[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JPS6410203A - Production of diffraction grating - Google Patents

Production of diffraction grating

Info

Publication number
JPS6410203A
JPS6410203A JP16717087A JP16717087A JPS6410203A JP S6410203 A JPS6410203 A JP S6410203A JP 16717087 A JP16717087 A JP 16717087A JP 16717087 A JP16717087 A JP 16717087A JP S6410203 A JPS6410203 A JP S6410203A
Authority
JP
Japan
Prior art keywords
mask
substrate
thin film
diffraction grating
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16717087A
Other languages
Japanese (ja)
Inventor
Teruhito Matsui
Hiroshi Sugimoto
Kenichi Otsuka
Yuji Abe
Toshiyuki Oishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP16717087A priority Critical patent/JPS6410203A/en
Publication of JPS6410203A publication Critical patent/JPS6410203A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/124—Geodesic lenses or integrated gratings

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

PURPOSE:To obtain a desired diffraction grating with good reproducibility by executing exposing of interference fringe patterns by using a two beam interference exposing method and generating a phase transition between a 1st mask and 2nd mask by a difference in the optical path between the front face of a 1st thin film and the front face of a substrate. CONSTITUTION:The 1st thin film 20 is selectively formed on the substrate 1 and a photosensitive resin 11 is coated on the 1st thin film 20 and the substrate 1. Exposing of the interference patterns is executed by using the two beam interference exposing method to form the 1st mask 2a for etching the 1st thin film and the 2nd mask 2b for etching the substrate on the 1st thin film 20 and the substrate 1. Selective etching of the 1st thin film 20 is executed by using the 1st mask 2a to form a 3rd mask 2c for etching the substrate and selective etching of the substrate 1 is executed by using the 2nd mask and the 3rd mask 2c to form the diffraction grating 2. The diffraction grating 2 having the phase transition of a quarter wavelength according to the wavelength of the light to be used is thereby easily produced with the good reproducibility without using the phase mask.
JP16717087A 1987-07-02 1987-07-02 Production of diffraction grating Pending JPS6410203A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16717087A JPS6410203A (en) 1987-07-02 1987-07-02 Production of diffraction grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16717087A JPS6410203A (en) 1987-07-02 1987-07-02 Production of diffraction grating

Publications (1)

Publication Number Publication Date
JPS6410203A true JPS6410203A (en) 1989-01-13

Family

ID=15844718

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16717087A Pending JPS6410203A (en) 1987-07-02 1987-07-02 Production of diffraction grating

Country Status (1)

Country Link
JP (1) JPS6410203A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6606432B2 (en) * 2000-05-03 2003-08-12 Georgia Tech Research Corp. Phase mask consisting of an array of multiple diffractive elements for simultaneous accurate fabrication of large arrays of optical couplers and method for making same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6606432B2 (en) * 2000-05-03 2003-08-12 Georgia Tech Research Corp. Phase mask consisting of an array of multiple diffractive elements for simultaneous accurate fabrication of large arrays of optical couplers and method for making same

Similar Documents

Publication Publication Date Title
CA2023510A1 (en) Single wavelength oscillating semiconductor laser device and method for manufacturing diffraction grating
EP0379358A3 (en) A method for producing a diffraction grating in optical elements
JPS5557807A (en) Production of diffraction grating
DE69515571D1 (en) Process for producing a glass substrate coated with a finely structured Nesa glass membrane
DE3564619D1 (en) Reflection phase grating and process for its manufacture
ATE162636T1 (en) MANUFACTURING METHOD FOR SHARP FIBER OPTICAL BRANCHES IN INTEGRATED OPTICAL COMPONENTS
JPS6410203A (en) Production of diffraction grating
JPS57106128A (en) Forming method for pattern
EP0517923A4 (en) Method of forming minute resist pattern
JPH0229955A (en) Production of optical disk
JPS56137633A (en) Pattern forming
JPS5320770A (en) Production of thin film fine patterns
JPS56137632A (en) Pattern forming
JPS54110857A (en) Optical production of sawtooth photo-sensitive resin flim
JPS6421450A (en) Production of mask
JPS56107554A (en) Formation of pattern
JPS5610930A (en) Manufacture of semiconductor device
JPS55128832A (en) Method of making minute pattern
JPS5983111A (en) Preparation of optical integrated circuit
JPS5543542A (en) Exposure method and exposure mask used for this
JPS57212445A (en) Production of photomask
JPH07101302B2 (en) Diffraction grating manufacturing method and automask used therefor
TAKASHI et al. Production of diffraction grating
JPH05343806A (en) Manufacture of phase-shifting diffraction
JPS54121150A (en) Optical production of blaze grating