHFFFAOYSA-N CCC[N+]1=C(C)[S+](C)C=C1 Chemical compound CCC[N+]1=C(C)[S+](C)C=C1 RGSSJDPUQVEJIL-UHFFFAOYSA-N 0.000 description 1
- AEGJIDJYXSUSMM-UHFFFAOYSA-N C[S+]1C=CN=C1C Chemical compound C[S+]1C=CN=C1C AEGJIDJYXSUSMM-UHFFFAOYSA-N 0.000 description 1
- HIJAXFVRRXRSNN-UHFFFAOYSA-N C[S+]1C=NC=C1 Chemical compound C[S+]1C=NC=C1 HIJAXFVRRXRSNN-UHFFFAOYSA-N 0.000 description 1
- DJEQZVQFEPKLOY-UHFFFAOYSA-N N,N-dimethylbutylamine Chemical compound CCCCN(C)C DJEQZVQFEPKLOY-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- HTLZVHNRZJPSMI-UHFFFAOYSA-N N-ethylpiperidine Chemical compound CCN1CCCCC1 HTLZVHNRZJPSMI-UHFFFAOYSA-N 0.000 description 1
- UQFQONCQIQEYPJ-UHFFFAOYSA-N N-methylpyrazole Chemical compound CN1C=CC=N1 UQFQONCQIQEYPJ-UHFFFAOYSA-N 0.000 description 1
- PQBAWAQIRZIWIV-UHFFFAOYSA-N N-methylpyridinium Chemical compound C[N+]1=CC=CC=C1 PQBAWAQIRZIWIV-UHFFFAOYSA-N 0.000 description 1
- GSBKRFGXEJLVMI-UHFFFAOYSA-N Nervonyl carnitine Chemical compound CCC[N+](C)(C)C GSBKRFGXEJLVMI-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- XHIHMDHAPXMAQK-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)azanide;1-butylpyridin-1-ium Chemical compound CCCC[N+]1=CC=CC=C1.FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F XHIHMDHAPXMAQK-UHFFFAOYSA-N 0.000 description 1
- IUNCEDRRUNZACO-UHFFFAOYSA-N butyl(trimethyl)azanium Chemical compound CCCC[N+](C)(C)C IUNCEDRRUNZACO-UHFFFAOYSA-N 0.000 description 1
- YQPAAVMEUPILEE-UHFFFAOYSA-N butyl(trimethyl)phosphanium Chemical compound CCCC[P+](C)(C)C YQPAAVMEUPILEE-UHFFFAOYSA-N 0.000 description 1
- JTSLKOMZLHUIMT-UHFFFAOYSA-N butyl-(ethoxymethyl)-diethylazanium Chemical compound CCCC[N+](CC)(CC)COCC JTSLKOMZLHUIMT-UHFFFAOYSA-N 0.000 description 1
- FZYZWGCASHMHDP-UHFFFAOYSA-N butyl-(ethoxymethyl)-dimethylazanium Chemical compound CCCC[N+](C)(C)COCC FZYZWGCASHMHDP-UHFFFAOYSA-N 0.000 description 1
- VJGAQZSQPXJMQG-UHFFFAOYSA-N butyl-(methoxymethyl)-dimethylazanium Chemical compound CCCC[N+](C)(C)COC VJGAQZSQPXJMQG-UHFFFAOYSA-N 0.000 description 1
- XDVUELLFFZMZPX-UHFFFAOYSA-N butyl-diethyl-(methoxymethyl)azanium Chemical compound CCCC[N+](CC)(CC)COC XDVUELLFFZMZPX-UHFFFAOYSA-N 0.000 description 1
- OZHYULYUYJVOPW-UHFFFAOYSA-N butyl-ethyl-methyl-propylazanium Chemical compound CCCC[N+](C)(CC)CCC OZHYULYUYJVOPW-UHFFFAOYSA-N 0.000 description 1
- SKXSOGCIGQMMOO-UHFFFAOYSA-N butyl-ethyl-methyl-propylphosphanium Chemical compound CCCC[P+](C)(CC)CCC SKXSOGCIGQMMOO-UHFFFAOYSA-N 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- ZJHQDSMOYNLVLX-UHFFFAOYSA-N diethyl(dimethyl)azanium Chemical compound CC[N+](C)(C)CC ZJHQDSMOYNLVLX-UHFFFAOYSA-N 0.000 description 1
- RBECNRCKEQGFRU-UHFFFAOYSA-N diethyl(dimethyl)phosphanium Chemical compound CC[P+](C)(C)CC RBECNRCKEQGFRU-UHFFFAOYSA-N 0.000 description 1
- PQZTVWVYCLIIJY-UHFFFAOYSA-N diethyl(propyl)amine Chemical compound CCCN(CC)CC PQZTVWVYCLIIJY-UHFFFAOYSA-N 0.000 description 1
- DUWSQQWAYMDIDY-UHFFFAOYSA-N diethyl-(methoxymethyl)-methylazanium Chemical compound CC[N+](C)(CC)COC DUWSQQWAYMDIDY-UHFFFAOYSA-N 0.000 description 1
- XFJURCLHAYZSSA-UHFFFAOYSA-N diethyl-(methoxymethyl)-propylazanium Chemical compound CCC[N+](CC)(CC)COC XFJURCLHAYZSSA-UHFFFAOYSA-N 0.000 description 1
- IKXAGLHOBMLMFG-UHFFFAOYSA-N ethoxymethyl(triethyl)azanium Chemical compound CCOC[N+](CC)(CC)CC IKXAGLHOBMLMFG-UHFFFAOYSA-N 0.000 description 1
- UGYNCNQTQKRZKR-UHFFFAOYSA-N ethoxymethyl(trimethyl)azanium Chemical compound CCOC[N+](C)(C)C UGYNCNQTQKRZKR-UHFFFAOYSA-N 0.000 description 1
- URDYKTRHJTYNMQ-UHFFFAOYSA-N ethoxymethyl(tripropyl)azanium Chemical compound CCC[N+](CCC)(CCC)COCC URDYKTRHJTYNMQ-UHFFFAOYSA-N 0.000 description 1
- VRTBTDVPBFYRMM-UHFFFAOYSA-N ethoxymethyl-diethyl-methylazanium Chemical compound CCOC[N+](C)(CC)CC VRTBTDVPBFYRMM-UHFFFAOYSA-N 0.000 description 1
- QDIDVEQNGJDCLN-UHFFFAOYSA-N ethoxymethyl-diethyl-propylazanium Chemical compound CCC[N+](CC)(CC)COCC QDIDVEQNGJDCLN-UHFFFAOYSA-N 0.000 description 1
- RWNNJGPZFYSWLD-UHFFFAOYSA-N ethoxymethyl-dimethyl-propylazanium Chemical compound CCC[N+](C)(C)COCC RWNNJGPZFYSWLD-UHFFFAOYSA-N 0.000 description 1
- DAOSJUPOGKHGLD-UHFFFAOYSA-N ethoxymethyl-ethyl-dimethylazanium Chemical compound CCOC[N+](C)(C)CC DAOSJUPOGKHGLD-UHFFFAOYSA-N 0.000 description 1
- ZPUQFHINROWWCC-UHFFFAOYSA-N ethoxymethyl-ethyl-dipropylazanium Chemical compound CCC[N+](CC)(CCC)COCC ZPUQFHINROWWCC-UHFFFAOYSA-N 0.000 description 1
- NMTZFVFRGJNYRW-UHFFFAOYSA-N ethoxymethyl-methyl-dipropylazanium Chemical compound CCC[N+](C)(CCC)COCC NMTZFVFRGJNYRW-UHFFFAOYSA-N 0.000 description 1
- IQLVJVXTKNBZRC-UHFFFAOYSA-N ethyl(trimethyl)phosphanium Chemical compound CC[P+](C)(C)C IQLVJVXTKNBZRC-UHFFFAOYSA-N 0.000 description 1
- XPCZOMQISCICKH-UHFFFAOYSA-N ethyl-(methoxymethyl)-dimethylazanium Chemical compound CC[N+](C)(C)COC XPCZOMQISCICKH-UHFFFAOYSA-N 0.000 description 1
- OQULBFLJJHJSOL-UHFFFAOYSA-N ethyl-(methoxymethyl)-dipropylazanium Chemical compound CCC[N+](CC)(CCC)COC OQULBFLJJHJSOL-UHFFFAOYSA-N 0.000 description 1
- ZOZZQPFBMNNPPO-UHFFFAOYSA-N ethyl-dimethyl-propylazanium Chemical compound CCC[N+](C)(C)CC ZOZZQPFBMNNPPO-UHFFFAOYSA-N 0.000 description 1
- XRUDAGYWANYZNW-UHFFFAOYSA-N ethyl-dimethyl-propylphosphanium Chemical compound CCC[P+](C)(C)CC XRUDAGYWANYZNW-UHFFFAOYSA-N 0.000 description 1
- YOMFVLRTMZWACQ-UHFFFAOYSA-N ethyltrimethylammonium Chemical compound CC[N+](C)(C)C YOMFVLRTMZWACQ-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- NNCAWEWCFVZOGF-UHFFFAOYSA-N mepiquat Chemical compound C[N+]1(C)CCCCC1 NNCAWEWCFVZOGF-UHFFFAOYSA-N 0.000 description 1
- SUQNNSTVKPMHRZ-UHFFFAOYSA-N methoxymethyl(trimethyl)azanium Chemical compound COC[N+](C)(C)C SUQNNSTVKPMHRZ-UHFFFAOYSA-N 0.000 description 1
- MEVCELUSWHCAFS-UHFFFAOYSA-N methoxymethyl(tripropyl)azanium Chemical compound CCC[N+](CCC)(CCC)COC MEVCELUSWHCAFS-UHFFFAOYSA-N 0.000 description 1
- CYMZPHRZTDBXCR-UHFFFAOYSA-N methoxymethyl-dimethyl-propylazanium Chemical compound CCC[N+](C)(C)COC CYMZPHRZTDBXCR-UHFFFAOYSA-N 0.000 description 1
- DPLISQLAZUOVEE-UHFFFAOYSA-N methoxymethyl-methyl-dipropylazanium Chemical compound CCC[N+](C)(CCC)COC DPLISQLAZUOVEE-UHFFFAOYSA-N 0.000 description 1
