JPS63115885A - Spiroxazine compound and photosensitive material utilizing said compound - Google Patents
Spiroxazine compound and photosensitive material utilizing said compoundInfo
- Publication number
- JPS63115885A JPS63115885A JP24925186A JP24925186A JPS63115885A JP S63115885 A JPS63115885 A JP S63115885A JP 24925186 A JP24925186 A JP 24925186A JP 24925186 A JP24925186 A JP 24925186A JP S63115885 A JPS63115885 A JP S63115885A
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- formula
- atom
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 51
- 239000000463 material Substances 0.000 title claims abstract description 19
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 21
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 15
- 125000005138 alkoxysulfonyl group Chemical group 0.000 claims abstract description 6
- 125000003118 aryl group Chemical group 0.000 claims abstract description 5
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims abstract description 4
- 125000000732 arylene group Chemical group 0.000 claims abstract description 3
- 125000002947 alkylene group Chemical group 0.000 claims abstract 2
- 125000005843 halogen group Chemical group 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 125000004429 atom Chemical group 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 5
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 125000005156 substituted alkylene group Chemical group 0.000 claims description 2
- 125000005649 substituted arylene group Chemical group 0.000 claims description 2
- 238000004040 coloring Methods 0.000 abstract description 4
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- FLHJIAFUWHPJRT-UHFFFAOYSA-N 2,3,3-trimethylindole Chemical class C1=CC=C2C(C)(C)C(C)=NC2=C1 FLHJIAFUWHPJRT-UHFFFAOYSA-N 0.000 abstract 1
- ULDFPQKCKOFNOF-UHFFFAOYSA-N 5-nitrosoquinolin-6-ol Chemical class N1=CC=CC2=C(N=O)C(O)=CC=C21 ULDFPQKCKOFNOF-UHFFFAOYSA-N 0.000 abstract 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- -1 di-substituted phenyl group Chemical group 0.000 description 8
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000001819 mass spectrum Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- BXXWFOGWXLJPPA-UHFFFAOYSA-N 2,3-dibromobutane Chemical compound CC(Br)C(C)Br BXXWFOGWXLJPPA-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 238000004042 decolorization Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 239000012454 non-polar solvent Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000006125 ethylsulfonyl group Chemical group 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229940058961 hydroxyquinoline derivative for amoebiasis and other protozoal diseases Drugs 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical group C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000003884 phenylalkyl group Chemical group 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- LISFMEBWQUVKPJ-UHFFFAOYSA-N quinolin-2-ol Chemical class C1=CC=C2NC(=O)C=CC2=C1 LISFMEBWQUVKPJ-UHFFFAOYSA-N 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 229920006230 thermoplastic polyester resin Polymers 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D519/00—Heterocyclic compounds containing more than one system of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring system not provided for in groups C07D453/00 or C07D455/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、フォトクロミック性を有する新規カスピロオ
キサジン化合物及び該化合物を溶解あるいは分散した樹
脂を含有する感光層を基板上に有する感光材料に関する
ものである。Detailed Description of the Invention (Industrial Application Field) The present invention relates to a photosensitive material having a photosensitive layer on a substrate containing a novel caspirooxazine compound having photochromic properties and a resin in which the compound is dissolved or dispersed. It is.
(従来の技術)
従来よりスピロオキサジン化合物が光の照射により発色
又は消色するフォトクロミック性を有することは知られ
ており、これを使用したフォトクロミック感光材料が種
々提案されている。(Prior Art) It has been known that spirooxazine compounds have photochromic properties in which they develop or discolor when irradiated with light, and various photochromic light-sensitive materials using the same have been proposed.
例えば、特公昭μj−Jrr9.2号には、次式の様な
スピロナフトオキサジン系化合物を含有するフォトクロ
ミック材料が提案されている。For example, a photochromic material containing a spironaphthoxazine compound as shown in the following formula is proposed in Japanese Patent Publication No. 9.2.
(式中、rは水素原子、ハロゲン原子、シアン基、炭素
数/〜rのアルキル基″!たはアルコキシ基を示す。)
また、特公昭ψター44163/号には、次式の様なス
ピロナフトオキサジン系化合物を高分子物質中に分散さ
せたフォトクロミック感光材料が提案されている。(In the formula, r represents a hydrogen atom, a halogen atom, a cyan group, an alkyl group with carbon number/~r, or an alkoxy group.) In addition, in Japanese Patent Publication No. 44163/, the following formula A photochromic light-sensitive material in which a spironaphthoxazine compound is dispersed in a polymeric substance has been proposed.
