JPH02225486A - Spiroxazine-based compound and photosensitive material using the same compound - Google Patents
Spiroxazine-based compound and photosensitive material using the same compoundInfo
- Publication number
- JPH02225486A JPH02225486A JP4735989A JP4735989A JPH02225486A JP H02225486 A JPH02225486 A JP H02225486A JP 4735989 A JP4735989 A JP 4735989A JP 4735989 A JP4735989 A JP 4735989A JP H02225486 A JPH02225486 A JP H02225486A
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 50
- 239000000463 material Substances 0.000 title claims abstract description 24
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 32
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 16
- 125000003118 aryl group Chemical group 0.000 claims abstract description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims abstract description 6
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims abstract description 5
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 5
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 5
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 125000005843 halogen group Chemical group 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 4
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 125000005083 alkoxyalkoxy group Chemical group 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 2
- -1 p-toluenesulfonic acid ester Chemical class 0.000 abstract description 20
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract description 6
- 229920003023 plastic Polymers 0.000 abstract description 6
- 239000004033 plastic Substances 0.000 abstract description 6
- 230000003287 optical effect Effects 0.000 abstract description 4
- 150000001412 amines Chemical class 0.000 abstract description 3
- 229910021529 ammonia Inorganic materials 0.000 abstract description 3
- 230000000873 masking effect Effects 0.000 abstract description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N p-toluenesulfonic acid Substances CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 abstract description 2
- MZVAAWXYMDEDLD-UHFFFAOYSA-N 3-nitro-1h-quinolin-2-one Chemical class C1=CC=C2C=C([N+]([O-])=O)C(O)=NC2=C1 MZVAAWXYMDEDLD-UHFFFAOYSA-N 0.000 abstract 1
- 239000000835 fiber Substances 0.000 abstract 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine group Chemical group N1=CCC2=CC=CC=C12 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 abstract 1
- 238000000034 method Methods 0.000 description 19
- 125000004432 carbon atom Chemical group C* 0.000 description 14
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 230000000903 blocking effect Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 229920006267 polyester film Polymers 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- TZXJJSAQSRHKCZ-UHFFFAOYSA-N 2-methoxyethyl 4-methylbenzenesulfonate Chemical compound COCCOS(=O)(=O)C1=CC=C(C)C=C1 TZXJJSAQSRHKCZ-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000005354 coacervation Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000004672 ethylcarbonyl group Chemical group [H]C([H])([H])C([H])([H])C(*)=O 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000001072 heteroaryl group Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000003094 microcapsule Substances 0.000 description 2
- 125000002757 morpholinyl group Chemical group 0.000 description 2
- 239000012454 non-polar solvent Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 238000005191 phase separation Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000003884 phenylalkyl group Chemical group 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 125000003386 piperidinyl group Chemical group 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 239000004753 textile Substances 0.000 description 2
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- DAEFFNAEABRQEK-UHFFFAOYSA-N 3-nitroso-1h-quinolin-2-one Chemical class C1=CC=C2C=C(N=O)C(O)=NC2=C1 DAEFFNAEABRQEK-UHFFFAOYSA-N 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- ULDFPQKCKOFNOF-UHFFFAOYSA-N 5-nitrosoquinolin-6-ol Chemical compound N1=CC=CC2=C(N=O)C(O)=CC=C21 ULDFPQKCKOFNOF-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- 238000012695 Interfacial polymerization Methods 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000005452 alkenyloxyalkyl group Chemical group 0.000 description 1
- 125000005081 alkoxyalkoxyalkyl group Chemical group 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000005160 aryl oxy alkyl group Chemical group 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical group C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 235000019646 color tone Nutrition 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 125000004966 cyanoalkyl group Chemical group 0.000 description 1
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000004851 cyclopentylmethyl group Chemical group C1(CCCC1)C* 0.000 description 1
- 238000004042 decolorization Methods 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000012769 display material Substances 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 125000003387 indolinyl group Chemical class N1(CCC2=CC=CC=C12)* 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000001819 mass spectrum Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000006502 nitrobenzyl group Chemical group 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000011197 physicochemical method Methods 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000004673 propylcarbonyl group Chemical group 0.000 description 1
- 125000004742 propyloxycarbonyl group Chemical group 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- 229920006230 thermoplastic polyester resin Chemical class 0.000 description 1
- 125000005301 thienylmethyl group Chemical group [H]C1=C([H])C([H])=C(S1)C([H])([H])* 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Landscapes
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、新規なスピロオキサジン化合物及び該化合物
を使用した感光材料に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a novel spirooxazine compound and a photosensitive material using the compound.
詳しくは、光照射により色変化する繊維製品、プラスチ
ック製品、調光材料、光学フィルターマスキング用材料
あるいは光量計として使用し得るフォトクロミンク性を
有する新規な化合物および該化合物を使用した感光材料
に関するものである。Specifically, it relates to a novel compound with photochromic properties that can be used as a textile product, plastic product, light control material, optical filter masking material, or light meter that changes color when irradiated with light, and a photosensitive material using the compound. It is.
スピロオキサジン化合物が光の照射により発色又は消色
するフォトクロミック性を有することは知られている。It is known that spirooxazine compounds have photochromic properties that develop or discolor when irradiated with light.
例えば、特表昭61501)45号には、次式の様なス
ピロナフトオキサジン系化合物が提案されている。For example, Japanese Patent Publication No. 61501) No. 45 proposes a spironaphthoxazine compound represented by the following formula.
(式中、残基R1〜R9は次の意味を有する:R’、R
h及びRcは
系列−H,CN、 SCN、 NOx 、 X。(wherein the residues R1 to R9 have the following meanings: R', R
h and Rc are the series - H, CN, SCN, NOx, X.
