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JPS62180939U - - Google Patents

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Publication number
JPS62180939U
JPS62180939U JP6895186U JP6895186U JPS62180939U JP S62180939 U JPS62180939 U JP S62180939U JP 6895186 U JP6895186 U JP 6895186U JP 6895186 U JP6895186 U JP 6895186U JP S62180939 U JPS62180939 U JP S62180939U
Authority
JP
Japan
Prior art keywords
ion beam
electrode
circular hole
ion source
etching chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6895186U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6895186U priority Critical patent/JPS62180939U/ja
Publication of JPS62180939U publication Critical patent/JPS62180939U/ja
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は反応性イオンビームエツチング装置の
断面図、第2図は本考案実施例の電極の要部拡大
断面図、第3図は従来の電極の要部拡大断面図で
ある。 1……エツチング室、3……イオン源、4……
イオン源側電極、5……エツチング室側電極。
FIG. 1 is a sectional view of a reactive ion beam etching apparatus, FIG. 2 is an enlarged sectional view of a main part of an electrode according to an embodiment of the present invention, and FIG. 3 is an enlarged sectional view of a main part of a conventional electrode. 1... Etching chamber, 3... Ion source, 4...
Ion source side electrode, 5...Etching chamber side electrode.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] エツチング室とイオン源の間にイオンビーム引
出し用の円穴が複数個形成された電極が2枚備え
られる反応性イオンビームエツチング装置におい
て、エツチング室側電極の円穴がイオン源側電極
の円穴よりも大きいことを特徴とする反応性イオ
ンビームエツチング装置。
In a reactive ion beam etching device equipped with two electrodes each having a plurality of circular holes for extracting the ion beam between the etching chamber and the ion source, the circular hole in the electrode on the etching chamber side is connected to the circular hole in the electrode on the ion source side. A reactive ion beam etching device characterized by being larger than.
JP6895186U 1986-05-08 1986-05-08 Pending JPS62180939U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6895186U JPS62180939U (en) 1986-05-08 1986-05-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6895186U JPS62180939U (en) 1986-05-08 1986-05-08

Publications (1)

Publication Number Publication Date
JPS62180939U true JPS62180939U (en) 1987-11-17

Family

ID=30909237

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6895186U Pending JPS62180939U (en) 1986-05-08 1986-05-08

Country Status (1)

Country Link
JP (1) JPS62180939U (en)

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