KR100778847B1 - 박막 어레이 기판 및 그 제조방법 - Google Patents
박막 어레이 기판 및 그 제조방법 Download PDFInfo
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- KR100778847B1 KR100778847B1 KR1020010088471A KR20010088471A KR100778847B1 KR 100778847 B1 KR100778847 B1 KR 100778847B1 KR 1020010088471 A KR1020010088471 A KR 1020010088471A KR 20010088471 A KR20010088471 A KR 20010088471A KR 100778847 B1 KR100778847 B1 KR 100778847B1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133519—Overcoatings
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/13625—Patterning using multi-mask exposure
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
- G02F2201/123—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode pixel
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/22—Antistatic materials or arrangements
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- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims (7)
- 종횡으로 교차되어 화소를 정의하는 게이트 배선 및 데이터 배선;상기 홀수 번째 데이터 배선에 연결되는 제 1 쇼팅바 및 상기 짝수 번째 데이터 배선에 연결되며 상기 제 1 쇼팅바와 절연되는 제 2 쇼팅바;상기 홀수 번째 게이트 배선에 연결되는 제 3 쇼팅바 및 상기 짝수 번째 게이트 배선에 연결되며 상기 제 3 쇼팅바와 절연되는 제 4 쇼팅바;상기 데이터 배선을 포함한 전면에 형성된 보호막;상기 쇼팅바가 교차하는 부분 또는 상기 쇼팅바가 형성된 부분을 제외한 상기 보호막 상부에 선택적으로 형성된 투명도전막을 포함하여 구성되는 것을 특징으로 하는 박막 어레이 기판.
- 제 1 항에 있어서, 상기 제 1 쇼팅바와 제 2 쇼팅바가 교차하는 것을 특징으로 하는 박막 어레이 기판.
- 제 1 항에 있어서, 상기 제 3 쇼팅바와 제 4 쇼팅바가 교차하는 것을 특징으로 하는 박막 어레이 기판.
- 기판 상에 게이트 배선을 형성하는 단계;상기 게이트 배선과 절연되는 데이터 배선을 형성하는 단계;상기 게이트 배선과 선택적으로 연결되는 적어도 하나 이상의 쇼팅바를 형성하는 단계;상기 데이터 배선과 선택적으로 연결되는 적어도 하나 이상의 쇼팅바를 형성하는 단계;상기 데이터 배선을 포함한 전면에 보호막을 형성하는 단계;상기 보호막 상에 투명도전막을 형성하는 단계;상기 투명도전막을 패터닝하여 화소전극을 형성함과 동시에,상기 쇼팅바가 교차하는 부분 또는 쇼팅바 상부의 투명도전막을 제거하는 단계를 포함하여 이루어지는 것을 특징으로 하는 박막 어레이 기판의 제조방법.
- 제 4 항에 있어서, 상기 쇼팅바는 상기 게이트 배선 또는 데이터 배선과 동시에 형성하는 것을 특징으로 하는 박막 어레이 기판의 제조방법.
- 제 4 항에 있어서, 상기 투명도전막은 ITO인 것을 특징으로 하는 박막 어레이 기판의 제조방법.
- 제 4 항에 있어서, 상기 게이트 배선 및 데이터 배선의 교차점에 상기 화소전극과 연결되는 박막트랜지스터를 형성하는 단계를 더 포함하는 것을 특징으로 하는 박막 어레이 기판의 제조방법.
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KR1020010088471A KR100778847B1 (ko) | 2001-12-29 | 2001-12-29 | 박막 어레이 기판 및 그 제조방법 |
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KR1020010088471A KR100778847B1 (ko) | 2001-12-29 | 2001-12-29 | 박막 어레이 기판 및 그 제조방법 |
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KR20030058085A KR20030058085A (ko) | 2003-07-07 |
KR100778847B1 true KR100778847B1 (ko) | 2007-11-22 |
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Families Citing this family (1)
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KR101010470B1 (ko) * | 2003-12-30 | 2011-01-21 | 엘지디스플레이 주식회사 | 액정 표시 장치용 어레이 기판 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970011942A (ko) * | 1995-08-02 | 1997-03-27 | 구자홍 | 정전기방지구조를 갖춘 액정표시장치 및 그 제조방법 |
KR19990047650A (ko) * | 1997-12-05 | 1999-07-05 | 윤종용 | 두개 이상의 쇼팅 바를 갖는 액정 표시 장치 및 그 제조 방법 |
KR20000021924A (ko) * | 1998-09-30 | 2000-04-25 | 구본준;론 위라하디락사 | 박막트랜지스터 어레이 기판의 검사방법 |
KR20000032794A (ko) * | 1998-11-18 | 2000-06-15 | 윤종용 | 액정 표시 장치의 불량 검사 방법 |
KR20000065730A (ko) * | 1999-04-08 | 2000-11-15 | 구본준 | 액정표시장치의 tft어레이 기판 및 그 검사방법 |
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2001
- 2001-12-29 KR KR1020010088471A patent/KR100778847B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970011942A (ko) * | 1995-08-02 | 1997-03-27 | 구자홍 | 정전기방지구조를 갖춘 액정표시장치 및 그 제조방법 |
KR19990047650A (ko) * | 1997-12-05 | 1999-07-05 | 윤종용 | 두개 이상의 쇼팅 바를 갖는 액정 표시 장치 및 그 제조 방법 |
KR20000021924A (ko) * | 1998-09-30 | 2000-04-25 | 구본준;론 위라하디락사 | 박막트랜지스터 어레이 기판의 검사방법 |
KR20000032794A (ko) * | 1998-11-18 | 2000-06-15 | 윤종용 | 액정 표시 장치의 불량 검사 방법 |
KR20000065730A (ko) * | 1999-04-08 | 2000-11-15 | 구본준 | 액정표시장치의 tft어레이 기판 및 그 검사방법 |
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