R(l Ha
(式中、R1は+C烏tooOH,÷CH鵞蝙aNまた
は+(:!Hs+QCOOR(Rは炭素数/〜jのアル
キル基);R′′−およびR4は炭素数/〜!のアルキ
ル基;R′″wQ素原子、炭素数7〜5個のアルキル基
、ハロゲン原子、ニトロ基、シアノ基、炭素数2〜6個
のアルコキシカルボニル基または炭素数7〜5個のアル
コキシ基を示す。・)
また、特開昭!j−Jtコr参号には、次式の様なフォ
トクロミック化合物が提案されている。R(l Ha (wherein, R1 is +CtooOH, ÷CH Goose aN or +(:!Hs+QCOOR (R is an alkyl group with carbon number/~j); R''- and R4 are carbon number/~! Alkyl group; R'''wQ elemental atom, alkyl group having 7 to 5 carbon atoms, halogen atom, nitro group, cyano group, alkoxycarbonyl group having 2 to 6 carbon atoms, or alkoxy group having 7 to 5 carbon atoms In addition, a photochromic compound as shown in the following formula is proposed in Japanese Patent Application Laid-open No. Sho! J-Jt Cor.
(式中、ytfとHgの一つはハロゲン原子又は低級ア
ルコキシ基で他の一つは水素原子で、又RhとR1は水
素原子、低級アルキル基、低級アルコキシ基、又はハロ
ゲン原子を示す。)また、l1lr 8 P 4’、J
44J、(j/には、次式の様なフォトクロミック化合
物が提案されている。(In the formula, one of ytf and Hg is a halogen atom or a lower alkoxy group, and the other is a hydrogen atom, and Rh and R1 represent a hydrogen atom, a lower alkyl group, a lower alkoxy group, or a halogen atom.) Also, l1lr 8 P 4', J
For 44J, (j/, a photochromic compound as shown in the following formula has been proposed.
(式中、R3とxkの一つはハロゲン原子又は低級アル
コキシ基で、他の一つは水素原子で、また、R1とR1
は水素原子、低級アルキル基、低級アルコキシ基、又は
ハロゲン゛原子を示し、Rfiは炭素数−から10まで
のアルキル基を示す。)ま九、特開昭、gO−//、2
lr0号公報には、次式のようなスピロピリドベンゾオ
キサジン系化合物および該化合物を高分子物質中に分散
させたフォトクロミック感光材料が提案されている。(In the formula, one of R3 and xk is a halogen atom or a lower alkoxy group, the other is a hydrogen atom, and R1 and R1
represents a hydrogen atom, a lower alkyl group, a lower alkoxy group, or a halogen atom, and Rfi represents an alkyl group having from - to 10 carbon atoms. ) Maku, Tokukai Akira, gO-//, 2
Publication lr0 proposes a spiropyridobenzoxazine compound represented by the following formula and a photochromic light-sensitive material in which the compound is dispersed in a polymeric substance.
(式中、R″は炭素数/〜lのアルキル基、フェニル基
、炭素数/〜参のフェンアルキル基、アリル基及びモノ
またはジ置換フェニル基(置換R′及びR6は、各々、
炭素数l−jのアルキル基、フェニル基、炭素数/〜!
のアルコキシ基、モノまたはジ置換フェニル基及びベン
ジル基からなる群から選ばれ、あるいは結合して4〜2
個の炭素原子(スピロ炭素原子を含む)を含む脂環式溝
、ノルボルニル環及びアダマンチル環からなる群から選
ばれる環式環を形成し、Ua及びRoは、各々、水素原
子、炭素数/〜!のアルキル基、ノちロゲン原子、炭素
数7〜5のアルコキシ基、ニトロ基、シアノ基、及び炭
素数/〜lのアルコキシカルボニル基からkる群から選
ばれる)
通常、フォトクロミック感光材料は、上述の様に高分子
化合物にスピロオキサジン化合物を溶解あるいは分散さ
せたものをフィルム状に製膜して使用される。(In the formula, R'' is an alkyl group having a carbon number of 1 to 1, a phenyl group, a phenylalkyl group having a carbon number of 1 to 1, an allyl group, and a mono- or di-substituted phenyl group (substituted R' and R6 are each a
Alkyl group with carbon number l-j, phenyl group, carbon number/~!
selected from the group consisting of alkoxy groups, mono- or di-substituted phenyl groups, and benzyl groups, or combined with 4 to 2
form a cyclic ring selected from the group consisting of an alicyclic groove, a norbornyl ring, and an adamantyl ring, each containing a hydrogen atom and a carbon number/~ ! (selected from the group consisting of an alkyl group, a notyrogen atom, an alkoxy group having 7 to 5 carbon atoms, a nitro group, a cyano group, and an alkoxycarbonyl group having 1 to 1 carbon atoms) Usually, the photochromic light-sensitive material is A spirooxazine compound is dissolved or dispersed in a polymer compound and then formed into a film.
しかし、従来のスピロオキサジン化合物の場合、発色濃
度および着色状態の堅牢性が必ずしも十分ではなく、融
点も低く、耐熱性が劣っていた。従って、発色・消色の
コントラストが良好で大きな発色濃度を示す堅牢で耐熱
性の良好なフォトクロミック感光材料が得られないとい
う問題点を有していた。However, in the case of conventional spirooxazine compounds, the color density and fastness of the colored state were not necessarily sufficient, the melting point was low, and the heat resistance was poor. Therefore, there has been a problem in that it is not possible to obtain a photochromic light-sensitive material that is robust and has good heat resistance, exhibiting good contrast between color development and decolorization, and high color density.
