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KR100947921B1 - High ductility Au surface treatment plating method of flexible printed circuit board - Google Patents

High ductility Au surface treatment plating method of flexible printed circuit board Download PDF

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KR100947921B1
KR100947921B1 KR1020080042504A KR20080042504A KR100947921B1 KR 100947921 B1 KR100947921 B1 KR 100947921B1 KR 1020080042504 A KR1020080042504 A KR 1020080042504A KR 20080042504 A KR20080042504 A KR 20080042504A KR 100947921 B1 KR100947921 B1 KR 100947921B1
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circuit board
printed circuit
weight
flexible printed
surface treatment
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KR20090116515A (en
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이봉준
고상준
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(주)인터플렉스
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/341Surface mounted components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/43Manufacturing methods
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/18Printed circuits structurally associated with non-printed electric components
    • H05K1/181Printed circuits structurally associated with non-printed electric components associated with surface mounted components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8538Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/85399Material
    • H01L2224/854Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/85438Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/85439Silver (Ag) as principal constituent

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

본 발명은 연성인쇄회로기판의 고연성 Au 표면처리 도금방법에 관한 것으로, 보다 구체적으로는 반도체 실장을 위한 와이어본딩부 및 직접 외부 부품과의 결합되거나 부품이 실장되는 솔더링부로 이루어진 표면처리부를 구비하고, 일정한 회로패턴이 형성된 연성인쇄회로기판의 도금방법에 있어서, a)연성인쇄회로기판을 탈지, 산세 및 연마하는 단계; b)와이어본딩부 및 솔더링부에 무전해 니켈도금액을 이용하여 무전해 니켈도금층을 형성하는 단계;c)무전해 니켈도금층 위에 금도금층을 형성하는 단계; 및 d)인산염 유화제(Phosphate surfactant), 폴리아민계 환고리형 화합물 및 물이 함유된 봉공 처리제를 금도금층 위에 흡착 또는 코팅하는 단계를 포함한다.The present invention relates to a method for plating a highly flexible Au surface treatment of a flexible printed circuit board, and more specifically, to a surface treatment portion including a wire bonding portion for semiconductor mounting and a soldering portion directly bonded to an external component or mounted thereon. A method for plating a flexible printed circuit board having a predetermined circuit pattern, the method comprising: a) degreasing, pickling, and polishing a flexible printed circuit board; b) forming an electroless nickel plating layer using an electroless nickel plating solution in the wire bonding portion and the soldering portion; c) forming a gold plating layer on the electroless nickel plating layer; And d) adsorbing or coating a sealing treatment agent containing a phosphate surfactant, a polyamine-based ring compound, and water on the gold plated layer.

본 발명에 의하면, 무전해 금도금 시 얇은 금도금층에 형성되는 핀홀을 봉공 처리함으로써 내식성을 향상시킬 수 있다.According to the present invention, corrosion resistance can be improved by sealing a pinhole formed in a thin gold plated layer during electroless gold plating.

고연성, Au, 봉공처리, 연성인쇄회로기판, 산세, 연마제 Flexible, Au, Sealed, Flexible Printed Circuit Board, Pickling, Abrasive

Description

연성인쇄회로기판의 고연성 Au 표면처리 도금방법{High ductility Au surface treatment plating method of flexible printed circuit board}High ductility Au surface treatment plating method of flexible printed circuit board

본 발명은 연성인쇄회로기판의 표면처리 도금방법에 관한 것으로, 보다 구체적으로는 연성인쇄회로기판의 구리층을 보호하기 위하여 표면에 도금층을 형성하는 연성인쇄회로기판의 표면처리 도금방법에 관한 것이다.The present invention relates to a surface treatment plating method of a flexible printed circuit board, and more particularly to a surface treatment plating method of forming a plating layer on the surface in order to protect the copper layer of the flexible printed circuit board.

일반적으로 경성, 연성 또는 경연성 인쇄회로기판은 반도체의 실장을 위한 와이어본딩 부위 및 IC 칩, RAM 등과 같은 부품과 인쇄회로기판과의 실장을 위한 솔더링 부위로 이루어진 표면처리부를 구비한다.In general, a rigid, flexible, or rigid printed circuit board has a surface treatment part including a wire bonding part for mounting a semiconductor and a soldering part for mounting a printed circuit board with components such as an IC chip and a RAM.

