JPS52127170A - Mask for patterning - Google Patents
Mask for patterningInfo
- Publication number
- JPS52127170A JPS52127170A JP4364976A JP4364976A JPS52127170A JP S52127170 A JPS52127170 A JP S52127170A JP 4364976 A JP4364976 A JP 4364976A JP 4364976 A JP4364976 A JP 4364976A JP S52127170 A JPS52127170 A JP S52127170A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitizer
- mask
- thickness
- patterning
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4364976A JPS52127170A (en) | 1976-04-19 | 1976-04-19 | Mask for patterning |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4364976A JPS52127170A (en) | 1976-04-19 | 1976-04-19 | Mask for patterning |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52127170A true JPS52127170A (en) | 1977-10-25 |
Family
ID=12669703
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4364976A Pending JPS52127170A (en) | 1976-04-19 | 1976-04-19 | Mask for patterning |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52127170A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008116517A (ja) * | 2006-11-01 | 2008-05-22 | Sk Electronics:Kk | 中間調フォトマスク及びその製造方法 |
JP2011186506A (ja) * | 2011-07-01 | 2011-09-22 | Sk Electronics:Kk | 中間調フォトマスク |
-
1976
- 1976-04-19 JP JP4364976A patent/JPS52127170A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008116517A (ja) * | 2006-11-01 | 2008-05-22 | Sk Electronics:Kk | 中間調フォトマスク及びその製造方法 |
JP2011186506A (ja) * | 2011-07-01 | 2011-09-22 | Sk Electronics:Kk | 中間調フォトマスク |
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