CHzX、 CXz (X−ハロゲン) 、−O
R’−3Rゝ −COR’ −COOR’
(Rh =H18個までのC原子を有するアルキル、
アリール、ヘテロアリール)、>、Ar(環式芳香族ま
たはへテロ芳香族環系)からなる1個またはより多くの
置換基、
R’、R”、R’、、R9:
系列−H,R’ CHAR’ NH2、NHR
L NR’ 2 、 OR’ 5RI(R’
=8個までのC原子を有するアルキル残基アリールまた
はへテロアリール残基)からなる置換基、ただし、R,
’=Hのときの残基R’ 、R”またはRfの少tくと
も1つはメチル基ではない。)一方、フォトクロミンク
感光材料としては例えば、特公昭4.5−28892号
には、次式の様なスピロナフトオキサジン系化合物を含
有するフォトクロミック材料が提案されている。CHzX, CXz (X-halogen), -O
R'-3Rゝ -COR'-COOR'
(Rh = H alkyl with up to 18 C atoms,
aryl, heteroaryl), >, Ar (cyclic aromatic or heteroaromatic ring system), R', R'', R',, R9: series -H,R 'CHAR' NH2, NHR
L NR' 2 , OR'5RI(R'
= a substituent consisting of an alkyl residue (aryl or heteroaryl residue) having up to 8 C atoms, with the proviso that R,
(When '=H, at least one of the residues R', R'' or Rf is not a methyl group.) On the other hand, as a photochromic light-sensitive material, for example, Japanese Patent Publication No. 4.5-28892 describes A photochromic material containing a spironaphthoxazine compound as shown in the following formula has been proposed.
(式中、Rcは水素原子、ハロゲン原子、シアン基、炭
素数1〜8のアルキル基またはアルコキシ基を示す。)
また、特公昭49−48631号には、次式の様なスピ
ロナフトオキサジン系化合物を高分子物質中に分散させ
たフォトクロミック感光材料が提案されている。(In the formula, Rc represents a hydrogen atom, a halogen atom, a cyan group, an alkyl group having 1 to 8 carbon atoms, or an alkoxy group.) In addition, Japanese Patent Publication No. 49-48631 describes spironaphthoxazine systems such as the following formula. Photochromic light-sensitive materials have been proposed in which compounds are dispersed in polymeric substances.
Rdは炭素数1〜5のアルキル基:Reは水素原子、炭
素数1〜5個のアルキル基、ハロゲン原子、ニトロ基、
シアノ基、炭素数2〜6個のアルコキシカルボニル基ま
たは炭素数1〜5個のアルコキシ基を示す。)
また、特開昭55−36284号には、次式の様なフォ
トクロミック化合物が提案されている。Rd is an alkyl group having 1 to 5 carbon atoms; Re is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a halogen atom, a nitro group,
It represents a cyano group, an alkoxycarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. ) Furthermore, JP-A-55-36284 proposes a photochromic compound as shown in the following formula.
l(1′ (式中、Rhは+CHz−)−,1COOH。l(1' (wherein Rh is +CHz-)-, 1COOH.
−(−CH,+−5CNまたは+CH□±−n C00
R(R4i炭素数1〜5のアルキル基):R’および(
式中、RfとR9の一つはハロゲン原子又は低級アルコ
キシ基で他の一つは水素原子、又RhとRcは水素原子
、低級アルキル基、低級アルコキシ基、又はハロゲン原
子を示す。)
また、USP4,342.668には、次式の様なフォ
トクロミック化合物が提案されている。-(-CH, +-5CN or +CH□±-n C00
R (R4i alkyl group having 1 to 5 carbon atoms): R' and (
In the formula, one of Rf and R9 is a halogen atom or a lower alkoxy group, and the other is a hydrogen atom, and Rh and Rc are a hydrogen atom, a lower alkyl group, a lower alkoxy group, or a halogen atom. ) Furthermore, USP 4,342.668 proposes a photochromic compound as shown in the following formula.
R”
(式中、Rj とR″の一つはハロゲン原子又は低級ア
ルコキシ基で、他の一つは水素原子、また、R1とR″
は水素原子、低級アルキル基、低級アルコキシ基、又は
ハロゲン原子を示し、Rfiは炭素数2から10までの
アルキル基を示す、)そしてこれらのフォトクロミック
化合物を高分子化合物中に溶解又は分散させフィルム状
としたり、基板上に塗布し感光層を形成したり、それら
の上にもう一枚基板を重ね積層体としたフォトクロミッ
ク感光材料が提案されている。R'' (in the formula, one of Rj and R'' is a halogen atom or a lower alkoxy group, the other is a hydrogen atom, and R1 and R''
represents a hydrogen atom, a lower alkyl group, a lower alkoxy group, or a halogen atom, and Rfi represents an alkyl group having 2 to 10 carbon atoms), and these photochromic compounds are dissolved or dispersed in a polymer compound to form a film. Photochromic photosensitive materials have been proposed in which the photosensitive layer is coated on a substrate, or a photosensitive layer is formed by stacking another substrate on top of the photosensitive layer.
しかし、従来のスピロオキサジン化合物の場合、有機系
溶媒への溶解性が劣るため、塗布によって感光層を形成
しにくく、しかも高分子化合物との相溶性が劣るため発
色濃度および着色状態の堅牢性が必ずしも十分ではなか
った。However, conventional spirooxazine compounds have poor solubility in organic solvents, making it difficult to form a photosensitive layer by coating, and poor compatibility with polymeric compounds, resulting in poor color density and color fastness. It wasn't always enough.