상기 표면처리부는 보통 구리 재질로 이루어지는데, 외부로 노출된 구리는 시간 경과에 따라 산화되고 부식될 수 있으므로 종래에는 이와 같은 솔더링 및 와이어본딩 특성이 부식에 의해 손상되지 않도록 노출된 구리층 위에 전기 니켈도금 또는 무전해 니켈도금을 한 후, 전해 금도금 또는 무전해 금도금을 0.5㎛ 내외로 하여 직접 외부 부품이 결합되거나 부품실장이 되는 표면처리부를 형성하였다.The surface treatment part is usually made of a copper material, and the copper exposed to the outside may be oxidized and corroded over time, so that conventional soldering and wirebonding characteristics may not be damaged by corrosion. After plating or electroless nickel plating, the electrolytic gold plating or the electroless gold plating was about 0.5 μm, thereby forming a surface treatment portion in which external components were directly bonded or mounted.

여기서, 상기 전기 니켈도금 또는 무전해 니켈도금은 부식이나 장기적인 저장 조건 하에서도 구리를 보호할 뿐 아니라 상기 구리층과 금도금 사이에서 계면 도금으로써 상호 확산을 방지하는 역할을 하였다.Here, the electro-nickel plating or electroless nickel plating not only protects copper even under corrosion or long-term storage conditions, but also serves to prevent interdiffusion by interfacial plating between the copper layer and gold plating.

그러나 종래 무전해 니켈도금 후 무전해 금도금하는 무전해 금도금 방법으로 연성인쇄회로기판을 표면 처리하는 경우 굴곡 시에 크랙이 발생한다는 문제점이 있었다.However, when the flexible printed circuit board is surface-treated by the electroless gold plating method of electroless gold plating after the conventional electroless nickel plating, there is a problem that cracks occur during bending.

종래 무전해 니켈도금 및 무전해 금도금 방법의 문제점을 개선하고자 무전해 니켈도금 없이 전해 방식으로 금을 직접 도금하는 전해 다이렉트 금도금 방법을 수행하는 경우 연성은 우수하게 나타나지만, 고가의 금을 다량 사용함에 따라 제조비용이 많이 소요된다는 문제가 있었으며, 상기 전해 다이렉트 금도금 방법의 경우 도금선이 필요하기 때문에 도금선에 의한 구김, 이물, 찍힘, 미도금 불량발생이 늘어날 수 있다는 문제점도 있었다.In order to improve the problems of the conventional electroless nickel plating and the electroless gold plating method, when the electrolytic direct gold plating method of directly electroplating gold without electroless nickel plating is performed, the ductility is excellent, but the use of a large amount of expensive gold There was a problem that the manufacturing cost is high, and in the electrolytic direct gold plating method, since a plating line is required, wrinkles, foreign matters, imprints, and unplating defects due to the plating line may be increased.

아울러, 상기 무전해 금도금 방법은 금도금층이 얇게 형성되기 때문에 일정한 크기의 핀홀(pinhole)이 형성되는데, 상기 핀홀에 수분, 염화물, 유화물, 염류 등의 부식성 물질이 침입하여 바탕 소지를 부식하고, 상기 부식에 의해 생겨난 반응물이 표면에 석출하고, 접촉저항상승 등의 문제점을 일으켰다.In addition, in the electroless gold plating method, since the gold plating layer is thinly formed, a pinhole having a predetermined size is formed, and corrosive substances such as moisture, chloride, emulsion, salt, and the like penetrate the pinhole to corrode the base material. Reactants generated by corrosion precipitated on the surface, causing problems such as an increase in contact resistance.

본 발명은 상술한 문제점을 해결하기 위하여 창출된 것으로서, 고가의 금을 많이 사용하지 않고도 고연성을 유지할 수 있는 연성인쇄회로기판의 고연성 Au 표면처리방법을 제공하는데 그 목적이 있다.The present invention has been made to solve the above problems, and an object thereof is to provide a high-ductility Au surface treatment method of a flexible printed circuit board capable of maintaining high ductility without using a lot of expensive gold.

