KR100812510B1 - 디메틸벤젠 부분산화용 촉매 및 이를 이용한 방향족디알데히드의 제조방법 - Google Patents
디메틸벤젠 부분산화용 촉매 및 이를 이용한 방향족디알데히드의 제조방법 Download PDFInfo
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- KR100812510B1 KR100812510B1 KR1020050120635A KR20050120635A KR100812510B1 KR 100812510 B1 KR100812510 B1 KR 100812510B1 KR 1020050120635 A KR1020050120635 A KR 1020050120635A KR 20050120635 A KR20050120635 A KR 20050120635A KR 100812510 B1 KR100812510 B1 KR 100812510B1
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- Prior art keywords
- catalyst
- dimethylbenzene
- partial oxidation
- aromatic dialdehyde
- formula
- Prior art date
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- 239000003054 catalyst Substances 0.000 title claims abstract description 118
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- 238000007254 oxidation reaction Methods 0.000 title claims abstract description 56
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- 125000003118 aryl group Chemical group 0.000 title claims abstract description 26
- ZNZYKNKBJPZETN-WELNAUFTSA-N Dialdehyde 11678 Chemical compound N1C2=CC=CC=C2C2=C1[C@H](C[C@H](/C(=C/O)C(=O)OC)[C@@H](C=C)C=O)NCC2 ZNZYKNKBJPZETN-WELNAUFTSA-N 0.000 title claims abstract description 22
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- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical group [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 13
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- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 6
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- 239000000376 reactant Substances 0.000 description 5
- 229910000410 antimony oxide Inorganic materials 0.000 description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
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- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 4
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- 230000007423 decrease Effects 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
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- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
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- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
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- 150000001299 aldehydes Chemical class 0.000 description 1
- 238000011021 bench scale process Methods 0.000 description 1
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- 238000001354 calcination Methods 0.000 description 1
- XFWJKVMFIVXPKK-UHFFFAOYSA-N calcium;oxido(oxo)alumane Chemical compound [Ca+2].[O-][Al]=O.[O-][Al]=O XFWJKVMFIVXPKK-UHFFFAOYSA-N 0.000 description 1
- 239000012018 catalyst precursor Substances 0.000 description 1
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- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
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- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
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- 229910052750 molybdenum Inorganic materials 0.000 description 1
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- CJJMLLCUQDSZIZ-UHFFFAOYSA-N oxobismuth Chemical class [Bi]=O CJJMLLCUQDSZIZ-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
