JPS508760B1 - - Google Patents
Info
- Publication number
- JPS508760B1 JPS508760B1 JP45082600A JP8260070A JPS508760B1 JP S508760 B1 JPS508760 B1 JP S508760B1 JP 45082600 A JP45082600 A JP 45082600A JP 8260070 A JP8260070 A JP 8260070A JP S508760 B1 JPS508760 B1 JP S508760B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
- C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
- C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
- C08G61/08—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds of carbocyclic compounds containing one or more carbon-to-carbon double bonds in the ring
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL6914466A NL6914466A (ja) | 1969-09-24 | 1969-09-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS508760B1 true JPS508760B1 (ja) | 1975-04-07 |
Family
ID=19807974
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP45082600A Pending JPS508760B1 (ja) | 1969-09-24 | 1970-09-22 |
Country Status (7)
Country | Link |
---|---|
US (1) | US3776895A (ja) |
JP (1) | JPS508760B1 (ja) |
BE (1) | BE756457A (ja) |
DE (1) | DE2046722A1 (ja) |
FR (1) | FR2062473A5 (ja) |
GB (1) | GB1329997A (ja) |
NL (1) | NL6914466A (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4485208A (en) * | 1982-05-14 | 1984-11-27 | Hercules Incorporated | Plasticized polydicyclopentadiene and a method for making the same |
US3895001A (en) * | 1971-04-17 | 1975-07-15 | Bayer Ag | Process for the polymerisation of cycloalkenes |
US3944533A (en) * | 1973-08-25 | 1976-03-16 | Bayer Aktiengesellschaft | Polyalkenamers of wide molecular-weight distribution |
US4436858A (en) | 1982-05-14 | 1984-03-13 | Hercules Incorporated | Plasticized polydicyclopentadiene and a method for making the same |
KR100211548B1 (ko) * | 1996-12-20 | 1999-08-02 | 김영환 | 원자외선용 감광막 공중합체 및 그 제조방법 |
KR100265597B1 (ko) * | 1996-12-30 | 2000-09-15 | 김영환 | Arf 감광막 수지 및 그 제조방법 |
US6808859B1 (en) | 1996-12-31 | 2004-10-26 | Hyundai Electronics Industries Co., Ltd. | ArF photoresist copolymers |
KR100225956B1 (ko) * | 1997-01-10 | 1999-10-15 | 김영환 | 아민을 도입한 에이알에프 감광막 수지 |
KR100254472B1 (ko) * | 1997-11-01 | 2000-05-01 | 김영환 | 신규한 말레이미드계 또는 지방족 환형 올레핀계 단량체와 이들 단량체들의 공중합체수지 및 이수지를 이용한 포토레지스트 |
KR100252546B1 (ko) * | 1997-11-01 | 2000-04-15 | 김영환 | 공중합체 수지와 포토레지스트 및 그 제조방법 |
KR100321080B1 (ko) | 1997-12-29 | 2002-11-22 | 주식회사 하이닉스반도체 | 공중합체수지와이의제조방법및이수지를이용한포토레지스트 |
KR100313150B1 (ko) * | 1997-12-31 | 2001-12-28 | 박종섭 | 리소콜릴에시딜(메타)아크릴레이트 단량체와 그를 도입한 공중합체 수지 및 이 수지를 이용한 포토레지스트 |
KR100354871B1 (ko) | 1997-12-31 | 2003-03-10 | 주식회사 하이닉스반도체 | 공중합체수지와그제조방법및이수지를이용한포토레지스트 |
KR19990081722A (ko) | 1998-04-30 | 1999-11-15 | 김영환 | 카르복실기 함유 지환족 유도체 및 그의 제조방법 |
KR100376983B1 (ko) | 1998-04-30 | 2003-08-02 | 주식회사 하이닉스반도체 | 포토레지스트중합체및이를이용한미세패턴의형성방법 |
KR100403325B1 (ko) | 1998-07-27 | 2004-03-24 | 주식회사 하이닉스반도체 | 포토레지스트중합체및이를이용한포토레지스트조성물 |
KR20000015014A (ko) | 1998-08-26 | 2000-03-15 | 김영환 | 신규의 포토레지스트용 단량체, 중합체 및 이를 이용한 포토레지스트 조성물 |
JP3587743B2 (ja) | 1998-08-26 | 2004-11-10 | 株式会社ハイニックスセミコンダクター | フォトレジスト単量体とその製造方法、フォトレジスト共重合体とその製造方法、フォトレジスト組成物、フォトレジストパターン形成方法、および、半導体素子。 |
US6569971B2 (en) | 1998-08-27 | 2003-05-27 | Hyundai Electronics Industries Co., Ltd. | Polymers for photoresist and photoresist compositions using the same |
US10435497B2 (en) * | 2013-02-26 | 2019-10-08 | Zeon Corporation | Cyclopentene ring-opening copolymer, method for producing same, and rubber composition |
-
1969
- 1969-09-24 NL NL6914466A patent/NL6914466A/xx unknown
-
1970
- 1970-09-14 US US00072167A patent/US3776895A/en not_active Expired - Lifetime
- 1970-09-22 BE BE756457D patent/BE756457A/xx unknown
- 1970-09-22 JP JP45082600A patent/JPS508760B1/ja active Pending
- 1970-09-22 FR FR7034240A patent/FR2062473A5/fr not_active Expired
- 1970-09-22 GB GB4511270A patent/GB1329997A/en not_active Expired
- 1970-09-22 DE DE19702046722 patent/DE2046722A1/de active Pending
Also Published As
Publication number | Publication date |
---|---|
US3776895A (en) | 1973-12-04 |
BE756457A (fr) | 1971-03-22 |
NL6914466A (ja) | 1971-03-26 |
FR2062473A5 (ja) | 1971-06-25 |
GB1329997A (en) | 1973-09-12 |
DE2046722A1 (de) | 1971-04-01 |