상기와 같은 목적을 달성하기 위한 본 발명의 연성인쇄회로기판의 고연성 Au 표면처리 도금방법은, 반도체 실장을 위한 와이어본딩부 및 직접 외부 부품과의 결합되거나 부품이 실장되는 솔더링부로 이루어진 표면처리부를 구비하고, 일정한 회로패턴이 형성된 연성인쇄회로기판의 도금방법에 있어서, a)상기 연성인쇄회로기판을 탈지, 산세 및 연마하는 단계; b)상기 와이어본딩부 및 솔더링부에 무전해 니켈도금액을 이용하여 무전해 니켈도금층을 형성하는 단계; c)상기 무전해 니켈도금층 위에 금도금층을 형성하는 단계; 및 d)인산염 유화제(Phosphate surfactant), 폴리아민계 환고리형 화합물 및 물이 함유된 봉공 처리제를 금도금층 위에 흡착 또는 코팅하는 단계를 포함한다.In order to achieve the above object, a high-ductility Au surface treatment plating method of a flexible printed circuit board of the present invention includes a surface treatment part including a wire bonding part for semiconductor mounting and a soldering part directly bonded to an external component or mounted thereon. A plating method of a flexible printed circuit board having a predetermined circuit pattern, the method comprising: a) degreasing, pickling, and polishing the flexible printed circuit board; b) forming an electroless nickel plating layer by using an electroless nickel plating solution on the wire bonding part and the soldering part; c) forming a gold plated layer on the electroless nickel plated layer; And d) adsorbing or coating a sealing treatment agent containing a phosphate surfactant, a polyamine-based ring compound, and water on the gold plated layer.

여기서, 상기 c)단계는 상기 봉공 처리제를 40~80℃에서 10~100초 동안 침적하는 것이 바람직하다.Here, the step c) is preferably deposited for 10-100 seconds the sealing agent at 40 ~ 80 ℃.

상기 봉공 처리제를 40℃ 미만의 온도에서 침적하는 경우 침적시간이 길어지므로 경제적이지 못하다는 문제점이 있으며, 80℃를 초과하는 온도에서 침적하는 경우 용액의 수명이 짧아진다는 문제점이 있다. 또한, 침적시간이 10초 미만인 경 우 봉공처리가 완전하게 이루어지지 않을 수 있다는 문제점이 있으며, 100초를 초과하는 경우 봉공처리 효과에 있어서 차이가 없어 생산시간만을 늘리므로 비경제적이라는 문제점이 있다.When the sealing treatment agent is deposited at a temperature of less than 40 ℃ there is a problem that it is not economical because the deposition time is long, there is a problem that the life of the solution is shortened when deposited at a temperature exceeding 80 ℃. In addition, when the deposition time is less than 10 seconds, there is a problem that the sealing process may not be made completely, if there is more than 100 seconds there is no difference in the sealing effect so there is a problem that it is uneconomical to increase the production time.

아울러, 상기 봉공 처리제는 인산염 유화제(Phosphate surfactant) 1~3중량%, 폴리아민계 환고리형 화합물 1~4중량% 및 물 93~98중량%가 함유된 것이 바람직하다.In addition, the sealing agent is preferably containing 1 to 3% by weight of phosphate surfactant (Phosphate surfactant), 1 to 4% by weight of the polyamine-based ring compound and 93 to 98% by weight of water.

또한, 상기 무전해 니켈도금층의 두께는 1~8㎛이고, 상기 금도금층의 두께는 0.01 ~0.1㎛인 것이 바람직하다.In addition, the thickness of the electroless nickel plating layer is 1 ~ 8㎛, it is preferable that the thickness of the gold plating layer is 0.01 ~ 0.1㎛.

또한, 상기 무전해 니켈도금액은 황산니켈 30~40중량%와, 이온교환수 60~70중량%가 혼합된 제1용액 및 치아인산나트륨 35~45중량%와, 암모늄 말레이트 5~15중량%와, 이온교환수 45~55중량%가 혼합된 제2용액이 함유된 것이 바람직하다.In addition, the electroless nickel plating solution is 30 to 40% by weight of nickel sulfate, 60 to 70% by weight of ion-exchanged water, 35 to 45% by weight of sodium dental phosphate, and 5 to 15% by weight of ammonium maleate It is preferable to contain the 2nd solution which mixed% and 45-55 weight% of ion-exchange water.