従って、コントラストが良好で大きな発色濃度を示す堅
牢なフォトクロミンク感光材料が得られなかった。Therefore, a robust photochromic light-sensitive material exhibiting good contrast and high color density could not be obtained.
〔課題を解決するための手段]
本発明は一般式(1)
〔式中nはO〜4の整数を示し、R’は置換もしくは非
置換のアルキル基、置換もしくは非置換のアルケニル基
、置換もしくは非置換のシクロアルキル基、置換もしく
は非置換の了り−ル基を示す。[Means for Solving the Problems] The present invention relates to the general formula (1) [wherein n represents an integer of O to 4, R' is a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted Alternatively, it represents an unsubstituted cycloalkyl group or a substituted or unsubstituted aryl group.
R1,R3はアルキル基、アルコキシアルキル基を示し
、またはRZ、R2は互いに結合し、環化していてもよ
い。Aは直鎖状または分岐鎖状のアルキレン基を示し、
R4は−NRR’ (R,R’は水素原子、アルコキ
シ基、アルコキシアルコキシ基もしくはヒドロキシ基に
よって置換されていてもよいアルキル基を示す、R,R
’は互いに結合、環化し、含窒素複素環を形成していて
もよい。)を示し、R5、R6、R7,R1′は水素原
子、シアン基。R1 and R3 represent an alkyl group or an alkoxyalkyl group, or RZ and R2 may be bonded to each other and cyclized. A represents a linear or branched alkylene group, R4 represents -NRR' (R, R' represents an alkyl group optionally substituted with a hydrogen atom, an alkoxy group, an alkoxyalkoxy group, or a hydroxy group, R,R
' may be bonded to each other or cyclized to form a nitrogen-containing heterocycle. ), and R5, R6, R7, and R1' are hydrogen atoms and cyan groups.
アルキル基、アルコキシ基、ニトロ基、アルコキシカル
ボニル基、アルキルカルボニル基、トリフルオロメチル
基、ハロゲン原子、ヒドロキシ基。Alkyl group, alkoxy group, nitro group, alkoxycarbonyl group, alkylcarbonyl group, trifluoromethyl group, halogen atom, hydroxy group.
カルボキシル基を示す。〕
で表わされるスピロオキサジン化合物及び該化合物を含
有する感光層を設けてなる感光材料を要旨とする。Indicates a carboxyl group. ] The gist is a photosensitive material provided with a spirooxazine compound represented by the following and a photosensitive layer containing the compound.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
本発明のスピロオキサジン化合物は、前記一般式(1)
で表わされるものである。The spirooxazine compound of the present invention has the general formula (1)
It is expressed as
式中R1としては、C+、、ZSのアルキル基等のアル
キル基;メトキシエチル基、エトキシエチル基等のアル
コキシアルキル基;メトキシエトキシエチル基、n−ブ
トキシエトキシエチル基等のアルコキシアルコキシアル
キル基;メトキシエトキシエトキシエチル基、エトキシ
エトキシエトキシエチル等のアルコキシアルコキシアル
コキシアルキル基;フェニルオキシエチル基、ナフチル
オキシエチル基、p−クロロフェニルオキシエチル基等
の置換されていてもよいアリールオキシアルキル基;ヘ
ンシル基、フェネチル基、p−クロロベンジル基、p−
ニトロベンジル基等の置換されていてもよいフェニルア
ルキル基;シクロヘキシルメチル基、シクロヘキシルエ
チル基、シクロペンチルメチル基等のシクロアルキルア
ルキル基;アリルオキシエチル基、3−ブロモアリルオ
キシエチル基等の置換されていてもよいアルケニルオキ
シアルキル基ニジアノエチル基、シアノメチル基等のシ
アノアルキル基:ヒドロキシエチル基、ヒドロキシメチ
ル基等のヒドロキシアルキル基:テトラヒドロフルフリ
ル基、テトラヒドロフリルエチル基等のテトラヒドロフ
リルアルキル基;チエニルエチル基、チエニルメチル基
等のチェニルアルキル基等の置換もしくは非置換のアル
キル基、アリル基、2−クロロアリル基等の置換もしく
は非置換のアルケニル基、フェニル基、p−メチルフェ
ニル基、ナフチル基、m−メI・キシフェニル基等の置
換もしくは非置換のアリール基、または、シクロヘキシ
ル基、シクロペンチル基等のシクロアルキル基更には、
これらシクロアルキル基がハロゲン原子、アルキル基、
アルコキシ基等で置換されたものが挙げられる。これら
の中で、R1としては炭素数1〜6のアルキル基、アリ
ル基、フェニル基等の基を示すのが好ましい。In the formula, R1 is an alkyl group such as a C+, ZS alkyl group; an alkoxyalkyl group such as a methoxyethyl group or an ethoxyethyl group; an alkoxyalkoxyalkyl group such as a methoxyethoxyethyl group or an n-butoxyethoxyethyl group; methoxy Alkoxyalkoxyalkoxyalkyl groups such as ethoxyethoxyethyl group and ethoxyethoxyethoxyethyl group; optionally substituted aryloxyalkyl groups such as phenyloxyethyl group, naphthyloxyethyl group, p-chlorophenyloxyethyl group; Hensyl group, phenethyl group group, p-chlorobenzyl group, p-
Optionally substituted phenylalkyl groups such as nitrobenzyl group; cycloalkylalkyl groups such as cyclohexylmethyl group, cyclohexylethyl group, cyclopentylmethyl group; substituted phenylalkyl groups such as allyloxyethyl group, 3-bromoallyloxyethyl group, etc. optional alkenyloxyalkyl groups; cyanoalkyl groups such as dianoethyl group and cyanomethyl group; hydroxyalkyl groups such as hydroxyethyl group and hydroxymethyl group; tetrahydrofuryl alkyl groups such as tetrahydrofurfuryl group and tetrahydrofurylethyl group; thienylethyl group , substituted or unsubstituted alkyl groups such as thienylalkyl groups such as thienylmethyl groups, substituted or unsubstituted alkenyl groups such as allyl groups and 2-chloroallyl groups, phenyl groups, p-methylphenyl groups, naphthyl groups, m Substituted or unsubstituted aryl groups such as -MeI xyphenyl group, or cycloalkyl groups such as cyclohexyl group and cyclopentyl group;
These cycloalkyl groups are halogen atoms, alkyl groups,
Examples include those substituted with an alkoxy group or the like. Among these, R1 preferably represents a group having 1 to 6 carbon atoms, such as an alkyl group, an allyl group, or a phenyl group.
