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JPS62247330A - Liquid crystal display device - Google Patents

Liquid crystal display device

Info

Publication number
JPS62247330A
JPS62247330A JP9155586A JP9155586A JPS62247330A JP S62247330 A JPS62247330 A JP S62247330A JP 9155586 A JP9155586 A JP 9155586A JP 9155586 A JP9155586 A JP 9155586A JP S62247330 A JPS62247330 A JP S62247330A
Authority
JP
Japan
Prior art keywords
liquid crystal
electrode
crystal display
substrate
electrode part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9155586A
Other languages
Japanese (ja)
Inventor
Koichi Kamijo
光一 上條
Yukihiro Iwashita
幸廣 岩下
Satoru Kamata
悟 鎌田
Manabu Hanakawa
花川 学
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP9155586A priority Critical patent/JPS62247330A/en
Publication of JPS62247330A publication Critical patent/JPS62247330A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PURPOSE:To lessen a difference of retardation between a non-electrode part and an electrode part, and to obtain the good appearance by making the surface of the electrode part which drives the liquid crystal layer and the surface of the non-electrode part to a same level on the surface of the liquid crystal layer side of a pair of the substrates inserted the liquid crystal layer there-between. CONSTITUTION:The ITO film having 1,500Angstrom thickness is formed on the glass substrate 1. At the time of working ITO to the electrode 2 having the prescribed pattern by means of a lithography, the electrode and the non-electrode are made to the same level by washing the substrate remaining a pattern of the photoresist as it is, and then by forming the SiO2 film 6 having 1,500Angstrom thickness on the substrate by means of the sputtering method, followed by removing the photoresist. In the liquid crystal display element used the obtd. substrate, the electrode 2, SiO2 6 and the orientation film 3 are formed on the inner surface of the liquid crystal side of the substrate 1, and the electrode 2 and the SiO2 6 mounted on the non-electrode part are made to the same level. The liquid crystal 4 is enclosed with the seal 5 and the two sheets of the substrates 1. Thus, the difference of the retardation of between the electrode part and the non-electrode part is lessened at all, thereby obtaining the good appearance.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は液晶表示装置の特に液晶表示素子に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a liquid crystal display device, and particularly to a liquid crystal display element.

〔従来の技術〕[Conventional technology]

第4図に示す様に従来の液晶表示素子は、電極2及び配
向膜5を形成した基板1と、2枚の基板1を接着するシ
ール5によって液晶層4を封入していた。電極2は数百
から千数百λ程度の厚さがあシ、又配向膜3は数十から
数百λ程度の厚さであった。2枚の基板間の距離(いわ
ゆるセルギャップ)は5〜10μm程度である丸め、第
4図に示した距離aと距離すの差(a−b)はα1〜Q
、3μm程度となり、セルギャップの5%程度の値とな
ってい友。
As shown in FIG. 4, the conventional liquid crystal display element includes a substrate 1 on which electrodes 2 and an alignment film 5 are formed, and a liquid crystal layer 4 enclosed by a seal 5 that adheres the two substrates 1. The electrode 2 had a thickness of about several hundred to several thousand λ, and the alignment film 3 had a thickness of about several tens to several hundred λ. The distance between the two substrates (so-called cell gap) is approximately 5 to 10 μm.The difference between distance a and distance (a-b) shown in Figure 4 is α1 to Q.
, which is about 3 μm, which is about 5% of the cell gap.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

従来の液晶表示素子では前述した如く第4図において、
電極2のない部分のギャップaと、電極2のある部分の
ギャップbは、電極2の厚さの2倍だけ差が生じてしま
った。
In the conventional liquid crystal display element, as mentioned above, in FIG.
The difference between the gap a in the part without the electrode 2 and the gap b in the part with the electrode 2 was twice the thickness of the electrode 2.

