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JPS60260861A - Probe - Google Patents

Probe

Info

Publication number
JPS60260861A
JPS60260861A JP59116390A JP11639084A JPS60260861A JP S60260861 A JPS60260861 A JP S60260861A JP 59116390 A JP59116390 A JP 59116390A JP 11639084 A JP11639084 A JP 11639084A JP S60260861 A JPS60260861 A JP S60260861A
Authority
JP
Japan
Prior art keywords
probe
semiconductor pellet
strip line
force
tip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59116390A
Other languages
Japanese (ja)
Inventor
Shinya Niizaki
新居崎 信也
Hideo Yamamura
英穂 山村
Takashi Saito
隆 斎藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59116390A priority Critical patent/JPS60260861A/en
Publication of JPS60260861A publication Critical patent/JPS60260861A/en
Pending legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Measuring Leads Or Probes (AREA)

Abstract

PURPOSE:To transmit a signal of high frequency and high speed without distortion, and to inspect a semiconductor pellet of high frequency and high speed by structuring the part extending to the tip of a probe by a micro strip line. CONSTITUTION:A micro strip line is formed by constituting one face of a base film 6 of a ground electric conductor, and providing a signal wire 7 on the other face. A dam 10 consisting of an organic substance is formed in the tip of a probe, namely, a contact part with a semiconductor pellet, and a contactor 9 is formed adjacently to said dam. The other end of the probe is connected to a probe card 2 consisting of a strip line structure. When executing an inspection, a force is applied to the probe part by using a probe holding jig 13 from the upper part of the probe, and the probe is brought into contact with a semiconductor pellet to be measure 1. In this case, the force applied to a terminal electrode 5 of the semiconductor pellet can be adjusted by adjusting the applied force of the probe holding jig 13.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は半導体ペレット検査用のプローブに関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a probe for inspecting semiconductor pellets.

〔発明の背景〕[Background of the invention]

IC、LSI等の半導体素子の品質管理のため、ペレッ
ト状態での検査が行なわれ、ここで計測装置と半導体ペ
レットを電気的に接続する治具としてプローブが用いら
れている。第1図は従来のプロービング方式を示す図で
、1は被測定半導体ペレット、2はプローブカードで3
はタングステン鋼等で作られているプローブである。
For quality control of semiconductor elements such as ICs and LSIs, inspection is performed in the pellet state, and a probe is used as a jig to electrically connect a measuring device and the semiconductor pellet. Figure 1 shows the conventional probing method, where 1 is a semiconductor pellet to be measured, 2 is a probe card, and 3
is a probe made of tungsten steel or the like.

プローブ5はグローブカード2の配線4にはんだ等で接
続され、プローブカードとプローブが一体となり上下す
ることにより、半導体ペレットの電極との接触を行なう
。このような従来のブロービング方式では、電気的には
プローブの自己インダクタンスがあるため、マイクロ波
トランジスタ等の高周波素子、および高速ノくルスを扱
う高速素子のブロービングには用いられないという欠点
があった。
The probe 5 is connected to the wiring 4 of the glove card 2 by solder or the like, and the probe card and the probe move up and down as one, thereby making contact with the electrodes of the semiconductor pellet. This type of conventional probing method has the disadvantage that it cannot be used for probing high-frequency devices such as microwave transistors, or high-speed devices that handle high-speed nozzles, because the probe has self-inductance electrically. there were.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、高周波および高速の半導体ヘレットノ
ブロービング方式を提供することにある。
An object of the present invention is to provide a high frequency and high speed semiconductor Herrett knob roving method.