R2,R3はC+−teのアルキル基等のアルキル基:
メトキシエチル基、エトキシエチル基等のアルコキシア
ルキル基を示し、R2とR3は互いに結合し、環化して
、シクロヘキシル基、シクロペンチル基、シクロへブチ
ル基等のシクロアルキル基を形成していてもよい。R1
,R3としては、特に、メチル基、エチル基、プロピル
基、ブチル基等の低級アルキル基または、R2とR3が
環化したシクロヘキシル基等が好ましい。R2 and R3 are alkyl groups such as C+-te alkyl groups:
It represents an alkoxyalkyl group such as a methoxyethyl group or an ethoxyethyl group, and R2 and R3 may be bonded to each other and cyclized to form a cycloalkyl group such as a cyclohexyl group, a cyclopentyl group, or a cyclohebutyl group. R1
, R3 is particularly preferably a lower alkyl group such as a methyl group, ethyl group, propyl group, or butyl group, or a cyclohexyl group obtained by cyclizing R2 and R3.
Aの直鎖または分岐状のアルキレン基の例としては、例
えば下記のものが挙げられる。Examples of the linear or branched alkylene group of A include the following.
CHz CH、−fCHz→−r、 −CHCH2
CR3CH:1
−CH。CHz CH, -fCHz→-r, -CHCH2
CR3CH:1-CH.
C1]− −CHCHI zHs zHs CH。C1]- -CHCHI zHs zHs CH.
−(−CH,→−丁。-(-CH, →-ding.
+CHz→−「。+CHz→-“.
一+CH2→−「cH、CHzCH CH3C)Hl(n) −CH,CH CaHq(n+ −NHC! OH。1+CH2→-“cH, CHzCH CH3C)Hl(n) -CH,CH CaHq(n+ -NHC! Oh.
−NHC。-NHC.
OCH,t
Aとしては炭素数1〜6の直鎖状のアルキレン基が好ま
しい。nとしては1を表すものが好ましい。OCH,tA is preferably a linear alkylene group having 1 to 6 carbon atoms. It is preferable that n represents 1.
R4の例としては例えば下記のものが挙げられる。Examples of R4 include the following.
NHz 、 NHCH3、NHCz Hs 。NHz, NHCH3, NHCzHs.
NHCH2C82CH2、−NH(CHI)3CHff
。NHCH2C82CH2, -NH(CHI)3CHff
.
N HCH(CH:l ) t
OCR,、またR、R’が結合環化し、含窒素複素環を
形成するものの例としては
−NHGHz CH(CHz )! 。N HCH(CH:l ) t OCR, and an example of a compound in which R and R' are bonded and cyclized to form a nitrogen-containing heterocycle is -NHGHz CH(CHz )! .
N (CH3) z 、 N (Ct
Hs)z。N (CH3) z, N (Ct
Hs)z.
N (Cal H?。+)z 、 N (C
4Hq+−1)zC1)3
しUNHz
CIlzυH
R4としては、特にピペリジニル基、モルフオリニル基
、ジメチルアミノ基、ジエチルアミノ基が好ましい。N (Cal H?.+)z, N (C
As R4, a piperidinyl group, a morpholinyl group, a dimethylamino group, and a diethylamino group are particularly preferable.
更に好ましくは、ピペリジニル基、モルフオリニル基が
挙げられる。More preferred are a piperidinyl group and a morpholinyl group.
R’、Rh、R’、R’は、水素原子ニジアノ基:メチ
ル基、エチル基、プロピル基等の炭素数1〜6のアルキ
ル基、メトキシ基、エトキシ基、プロポキシ基等の炭素
数1〜6のアルコキシ基:ニトロ基;メトキシカルボニ
ル基、エトキシカルボニル基、プロポキシカルボニル基
等の炭素数1〜6のアルコキシ基を有するアルコキシカ
ルボニル基:エチルカルボニル基、エチルカルボニル基
、プロピルカルボニル基等の炭素数1〜6のアルキル基
を有するアルキルカルボニル基ニトリフルオロメチル基
:塩素原子、臭素原子、ヨウ素原子等のハロゲン原子:
ヒドロキシ基二カルボキシル基等を示す。こΦ様なR5
、Rh 、 R’l 、 R8の基としては水素原
子、低級アルキル基、低級アルコキシ基、ハロゲン原子
、ヒドロキシ基が好ましい。R', Rh, R', and R' are hydrogen atoms, diano groups, alkyl groups having 1 to 6 carbon atoms such as methyl, ethyl, and propyl groups, and 1 to 6 carbon atoms such as methoxy, ethoxy, and propoxy groups; Alkoxy group of 6: nitro group; alkoxycarbonyl group having an alkoxy group having 1 to 6 carbon atoms such as methoxycarbonyl group, ethoxycarbonyl group, propoxycarbonyl group: carbon number such as ethylcarbonyl group, ethylcarbonyl group, propylcarbonyl group, etc. Alkylcarbonyl group having 1 to 6 alkyl groups Nitrifluoromethyl group: Halogen atom such as chlorine atom, bromine atom, iodine atom:
Indicates hydroxy group, dicarboxyl group, etc. This Φ-like R5
, Rh, R'l, and R8 are preferably a hydrogen atom, a lower alkyl group, a lower alkoxy group, a halogen atom, or a hydroxy group.
