KR100964653B1 - 광 테이프를 이용한 대면적 x선 검출장치의 제조 방법 - Google Patents
광 테이프를 이용한 대면적 x선 검출장치의 제조 방법 Download PDFInfo
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- KR100964653B1 KR100964653B1 KR1020080015453A KR20080015453A KR100964653B1 KR 100964653 B1 KR100964653 B1 KR 100964653B1 KR 1020080015453 A KR1020080015453 A KR 1020080015453A KR 20080015453 A KR20080015453 A KR 20080015453A KR 100964653 B1 KR100964653 B1 KR 100964653B1
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- panel
- optical tape
- scintillator
- scintillator panel
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- 230000003287 optical effect Effects 0.000 title claims abstract description 54
- 238000000034 method Methods 0.000 title claims abstract description 16
- 238000001514 detection method Methods 0.000 claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 claims abstract description 21
- 230000001681 protective effect Effects 0.000 claims abstract description 21
- 238000002834 transmittance Methods 0.000 claims description 4
- 238000003825 pressing Methods 0.000 abstract description 5
- 239000000463 material Substances 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XQPRBTXUXXVTKB-UHFFFAOYSA-M caesium iodide Chemical compound [I-].[Cs+] XQPRBTXUXXVTKB-UHFFFAOYSA-M 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 241001503485 Mammuthus Species 0.000 description 1
- 241000505673 Scintilla Species 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000011976 chest X-ray Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B42/00—Obtaining records using waves other than optical waves; Visualisation of such records by using optical means
- G03B42/02—Obtaining records using waves other than optical waves; Visualisation of such records by using optical means using X-rays
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B6/00—Apparatus or devices for radiation diagnosis; Apparatus or devices for radiation diagnosis combined with radiation therapy equipment
- A61B6/50—Apparatus or devices for radiation diagnosis; Apparatus or devices for radiation diagnosis combined with radiation therapy equipment specially adapted for specific body parts; specially adapted for specific clinical applications
- A61B6/51—Apparatus or devices for radiation diagnosis; Apparatus or devices for radiation diagnosis combined with radiation therapy equipment specially adapted for specific body parts; specially adapted for specific clinical applications for dentistry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/2002—Optical details, e.g. reflecting or diffusing layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/115—Devices sensitive to very short wavelength, e.g. X-rays, gamma-rays or corpuscular radiation
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- Health & Medical Sciences (AREA)
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Molecular Biology (AREA)
- High Energy & Nuclear Physics (AREA)
- Medical Informatics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Optics & Photonics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Dentistry (AREA)
- Electromagnetism (AREA)
- Biophysics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Power Engineering (AREA)
- Pathology (AREA)
- Radiology & Medical Imaging (AREA)
- Biomedical Technology (AREA)
- Heart & Thoracic Surgery (AREA)
- Surgery (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Measurement Of Radiation (AREA)
Abstract
Description
Claims (5)
- X선을 검출하여 이미지를 획득하는 대면적 X선 검출장치의 제조 방법에 있어서,센서 패널, 신틸레이터 패널 및 제1보호필름과 제2보호필름으로 양면이 보호된 광 테이프를 진공 챔버 내에 준비하는 단계;상기 제1보호필름을 제거한 상기 광 테이프를 상기 센서 패널 상에 위치시키는 단계;상기 광 테이프를 롤러로 압착하여 상기 센서 패널에 부착하되, 상기 광 테이프의 일 측 하부에서부터 타 측 하부까지 순차적으로 압착하여 부착하는 단계;상기 광 테이프의 상기 제2보호필름을 제거하는 단계;상기 광 테이프가 부착된 상기 센서 패널 상에 상기 신틸레이터 패널을 위치시키는 단계; 및상기 신틸레이터 패널을 롤러로 압착하여 상기 센서 패널에 부착하되, 상기 신틸레이터 패널의 일 측 하부에서부터 타 측 하부까지 순차적으로 압착하여 부착하는 단계;를 포함하며,상기 센서 패널의 가로 및 세로의 길이는 각각 8 내지 20 인치(inch)이고, 상기 신틸레이터 패널의 가로 및 세로의 길이는 각각 8 내지 20 인치인 것을 특징으로 하는 대면적 X선 검출장치의 제조 방법.
- 삭제
- 제 1 항에 있어서,상기 광 테이프는 투과율이 90% 이상이며, 굴절율이 1.45 내지 1.47인 것을 특징으로 하는 대면적 X선 검출장치의 제조 방법.
- 삭제
- 제 1 항 또는 제 3 항에 있어서,상기 센서 패널과 상기 신틸레이터 패널의 가로×세로의 길이는 8×8 인치, 10×12 인치 및 17×17 인치 중 어느 하나인 것을 특징으로 하는 대면적 X선 검출장치의 제조 방법.
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KR1020080015453A KR100964653B1 (ko) | 2008-02-20 | 2008-02-20 | 광 테이프를 이용한 대면적 x선 검출장치의 제조 방법 |
Applications Claiming Priority (1)
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KR1020080015453A KR100964653B1 (ko) | 2008-02-20 | 2008-02-20 | 광 테이프를 이용한 대면적 x선 검출장치의 제조 방법 |
Publications (2)
Publication Number | Publication Date |
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KR20090090153A KR20090090153A (ko) | 2009-08-25 |
KR100964653B1 true KR100964653B1 (ko) | 2010-06-22 |
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KR1020080015453A KR100964653B1 (ko) | 2008-02-20 | 2008-02-20 | 광 테이프를 이용한 대면적 x선 검출장치의 제조 방법 |
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Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101925895B1 (ko) | 2011-12-29 | 2018-12-07 | 삼성디스플레이 주식회사 | 엑스선 검출용 패널 및 이의 제조방법 |
KR101339465B1 (ko) * | 2012-11-16 | 2013-12-10 | 주식회사 아비즈알 | 신틸레이터 패널과 촬상소자 패널의 합착 장치 및 그 합착 방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006220439A (ja) | 2005-02-08 | 2006-08-24 | Canon Inc | シンチレータパネル、放射線検出装置及びその製造方法 |
JP2007071836A (ja) * | 2005-09-09 | 2007-03-22 | Canon Inc | 放射線検出装置及び放射線撮像システム |
KR100725289B1 (ko) | 2005-03-17 | 2007-06-07 | 엘에스전선 주식회사 | 반도체 제조용 접착 테이프 제조장치 및 그 제조방법 |
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- 2008-02-20 KR KR1020080015453A patent/KR100964653B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006220439A (ja) | 2005-02-08 | 2006-08-24 | Canon Inc | シンチレータパネル、放射線検出装置及びその製造方法 |
KR100725289B1 (ko) | 2005-03-17 | 2007-06-07 | 엘에스전선 주식회사 | 반도체 제조용 접착 테이프 제조장치 및 그 제조방법 |
JP2007071836A (ja) * | 2005-09-09 | 2007-03-22 | Canon Inc | 放射線検出装置及び放射線撮像システム |
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KR20090090153A (ko) | 2009-08-25 |
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