아울러, 상기 무전해 니켈도금액은 수산화나트륨 10~20중량%와, 호박산이나트륨 1~10중량%와, 이온교환수 75~90중량%가 혼합된 제3용액 또는 치아인산나트륨 25~35중량%와, 젖산암모늄 10~25중량%와, 이온 교환수 45~55중량%가 혼합된 제4용액 중 하나 이상의 용액이 더 첨가된 것이 바람직하다.In addition, the electroless nickel plating solution is 10 to 20% by weight of sodium hydroxide, 1 to 10% by weight of disodium succinate, and 75 to 90% by weight of ion-exchanged water or 25 to 35% by weight of sodium dental phosphate It is preferable that one or more solutions of the fourth solution in which%, 10 to 25% by weight of ammonium lactate, and 45 to 55% by weight of ion-exchanged water are further added.

나아가, 상기 무전해 니켈도금액은 층 두께 등과 같은 다른 조건에 따라 상기 제1용액, 제2용액, 제3용액 및 제4용액을 다양한 혼합비율로 혼합한 것일 수 있으나, 바람직하게는 4:1:1:0.9의 비율로 혼합한 것을 사용한다.Further, the electroless nickel plating solution may be a mixture of the first solution, the second solution, the third solution and the fourth solution in various mixing ratios according to other conditions such as layer thickness, but is preferably 4: 1. A mixture of 1: 1: 0.9 is used.

상술한 바와 같은 본 발명의 연성인쇄회로기판의 고연성 Au 표면처리 도금방 법은, As described above, the highly flexible Au surface treatment plating method of the flexible printed circuit board of the present invention,

첫째, 전해 다이렉트 금도금 방법에 비하여 금 사용량을 현저하게 줄일 수 있으므로 제조비용 절감 및 이에 따른 생산성 증대를 가져올 수 있다는 장점이 있다.First, since the amount of gold can be significantly reduced compared to the electrolytic direct gold plating method, there is an advantage that the production cost can be reduced and the productivity increase accordingly.

둘째, 얇은 금도금만으로도 연성에 우수하여 연성인쇄회로기판의 굴곡균열을 방지할 수 있다는 장점이 있다.Second, there is an advantage that the thin gold plating alone is excellent in ductility to prevent the bending crack of the flexible printed circuit board.

셋째, 얇은 금도금 시에 수반될 수 있는 핀홀을 봉공 처리함으로써 제품의 부식을 방지할 수 있고, 이에 따라 제품신뢰도를 향상시킬 수 있다.Third, by sealing the pinhole that may be involved in the thin gold plating it is possible to prevent the corrosion of the product, thereby improving the product reliability.

이하 첨부된 도면을 참조로 본 발명의 바람직한 실시예를 상세히 설명하기로 한다. 이에 앞서, 본 명세서 및 청구범위에 사용된 용어나 단어는 통상적이거나 사전적인 의미로 한정해서 해석되어서는 아니되며, 발명자는 그 자신의 발명을 가장 최선의 방법으로 설명하기 위해 용어의 개념을 적절하게 정의할 수 있다는 원칙에 입각하여 본 발명의 기술적 사상에 부합하는 의미와 개념으로 해석되어야만 한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. Prior to this, terms or words used in the specification and claims should not be construed as having a conventional or dictionary meaning, and the inventors should properly explain the concept of terms in order to best explain their own invention. Based on the principle that can be defined, it should be interpreted as meaning and concept corresponding to the technical idea of the present invention.

따라서 본 명세서에 기재된 실시예와 도면에 도시된 구성은 본 발명의 가장 바람직한 일 실시예에 불과할 뿐이고 본 발명의 기술적 사상을 모두 대변하는 것은 아니므로, 본 출원시점에 있어서 이들을 대체할 수 있는 다양한 균등물과 변형예들이 있을 수 있음을 이해하여야 한다.Therefore, the embodiments described in the specification and the drawings shown in the drawings are only the most preferred embodiments of the present invention and do not represent all of the technical idea of the present invention, various equivalents that may be substituted for them at the time of the present application It should be understood that there may be water and variations.