〔発明の概要〕[Summary of the invention]

計測器の入出力インピーダンスz0と同じ特性インピー
ダンスで信号を伝送すると信号は歪まないことが知られ
ている。このためプローブまで特性インピーダンスz0
の伝送線路で形成する。
It is known that if a signal is transmitted with the same characteristic impedance as the input/output impedance z0 of the measuring instrument, the signal will not be distorted. Therefore, the characteristic impedance z0 up to the probe
It is formed by a transmission line.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の一実施例を図面を用いて説明する。第2
図は本発明の断面模式図、第3図はプローブ部のみを第
2図の下面より見た図、第4図はグローブ部の配線部の
断面図である。プローブ部は、ポリイミドフィルム等を
ベースフィルムとした両面銅張フレキシブルプリント板
で基本的に構成される、すなわちベースフィルム60片
面は接地導体8とし他の面に信号伝送用配線7が配され
てマイクロストリップラインを形成している。この伝送
線路の特性インピーダンス2゜は、ベースフィルム6の
厚さをり、比誘電率をεr、配線7の幅をWとすれば、
次式で与えられる。
An embodiment of the present invention will be described below with reference to the drawings. Second
3 is a schematic cross-sectional view of the present invention, FIG. 3 is a view of only the probe portion viewed from the bottom of FIG. 2, and FIG. 4 is a cross-sectional view of the wiring portion of the globe portion. The probe section basically consists of a double-sided copper-clad flexible printed board with a polyimide film or the like as a base film.In other words, the base film 60 has a grounding conductor 8 on one side and signal transmission wiring 7 on the other side. forming a strip line. The characteristic impedance 2° of this transmission line is the thickness of the base film 6, the relative dielectric constant is εr, and the width of the wiring 7 is W.
It is given by the following formula.

ここで εr−Hεr−1 εre−2+ 2 (1+10 % ) −172いま
、ポリイミドベースフィルムの厚さを100μmとしz
0s++soΩとすれば、Wは約200μ簿となる。
Here, εr−Hεr−1 εre−2+ 2 (1+10%) −172 Now, assuming that the thickness of the polyimide base film is 100 μm, z
If 0s++soΩ, W becomes approximately 200μ.

プローブ部の先端、すなわち半導体ベレットとの接触部
は、有機物よりなるダム10が形成され、それに隣接し
【接触子9が形成されている。
A dam 10 made of an organic material is formed at the tip of the probe part, that is, a contact part with the semiconductor pellet, and a contact 9 is formed adjacent to the dam 10.

この接触子は、銅等の金属の部分めっきないし、タング
ステン鋼等の金属加工物のはんだ接続等による接着、あ
るいは、はんだボール等の接着により形成される。最後
の例は、7リツプチツプの半田溶融接続法に用いられる
手法であり、はんだの表面張力により接触子が形成され
るが、この時全接触子先端を同一平面にするには、はん
だ溶融時にはんだにぬれない平面物体に全接触子先端を
わずかにあてればよい。
This contact is formed by selectively plating a metal such as copper, adhering a metal workpiece such as tungsten steel by soldering, or adhering a solder ball or the like. The last example is a method used in the solder fusion connection method for 7-lip chips, in which contacts are formed by the surface tension of the solder. All you have to do is slightly touch the tips of all the contacts to a flat object that cannot be wetted by the liquid.

プローブ部の他の一方の端は、ストリップ線路構造とな
っているプローブカード2と接続されている。すなわち
、プローブ部の接地導体8とプローブカードの接地導体
12が、また信号線7と11が接続されている。ここで
、プローブカードと己て第5図に示すように筒体14に
機械的に固定されたセミリジットケーブル等の同軸線路
15をグローブカードのかわりに用いてもよい。
The other end of the probe section is connected to a probe card 2 having a stripline structure. That is, the ground conductor 8 of the probe section is connected to the ground conductor 12 of the probe card, and the signal lines 7 and 11 are connected. Here, a coaxial line 15 such as a semi-rigid cable mechanically fixed to the cylindrical body 14 as shown in FIG. 5 together with the probe card may be used instead of the globe card.

