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JPS52127170A - Mask for patterning - Google Patents

Mask for patterning

Info

Publication number
JPS52127170A
JPS52127170A JP4364976A JP4364976A JPS52127170A JP S52127170 A JPS52127170 A JP S52127170A JP 4364976 A JP4364976 A JP 4364976A JP 4364976 A JP4364976 A JP 4364976A JP S52127170 A JPS52127170 A JP S52127170A
Authority
JP
Japan
Prior art keywords
photosensitizer
mask
thickness
patterning
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4364976A
Other languages
Japanese (ja)
Inventor
Akira Abiru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4364976A priority Critical patent/JPS52127170A/en
Publication of JPS52127170A publication Critical patent/JPS52127170A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To obtain a mask which does not generate unevenness of exposure also in case of ununiformity of coating thickness of a photosensitizer by changing thickness of a reflection preventing layer correspondingly with thickness of the photosensitizer for applying enough quantity of light to the stated exposure region of the photosensitizer.
COPYRIGHT: (C)1977,JPO&Japio
JP4364976A 1976-04-19 1976-04-19 Mask for patterning Pending JPS52127170A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4364976A JPS52127170A (en) 1976-04-19 1976-04-19 Mask for patterning

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4364976A JPS52127170A (en) 1976-04-19 1976-04-19 Mask for patterning

Publications (1)

Publication Number Publication Date
JPS52127170A true JPS52127170A (en) 1977-10-25

Family

ID=12669703

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4364976A Pending JPS52127170A (en) 1976-04-19 1976-04-19 Mask for patterning

Country Status (1)

Country Link
JP (1) JPS52127170A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008116517A (en) * 2006-11-01 2008-05-22 Sk Electronics:Kk Halftone photomask and method for manufacturing same
JP2011186506A (en) * 2011-07-01 2011-09-22 Sk Electronics:Kk Halftone photomask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008116517A (en) * 2006-11-01 2008-05-22 Sk Electronics:Kk Halftone photomask and method for manufacturing same
JP2011186506A (en) * 2011-07-01 2011-09-22 Sk Electronics:Kk Halftone photomask

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