- ORSUTASIQKBEFU-UHFFFAOYSA-N n,n-diethylbutan-1-amine Chemical compound CCCCN(CC)CC ORSUTASIQKBEFU-UHFFFAOYSA-N 0.000 description 1
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 description 1
- ZUHZZVMEUAUWHY-UHFFFAOYSA-N n,n-dimethylpropan-1-amine Chemical compound CCCN(C)C ZUHZZVMEUAUWHY-UHFFFAOYSA-N 0.000 description 1
- VJIRBKSBSKOOLV-UHFFFAOYSA-N n,n-dipropylbutan-1-amine Chemical compound CCCCN(CCC)CCC VJIRBKSBSKOOLV-UHFFFAOYSA-N 0.000 description 1
- FKWUBBCUJLXTFR-UHFFFAOYSA-N n-(ethoxymethyl)-n-ethylethanamine Chemical compound CCOCN(CC)CC FKWUBBCUJLXTFR-UHFFFAOYSA-N 0.000 description 1
- IERCYDLITWNHDA-UHFFFAOYSA-N n-(ethoxymethyl)-n-ethylpropan-1-amine Chemical compound CCCN(CC)COCC IERCYDLITWNHDA-UHFFFAOYSA-N 0.000 description 1
- UTQQKJYYYJBFEB-UHFFFAOYSA-N n-(ethoxymethyl)-n-methylethanamine Chemical compound CCOCN(C)CC UTQQKJYYYJBFEB-UHFFFAOYSA-N 0.000 description 1
- MYPRRUMXVCEWBC-UHFFFAOYSA-N n-(ethoxymethyl)-n-methylpropan-1-amine Chemical compound CCCN(C)COCC MYPRRUMXVCEWBC-UHFFFAOYSA-N 0.000 description 1
- PNHFDNKBTRHNHL-UHFFFAOYSA-N n-(ethoxymethyl)-n-propylbutan-1-amine Chemical compound CCCCN(CCC)COCC PNHFDNKBTRHNHL-UHFFFAOYSA-N 0.000 description 1
- KZGFTKAJCVXVJI-UHFFFAOYSA-N n-(ethoxymethyl)-n-propylpropan-1-amine Chemical compound CCCN(CCC)COCC KZGFTKAJCVXVJI-UHFFFAOYSA-N 0.000 description 1
- OBPKNNCDYBHGHA-UHFFFAOYSA-N n-(methoxymethyl)-n-methylbutan-1-amine Chemical compound CCCCN(C)COC OBPKNNCDYBHGHA-UHFFFAOYSA-N 0.000 description 1
- DDUWYDGMCLTDDC-UHFFFAOYSA-N n-(methoxymethyl)-n-methylethanamine Chemical compound CCN(C)COC DDUWYDGMCLTDDC-UHFFFAOYSA-N 0.000 description 1
- LZKDVWPJNFSLCY-UHFFFAOYSA-N n-(methoxymethyl)-n-methylpropan-1-amine Chemical compound CCCN(C)COC LZKDVWPJNFSLCY-UHFFFAOYSA-N 0.000 description 1
- IMKNRDZRXHOOAV-UHFFFAOYSA-N n-(methoxymethyl)-n-propylbutan-1-amine Chemical compound CCCCN(CCC)COC IMKNRDZRXHOOAV-UHFFFAOYSA-N 0.000 description 1
- KQYNAEZUEIGWPU-UHFFFAOYSA-N n-(methoxymethyl)-n-propylpropan-1-amine Chemical compound CCCN(CCC)COC KQYNAEZUEIGWPU-UHFFFAOYSA-N 0.000 description 1
- VEBPYKMCKZTFPJ-UHFFFAOYSA-N n-butyl-n-propylbutan-1-amine Chemical compound CCCCN(CCC)CCCC VEBPYKMCKZTFPJ-UHFFFAOYSA-N 0.000 description 1
- GEVHXUHOPDPQMZ-UHFFFAOYSA-N n-ethyl-n-(methoxymethyl)butan-1-amine Chemical compound CCCCN(CC)COC GEVHXUHOPDPQMZ-UHFFFAOYSA-N 0.000 description 1
- QGRBGPKKFIYPSW-UHFFFAOYSA-N n-ethyl-n-(methoxymethyl)ethanamine Chemical compound CCN(CC)COC QGRBGPKKFIYPSW-UHFFFAOYSA-N 0.000 description 1
- WOLFCKKMHUVEPN-UHFFFAOYSA-N n-ethyl-n-methylbutan-1-amine Chemical compound CCCCN(C)CC WOLFCKKMHUVEPN-UHFFFAOYSA-N 0.000 description 1
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 description 1
- SMBYUOXUISCLCF-UHFFFAOYSA-N n-ethyl-n-methylpropan-1-amine Chemical compound CCCN(C)CC SMBYUOXUISCLCF-UHFFFAOYSA-N 0.000 description 1
- YXSVUUUKWBDCAD-UHFFFAOYSA-N n-ethyl-n-propylbutan-1-amine Chemical compound CCCCN(CC)CCC YXSVUUUKWBDCAD-UHFFFAOYSA-N 0.000 description 1
- STCMDMFTMKSBSV-UHFFFAOYSA-N n-methoxypropan-2-amine Chemical compound CONC(C)C STCMDMFTMKSBSV-UHFFFAOYSA-N 0.000 description 1
- 239000011255 nonaqueous electrolyte Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- SZWHXXNVLACKBV-UHFFFAOYSA-N tetraethylphosphanium Chemical compound CC[P+](CC)(CC)CC SZWHXXNVLACKBV-UHFFFAOYSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- BXYHVFRRNNWPMB-UHFFFAOYSA-N tetramethylphosphanium Chemical compound C[P+](C)(C)C BXYHVFRRNNWPMB-UHFFFAOYSA-N 0.000 description 1
- OSBSFAARYOCBHB-UHFFFAOYSA-N tetrapropylammonium Chemical compound CCC[N+](CCC)(CCC)CCC OSBSFAARYOCBHB-UHFFFAOYSA-N 0.000 description 1
- XOGCTUKDUDAZKA-UHFFFAOYSA-N tetrapropylphosphanium Chemical compound CCC[P+](CCC)(CCC)CCC XOGCTUKDUDAZKA-UHFFFAOYSA-N 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- KDYHSGOHECNGNG-UHFFFAOYSA-N triethyl(methoxymethyl)azanium Chemical compound CC[N+](CC)(CC)COC KDYHSGOHECNGNG-UHFFFAOYSA-N 0.000 description 1
- SEACXNRNJAXIBM-UHFFFAOYSA-N triethyl(methyl)azanium Chemical compound CC[N+](C)(CC)CC SEACXNRNJAXIBM-UHFFFAOYSA-N 0.000 description 1
- TZWFFXFQARPFJN-UHFFFAOYSA-N triethyl(methyl)phosphanium Chemical compound CC[P+](C)(CC)CC TZWFFXFQARPFJN-UHFFFAOYSA-N 0.000 description 1
- YGDBTMJEJNVHPZ-UHFFFAOYSA-N trimethyl(propyl)phosphanium Chemical compound CCC[P+](C)(C)C YGDBTMJEJNVHPZ-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
- C07C209/82—Purification; Separation; Stabilisation; Use of additives
- C07C209/84—Purification
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/62—Quaternary ammonium compounds
- C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/54—Electrolytes
- H01G11/58—Liquid electrolytes
- H01G11/62—Liquid electrolytes characterised by the solute, e.g. salts, anions or cations therein
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/022—Electrolytes; Absorbents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/022—Electrolytes; Absorbents
- H01G9/035—Liquid electrolytes, e.g. impregnating materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/13—Energy storage using capacitors
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
Abstract
(1) 불순물로서 제3급 아민의 양성자산염을 포함하는 제4급 암모늄염에, 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염을 첨가하여, 상기 제3급 아민의 양성자산염을 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염에 의해 중화시켜 제3급 아민과 물로 변환시킴과 동시에 상기 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염은 제4급 암모늄염으로 변환시키고, (1) A quaternary ammonium hydroxide or quaternary ammonium carbonate is added to a quaternary ammonium salt containing a protonate of a tertiary amine as an impurity, and the protonate of the tertiary amine is added to quaternary ammonium. Neutralized with hydroxide or quaternary ammonium carbonate to convert to tertiary amine and water, while the quaternary ammonium hydroxide or quaternary ammonium carbonate is converted to quaternary ammonium salt,
(2) 생성된 제3급 아민과 물은 계 밖으로 제거하는 것을 특징으로 하는 고순도 제4급 암모늄염의 제조 방법.(2) A method for producing a high purity quaternary ammonium salt, wherein the produced tertiary amine and water are removed out of the system.