(発明が解決しようとする問題点)
本発明は耐熱性が良好で発色濃度が大きく、着色状態の
堅牢性に優れていて発色・消色のくり返し安定性の良好
なフォトクロミック性を有するスピロナフトオキサジン
系化合物及び該化合物を含有する感光層より成る感光材
料を提供しようというものである。(Problems to be Solved by the Invention) The present invention provides spironaphthoxazine which has good heat resistance, high coloring density, excellent fastness of the colored state, and good photochromic properties with good stability in repeated coloring and decoloring. The object of the present invention is to provide a photosensitive material comprising a compound and a photosensitive layer containing the compound.
(問題点を解決する丸めの手段)
すなわち、本発明は、一般式(1)
(式中、xl、炉 yl 、 ylはアルキル基、アル
コキシアルキル基、シクロアルキル基、アリール基を示
し、XIとx8、YlとY雪は互いに結合し、環化して
いてもよい。2は他の基もしくは原子を介していてもよ
く、また置換されていてもよいアルキレン基、置換され
ていてもよいアリーレン基を示し、R1,R1、H*
、 R4、R11、R6、R? 、Raは水素原子、ハ
ロゲン原子、アルキル基、アルコキシ基、アルコキシカ
ルボニル基、アルコキシスルホニル基、アルキルスルホ
ニル基ヲ示ス、化6勝
テ表ワされるスピロオキサジレS1びそれを使用した感
光材料である。(Rounding Means to Solve Problems) That is, the present invention is based on the general formula (1) (where xl, yl, and yl represent an alkyl group, an alkoxyalkyl group, a cycloalkyl group, and an aryl group; x8, Yl and Y snow may be bonded to each other and may be cyclized. 2 is an optionally substituted alkylene group or an optionally substituted arylene group, which may be via another group or atom. , R1, R1, H*
, R4, R11, R6, R? , Ra represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkoxysulfonyl group, an alkylsulfonyl group.
本発明の一般式(1)で表わされるスピロオキサジン化
合物におイテ、xl、XI、Yl、Y2はat〜ts、
好ましくはC1〜4のアルキル基等のアルキル基;メト
キシエチル基等のアルコキシアルキル基;シクロヘキシ
ル基、シクロペンチル基等のシクロアルキル基;フェニ
ル基、p−メチル7エ二ル基、ナフチルg% m−メト
キクフェニル基等のアリール基を示し、xlとx2、Y
lとYlは互いニ環化シ、シクロヘキシル基、シクロペ
ンチル基、シクロヘプチル基等のシクロアルキル基等を
形成していてもよho
XI、x2、Yl、Y2としては、メチル基、エチル基
、プロピル基、ブチル基、フェニル基または環化したシ
クロヘキシル基等が好ましい。In the spirooxazine compound represented by the general formula (1) of the present invention, xl, XI, Yl, Y2 are at to ts,
Preferably an alkyl group such as a C1-4 alkyl group; an alkoxyalkyl group such as a methoxyethyl group; a cycloalkyl group such as a cyclohexyl group or a cyclopentyl group; a phenyl group, a p-methyl 7enyl group, or a naphthyl g% m- Indicates an aryl group such as methoxyphenyl group, xl and x2, Y
l and Yl may each form a cycloalkyl group such as dicyclized, cyclohexyl group, cyclopentyl group, or cycloheptyl group. A butyl group, a phenyl group, a cyclized cyclohexyl group, and the like are preferred.
2としては一〇H,−1÷OR,)2−1−(CHt)
3−1(−(!Hり4−1+ CHt )、−1”:”
”t )@ 、+01h)、−1−((H鵞)t−0(
OHz)z−0−(OHz)z−、−(! T1! u
CH2−1○l
もしくは原子を介しているかまたは置換されてもよいア
リーレン基が挙げられる。2 is 10H, -1÷OR,)2-1-(CHt)
3-1(-(!Hri4-1+CHt),-1":"
"t ) @ , +01h), -1-((H鵞)t-0(
OHz)z-0-(OHz)z-,-(! T1! u
Examples include CH2-1○l or an arylene group which may be substituted or substituted through an atom.
R1、R2、R*%R4、RI%R・、R7、′Rsと
しては水素原子;塩素原子、臭素原子、目つ素原子等の
ハロゲン原子;C1〜、のアルキル基等のアルキル基;
C1〜、のアルコキシ基等のアルコキシ基、または、C
4〜、のアルコキシカルボニル基等のアルコキシカルボ
ニル基または、メトキクスルホニル基、エトキシスルホ
ニル基等のアルコキシスルホニル基、メチルスルホニル
基、エチルスルホニル基等のアル中ルスルホニル基が挙
げられる。R1, R2, R*%R4, RI%R・, R7, 'Rs are hydrogen atoms; halogen atoms such as chlorine atom, bromine atom, methane atom; alkyl groups such as C1 ~, alkyl groups;
An alkoxy group such as an alkoxy group of C1~, or C
Examples include alkoxycarbonyl groups such as alkoxycarbonyl groups of 4 to 4, alkoxysulfonyl groups such as methoxysulfonyl group and ethoxysulfonyl group, and alkoxysulfonyl groups such as methylsulfonyl group and ethylsulfonyl group.
