KR100312164B1 - High temperature plasma gas scrubber - Google Patents
High temperature plasma gas scrubber Download PDFInfo
- Publication number
- KR100312164B1 KR100312164B1 KR1019990031455A KR19990031455A KR100312164B1 KR 100312164 B1 KR100312164 B1 KR 100312164B1 KR 1019990031455 A KR1019990031455 A KR 1019990031455A KR 19990031455 A KR19990031455 A KR 19990031455A KR 100312164 B1 KR100312164 B1 KR 100312164B1
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- South Korea
- Prior art keywords
- electrode
- nitrogen
- upper electrode
- insulation
- noise
- Prior art date
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 82
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 40
- 239000007789 gas Substances 0.000 claims abstract description 25
- 238000009413 insulation Methods 0.000 claims abstract description 14
- 239000002699 waste material Substances 0.000 claims abstract description 13
- 239000002912 waste gas Substances 0.000 claims abstract description 12
- 239000012212 insulator Substances 0.000 claims abstract description 11
- 238000006243 chemical reaction Methods 0.000 claims abstract description 9
- QGZKDVFQNNGYKY-NJFSPNSNSA-N nitrogen-16 Chemical compound [16NH3] QGZKDVFQNNGYKY-NJFSPNSNSA-N 0.000 claims description 7
- 238000000034 method Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 239000004065 semiconductor Substances 0.000 abstract description 6
- 230000005611 electricity Effects 0.000 abstract description 4
- 230000001105 regulatory effect Effects 0.000 abstract description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 abstract description 2
- 238000010891 electric arc Methods 0.000 abstract description 2
- 239000003990 capacitor Substances 0.000 description 9
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 8
- 239000001294 propane Substances 0.000 description 4
- 239000002360 explosive Substances 0.000 description 3
- 238000000197 pyrolysis Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3431—Coaxial cylindrical electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
- B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/002—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out in the plasma state
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/126—Microwaves
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder or liquid
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Electromagnetism (AREA)
- Treating Waste Gases (AREA)
Abstract
본 발명은 고온플라스마를 이용한 폐가스처리장치에 관한 것으로서, 반도체 제조과정에서 발생하는 폐프레온가스를 소량의 질소와 전기만을 사용하여 고온의 전기아크 플라스마를 발생시켜 열분해 처리함으로써, 오존층 파괴물질인 프레온가스를 연속적으로 분해처리하는 고온플라스마를 이용한 폐가스처리장치에 관한 것이다. 이를 위하여 본 발명은 폐프레온가스를 수용하는 입구배관과 전원으로부터 공급되는 교류를 직류로 정류하는 3상정류 및 전류조정회로의 마이너스극으로 노이즈를 제거하는 노이즈필터와 시동변압기의 2차코일을 통하여 접속되는 상부전극과 전원으로부터 공급되는 교류를 직류로 정류하는 3상정류 및 전류조정회로의 플러스극으로 노이즈를 제거하는 노이즈필터와 저항이 높은 시작저항을 통하여 접속되고 상기 상부전극의 하부에 설치된 중간전극과 전원으로부터 공급되는 교류를 직류로 정류하는 3상정류 및 전류조정회로의 플러스극으로 노이즈를 제거하는 노이즈필터와 저항이 낮은 주저항을 통하여 접속되고 상기 중간전극의 하부에 설치된 하부전극과 상기 입구배관과 상기 상부전극간의 절연을 위한 상기 상부전극의 내경의 일부에 형성된 입구절연대와 상기 상부전극 하부에 형성되어 외부로부터 입력되는 압축질소를 입력받는 질소회전대와 상기 질소회전대를 통하여 입력되는 상기 압축질소를 나선형으로 회전시키기 위한 질소회전실과 상기 중간전극과 상기 하부전극간의 절연을 위한 절연대와 상기 상부전극과 상기 중간전극 사이의 절연의 파괴와 상기 질소회전대를 통하여 입력되는 상기 압축질소에 의해 발생되어 상기 입구배관으로부터 입력되는 상기 폐프레온가스를 분해처리하는 아크화염과 상기 아크화염을 방출시키기 위한 반응배관 및 상기 하부전극과 상기 반응배관간의 절연을 위한 하부절연대로 이루어진다.The present invention relates to a waste gas treatment apparatus using a high temperature plasma, wherein the freon gas generated during the semiconductor manufacturing process is pyrolyzed by generating a high temperature electric arc plasma using only a small amount of nitrogen and electricity, thereby destroying the ozone layer. It relates