고순도 제4급 암모늄염, 고순도 제4급 암모늄염의 제조 방법.High purity quaternary ammonium salt, manufacturing method of high purity quaternary ammonium salt.
Description
본 발명은 전기 이중층 캐패시터나 전해 컨덴서 등의 축전 소자의 전해질로서 사용되는 제4급 암모늄염 중에, 불순물로서 포함되는 제3급 아민 및 제3급 아민의 양성자산염을 감소시키는 제4급 암모늄염의 제조 방법에 관한 것이다.The present invention provides a method for producing a quaternary ammonium salt which reduces the protonates of tertiary amines and tertiary amines contained as impurities in quaternary ammonium salts used as electrolytes for power storage devices such as electric double layer capacitors and electrolytic capacitors. It is about.
종래 제4급 암모늄염의 제조 방법은 제3급 아민에 알킬할라이드를 반응시켜 제4급 암모늄 할라이드로 하고, 이것에 산을 반응시키는 방법, 또한 제3급 아민에 탄산디에스테르를 반응시켜 제4급 암모늄염을 생성시키고, 이어서 산을 반응시켜 탈탄산시키는 방법이 알려져 있다.Conventionally, the method for preparing the quaternary ammonium salt is a quaternary ammonium halide by reacting an alkyl halide with a tertiary amine, and an acid is reacted with this, and a diester carbonate is reacted with a tertiary amine. It is known to produce ammonium salts and then to react the acid to decarbonate.
어떠한 방법도 제3급 아민의 제4급화 반응이 완전히 행해지지 않은 경우, 미반응의 제3급 아민은 후속 공정에서 산과 반응하여 제3급 아민의 양성자산염을 생성하여, 주생성물인 제4급 암모늄염 중에 혼입되게 된다.If neither method is fully quaternized with the tertiary amine, the unreacted tertiary amine reacts with the acid in a subsequent process to produce the protic acid salt of the tertiary amine, the primary product being quaternary Incorporation into the ammonium salt.
또한, 제4급 암모늄 할라이드나 제4급 암모늄염의 열 분해에 의해 제3급 아민이 생성되는 경우가 있다. 생성된 제3급 아민은 제4급 암모늄염의 제조 과정에서 제3급 아민의 양성자산염을 생성시킨다. 제3급 아민의 양성자산염의 양이온의 수소 원자는 양성자로서 방출되기 쉽기 때문에, 특히 환원 반응에 대하여 불안정하 여, 전기 이중층 캐패시터, 전해 컨덴서의 내전압 및 장기간 신뢰성 저하의 원인이 되는 것으로 알려져 있다(예를 들면, 특허 문헌 1). In addition, tertiary amines may be produced by thermal decomposition of quaternary ammonium halides or quaternary ammonium salts. The resulting tertiary amine produces a protonate of the tertiary amine in the preparation of the quaternary ammonium salt. Since the hydrogen atom of the cation of the protonate of the tertiary amine is easily released as a proton, it is particularly unstable to the reduction reaction, which is known to cause breakdown voltage and long-term reliability of the electric double layer capacitor and the electrolytic capacitor (eg For example, patent document 1).
따라서, 신뢰성이 높은 전기 이중층 캐패시터, 전해 컨덴서를 얻기 위해서는, 전해질로서 사용되는 제4급 암모늄염 중의 제3급 아민 및 제3급 아민의 양성자산염을 감소시킬 필요가 있다.Therefore, in order to obtain highly reliable electric double layer capacitors and electrolytic capacitors, it is necessary to reduce the protonates of the tertiary amine and the tertiary amine in the quaternary ammonium salt used as the electrolyte.
제4급 암모늄염 중의 제3급 아민 및 제3급 아민의 양성자산염의 감소 방법으로서는, 상기 염을 유기 용매 중에서 재결정하는 방법이 알려져 있다(특허 문헌 1, 2).As a method for reducing the protonate of the tertiary amine and the tertiary amine in the quaternary ammonium salt, a method of recrystallizing the salt in an organic solvent is known (Patent Documents 1 and 2).
그러나, 재결정을 행하는 것에 의한 수율의 저하 등, 공업적으로 실시하는 방법으로서는 적절하지 않다. 또한, 제4급 암모늄염이 상온에서 액체 물질인 경우, 재결정을 행하는 것은 곤란하다.However, it is not suitable as an industrial method, such as a fall of a yield by recrystallization. In addition, when the quaternary ammonium salt is a liquid substance at room temperature, it is difficult to recrystallize.
본 발명의 과제는 제4급 암모늄염 중에 불순물로서 포함되는 제3급 아민 및 제3급 아민의 양성자산염을 감소시키는 제4급 암모늄염의 제조 방법을 제공하는 것이다.An object of the present invention is to provide a method for producing a quaternary ammonium salt which reduces the protonates of tertiary amines and tertiary amines contained as impurities in the quaternary ammonium salts.
[특허 문헌 1] 일본 특허 공개 제2000-311839호 공보[Patent Document 1] Japanese Unexamined Patent Publication No. 2000-311839
[특허 문헌 2] 일본 특허 공개 제2004-186246호 공보[Patent Document 2] Japanese Patent Application Laid-Open No. 2004-186246
<발명의 개시><Start of invention>
본 발명은 이하의 발명에 관한 것이다.The present invention relates to the following inventions.
1. (1) 불순물로서 제3급 아민의 양성자산염을 포함하는 제4급 암모늄염에, 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염을 첨가하여, 상기 제3급 아민의 양성자산염을 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염에 의해 중화시켜 제3급 아민과 물로 변환시킴과 동시에 상기 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염은 제4급 암모늄염으로 변환시키고,1. (1) A quaternary ammonium hydroxide salt or quaternary ammonium carbonate is added to a quaternary ammonium salt containing a protonate of a tertiary amine as an impurity, and the protonate of the tertiary amine is added to the fourth. Neutralized by quaternary ammonium hydroxide or quaternary ammonium carbonate to tertiary amine and water, while the quaternary ammonium hydroxide or quaternary ammonium carbonate is converted to quaternary ammonium salt,
(2) 생성된 제3급 아민과 물은 계 밖으로 제거하는 것을 특징으로 하는 고순도 제4급 암모늄염의 제조 방법.(2) A method for producing a high purity quaternary ammonium salt, wherein the produced tertiary amine and water are removed out of the system.