本発明の化合物は、例えば、次のようにして製造するこ
とができる。すなわち、下記一般式%式%()
(式中、xl、z!、yl、Y2、R1、R1、R’、
R@ は前記定義に同じ。)
で表わされる2、J、!−トリメチルインドレニン誘導
体く下記一般式〇V)
A−Z−A・・・・・譬・・・・・・・・・拳・・(I
V)(式中、Aはハロゲン原子を示し、2は前記定IA
K同じ。)
で表わされるジハロゲン化物を反応させ1次いで下記一
般式(V)および(W)
O
(式中、R1%R4、R1およびBlは前記定義に同じ
。)
で表わされる!−ニトロンーt−ヒドロキシキノリン誘
導体を反応させることによって製造することができる。The compound of the present invention can be produced, for example, as follows. That is, the following general formula % formula % () (where xl, z!, yl, Y2, R1, R1, R',
R@ is the same as the above definition. ) 2,J,! -Trimethylindolenine derivative has the following general formula 〇V) A-Z-A... Parable... Fist... (I
V) (wherein A represents a halogen atom, and 2 represents the above-mentioned constant IA
Same as K. ) is reacted with a dihalide represented by the following general formulas (V) and (W) O (wherein R1%R4, R1 and Bl are the same as defined above)! -It can be produced by reacting a nitrone-t-hydroxyquinoline derivative.
ジハロゲン化物によるアルキル化反応は熱溶fsするい
はクロロベンゼン、ジクロロベンゼンなどの芳香族系溶
媒などの非極性溶媒中、20〜200℃の反応温度で実
施される。好ましくは無溶媒で730〜/!θ℃で円滑
に実施できる。The alkylation reaction using a dihalide is carried out at a reaction temperature of 20 to 200° C. in a nonpolar solvent such as hot fs or an aromatic solvent such as chlorobenzene or dichlorobenzene. Preferably 730~/! without solvent. It can be carried out smoothly at θ℃.
次いで、!−二トロソー乙−ヒドロキシキノリン誘導体
との反応は、ピペリジン、ピペラジン、モルホリン等の
塩基性触媒の存在下、メタノール、エタノール、グロバ
ノール、ブタノールなどのアルコール系溶媒、アセトン
、メチルエチルケトンなどのケトン系溶媒、ジクロロメ
タン、トリクロロエタンなどのハロゲン化炭化水素系溶
媒などの極性又は非極性の溶媒中で実施される。反応温
度は0〜200℃の範囲で実施される。好ましくは、エ
タノール、メチル二本発明の化合物は、例えば、次のよ
うにしても製造することができる。すなわち、下記一般
式〔■〕
コ
2 ・・・・・・川〔■〕
(式中、X!、z2.yl、Y!、Z、 p、l、 R
”、RM、H@は前記定義に同じ。)
で表わされる化合物と下記一般式(V)、〔■〕?IO
(式中、R1,R4、R?、R” ハ前記定義K 同1
.。)で表わされるj−ニトロソ−6−ヒトロキクキノ
リン誘導体と反応させるととKよって製造することかで
きる。Next,! The reaction with hydroxyquinoline derivatives is carried out in the presence of a basic catalyst such as piperidine, piperazine or morpholine, in an alcoholic solvent such as methanol, ethanol, globanol or butanol, in a ketone solvent such as acetone or methyl ethyl ketone, or in dichloromethane. , in a polar or non-polar solvent such as a halogenated hydrocarbon solvent such as trichloroethane. The reaction temperature is carried out in the range of 0 to 200°C. Preferably, ethanol and methyl are used.The compound of the present invention can also be produced, for example, as follows. That is, the following general formula [■] Ko2... River [■] (In the formula, X!, z2.yl, Y!, Z, p, l, R
", RM, H@ are the same as the above definitions) and the following general formula (V), [■]?IO (wherein, R1, R4, R?, R") C The above definition K Same as 1
.. . ) can be produced by reacting with a j-nitroso-6-hydroxyquinoline derivative represented by K.
反応は通常、メタノール、エタノール、プロパツール、
ブタノールなどのアルコール系溶媒、アセトン、メチル
エチルケトンなどのケトン系溶媒、ジクロロメタン、ト
リクロロエタンなど200℃の範囲で実施され、好まし
くは、4cOロミズムを示す化合物である。すなわち、
本化合物は紫外線照射により発色し、次に可視光を照射
するか、あるいは10℃以上に加熱すると元の無色の状
態圧なり、この変化をくり返すことができる。The reaction is usually carried out using methanol, ethanol, propatool,
The reaction is carried out at a temperature of 200° C., such as an alcohol solvent such as butanol, a ketone solvent such as acetone or methyl ethyl ketone, dichloromethane, or trichloroethane, and preferably a compound exhibiting 4cO romism. That is,
This compound develops a color when irradiated with ultraviolet rays, and then returns to its original colorless state when irradiated with visible light or heated to 10° C. or higher, and this change can be repeated.