이하, 도 1 및 도 2를 참고하여 본 발명의 바람직한 일 실시예에 따른 연성인쇄회로기판의 고연성 Au 표면처리 도금방법을 설명하도록 한다. 도 1은 본 발명 의 바람직한 일 실시예에 따른 연성인쇄회로기판의 고연성 Au 표면처리 도금방법을 나타낸 블록흐름도이고, 도 2는 도 1의 연성인쇄회로기판의 고연성 Au 표면처리 도금방법에 따른 공정흐름을 나타낸 개략도이다.Hereinafter, referring to FIGS. 1 and 2, a method for plating a highly flexible Au surface treatment of a flexible printed circuit board according to an exemplary embodiment of the present invention will be described. 1 is a block flow diagram illustrating a method for plating a highly flexible Au surface treatment of a flexible printed circuit board according to an exemplary embodiment of the present invention, and FIG. 2 is a method for plating the high flexible Au surface treatment of a flexible printed circuit board of FIG. Schematic diagram showing the process flow.

도 1을 참고하면, 본 발명의 바람직한 일 실시예에 따른 연성인쇄회로기판의 고연성 Au 표면처리 도금방법은 a)탈지, 산세 및 연마단계(S110), b)니켈도금단계(S120), c)금도금단계(S130) 및 d)봉공처리단계(S140)를 포함한다.Referring to Figure 1, a method for plating a high-ductility Au surface treatment of a flexible printed circuit board according to an embodiment of the present invention is a) degreasing, pickling and polishing step (S110), b) nickel plating step (S120), c ) Gold plating step (S130) and d) sealing processing step (S140).

도 2를 참고하면, 일정한 회로패턴(미도시)이 형성된 연성인쇄회로기판(100)은 반도체 실장을 위한 와이어본딩부 및 외부 부품과의 결합을 위한 솔더링부로 이루어진 표면처리부(110)를 구비하는데, 이와 같은 공정은 당 업계에서 널리 알려진 연성인쇄회로기판(100)의 제조방법에 의한 것이므로 이에 대한 구체적인 설명은 생략하도록 한다.Referring to FIG. 2, the flexible printed circuit board 100 having a predetermined circuit pattern (not shown) includes a surface treatment part 110 including a wire bonding part for semiconductor mounting and a soldering part for coupling with external components. Since this process is due to the manufacturing method of the flexible printed circuit board 100 well known in the art, a detailed description thereof will be omitted.

상기 표면처리부(110)는 일반적으로 구리 재질로 이루어지는데 이와 같은 구리층을 보호하기 위하여 표면처리 도금방법을 수행하게 된다.The surface treatment unit 110 is generally made of a copper material to perform a surface treatment plating method to protect such a copper layer.

우선, 상기 연성인쇄회로기판(100)의 표면에 노출된 구리층을 보호하는 표면처리를 수행하기에 앞서 일반적으로 포토솔더레지스트(PSR)를 상기 연성인쇄회로기판(100) 중 상기 표면처리부(110)를 제외한 부분에 도포하여 포토솔더레지스트층(130)을 형성함으로써 후술하는 도금에 대한 레지스트(resist) 역할을 하도록 한다.First, prior to performing a surface treatment for protecting a copper layer exposed on the surface of the flexible printed circuit board 100, photosolder resist (PSR) is generally applied to the surface treatment unit 110 of the flexible printed circuit board 100. The photo solder resist layer 130 is formed by applying to portions except for) to serve as a resist for plating to be described later.

즉, 상기 포토솔더레지스트층(130)에 드라이 필름을 적용하고, 노광 및 현상을 거쳐 상기 표면처리부(110) 상의 포토솔더레지스트층(130) 부위만을 선택적으로 박리한다.That is, a dry film is applied to the photosolder resist layer 130, and selectively exposed only a portion of the photosolder resist layer 130 on the surface treatment unit 110 through exposure and development.

이와 같이 상기 연성인쇄회로기판에서 표면처리부(110)가 외부로 노출되면, 탈지에 의해 소재표면에 부착된 유지류의 오염물질을 제거한다.As such, when the surface treatment unit 110 is exposed to the outside in the flexible printed circuit board, contaminants of oils and fats adhered to the material surface are removed by degreasing.

상기 탈지방법으로는 에멀션 탈지법, 알칼리 탈지법, 전해 탈지법, 초음파 탈지법 등 다양한 방법들이 포함될 수 있으나 바람직하게는 전해 탈지법을 사용한다.The degreasing method may include various methods such as emulsion degreasing, alkali degreasing, electrolytic degreasing, ultrasonic degreasing, but preferably electrolytic degreasing.