このグローブの被測定半導体ベレット1との接触方法で
あるが、プローブ部上方よりプローブおさえの治具13
を用い、グローブ部に力を加えることにより達成される
。この時、プローブ部はフレキシブル基板で製作されて
いるため、半導体ベレットの端子電極5に加わる力はプ
ローブおさえ治具13の印加力を調整することにより調
整できる。
The method of bringing this glove into contact with the semiconductor pellet 1 to be measured is to use a jig 13 for holding the probe from above the probe part.
This is achieved by applying force to the glove part. At this time, since the probe section is made of a flexible substrate, the force applied to the terminal electrode 5 of the semiconductor pellet can be adjusted by adjusting the applied force of the probe holding jig 13.

以上の説明では、プローブカードの伝送線路として、ス
トリップライン構造としたが、第6図に示すように、ス
トリップ線路構造とすることもできる。ここで、16.
17はベースフィルム、7は信号配線、18.19は接
地導体で、それぞれ同軸線路の中心導体と外部導体に接
続される。
In the above description, the transmission line of the probe card has a strip line structure, but as shown in FIG. 6, it can also have a strip line structure. Here, 16.
17 is a base film, 7 is a signal wiring, and 18 and 19 are ground conductors, which are connected to the center conductor and outer conductor of the coaxial line, respectively.

〔発明の効果〕〔Effect of the invention〕

以上述べたように、本発明によれば、プローブ先端部分
まで、マイク四ス) IJツブ線路構造とできるため、
高周波および高速の信号が歪なく伝送できる。すなわち
、従来は周波数的には数10−、パルスとしては立上り
時間10ns前後までしか扱えなかったのが、本発明に
よると周波数的には数100恥、立上り時間1nS前後
のパルスまで計測可能となり、1桁以上の高速・高周波
化が達成できる。また、配線幅も100μ馬前後まで微
細化が可能なことから、端子電極が多い多ピンLSI用
プローブが容易に得られるという利点を有している。
As described above, according to the present invention, it is possible to have an IJ tube line structure up to the tip of the probe.
High frequency and high speed signals can be transmitted without distortion. In other words, in the past, it was only possible to measure pulses with a frequency of several 10 ns and a rise time of around 10 ns, but according to the present invention, it is now possible to measure pulses with a frequency of several 100 ns and a rise time of around 1 ns. It is possible to achieve higher speeds and frequencies of more than one order of magnitude. Further, since the wiring width can be reduced to around 100 μm, it has the advantage that a multi-pin LSI probe with many terminal electrodes can be easily obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のプローブを示す模式図、第2図は本発明
の一実施例のプローブを示す断面模式図、第6図はプロ
ーブ部の下面図、第4図は配線部の断面図、第5図はプ
ローブカードとして同軸線路を用いた断面図、第6図は
本発明の他の実施例の断面図である。 6・・・ベースフィルム、 7・・・信号配線、 8・・・接地導体、 9・・・接触子。 代理人弁理士 高 橋 明 夫 才 l 図 7 第2図 9 21″3 図 オ 4 詔
FIG. 1 is a schematic diagram showing a conventional probe, FIG. 2 is a cross-sectional schematic diagram showing a probe according to an embodiment of the present invention, FIG. 6 is a bottom view of the probe section, and FIG. 4 is a cross-sectional diagram of the wiring section. FIG. 5 is a sectional view using a coaxial line as a probe card, and FIG. 6 is a sectional view of another embodiment of the present invention. 6...Base film, 7...Signal wiring, 8...Grounding conductor, 9...Contactor. Representative Patent Attorney Akira Takahashi Figure 7 Figure 2 9 21″3 Figure O 4 Rescript

Claims (1)

【特許請求の範囲】[Claims] 1 ベースフィルム上の片面に接地導体を、他の一方の
面に信号配線を配し、マイクロストリップ線路構造とし
、該信号配線の先端部に接触子を形成したことを特徴と
するプローブ。
1. A probe characterized in that a ground conductor is arranged on one side of a base film and a signal wiring is arranged on the other side to form a microstrip line structure, and a contact is formed at the tip of the signal wiring.
JP59116390A 1984-06-08 1984-06-08 Probe Pending JPS60260861A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59116390A JPS60260861A (en) 1984-06-08 1984-06-08 Probe