2, (1) 제3급 아민과 치환기를 가질 수도 있는 알킬할라이드를 반응시켜 제4급 암모늄 할라이드염을 얻고,2, (1) reacting a tertiary amine with an alkyl halide which may have a substituent to obtain a quaternary ammonium halide salt,
(2) 이것에 산 화합물을 반응시켜 불순물로서 제3급 아민 양성자산염을 포함하는 제4급 암모늄염을 얻고,(2) an acid compound is reacted to obtain a quaternary ammonium salt containing a tertiary amine protic acid salt as an impurity,
(3) 이것에 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염을 첨가하여, 상기 제3급 아민의 양성자산염을 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염에 의해 중화시켜 제3급 아민과 물로 변환시킴과 동시에 상기 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염은 제4급 암모늄염으로 변환시키고,(3) To this, quaternary ammonium hydroxide or quaternary ammonium carbonate is added, and the protonate of the tertiary amine is neutralized with quaternary ammonium hydroxide or quaternary ammonium carbonate to form tertiary amine And quaternary ammonium hydroxide or quaternary ammonium carbonate to quaternary ammonium salt
(4) 생성된 제3급 아민과 물을 계 밖으로 제거하는 것을 특징으로 하는 고순도 제4급 암모늄염의 제조 방법.(4) A method for producing a high purity quaternary ammonium salt, wherein the produced tertiary amine and water are removed from the system.
본 발명에 있어서 제3급 아민의 양성자산염이란, 분자 중에 방출 가능한 H+를 가지고 있는 제3급 아민염을 말한다.In this invention, the protonate of a tertiary amine means the tertiary amine salt which has H <+> which can be released in a molecule | numerator.
본 발명은 (1) 불순물로서 제3급 아민의 양성자산염을 포함하는 제4급 암모늄염에, 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염을 첨가하여, 상기 제3급 아민의 양성자산염을 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염에 의해 중화시켜 제3급 아민과 물로 변환시킴과 동시에 상기 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염은 제4급 암모늄염으로 변환시키고, (2) 생성된 제3급 아민과 물은 계 밖으로 제거하는 고순도 제4급 암모늄염의 제조 방법이다.(1) The quaternary ammonium hydroxide salt or the quaternary ammonium carbonate is added to the quaternary ammonium salt containing the protonate of the tertiary amine as an impurity to remove the protonate of the tertiary amine. Neutralized by quaternary ammonium hydroxide or quaternary ammonium carbonate to tertiary amine and water, while quaternary ammonium hydroxide or quaternary ammonium carbonate is converted to quaternary ammonium salt, (2) The resulting tertiary amine and water are a process for producing a high purity quaternary ammonium salt which is removed out of the system.
본 발명에서 사용되는 제4급 암모늄염의 제4급 암모늄 양이온으로서는, 예를 들면 테트라알킬암모늄, 테트라알킬포스포늄, 이미다졸륨, 피라졸륨, 피리디늄, 트리아졸륨, 피리다지늄, 티아졸륨, 옥사졸륨, 피리미디늄, 피라지늄 등을 들 수 있다.As the quaternary ammonium cation of the quaternary ammonium salt used in the present invention, for example, tetraalkylammonium, tetraalkylphosphonium, imidazolium, pyrazolium, pyridinium, triazium, pyridazinium, thiazolium, oxa Zolium, pyrimidinium, pyrazinium, etc. are mentioned.
구체적으로는, 예를 들면 하기와 같은 화합물을 나타낼 수 있다.Specifically, the following compounds can be shown, for example.
테트라알킬암모늄으로서는, 테트라에틸암모늄, 테트라메틸암모늄, 테트라프로필암모늄, 테트라부틸암모늄, 트리에틸메틸암모늄, 트리메틸에틸암모늄, 디메틸디에틸암모늄, 트리메틸프로필암모늄, 트리메틸부틸암모늄, 디메틸에틸프로필암모늄, 메틸에틸프로필부틸암모늄, N,N-디메틸피롤리디늄, N-에틸-N-메틸피롤리디늄, N-메틸-N-프로필피롤리디늄, N-에틸-N-프로필피롤리디늄, N,N-디메틸피페리디늄, N-메틸-N-에틸피페리디늄, N-메틸-N-프로필피페리디늄, N-에틸-N-프로필피페리디늄, N,N-디메틸모르폴리늄, N-메틸-N-에틸모르폴리늄, N-메틸-N-프로필모르폴리늄, N-에틸-N-프로필모르폴리늄, 트리메틸메톡시메틸암모늄, 디메틸에틸메톡시메틸암모늄, 디메틸프로필메톡시메틸암모늄, 디메틸부틸메톡시메틸암모늄, 디에틸메틸메톡시메틸암모늄, 메틸에틸프로필메톡시메틸암모늄, 트리에틸메톡시메틸암모늄, 디에틸프로필메톡시메틸암모늄, 디에틸부틸메톡시메틸암모늄, 디프로필메틸메톡시메틸암모늄, 디프로필에틸메톡시메틸암모늄, 트리프로필메톡시메틸암모늄, 트리부틸메톡시메틸암모늄, 트리메틸에톡시메틸암모늄, 디메틸에틸에톡시메틸암모늄, 디메틸프로필에톡시메틸암모늄, 디메틸부틸에톡시메틸암모늄, 디에틸메틸에톡시메틸암모늄, 트리에틸에톡시메틸암모늄, 디에틸프로필에톡시메틸암모늄, 디에틸부틸에톡시메틸암모늄, 디프로필메틸에톡시메틸암모늄, 디프로필에틸에톡시메틸암모늄, 트리프로필에톡시메틸암모늄, 트리부틸에톡시메틸암모늄, N-메틸-N-메톡시메틸피롤리디늄, N-에틸-N-메톡시메틸피롤리디늄, N-프로필-N-메톡시메틸피롤리디늄, N-부틸-N-메톡시메틸피롤리디늄, N-메틸-N-에톡시메틸피롤리디늄, N-메틸-N-프로폭시메틸피롤리디늄, N-메틸-N-부톡시메틸피롤리디늄, N-메틸-N-메톡시메틸피페리디늄, N-에틸-N-메톡시메틸피롤리디늄, N-메틸-N-에톡시메틸피롤리디늄, N-프로필-N-메톡시메틸피롤리디늄, N-메틸-N-프로폭시메틸피롤리디늄, 4-아조니아스피로[3,4]옥탄, 3-아조니아스피로[2,4]헵탄, 5-아조니아스피로[4,4]노난, 6-아조니아스피로[5,5]운데칸 등을 들 수 있다.As tetraalkylammonium, tetraethylammonium, tetramethylammonium, tetrapropylammonium, tetrabutylammonium, triethylmethylammonium, trimethylethylammonium, dimethyldiethylammonium, trimethylpropylammonium, trimethylbutylammonium, dimethylethylpropylammonium, methylethyl Propylbutylammonium, N, N-dimethylpyrrolidinium, N-ethyl-N-methylpyrrolidinium, N-methyl-N-propylpyrrolidinium, N-ethyl-N-propylpyrrolidinium, N, N- Dimethylpiperidinium, N-methyl-N-ethylpiperidinium, N-methyl-N-propylpiperidinium, N-ethyl-N-propylpiperidinium, N, N-dimethylmorpholinium, N-methyl -N-ethylmorpholinium, N-methyl-N-propylmorpholinium, N-ethyl-N-propylmorpholinium, trimethylmethoxymethylammonium, dimethylethylmethoxymethylammonium, dimethylpropylmethoxymethylammonium, Dimethylbutylmethoxymethylammonium, diethylmethylmethoxymethylammonium, methylethyl Lofilmethoxymethylammonium, Triethylmethoxymethylammonium, Diethylpropylmethoxymethylammonium, Diethylbutylmethoxymethylammonium, Dipropylmethylmethoxymethylammonium, Dipropylethylmethoxymethylammonium, Tripropylmethoxymethyl Ammonium, Tributylmethoxymethylammonium, Trimethylethoxymethylammonium, Dimethylethylethoxymethylammonium, Dimethylpropylethoxymethylammonium, Dimethylbutylethoxymethylammonium, Diethylmethylethoxymethylammonium, Triethylethoxymethylammonium , Diethylpropylethoxymethylammonium, diethylbutylethoxymethylammonium, dipropylmethylethoxymethylammonium, dipropylethylethoxymethylammonium, tripropylethoxymethylammonium, tributylethoxymethylammonium, N-methyl -N-methoxymethylpyrrolidinium, N-ethyl-N-methoxymethylpyrrolidinium, N-propyl-N-methoxymethylpyrrolidinium, N-butyl-N-methoxymethylpyrrolidinium, N -methyl -N-ethoxymethylpyrrolidinium, N-methyl-N-propoxymethylpyrrolidinium, N-methyl-N-butoxymethylpyrrolidinium, N-methyl-N-methoxymethylpiperidinium, N -Ethyl-N-methoxymethylpyrrolidinium, N-methyl-N-ethoxymethylpyrrolidinium, N-propyl-N-methoxymethylpyrrolidinium, N-methyl-N-propoxymethylpyrrolidinium , 4-azoniaspiro [3,4] octane, 3-azoniaspiro [2,4] heptane, 5-azoniaspiro [4,4] nonane, 6-azoniaspiro [5,5] undecane, etc. Can be mentioned.