本発明の新規な化合物を溶解または分散した樹脂を含有
する感光層を基板上に有する感光材料は、公知の方法に
準じて得ることができる。A photosensitive material having a photosensitive layer on a substrate containing a resin in which the novel compound of the present invention is dissolved or dispersed can be obtained according to a known method.
本発明化合物を溶解又は分散する樹脂としてはポリエス
テル樹脂、ポリスチレン樹脂、ポリビニルブチラール樹
脂、ポリ塩化ビニリデン、ポリ塩化ビニル、ポリメタク
リル酸メチル、ポリ酢酸ビニル、酢酸セルロース、エポ
キシ樹脂、フェノール樹脂等が挙げられ、用いる溶媒と
しては、四塩化炭素、ベンゼン、シクロヘキサン、メチ
ルエチルケトン、テトラクロロエタン、トルエン、エタ
ノール、エチルセルソルブ等カ挙げられる。Examples of the resin that dissolves or disperses the compound of the present invention include polyester resin, polystyrene resin, polyvinyl butyral resin, polyvinylidene chloride, polyvinyl chloride, polymethyl methacrylate, polyvinyl acetate, cellulose acetate, epoxy resin, and phenol resin. Examples of the solvent used include carbon tetrachloride, benzene, cyclohexane, methyl ethyl ketone, tetrachloroethane, toluene, ethanol, and ethyl cellosolve.
本発明化合物の使用割合としては、樹脂に対して3〜!
0%、好ましくは5〜20%である。The ratio of the compound of the present invention to be used is 3~!
0%, preferably 5-20%.
本発明化合物と樹脂以外の他の添加剤としては、感光材
料の安定化や耐光性を向上させる目的で、−重環酸素ク
エンチャーとして遷移金属キレート化合物(たとえばア
セチルアセトナ−前・)ヤい−4.2ユ、8=エアオー
ヤ、ヶヮアルアルデヒドオキシム、ビスジチオール−α
−ジケトン等)を含有せしめてもよい。又は、紫外線吸
収剤、酸化防止剤を添加してもよい。Other additives other than the compound and resin of the present invention include transition metal chelate compounds (for example, acetylacetonate) as a heavy ring oxygen quencher for the purpose of stabilizing the photosensitive material and improving light resistance. -4.2 U, 8 = air oya, kawaraldehyde oxime, bisdithiol -α
- diketone, etc.) may be contained. Alternatively, an ultraviolet absorber or an antioxidant may be added.
感光層の形成方法としては、ドクターブレード法、キャ
スト法、スピナー法、浸漬法等の一般に行なわれる塗布
方法が用いられる。As a method for forming the photosensitive layer, commonly used coating methods such as a doctor blade method, a casting method, a spinner method, and a dipping method are used.
感光層の厚さはO1Sμ〜/、θ劉、好ましくは5〜7
00μである。The thickness of the photosensitive layer is O1Sμ~/, θLi, preferably 5~7
00μ.
本発明における基板としては、透明または不透明のいず
れであってもよいが、基板を感光層の両@に設ける時は
、感光するために少なくとも片面は透明であることが必
要である。基板の材質としては、ガラス、プラスチック
、紙、板状本しくは箔状の金属およびこれらの複合体等
の゛−★持体が用いられるが、種々の点からしてガラス
およびプラスチックが好ましい。そのプラスチックとし
ては、たとえば、アクリル樹脂、メタアクリル樹脂、酢
酸ビニル樹脂、塩化ビニ等があげられる。The substrate in the present invention may be either transparent or opaque, but when substrates are provided on both sides of the photosensitive layer, at least one side must be transparent in order to be exposed to light. As the material of the substrate, glass, plastic, paper, plate-like or foil-like metal, and composites thereof can be used, but glass and plastic are preferable from various points of view. Examples of the plastic include acrylic resin, methacrylic resin, vinyl acetate resin, and vinyl chloride.
(実施例)
次に、本発明を実施例により、更に具体的に説明するが
、本発明は以下の実施例に限定されるものではない。(Examples) Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to the following Examples.
実施例/
下記構造式
で表わされる一、J、J−)リメチルインドレニン/!
、りfおよび下記構造式
%式%
で表わされるジブロモブタン/ 0.r fの混合物t
−/10℃で参時間反応させ、室温まで冷却後、エタノ
ールλ001E/を加え、更に下記構造式で表わされる
!−ニトロソー4−ヒドロキシキノリン/ 7.J f
およびトリエチルアミン10./lを加え、窒素雰囲気
下2時間還流下反応させた。オ炉蓬、クロロホルム抽ム
レ、層重とクラムで乾燥、溶媒留去し、カラムクロマト
グラフィー(溶媒ベンゼン)で分離・精製し下記構造式
で表わされる融点、2IO−コ/4I−℃のスピロオキ
サジン化合物の無色結晶を得た。Example/1,J,J-)limethylindolenine/! represented by the following structural formula!
