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JPS6468968A - Thin film transistor - Google Patents

Thin film transistor

Info

Publication number
JPS6468968A
JPS6468968A JP62225721A JP22572187A JPS6468968A JP S6468968 A JPS6468968 A JP S6468968A JP 62225721 A JP62225721 A JP 62225721A JP 22572187 A JP22572187 A JP 22572187A JP S6468968 A JPS6468968 A JP S6468968A
Authority
JP
Japan
Prior art keywords
electrode
gate
drain electrode
source electrode
covered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62225721A
Other languages
Japanese (ja)
Other versions
JP2516030B2 (en
Inventor
Takashi Nakazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP62225721A priority Critical patent/JP2516030B2/en
Publication of JPS6468968A publication Critical patent/JPS6468968A/en
Application granted granted Critical
Publication of JP2516030B2 publication Critical patent/JP2516030B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/417Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
    • H01L29/41725Source or drain electrodes for field effect devices
    • H01L29/41733Source or drain electrodes for field effect devices for thin film transistors with insulated gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thin Film Transistor (AREA)

Abstract

PURPOSE:To eliminate the dispersion in the floating capacity by a method wherein a semiconductor layer is covered with a gate insulating film while a gate electrode is provided to intersect with a source electrode and a drain electrode in the long direction. CONSTITUTION:A source electrode 103 and a drain electrode 102 are provided in parallel with each other at the distance of the channel length of a thin film transistor on an insulating substrate 101. A semiconductor layer 104 is formed in contact with the upper side of the source electrode 103 and the drain electrode 102 to connect these two electrodes 103, 102 which are covered with a gate insulating film 105. Furthermore, the semiconductor layer 104 is covered with a gate electrode 106 intersecting with the source electrode 103 and the drain electrode 102 in the long direction through the intermediary of the gate insulating film 105. Thus, even if the gate electrode 106 is pattern-slipped in the arrow 505 or 506 directions, the overlapped space of the source electrode 103 and the drain electrode 102 with the gate electrode 106 can be kept constant. Consequently, the pattern-slip of the gate electrode 106 do not have any effect on the stray capacity.
JP62225721A 1987-09-09 1987-09-09 Thin film transistor Expired - Lifetime JP2516030B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62225721A JP2516030B2 (en) 1987-09-09 1987-09-09 Thin film transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62225721A JP2516030B2 (en) 1987-09-09 1987-09-09 Thin film transistor

Publications (2)

Publication Number Publication Date
JPS6468968A true JPS6468968A (en) 1989-03-15
JP2516030B2 JP2516030B2 (en) 1996-07-10

Family

ID=16833774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62225721A Expired - Lifetime JP2516030B2 (en) 1987-09-09 1987-09-09 Thin film transistor

Country Status (1)

Country Link
JP (1) JP2516030B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5049952A (en) * 1989-12-30 1991-09-17 Samsung Electron Devices Co., Ltd. Thin film transistor for use in a flat plate display
JP2011175032A (en) * 2010-02-23 2011-09-08 Hitachi Displays Ltd Display device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001051293A (en) 1999-07-29 2001-02-23 Internatl Business Mach Corp <Ibm> Thin-film transistor, liquid crystal display panel, manufacturing method of the thin-film transistor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61108171A (en) * 1984-11-01 1986-05-26 Toshiba Corp Thin film field effect transistor
JPS62120080A (en) * 1985-11-20 1987-06-01 Sanyo Electric Co Ltd Display device
JPS62132367A (en) * 1985-12-04 1987-06-15 Nec Corp Thin film field effect transistor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61108171A (en) * 1984-11-01 1986-05-26 Toshiba Corp Thin film field effect transistor
JPS62120080A (en) * 1985-11-20 1987-06-01 Sanyo Electric Co Ltd Display device
JPS62132367A (en) * 1985-12-04 1987-06-15 Nec Corp Thin film field effect transistor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5049952A (en) * 1989-12-30 1991-09-17 Samsung Electron Devices Co., Ltd. Thin film transistor for use in a flat plate display
JP2011175032A (en) * 2010-02-23 2011-09-08 Hitachi Displays Ltd Display device

Also Published As

Publication number Publication date
JP2516030B2 (en) 1996-07-10

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Legal Events

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