테트라알킬포스포늄으로서는, 테트라에틸포스포늄, 테트라메틸포스포늄, 테트라프로필포스포늄, 테트라부틸포스포늄, 트리에틸메틸포스포늄, 트리메틸에틸포스포늄, 디메틸디에틸포스포늄, 트리메틸프로필포스포늄, 트리메틸부틸포스포늄, 디메틸에틸프로필포스포늄, 메틸에틸프로필부틸포스포늄 등을 들 수 있다.As tetraalkyl phosphonium, tetraethyl phosphonium, tetramethyl phosphonium, tetrapropyl phosphonium, tetrabutyl phosphonium, triethylmethyl phosphonium, trimethyl ethyl phosphonium, dimethyl diethyl phosphonium, trimethyl propyl phosphonium, trimethyl butyl Phosphonium, dimethyl ethyl propyl phosphonium, methyl ethyl propyl butyl phosphonium, and the like.
이미다졸륨으로서는, 1,3-디메틸이미다졸륨, 1-에틸-3-메틸이미다졸륨, 1,3-디에틸이미다졸륨, 1,2-디메틸-3-에틸이미다졸륨, 1,2-디메틸-3-프로필이미다졸륨 등을 들 수 있다.Examples of imidazolium include 1,3-dimethylimidazolium, 1-ethyl-3-methylimidazolium, 1,3-diethylimidazolium, 1,2-dimethyl-3-ethylimidazolium, 1, 2-dimethyl-3-propyl imidazolium etc. are mentioned.
피라졸륨으로서는, 1,2-디메틸피라졸륨, 1-메틸-2-에틸피라졸륨, 1-프로필-2-메틸피라졸륨, 1-메틸-2-부틸피라졸륨 등을 들 수 있다.Examples of pyrazolium include 1,2-dimethylpyrazolium, 1-methyl-2-ethylpyrazolium, 1-propyl-2-methylpyrazolium, 1-methyl-2-butylpyrazolium and the like.
피리디늄으로서는, N-메틸피리디늄, N-에틸피리디늄, N-프로필피리디늄, N-부틸피리디늄 등을 들 수 있다.Examples of pyridinium include N-methylpyridinium, N-ethylpyridinium, N-propylpyridinium, and N-butylpyridinium.
트리아졸륨로서는, 1-메틸트리아졸륨, 1-에틸트리아졸륨, 1-프로필트리아졸륨, 1-부틸트리아졸륨 등을 들 수 있다.Examples of the triazolium include 1-methyltriazolium, 1-ethyltriazolium, 1-propyltriazolium, 1-butyltriazolium and the like.
피리다지늄로서는, 1-메틸피리다지늄, 1-에틸피리다지늄, 1-프로필피리다지늄, 1-부틸피리다지늄 등을 들 수 있다.Examples of the pyridazinium include 1-methylpyridazinium, 1-ethylpyridazinium, 1-propylpyridazinium, 1-butylpyridazinium and the like.
티아졸륨으로서는, 1,2-디메틸티아졸륨, 1,2-디메틸-3-프로필티아졸륨 등을 들 수 있다.Examples of thiazolium include 1,2-dimethylthiazolium and 1,2-dimethyl-3-propylthiazolium.
옥사졸륨로서는, 1-에틸-2-메틸옥사졸륨, 1,3-디메틸옥사졸륨 등을 들 수 있다.Examples of oxazolium include 1-ethyl-2-methyloxazolium, 1,3-dimethyloxazolium and the like.
피리미디늄으로서는, 1,2-디메틸피리미디늄, 1-메틸-3-프로필피리미디늄 등을 들 수 있다.Examples of pyrimidinium include 1,2-dimethylpyrimidinium, 1-methyl-3-propylpyrimidinium, and the like.
피라지늄로서는, 1-에틸-2-메틸피라지늄, 1-부틸피라지늄 등을 들 수 있다.Examples of pyrazinium include 1-ethyl-2-methylpyrazinium and 1-butylpyrazinium.
본 발명에서 사용되는 제4급 암모늄염의 음이온으로서는, 예를 들면 CF3CO2 -, CF3SO3 -, BF4 -, AlF4 -, ClBF3 -, (FSO2)2N-, PF6 -, AsF6 -, ClO4 -, N(CF3SO3)2 -, C(CF3SO3)3 -, RfSO3 -, RfCO2 -(단, Rf는 탄소수 1 내지 8의 플루오로알킬기를 나타냄), (Rr1SO2)(Rr2SO2)N-, (Rr1SO2)(Rr2CO2)-(단, Rr1, Rr2는 탄소수 1 내지 8의 플루오로알킬기를 나타내고, Rr1, Rr2는 동일하거나 상이할 수도 있음) 등을 들 수 있다. 바람직하게는 CF3CO2 -, CF3SO3 -, BF4 -, AlF4 -, ClBF3 - 또는 (FSO2)2N-을 들 수 있다.As the anion of the quaternary ammonium salt used in the present invention, for instance CF 3 CO 2 -, CF 3 SO 3 -, BF 4 -, AlF 4 -, ClBF 3 -, (FSO 2) 2 N -, PF 6 -, AsF 6 -, ClO 4 -, N (CF 3 SO 3) 2 -, C (CF 3 SO 3) 3 -, RfSO 3 -, RfCO 2 - ( However, Rf is a fluoroalkyl group having 1 to 8 carbon atoms the indicated), (R r1 SO 2) (R r2 SO 2) N -, (R r1 SO 2) (R r2 CO 2) - ( However, R r1, R r2 is a fluoroalkyl group having 1 to 8 carbon atoms And R r1 and R r2 may be the same or different). Preferably CF 3 CO 2 - may be mentioned -, CF 3 SO 3 -, BF 4 -, AlF 4 -, ClBF 3 - or (FSO 2) 2 N.
본 발명에서 사용되는 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염의 제4급 암모늄 양이온으로서는, 상기 제4급 암모늄염의 제4급 암모늄 양이온으로 열거된 것과 동일한 것을 들 수 있다. Examples of the quaternary ammonium cation of the quaternary ammonium hydroxide or quaternary ammonium carbonate used in the present invention include the same as those listed as the quaternary ammonium cations of the quaternary ammonium salt.