本発明の化合物は、例えば次のようにして製造すること
ができる。すなわち、下記一般式(II)(式中、RZ
、 R3、R5、R6は前記定義に同じ。)で表わ
されるインドレニン誘導体を下記−般式(III)
(式中、A、 % n 、R’ は前記定義に同じ。)
で表わされるI)−4ルエンスルホン酸エステルでアル
キル化し、次いで下記一般式(IV)
(式中、R7,R1)は前記定義に同じ。)で表わされ
るニトロヒドロキシキノリン誘導体及びN HRR’
(R,R’は前記定義に同じ。)で表わされるアンモ
ニアまたはアミン類と反応させることテ艷よって製造す
ることができる。The compound of the present invention can be produced, for example, as follows. That is, the following general formula (II) (wherein RZ
, R3, R5, and R6 are the same as defined above. ) is represented by the following general formula (III) (wherein A, % n and R' are the same as defined above).
The compound is alkylated with I)-4 luenesulfonic acid ester represented by the following general formula (IV) (wherein, R7 and R1) are the same as defined above. ) and N HRR'
It can be produced by reacting with ammonia or amines represented by (R, R' are the same as defined above).
、〕〕p−トルエンスルホン酸エステによるアルキル化
反応は無溶媒あるいはクロロヘンゼン、ジクロロベンゼ
ンなどの芳香族系溶媒などの非極性溶媒中、80〜20
0℃の反応温度で実施される。, ]] The alkylation reaction using p-toluenesulfonic acid ester is carried out without a solvent or in a nonpolar solvent such as an aromatic solvent such as chlorohenzene or dichlorobenzene.
It is carried out at a reaction temperature of 0°C.
好ましくは無溶媒で100〜150℃で円滑に実施でき
る。この反応の後、Naz CO3,NaOH等のアル
カリと水を加えた後60°Cで撹拌し、油層を分離し、
減圧蒸留する。Preferably, it can be carried out smoothly at 100 to 150°C without a solvent. After this reaction, add alkali such as Naz CO3 and NaOH and water, stir at 60°C, and separate the oil layer.
Distill under reduced pressure.
次いで、ニトロソヒドロキシキノリン誘導体並びにアン
モニア又はアミン類との反応はメタノール、エタノール
、プロパツール、ブタノールなどのアルコール系溶媒、
アセトン、メチルエチルケトンなどのケトン系溶媒、ジ
クロロメタン、トリクロロエタン、トリクロロエチレン
などのハロゲン化炭化水素系溶媒などの極性又は非極性
の溶媒の存在下に実施される。反応温度は0〜200℃
の範囲で実施される。好ましくは、エタノール、メチル
エチルケトン、アセトン、トリクロロエチレン中で、4
0℃〜120℃で円滑に実施できる。Next, the reaction with the nitrosohydroxyquinoline derivative and ammonia or amines is carried out using an alcoholic solvent such as methanol, ethanol, propatool, butanol,
It is carried out in the presence of a polar or non-polar solvent such as a ketone solvent such as acetone or methyl ethyl ketone, or a halogenated hydrocarbon solvent such as dichloromethane, trichloroethane, or trichloroethylene. Reaction temperature is 0-200℃
It will be carried out within the scope of. Preferably, in ethanol, methyl ethyl ketone, acetone, trichloroethylene, 4
It can be carried out smoothly at 0°C to 120°C.
本発明の化合物は新規な色素であり、ホトクロミズムを
示す化合物である。すなわち、本化合物は紫外線照射に
より発色し、次に紫外線を遮断して数暁間放置するか、
あるいは可視光を照射すると元の状態になり、この変化
をくり返すことができる。The compound of the present invention is a novel dye and a compound exhibiting photochromism. That is, this compound develops color when exposed to ultraviolet rays, and then the ultraviolet rays are blocked and left for several hours, or
Alternatively, when exposed to visible light, it returns to its original state, and this change can be repeated.
本発明の感光材料は前記の化合物あるいは、該化合物を
マイクロカプセル化したものを樹脂に溶解または分散さ
せたものを含有する感光層を基板上に有するもので、公
知の方法に準じて得ることができる。The photosensitive material of the present invention has a photosensitive layer on a substrate containing the above-mentioned compound or a microcapsule of the compound dissolved or dispersed in a resin, and can be obtained according to a known method. can.
本発明における基板としては、透明または不透明のいず
れであってもよいが、基板を感光層の両側に設ける時は
、感光するために少なくとも片面は透明であることが必
要である。基板の材質としては、ガラス、プラスチック
、紙、板状もしくは箔状の金属およびこれらの複合体等
の支持体が用いられるが、種々の点からしてガラスおよ
びプラスチックが好ましい。そのプラスチックとしては
、たとえば、アクリル樹脂、メタアクリル樹脂、酢酸ビ
ニル樹脂、塩化ビニル樹脂、ポリエチレン樹脂、ポリプ
ロピレン樹脂、ポリカーボネート樹脂、ポリサルホン樹
脂等が挙げられる。The substrate in the present invention may be either transparent or opaque, but when the substrates are provided on both sides of the photosensitive layer, at least one side must be transparent in order to be exposed to light. As the material of the substrate, supports such as glass, plastic, paper, plate-shaped or foil-shaped metal, and composites thereof are used, and glass and plastic are preferable from various points of view. Examples of the plastic include acrylic resin, methacrylic resin, vinyl acetate resin, vinyl chloride resin, polyethylene resin, polypropylene resin, polycarbonate resin, polysulfone resin, and the like.