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59116390A JPS60260861A (en) 1984-06-08 1984-06-08 Probe

Publications (1)

Publication Number Publication Date
JPS60260861A true JPS60260861A (en) 1985-12-24

Family

ID=14685837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59116390A Pending JPS60260861A (en) 1984-06-08 1984-06-08 Probe

Country Status (1)

Country Link
JP (1) JPS60260861A (en)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62177454A (en) * 1986-01-31 1987-08-04 Tanaka Kikinzoku Kogyo Kk Probe stylus for measuring electric characteristic of semiconductor wafer
JPS62177456A (en) * 1986-01-31 1987-08-04 Tanaka Kikinzoku Kogyo Kk Probe stylus for measuring electric characteristic of semiconductor wafer
JPS62177455A (en) * 1986-01-31 1987-08-04 Tanaka Kikinzoku Kogyo Kk Probe stylus for measuring electric characteristics of semiconductor wafer
JPS62179126A (en) * 1986-01-31 1987-08-06 Nippon Denshi Zairyo Kk Probe card for microwave
JPS62182672A (en) * 1986-01-07 1987-08-11 Yokogawa Hewlett Packard Ltd Testing probe
JPS62186544A (en) * 1986-02-12 1987-08-14 Tanaka Kikinzoku Kogyo Kk Probe for measuring electric characteristic of semiconductor wafer
JPS62186543A (en) * 1986-02-12 1987-08-14 Tanaka Kikinzoku Kogyo Kk Probe for measuring electric characteristic of semiconductor wafer
JPS62233774A (en) * 1986-04-03 1987-10-14 Matsushita Electric Ind Co Ltd Inspecting method for circuit board
JPS62261972A (en) * 1986-05-08 1987-11-14 Mitsubishi Electric Corp Substrate inspection device
JPS6365638A (en) * 1986-09-05 1988-03-24 テクトロニクス・インコーポレイテツド Integrated circuit wafer prober
JPS644042A (en) * 1987-06-09 1989-01-09 Tektronix Inc Prober
JPS6414936A (en) * 1987-07-08 1989-01-19 Tokyo Electron Ltd Inspecting apparatus
JPH0252048U (en) * 1988-10-11 1990-04-13
JPH02210269A (en) * 1988-10-25 1990-08-21 Tokyo Electron Ltd Probe device
JPH02237131A (en) * 1989-03-10 1990-09-19 Matsushita Electric Ind Co Ltd Apparatus and method for testing of semiconductor ic
US4975638A (en) * 1989-12-18 1990-12-04 Wentworth Laboratories Test probe assembly for testing integrated circuit devices
JPH03127845A (en) * 1989-10-13 1991-05-30 Fuji Electric Co Ltd Testing probe for integrated circuit device
JPH0722478A (en) * 1993-06-30 1995-01-24 Kawasaki Steel Corp Probe test apparatus and probe testing method
US6759258B2 (en) 1997-05-09 2004-07-06 Renesas Technology Corp. Connection device and test system
JP2005524855A (en) * 2002-05-08 2005-08-18 フォームファクター,インコーポレイテッド High performance probe system for testing semiconductor wafers
JP2009294064A (en) * 2008-06-05 2009-12-17 Totoku Electric Co Ltd High frequency measuring probe
US7764075B2 (en) 2002-05-08 2010-07-27 Formfactor, Inc. High performance probe system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS499976A (en) * 1972-05-15 1974-01-29
JPS4917685A (en) * 1972-06-05 1974-02-16
JPS5718334A (en) * 1980-07-10 1982-01-30 Nippon Telegr & Teleph Corp <Ntt> Ic chip testing apparatus
JPS57204473A (en) * 1981-06-05 1982-12-15 Maikuro Component Tekunorojii Electric connector to electric device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS499976A (en) * 1972-05-15 1974-01-29
JPS4917685A (en) * 1972-06-05 1974-02-16
JPS5718334A (en) * 1980-07-10 1982-01-30 Nippon Telegr & Teleph Corp <Ntt> Ic chip testing apparatus
JPS57204473A (en) * 1981-06-05 1982-12-15 Maikuro Component Tekunorojii Electric connector to electric device