to a waste gas treatment apparatus using a high temperature plasma to continuously decompose. To this end, the present invention uses a secondary filter of a noise filter and a starting transformer to remove noise with a negative pole of a three-phase rectification and a current regulation circuit rectifying the alternating current supplied from a power source into a direct current. A noise filter for removing noise with a positive pole of a three-phase rectification and a current regulating circuit that rectifies the alternating current supplied from a power source into a direct current, and a resistor are connected through a high starting resistance and installed below the upper electrode. A noise filter for removing noise with a positive pole of a three-phase rectification and a current regulating circuit for rectifying an alternating current supplied from an electrode and a power supply with a direct current, and a lower electrode installed under the intermediate electrode and connected with a low main resistance. A portion of the inner diameter of the upper electrode for insulation between the inlet pipe and the upper electrode A nitrogen swivel chamber formed under the insulator insulator and the upper electrode to receive compressed nitrogen input from the outside, and between the intermediate electrode and the lower electrode with a nitrogen rotating chamber for spirally rotating the compressed nitrogen input through the nitrogen swivel. An arc flame for decomposing the waste freon gas generated by the compressed nitrogen input through the insulating band for insulation and the insulation between the upper electrode and the intermediate electrode and the nitrogen swivel and inputted from the inlet pipe; A reaction pipe for releasing the arc flame and a lower insulator for insulation between the lower electrode and the reaction pipe.
Description
본 발명은 고온플라스마를 이용한 폐가스처리장치에 관한 것으로서, 반도체 제조과정에서 발생하는 폐프레온가스를 소량의 질소와 전기만을 사용하여 고온의 전기아크 플라스마를 발생시켜 열분해 처리함으로써, 오존층 파괴물질인 프레온가스를 연속적으로 분해처리하는 고온플라스마를 이용한 폐가스처리장치에 관한 것이다.The present invention relates to a waste gas treatment apparatus using a high temperature plasma, wherein the freon gas generated during the semiconductor manufacturing process is pyrolyzed by generating a high temperature electric arc plasma using only a small amount of nitrogen and electricity, thereby destroying the ozone layer. It relates to a waste gas treatment apparatus using a high temperature plasma to continuously decompose.
종래의 폐프레온가스 분해처리장치로는 프로판가스화염을 이용한 열분해장치가 있다. 상기 열분해장치는 프로판가스의 연소를 위한 다량의 질소를 투입함에 따른 열손실 및 배기가스량이 증대되어 배기시설의 증대 및 열분해 후, 정화처리설비의 증대로 이어지고, 원가상승 요인이 되는 문제점이 있었다. 또한, 상기 프로판가스는 폭발성가스로 항상 폭발의 위험에 노출되어 있는 문제가 있었다. 상기 문제점 등으로 인하여 현재 국내 반도체제조공장에서는 프로판가스로 폐프레온가스를 처리하는 장비가 도입되지 않고 있다. 따라서, 국내 반도체제조공정에서 발생하는 폐프레온 가스는 분해처리되지 아니한 채 배출되고 있는 실정이다.Conventional waste freon gas decomposition treatment apparatus is a pyrolysis apparatus using propane gas flame. The pyrolysis device has a problem that the heat loss and the amount of exhaust gas are increased by inputting a large amount of nitrogen for combustion of propane gas, which leads to the increase of the exhaust facility and the increase of the purification treatment facility after pyrolysis, and the cost increase factor. In addition, the propane gas is an explosive gas has always been exposed to the risk of explosion. Due to the above problems, at present, domestic semiconductor manufacturing plants are not introduced equipment for treating waste freon gas with propane gas. Therefore, the waste freon gas generated in the domestic semiconductor manufacturing process is discharged without being decomposed.