本発明化合物を溶解又は分散する樹脂としてはポリエス
テル樹脂、ポリスチレン樹脂、ポリビニルブチラール樹
脂、ポリ塩化ビニリデン、ポリ塩化ビニル、ポリメタク
リル酸メチル、ポリ酢酸ビニル、酢酸セルロース、エポ
キシ樹脂、フェノール樹脂、ポリアセタール樹脂等が挙
げられ、用いる溶媒としては、四塩化炭素、ヘンゼン、
シクロヘキサン、メチルエチルケトン、メチルイソブチ
ルケトン、テトラクロロエタン、トルエン、エタノール
、エチルセロソルブ等があげられる。本発明化合物の使
用割合としては、樹脂に対して3〜50%、好ましくは
5〜20%である。Examples of the resin for dissolving or dispersing the compound of the present invention include polyester resin, polystyrene resin, polyvinyl butyral resin, polyvinylidene chloride, polyvinyl chloride, polymethyl methacrylate, polyvinyl acetate, cellulose acetate, epoxy resin, phenol resin, polyacetal resin, etc. Examples of solvents used include carbon tetrachloride, Hensen,
Examples include cyclohexane, methyl ethyl ketone, methyl isobutyl ketone, tetrachloroethane, toluene, ethanol, and ethyl cellosolve. The proportion of the compound of the present invention used is 3 to 50%, preferably 5 to 20%, based on the resin.
本発明のスピロオキサジン化合物をマイクロカプセル化
して用いる場合のその方法としては、文献〔近藤保著「
最新マイクロカプセル化技術」(総合技術センター出版
)〕記載の通常知られている方法が挙げられる。すなわ
ち界面重合法、1nsitu重合法などの化学的方法、
相分離法(単純コアセルベーション法、複合コアセルベ
ーション法)、界面沈殿法等の物理化学的方法、スプレ
ードライ法、気中懸濁被覆法などの物理的・機械的方法
が挙げられる。When using the spirooxazine compound of the present invention in microcapsule form, the method is described in the literature [written by Tamotsu Kondo,
Examples include the commonly known method described in "Latest Microencapsulation Technology" (published by Sogo Gijutsu Center). That is, chemical methods such as interfacial polymerization method and 1 nsitu polymerization method,
Examples include physicochemical methods such as phase separation methods (simple coacervation method, complex coacervation method), interfacial precipitation method, and physical/mechanical methods such as spray drying method and air suspension coating method.
好ましいマイクロカプセル化方法としては、ゼラチン系
膜剤(例えばゼラチン−アラビアゴム系膜剤、ゼラチン
−カルボキシメチルセルロース系膜剤)の相分離法、メ
ラミン−ホルムアルデヒド樹脂を用いたin 5itu
重合法が挙げられる。Preferred microencapsulation methods include phase separation of gelatin-based membrane agents (e.g., gelatin-gum arabic membrane agents, gelatin-carboxymethylcellulose-based membrane agents), and in-5-itu method using melamine-formaldehyde resin.
Examples include polymerization methods.
基板としてのフィル′ム上に感光層を形成する方法とし
ては、ドクターブレード法、キャスト法、スピナー法、
浸漬法等の一般に行なわれる塗布方法が用いられる。Methods for forming a photosensitive layer on a film as a substrate include the doctor blade method, casting method, spinner method,
A commonly used coating method such as a dipping method is used.
フィルムの厚さは0.5μm〜1.0I*m、好ましく
は5μm〜100μmである。本発明の感光材料は必要
に応じて各種添加剤を使用してもよい。The thickness of the film is between 0.5 μm and 1.0 I*m, preferably between 5 μm and 100 μm. The photosensitive material of the present invention may contain various additives, if necessary.
次に、本発明を実施例により、更に具体的に説明するが
本発明はこれら実施例により何ら限定されるものではな
い。Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to these Examples in any way.
実施例1
下記構造式
で表わされる2、3,3.5−テトラメチルインドレニ
ン8.6gおよび下記構造式
で表わされるp−)ルエンスルホン酸エステル誘導体1
3.0gの混合物を1)0℃で4時間反応させ、室温ま
で冷却後、Na、coalを5.8g添加し、撹拌した
。次いで、水を8Qml加え、60℃で2時間撹拌した
後、油層を分取し、減圧蒸留を行って下記構造式
で表わされるインドリン誘導体を得た。Example 1 8.6 g of 2,3,3.5-tetramethylindolenine represented by the following structural formula and p-)luenesulfonic acid ester derivative 1 represented by the following structural formula
1) 3.0 g of the mixture was reacted at 0° C. for 4 hours, and after cooling to room temperature, 5.8 g of Na and coal were added and stirred. Next, 8 Qml of water was added, and after stirring at 60°C for 2 hours, the oil layer was separated and distilled under reduced pressure to obtain an indoline derivative represented by the following structural formula.