본 발명의 불순물인 제3급 아민의 양성자산염은 제4급 암모늄염을 제조할 때에 생성된다. 또한, 제4급 암모늄염이 열 분해를 받았을 때도 생성된다. 구체적으로는, 예를 들면 N-메톡시메틸-N-메틸피롤리디늄의 BF4염을 합성할 때, 원료의 클로로메틸메틸에테르에 불순물로서 포함되는 염산이, 또 하나의 원료인 3급 아민의 메틸피롤리딘과 반응하여 메틸피롤리딘의 양성자산염을 생성한다. 또는 메틸피롤리딘, 또한 용매에 포함되는 미량의 물에 의해서 클로로메틸메틸에테르가 가수분해되어, 염산을 생성, 동일 반응에 의해 메틸피롤리딘의 양성자산염을 생성한다. 상기 양성자산염은 HBF4를 사용한 염 변환 반응에 의해 제거가 매우 곤란한 메틸피롤리딘의 HBF4염이 된다. 또한 BF4염 합성을 고온 130 내지 200 ℃에서 행한 경우에도 N-메톡시메틸-N-메틸피롤리디늄염(염산염, BF4염)의 열 분해에 의해 소량이지만, 메틸피롤리딘의 HBF4염이 생성된다. 또한 메틸피롤리딘을 과잉으로 사용한 경우, N-메톡시메틸-N-메틸피롤리디늄염산염 중에 메틸피롤리딘이 잔존하고, 계속되는 HBF4염으로의 변환에서 N-메틸피롤리디늄의 HBF4염을 생성한다.The protonate of the tertiary amine, which is an impurity of the present invention, is produced when the quaternary ammonium salt is prepared. It is also produced when the quaternary ammonium salt undergoes thermal decomposition. Specifically, for example, when synthesizing the BF 4 salt of N-methoxymethyl-N-methylpyrrolidinium, hydrochloric acid contained as an impurity in chloromethylmethyl ether of the raw material is a tertiary amine which is another raw material. Reacts with methylpyrrolidine to produce a protonate of methylpyrrolidine. Or chloromethylmethyl ether is hydrolyzed by methylpyrrolidine or a trace amount of water contained in the solvent to produce hydrochloric acid, thereby producing a protic acid salt of methylpyrrolidine by the same reaction. The protic acid salt becomes HBF 4 salt of methylpyrrolidine which is very difficult to remove by a salt conversion reaction using HBF 4 . In addition, even when BF 4 salt synthesis was carried out at a high temperature of 130 to 200 ° C., a small amount was obtained by thermal decomposition of N-methoxymethyl-N-methylpyrrolidinium salt (hydrochloride, BF 4 salt), but HBF 4 of methylpyrrolidin Salts are formed. In case of using the methylpyrrolidine in excess, N- methoxymethyl -N- methylpyrrolidin-pyridinium hydrochloride in the methylpyrrolidine and the residual, ensuing N- methylpyrrolidone in a change to a pyridinium HBF 4 salt HBF 4 Produces a salt.
제3급 아민으로서는, 구체적으로는, 예를 들면 하기와 같은 화합물을 나타낼 수 있다.Specifically as a tertiary amine, the following compounds can be shown, for example.
트리에틸아민, 트리메틸아민, 트리프로필아민, 트리부틸아민, 디메틸에틸아민, 디메틸프로필아민, 디메틸부틸아민, 디에틸메틸아민, 디에틸프로필아민, 디에틸부틸아민, 디프로필부틸아민, 디부틸프로필아민, 메틸에틸프로필아민, 메틸에틸부틸아민, 에틸프로필부틸아민, N-메틸피롤리딘, N-에틸피롤리딘, N-프로필피롤리딘, N-부틸피롤리딘, N-메틸피페리딘, N-에틸피페리딘, N-프로필피페리딘, N-부틸피페리딘, N-메틸모르폴린, N-에틸모르폴린, N-프로필모르폴린, N-부틸모르폴린, 디메틸메톡시메틸아민, 디에틸메톡시메틸아민, 디프로필메톡시메틸아민, 디부틸메톡시메틸아민, 에틸메틸메톡시메틸아민, 메틸프로필메톡시메틸아민, 메틸부틸메톡시메틸아민, 에틸프로필메톡시메틸아민, 에틸부틸메톡시메틸아민, 프로필부틸메톡시메틸아민, 디메틸에톡시메틸아민, 디에틸에톡시메틸아민, 디프로필에톡시메틸아민, 디부틸에톡시메틸아민, 에틸메틸에톡시메틸아민, 메틸프로필에톡시메틸아민, 에틸프로필에톡시메틸아민, 에틸부틸에톡시메틸아민, 프로필부틸에톡시메틸아민, N-메톡시메틸피롤리딘, N-에톡시메틸피롤리딘, N-프로폭시메틸피롤리딘, N-부톡시메틸피롤리딘, N-에톡시메틸피롤리딘, N-프로폭시메틸피롤리딘 등을 들 수 있다. Triethylamine, trimethylamine, tripropylamine, tributylamine, dimethylethylamine, dimethylpropylamine, dimethylbutylamine, diethylmethylamine, diethylpropylamine, diethylbutylamine, dipropylbutylamine, dibutylpropyl Amine, methylethylpropylamine, methylethylbutylamine, ethylpropylbutylamine, N-methylpyrrolidine, N-ethylpyrrolidine, N-propylpyrrolidine, N-butylpyrrolidine, N-methylpiperi Dean, N-ethylpiperidine, N-propylpiperidine, N-butylpiperidine, N-methylmorpholine, N-ethylmorpholine, N-propylmorpholine, N-butylmorpholine, dimethylmethoxy Methylamine, diethylmethoxymethylamine, dipropylmethoxymethylamine, dibutylmethoxymethylamine, ethylmethylmethoxymethylamine, methylpropylmethoxymethylamine, methylbutylmethoxymethylamine, ethylpropylmethoxymethyl Amine, ethylbutylmethoxymethylamine, propylbutylmethoxymethylamine, dimethyl Methylamine, diethylethoxymethylamine, dipropylethoxymethylamine, dibutylethoxymethylamine, ethylmethylethoxymethylamine, methylpropylethoxymethylamine, ethylpropylethoxymethylamine, ethylbutylethoxy Methylamine, propylbutylethoxymethylamine, N-methoxymethylpyrrolidine, N-ethoxymethylpyrrolidine, N-propoxymethylpyrrolidine, N-butoxymethylpyrrolidine, N-ethoxy Methyl pyrrolidine, N-propoxymethylpyrrolidine, etc. are mentioned.
1-메틸이미다졸, 1-에틸이미다졸, 1,2-디메틸이미다졸, 1-메틸-2-에틸이미다졸 등을 들 수 있다.1-methylimidazole, 1-ethylimidazole, 1,2-dimethylimidazole, 1-methyl-2-ethylimidazole, etc. are mentioned.
피라졸륨으로서는, 1-메틸피라졸, 1-에틸피라졸, 1-프로필피라졸, 3-메틸피라졸 등을 들 수 있다.As pyrazolium, 1-methylpyrazole, 1-ethylpyrazole, 1-propylpyrazole, 3-methylpyrazole, etc. are mentioned.
피리딘, 트리아졸, 피리다진, 피라진, 1-메틸티아졸, 1-메틸옥사졸 등을 들 수 있다.Pyridine, triazole, pyridazine, pyrazine, 1-methylthiazole, 1-methyloxazole, etc. are mentioned.
또한, 제3급 아민의 양성자산염으로서는, 구체적으로는 상기 제3급 아민의 CF3CO2H, CF3SO3H, HBF4, HAlF4, HClBF3 또는 (FSO2)2NH, HPF6, HAsF6, HClO4, NH(CF3SO3)2, HC(CF3SO3)3, RfSO3H, RfCO2H(단, Rf는 탄소수 1 내지 8의 플루오로알킬기를 나타냄), (Rr1SO2)(Rr2SO2)NH, (Rr1SO2)(Rr2CO2)H(단, Rr1, Rr2는 탄소수 1 내지 8의 플루오로알킬기를 나타내고, Rr1, Rr2는 동일하거나 상이할 수도 있음) 등의 양성자산의 염을 들 수 있다.As the protic acid salt of the tertiary amine, specifically, the tertiary amine CF 3 CO 2 H, CF 3 SO 3 H, HBF 4 , HAlF 4 , HClBF 3 or (FSO 2 ) 2 NH, HPF 6 , HAsF 6 , HClO 4 , NH (CF 3 SO 3 ) 2 , HC (CF 3 SO 3 ) 3 , RfSO 3 H, RfCO 2 H (where Rf represents a fluoroalkyl group having 1 to 8 carbon atoms), ( R r1 SO 2 ) (R r2 SO 2 ) NH, (R r1 SO 2 ) (R r2 CO 2 ) H (wherein R r1 , R r2 represents a fluoroalkyl group having 1 to 8 carbon atoms, R r1 , R r2 may be the same or different).
본 발명의 고순도 제4급 암모늄염의 제조 방법을 이하에 설명한다.The manufacturing method of the high purity quaternary ammonium salt of this invention is demonstrated below.