かかる液晶表示素子のセルギャップの差(a−b)は、
特に複屈折モードを利用する液晶表示素子ではりタープ
−ジョンの差となって現われ、表示品質を著しく悪化さ
せてしまう0発明者らが実験したところでは、非点灯外
観を満足させるためには前述のセルギャップの差(a−
b)は2000λ以下が好ましく、差(a−b)が少な
いほど良質の画面が得られた。したがってこれから電極
2の厚さは、良好な外観を得るためには1000λ以下
で薄いほど良いということがわかった。ところが周知の
ごとく最近液晶表示素子は大容量、高解像度も求められ
大型化してくるにつれ、配線抵抗を下げなければならず
、電極2は厚くなシ、又電極上に他の良導体(例えば金
属)を配線する必要もでてきた。電極2を厚くする場合
、良好な配線抵抗を得るには最も低抵抗な透明電極のI
TOでも1000〜1500λ程度が必要であり、又金
属の良導体を配線する場合は、それ自身が不透なため外
観、が悪い。
The difference in cell gap (a-b) of such a liquid crystal display element is
In particular, in liquid crystal display devices that utilize birefringence mode, this appears as a difference in beam turbulence, which significantly deteriorates display quality.The inventors have conducted experiments and found that in order to satisfy the non-lighting appearance, the above-mentioned The cell gap difference (a-
b) is preferably 2000λ or less, and the smaller the difference (a-b), the better the quality of the screen was obtained. Therefore, it has been found that the thinner the electrode 2 is, 1000λ or less, the better in order to obtain a good appearance. However, as is well known, recently, liquid crystal display elements are required to have large capacity and high resolution, and as they become larger, the wiring resistance must be lowered. It became necessary to wire the . When making electrode 2 thicker, in order to obtain good wiring resistance, the lowest resistance transparent electrode I
Even TO requires a thickness of about 1000 to 1500λ, and when wiring a good metal conductor, the appearance is poor because it is itself opaque.

以上の様に第4図に示す従来の様な液晶表示素子の構造
をとる限り、リターデーションによる外観の悪化はさけ
ることができなかった。
As described above, as long as the conventional structure of the liquid crystal display element shown in FIG. 4 is used, deterioration in appearance due to retardation cannot be avoided.

〔問題点を解決するための手段〕[Means for solving problems]

以上の様な従来の問題点を解決するため発明者らは、液
晶表示素子に用いる基板の電極面と非電極面が平坦であ
ることを特徴とする液晶表示素子を用いた液晶表示装置
を発明した。
In order to solve the above conventional problems, the inventors invented a liquid crystal display device using a liquid crystal display element characterized in that the electrode surface and non-electrode surface of the substrate used in the liquid crystal display element are flat. did.

〔作用〕[Effect]

以下実施例を用いて本発明の詳細な説明する。 The present invention will be described in detail below using Examples.

〔実施例〕〔Example〕

〈実施例1〉 ガラス基板1上にITO膜を1sooX形成し、フォト
リソグラフィーによJ)ITOを所定のパターンの電極
2に加工した。その際フォトレジストのパターンはその
まま残しておいて、基板の洗浄の後、スパッタリング法
により1500λのS to z膜6を形成した後、前
述の7オトレジストを除去したところ、電極部と非電極
部は平坦になった。
<Example 1> A 1sooX ITO film was formed on a glass substrate 1, and J) ITO was processed into an electrode 2 in a predetermined pattern by photolithography. At that time, the photoresist pattern was left as it was, and after cleaning the substrate, a 1500λ S to z film 6 was formed by sputtering, and then the photoresist 7 described above was removed. It became flat.

かかる基材を用いて液晶表示素子を作成した。A liquid crystal display element was created using such a base material.

本実施例の液晶表示素子の断面図を第1図に示す。A cross-sectional view of the liquid crystal display element of this example is shown in FIG.

第1図で基板1の液晶側内面には電極2.5loz6及
び配向膜3が形成されており、電極2と非電極部上の5
iOz6は平坦となっている。液晶4はシール5と2枚
の基板1により封入されている。
In FIG. 1, an electrode 2.5 loz6 and an alignment film 3 are formed on the inner surface of the substrate 1 on the liquid crystal side.
iOz6 is flat. The liquid crystal 4 is enclosed by a seal 5 and two substrates 1.

この様にして作成した液晶表示素子では、電極部と非電
極部のりタープ−ジョンの差は全くなく、非常に良好な
外観が得られた。
In the liquid crystal display element prepared in this manner, there was no difference in adhesive tarp between the electrode portion and the non-electrode portion, and a very good appearance was obtained.