상기와 같이 탈지공정에 의해 표면의 오염물질을 제거한 후에 인청동의 주석과 인성분, 베릴륨 동의 산화필름을 제거하기 위해 불소 이온이 함유된 연마제를 이용하여 산세 및 연마한다(S110).After removing contaminants on the surface by the degreasing process, pickling and polishing are performed using an abrasive containing fluorine ions to remove tin oxide, phosphorus component, and beryllium copper oxide film of phosphor bronze (S110).

상기 불소 이온이 함유된 연마제는 과산화나트륨계 연마제와 달리 연마 시 기판이 변색되지 않도록 해주는 역할을 하며, 부식을 방지할 수 있다는 장점이 있다.Unlike the sodium peroxide-based abrasive, the fluorine-containing abrasive has a role of preventing the substrate from discoloring during polishing, and has an advantage of preventing corrosion.

다음으로, 상기 무전해 니켈도금액을 접촉하여 무전해 니켈도금층(150)을 형성한다(S120).Next, the electroless nickel plating solution is contacted to form an electroless nickel plating layer 150 (S120).

여기서, 상기 무전해 니켈도금층(150)의 두께는 1~8㎛인 것이 바람직하다.Here, the thickness of the electroless nickel plating layer 150 is preferably 1 ~ 8㎛.

상기 무전해 니켈도금층(150)의 두께를 상기와 같이 두껍게 형성하므로 종래 전해 다이렉트 금도금 방법과 비교하여 도금되는 금의 양을 현저하게 줄일 수 있다는 장점이 있다.Since the thickness of the electroless nickel plating layer 150 is formed as described above, there is an advantage that the amount of gold plated can be significantly reduced as compared with the conventional electrolytic direct gold plating method.

또한, 상기 무전해 니켈도금액은 황산니켈 30~40중량%와, 이온교환수 60~70중량%가 혼합된 제1용액 및 치아인산나트륨 35~45중량%와, 암모늄 말레이트 5~15중 량%와, 이온교환수 45~55중량%가 혼합된 제2용액이 함유된 것이 바람직하다.In addition, the electroless nickel plating solution is 30 to 40% by weight of nickel sulfate, 60 to 70% by weight of ion-exchanged water, 35 to 45% by weight of sodium dental phosphate, and 5 to 15 in ammonium maleate It is preferable to contain the 2nd solution which mixed amount% and 45-55 weight% of ion-exchange water.

아울러, 상기 무전해 니켈도금액은 수산화나트륨 10~20중량%와, 호박산이나트륨 1~10중량%와, 이온교환수 75~90중량%가 혼합된 제3용액 또는 치아인산나트륨 25~35중량%와, 젖산암모늄 10~25중량%와, 이온 교환수 45~55중량%가 혼합된 제4용액 중 하나 이상의 용액이 더 첨가된 것이 보다 바람직하다.In addition, the electroless nickel plating solution is 10 to 20% by weight of sodium hydroxide, 1 to 10% by weight of disodium succinate, and 75 to 90% by weight of ion-exchanged water or 25 to 35% by weight of sodium dental phosphate More preferably, at least one solution of the fourth solution in which%, 10 to 25% by weight of ammonium lactate, and 45 to 55% by weight of ion-exchanged water is added is added.

상기 무전해 니켈도금액에 의해 도금된 무전해 니켈도금층(150)은 결정구조가 종방향으로 형성되며, 도금의 밀착성이 강하고 고연성을 나타낸다는 장점이 있다.The electroless nickel plated layer 150 plated by the electroless nickel plating solution has an advantage in that the crystal structure is formed in the longitudinal direction, and the adhesion of the plating is strong and high ductility is exhibited.

이어서, 상기 무전해 니켈도금층(150) 위에 금도금층(170)을 형성함으로써 연성인쇄회로기판(100)에 고연성 Au 표면처리를 한다(S130).Subsequently, by forming the gold plating layer 170 on the electroless nickel plating layer 150, the flexible printed circuit board 100 is subjected to high ductility Au surface treatment (S130).