, rif and dibromobutane represented by the following structural formula % formula % / 0. r f mixture t
- / Reacted at 10°C for a period of time, cooled to room temperature, added ethanol λ001E/, and further represented by the following structural formula! -Nitroso-4-hydroxyquinoline/7. J f
and triethylamine 10. /l was added thereto, and the mixture was reacted under reflux for 2 hours under a nitrogen atmosphere. Spirooxazine, extracted with chloroform, dried with layers and crumbs, distilled off the solvent, separated and purified by column chromatography (solvent benzene), has a melting point of 2IO-co/4I-℃ and is represented by the following structural formula. Colorless crystals of the compound were obtained.
物性値(マススペクトル)は下記の通りである。The physical property values (mass spectrum) are as follows.
(測定条件: 70 eV s J j (’℃)m/
e t/ a(M” )
6ごデ(M”−/s)
/ s r (base peak )本化合物≠2を
用い、熱可塑性ポリエステル樹脂109 (東洋紡社裏
バイロンー−2oo)、溶媒メチルエチルケトン100
9からなる溶液をポリエステルフィルム(ダイヤホイル
社製、厚さ100μ)バーコーターA3を用いて塗布し
、7j℃、70分乾燥した。得られた試料は通常の状態
では無色であるが、紫外線照射すると濃度の高い青色(
λmaw =ご/ Onm ) K発色し喪。図−/に
その吸収スペクトルを示した。(Measurement conditions: 70 eV s J j ('℃) m/
et/a(M”) 6/sr(base peak) Using this compound≠2, thermoplastic polyester resin 109 (Toyobo Ura Byron-2oo), solvent methyl ethyl ketone 100
A solution consisting of 9 was applied to a polyester film (manufactured by Diafoil Co., Ltd., thickness 100 μm) using bar coater A3, and dried at 7j° C. for 70 minutes. The obtained sample is colorless under normal conditions, but when irradiated with ultraviolet light it becomes a highly concentrated blue color (
λmaw = Go/Onm) K color and mourning. The absorption spectrum is shown in Figure-/.
次に、可視光を照射するか、あるいは10℃以上に加熱
すると元の無色の状態になった。この変化はくり返し行
なうことができ友。Next, when exposed to visible light or heated to 10° C. or higher, it returned to its original colorless state. This change can be repeated repeatedly.
実施例2
実加例/におけるジブロモブタン/ 0.♂?の代りに
ジブロモブタンタ、゛≠2を用い、他は実施例/と同様
にして下記化合物を得喪。Example 2 Practical Example/Dibromobutane/0. ♂? The following compound was obtained in the same manner as in Example, except that dibromobutanta, ゛≠2 was used in place of .
CH3ca3 物性値(マススペクトル)は下記の通り。CH3ca3 The physical property values (mass spectrum) are as follows.
(測定条件: 70 evs J 00℃)m/e
t s & (M” )
6参/(M” −/り
/ j r (base peak )本化合物を用い
、実施例1と同様にポリエステルフィルムに塗布したと
ころ、紫外線照射により濃色の青色(λmax= t
/ Onm )に発色した。次に可視光を照射するか、
あるいは29℃以上に加熱すると元の無色の状態に逢っ
た。この変化はくり返し行なうことができた。(Measurement conditions: 70 evs J 00℃) m/e
t s &(M")6/(M"-/ri/j r (base peak) When this compound was applied to a polyester film in the same manner as in Example 1, it turned dark blue (λmax) by ultraviolet irradiation. = t
/Onm). Next, irradiate with visible light or
Alternatively, when heated above 29°C, it returned to its original colorless state. This change could be repeated.
実施例3
下記構造式
%式%)
で表わされる化合物4cJt、Ofをメチルエチルケト
ン1000tdK溶解し、下記構造式で表わされる化合
物3≠、g fを加え、還流下3時間反応させた。室温
まで冷却し、溶媒を留去し、カラムクロマトグラフィー
(使用溶媒ベンゼン)で分離・精製し、下記構造式で表
わされるスピロナフトオキサジン化合物を得た。Example 3 Compound 4cJt, Of represented by the following structural formula (% formula %) was dissolved in 1000 tdK of methyl ethyl ketone, and compound 3≠, g f represented by the following structural formula was added and reacted under reflux for 3 hours. The mixture was cooled to room temperature, the solvent was distilled off, and the mixture was separated and purified by column chromatography (using benzene as the solvent) to obtain a spironaphthoxazine compound represented by the following structural formula.
cHsO1’l= 物性値(マススペクトル)は下記の通り。cHsO1’l= The physical property values (mass spectrum) are as follows.
(測定条件ニアθev、3xO℃)
m/e り3x(M”)
7/り(M” −/、r)
/ s / (base peak )本化合物を用い
、実施例/と同様にポリエステルフィルムに塗布したと
ころ、紫外線照射により、濃色の青色(λmaX =ご
/ Onm )に発色し念。次に可視光を照射するか、
あるいは20℃以上に加熱すると元の無色の状態になつ
穴。(Measurement conditions near θev, 3xO℃) When applied, it developed a deep blue color (λmaX = Go/Onm) due to UV irradiation. Next, irradiate with visible light or
Or a hole that returns to its original colorless state when heated above 20℃.