〈実施例2〉 ガラス基板7上に電極パターンのネガパターンをフォト
リソグラフィーにより形成し、フッ酸により基板7を1
500λエツチングした。しかる後にフォトレジストを
除去しITOIII形成した後、今度は電極パターンを
フォトリソグラフィーにより形成し電極2を加工したと
ころ、電極部と非電極部は平坦であった。
<Example 2> A negative pattern of an electrode pattern is formed on a glass substrate 7 by photolithography, and the substrate 7 is coated with hydrofluoric acid.
500λ etched. After the photoresist was removed and ITO III was formed, an electrode pattern was formed by photolithography and electrode 2 was processed, and the electrode portion and non-electrode portion were flat.

かかる基材を用いて液晶表示素子を作成した。A liquid crystal display element was created using such a base material.

本実施例の液晶表示素子の断面図を第2図に示す。FIG. 2 shows a cross-sectional view of the liquid crystal display element of this example.

第2図で基板7の溝にはITOの電極2が形成されてお
シ、その上に配向膜5が設置されている。
In FIG. 2, an ITO electrode 2 is formed in a groove of a substrate 7, and an alignment film 5 is placed thereon.

液晶4はシール5と基板7により封入されている。The liquid crystal 4 is enclosed by a seal 5 and a substrate 7.

この様にして作成した液晶表示素子では、電極部と非電
極部のりタープ−ジョンの差は全くなく、非常に良好な
外観が得られた。
In the liquid crystal display element prepared in this manner, there was no difference in adhesive tarp between the electrode portion and the non-electrode portion, and a very good appearance was obtained.

〈実施例3〉 ガラス基板1上にITO膜を1500^形成し、フォト
リソグラフィーによITOを所定のパターンの電極2に
加工した。しかる後にポリイミド膜8を1.5μm塗布
したところ、ポリイミド膜80表面は°平坦であった。
<Example 3> A 1500 mm thick ITO film was formed on a glass substrate 1, and the ITO was processed into a predetermined pattern of electrodes 2 by photolithography. Thereafter, a polyimide film 8 was applied to a thickness of 1.5 μm, and the surface of the polyimide film 80 was found to be flat.

かかる基材を用いて液晶表示素子を作成した。A liquid crystal display element was created using such a base material.

本実施例の液晶表示素子の断面図を第5図に示す。A cross-sectional view of the liquid crystal display element of this example is shown in FIG.

第3図で基板1上にITO電極2が形成され、さらにポ
リイミド膜8が形成されている。液晶4はシール5と2
枚の基板1によシ封入されている。
In FIG. 3, an ITO electrode 2 is formed on a substrate 1, and a polyimide film 8 is further formed. LCD 4 has stickers 5 and 2
It is enclosed in a single substrate 1.

この様にして作成した液晶表示素子では、電極部と非電
極部のりタープ−ジョンの差は全くなく、非常に良好な
外観が得られた。
In the liquid crystal display element prepared in this manner, there was no difference in adhesive tarp between the electrode portion and the non-electrode portion, and a very good appearance was obtained.

〔発明の効果〕〔Effect of the invention〕

以上述べた様に本発明による液晶表示素子はすぐれた外
観をもち、本発明による液晶表示素子を組み込んだ液晶
表示装置は非常に良好な表示品質を与えた。
As described above, the liquid crystal display element according to the present invention has an excellent appearance, and the liquid crystal display device incorporating the liquid crystal display element according to the present invention provides very good display quality.

さらに実施例1に示した様にITO電極のバターニング
に使用したレジストを利用してリフトオフ法により膜付
けできる等、工程上の負荷はほとんど増加させずに高品
位な液晶表示素子を得ることもでき、又実施3に示した
様に工程を増加させずに高品位な液晶表示素子を得るこ
ともできる。
Furthermore, as shown in Example 1, the resist used for patterning the ITO electrode can be used to form a film by the lift-off method, making it possible to obtain a high-quality liquid crystal display element with almost no increase in process load. Furthermore, as shown in Example 3, a high-quality liquid crystal display element can be obtained without increasing the number of steps.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例の断面を示す図。 第2図は本発明の実施例2の断面を示す図。 第3図は本発明の実施例5の断面を示す図。 第4図は従来の液晶表示素子の断面を示す図。 1・・・基板 2・・・電極 3・・・配向膜 4・・
・液晶層5・・・シール 6・・・5iOz7・・・基
板 8・・・ポリイ ミ ド膜 a、bは第4図中の距離を示す。 以  上 出願人 セイコーエプソン株式会社 第2図
FIG. 1 is a cross-sectional view of an embodiment of the present invention. FIG. 2 is a cross-sectional view of Embodiment 2 of the present invention. FIG. 3 is a cross-sectional view of Embodiment 5 of the present invention. FIG. 4 is a diagram showing a cross section of a conventional liquid crystal display element. 1... Substrate 2... Electrode 3... Alignment film 4...
・Liquid crystal layer 5...Seal 6...5iOz7...Substrate 8...Polyimide films a and b indicate the distances in FIG. 4. Applicant: Seiko Epson Corporation Figure 2

