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JPWO2021025133A1 - - Google Patents

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Publication number
JPWO2021025133A1
JPWO2021025133A1 JP2021537391A JP2021537391A JPWO2021025133A1 JP WO2021025133 A1 JPWO2021025133 A1 JP WO2021025133A1 JP 2021537391 A JP2021537391 A JP 2021537391A JP 2021537391 A JP2021537391 A JP 2021537391A JP WO2021025133 A1 JPWO2021025133 A1 JP WO2021025133A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021537391A
Other languages
Japanese (ja)
Other versions
JP7214875B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021025133A1 publication Critical patent/JPWO2021025133A1/ja
Application granted granted Critical
Publication of JP7214875B2 publication Critical patent/JP7214875B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067—Etchants
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Photoreceptors In Electrophotography (AREA)
JP2021537391A 2019-08-06 2020-08-06 感光性樹脂組成物、及び感光性エレメント Active JP7214875B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019144661 2019-08-06
JP2019144661 2019-08-06
PCT/JP2020/030256 WO2021025133A1 (ja) 2019-08-06 2020-08-06 感光性樹脂組成物、及び感光性エレメント

Publications (2)

Publication Number Publication Date
JPWO2021025133A1 true JPWO2021025133A1 (ko) 2021-02-11
JP7214875B2 JP7214875B2 (ja) 2023-01-30

Family

ID=74503856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021537391A Active JP7214875B2 (ja) 2019-08-06 2020-08-06 感光性樹脂組成物、及び感光性エレメント

Country Status (5)

Country Link
JP (1) JP7214875B2 (ko)
KR (1) KR102671948B1 (ko)
CN (1) CN114174922A (ko)
TW (1) TWI770578B (ko)
WO (1) WO2021025133A1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024095927A1 (ja) * 2022-10-31 2024-05-10 旭化成株式会社 感光性樹脂組成物、並びにこれを用いた硬化レリーフパターンの製造方法及びポリイミド膜の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05281724A (ja) * 1992-03-31 1993-10-29 Dainippon Toryo Co Ltd ネガ型感光性電着塗料樹脂組成物、これを用いた電着塗装浴及びレジストパターンの製造法
JP2006349724A (ja) * 2005-06-13 2006-12-28 Konica Minolta Medical & Graphic Inc 感光性組成物、感光性平版印刷版材料および平版印刷版材料の画像形成方法
WO2014167671A1 (ja) * 2013-04-10 2014-10-16 千代田ケミカル株式会社 感光性樹脂組成物
JP2015141352A (ja) * 2014-01-29 2015-08-03 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物及びそれを用いたパターン硬化膜の製造方法
WO2018030198A1 (ja) * 2016-08-08 2018-02-15 日産化学工業株式会社 光硬化性組成物及び半導体装置の製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4883537U (ko) 1972-01-19 1973-10-11
US4629679A (en) * 1985-02-12 1986-12-16 Mitsubishi Rayon Company Ltd. Tetrazole compound-containing photopolymerizable resin composition
JPH05281726A (ja) * 1992-03-31 1993-10-29 Dainippon Toryo Co Ltd ネガ型感光性電着塗料樹脂組成物、これを用いた電着塗装浴及びレジストパターンの製造法
US5886136A (en) * 1995-09-12 1999-03-23 Nippon Zeon Co., Ltd. Pattern forming process
JP4221467B2 (ja) 2001-04-20 2009-02-12 デュポン エムアールシー ドライフィルム株式会社 レジスト用光重合性樹脂組成物
JP5063764B2 (ja) 2005-07-22 2012-10-31 富士フイルム株式会社 パターン形成材料、並びに、パターン形成装置及びパターン形成方法
JP5273455B2 (ja) 2008-09-22 2013-08-28 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造法
JP5707420B2 (ja) * 2010-12-24 2015-04-30 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP5920357B2 (ja) * 2011-11-01 2016-05-18 日立化成株式会社 感光性樹脂組成物、これを用いた感光性エレメント、硬化物、画像表示装置の隔壁の形成方法、画像表示装置の製造方法及び画像表示装置
KR102072532B1 (ko) * 2012-05-31 2020-02-03 히타치가세이가부시끼가이샤 감광성 수지 조성물, 감광성 엘리먼트, 레지스터 패턴의 형성 방법 및 배선판의 제조 방법
EP2916171B1 (en) * 2014-03-03 2017-05-31 Agfa Graphics Nv A method for making a lithographic printing plate precursor
CN107924128B (zh) * 2015-08-25 2020-11-06 旭化成株式会社 感光性树脂组合物
JP6661343B2 (ja) * 2015-11-26 2020-03-11 富士フイルム株式会社 転写材料、転写材料の製造方法、積層体、積層体の製造方法、静電容量型入力装置の製造方法、及び、画像表示装置の製造方法
JP2018165788A (ja) * 2017-03-28 2018-10-25 日立化成株式会社 転写型感光性フィルム、硬化樹脂パターンの形成方法及びタッチパネル
TWI700183B (zh) * 2017-12-20 2020-08-01 日商旭化成股份有限公司 感光性樹脂積層體

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05281724A (ja) * 1992-03-31 1993-10-29 Dainippon Toryo Co Ltd ネガ型感光性電着塗料樹脂組成物、これを用いた電着塗装浴及びレジストパターンの製造法
JP2006349724A (ja) * 2005-06-13 2006-12-28 Konica Minolta Medical & Graphic Inc 感光性組成物、感光性平版印刷版材料および平版印刷版材料の画像形成方法
WO2014167671A1 (ja) * 2013-04-10 2014-10-16 千代田ケミカル株式会社 感光性樹脂組成物
JP2015141352A (ja) * 2014-01-29 2015-08-03 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物及びそれを用いたパターン硬化膜の製造方法
WO2018030198A1 (ja) * 2016-08-08 2018-02-15 日産化学工業株式会社 光硬化性組成物及び半導体装置の製造方法

Also Published As

Publication number Publication date
WO2021025133A1 (ja) 2021-02-11
TW202111429A (zh) 2021-03-16
KR102671948B1 (ko) 2024-06-03
TWI770578B (zh) 2022-07-11
JP7214875B2 (ja) 2023-01-30
KR20210146977A (ko) 2021-12-06
CN114174922A (zh) 2022-03-11

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