본 발명은 상기한 종래의 제반 문제점을 해결하기 위한 것으로, 그 목적은 종래의 다른 장치처럼 가연성가스를 사용하지 않고 전기와 질소만을 사용하여 반도체 제조공정과정에서 발생하고 있는 폐프레온가스 및 이와 함께 혼합 배출되고 있는 독성가스, 폭발성가스 등을 안전하고 효율적으로 처리할 수 있는 고온플라스마를 이용한 폐가스처리장치를 제공하고자 하는 것이다.The present invention is to solve the above-mentioned conventional problems, its purpose is to use the waste freon gas generated in the semiconductor manufacturing process using only the electricity and nitrogen, without the combustible gas like other conventional devices and mixed with it It is an object of the present invention to provide a waste gas treatment apparatus using a high temperature plasma that can safely and efficiently treat toxic and explosive gases being discharged.
도 1은 본 발명에 따른 고온플라스마를 이용한 폐가스처리장치의 계통도.1 is a system diagram of a waste gas treatment apparatus using a high temperature plasma according to the present invention.
도 2는 본 발명에 따른 토치부의 단면도.2 is a cross-sectional view of the torch portion according to the present invention.
도 3은 본 발명에 따른 압축질소 투입시의 질소회전실의 단면도.Figure 3 is a cross-sectional view of the nitrogen rotating chamber at the time of compression nitrogen injection according to the present invention.
도 4는 본 발명에 따른 압축질소 투입시의 토치부의 외관도.Figure 4 is an external view of the torch unit at the time of injection of compressed nitrogen according to the present invention.
<도면의 주요부분에 대한 설명><Description of main parts of drawing>
1 : 노이즈 필터 2 : 3상 정류 및 전류조정회로1: Noise filter 2: Three-phase rectification and current adjustment circuit
3 : 방전 콘덴서 4 : 노이즈 필터3: discharge capacitor 4: noise filter
5 : 방전 콘덴서 6 : 노이즈 필터5: discharge capacitor 6: noise filter
7 : 시작 저항 8 : 주저항7: starting resistance 8: main resistance
9 : 콘덴서 10 : 콘덴서9: condenser 10: condenser
11 : 폐프레온 가스 12 : 입구 배관11: waste Freon gas 12: inlet piping
13 : 입구 절연대 14 : 상부전극13 inlet insulator 14 upper electrode
15 : 질소 회전실 16 : 압축질소15: nitrogen rotating chamber 16: compressed nitrogen
17 : 질소 회전실대 18 : 중간 전극17: nitrogen rotating chamber 18: intermediate electrode
19 : 절연대 20 : 하부 전극21 : 하부 절연대 22 : 반응 배관23 : 아크화염 24 : 간극대25 : 냉각수통 26 : 시동 변압기27 : 시동 콘덴서 28 : 고압 변압기29 : 노이즈 필터 30 : 전원19: Insulation stand 20: Lower electrode 21: Lower insulator 22: Reaction pipe 23: Arc flame 24: Gap 25: Cooling water tank 26: Start transformer 27: Start capacitor 28: High voltage transformer 29: Noise filter 30: Power supply
본 발명에 따른 고온플라스마를 이용한 폐가스처리장치의 특징은,Features of the waste gas treatment apparatus using a high temperature plasma according to the present invention,
폐프레온가스를 수용하는 입구배관과 전원으로부터 공급되는 교류를 직류로 정류하는 3상정류 및 전류조정회로의 마이너스극으로 노이즈를 제거하는 노이즈필터와 시동변압기의 2차코일을 통하여 접속되는 상부전극과 전원으로부터 공급되는 교류를 직류로 정류하는 3상정류 및 전류조정회로의 플러스극으로 노이즈를 제거하는 노이즈필터와 저항이 높은 시작저항을 통하여 접속되고 상기 상부전극의 하부에 설치된 중간전극과 전원으로부터 공급되는 교류를 직류로 정류하는 3상정류 및 전류조정회로의 플러스극으로 노이즈를 제거하는 노이즈필터와 저항이 낮은 주저항을 통하여 접속되고 상기 중간전극의 하부에 설치된 하부전극과 상기 입구배관과 상기 상부전극간의 절연을 위한 상기 상부전극의 내경의 일부에 형성된 입구절연대와 상기 상부전극 하부에 형성되어 외부로부터 입력되는 압축질소를 입력받는 질소회전대와 상기 질소회전대를 통하여 입력되는 상기 압축질소를 나선형으로 회전시키기위한 질소회전실과 상기 중간전극과 상기 하부전극간의 절연을 위한 절연대와 상기 상부전극과 상기 중간전극 사이의 절연의 파괴와 상기 질소회전대를 통하여 입력되는 상기 압축질소에 의해 발생되어 상기 입구배관으로부터 입력되는 상기 폐프레온가스를 분해처리하는 아크화염과 상기 아크화염을 방출시키기 위한 반응배관 및 상기 하부전극과 상기 반응배관간의 절연을 위한 하부절연대로 이루어진다.An upper electrode connected through a secondary filter of a starting filter and a noise