Claims (2)

【特許請求の範囲】[Claims] (1)液晶層を挾持する2枚の基板の前記液晶層側の面
上において、前記液晶層を駆動する電極部の表面と非電
極部の表面が平坦であることを特徴とする液晶表示装置
(1) A liquid crystal display device characterized in that, on the liquid crystal layer-side surfaces of two substrates that sandwich the liquid crystal layer, the surface of an electrode portion that drives the liquid crystal layer and the surface of a non-electrode portion are flat. .
(2)液晶層を挾持する2枚の基板の前記液晶層側の面
上において、少なくとも前記液晶層を駆動する電極部以
外の部分に絶縁物質を形成したことを特徴とする特許請
求の範囲第1項記載の液晶表示装置。
(2) An insulating material is formed on the surfaces of the two substrates sandwiching the liquid crystal layer on the liquid crystal layer side, at least in a portion other than the electrode portions that drive the liquid crystal layer. The liquid crystal display device according to item 1.
JP9155586A 1986-04-21 1986-04-21 Liquid crystal display device Pending JPS62247330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9155586A JPS62247330A (en) 1986-04-21 1986-04-21 Liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9155586A JPS62247330A (en) 1986-04-21 1986-04-21 Liquid crystal display device

Publications (1)

Publication Number Publication Date
JPS62247330A true JPS62247330A (en) 1987-10-28

Family

ID=14029750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9155586A Pending JPS62247330A (en) 1986-04-21 1986-04-21 Liquid crystal display device

Country Status (1)

Country Link
JP (1) JPS62247330A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0682770A (en) * 1992-09-07 1994-03-25 Rohm Co Ltd Liquid crystal display element
JPH07333591A (en) * 1994-06-02 1995-12-22 Samsung Electron Devices Co Ltd Liquid crystal display device and preparation thereof
US5493429A (en) * 1990-10-26 1996-02-20 Ricoh Company, Ltd. Color liquid crystal device having thickness controlling layers disposed at non-pixel portions and between adjacent color filters
US7479939B1 (en) 1991-02-16 2009-01-20 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device
JP2012118425A (en) * 2010-12-03 2012-06-21 Toray Ind Inc Substrate for liquid crystal display and manufacturing method thereof
WO2013042674A1 (en) * 2011-09-21 2013-03-28 日本写真印刷株式会社 Capacitance-type touch sensor and display device equipped therewith

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5493429A (en) * 1990-10-26 1996-02-20 Ricoh Company, Ltd. Color liquid crystal device having thickness controlling layers disposed at non-pixel portions and between adjacent color filters
US5623353A (en) * 1990-10-26 1997-04-22 Ricoh Company, Ltd. Color liquid crystal device having thickness controlling layers disposed at pixel portions
US7479939B1 (en) 1991-02-16 2009-01-20 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device
JPH0682770A (en) * 1992-09-07 1994-03-25 Rohm Co Ltd Liquid crystal display element
JPH07333591A (en) * 1994-06-02 1995-12-22 Samsung Electron Devices Co Ltd Liquid crystal display device and preparation thereof
JP2012118425A (en) * 2010-12-03 2012-06-21 Toray Ind Inc Substrate for liquid crystal display and manufacturing method thereof
WO2013042674A1 (en) * 2011-09-21 2013-03-28 日本写真印刷株式会社 Capacitance-type touch sensor and display device equipped therewith
KR101450512B1 (en) * 2011-09-21 2014-10-13 니폰샤신인사츠가부시키가이샤 Capacitance-type touch sensor and display device equipped therewith
US9063628B2 (en) 2011-09-21 2015-06-23 Nissha Printing Co., Ltd. Capacitance-type touch sensor and display device equipped therewith

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