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JPS6438701A - Non-reflection treated substrate - Google Patents

Non-reflection treated substrate

Info

Publication number
JPS6438701A
JPS6438701A JP62194480A JP19448087A JPS6438701A JP S6438701 A JPS6438701 A JP S6438701A JP 62194480 A JP62194480 A JP 62194480A JP 19448087 A JP19448087 A JP 19448087A JP S6438701 A JPS6438701 A JP S6438701A
Authority
JP
Japan
Prior art keywords
substrate
aluminum
glass substrate
obtd
sticking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62194480A
Other languages
Japanese (ja)
Inventor
Akio Saito
Mitsuo Nakatani
Hiromitsu Kawamura
Shinji Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62194480A priority Critical patent/JPS6438701A/en
Publication of JPS6438701A publication Critical patent/JPS6438701A/en
Pending legal-status Critical Current

Links

Landscapes

  • Surface Treatment Of Optical Elements (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)

Abstract

PURPOSE:To increase film strength and to enable the easy removal of the finger prints sticking to the film by etching the surface of a glass substrate thereby forming rugged parts having a specific depth continuous at a specific pitch over the entire surface of the substrate. CONSTITUTION:The recesses of 1,000-1,500Angstrom depth obtd. by etching the substrate surface are formed continuously at 1,500-2,000Angstrom pitch over the entire surface of the substrate. Aluminum 2 is, therefore, formed in an island shape if the aluminum 2 is formed by vacuum deposition on the glass substrate 1 at an angle theta. The surface of the glass substrate 1 is etched by CF4 plasma 3 with such aluminum as a mask. The aluminum 2 is then removed by a soln. mixture composed of phosphoric acid, nitric acid and acetic acid. The practicable non-reflection treated substrate which has the high film strength and enables the easy removal of the finger prints sticking to thereto is thereby obtd.
JP62194480A 1987-08-05 1987-08-05 Non-reflection treated substrate Pending JPS6438701A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62194480A JPS6438701A (en) 1987-08-05 1987-08-05 Non-reflection treated substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62194480A JPS6438701A (en) 1987-08-05 1987-08-05 Non-reflection treated substrate

Publications (1)

Publication Number Publication Date
JPS6438701A true JPS6438701A (en) 1989-02-09

Family

ID=16325242

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62194480A Pending JPS6438701A (en) 1987-08-05 1987-08-05 Non-reflection treated substrate

Country Status (1)

Country Link
JP (1) JPS6438701A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002122702A (en) * 2000-10-17 2002-04-26 Matsushita Electric Ind Co Ltd Optical film and display device
JP2002287370A (en) * 2001-03-27 2002-10-03 Mitsubishi Electric Corp Method for manufacturing optical element
JP2002333502A (en) * 2001-05-10 2002-11-22 Dainippon Printing Co Ltd Antireflection window plate for display cover of portable device having display and portable device
US6514674B1 (en) 1999-03-11 2003-02-04 Canon Kabushiki Kaisha Method of forming an optical element
US7034808B2 (en) 2001-01-17 2006-04-25 Seiko Epson Corporation Touch panel and electronic device
JP2008508553A (en) * 2004-07-27 2008-03-21 ヒューレット−パッカード デベロップメント カンパニー エル.ピー. Nanostructure antireflection surface
JP2012001000A (en) * 2006-11-15 2012-01-05 National Institute Of Advanced Industrial Science & Technology Molding die for optical device having antireflective structure, and optical device
JP2012040878A (en) * 2006-12-13 2012-03-01 National Institute Of Advanced Industrial Science & Technology Mold for optical element having nanostructure, mold for nanostructure, and optical element

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6514674B1 (en) 1999-03-11 2003-02-04 Canon Kabushiki Kaisha Method of forming an optical element
JP2002122702A (en) * 2000-10-17 2002-04-26 Matsushita Electric Ind Co Ltd Optical film and display device
US7034808B2 (en) 2001-01-17 2006-04-25 Seiko Epson Corporation Touch panel and electronic device
JP2002287370A (en) * 2001-03-27 2002-10-03 Mitsubishi Electric Corp Method for manufacturing optical element
JP2002333502A (en) * 2001-05-10 2002-11-22 Dainippon Printing Co Ltd Antireflection window plate for display cover of portable device having display and portable device
JP2008508553A (en) * 2004-07-27 2008-03-21 ヒューレット−パッカード デベロップメント カンパニー エル.ピー. Nanostructure antireflection surface
JP2012001000A (en) * 2006-11-15 2012-01-05 National Institute Of Advanced Industrial Science & Technology Molding die for optical device having antireflective structure, and optical device
JP2012040878A (en) * 2006-12-13 2012-03-01 National Institute Of Advanced Industrial Science & Technology Mold for optical element having nanostructure, mold for nanostructure, and optical element

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