JPS62166537A - wafer stage - Google Patents
wafer stageInfo
- Publication number
- JPS62166537A JPS62166537A JP61009520A JP952086A JPS62166537A JP S62166537 A JPS62166537 A JP S62166537A JP 61009520 A JP61009520 A JP 61009520A JP 952086 A JP952086 A JP 952086A JP S62166537 A JPS62166537 A JP S62166537A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- pins
- stage
- wafer stage
- placing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 48
- 238000011109 contamination Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔斗既要〕
ウェーハステージ上表面に突出するピンを設け、これで
ウェーハを載せるときの、ウェーハ横滑りを防止する。[Detailed Description of the Invention] [Required] A protruding pin is provided on the upper surface of the wafer stage to prevent the wafer from sliding sideways when the wafer is placed on it.
本発明はウェーハステージの構造に関する。 The present invention relates to the structure of a wafer stage.
半導体ウェーハは、ウェーハプロセスが完了するまでに
多(の処理、検査の工程が専用機のウェーハステージ上
でなされる。例えば、顕微鏡、アライナ−、ステッパー
、プローバー等は全て専用のウェーハステージを有し、
その固定には種々の工夫がなされている。Semiconductor wafers undergo many processing and inspection steps on a wafer stage of a dedicated machine before the wafer process is completed.For example, microscopes, aligners, steppers, probers, etc. all have dedicated wafer stages. ,
Various methods have been used to fix it.
然し、従来のものは固定に至るまでの操作については、
細心の注意を要し、決して簡便、安全なものではなかっ
た。However, regarding the operation up to the fixation of the conventional one,
It required extreme caution and was by no means simple or safe.
従来のウェーハステージはその上面が平滑なので、ウェ
ーハを置いた際、ウェーハが薄い空気層の上に載ること
になり横の方向に極めて滑り易く、その結果ウェーハが
ウェーハステージ上から落下して、汚染や破損を招いて
いた。Conventional wafer stages have a smooth top surface, so when a wafer is placed on it, it rests on a thin layer of air and is extremely prone to slipping laterally, resulting in the wafer falling off the wafer stage and causing contamination. This caused damage.
又、横滑り防止のため、ウェーハステージ上面に同心円
状の細い溝を刻んだものもあるが、その効果は充分とは
言えない。Furthermore, in order to prevent side-slipping, there are some devices in which narrow concentric grooves are carved on the top surface of the wafer stage, but the effect cannot be said to be sufficient.
従って、ウェーハの横滑りの生じないものが要望されて
いた。Therefore, there has been a demand for something that does not cause wafer skidding.
従来のウェーハステージはウェーハを載せるときウェー
ハが横滑りを起こし易いのでこれを防止する。Conventional wafer stages tend to cause wafers to skid when placed on them, so this is prevented.
上記問題点の解決は、上表面が平面状のウェーハステー
ジの上表面に設けた孔から上方に突き出た、上から押さ
えると突出部がウェーハステージ内に沈下する3個以上
のピンを有し、ウェーハを載せたときは前記ピンで支え
、固定するときは前記ウェーハステージに設けたアスピ
レータでウェーハを吸着固定するようにした本発明によ
るウェーハステージにより達成される。The solution to the above problem is to have three or more pins that protrude upward from holes provided on the upper surface of the wafer stage whose upper surface is flat, and whose protruding parts sink into the wafer stage when pressed from above. This is achieved by the wafer stage according to the present invention, in which when the wafer is placed, it is supported by the pins, and when it is fixed, the wafer is sucked and fixed by an aspirator provided on the wafer stage.
(作用)
本発明によると、ウェーハステージにウェーハを載せた
とき、ウェーハは横滑りを起こす空気層厚さに達するま
での高さで、複数のピンの先端で保持される。又、ウェ
ーハをアスピレータで吸着すると、ピンは突き上げる力
が弱いので、ウェーハで押しさげられウェーハステージ
内に沈下し、ウェーハは完全にウェーハステージに密着
固定される。(Function) According to the present invention, when a wafer is placed on a wafer stage, the wafer is held by the tips of a plurality of pins at a height that reaches an air layer thickness that causes sideways sliding. Furthermore, when a wafer is attracted by an aspirator, the pins have a weak pushing force, so they are pushed down by the wafer and sink into the wafer stage, so that the wafer is completely fixed tightly to the wafer stage.
第1図は本発明におけるウェーハステージの断面模式図
である。FIG. 1 is a schematic cross-sectional view of a wafer stage in the present invention.
図において、1は上表面が平面状のウェーハステージで
、このウェーハステージ1には、その上表面に設けた孔
から3個以上の、先端を丸めたピン2が約0.5 mm
出ている。このピン2の下には、このピン2を上に押し
上げる弱いスプリング3があり、スプリング3を支える
ネジ4を調整してピン2の押し上げ力を調整する。In the figure, 1 is a wafer stage with a flat upper surface, and this wafer stage 1 has three or more pins 2 with rounded tips of about 0.5 mm extending from holes provided on the upper surface.
It's out. Below this pin 2 is a weak spring 3 that pushes up this pin 2, and the pushing force of the pin 2 is adjusted by adjusting the screw 4 that supports the spring 3.
