JPS6233762A - Vacuum deposition device - Google Patents

Abstract

PURPOSE:To simplify the mechanism of a vacuum deposition device and to reduce the size of a vacuum vessel by continuously supplying a molten vapor deposition material through a transport pipe by a differential pressure from a reservoir part installed to the atm. side to a crucible for vapor deposition disposed in the vacuum vessel. CONSTITUTION:This vapor deposition device is constituted by supplying the molten vapor deposition material 1A obtd. by heating and melting the vapor deposition material 1 in the reservoir part 2 installed to the atm. side to the crucible 3 for vapor deposition disposed in the vacuum vessel 6 having a vacuum evacuation device 7 through the transport pipe 4 and further evaporating the same by heating to deposit the material by evaporation on a substrate 9 on a substrate holder 8. The molten vapor deposition material 1A in the reservoir part 2 of the above-mentioned device is continuously supplied to the crucible 3 by the differential pressure P0-P1 between the atm. pressure P0 and the pressure P1 in the crucible. The pressure is preferably balanced at all times in such a manner as to maintain P0-P1=DELTAP+rhoDELTAH as the fluid resistance DELTAP of the molten vapor deposition material 1A in the transport pipe 4, the head difference DELTAH between the crucible 3 and the reservoir part 2 and the density rhoof the material 1A.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a vacuum evaporation apparatus used in semiconductor manufacturing and the like, and particularly to a method of supplying a molten evaporation material from a molten sump to a evaporation crucible.

[Background of the invention]

Conventional vacuum evaporation equipment is, for example, disclosed in Japanese Utility Model Publication No. 56-23329.
A sump section for heating and melting the vapor deposition material and storing the molten vapor deposition material, and a transport pipe for transporting the molten vapor deposition material to the vapor deposition crucible are in the same vacuum tank as the crucible. It is assumed that it is stored inside.

However, in this vacuum evaporation apparatus, it is necessary to incorporate a device for continuously supplying the molten evaporation material into the vacuum chamber, which complicates the mechanism due to problems such as vacuum sealing.
Additionally, there is a problem in that the vacuum chamber also increases in size.

[Purpose of the invention]

An object of the present invention is to provide a vacuum evaporation device that can continuously supply a molten evaporation material to a evaporation crucible without requiring a continuous supply device, simplifying the mechanism and downsizing the vacuum chamber. It's about doing.

Another object of the present invention is to provide a vacuum evaporation apparatus that can continuously supply a molten evaporation substance with higher accuracy.

[Summary of the invention]

The present invention includes a sump for heating and melting a evaporation material and storing the molten evaporation material, and a evaporation crucible for further heating and evaporating the molten evaporation material transported from the sump through a transport pipe. , in a vacuum evaporation apparatus configured to evaporate a molten deposition material in the crucible in a vacuum chamber and deposit it on a substrate, etc., the molten metal sump is installed on the atmosphere side;
The molten vapor deposition material in the molten metal tank is supplied to the crucible in the vacuum chamber by the differential pressure between the atmospheric pressure and the pressure inside the crucible,
This makes it possible to continuously supply the molten vapor deposition material without requiring a continuous supply device, simplifying the mechanism and downsizing the vacuum chamber.

Further, in the present invention, while the molten metal sump is installed on the atmospheric side, atmospheric pressure P O, crucible internal pressure P6, flow resistance ΔP of the molten vapor deposition material in the transport pipe, head difference ΔH1 between the crucible and the molten evaporation When the density of the substance is ρ, by providing a pressure balance means that always satisfies the relational expression Po P1 = ΔP + ρ・ΔH in the middle of the transport pipe or in the sump, it is possible to continuously supply the molten vapor deposition material with higher precision. This is how it was done.

[Embodiments of the invention]

An embodiment of the present invention will be described below with reference to FIG. The figure shows a configuration diagram of a vacuum evaporation apparatus according to the present invention, in which 1 is a rod-shaped;
A vapor deposition material in the form of cotton, pellets, or buttons; 2 is a sump for heating and melting the evaporation material 1 and storing the molten evaporation material IA; 3 is a molten vapor deposition material transported from the sump 2 through a transport pipe 4; A crucible for vapor deposition to further heat and evaporate substance IA;
6 is a vacuum chamber for performing vapor deposition; 7 is a vacuum evacuation device for evacuating the inside of vacuum chamber 6; 8 is for mounting a substrate 9 in vacuum chamber 6; This is a substrate holder for.

Thus, the vacuum evaporation apparatus according to the present invention has a configuration in which the hot water reservoir 2 is installed on the atmosphere side.

Next, the operation of this embodiment will be explained. The vapor deposition material l continuously supplied to the sump 2 in the atmosphere is heated by the heating element 5.
It is heated to a molten state.

This molten deposit flA flows through the transport pipe 4 due to the pressure difference between the atmospheric pressure P0 and the crucible internal pressure P+ (PI < P(1)) and is supplied to the crucible 3 in the vacuum chamber 6.

The molten deposition material IA supplied to the crucible 3 is further heated and evaporated, and is deposited on the substrate 9 held by the substrate holder 8. In addition, P2 in the figure indicates the pressure inside the vacuum chamber 6, and P2
2 The relationship is <PI.

Therefore, in this embodiment, the molten deposition material IA can be continuously supplied by the pressure difference between the atmospheric pressure P0 and the crucible internal pressure P1, so there is no need to incorporate a conventional continuous supply device into the vacuum chamber, and the mechanism This makes it possible to simplify the process and downsize the vacuum chamber.