この変化はくり返し行なうことができた。This change could be repeated.
実施例弘
、°−
シー例′〜JK記載の方法に準じた方法により、前記一
般式(1)で示される下記の第1表に記載のスピロオキ
サジン化合物を合成した。得られた化合物をポリエステ
ルフィルム上に塗布し、紫外線照射したところ各々第1
表に示す色調、λmaxに発色し九。次に可視光を照射
するか、あるいは20℃以上に加熱すると元の無色の状
態になった。この賢化けくり返して行なうことができた
。A spirooxazine compound represented by the general formula (1) and shown in Table 1 below was synthesized by a method similar to that described in Examples Hiroshi, C and JK. When the obtained compounds were applied onto a polyester film and irradiated with ultraviolet rays, each of the first
The color tone shown in the table is 9, and the color develops to λmax. Next, when exposed to visible light or heated to 20°C or higher, it returned to its original colorless state. I was able to do this trick over and over again.
(発明の効果)
本発明のスピロオキサジン化合物は、フォトクロミック
性を有し特に、耐熱性が良好で、発色濃度および着色状
態の堅牢性に優れるため濃色でしかも発色・消色のくり
返し安定性が良好である。(Effects of the Invention) The spirooxazine compound of the present invention has photochromic properties, has particularly good heat resistance, and has excellent color density and color fastness, so it is deep in color and stable in repeated color development and decolorization. In good condition.
このスピロオキサジン化合物を溶解あるいは分散した樹
脂を含有する感光層を基板上に有する感光材料は各種の
調光材料、光学フィルター、マスキング用材料、光量計
として使用するととができる。A photosensitive material having on a substrate a photosensitive layer containing a resin in which a spirooxazine compound is dissolved or dispersed can be used as various light control materials, optical filters, masking materials, and light meters.
図/は、本発明のスピロオキサジン化合物の一例の紫外
線照射時の発色状態の吸収スペクトルを示す。縦軸は吸
光度、横軸は波長を示す。
特許出願人 日産自動車株式会社
(ほか7名)
代 理 人 弁理士 要否用 −(ほか1名)
図−1
(自発)手続補正書
昭和62年//月79日
2 発 明 の名称 スピロオキサジン化合物及び該化
合物を使用した感光材料
4代理人〒100
(ほか l 名)
5 補正の対象 明細書の「発明の詳細な説明」の欄
6 補正の内容
(1) 明細書簡1貰第す〜!行の「製膜」を「成膜
」と訂正する。
(2) 明細書同頁下から3行の「スビロナlトオキ
サジン系化合物」を「スピロオキサジン化/−一
合物」と訂正する。
13)明細書第一〇百下から2行の「パイロン」を「バ
イロン」と訂正する。
(4)明細書第21頁第2行の「パーコーター腐3」を
「パーコーター腐3」と訂正する。
(5)明細書第23頁構造式を除いて上から第りブ
行の「スピロナフトオキメジン化合物」を「スピロオキ
サジン化合物」と訂正する。
(6)明細書簡コj頁表土に「第1表」を加入する。
(力 明細書第コロ頁第1表実施例/16vの化合物を
と訂正する。
(8) 明細書第33頁第1表実施例/1617の化
合物を
と訂正する。
(9)明細薔第Jj頁第1表実施例慮コl及び−一の化
合物を夫々
鷹コ1
7g62コ
と訂正する。
a〔明細書第jA’ii第1表実施例A62(4の化合
物を
と訂正する。
αυ 明細書筒す6頁第1表実施例/l6tl 、7の
あとに以下の実施例を追加する。
以 上Figure / shows the absorption spectrum of an example of the spirooxazine compound of the present invention in a colored state upon irradiation with ultraviolet rays. The vertical axis shows absorbance and the horizontal axis shows wavelength. Patent applicant: Nissan Motor Co., Ltd. (7 others) Agent: Patent attorney - (1 other person) Figure 1 (Voluntary) Procedural amendment dated 79///1982 2 Name of the invention Spirooxazine Compound and photosensitive material using the compound 4 agents 〒100 (and 1 other names) 5 Subject of amendment 6 "Detailed Description of the Invention" column of the specification 6 Contents of amendment (1) I received the specification letter 1! Correct "film formation" in the row to "film formation". (2) In the third line from the bottom of the same page of the specification, "Svironal tooxazine compound" is corrected to "spirooxazinated/-compound." 13) "Pylon" in the second line from the bottom of 1000 of the specification is corrected to "Byron". (4) "Percoater Fu 3" on page 21, line 2 of the specification is corrected to "Percoater Fu 3". (5) Except for the structural formula on page 23 of the specification, "spironaphthookimedine compound" in the first row from the top is corrected to "spirooxazine compound." (6) Add "Table 1" to page J of the detailed letter. (The compound in Example/16v of Table 1 on page 33 of the specification is corrected as follows. (8) The compound in Example/1617 of Table 1 on page 33 of the specification is corrected as. Page 1 Table 1 Example Example A62 (Compound 4 is corrected as Table 1 Example A62 (4) is corrected as Takako17g62, respectively.αυ Details Bookcase page 6 Table 1 Examples/l6tl Add the following examples after 7. That's all.