スプリング3の強さは、ウェーハ5をその上に載せたと
き僅かに沈むが、ウェーハの横滑りの生じない高さを維
持し、且つウェーハをウェーハステージに押し付けたと
きウェーハを傷付けない程度のものである。The strength of the spring 3 is such that it sinks slightly when the wafer 5 is placed on it, but maintains a height that does not cause the wafer to slide sideways, and does not damage the wafer when it is pressed against the wafer stage. be.
又、ウェーハステージ1の中央にはアスピレータ6の開
口をもつ。Further, the wafer stage 1 has an opening for an aspirator 6 at the center thereof.
以上の如きウェーハステージ1にウェーハを載せると、
ウェーハ5はピン2に支えられ、全く横滑りを生じない
。又ウェーハ5の固定も完全で、傷もつかない。When a wafer is placed on wafer stage 1 as described above,
The wafer 5 is supported by the pins 2 and does not slip at all. Furthermore, the wafer 5 is completely fixed and is not damaged.
以上詳細に説明したように本発明によるウェーハステー
ジによれば、ウェーハを載せるとき横滑りがなくなり、
落下によるウェーハの汚染や破損を防ぐことが出来る。As explained in detail above, according to the wafer stage according to the present invention, there is no side slipping when placing a wafer, and
It is possible to prevent wafer contamination and damage due to dropping.
第1図は本発明におけるウェーハステージの断面模式図
である。
図において、
1はウェーハステージ、
2はピン、
3はスプリング、
4はネジ、
5はウェーハ
6はアスピレータFIG. 1 is a schematic cross-sectional view of a wafer stage in the present invention. In the figure, 1 is a wafer stage, 2 is a pin, 3 is a spring, 4 is a screw, 5 is a wafer, 6 is an aspirator
Claims (1)
けた孔から上方に突き出た、上から押さえると突出部が
ウェーハステージ(1)内に沈下する3個以上のピン(
2)を有し、ウェーハ(5)を載せたときは前記ピン(
2)で支え、固定するときは前記ウェーハステージ(1
)に設けたアスピレータ(6)でウェーハ(5)を吸着
固定することを特徴とするウェーハステージ。Three or more pins (3 or more) protruding upward from holes provided in the upper surface of the wafer stage (1), the upper surface of which is flat, whose protrusions sink into the wafer stage (1) when pressed from above.
2), and when the wafer (5) is placed, the pins (
2) When supporting and fixing, use the wafer stage (1).
A wafer stage characterized in that a wafer (5) is suctioned and fixed by an aspirator (6) provided in ).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61009520A JPS62166537A (en) | 1986-01-20 | 1986-01-20 | wafer stage |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61009520A JPS62166537A (en) | 1986-01-20 | 1986-01-20 | wafer stage |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62166537A true JPS62166537A (en) | 1987-07-23 |
Family
ID=11722538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61009520A Pending JPS62166537A (en) | 1986-01-20 | 1986-01-20 | wafer stage |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62166537A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5249343A (en) * | 1991-08-23 | 1993-10-05 | International Business Machines Corporation | Apparatus for alignment of workpieces |
WO1999000837A1 (en) * | 1997-06-30 | 1999-01-07 | Lam Research Corporation | Vacuum processing chamber workpiece lifter |
US7198276B2 (en) * | 2003-10-24 | 2007-04-03 | International Business Machines Corporation | Adaptive electrostatic pin chuck |
JP2007266514A (en) * | 2006-03-30 | 2007-10-11 | V Technology Co Ltd | Work transfer device in work device |
CN105045048A (en) * | 2015-09-16 | 2015-11-11 | 京东方科技集团股份有限公司 | Exposure base platform and exposure device |
CN108962794A (en) * | 2018-07-20 | 2018-12-07 | 北京北方华创微电子装备有限公司 | A kind of liter of needle method and the thimble lifting device for applying it |
WO2019085901A1 (en) * | 2017-10-31 | 2019-05-09 | 上海微电子装备(集团)股份有限公司 | Mobile platform moving mechanism, mobile platform system and photoetching device |
-
1986
- 1986-01-20 JP JP61009520A patent/JPS62166537A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5249343A (en) * | 1991-08-23 | 1993-10-05 | International Business Machines Corporation | Apparatus for alignment of workpieces |
WO1999000837A1 (en) * | 1997-06-30 | 1999-01-07 | Lam Research Corporation | Vacuum processing chamber workpiece lifter |
US7198276B2 (en) * | 2003-10-24 | 2007-04-03 | International Business Machines Corporation | Adaptive electrostatic pin chuck |
JP2007266514A (en) * | 2006-03-30 | 2007-10-11 | V Technology Co Ltd | Work transfer device in work device |
CN105045048A (en) * | 2015-09-16 | 2015-11-11 | 京东方科技集团股份有限公司 | Exposure base platform and exposure device |
WO2019085901A1 (en) * | 2017-10-31 | 2019-05-09 | 上海微电子装备(集团)股份有限公司 | Mobile platform moving mechanism, mobile platform system and photoetching device |
CN108962794A (en) * | 2018-07-20 | 2018-12-07 | 北京北方华创微电子装备有限公司 | A kind of liter of needle method and the thimble lifting device for applying it |
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