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- 239000011949 solid catalyst Substances 0.000 description 1
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- 239000011787 zinc oxide Substances 0.000 description 1
Images
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/18—Arsenic, antimony or bismuth
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/24—Chromium, molybdenum or tungsten
- B01J23/30—Tungsten
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/50—Catalysts, in general, characterised by their form or physical properties characterised by their shape or configuration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/0009—Use of binding agents; Moulding; Pressing; Powdering; Granulating; Addition of materials ameliorating the mechanical properties of the product catalyst
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/27—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation
- C07C45/32—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation with molecular oxygen
- C07C45/33—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation with molecular oxygen of CHx-moieties
- C07C45/34—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation with molecular oxygen of CHx-moieties in unsaturated compounds
- C07C45/36—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation with molecular oxygen of CHx-moieties in unsaturated compounds in compounds containing six-membered aromatic rings
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Catalysts (AREA)
Abstract
Description
구분 | 2 mmol/g 암모늄 메타 텅스텐 수용액 사용량 (g) | 0.5 mmol/g 안티몬 타르타르산 수용액 사용량 (g) | 촉매조성 | 담지량 (중량%) |
실시예 1 | 18.0 | 1.2 | W12Sb0.2Ox/SA5218 | 11.3 |
실시예 2 | 18.0 | 2.4 | W12Sb0.4Ox/SA5218 | 11.3 |
실시예 3 | 18.0 | 3.6 | W12Sb0.6Ox/SA5218 | 11.7 |
비교예 1 | 18.0 | 4.8 | W12Sb0.8Ox/SA5218 | 11.6 |
비교예 2 | 18.0 | 6.0 | W12Sb1Ox/SA5218 | 11.8 |
비교예 3 | 18.0 | 12.0 | W12Sb2Ox/SA5218 | 11.8 |
비교예 4 | 18.0 | 18.0 | W12Sb3Ox/SA5218 | 9.9 |
비교예 5 | 12.0 | 0 | W12Ox/SA5218 | 6.4 |
구분 | 2 mmol/g 암모늄 메타 텅스텐 수용액 사용량 (g) | 0.5 mmol/g 안티몬 타르타르산 수용액 사용량 (g) | 촉매조성 |
실시예 4 | 18 | 0.18 | W12Sb0.03Ox |
실시예 5 | 18 | 0.6 | W12Sb0.1Ox |
실시예 6 | 18 | 1.2 | W12Sb0.2Ox |
실시예 7 | 18 | 2.4 | W12Sb0.4Ox |
실시예 8 | 18 | 3.6 | W12Sb0.6Ox |
비교예 6 | 18 | 6 | W12Sb1Ox |
비교예 7 | 18 | 12 | W12Sb2Ox |
비교예 8 | 18 | 0 | W12Ox |
구분 | 반응온도 (℃) | 전환율 (몰%) | 선택도 (몰%) | 원패스 수율 (몰%) | ||
TPAL | PTAL | TPAL | PTAL | |||
실시예 1 | 450 | 7.0 | 64.3 | 0.0 | 4.5 | 0.0 |
500 | 16.2 | 88.6 | 0.0 | 14.3 | 0.0 | |
550 | 27.7 | 85.4 | 3.8 | 23.7 | 1.1 | |
580 | 35.4 | 82.2 | 5.0 | 29.1 | 1.8 | |
실시예 2 | 450 | 15.5 | 53.1 | 12.0 | 8.2 | 1.9 |
500 | 28.8 | 82.4 | 4.6 | 23.7 | 1.3 | |
550 | 46.5 | 82.3 | 5.8 | 38.3 | 2.7 | |
580 | 57.3 | 79.5 | 5.6 | 45.5 | 3.2 | |
실시예 3 | 450 | 13.4 | 61.0 | 0.0 | 8.1 | 0.0 |
500 | 32.6 | 82.1 | 6.4 | 26.8 | 2.1 | |
550 | 47.0 | 81.7 | 6.6 | 38.3 | 3.1 | |
580 | 50.1 | 81.3 | 6.2 | 41.0 | 3.1 | |
비교예 1 | 450 | 10.7 | 52.2 | 10.3 | 5.6 | 1.1 |
500 | 24.3 | 76.8 | 9.1 | 18.7 | 2.2 | |
550 | 37.3 | 84.0 | 7.2 | 31.3 | 2.7 | |
580 | 47.8 | 83.0 | 6.8 | 39.7 | 3.3 | |
비교예 2 | 450 | 6.7 | 38.3 | 0.0 | 2.6 | 0.0 |