filter to remove noise with a negative pole of a three-phase rectification and a current regulation circuit rectifying the alternating current supplied from a power source into a direct current. A noise filter that removes noise to the positive pole of the three-phase rectification and current regulation circuits rectifying AC supplied from a power source and a resistance is connected through a high start resistance and supplied from an intermediate electrode and a power supply provided under the upper electrode. The lower electrode, the inlet pipe, and the upper part connected to a noise filter for removing noise with a positive pole of a three-phase rectification and a current regulating circuit for rectifying alternating current into a direct current, and a low resistance main resistance, are installed below the intermediate electrode. An inlet insulator formed on a part of the inner diameter of the upper electrode for insulating between electrodes A nitrogen rotating chamber formed under the electrode to receive compressed nitrogen input from the outside, a nitrogen rotating chamber for spirally rotating the compressed nitrogen input through the nitrogen rotating table, and an insulating band for insulating the intermediate electrode and the lower electrode; Breaking the insulation between the upper electrode and the intermediate electrode and discharge the arc flame and the arc flame generated by the compressed nitrogen input through the nitrogen swivel to decompose the waste freon gas input from the inlet pipe And a lower insulator for insulation between the reaction pipe and the lower electrode and the reaction pipe.
이하, 첨부된 도면을 참조하여 본 발명의 바람직한 실시예를 상세히 설명한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
도 1은 본 발명에 따른 고온플라스마를 이용한 폐가스처리장치의 계통도이고, 도 2는 본 발명에 따른 토치부의 단면도이며, 도 3은 본 발명에 따른 압축질소 투입시의 질소회전실의 단면도이고, 도 4는 본 발명에 따른 압축질소 투입시의 토치부의 외관도이다.1 is a system diagram of a waste gas treatment apparatus using a high temperature plasma according to the present invention, FIG. 2 is a cross-sectional view of a torch unit according to the present invention, and FIG. 3 is a cross-sectional view of a nitrogen rotating chamber at the time of inputting compressed nitrogen according to the present invention. 4 is an external view of the torch unit at the time of inputting compressed nitrogen according to the present invention.
도시된 바와 같이, 토치부는 배관 형상의 폐프레온가스(11)의 입구배관(12)과 상부전극(14)의 절연을 위한 입구절연대(13)를 설치하고, 상부전극(14)과 중간전극(18)의 사이에 질소회전대(17)를 설치하여 압축질소(16)를 나선형으로 상기 질소회전대(17)를 통하여 투입함으로써, 질소회전실(15)을 형성한다. 하부전극(20)과 상기 중간전극(18) 사이에는 절연을 위한 절연대(19)를 설치하고, 상기 하부전극(20)과 반응배관(22) 사이에 하부절연대(21)를 설치한 구조의 플라스마 발생 토치이다. 전기장치부는 전원(30)에 220V나 380V의 3상교류전원을 사용하고, 상기 220V나 380V의 3상교류전원이 노이즈필터(1)를 통과하여 저압부와 고압부로 분리된다. 상기 고압부는 노이즈필터(29)를 통하여 고압변압기(28)에서 15kV~20kV로 승압되며, 상기 승압된 전압은 시동콘덴서(27)를 충전하기 시작하고, 충전전압이 간극대(24)의 간격 3~15mm의 절연파괴 전압에 이르면, 상기 시동콘덴서(27)에 충전된 전하는 순간적으로 상기 간극대(24)를 통하여 방전되면서 시동변압기(26)의 2차 코일에 기립형상의 순간전압을 발생시킨다. 상기 순간전압은 콘덴서(9, 10)를 통하여 상기 상부전극(14), 상기 중간전극(18), 상기 하부전극(20)간의 절연을 파괴하면서 불꽃방전을 일으킨다. 상기 불꽃방전은 상기 토치부의 플라스마 시동 역할을 수행한다. 상기 저압부는 3상정류 및 전류조정회로(2)를 통과하면서 직류로 정류되어 노이즈필터(4, 6)를 통과하고, 마이너스극은 상기 시동변압기(26)의 2차 코일을 흘러 상기 상부전극(14)에 공급되고, 플러스극은 저항이 높은 시작저항(7)과 저항이 낮은 주저항(8)을 통하여 상기 중간전극(18)과 상기 하부전극(20)에 각각 공급된다. 