이와 같이 고연성 Au 표면처리된 연성인쇄회로기판(100)은 고가의 금이 다량 포함되지 않아도 우수한 연성을 나타내며, 솔더링 특성에 있어서도 우수한 특징을 나타낸다.Thus, the flexible printed circuit board 100 having the high ductility Au surface treatment exhibits excellent ductility even when a large amount of expensive gold is not included, and also shows excellent characteristics in soldering properties.

그러나 상기 금도금층(170)은 얇은 층으로 형성되기 때문에 c)금도금단계(S130)를 수행한 후에 핀홀(171)이 형성될 수 있는데, 상술한 바와 같이 상기 핀홀(171)에 의해 부식이 발생할 수 있다.However, since the gold plating layer 170 is formed as a thin layer, c) the pinhole 171 may be formed after the gold plating step S130, and as described above, corrosion may occur due to the pinhole 171. have.

이에 봉공 처리제를 이용하여 상기 핀폴(171)을 봉공 처리함으로써 핀홀(171)에 의한 부식을 방지하고 내식성을 향상시킬 수 있다(S140).Accordingly, by sealing the pin pole 171 using a sealing agent, it is possible to prevent corrosion by the pinhole 171 and to improve corrosion resistance (S140).

상기 봉공 처리제는 흡착 또는 코팅 방식에 의해 봉공 처리층(190)을 형성한다. 또한, 상기 봉공 처리 시에는 상기 봉공 처리제를 40~80℃에서 10~100초 동안 침적하는 것이 바람직하다.The sealing treatment agent forms the sealing treatment layer 190 by an adsorption or coating method. In addition, during the sealing process, it is preferable to deposit the sealing agent for 10 to 100 seconds at 40 ~ 80 ℃.

또한, 상기 봉공 처리제는 인산염 유화제(Phosphate surfactant) 1~3중량%, 폴리아민계 환고리형 화합물 1~4중량% 및 물 93~98중량%가 함유된 것이 바람직하다.In addition, the sealing agent is preferably containing 1 to 3% by weight of a phosphate surfactant (Phosphate surfactant), 1 to 4% by weight of the polyamine-based ring compound and 93 to 98% by weight of water.

이상과 같이, 본 발명은 비록 한정된 실시예와 도면에 의해 설명되었으나, 본 발명은 이것에 의해 한정되지 않으며 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자에 의해 본 발명의 기술 사상과 아래에 기재될 특허 청구범위의 균등 범위 내에서 다양한 수정 및 변형이 가능함은 물론이다.As mentioned above, although this invention was demonstrated by the limited embodiment and drawing, this invention is not limited by this, The person of ordinary skill in the art to which this invention belongs, Of course, various modifications and variations are possible within the scope of equivalent claims.

도 1은 본 발명의 바람직한 일 실시예에 따른 연성인쇄회로기판의 고연성 Au 표면처리 도금방법을 나타낸 블록흐름도이고,1 is a block flow diagram illustrating a method for plating a highly flexible Au surface treatment of a flexible printed circuit board according to an exemplary embodiment of the present invention.

도 2는 도 1의 연성인쇄회로기판의 고연성 Au 표면처리 도금방법에 따른 공정흐름을 나타낸 개략도이다.FIG. 2 is a schematic diagram illustrating a process flow according to the high ductility Au surface treatment plating method of the flexible printed circuit board of FIG. 1.

<도면의 주요부분에 대한 부호의 설명><Description of the symbols for the main parts of the drawings>

100 : 연성인쇄회로기판 110 : 표면처리부100: flexible printed circuit board 110: surface treatment

130 : 포토솔더레지스트층 150 : 무전해 니켈도금층130 photosolder resist layer 150 electroless nickel plated layer

170 : 금도금층 171 : 핀홀170: gold plated layer 171: pinhole

190 : 봉공 처리층190: sealing layer

Claims (5)