500 | 14.9 | 74.1 | 9.6 | 11.1 | 1.4 | |
550 | 24.7 | 82.1 | 8.1 | 20.2 | 2.0 | |
580 | 32.0 | 81.0 | 6.6 | 25.9 | 2.1 | |
비교예 3 | 450 | 7.5 | 39.2 | 13.8 | 2.9 | 1.0 |
500 | 16.0 | 69.7 | 11.0 | 11.1 | 1.8 | |
550 | 29.9 | 85.2 | 7.5 | 25.5 | 2.2 | |
580 | 42.3 | 83.0 | 6.9 | 35.1 | 2.9 | |
비교예 4 | 450 | 6.0 | 33.7 | 0.0 | 2.0 | 0.0 |
500 | 14.5 | 43.6 | 10.0 | 6.3 | 1.5 | |
550 | 32.8 | 58.3 | 6.1 | 19.1 | 2.0 | |
580 | 47.4 | 74.0 | 4.9 | 35.2 | 2.3 | |
비교예 5 | 450 | 8.3 | 67.9 | 15.8 | 5.6 | 1.3 |
500 | 16.6 | 68.6 | 15.2 | 11.4 | 2.5 | |
550 | 33.1 | 72.8 | 10.9 | 24.1 | 3.6 | |
580 | 45.9 | 72.1 | 8.7 | 33.1 | 4.0 | |
TPAL:테레프탈알데히드, PTAL:p-톨루알데히드 |
구분 | BET 비표면적 (m2/g) | 반응온도 (℃) | 전환율 (몰%) | 선택도 (몰%) | 원패스 수율 (몰%) | ||
TPAL | PTAL | TPAL | PTAL | ||||
실시예 4 | - | 520 | 60.0 | 8.8 | 3.0 | 5.3 | 1.8 |
550 | 88.6 | 20.3 | 2.8 | 18.0 | 2.5 | ||
580 | 98.1 | 23.8 | 2.3 | 23.4 | 2.3 | ||
실시예 5 | - | 520 | 21.7 | 22.9 | 7.3 | 4.9 | 1.6 |
550 | 41.1 | 38.1 | 7.0 | 15.8 | 2.9 | ||
580 | 66.7 | 53.0 | 6.1 | 35.3 | 4.0 | ||
실시예 6 | 2.4 | 520 | 20.9 | 28.7 | 7.7 | 6.0 | 1.6 |
550 | 35.4 | 44.1 | 6.9 | 15.6 | 2.4 | ||
580 | 64.3 | 61.9 | 5.7 | 39.8 | 3.7 | ||
실시예 7 | - | 520 | 49.1 | 31.0 | 5.5 | 15.2 | 2.7 |
550 | 79.4 | 58.0 | 4.8 | 46.1 | 3.8 | ||
580 | 92.9 | 45.7 | 3.5 | 42.4 | 3.2 | ||
실시예 8 | 4.4 | 520 | 33.8 | 31.2 | 5.9 | 10.6 | 2.0 |
550 | 54.1 | 58.2 | 5.4 | 31.5 | 2.9 | ||
580 | 71.5 | 61.6 | 4.7 | 44.0 | 3.3 | ||
비교예 6 | - | 520 | 11.2 | 10.2 | 9.2 | 1.1 | 1.0 |
550 | 19.3 | 44.6 | 8.2 | 8.6 | 1.6 | ||
580 | 41.2 | 65.2 | 6.2 | 26.9 | 2.6 | ||
비교예 7 | 1.6 | 520 | 11.4 | 1.0 | 8.7 | 0.1 | 1.0 |
550 | 15.9 | 28.6 | 8.7 | 4.6 | 1.4 | ||
580 | 29.9 | 53.3 | 7.4 | 16.0 | 2.2 | ||
비교예 8 | 2.1 | 520 | 96.9 | 4.1 | 0.6 | 4.0 | 0.6 |
550 | 99.9 | 5.1 | 0.2 | 5.1 | 0.2 | ||
580 | 100.0 | 5.4 | 0.2 | 5.4 | 0.2 | ||
TPAL:테레프탈알데히드, PTAL:p-톨루알데히드 |
Claims (9)
- 하기 화학식 1로 정의되는 디메틸벤젠의 부분산화용 촉매.[화학식 1]WxSbyOz상기 식에서, W는 텅스텐 원자이며, Sb는 안티몬 원자이며, O는 산소 원자이며, x는 12, y는 0<y≤0.6, z는 x와 y에 의해 결정되는 값이다.
- 제 1항에 있어서,상기 화학식 1의 촉매가 분말 상태 촉매인 것을 특징으로 하는 디메틸벤젠의 부분산화용 촉매.
- 제 1항에 있어서,상기 화학식 1의 촉매가 촉매 활성성분을 팰릿(pellet), 구형(sphere) 또는 링(ring) 형태로 성형한 성형 촉매인 것을 특징으로 하는 디메틸벤젠의 부분산화용 촉매.
- 제 1항에 있어서,상기 화학식 1의 촉매가 내열성 무기물 담체에 담지되는 촉매인 것을 특징으로 하는 디메틸벤젠의 부분산화용 촉매.
- 제 4항에 있어서,상기 내열성 무기물 담체는 세공 크기가 1 ㎛ 이상이고, 표면적이 1 m2/g 이하인 것을 특징으로 하는 디메틸벤젠의 부분산화용 촉매.
- 제 4항에 있어서,상기 내열성 무기물 담체에 담지되는 성형 촉매는 W 및 Sb를 포함하는 수용액으로부터 침전법, 함침법, 연속 함침법, 공침법 또는 코팅법으로 제조되는 것을 특징으로 하는 디메틸벤젠의 부분산화용 촉매.
- 제 1항에 있어서,상기 디메틸벤젠은 p-자일렌인 것을 특징으로 하는 디메틸벤젠의 부분산화용 촉매.
- 디메틸벤젠을 분자상 산소를 이용하여 기상 산화하여 대응하는 방향족 디알데히드를 제조하는 방법에 있어서, 제 1항 내지 제 7항 중 어느 한 항 기재의 촉매를 사용하는 것을 특징으로 하는 방향족 디알데히드의 제조방법.
- 제 8항에 있어서,상기 디메틸벤젠이 p-자일렌이고 대응하는 방향족 디알데히드가 테레프탈알데히드인 것을 특징으로 하는 방향족 디알데히드의 제조방법.
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JP2002355556A (ja) | 2001-03-30 | 2002-12-10 | Nippon Shokubai Co Ltd | アルキルベンゼン類酸化用触媒及び芳香族アルデヒドの製造方法 |
JP2004148188A (ja) | 2002-10-30 | 2004-05-27 | Nippon Shokubai Co Ltd | タングステン−アンチモン系酸化物触媒の製造方法 |
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JP2002355556A (ja) | 2001-03-30 | 2002-12-10 | Nippon Shokubai Co Ltd | アルキルベンゼン類酸化用触媒及び芳香族アルデヒドの製造方法 |
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