이때 상기 고압부에 의하여 상기 상부전극(14)과 상기 중간전극(18) 사이에 불꽃방전이 발생되어 상기 상부전극(14)과 상기 중간전극(18) 사이에 절연이 파괴되면 50~300 마이크로 파라드의 용량을 갖는 방전콘덴서(3, 5)에 충전되어 있던 전하가 상기 상부전극(14)과 상기 중간전극(18)에 방전이 일어나고, 방전전류가 흐르면서 콘덴서 방전아크가 발생된다. 상기 콘덴서 방전아크는 곧바로 저항이 낮은 상기 주저항(8)에 연결된 동반한 아크화염(23)이 발생된다. 상기 아크화염(23)은 나선형으로 공급되는 압축질소(16)에 의하여 회전하면서 반응배관(22)을 통하여 하부로 밀려나가게 된다. 또한, 전류제어는 상기 3상정류 및 전류조정회로(2)에서 원하는 크기의 화염이 발생되도록 조정되어진다. 상기 구조의 본 장치는 상기 입구배관(12)을 통하여 상기 폐프레온가스(11)를 투입하고, 투입된 상기 폐프레온가스(11)는 상기 아크화염(23)을 통과하면서 상기 아크화염(23)에서 발생되는 열과 빛에 의하여 상기 폐프레온가스(11)가 분해처리된다.상기 상부전극(14)과 상기 중간전극(18) 및 상기 하부전극(20)의 수명연장을 위하여 상기 상부전극(14)과 상기 중간전극(18) 및 상기 하부전극(20)에 냉각통(25)을 각각 설치하여 냉각수로 전극을 냉각하고, 상기 상부전극(14)의 내경을 상기 하부전극(20)보다 크게 함으로써, 회전되는 상기 압축질소(16)의 회전률이 상기 상부전극(14)에서 유지되도록 하여 아크의 회전을 원활히 한다. 그리고, 상기 질소회전실(15)을 V형상으로 하여 상기 압축질소(16) 투입시 질소의 비정상적인 흐름을 방지하도록 하여 원활한 상기 아크화염(23)을 발생하게 하는 구조이다. 또한, 상기 압축질소(16)의 투입방법을 상기 질소회전실(15)내에서 상기 압축질소(16)가 회전을 하도록 투입하여 상기 상부전극(14)과 상기 중간전극(18) 및 상기 하부전극(20)에서 발생되는 상기 아크화염(23)의 발생점을 회전시켜 분산처리함으로써, 상기 상부전극(14)과 상기 중간전극(18) 및 상기 하부전극(20)의 수명을 연장하게 한다. 또한, 상기 3상정류 및 전류조정회로(2)의 플러스극은 상기 중간전극(18)과 상기 하부전극(20)으로 분리설치하여 상기 아크화염(23)의 길이가 길어질 수 있도록 한다.As shown, the torch unit is provided with an inlet insulator 13 for insulating the inlet pipe 12 and the upper electrode 14 of the closed Freon gas 11 in a pipe shape, and the upper electrode 14 and the intermediate electrode. Nitrogen swivel 17 is provided between 18, and compressed nitrogen 16 is spirally injected through the said nitrogen swivel 17, and nitrogen swivel chamber 15 is formed. Between the lower electrode 20 and the intermediate electrode 18, an insulating stand 19 for insulation is provided, and the lower insulating stand 21 is provided between the lower electrode 20 and the reaction pipe 22. Is a plasma generating torch. The electric device unit uses a three-phase AC power source of 220V or 380V for the power source 30, and the 220V or 380V three-phase AC power source passes through the noise filter 1 and is separated into a low voltage part and a high voltage part. The high voltage portion is boosted from the high voltage transformer 28 to the 15 kV ~ 20 kV through the noise filter 29, the boosted voltage starts to charge the starting capacitor 27, the charge voltage is the interval 3 of the gap band 24 When the dielectric breakdown voltage of ˜15 mm is reached, the charge charged in the starting capacitor 27 is instantaneously discharged through the gap band 24 to generate an instantaneous voltage in the standing coil in the secondary coil of the starting transformer 26. The instantaneous voltage causes spark discharge while destroying the insulation between the upper electrode 14, the intermediate electrode 18, and the lower electrode 20 through the capacitors 9 and 10. The flame discharge serves to start the plasma of the torch portion. The low voltage portion is rectified by direct current while passing through the three-phase rectification and current adjustment circuit (2), and passes through the noise filters (4, 6), the negative pole flows through the secondary coil of the starting transformer 26 to the upper electrode ( 14, the positive electrode is supplied to the intermediate electrode 