JPS62139868A - Crucible for electron beam evaporation - Google Patents
Crucible for electron beam evaporationInfo
- Publication number
- JPS62139868A JPS62139868A JP28134085A JP28134085A JPS62139868A JP S62139868 A JPS62139868 A JP S62139868A JP 28134085 A JP28134085 A JP 28134085A JP 28134085 A JP28134085 A JP 28134085A JP S62139868 A JPS62139868 A JP S62139868A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- electron beam
- shape
- evaporation
- hearth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005566 electron beam evaporation Methods 0.000 title claims abstract description 8
- 239000004570 mortar (masonry) Substances 0.000 claims abstract description 7
- 239000000463 material Substances 0.000 abstract description 22
- 238000010894 electron beam technology Methods 0.000 abstract description 11
- 238000001704 evaporation Methods 0.000 abstract description 10
- 230000008020 evaporation Effects 0.000 abstract description 10
- 238000010438 heat treatment Methods 0.000 abstract description 7
- 238000007740 vapor deposition Methods 0.000 abstract description 5
- 230000003247 decreasing effect Effects 0.000 abstract description 3
- 229910001325 element alloy Inorganic materials 0.000 abstract 1
- 230000007774 longterm Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、真空蒸着の蒸発源、特に電子ビーム蒸発用の
ルツボに関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an evaporation source for vacuum evaporation, in particular to a crucible for electron beam evaporation.
従来の技術
近年電子ビーム蒸着は、電子部品の高機能・小型化に伴
なう薄膜素子構造の進展とともK、急速に伸びてきてい
る。その蒸発源であるハースのルツボ形状は、第3図に
示すように、円形すりばち状であった。BACKGROUND OF THE INVENTION In recent years, electron beam evaporation has been rapidly growing along with advances in thin film element structures that accompany the increasing functionality and miniaturization of electronic components. The shape of the hearth crucible, which is the evaporation source, was a circular mortar shape, as shown in FIG.
この円形すりばち状のルツボ内に、蒸着しようとする材
料を入れ、電子ビームで加熱蒸発させるのであるが、長
時間連続して蒸着加工しだいというフィルム状の蒸着や
、インライン式の蒸着と、多成分材料、例えばNi/C
o、Nf/Fe、Te/Seなどの合金を蒸着したいと
する、電子工業界でのニーズが近年特に高まってきた。The material to be evaporated is put into this circular mortar-shaped crucible and heated and evaporated with an electron beam. material, e.g. Ni/C
The need in the electronics industry to deposit alloys such as O, Nf/Fe, and Te/Se has particularly increased in recent years.
発明が解決しようとする問題点
長時間連続蒸着はもち論のこと真空蒸着は、蒸着しよう
とする材料を加熱蒸発させるだめ、材料により飛び易さ
、つまりある温度TKにおける蒸気圧PTが異なるのが
、基本的に存在する。従って、例えばN i /Crの
ように、蒸気圧差が大きい材料では、当初飛び易いCr
が多く、徐々に、Nlが多くなるような、蒸着膜の組成
変化が起こるのが一般的であった。Problems to be Solved by the Invention Of course, continuous vapor deposition over a long period of time is a problem.In vacuum vapor deposition, the material to be vaporized must be heated and evaporated. , basically exists. Therefore, in materials with a large vapor pressure difference, such as N i /Cr, Cr tends to fly at first.
Generally, the composition of the deposited film changes such that the amount of Nl gradually increases.
そこで減少する材料や飛び易い材料を常に補充しながら
、膜組成を一定に保とうとする試みがなされているが、
上記のような、従来の円形すりばち状ルツボでは、材料
供給時に、スプラッシュと呼ばれる突沸が起こり、膜に
微小粒子が付着し、プツプツ状となるという問題があっ
た。Attempts have been made to keep the film composition constant by constantly replenishing decreasing materials or materials that fly easily.
In the conventional circular mortar-shaped crucible as described above, there is a problem in that bumping called splash occurs when the material is fed, and microparticles adhere to the film, resulting in a lumpy appearance.
その原因は、未だ充分に解析されていないが、急激な温
度上昇(固体材料を補充するため1000〜20oO℃
の温度変化をする)又は、電子ビームにふれたチャージ
アップなどが考えられている。The reason for this has not yet been fully analyzed, but the rapid temperature rise (1000 to 20oO℃ to replenish the solid material)
(temperature change) or charge-up due to contact with the electron beam.
そこで、予め加熱した材料を供給する方法などの提案も
あるが、装置が複雑となり、又、その効果も予想した通
りではない。Therefore, there have been proposals for a method of supplying preheated materials, but the equipment becomes complicated and the effect is not as expected.
本発明は、上記問題点に鑑み、蒸気圧差の大きい多成分
材料の蒸着において、その膜組成変化を抑えるだめの蒸
着材料供給に適した電子ビーム蒸着ハース用のルツボを
提供するものである。In view of the above problems, the present invention provides a crucible for an electron beam evaporation hearth that is suitable for supplying evaporation materials to suppress changes in film composition in the evaporation of multi-component materials with large vapor pressure differences.
問題点を解決するための手段
上記問題点を解決するため、本発明は、電子ビーム蒸着
用ハースのルツボ形状を長円すりばち状にしたものであ
る。Means for Solving the Problems In order to solve the above-mentioned problems, in the present invention, the crucible shape of the hearth for electron beam evaporation is made into an oblong mortar shape.
作 用
本発明はルツボ形状を長円すりばち状にする事により、
電子ビーム加熱蒸発部と、材料供給部を分離することが
でき、これによって材料供給時のスプラッシュを低減す
ることができるものである。Function The present invention has a crucible shaped like an oblong mortar.