반도체 실장을 위한 와이어본딩부 및 연성인쇄회로기판이 직접 외부 부품과의 결합되거나 부품이 실장되는 솔더링부로 이루어진 표면처리부를 구비하고, 일정한 회로패턴이 형성된 연성인쇄회로기판의 도금방법에 있어서,In the plating method of a flexible printed circuit board having a predetermined circuit pattern, the surface bonding portion comprising a wire bonding portion and a flexible printed circuit board for semiconductor mounting is directly bonded to an external component or a soldering portion to which the component is mounted, a)상기 연성인쇄회로기판을 탈지, 산세 및 연마하는 단계;a) degreasing, pickling and polishing the flexible printed circuit board; b)상기 와이어본딩부 및 솔더링부에 무전해 니켈도금액을 이용하여 무전해 니켈도금층을 형성하는 단계;b) forming an electroless nickel plating layer by using an electroless nickel plating solution on the wire bonding part and the soldering part; c)상기 무전해 니켈도금층 위에 금도금층을 형성하는 단계; 및c) forming a gold plated layer on the electroless nickel plated layer; And d)인산염 유화제(Phosphate surfactant), 폴리아민계 환고리형 화합물 및 물이 함유된 봉공 처리제를 금도금층 위에 흡착 또는 코팅하는 단계를 포함하되,d) adsorbing or coating a sealing agent containing a phosphate surfactant, a polyamine-based ring compound, and water on a gold plated layer, 상기 봉공 처리제를 40~80℃에서 10~100초 동안 침적하는 것을 특징으로 하는 연성인쇄회로기판의 고연성 Au 표면처리 도금방법.The plating method of the high-ductility Au surface treatment of a flexible printed circuit board, characterized in that the sealing treatment agent is deposited for 10 to 100 seconds at 40 ~ 80 ℃. 삭제delete 제 1항에 있어서,The method of claim 1, 상기 봉공 처리제는 인산염 유화제(Phosphate surfactant) 1~3중량%, 폴리아민계 환고리형 화합물 1~4중량% 및 물 93~98중량%가 함유된 것을 특징으로 하는 연 성인쇄회로기판의 고연성 Au 표면처리 도금방법.The sealing agent is a high ductility Au of a flexible adult circuit board, characterized in that it contains 1 to 3% by weight of a phosphate surfactant, 1 to 4% by weight of a polyamine ring compound, and 93 to 98% by weight of water. Surface treatment plating method. 제 1항에 있어서,The method of claim 1, 상기 무전해 니켈도금액은 황산니켈 30~40중량%와, 이온교환수 60~70중량%가 혼합된 제1용액 및 치아인산나트륨 35~45중량%와, 암모늄 말레이트 5~15중량%와, 이온교환수 45~55중량%가 혼합된 제2용액이 함유된 것을 특징으로 하는 연성인쇄회로기판의 고연성 Au 표면처리 도금방법.The electroless nickel plating solution is 30 to 40% by weight of nickel sulfate, 35 to 45% by weight of sodium phosphate, and 1 to 5% by weight of ammonium maleate And a second solution containing 45 to 55% by weight of ion-exchanged water, wherein the flexible Au surface treatment plating method of the flexible printed circuit board is performed. 제 4항에 있어서,The method of claim 4, wherein 상기 무전해 니켈도금액은 수산화나트륨 10~20중량%와, 호박산이나트륨 1~10중량%와, 이온교환수 75~90중량%가 혼합된 제3용액 또는 치아인산나트륨 25~35중량%와, 젖산암모늄 10~25중량%와, 이온 교환수 45~55중량%가 혼합된 제4용액 중 하나 이상의 용액이 더 첨가된 것을 특징으로 하는 연성인쇄회로기판의 고연성 Au 표면처리 도금방법.The electroless nickel plating solution comprises 10 to 20% by weight of sodium hydroxide, 1 to 10% by weight of disodium succinate, and 75 to 90% by weight of ion-exchanged water, or 25 to 35% by weight of sodium dental phosphate, And 10-25 wt% of ammonium lactate and 45-55 wt% of ion-exchanged water are further added with one or more solutions of the fourth flexible Au surface treatment plating method of a flexible printed circuit board.
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KR102301221B1 (en) 2020-11-25 2021-09-09 박현배 Method for manufacturing a printed circuit board with improved plating properties by atmospheric pressure plasma treatment, and a flexible printed circuit board manufactured thereby
KR102515271B1 (en) * 2021-05-31 2023-03-29 주식회사 다이브 Multilayer metal foils and fabricating method of the same
CN114107986A (en) * 2021-11-22 2022-03-01 深圳市宏钢机械设备有限公司 Local gold plating process for lead of hybrid integrated circuit shell

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