In addition, in the state where the above-mentioned evaporation action is being performed, atmospheric pressure PO% crucible internal pressure P1% flow resistance ΔP of the molten evaporation material in the transport pipe, head difference ΔH between the crucible and the sump, density of the molten evaporation material When ρ, Pa PI = ΔP + ρ・ΔH... River... (
If a pressure balance means that always satisfies the relational expression 1) is provided in the middle of the transport pipe 4 or on the side of the sump 2, it becomes possible to continuously supply the molten vapor deposition substance IA with higher precision.

Next, an embodiment in which the pressure balance means is provided will be described with reference to FIGS. 2 and 3.

FIG. 2 shows a configuration diagram of a vacuum evaporation apparatus in which a pressure balance means is provided in the middle of the transport pipe, and a pressure control chamber 10 is provided in the middle of the transport pipe 4.
Pressure controller 11 that controls the pressure within 0
It is configured with the following.

In the figure, the same reference numerals as in FIG. 1 indicate the same things. - In this embodiment, the pressure P1 in the pressure control chamber 10, the hot water level in the pressure control chamber 10, and the hot water reservoir 2
The head difference ΔH′ between the scene inside the crucible 3 and the scene inside the pressure control chamber 10, the head difference ΔH″ between the scene inside the crucible 3 and the scene inside the pressure control chamber 10, and the head difference ΔH″ between the scene inside the crucible 3 and the scene inside the pressure control chamber 10, When the flow resistance ΔP′ and the flow resistance ΔP# of the molten vapor deposition material in the transport pipe 4 between the pressure control chamber 10 and the crucible 3 are assumed, the pressure relationship between these is (2
) and (3).

Pa P3=Δp'+p・ΔH' -98,-+
2) Ps P1=ΔP#+ρ・ΔH" ・・・・・・
(3) Therefore, the pressure P in the pressure control chamber 10,
By controlling this, it becomes possible to continuously supply the molten vapor deposition material with higher precision.

FIG. 3 shows a configuration diagram of a vacuum evaporation apparatus in which a pressure balance means is provided on the side of the hot water reservoir, in which 12 is a pressure control chamber provided around the hot water reservoir 2, and 13 is the pressure inside the pressure control chamber 12. A load rotor chamber for loading the vapor deposition substance 1 into the pressure control chamber 12 without changing P4, 14 a gate valve provided between the pressure control chamber 12 and the load lock chamber 13, 15 a load lock chamber 13 is a gate valve that communicates with and shuts off the atmosphere; 16 is a pressure controller that controls the pressure P4 in the pressure control chamber 12; and 17 is a pressure controller that controls the pressure P5 in the load lock chamber 13.

In this vacuum evaporation apparatus, a evaporation substance 1 is inserted into a load lock chamber 13 in an atmospheric state via a gate valve 15. Then, when the pressure P in the load lock chamber 13 is made equal to the pressure P4 in the pressure control chamber 12 and all the vapor deposition material l used in the previous process in the pressure control chamber 12 is melted, the load lock is applied. The vapor deposition material inserted into the chamber 13 is transferred to the pressure control chamber 1 through the gate valve 14.
Load into 2.

Therefore, in this embodiment as well, the pressure P around the hot water tank 2
By controlling 4, the continuous supply of the molten vapor deposition material can be performed with higher precision.

〔Effect of the invention〕

As explained above, according to the present invention, the molten vapor deposition material can be continuously supplied to the vapor deposition crucible without the need for a continuous supply device, so it is possible to simplify the mechanism and downsize the vacuum chamber. can. Further, according to the present invention,
The molten deposition material can be continuously supplied with higher accuracy.

[Brief explanation of the drawing]

FIG. 1 is a block diagram showing one embodiment of the vacuum evaporation apparatus of the present invention, and FIGS. 2 and 3 are block diagrams showing embodiments of the vacuum evaporation apparatus of other inventions. 1... Vapor deposition substance, IA... Melted vapor deposition substance, 2...
Hot water reservoir part, 3... Crucible for vapor deposition, 4... Transport pipe, 5
... Heating body, 6 ... Vacuum chamber, 10.12 ... Pressure control room, 11, 16.17 ... Pressure controller, 13 ... Load lock room agent Patent attorney Masashi Akimoto Figure 7Figure 2

Claims (1)

[Scope of Claims] 1. A sump for heating and melting a vapor deposition material and storing the molten vapor deposition material, and a vapor deposition device for further heating and evaporating the molten vapor deposition material transported from the sump through a transport pipe. In the vacuum evaporation apparatus, the molten vapor deposition material in the crucible is evaporated in a vacuum chamber and is deposited on a substrate, etc. 1. A vacuum evaporation apparatus characterized in that a molten evaporation substance in a sump is continuously supplied to a crucible in a vacuum chamber by a pressure difference between the molten metal and the molten metal. 2. A vapor deposition crucible that further heats and evaporates the molten vapor deposition material transported from the bath through a transport pipe, comprising a sump for heating and melting a vapor deposition material and storing the molten vapor deposition material; In a vacuum evaporation apparatus configured to evaporate a molten deposition material in a crucible in a vacuum chamber and deposit it on a substrate, etc., the molten sump is installed on the atmospheric side, atmospheric pressure P_0, crucible internal pressure P1, and a transport pipe. Flow resistance ΔP of the molten vapor deposited material at , head difference Δ between the crucible and the sump
When H is the density of the molten vapor deposited material, ρ, a pressure balance means that always satisfies the relational expression P_0-P_1=ΔP+ρ・ΔH is installed in the middle of the transport pipe or in the sump, and the molten evaporated material in the sump is evacuated. A vacuum evaporation device characterized by continuous supply to a crucible in a tank.