The electron beam heating evaporation section and the material supply section can be separated, thereby reducing splash during material supply.
実施例 以下本発明の一実施例を図面を参照しながら説明する。Example An embodiment of the present invention will be described below with reference to the drawings.
第1図は本発明の実施例におけるルツボ形状を示すもの
で、1はルツボ、2はハース、3は電子ビーム加熱部、
4は材料供給部である。FIG. 1 shows the crucible shape in an embodiment of the present invention, where 1 is a crucible, 2 is a hearth, 3 is an electron beam heating section,
4 is a material supply section.
ここで、材料供給部は、電子ビーム加熱部より低温にな
るようハースの冷却構造を配慮している。Here, the cooling structure of the hearth is designed so that the material supply section is at a lower temperature than the electron beam heating section.
電子ビーム加熱部は、第2図に示すように、電子ビーム
のビームスィーブ中心6とビームスイープの最外部を結
ぶ距離5でもって円を描いた円形範囲と規定する。As shown in FIG. 2, the electron beam heating section is defined as a circular area drawn by a distance 5 connecting the beam sweep center 6 of the electron beam and the outermost edge of the beam sweep.
材料供給部は、役人材料が落下する部分の中心7と、上
記6でもって円を描いた円形範囲と規定する。The material supply section is defined as a circular area drawn by the center 7 of the part where the official materials fall and the above 6.
この材料供給部と電子ビーム加熱部のオーバラップ量を
規定することにより、ルツボ形状を設計出来ると考え、
実験を重ねた結果、電子ビームスイープの半径が10
m/m以下の場合には、オーバラップ部があってはスプ
ラッシュが多発した。半径が10〜25 m/mの場合
にはオーバラップ部があってもよいが、その量は、半径
のZ以下である事が望しいことが分かった。さらに25
m/m以上の場合には、オーバラップ量は%以下であ
ることが分かった。We believe that the shape of the crucible can be designed by specifying the amount of overlap between the material supply section and the electron beam heating section.
As a result of repeated experiments, the radius of the electron beam sweep was 10
m/m or less, splashes occurred frequently even if there was an overlapping part. When the radius is 10 to 25 m/m, there may be an overlapping portion, but it has been found that it is desirable that the amount is less than or equal to Z of the radius. 25 more
It was found that when the ratio is m/m or more, the overlap amount is less than %.
発明の効果
以上のように本発明は、電子ビーム蒸着用ハースのルツ
ボ形状を長円すりばち状にすることにより、長時間の連
続蒸着や、蒸気圧に差がある成分の多元合金蒸着等にお
ける蒸着材料の供給時におけるスプラッシュを著るしく
低減し、良質な皮膜形成を可能にするもので、実生産に
多元な効果をもたらすものである。Effects of the Invention As described above, the present invention makes the shape of the crucible of the hearth for electron beam evaporation into an oblong mortar shape, thereby making it possible to perform continuous evaporation over a long period of time or evaporation in multi-component alloy evaporation of components with different vapor pressures. It significantly reduces splash during material feeding and enables the formation of a high-quality film, which brings multiple effects to actual production.
又、長円としたため、ハースライナの形作が多角形に比
べ容易で、割れに<<、冷却効果も均一となるため、成
膜コストの低減をもたらす。Furthermore, since the shape is oval, the shape of the hearth liner is easier than that of a polygon, and the cooling effect is uniform to prevent cracking, resulting in a reduction in film-forming cost.
第1図aは本発明の一実施例の正面図、第1図すは同側
面図、第2図は電子ビーム加熱部と材料供給部を規定す
る正面模式図、第3図aは従来例の正面図、第3図すは
同側面図である。
1・・・・・・ルツボ、2・・・・・・ハース。
代理人の氏名 弁理士 中 尾 敏 男 はが1名第1
図
第2図
第3図
αFIG. 1a is a front view of one embodiment of the present invention, FIG. 1 is a side view of the same, FIG. 2 is a schematic front view defining an electron beam heating section and a material supply section, and FIG. FIG. 3 is a front view of the same, and FIG. 3 is a side view of the same. 1... Crucible, 2... Hearth. Name of agent: Patent attorney Toshio Nakao (1st person)
Figure 2 Figure 3 α
Claims (1)
ボ。A crucible for electron beam evaporation with a hearth part shaped like an oblong mortar.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28134085A JPS62139868A (en) | 1985-12-13 | 1985-12-13 | Crucible for electron beam evaporation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28134085A JPS62139868A (en) | 1985-12-13 | 1985-12-13 | Crucible for electron beam evaporation |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62139868A true JPS62139868A (en) | 1987-06-23 |
Family
ID=17637741
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28134085A Pending JPS62139868A (en) | 1985-12-13 | 1985-12-13 | Crucible for electron beam evaporation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62139868A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5415007A (en) * | 1977-06-29 | 1979-02-03 | Tadashi Tomizawa | Image erasing apparatus for developed diazo light sensitive paper |
JPS57169088A (en) * | 1981-04-09 | 1982-10-18 | Olympus Optical Co Ltd | Crucible |
JPS60116769A (en) * | 1983-11-30 | 1985-06-24 | Shinko Electric Ind Co Ltd | Vapor deposition device |
-
1985
- 1985-12-13 JP JP28134085A patent/JPS62139868A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5415007A (en) * | 1977-06-29 | 1979-02-03 | Tadashi Tomizawa | Image erasing apparatus for developed diazo light sensitive paper |
JPS57169088A (en) * | 1981-04-09 | 1982-10-18 | Olympus Optical Co Ltd | Crucible |
JPS60116769A (en) * | 1983-11-30 | 1985-06-24 | Shinko Electric Ind Co Ltd | Vapor deposition device |
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