18 and the lower electrode 20 through a high starting resistance 7 and a low main resistance 8, respectively. In this case, when the discharge is generated between the upper electrode 14 and the intermediate electrode 18 by the high voltage part and the insulation is broken between the upper electrode 14 and the intermediate electrode 18, 50 to 300 micro parades The charges charged in the discharge capacitors 3 and 5 having the capacity of discharge discharge to the upper electrode 14 and the intermediate electrode 18, and discharge current flows to generate a capacitor discharge arc. The capacitor discharge arc immediately generates an accompanying arc flame 23 connected to the main resistance 8 having low resistance. The arc flame 23 is pushed downward through the reaction pipe 22 while rotating by the compressed nitrogen (16) supplied in a spiral. In addition, the current control is adjusted so that a flame of a desired size is generated in the three-phase rectification and current adjustment circuit 2. The apparatus of the above structure injects the waste freon gas (11) through the inlet pipe (12), and the injected waste freon gas (11) passes through the arc flame (23) in the arc flame (23). The waste freon gas 11 is decomposed by heat and light generated. The upper electrode 14 and the intermediate electrode 18 and the lower electrode 20 are extended to extend the lifespan of the upper electrode 14. Cooling the electrode with cooling water by installing cooling cylinders 25 in the intermediate electrode 18 and the lower electrode 20, respectively, and the inner diameter of the upper electrode 14 larger than the lower electrode 20, thereby rotating The rotation rate of the compressed nitrogen 16 is maintained at the upper electrode 14 to facilitate the rotation of the arc. In addition, the nitrogen rotating chamber 15 has a V shape to prevent abnormal flow of nitrogen when the compressed nitrogen 16 is introduced, thereby generating the arc flame 23 smoothly. In addition, the compressed nitrogen 16 is injected into the nitrogen rotating chamber 15 so that the compressed nitrogen 16 is rotated so that the upper electrode 14, the intermediate electrode 18, and the lower electrode are rotated. By dispersing by rotating the generation point of the arc flame 23 generated in the (20), to extend the life of the upper electrode 14, the intermediate electrode 18 and the lower electrode 20. In addition, the positive pole of the three-phase rectification and current adjustment circuit 2 is separated into the intermediate electrode 18 and the lower electrode 20 so that the length of the arc flame 23 can be long.
이상에서 설명한 바와 같이, 본 발명에 따른 고온 플라스마를 이용한 폐가스처리장치에 의하면, 전기와 질소만을 사용하여 반도체 제조과정에서 발생되는 폐프레온가스 및 이와 함께 혼합 배출되고 있는 독성가스, 폭발성가스 등을 안전하고 효율적으로 분해처리할 수 있는 효과가 있다.As described above, according to the waste gas treatment apparatus using the high temperature plasma according to the present invention, waste freon gas generated during the semiconductor manufacturing process using only electricity and nitrogen, and toxic gas and explosive gas mixed and discharged together with it are safe. It is effective to decompose and efficiently.
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