원료의 제3급 아민과 치환기를 가질 수도 있는 알킬할라이드를 반응시킴으로써 제4급 암모늄 할라이드염이 제조된다. 다음에 제4급 암모늄 할라이드염과 산 화합물과 반응시킴으로써 제4급 암모늄염이 제조된다.The quaternary ammonium halide salt is prepared by reacting a tertiary amine of a raw material with an alkyl halide which may have a substituent. The quaternary ammonium salt is then prepared by reacting the quaternary ammonium halide salt with an acid compound.
산 화합물로서는, 예를 들면 CF3CO2H, CF3SO3H, HBF4, HAlF4, HClBF3, (FSO2)2NH, HPF6, HAsF6, HClO4, NH(CF3SO3)2, CH(CF3SO3)3, RfSO3H, RfCO2H(단, Rf는 탄소수 1 내지 8의 플루오로알킬기를 나타냄), (Rr1SO2)(Rr2SO2)NH, (Rr1SO2)(Rr2CO2)H(단, Rr1, Rr2는 탄소수 1 내지 8의 플루오로알킬기를 나타내고, Rr1, Rr2는 동일하거나 상이할 수도 있음) 등을 들 수 있다. 바람직하게는 CF3CO2H, CF3SO3H, HBF4, HAlF4, HClBF3 또는 (FSO2)2NH를 들 수 있다.As the acid compound, for example, CF 3 CO 2 H, CF 3 SO 3 H, HBF 4 , HAlF 4 , HClBF 3 , (FSO 2 ) 2 NH, HPF 6 , HAsF 6 , HClO 4 , NH (CF 3 SO 3 ) 2 , CH (CF 3 SO 3 ) 3 , RfSO 3 H, RfCO 2 H (where Rf represents a fluoroalkyl group having 1 to 8 carbon atoms), (R r1 SO 2 ) (R r2 SO 2 ) NH, (R r1 SO 2 ) (R r2 CO 2 ) H, provided that R r1 and R r2 represent a fluoroalkyl group having 1 to 8 carbon atoms, and R r1 and R r2 may be the same or different. have. Preferably CF 3 CO 2 H, CF 3 SO 3 H, HBF 4 , HAlF 4 , HClBF 3 or (FSO 2 ) 2 NH.
이 때, 상기 제4급 암모늄염 중에는, 원료 유래의 제3급 아민으로부터 제3급 아민의 양성자산염이 불순물로서 미량 포함된다.At this time, in the quaternary ammonium salt, a trace amount of the protonate of the tertiary amine is contained as an impurity from the tertiary amine derived from the raw material.
이어서, 상기 불순물이 함유한 상기 제4급 암모늄염에, 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염을 첨가하여 반응(중화)시킨다. 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염의 첨가량으로서는, 제3급 아민의 양성자산염의 몰수에 대하여 0.5 내지 10 당량, 바람직하게는 0.5 내지 2 당량, 더욱 바람직하게는 1 내지 2 당량이 좋다.Subsequently, quaternary ammonium hydroxide or quaternary ammonium carbonate is added to the quaternary ammonium salt containing the impurity to react (neutralize). As the addition amount of the quaternary ammonium hydroxide or the quaternary ammonium carbonate, 0.5 to 10 equivalents, preferably 0.5 to 2 equivalents, and more preferably 1 to 2 equivalents, relative to the number of moles of the protonate of the tertiary amine .
첨가하는 온도로서는, -20 ℃ 내지 200 ℃, 바람직하게는 10 ℃ 내지 100 ℃가 좋다. 더욱 바람직하게는 25 ℃ 내지 80 ℃가 좋다. 반응 시간은 10 분간 내지 20 시간, 바람직하게는 30 분간 내지 5 시간이 좋다.As temperature to add, -20 degreeC-200 degreeC, Preferably 10 degreeC-100 degreeC is good. More preferably, 25 to 80 degreeC is good. The reaction time is 10 minutes to 20 hours, preferably 30 minutes to 5 hours.
반응 후, 제4급 암모늄 수산화물염 또는 제4급 암모늄 탄산염은 제4급 암모늄염으로 변환되고, 제3급 아민의 양성자산염은 제3급 아민과 물로 변환된다. 제3급 아민 및 물의 증류 제거 방법은 통상법에 의해 증류할 수 있고, 감압 또는 가열하거나, 이들을 조합할 수도 있다. 또한, 가열을 행하면서, 제4급 암모늄산성염과 반응하지 않는 질소, 아르곤, 공기 등을 취입하여 제거를 행할 수 있다.After the reaction, the quaternary ammonium hydroxide or quaternary ammonium carbonate is converted to quaternary ammonium salt, and the protonate of the tertiary amine is converted to tertiary amine and water. The method of distilling off tertiary amine and water can be distilled by a conventional method, and can also be reduced-pressure or heating, or these can be combined. Moreover, while heating, nitrogen, argon, air, etc. which do not react with a quaternary ammonium acid salt can be blown in and removed.
제3급 아민, 물을 증류 제거하는 온도는 20 내지 200 ℃, 바람직하게는 90 내지 170 ℃가 좋다. 시간은 0.5 내지 24 시간, 바람직하게는 5 내지 18 시간이 좋다.The temperature at which the tertiary amine and water are distilled off is 20 to 200 ° C, preferably 90 to 170 ° C. The time is 0.5 to 24 hours, preferably 5 to 18 hours.
불순물 제거 후의 제4급 암모늄염은 불순물인 제3급 아민, 제3급 아민의 양성자산염이 감소되어 있다. The quaternary ammonium salt after impurity removal has reduced protonates of tertiary amines and tertiary amines as impurities.
본 발명에서 제조되는 고순도 제4급 암모늄염은 전기 이중층 캐패시터, 전해 컨덴서, 전지 등의 전해질 또는 전해액으로서 바람직하게 사용할 수 있다. 이러한 비수전해액용 전해질에 요구되는 전해질 중의 제3급 아민의 양성자산염의 함유량은 전기 이중층 캐패시터, 전해 컨덴서 또는 전지 내전압의 저하, 장기간 신뢰성 저하의 관점에서 보다 적을수록 좋다. 바람직하게는 200 ppm 이하, 더욱 바람직하게는 100 ppm 이하, 특히 바람직하게는 30 ppm 이하가 좋다. 가장 바람직하게는 10 ppm 이하가 좋다.The high-purity quaternary ammonium salt produced in the present invention can be suitably used as an electrolyte or an electrolyte such as an electric double layer capacitor, an electrolytic capacitor, a battery, and the like. The content of the protonate of the tertiary amine in the electrolyte required for such a nonaqueous electrolyte electrolyte is preferably smaller from the viewpoint of lowering the electric double layer capacitor, the electrolytic capacitor or the battery breakdown voltage, and the long term reliability. Preferably it is 200 ppm or less, More preferably, it is 100 ppm or less, Especially preferably, it is 30 ppm or less. Most preferably, it is 10 ppm or less.
제3급 아민의 양성자산염의 농도는 액체 크로마토그래피에 의해 분석할 수 있다. 액체 크로마토그래피에 의한 분석은, 예를 들면 다음에 나타내는 조건에서 행할 수 있다.The concentration of the protonate of the tertiary amine can be analyzed by liquid chromatography. Analysis by liquid chromatography can be performed, for example, on the conditions shown below.
칼럼 이너트실(Inertsil)Column Inertsil
ODS-3 250 mm×4.6 mm I.D. 5.0 μm(지엘 사이언스사 제조), 검출기 L-7490 RI 검출기(히타치 세이사꾸쇼사 제조), 이동상{Na2HPO4 1 mM+KH2PO4 9 mM+NaClO4 100 mM}/H2O, 유속 1.0 mL/분, 칼럼 온도 40 ℃.ODS-3 250mm * 4.6mm ID 5.0μm (made by GE Science), detector L-7490 RI detector (made by Hitachi Seisakusho), mobile phase {Na 2 HPO 4 1 mM + KH 2 PO 4 9 mM + NaClO 4 100 mM} / H 2 O, flow rate 1.0 mL / min, column temperature 40 ° C.
<발명을 실시하기 위한 최선의 형태>Best Mode for Carrying Out the Invention
이하, 본 발명을 실시예에 기초하여 구체적으로 설명하지만 이것으로 조금도 한정되지 않는다.EMBODIMENT OF THE INVENTION Hereinafter, although this invention is demonstrated concretely based on an Example, it is not limited to this at all.
