JPS6489569A - Solar cell element - Google Patents
Solar cell elementInfo
- Publication number
- JPS6489569A JPS6489569A JP62247626A JP24762687A JPS6489569A JP S6489569 A JPS6489569 A JP S6489569A JP 62247626 A JP62247626 A JP 62247626A JP 24762687 A JP24762687 A JP 24762687A JP S6489569 A JPS6489569 A JP S6489569A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- semiconductor layer
- electrode
- substrate
- type semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Landscapes
- Photovoltaic Devices (AREA)
Abstract
PURPOSE:To increase a photoelectric conversion efficiency within a semiconductor layer on the side to which light is applied, by a method wherein dopant diffusion with higher concentration than that at peripheries is provided to many partions and current is taken out from these partions via an electrode metal layer. CONSTITUTION:An N<+>-type semiconductor layer 2 with conduction opposite to that of a P-type semiconductor substrate 1 is formed on one surface of the substrate 1. A reflection prevention layer 5 is then formed over the whole surface of the N<+>-type semiconductor layer 2 and many several-mum-square holes are made therein. Then, high concentration N<++> semiconductor layer 9 is formed only on those portions where the holes are made by the N<+> semiconductor layer 2. An electrode part 4 is formed so as to electrically connect the holes 8 with the N<++> diffusion part 9, and an electrode layer 6 is then formed on the underside of the substrate 1. With this construction, the contact resistance of the electrode 4 on the light projection side with respect to the N<+> layer 2 can be greatly reduced, which reduces a surface recombination current on the N<+> layer 2 and enhances a photoelectric conversion efficiency.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62247626A JPS6489569A (en) | 1987-09-30 | 1987-09-30 | Solar cell element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62247626A JPS6489569A (en) | 1987-09-30 | 1987-09-30 | Solar cell element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6489569A true JPS6489569A (en) | 1989-04-04 |
Family
ID=17166306
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62247626A Pending JPS6489569A (en) | 1987-09-30 | 1987-09-30 | Solar cell element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6489569A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03250671A (en) * | 1990-01-31 | 1991-11-08 | Sharp Corp | Semiconductor photoelectric converting device and its manufacture |
EP0908956A2 (en) * | 1997-10-06 | 1999-04-14 | Canon Kabushiki Kaisha | Photoelectric conversion apparatus and image sensor |
WO2009150741A1 (en) * | 2008-06-12 | 2009-12-17 | 三菱電機株式会社 | Photovoltaic device manufacturing method |
CN103515456A (en) * | 2012-06-26 | 2014-01-15 | Lg电子株式会社 | Solar cell |
-
1987
- 1987-09-30 JP JP62247626A patent/JPS6489569A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03250671A (en) * | 1990-01-31 | 1991-11-08 | Sharp Corp | Semiconductor photoelectric converting device and its manufacture |
EP0908956A2 (en) * | 1997-10-06 | 1999-04-14 | Canon Kabushiki Kaisha | Photoelectric conversion apparatus and image sensor |
EP0908956A3 (en) * | 1997-10-06 | 2000-02-02 | Canon Kabushiki Kaisha | Photoelectric conversion apparatus and image sensor |
US6150704A (en) * | 1997-10-06 | 2000-11-21 | Canon Kabushiki Kaisha | Photoelectric conversion apparatus and image sensor |
EP1688998A2 (en) * | 1997-10-06 | 2006-08-09 | Canon Kabushiki Kaisha | Photoelectric conversion apparatus and image sensor |
WO2009150741A1 (en) * | 2008-06-12 | 2009-12-17 | 三菱電機株式会社 | Photovoltaic device manufacturing method |
CN103515456A (en) * | 2012-06-26 | 2014-01-15 | Lg电子株式会社 | Solar cell |
JP2014007382A (en) * | 2012-06-26 | 2014-01-16 | Lg Electronics Inc | Solar cell |
US10573767B2 (en) | 2012-06-26 | 2020-02-25 | Lg Electronics Inc. | Solar cell |
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