更にこれをトリクロロエチレン150m7!中で下記構
造式
で表わされる5−ニトロソ−6−ヒドロキシキノリン8
.6gおよびピペリジン8.5gと3時間還流下反応さ
せた。冷却後トリクロロエチレンを除去し、反応生成物
をシリカゲルカラムクロマトグラフィー(溶媒;トルエ
ン)で分離・精製し、褐色の粉末0.2 gを得た。得
られた化合物は、下記の構造式で表わされ、以下に示す
物性を有する。Add this to 150m7 of trichlorethylene! Among them, 5-nitroso-6-hydroxyquinoline 8 represented by the following structural formula
.. 6 g and 8.5 g of piperidine under reflux for 3 hours. After cooling, trichlorethylene was removed, and the reaction product was separated and purified by silica gel column chromatography (solvent: toluene) to obtain 0.2 g of brown powder. The obtained compound is represented by the following structural formula and has the physical properties shown below.
(物性値)
(1)融点 70℃
(2)マススペクトル(測定条件ニア0eV150℃)
m/e 47 0 (M4)
455 (M” CH:l )425 (M
”−3CH,)
(3+1Rスペクトルデータは図−1に示す。(Physical property values) (1) Melting point 70°C (2) Mass spectrum (measurement conditions near 0 eV 150°C) m/e 47 0 (M4) 455 (M” CH:l) 425 (M
"-3CH,) (3+1R spectrum data is shown in Figure-1.
本化合物0.2gを用い、熱可望性ポリエステル樹脂1
.0g(東洋紡社製:商品名バイロン−200)、ン容
媒ノチルエチルケトン100gからなる)容液をポリエ
ステルフィルム(ダイヤホイル社製、厚さ100μm)
バーコーター阻3を用いて塗布し、75℃、10分間乾
燥した。得られた試料を通常の状態では無色であるが、
紫外線照射すると濃度の高い紫色(λ□、=575nm
)に発色した。Using 0.2 g of this compound, thermoplastic polyester resin 1
.. 0 g (manufactured by Toyobo Co., Ltd., trade name: Vylon-200), a solution consisting of 100 g of notyl ethyl ketone as a carrier) was transferred to a polyester film (manufactured by Diafoil Co., Ltd., thickness 100 μm).
It was coated using Bar Coater 3 and dried at 75° C. for 10 minutes. The obtained sample is colorless under normal conditions, but
When irradiated with ultraviolet rays, a highly concentrated purple color (λ□, = 575 nm)
).
次に、紫外線を遮断して数時間放置するか、あるいは可
視光を照射すると元の無色の状態になった。この変化は
くり返し行なうことができた。Next, they were left in their original colorless state by blocking ultraviolet rays and leaving them for several hours, or by irradiating them with visible light. This change could be repeated.
本品は紫外線照射の前後の発色濃度のコントラストが良
好で大きな発色濃度を示し、耐光性に優れていた。This product showed good contrast between the color density before and after UV irradiation, showed a large color density, and had excellent light resistance.
実施例2
実施例Iに於けるp−トルエンスルホン酸メトキシエチ
ルエステル13.0 gの代りにp−トルエンスルホン
酸メトキシエトキシエチルエステル14.8gを用い、
他は実施例1と同様にして、下記構造式で示される本発
明のスピロオキサジン化合物を得た。Example 2 Using 14.8 g of p-toluenesulfonic acid methoxyethyl ester instead of 13.0 g of p-toluenesulfonic acid methoxyethyl ester in Example I,
In the same manner as in Example 1, a spirooxazine compound of the present invention represented by the following structural formula was obtained.
CJ<OCz!LOCH:+
本化合物を用い、実施例1と同様にポリエステルフィル
ムに塗布したところ、紫外線照射により、濃色の紫色(
λ、、、 = 575nm)に発色した。次いで紫外線
を遮断して数時間放置するか、あるいは可視光を照射す
ると元の無色の状態になった。CJ<OCz! LOCH: + When this compound was applied to a polyester film in the same manner as in Example 1, it turned dark purple (
λ, , = 575 nm). The material was then left in its original colorless state by blocking ultraviolet rays and leaving it for several hours, or by irradiating it with visible light.
この変化はくり返し行なうことができた。This change could be repeated.
実施例3
下記構造式
で表わされる化合物12.3 gをトリクロロエチレン
200mlに溶解し、下記構造式
で表わされる化合物9.0gおよびモルフォリン9゜0
gを加え、還流下4時間反応させた。次いで、室温まで
冷却し、溶媒を留去し、カラムクロマトグラフィー(使
用溶媒:トルエン)で分離・精製し、下記構造式で示さ
れる本発明のスピロオキサジン化合物を得た。Example 3 12.3 g of the compound represented by the following structural formula was dissolved in 200 ml of trichlorethylene, and 9.0 g of the compound represented by the following structural formula and 9.0 g of morpholine were dissolved.
g was added thereto, and the mixture was reacted under reflux for 4 hours. Next, the mixture was cooled to room temperature, the solvent was distilled off, and the mixture was separated and purified by column chromatography (solvent used: toluene) to obtain the spirooxazine compound of the present invention represented by the following structural formula.
紫外線照射したところ各々第1表に示す色調、λamx
に発色した。次いで紫外線を遮断して数時間放置するか
、あるいは可視光を照射すると元の無色の状態になった
。この変化はくり返して行なうことができた。When irradiated with ultraviolet rays, the color tones shown in Table 1, λamx
The color developed. The material was then left in its original colorless state by blocking ultraviolet rays and leaving it for several hours, or by irradiating it with visible light. This change could be repeated.
本化合物を用い、実施例1と同様にポリエステルフィル
ムに塗布したところ、紫外線照射により、濃い紫色(λ
、1X= 573nm)に発色した。次いで紫外線を遮
断して数時間放置するか、あるいは可視光を照射すると
元の無色の状態になった。この変化はくり返し行なうこ
とができた。When this compound was applied to a polyester film in the same manner as in Example 1, it was exposed to deep purple color (λ) by ultraviolet irradiation.