실시예 1Example 1
노점 -60 ℃의 아르곤 분위기의 글로브 박스 내에서, N-메틸피롤리딘ㆍHBF4염 410 ppm을 함유하는 N-메톡시메틸-N-메틸피롤리디늄테트라플루오로보레이트 100 g에 N,N,N-트리에틸-N-메틸암모늄히드록시드 수용액(35 중량%) 0.2 g을 첨가하고, 130 ℃에서 질소를 5 L/분으로 흡입하면서 2 시간 반응시켰다. 반응 종료 후, 1 mmHg의 감압하에 25 ℃에서 1 시간 유지하였다. 노점 -60 ℃의 아르곤 가스로써 상압으로 복귀시키고, 분석에 사용하였다. N-메틸피롤리딘ㆍHBF4염의 함유량은 검출 한계(10 ppm) 이하였다.N, N to N-methoxymethyl-N-methylpyrrolidinium tetrafluoroborate containing 410 ppm of N-methylpyrrolidine / HBF 4 salt in a glove box having an dew point of -60 ° C in an argon atmosphere. 0.2 g of, N-triethyl-N-methylammonium hydroxide aqueous solution (35% by weight) was added and reacted for 2 hours while inhaling nitrogen at 5 L / min at 130 ° C. After the completion of the reaction, the mixture was kept at 25 ° C for 1 hour under a reduced pressure of 1 mmHg. The dew point was returned to normal pressure with argon gas at -60 ° C and used for analysis. The content of N-methylpyrrolidine-HBF 4 salt was below the detection limit (10 ppm).
실시예 2Example 2
N-메틸피롤리딘ㆍHBF4염 410 ppm을 함유하는 N-메톡시메틸-N-메틸피롤리디늄테트라플루오로보레이트 100 g에 N,N,N-트리에틸-N-메틸암모늄히드록시드 수용액(35 중량%) 0.2 g을 첨가하고, 120 ℃에서 질소를 5 L/분으로 흡입하면서 2 시 간 반응시켰다. N-메틸피롤리딘ㆍHBF4염의 함유량은 검출 한계(10 ppm) 이하였다.N, N, N-triethyl-N-methylammonium hydroxide to 100 g of N-methoxymethyl-N-methylpyrrolidinium tetrafluoroborate containing 410 ppm of N-methylpyrrolidine / HBF 4 salt 0.2 g of aqueous solution (35% by weight) was added and reacted for 2 hours while inhaling nitrogen at 5 L / min at 120 ° C. The content of N-methylpyrrolidine-HBF 4 salt was below the detection limit (10 ppm).
실시예 3Example 3
노점 -60 ℃의 아르곤 분위기의 글로브 박스 내에서, N-메틸피롤리딘ㆍHBF4염 410 ppm을 함유하는 N-메톡시메틸-N-메틸피롤리디늄테트라플루오로보레이트 100 g에 N-메톡시메틸-N-메틸피롤리디늄히드록시드 0.23 g을 첨가하고, 130 ℃에서 질소를 5 L/분으로 흡입하면서 2 시간 반응시켰다. 반응 종료 후, 1 mmHg의 감압하에 25 ℃에서 1 시간 유지하였다. 노점 -60 ℃의 아르곤 가스로써 상압으로 복귀시키고, 분석에 사용하였다. N-메틸피롤리딘ㆍHBF4염의 함유량은 검출 한계(10 ppm) 이하였다.N-methoxymethyl-N-methylpyrrolidiniumtetrafluoroborate containing 410 ppm of N-methylpyrrolidine / HBF 4 salt in a glove box having an dew point of -60 ° C in N-meth 0.23 g of oxymethyl-N-methylpyrrolidinium hydroxide was added, and it reacted for 2 hours, taking inhalation of nitrogen at 5 L / min at 130 degreeC. After the completion of the reaction, the mixture was kept at 25 ° C for 1 hour under a reduced pressure of 1 mmHg. The dew point was returned to normal pressure with argon gas at -60 ° C and used for analysis. The content of N-methylpyrrolidine-HBF 4 salt was below the detection limit (10 ppm).
실시예 4Example 4
N-메틸피롤리딘ㆍHBF4염 410 ppm을 함유하는 N-메톡시메틸-N-메틸피롤리디늄테트라플루오로보레이트 100 g에 N-메톡시메틸-N-메틸피롤리디늄히드록시드 수용액(5 중량%) 1.0 g을 첨가하고, 120 ℃에서 질소를 5 L/분으로 흡입하면서 2 시간 반응시켰다. 반응 종료 후, 1 mmHg의 감압하에 25 ℃에서 1 시간 유지하였다. N-메틸피롤리딘ㆍHBF4염의 함유량은 검출 한계(10 ppm) 이하였다.Aqueous solution of N-methoxymethyl-N-methylpyrrolidinium hydroxide to 100 g of N-methoxymethyl-N-methylpyrrolidinium tetrafluoroborate containing 410 ppm of N-methylpyrrolidin / HBF 4 salt 1.0 g (5% by weight) was added and reacted for 2 hours while inhaling nitrogen at 5 L / min at 120 ° C. After the completion of the reaction, the mixture was kept at 25 ° C for 1 hour under a reduced pressure of 1 mmHg. The content of N-methylpyrrolidine-HBF 4 salt was below the detection limit (10 ppm).
실시예 5Example 5
트리에틸아민ㆍHBF4염 100 ppm을 함유하는 트리에틸메틸암모늄테트라플루오로보레이트 50 g을 메틸알코올 70 g에 용해시키고, N,N,N-트리에틸-N-메틸암모늄히 드록시드의 메틸알코올 용액(20 중량%) 0.2 g을 첨가하고, 120 ℃에서 질소를 5 L/분으로 흡입하면서 12 시간 반응시켰다. 트리에틸아민ㆍHBF4염의 함유량은 검출 한계(10 ppm) 이하였다.50 g of triethylmethylammonium tetrafluoroborate containing 100 ppm of triethylamine and HBF 4 salt are dissolved in 70 g of methyl alcohol, and methyl alcohol of N, N, N-triethyl-N-methylammonium hydroxide. 0.2 g of a solution (20 wt%) was added and reacted for 12 hours while inhaling nitrogen at 5 L / min at 120 ° C. The content of triethylamine-HBF 4 salt was below the detection limit (10 ppm).
실시예 6Example 6
트리에틸아민ㆍHBF4염 100 ppm을 함유하는 트리에틸메틸암모늄테트라플루오로보레이트 50 g을 물 50 g에 용해시키고, N,N,N-트리에틸-N-메틸암모늄히드록시드 수용액(35 중량%) 0.1 g을 첨가하고, 120 ℃에서 질소를 5 L/분으로 흡입하면서 12 시간 반응시켰다. 트리에틸아민ㆍHBF4염의 함유량은 검출 한계(10 ppm) 이하였다.50 g of triethylmethylammonium tetrafluoroborate containing 100 ppm of triethylamine and HBF 4 salts were dissolved in 50 g of water, and an aqueous solution of N, N, N-triethyl-N-methylammonium hydroxide (35 weight %) 0.1 g was added and reacted for 12 hours, inhaling nitrogen at 5 L / min at 120 degreeC. The content of triethylamine-HBF 4 salt was below the detection limit (10 ppm).
본 발명에 따르면, 제4급 암모늄염 중에 불순물로서 포함되는 제3급 아민 및 제3급 아민의 양성자산염을 감소시킬 수 있다.According to the present invention, it is possible to reduce the protic acid salts of the tertiary amine and the tertiary amine contained as impurities in the quaternary ammonium salt.
불순물을 감소시킨 제4급 암모늄염은 전기 이중층 캐패시터나 전해 컨덴서 등의 축전 소자의 전해질로서 바람직하게 사용할 수 있다. The quaternary ammonium salt which reduced impurities can be used suitably as electrolyte of electrical storage elements, such as an electric double layer capacitor and an electrolytic capacitor.
또한, 상기 전해질을 사용한 전기 이중층 캐패시터, 전해 컨덴서는 내전압 및 장기간 신뢰성을 향상시킬 수 있다.In addition, the electric double layer capacitor and the electrolytic capacitor using the electrolyte can improve the breakdown voltage and long-term reliability.
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