Claims (4)
〕 (式中、X^1、X^2、Y^1、Y^2はアルキル基
、アルコキシアルキル基、シクロアルキル基、アリール
基を示し、X^1とX^2、Y^1とY^2は互いに結
合し環化していてもよい。Zは他の基もしくは原子を介
していてもよく、また置換されていてもよいアルキレン
基、置換されていてもよいアリーレン基を示し、R^1
、R^2、R^3、R^4、R^5、R^6、R^7、
R^8は水素原子、ハロゲン原子、アルキル基、アルコ
キシ基、アルコキシカルボニル基、アルコキシスルホニ
ル基、アルキルスルホニル基を示す。) で表わされるスピロオキサジン化合物。(1) General formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼・・・・・・[I
] (In the formula, X^1, X^2, Y^1, and Y^2 represent an alkyl group, an alkoxyalkyl group, a cycloalkyl group, and an aryl group, and X^1 and X^2, Y^1 and Y ^2 may be bonded to each other and cyclized.Z represents an alkylene group that may be substituted or an arylene group that may be substituted via another group or atom, and R^ 1
, R^2, R^3, R^4, R^5, R^6, R^7,
R^8 represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkoxysulfonyl group, or an alkylsulfonyl group. ) A spirooxazine compound represented by
、Y^2がメチル基である特許請求の範囲第(1)項記
載のスピロオキサジン化合物。(2) X^1, X^2, Y^1 in general formula [I]
, Y^2 is a methyl group, the spirooxazine compound according to claim (1).
とY^2は互いに結合しシクロヘキサン環を形成してい
る特許請求の範囲第(1)項記載のスピロオキサジン化
合物。(3) X^1, X^2, Y^1 in general formula [I]
The spirooxazine compound according to claim (1), wherein and Y^2 are bonded to each other to form a cyclohexane ring.
〕 (式中、X^1、X^2、Y^1、Y^2はアルキル基
、アルコキシアルキル基、シクロアルキル基、アリール
基を示し、X^1とX^2、Y^1とY^2は互いに結
合し、環化していてもよい。Zは他の基もし くは原子
を介していてもよく、また置換されていてもよいアルキ
レン基、置換されていてもよいアリーレン基を示し、R
^1、R^2、R^3、R^4、R^5、R^6、R^
7、R^8は水素原子、ハロゲン原子、アルキル基、ア
ルコキシ基、アルコキシカルボニル基、アルコキシスル
ホニル基、アルキルスルホニル基を示す。) で表わされるスピロオキサジン化合物を溶解または分散
した樹脂を含有する感光層を基板上に有する感光材料。(4) General formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼・・・・・・[I
] (In the formula, X^1, X^2, Y^1, and Y^2 represent an alkyl group, an alkoxyalkyl group, a cycloalkyl group, and an aryl group, and X^1 and X^2, Y^1 and Y ^2 may be bonded to each other and may be cyclized. Z may be connected to another group or atom, and represents an optionally substituted alkylene group or an optionally substituted arylene group. ,R
^1, R^2, R^3, R^4, R^5, R^6, R^
7. R^8 represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkoxysulfonyl group, or an alkylsulfonyl group. ) A photosensitive material having, on a substrate, a photosensitive layer containing a resin in which a spirooxazine compound represented by the following formula is dissolved or dispersed.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24925186A JPS63115885A (en) | 1986-10-20 | 1986-10-20 | Spiroxazine compound and photosensitive material utilizing said compound |
DE8787904318T DE3774437D1 (en) | 1986-07-08 | 1987-07-03 | SPIROOXAZINE COMPOUNDS, PHOTO-SENSITIVE MATERIALS CONTAINING THEM AND METHOD FOR THE PRODUCTION THEREOF. |
EP19870904318 EP0321563B1 (en) | 1986-07-08 | 1987-07-03 | Spirooxazine compounds, photosensitive materials using them, and process for forming them |
PCT/JP1987/000464 WO1988000196A1 (en) | 1986-07-08 | 1987-07-03 | Spirooxazine compounds, photosensitive materials using them, and process for forming them |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24925186A JPS63115885A (en) | 1986-10-20 | 1986-10-20 | Spiroxazine compound and photosensitive material utilizing said compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63115885A true JPS63115885A (en) | 1988-05-20 |
Family
ID=17190178
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24925186A Pending JPS63115885A (en) | 1986-07-08 | 1986-10-20 | Spiroxazine compound and photosensitive material utilizing said compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63115885A (en) |
-
1986
- 1986-10-20 JP JP24925186A patent/JPS63115885A/en active Pending
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