, 1X = 573 nm). The material was then left in its original colorless state by blocking ultraviolet rays and leaving it for several hours, or by irradiating it with visible light. This change could be repeated.
実施例4
実施例1〜3に準じた方法により、下記第1表に示され
る本発明のスピロオキサジン化合物を合成した。得られ
た化合物を用いて、実施例1に準じた方法によりポリエ
ステルフィルム上に塗布し、これ等実施例として第1表
に挙げたスピロオキサジン系化合物の他、下記第2表に
挙げた化合物が使用できるが、本発明はこれ等に限られ
ない。Example 4 Spirooxazine compounds of the present invention shown in Table 1 below were synthesized by a method similar to Examples 1 to 3. The obtained compound was coated on a polyester film by a method similar to Example 1, and in addition to the spirooxazine compounds listed in Table 1 as examples, the compounds listed in Table 2 below were However, the present invention is not limited thereto.
本発明のフォトクロミック化合物は、有機系溶媒への溶
解性がすぐれるため塗布による成膜が容易であり、特に
、高分子化合物に対する相溶性にすぐれるため、濃色で
しかも耐光性が良好で発色・消色のくり返し安定性の良
好な組成物を得ることができる。The photochromic compound of the present invention has excellent solubility in organic solvents, so it is easy to form a film by coating.In particular, it has excellent compatibility with polymer compounds, so it has a deep color and good light resistance. - It is possible to obtain a composition with good stability against repeated decolorization.
また本化合物をマイクロカプセル化することも可能であ
る。It is also possible to microencapsulate the present compound.
このような本化合物は各種の光照射により色変化する繊
維製品、プラスチック製品、調光材料、光学フィルター
、マスキング用材料、光イ計、デイスプレィ用材料とし
て使用される。Such compounds of the present invention are used as textile products, plastic products, light control materials, optical filters, masking materials, optical meters, and display materials that change color upon irradiation with various types of light.
図−1は、本発明の実施例1のスピロオキサジン系化合
物のIRスペクトルを表わすものであり、縦軸は透過率
(%T)横軸は波数(cm−’ )を表わす。FIG. 1 shows the IR spectrum of the spirooxazine compound of Example 1 of the present invention, where the vertical axis represents transmittance (%T) and the horizontal axis represents wave number (cm-').
Claims (2)
非置換のアルキル基、置換もしくは非置換のアルケニル
基、置換もしくは非置換のシクロアルキル基、置換もし
くは非置換のアリール基を示す。 R^2、R^3はアルキル基、アルコキシアルキル基を
示し、またはR^2、R^3は互いに結合し、環化して
いてもよい。Aは直鎖状または分岐鎖状のアルキレン基
を示し、 R^4は−NRR′(R、R′は水素原子、アルコキシ
基、アルコキシアルコキシ基もしくはヒドロキシ基によ
って置換されていてもよいアルキル基を示す。R、R′
は互いに結合、環化し、含窒素複素環を形成していても
よい。)を示し、R^5、R^6、R^7、R^8は水
素原子、シアノ基、アルキル基、アルコキシ基、ニトロ
基、アルコキシカルボニル基、アルキルカルボニル基、
トリフルオロメチル基、ハロゲン原子、ヒドロキシ基、
カルボキシル基を示す。〕 で表わされるスピロオキサジン化合物。(1) The following general formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼... [I] [In the formula, n represents an integer from 0 to 4, R^1 is a substituted or unsubstituted alkyl group, It represents a substituted or unsubstituted alkenyl group, a substituted or unsubstituted cycloalkyl group, or a substituted or unsubstituted aryl group. R^2 and R^3 represent an alkyl group or an alkoxyalkyl group, or R^2 and R^3 may be bonded to each other and cyclized. A represents a linear or branched alkylene group, and R^4 represents -NRR' (R and R' represent a hydrogen atom, an alkyl group optionally substituted with an alkoxy group, an alkoxyalkoxy group, or a hydroxy group); Indicates R, R'
may be bonded to each other or cyclized to form a nitrogen-containing heterocycle. ), R^5, R^6, R^7, R^8 are hydrogen atoms, cyano groups, alkyl groups, alkoxy groups, nitro groups, alkoxycarbonyl groups, alkylcarbonyl groups,
Trifluoromethyl group, halogen atom, hydroxy group,
Indicates a carboxyl group. ] A spirooxazine compound represented by
で表わされるスピロオキサジン化合物を含有する感光層
を設けてなる感光材料。(2) General formula [I] in claim (1) on the substrate
A photosensitive material comprising a photosensitive layer containing a spirooxazine compound represented by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4735989A JPH02225486A (en) | 1989-02-28 | 1989-02-28 | Spiroxazine-based compound and photosensitive material using the same compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4735989A JPH02225486A (en) | 1989-02-28 | 1989-02-28 | Spiroxazine-based compound and photosensitive material using the same compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02225486A true JPH02225486A (en) | 1990-09-07 |
Family
ID=12772931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4735989A Pending JPH02225486A (en) | 1989-02-28 | 1989-02-28 | Spiroxazine-based compound and photosensitive material using the same compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02225486A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1073564C (en) * | 1995-09-11 | 2001-10-24 | 康宁股份有限公司 | Photochemic spiroxazines with asymmetric monocyclic substituent, compositions and articles containing them |
-
1989
- 1989-02-28 JP JP4735989A patent/JPH02225486A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1073564C (en) * | 1995-09-11 | 2001-10-24 | 康宁股份有限公司 | Photochemic spiroxazines with asymmetric monocyclic substituent, compositions and articles containing them |
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