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62182672A (en) * 1986-01-07 1987-08-11 Yokogawa Hewlett Packard Ltd Testing probe
JPS62177454A (en) * 1986-01-31 1987-08-04 Tanaka Kikinzoku Kogyo Kk Probe stylus for measuring electric characteristic of semiconductor wafer
JPS62177456A (en) * 1986-01-31 1987-08-04 Tanaka Kikinzoku Kogyo Kk Probe stylus for measuring electric characteristic of semiconductor wafer
JPS62177455A (en) * 1986-01-31 1987-08-04 Tanaka Kikinzoku Kogyo Kk Probe stylus for measuring electric characteristics of semiconductor wafer
JPS62179126A (en) * 1986-01-31 1987-08-06 Nippon Denshi Zairyo Kk Probe card for microwave
JPS62186543A (en) * 1986-02-12 1987-08-14 Tanaka Kikinzoku Kogyo Kk Probe for measuring electric characteristic of semiconductor wafer
JPS62186544A (en) * 1986-02-12 1987-08-14 Tanaka Kikinzoku Kogyo Kk Probe for measuring electric characteristic of semiconductor wafer
JPS62233774A (en) * 1986-04-03 1987-10-14 Matsushita Electric Ind Co Ltd Inspecting method for circuit board
JPS62261972A (en) * 1986-05-08 1987-11-14 Mitsubishi Electric Corp Substrate inspection device
JPS6365638A (en) * 1986-09-05 1988-03-24 テクトロニクス・インコーポレイテツド Integrated circuit wafer prober
JPH0517705B2 (en) * 1987-06-09 1993-03-09 Tektronix Inc
JPS644042A (en) * 1987-06-09 1989-01-09 Tektronix Inc Prober
JPS6414936A (en) * 1987-07-08 1989-01-19 Tokyo Electron Ltd Inspecting apparatus
JPH0252048U (en) * 1988-10-11 1990-04-13
JPH02210269A (en) * 1988-10-25 1990-08-21 Tokyo Electron Ltd Probe device
JPH02237131A (en) * 1989-03-10 1990-09-19 Matsushita Electric Ind Co Ltd Apparatus and method for testing of semiconductor ic
JPH03127845A (en) * 1989-10-13 1991-05-30 Fuji Electric Co Ltd Testing probe for integrated circuit device
US4975638A (en) * 1989-12-18 1990-12-04 Wentworth Laboratories Test probe assembly for testing integrated circuit devices
JPH0722478A (en) * 1993-06-30 1995-01-24 Kawasaki Steel Corp Probe test apparatus and probe testing method
US6759258B2 (en) 1997-05-09 2004-07-06 Renesas Technology Corp. Connection device and test system
US7285430B2 (en) 1997-05-09 2007-10-23 Hitachi, Ltd. Connection device and test system
US7541202B2 (en) 1997-05-09 2009-06-02 Renesas Technology Corp. Connection device and test system
JP2005524855A (en) * 2002-05-08 2005-08-18 フォームファクター,インコーポレイテッド High performance probe system for testing semiconductor wafers
US7764075B2 (en) 2002-05-08 2010-07-27 Formfactor, Inc. High performance probe system
US8614590B2 (en) 2002-05-08 2013-12-24 Charles A. Miller High performance probe system
JP2009294064A (en) * 2008-06-05 2009-12-17 Totoku Electric Co Ltd High frequency measuring probe

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